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DE60020620D1 - Lithographischer Projektionsapparat - Google Patents

Lithographischer Projektionsapparat

Info

Publication number
DE60020620D1
DE60020620D1 DE60020620T DE60020620T DE60020620D1 DE 60020620 D1 DE60020620 D1 DE 60020620D1 DE 60020620 T DE60020620 T DE 60020620T DE 60020620 T DE60020620 T DE 60020620T DE 60020620 D1 DE60020620 D1 DE 60020620D1
Authority
DE
Germany
Prior art keywords
projection apparatus
lithographic projection
lithographic
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60020620T
Other languages
English (en)
Other versions
DE60020620T2 (de
Inventor
Boef Arie Jeffrey Den
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE60020620D1 publication Critical patent/DE60020620D1/de
Application granted granted Critical
Publication of DE60020620T2 publication Critical patent/DE60020620T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
DE60020620T 1999-02-04 2000-02-02 Lithographischer Projektionsapparat Expired - Fee Related DE60020620T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99200324 1999-02-04
EP99200324 1999-02-04

Publications (2)

Publication Number Publication Date
DE60020620D1 true DE60020620D1 (de) 2005-07-14
DE60020620T2 DE60020620T2 (de) 2006-05-11

Family

ID=8239864

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60020620T Expired - Fee Related DE60020620T2 (de) 1999-02-04 2000-02-02 Lithographischer Projektionsapparat

Country Status (5)

Country Link
US (1) US6384899B1 (de)
JP (1) JP3949868B2 (de)
KR (1) KR100544356B1 (de)
DE (1) DE60020620T2 (de)
TW (1) TW569083B (de)

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US20030145353A1 (en) * 1997-05-07 2003-07-31 Lightner Jonathan E. Starch biosynthetic enzymes
US7068833B1 (en) 2000-08-30 2006-06-27 Kla-Tencor Corporation Overlay marks, methods of overlay mark design and methods of overlay measurements
US7541201B2 (en) 2000-08-30 2009-06-02 Kla-Tencor Technologies Corporation Apparatus and methods for determining overlay of structures having rotational or mirror symmetry
US6778280B2 (en) * 2001-07-06 2004-08-17 Zygo Corporation Interferometry system and method employing an angular difference in propagation between orthogonally polarized input beam components
AU2003215204A1 (en) * 2002-02-12 2003-09-04 Zygo Corporation Characterization and compensation of non-cyclic errors in interferometry systems
US7804994B2 (en) * 2002-02-15 2010-09-28 Kla-Tencor Technologies Corporation Overlay metrology and control method
US6906784B2 (en) * 2002-03-04 2005-06-14 Zygo Corporation Spatial filtering in interferometry
DE60319462T2 (de) * 2002-06-11 2009-03-12 Asml Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
US7262860B2 (en) * 2002-07-29 2007-08-28 Zygo Corporation Compensation for errors in off-axis interferometric measurements
US7274462B2 (en) * 2002-09-09 2007-09-25 Zygo Corporation In SITU measurement and compensation of errors due to imperfections in interferometer optics in displacement measuring interferometry systems
KR100552455B1 (ko) * 2002-09-20 2006-02-20 에이에스엠엘 네델란즈 비.브이. 리소그래피시스템용 정렬시스템 및 정렬방법
US7075619B2 (en) * 2002-12-12 2006-07-11 Zygo Corporation In-process correction of stage mirror deformations during a photolithography exposure cycle
US7075639B2 (en) * 2003-04-25 2006-07-11 Kla-Tencor Technologies Corporation Method and mark for metrology of phase errors on phase shift masks
US7327465B2 (en) * 2003-06-19 2008-02-05 Zygo Corporation Compensation for effects of beam misalignments in interferometer metrology systems
US7286240B2 (en) * 2003-06-19 2007-10-23 Zygo Corporation Compensation for geometric effects of beam misalignments in plane mirror interferometer metrology systems
US7180603B2 (en) * 2003-06-26 2007-02-20 Zygo Corporation Reduction of thermal non-cyclic error effects in interferometers
US7608468B1 (en) 2003-07-02 2009-10-27 Kla-Tencor Technologies, Corp. Apparatus and methods for determining overlay and uses of same
US7346878B1 (en) 2003-07-02 2008-03-18 Kla-Tencor Technologies Corporation Apparatus and methods for providing in-chip microtargets for metrology or inspection
WO2005045529A2 (en) * 2003-11-04 2005-05-19 Zygo Corporation Characterization and compensation of errors in multi-axis interferometry system
US7443511B2 (en) * 2003-11-25 2008-10-28 Asml Netherlands B.V. Integrated plane mirror and differential plane mirror interferometer system
US7379190B2 (en) * 2004-01-05 2008-05-27 Zygo Corporation Stage alignment in lithography tools
JP4790632B2 (ja) * 2004-01-06 2011-10-12 ザイゴ コーポレーション 多軸干渉計ならびに多軸干渉計を用いる方法およびシステム
JP2005249794A (ja) * 2004-03-03 2005-09-15 Zygo Corp 干渉計および干渉計を使用するシステム
US7280224B2 (en) * 2004-04-22 2007-10-09 Zygo Corporation Interferometry systems and methods of using interferometry systems
US7375823B2 (en) * 2004-04-22 2008-05-20 Zygo Corporation Interferometry systems and methods of using interferometry systems
US7489407B2 (en) * 2004-10-06 2009-02-10 Zygo Corporation Error correction in interferometry systems
US7557921B1 (en) 2005-01-14 2009-07-07 Kla-Tencor Technologies Corporation Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools
WO2006102234A2 (en) * 2005-03-18 2006-09-28 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
KR100945314B1 (ko) * 2007-02-21 2010-03-05 캐논 가부시끼가이샤 형상 측정 장치, 노광 장치 및 컴퓨터
US7880863B2 (en) * 2008-01-22 2011-02-01 Infineon Technologies Ag Lithography system with illumination monitor
DE102008029970A1 (de) * 2008-06-26 2009-12-31 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zum Überwachen einer lateralen Abbildungsstabilität
US8039366B2 (en) * 2009-02-19 2011-10-18 International Business Machines Corporation Method for providing rotationally symmetric alignment marks for an alignment system that requires asymmetric geometric layout
US9927718B2 (en) 2010-08-03 2018-03-27 Kla-Tencor Corporation Multi-layer overlay metrology target and complimentary overlay metrology measurement systems
US10890436B2 (en) 2011-07-19 2021-01-12 Kla Corporation Overlay targets with orthogonal underlayer dummyfill
US9719777B1 (en) * 2014-05-30 2017-08-01 Zygo Corporation Interferometer with real-time fringe-free imaging
US10451412B2 (en) 2016-04-22 2019-10-22 Kla-Tencor Corporation Apparatus and methods for detecting overlay errors using scatterometry
CN113219800B (zh) * 2021-03-25 2024-03-19 北海惠科半导体科技有限公司 晶圆半导体产品、其制作方法与光刻机
KR102590798B1 (ko) * 2023-04-05 2023-10-19 한국기계연구원 리소그래피 장치 및 방법

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* Cited by examiner, † Cited by third party
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JPS5515685B2 (de) * 1972-06-30 1980-04-25
US5156943A (en) * 1987-10-25 1992-10-20 Whitney Theodore R High resolution imagery systems and methods
US4865450A (en) * 1988-06-23 1989-09-12 United States Of America As Represented By Secretary Of The Air Force Dual photoelastic modulator heterodyne interferometer
US5377006A (en) * 1991-05-20 1994-12-27 Hitachi, Ltd. Method and apparatus for detecting photoacoustic signal
US5189547A (en) 1991-05-28 1993-02-23 New Focus, Inc. Electro-optical light modulator driven by a resonant electrical circuit
US5298971A (en) * 1992-09-23 1994-03-29 Industrial Technology Research Institute Lateral shear interferometer for testing aspheric surfaces
US5469259A (en) * 1994-01-03 1995-11-21 International Business Machines Corporation Inspection interferometer with scanning autofocus, and phase angle control features
JPH08167559A (ja) * 1994-12-15 1996-06-25 Nikon Corp アライメント方法及び装置
US5706084A (en) * 1995-09-14 1998-01-06 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Modulated source interferometry with combined amputude & frequency modulation
US5872629A (en) * 1997-06-23 1999-02-16 Charles Evans & Associates Analytical depth monitor utilizing differential interferometric analysis
US5995207A (en) * 1997-11-26 1999-11-30 Litton Systems, Inc. Method for determining the phase difference of light waves propagated over two paths

Also Published As

Publication number Publication date
TW569083B (en) 2004-01-01
KR20000057889A (ko) 2000-09-25
KR100544356B1 (ko) 2006-01-23
US6384899B1 (en) 2002-05-07
JP3949868B2 (ja) 2007-07-25
DE60020620T2 (de) 2006-05-11
JP2000228359A (ja) 2000-08-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee