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DE60026461D1 - Lithographischer Projektionsapparat - Google Patents

Lithographischer Projektionsapparat

Info

Publication number
DE60026461D1
DE60026461D1 DE60026461T DE60026461T DE60026461D1 DE 60026461 D1 DE60026461 D1 DE 60026461D1 DE 60026461 T DE60026461 T DE 60026461T DE 60026461 T DE60026461 T DE 60026461T DE 60026461 D1 DE60026461 D1 DE 60026461D1
Authority
DE
Germany
Prior art keywords
projection apparatus
lithographic projection
lithographic
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60026461T
Other languages
English (en)
Other versions
DE60026461T2 (de
Inventor
De Pasch Engelbertus Anton Van
Meer Aschwin Lodewijk Hend Van
Franciscus Adrianus G Klaassen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML MaskTools Netherlands BV
Original Assignee
ASML MaskTools Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML MaskTools Netherlands BV filed Critical ASML MaskTools Netherlands BV
Application granted granted Critical
Publication of DE60026461D1 publication Critical patent/DE60026461D1/de
Publication of DE60026461T2 publication Critical patent/DE60026461T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60026461T 1999-10-12 2000-10-10 Lithographischer Projektionsapparat Expired - Fee Related DE60026461T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99203327 1999-10-12
EP99203327 1999-10-12

Publications (2)

Publication Number Publication Date
DE60026461D1 true DE60026461D1 (de) 2006-05-04
DE60026461T2 DE60026461T2 (de) 2006-09-28

Family

ID=8240734

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60026461T Expired - Fee Related DE60026461T2 (de) 1999-10-12 2000-10-10 Lithographischer Projektionsapparat

Country Status (5)

Country Link
US (1) US6392738B1 (de)
JP (1) JP4058230B2 (de)
KR (1) KR100776771B1 (de)
DE (1) DE60026461T2 (de)
TW (1) TW484039B (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001077002A (ja) * 1999-09-02 2001-03-23 Nikon Corp 荷電粒子ビーム露光方法、荷電粒子ビーム露光装置及び半導体デバイス製造方法
US6809809B2 (en) * 2000-11-15 2004-10-26 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
US6924492B2 (en) * 2000-12-22 2005-08-02 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
EP1452851A1 (de) * 2003-02-24 2004-09-01 ASML Netherlands B.V. Verfahren und Vorrichtung zur Messung der Oberflächenkontamination eines Teils eines Lithographischen Apparatus
SG115621A1 (en) * 2003-02-24 2005-10-28 Asml Netherlands Bv Method and device for measuring contamination of a surface of a component of a lithographic apparatus
SG123601A1 (en) * 2003-03-10 2006-07-26 Asml Netherlands Bv Focus spot monitoring in a lithographic projectionapparatus
EP1507172A1 (de) * 2003-08-12 2005-02-16 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Justierung des Apparats
US8698998B2 (en) * 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
US7050147B2 (en) * 2004-07-08 2006-05-23 Asml Netherlands B.V. Method of adjusting a height of protrusions on a support surface of a support table, a lithographic projection apparatus, and a support table for supporting an article in a lithographic apparatus
US7385670B2 (en) * 2004-10-05 2008-06-10 Asml Netherlands B.V. Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus
US7652746B2 (en) * 2005-06-21 2010-01-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR100995450B1 (ko) * 2005-12-12 2010-11-18 칼 짜이스 에스엠티 아게 오염을 고려한 광학 소자 검사기구 및 검사방법
US7522263B2 (en) * 2005-12-27 2009-04-21 Asml Netherlands B.V. Lithographic apparatus and method
US20070146658A1 (en) * 2005-12-27 2007-06-28 Asml Netherlands B.V. Lithographic apparatus and method
JP2007266074A (ja) * 2006-03-27 2007-10-11 Toshiba Corp 半導体装置の製造方法及び液浸リソグラフィーシステム
KR100763532B1 (ko) * 2006-08-17 2007-10-05 삼성전자주식회사 웨이퍼 지지장치, 웨이퍼 노광 장치 및 웨이퍼 지지방법
EP1901125A1 (de) * 2006-09-14 2008-03-19 Carl Zeiss SMT AG Optisches System zur Erzeugung von Strahlung im EUV-Wellenlängenbereich und Verfahren zur Messung des Kontaminationsstatus von EUV-reflektierenden Elementen
US7894037B2 (en) * 2007-07-30 2011-02-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL1036069A1 (nl) * 2007-10-30 2009-05-07 Asml Netherlands Bv An Immersion Lithography Apparatus.
NL1036125A1 (nl) * 2007-11-08 2009-05-11 Asml Netherlands Bv Lithographic apparatus and method.
NL2004153A (en) * 2009-02-24 2010-08-25 Asml Netherlands Bv Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system.
CN101819030B (zh) * 2009-02-27 2012-05-30 北京京东方光电科技有限公司 磁控溅射靶材表面粗糙度的监测方法和系统
NL2005207A (en) * 2009-09-28 2011-03-29 Asml Netherlands Bv Heat pipe, lithographic apparatus and device manufacturing method.
JP2012015206A (ja) * 2010-06-29 2012-01-19 Toshiba Corp 露光制御システム及び露光制御方法
US9281251B2 (en) 2013-08-09 2016-03-08 Tokyo Electron Limited Substrate backside texturing
JP6313585B2 (ja) * 2013-12-10 2018-04-18 キヤノン株式会社 露光装置及び物品の製造方法
KR102563669B1 (ko) 2015-08-22 2023-08-03 도쿄엘렉트론가부시키가이샤 기판 배면 텍스처링
JP6700922B2 (ja) * 2016-04-05 2020-05-27 キヤノン株式会社 カバー部材、搬送装置、リソグラフィ装置、及び物品の製造方法
NL2020847A (en) * 2017-05-25 2018-12-04 Asml Holding Nv Substrates and methods of using those substrates
JP6956604B2 (ja) * 2017-11-13 2021-11-02 キヤノン株式会社 基板処理装置および物品製造方法
NL2022445A (en) * 2018-02-06 2019-02-18 Asml Holding Nv System, Device and Method for Reconditioning a Substrate Support
US11300493B2 (en) * 2019-12-31 2022-04-12 Industrial Intelligence, Inc. Continuous dust accumulation monitoring system
KR102741400B1 (ko) * 2020-05-20 2024-12-11 삼성전자주식회사 레티클 포드의 세정 방법 및 세정 시스템
EP4381273A1 (de) * 2021-07-06 2024-06-12 Industrial Intelligence, Inc. Überwachungssystem für kontinuierliche staubansammlung, vorrichtung und verfahren mit erkennung und reinigung einer gestörten optik
US11841305B2 (en) 2021-08-25 2023-12-12 Industrial Intelligence, Inc. System, device and method for effective deployment of a dust accumulation sensor

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE33991E (en) * 1982-11-04 1992-07-14 Hitachi, Ltd. Foreign particle detecting method and apparatus
US4895446A (en) * 1986-10-23 1990-01-23 Inspex Incorporated Particle detection method and apparatus
US5821175A (en) * 1988-07-08 1998-10-13 Cauldron Limited Partnership Removal of surface contaminants by irradiation using various methods to achieve desired inert gas flow over treated surface
US5539514A (en) * 1991-06-26 1996-07-23 Hitachi, Ltd. Foreign particle inspection apparatus and method with front and back illumination
US5559582A (en) * 1992-08-28 1996-09-24 Nikon Corporation Exposure apparatus
JPH06260394A (ja) * 1993-03-09 1994-09-16 Nippon Steel Corp 半導体基板の露光方法及び露光装置
US5825470A (en) * 1995-03-14 1998-10-20 Nikon Corporation Exposure apparatus
JPH08330217A (ja) * 1995-06-02 1996-12-13 Nikon Corp 清掃装置
US5673208A (en) 1996-04-11 1997-09-30 Micron Technology, Inc. Focus spot detection method and system
JP3409272B2 (ja) 1997-02-04 2003-05-26 宮崎沖電気株式会社 露光マスクの異物検査方法
JPH10223512A (ja) 1997-02-10 1998-08-21 Nikon Corp 電子ビーム投影露光装置
JPH11162831A (ja) * 1997-11-21 1999-06-18 Nikon Corp 投影露光装置及び投影露光方法

Also Published As

Publication number Publication date
JP2001144013A (ja) 2001-05-25
JP4058230B2 (ja) 2008-03-05
TW484039B (en) 2002-04-21
US6392738B1 (en) 2002-05-21
KR100776771B1 (ko) 2007-11-16
DE60026461T2 (de) 2006-09-28
KR20010040044A (ko) 2001-05-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee