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DE60230328D1 - Boot zur wärmebehandlung und vertikalwärmebehandlungsgerät - Google Patents

Boot zur wärmebehandlung und vertikalwärmebehandlungsgerät

Info

Publication number
DE60230328D1
DE60230328D1 DE60230328T DE60230328T DE60230328D1 DE 60230328 D1 DE60230328 D1 DE 60230328D1 DE 60230328 T DE60230328 T DE 60230328T DE 60230328 T DE60230328 T DE 60230328T DE 60230328 D1 DE60230328 D1 DE 60230328D1
Authority
DE
Germany
Prior art keywords
heat treatment
boat
treatment device
vertical
vertical heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60230328T
Other languages
English (en)
Inventor
Shinji Irie
Hirofumi Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of DE60230328D1 publication Critical patent/DE60230328D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • H01L21/67309—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by the substrate support
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
DE60230328T 2001-12-27 2002-09-17 Boot zur wärmebehandlung und vertikalwärmebehandlungsgerät Expired - Lifetime DE60230328D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001397884A JP3377996B1 (ja) 2001-12-27 2001-12-27 熱処理用ボート及び縦型熱処理装置
PCT/JP2002/009512 WO2003060968A1 (fr) 2001-12-27 2002-09-17 Nacelle pour traitement thermique et equipement de traitement thermique vertical

Publications (1)

Publication Number Publication Date
DE60230328D1 true DE60230328D1 (de) 2009-01-22

Family

ID=19189253

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60230328T Expired - Lifetime DE60230328D1 (de) 2001-12-27 2002-09-17 Boot zur wärmebehandlung und vertikalwärmebehandlungsgerät

Country Status (8)

Country Link
US (1) US6966771B2 (de)
EP (1) EP1469508B1 (de)
JP (1) JP3377996B1 (de)
KR (1) KR100868399B1 (de)
CN (2) CN1320604C (de)
DE (1) DE60230328D1 (de)
TW (1) TW557534B (de)
WO (1) WO2003060968A1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7033168B1 (en) * 2005-01-24 2006-04-25 Memc Electronic Materials, Inc. Semiconductor wafer boat for a vertical furnace
JP2007201417A (ja) * 2005-12-28 2007-08-09 Tokyo Electron Ltd 熱処理用ボート及び縦型熱処理装置
US8109975B2 (en) * 2007-01-30 2012-02-07 Warsaw Orthopedic, Inc. Collar bore configuration for dynamic spinal stabilization assembly
JP4313401B2 (ja) * 2007-04-24 2009-08-12 東京エレクトロン株式会社 縦型熱処理装置及び被処理基板移載方法
US8042697B2 (en) 2008-06-30 2011-10-25 Memc Electronic Materials, Inc. Low thermal mass semiconductor wafer support
JP5088331B2 (ja) * 2009-01-26 2012-12-05 東京エレクトロン株式会社 熱処理装置用の構成部品及び熱処理装置
JP5545055B2 (ja) * 2010-06-15 2014-07-09 東京エレクトロン株式会社 支持体構造及び処理装置
JP5881956B2 (ja) * 2011-02-28 2016-03-09 株式会社日立国際電気 基板処理装置、半導体装置の製造方法およびウェーハホルダ
KR101052010B1 (ko) * 2011-04-25 2011-07-27 주식회사 페어텍 내구성이 향상된 푸셔 스프링이 구비된 ｌｃｄ 글라스 홀딩장치
CN103928375A (zh) * 2013-01-15 2014-07-16 上海华虹宏力半导体制造有限公司 一种适用于大气压炉的新型石英舟
CN104253077B (zh) * 2013-06-26 2017-08-25 上海华虹宏力半导体制造有限公司 一种用于扩散炉管的晶座
USD847105S1 (en) * 2018-05-03 2019-04-30 Kokusai Electric Corporation Boat of substrate processing apparatus
USD846514S1 (en) * 2018-05-03 2019-04-23 Kokusai Electric Corporation Boat of substrate processing apparatus
JP7245071B2 (ja) * 2019-02-21 2023-03-23 株式会社ジェイテクトサーモシステム 基板支持装置
JP1658652S (de) * 2019-08-07 2020-04-27
JP6770617B1 (ja) * 2019-08-09 2020-10-14 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、半導体装置の製造方法及び基板保持具
CN112466794B (zh) * 2020-11-24 2021-12-03 长江存储科技有限责任公司 薄膜沉积装置及晶舟组件
CN112530826B (zh) * 2020-11-27 2024-05-17 北京北方华创微电子装备有限公司 半导体热处理设备的承载装置及半导体热处理设备

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0538869U (ja) 1991-10-18 1993-05-25 富士通株式会社 ウエーハ支持装置
TW242196B (de) * 1992-12-03 1995-03-01 Saint Gdbain Norton Ind Ceramics Corp
US5458688A (en) * 1993-03-09 1995-10-17 Tokyo Electron Kabushiki Kaisha Heat treatment boat
US6033480A (en) * 1994-02-23 2000-03-07 Applied Materials, Inc. Wafer edge deposition elimination
JP3388668B2 (ja) 1996-02-29 2003-03-24 東京エレクトロン株式会社 熱処理用ボ−ト及び縦型熱処理装置
JP3469000B2 (ja) * 1996-08-02 2003-11-25 三井造船株式会社 縦型ウエハ支持装置
JPH1131639A (ja) 1997-07-10 1999-02-02 Kokusai Electric Co Ltd 半導体製造装置
JPH11260746A (ja) 1998-03-13 1999-09-24 Sumitomo Metal Ind Ltd ウェーハ支持板
WO2000019502A1 (fr) 1998-09-28 2000-04-06 Hitachi, Ltd. Fourneau vertical et nacelle porte-tranches
JP4003906B2 (ja) * 1999-03-19 2007-11-07 コバレントマテリアル株式会社 シリコン単結晶半導体ウエハ加熱処理用治具及びこれを用いたシリコン単結晶半導体ウエハ加熱処理用装置
JP4061904B2 (ja) 1999-09-03 2008-03-19 株式会社Ｓｕｍｃｏ ウェーハ保持具
US6287112B1 (en) * 2000-03-30 2001-09-11 Asm International, N.V. Wafer boat
KR100410982B1 (ko) * 2001-01-18 2003-12-18 삼성전자주식회사 반도체 제조장치용 보트
JP4467028B2 (ja) * 2001-05-11 2010-05-26 信越石英株式会社 縦型ウェーハ支持治具

Also Published As

Publication number Publication date
CN2684373Y (zh) 2005-03-09
CN1608313A (zh) 2005-04-20
EP1469508A4 (de) 2006-12-27
US6966771B2 (en) 2005-11-22
TW557534B (en) 2003-10-11
KR20040068113A (ko) 2004-07-30
WO2003060968A1 (fr) 2003-07-24
US20050042568A1 (en) 2005-02-24
EP1469508B1 (de) 2008-12-10
JP2003197553A (ja) 2003-07-11
EP1469508A1 (de) 2004-10-20
KR100868399B1 (ko) 2008-11-11
CN1320604C (zh) 2007-06-06
JP3377996B1 (ja) 2003-02-17

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