[go: up one dir, main page]

DE3850519D1 - Vorrichtung zur Herstellung von Halbleiter-Bauelementen. - Google Patents

Vorrichtung zur Herstellung von Halbleiter-Bauelementen.

Info

Publication number
DE3850519D1
DE3850519D1 DE3850519T DE3850519T DE3850519D1 DE 3850519 D1 DE3850519 D1 DE 3850519D1 DE 3850519 T DE3850519 T DE 3850519T DE 3850519 T DE3850519 T DE 3850519T DE 3850519 D1 DE3850519 D1 DE 3850519D1
Authority
DE
Germany
Prior art keywords
production
semiconductor components
semiconductor
components
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3850519T
Other languages
English (en)
Other versions
DE3850519T2 (de
Inventor
Masanori Yokohama W Nishiguchi
Takeshi Yokohama Wor Sekiguchi
Nobuyoshi Yokohama Works Tato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP10811887A external-priority patent/JP2567395B2/ja
Priority claimed from JP62108117A external-priority patent/JPS63272509A/ja
Priority claimed from JP10811987A external-priority patent/JP2567396B2/ja
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE3850519D1 publication Critical patent/DE3850519D1/de
Publication of DE3850519T2 publication Critical patent/DE3850519T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
    • B28D5/0017—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools
    • B28D5/0023—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools rectilinearly
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
    • B28D5/0052—Means for supporting or holding work during breaking
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00—Severing by tearing or breaking
    • Y10T225/30—Breaking or tearing apparatus
    • Y10T225/304—Including means to apply thermal shock to work
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00—Severing by tearing or breaking
    • Y10T225/30—Breaking or tearing apparatus
    • Y10T225/307—Combined with preliminary weakener or with nonbreaking cutter
    • Y10T225/321—Preliminary weakener
    • Y10T225/325—With means to apply moment of force to weakened work
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00—Severing by tearing or breaking
    • Y10T225/30—Breaking or tearing apparatus
    • Y10T225/371—Movable breaking tool
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00—Severing by tearing or breaking
    • Y10T225/30—Breaking or tearing apparatus
    • Y10T225/371—Movable breaking tool
    • Y10T225/379—Breaking tool intermediate spaced work supports
    • Y10T225/386—Clamping supports

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Dicing (AREA)
DE3850519T 1987-05-01 1988-04-29 Vorrichtung zur Herstellung von Halbleiter-Bauelementen. Expired - Fee Related DE3850519T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10811887A JP2567395B2 (ja) 1987-05-01 1987-05-01 半導体素子製造装置
JP62108117A JPS63272509A (ja) 1987-05-01 1987-05-01 半導体素子製造装置
JP10811987A JP2567396B2 (ja) 1987-05-01 1987-05-01 半導体素子製造装置

Publications (2)

Publication Number Publication Date
DE3850519D1 true DE3850519D1 (de) 1994-08-11
DE3850519T2 DE3850519T2 (de) 1994-12-01

Family

ID=27311150

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3850519T Expired - Fee Related DE3850519T2 (de) 1987-05-01 1988-04-29 Vorrichtung zur Herstellung von Halbleiter-Bauelementen.

Country Status (5)

Country Link
US (1) US5104023A (de)
EP (1) EP0289045B1 (de)
KR (1) KR920004514B1 (de)
CA (1) CA1311314C (de)
DE (1) DE3850519T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4006070A1 (de) * 1990-02-27 1991-09-12 Braun Ag Verfahren und einrichtung zum zerteilen einer scheibe aus halbleitermaterial
JP3552772B2 (ja) * 1994-01-21 2004-08-11 アマダ・エムエフジー・アメリカ・インコーポレイティド ミクロジョイント加工用製品分離方法
JP3409928B2 (ja) * 1994-10-15 2003-05-26 株式会社東芝 半導体装置の製造方法
US5543365A (en) * 1994-12-02 1996-08-06 Texas Instruments Incorporated Wafer scribe technique using laser by forming polysilicon
US5710065A (en) * 1995-01-03 1998-01-20 Texas Instruments Incorporated Method and apparatus for breaking and separating dies from a wafer
US6685073B1 (en) 1996-11-26 2004-02-03 Texas Instruments Incorporated Method and apparatus for stretching and processing saw film tape after breaking a partially sawn wafer
US6184063B1 (en) 1996-11-26 2001-02-06 Texas Instruments Incorporated Method and apparatus for breaking and separating a wafer into die using a multi-radii dome
JP4322328B2 (ja) * 1997-06-05 2009-08-26 テキサス インスツルメンツ インコーポレイテツド ウエハをウエハテープに接着する方法および装置
US5913468A (en) * 1998-01-06 1999-06-22 Amada Engineering & Service, Inc. Micro-joint part separator
US6098862A (en) * 1998-05-18 2000-08-08 Lucent Technologies Inc. Incrementally continuous laser cleaving process
US6205994B1 (en) * 1998-12-23 2001-03-27 Lucent Technologies, Inc. Scriber adapter plate
US6686225B2 (en) 2001-07-27 2004-02-03 Texas Instruments Incorporated Method of separating semiconductor dies from a wafer
US6541352B2 (en) 2001-07-27 2003-04-01 Texas Instruments Incorporated Semiconductor die with contoured bottom surface and method for making same
US20180323105A1 (en) * 2017-05-02 2018-11-08 Psemi Corporation Simultaneous Break and Expansion System for Integrated Circuit Wafers

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1481711A (fr) * 1965-06-02 1967-05-19 Nippon Electric Co Dispositif pour briser une masse semi-conductrice en morceaux élémentaires
US3562057A (en) * 1967-05-16 1971-02-09 Texas Instruments Inc Method for separating substrates
US3507426A (en) * 1968-02-23 1970-04-21 Rca Corp Method of dicing semiconductor wafers
US3493155A (en) * 1969-05-05 1970-02-03 Nasa Apparatus and method for separating a semiconductor wafer
US3727282A (en) * 1970-02-05 1973-04-17 Burroughs Corp Semiconductor handling apparatus
US3743148A (en) * 1971-03-08 1973-07-03 H Carlson Wafer breaker
US3790051A (en) * 1971-09-07 1974-02-05 Radiant Energy Systems Semiconductor wafer fracturing technique employing a pressure controlled roller
US3918150A (en) * 1974-02-08 1975-11-11 Gen Electric System for separating a semiconductor wafer into discrete pellets
US4247031A (en) * 1979-04-10 1981-01-27 Rca Corporation Method for cracking and separating pellets formed on a wafer
US4410168A (en) * 1980-07-11 1983-10-18 Asta, Ltd. Apparatus for manipulating a stretched resilient diaphragm
FR2516848A1 (fr) * 1981-11-25 1983-05-27 Radiotechnique Compelec Procede et machine pour subdiviser une plaque de ceramiqueŸa

Also Published As

Publication number Publication date
KR920004514B1 (ko) 1992-06-08
CA1311314C (en) 1992-12-08
US5104023A (en) 1992-04-14
EP0289045A2 (de) 1988-11-02
EP0289045B1 (de) 1994-07-06
DE3850519T2 (de) 1994-12-01
KR880014643A (ko) 1988-12-24
EP0289045A3 (de) 1991-01-16

Similar Documents

Publication Publication Date Title
DE68919053D1 (de) Verfahren zur Herstellung von Aluminoxanen.
DE3889393D1 (de) Verfahren zur Herstellung von 2,2,6,6-Tetramethyl-4-piperidylaminen.
DE3852381D1 (de) Verfahren zur Herstellung von para-Ethylphenol.
DE69005177D1 (de) Vorrichtung zur Herstellung von Aufhängeverpackungen.
DE3787197D1 (de) Gerät zur Herstellung von Schichtpressstoffen.
DE69008020D1 (de) Vorrichtung zur Herstellung von Bohnenbruch.
DE3865215D1 (de) Vorrichtung zur herstellung von kaffee.
DE68915220D1 (de) Vorrichtung zur Herstellung von Schichtstoffen.
DE68916393D1 (de) Verfahren zur Herstellung von ebenen Wafern.
DE68915496D1 (de) Vorrichtung zur Herstellung von Metallpulver.
DE3750318D1 (de) Verfahren zur Herstellung von Halosilanen.
DE68921655D1 (de) Verfahren zur Herstellung von Mustern.
DE3850519D1 (de) Vorrichtung zur Herstellung von Halbleiter-Bauelementen.
DE3767694D1 (de) Vorrichtung zur keratotomie der cornea.
DE3776819D1 (de) Vorrichtung fuer die herstellung von filterzigaretten.
DE3789680D1 (de) Verfahren zur Herstellung von Halbleiterbauelementen.
DE69007858D1 (de) Vorrichtung zur Herstellung von Silicium-Einkristallen.
EP0589710A3 (de) Vorrichtung zur Herstellung von Schablonen.
DE58901037D1 (de) Vorrichtung zur herstellung von klareisstuecken.
DE3883407D1 (de) Verfahren zur Herstellung von Fruit-Chips.
DE69213483D1 (de) Vorrichtung zur Herstellung von Kernen
DE3775913D1 (de) Vorrichtung zur herstellung von gepufftem getreide.
DE58906122D1 (de) Verfahren zur Herstellung von Phenylethanolen.
DE3860193D1 (de) Vorrichtung zur erzeugung von schlagobers.
DE68912292D1 (de) Vorrichtung zur Herstellung von Glastafeln.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee