DE271403C - - Google Patents
Info
- Publication number
- DE271403C DE271403C DENDAT271403D DE271403DA DE271403C DE 271403 C DE271403 C DE 271403C DE NDAT271403 D DENDAT271403 D DE NDAT271403D DE 271403D A DE271403D A DE 271403DA DE 271403 C DE271403 C DE 271403C
- Authority
- DE
- Germany
- Prior art keywords
- silver
- solution
- layer
- silicate
- chlorine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- BQCADISMDOOEFD-UHFFFAOYSA-N silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 12
- 229910052709 silver Inorganic materials 0.000 claims description 12
- 239000004332 silver Substances 0.000 claims description 12
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims description 3
- -1 chlorine silver Chemical compound 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 239000011148 porous material Substances 0.000 claims description 3
- 239000000654 additive Substances 0.000 claims 1
- 230000000996 additive Effects 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N silicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 5
- HKZLPVFGJNLROG-UHFFFAOYSA-M Silver chloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 4
- LDDQLRUQCUTJBB-UHFFFAOYSA-N Ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N Silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 210000003491 Skin Anatomy 0.000 description 2
- GGCZERPQGJTIQP-UHFFFAOYSA-M Sodium 2-anthraquinonesulfonate Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)[O-])=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-M 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000011505 plaster Substances 0.000 description 2
- 150000004760 silicates Chemical class 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N Carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N Sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 235000003560 Valerianella locusta Nutrition 0.000 description 1
- 240000004668 Valerianella locusta Species 0.000 description 1
- 230000001070 adhesive Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminum Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000001419 dependent Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N tin hydride Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1644—Composition of the substrate porous substrates
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Aftertreatments Of Artificial And Natural Stones (AREA)
Description
PATENTAMT.PATENT OFFICE.
1010
»5»5
3030th
Bd der vorliegenden Erfindung handelt es sich darnm, die Oberfläche eines Gegenstandes aas porösem Material, z. B. ans Gußeisen, KoIs, Gips, Gipsmörtel, Stuck, Papier, gepreStem Papiermache usw. zu metallisieren, indem auf ihr eine Alkalisilikatschicht zum Ausfüllen der Poren und durch Reduktion einer alkalischen Chlorsilberlösung eine Silberschicht hergestellt wird- Die Erfindung besteht darin, daß die Chlorsilberlösung einen Zusatz von Ammonfluorid erhält. Dieser Zusatz greift die Silikatschicht an und ermöglicht es dem Silber, sich auf der Oberfläche festzusetzen.Bd of the present invention is darnm, the surface of an object aas porous material, z. B. to cast iron, KoIs, plaster, plaster mortar, stucco, paper, pressed To metallize paper mache etc. by applying an alkali silicate layer to it Filling of the pores and a layer of silver by reducing an alkaline chlorosilver solution The invention consists in that the chlorosilver solution has a Addition of ammonium fluoride is obtained. This addition attacks the silicate layer and allows the silver to settle on the surface to fix.
Das Verfahren wird vorteilhaft in folgender Weise durchgeführt. Zuerst wird die zu metallisierende Oberfläche entweder durch Eintauchen oder durch direktes Auftragen mit einer Bürste o. dgL mit zwei oder mehr Schichten der Silikatlösung, z. B. Wasserglas, versehen. Diese Lösung kann dadurch hergestellt werden, daß man einen Teil kieselsaures Natron (spez. Gew. 1,27) in zwei Teilen Wasser löst und den Gegenstand einmal mit der Lösung bedeckt. Dann stellt man eine zweite Lösung her, und zwar durch Auflösen eines Teiles kieselsauren Natrons in einem Teil Wasser, und bringt diese Lösung auf den ersten Überzug. Vor Aufbringen jedes folgenden Überzuges muß der vorangegangene getrocknet sein. Die Anzahl der Silikatschichten hängt von dem betreffenden Gegenstand ab. The method is advantageously carried out in the following manner. First that becomes metallizing surface either by dipping or by direct application with a brush or similar with two or more layers of the silicate solution, e.g. B. water glass, Mistake. This solution can be prepared by adding some of the silicic acid Soda (specific weight 1.27) dissolves in two parts of water and the object once with the solution covered. Then make a second solution by dissolving it one part of silica in one part of water, and brings this solution to the first coat. Before each subsequent coat is applied, the previous one must be dry. The number of layers of silicate depends on the subject.
Die in dieser Weise hergestellte Oberfläche von kieselsaurem Alkali wird zweckmäßig mittels einer Bürste mit der Ammonfluorid , enthaltenden Chlorsilberlösung versehen, und zwar muß das Auftragen der Silberlösung so gleichmäßig erfolgen, daß die' Oberflächengestalt des Gegenstandes unverändert bleibt.The surface of silicic acid alkali prepared in this way becomes appropriate by means of a brush with the ammonium fluoride, containing silver chlorine solution, and the application of the silver solution must be so take place evenly that the 'surface shape of the object remains unchanged.
Alsdann wird eine Hydrazinlösung aufgetragen, die das Silberchlorid zu metallischem Silber reduziert und eine dünne, gleichmäßige Haut auf der Oberfläche bildet. In dieser Haut sind unendlich kleine und aneinanderhaftende Teilchen von metallischem Silber enthalten. Then a hydrazine solution is applied, which turns the silver chloride into metallic Silver reduces and forms a thin, even skin on the surface. In this Skin contains infinitely small and clinging particles of metallic silver.
Die Leichtigkeit, mit der das Ammonfluorid die Alkalisilikatschicht angreift, begünstigt das Eindringen des metallischen Silbers in die so Silikatschicht, so daß das Silber und · das Silikat fest aneinänderhaften und einen vollkommen homogenen Überzug bilden. ,The ease with which the ammonium fluoride attacks the alkali silicate layer favors this Penetration of the metallic silver into the silicate layer so that the silver and · the Silicate stick together tightly and form a completely homogeneous coating. ,
Die behandelte Oberfläche wird noch einmal zuerst mit der Silberlösung Und dann mit der Reduzierlösung befeuchtet und schließ-The treated surface is once again first and then with the silver solution moistened with the reducing solution and
ΛϊΆΛΚΛϊΆΛΚ
' Hch der Reibung von rasch rotierenden Bürsten mit Borsten aus Messing, Zink, Kupfer, Zinn, Aluminium oder Eisen ausgesetzt, zum Zwecke, die Reduktion des Silberchlorids zu vervollständigen und die Haftwirkung des metallischen Silbers zu erhöhen.High friction from rapidly rotating brushes with bristles made of brass, zinc, copper, tin, aluminum or iron exposed to Purposes to complete the reduction of the silver chloride and the adhesive effect of the metallic silver to increase.
Nach dieser Behandlung ist der Gegenstand fertig für die Elektrolyse.
^ Das Verfahren bietet die Möglichkeit, den ίο Gegenstand nur an einzelnen Stellen zu metallisieren
bzw. zu galvanisieren. Dies kann aus mannigfachen Gründen, sowohl des schönen Aussehens wie des Anbringens von Monogrammen
oder sonstiger Verzierungen wegen erwünscht sein. Die nicht behandelten Stellen ,'·.] werden dann durch das Bad nicht angegriffen
/ und erhalten keinen galvanischen Überzug.
Bei einem früheren Verfahren wird die zu metallisierende Oberfläche mit einer Silber- Γ
fluoridlösung behandelt, die durch, einen Gas- ao
strom reduziert wird. Auch hier werden die j Silikate durch Fluor angegriffen, doch erst
infolge der Reduktion des Silbersalzes. Bei < dem Verfahren der vorliegenden Erfindung :
ist die Zersetzung der Silikate an sich unab- as:
hängig von der Reduktion des Silbersalzes.After this treatment, the object is ready for electrolysis.
^ The process offers the possibility of metallizing or galvanizing the object only in individual places. This can be desirable for a variety of reasons, both because of the beautiful appearance and because of the attachment of monograms or other decorations. The untreated areas , '·.] Are then not attacked by the bath / and do not receive a galvanic coating.
In an earlier process, the surface to be metallized is treated with a silver Γ fluoride solution, which is reduced by a gas flow. Here, too, the silicates are attacked by fluorine, but only as a result of the reduction of the silver salt. In <the method of the present invention: is inde- as to the decomposition of the silicates: dependent of the reduction of the silver salt.
Claims (1)
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE271403C true DE271403C (en) | 1900-01-01 |
Family
ID=528058
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DENDAT271403D Expired DE271403C (en) |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE271403C (en) |
-
0
- DE DENDAT271403D patent/DE271403C/de not_active Expired
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