DE1086510B - Process for the production of metal coatings by vacuum deposition - Google Patents
Process for the production of metal coatings by vacuum depositionInfo
- Publication number
- DE1086510B DE1086510B DEB44596A DEB0044596A DE1086510B DE 1086510 B DE1086510 B DE 1086510B DE B44596 A DEB44596 A DE B44596A DE B0044596 A DEB0044596 A DE B0044596A DE 1086510 B DE1086510 B DE 1086510B
- Authority
- DE
- Germany
- Prior art keywords
- metal
- intermediate layer
- production
- vapor deposition
- metal coatings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/027—Graded interfaces
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
Verfahren zur Herstellung von Metallüberzügen durch Vakuumbedampfen Die Erfindung bezieht sich auf ein Verfahren zur Herstellung von Metallüberzügen durch Vakuumbedampfen.Process for the production of metal coatings by vacuum evaporation The invention relates to a method for producing metal coatings by vacuum evaporation.
Es ist bekannt, daß dünne aufgedampfte Metallschichten auf glatten Unterlagen, z. B. auf Glas oder Kunststoffen, aber auch auf hochglanzpolierten Metallunterlagen, vielfach schlecht haften. Eine gewisse Verbesserung konnte durch Aufdampfen von Zwischenschichten erzielt werden, die ihrerseits wenigstens auf der Unterlage gut haften. Häufig genügt dann aber die Haftung des auf die Zwischenschicht aufzudampfenden Metalls noch nicht allen Ansprüchen.It is known that thin vapor-deposited metal layers on smooth Documents, e.g. B. on glass or plastics, but also on highly polished metal surfaces, often stick poorly. A certain improvement could be achieved by vapor deposition Interlayers are achieved, which in turn at least work well on the substrate be liable. Often, however, the adhesion of the material to be vapor deposited onto the intermediate layer is sufficient Metal does not yet meet all demands.
Eine wesentliche Verbesserung kann in dieser Hinsicht dadurch erreicht werden, daß gemäß der Erfindung zwischen dem Metallüberzug und der Zwischenschicht durch gleichzeitiges Aufdampfen des Überzugsmetalls und des Stoffes der Zwischenschicht eine Mischschicht aus diesen Komponenten aufgebracht wird.A substantial improvement can thereby be achieved in this respect that according to the invention between the metal coating and the intermediate layer by simultaneous vapor deposition of the coating metal and the substance of the intermediate layer a mixed layer of these components is applied.
Als auf der Unterlage gut haftende Zwischenschichtstoffe sind z. B. Chrom, Eisen, Quarz, Kupfer u. a. bekannt, während andererseits Metallschichten aus Aluminium oder Silber auf diesen Zwischenschichten nicht genügend haften. Erst wenn erfindungsgemäß verfahren wird, läßt sich auch hier eine gute Haftung der Metallschicht auf der Zwischenschicht erreichen.As interlayer materials that adhere well to the base, z. B. Chromium, iron, quartz, copper and others. known, while on the other hand metal layers made of aluminum or silver do not adhere sufficiently to these intermediate layers. First If the method according to the invention is followed, good adhesion of the metal layer can also be achieved here on the intermediate layer.
Das Aufdampfverfahren geht dabei beispielsweise folgendermaßen vor sich: Auf eine Glasplatte wird aus einem Tiegel zunächst Chrom als Haftstoff mit einer Schichtdicke von 50 bis 100 Angström im Vakuum aufgedampft. Während das Chrom noch verdampft, wird aus einem zweiten Tiegel zusätzlich Aluminium aufgedampft, und zwar so lange, bis eine: etwa 50 Angström starke Chrom-Aluminium-Mischschicht entstanden ist. Hierauf wird der Chromverdampfer abgestellt und nur noch Aluminium in der vorgesehenen Stärke aufgedampft. Auf diese Weise, die durch geeignete Steuerung der Heizung der Tiegel für das Chrom und das Aluminium zu bewerkstelligen ist, kann eine besonders gute Verankerung zwischen dem als Haftstoff verwendeten Chrom und dem zur Metallisierung verwendeten Aluminium erreicht werden.The vapor deposition process proceeds as follows, for example yourself: On a glass plate, a crucible is first converted into chromium as an adhesive a layer thickness of 50 to 100 Angstroms is evaporated in a vacuum. While the chrome still evaporated, aluminum is additionally evaporated from a second crucible, until a chromium-aluminum mixed layer approx. 50 Angstroms thick originated. The chrome evaporator is then switched off and only aluminum is left vaporized in the intended strength. In this way that through appropriate control the heating of the crucibles for the chrome and aluminum can be accomplished a particularly good anchorage between the chromium used as an adhesive and the aluminum used for metallization can be achieved.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEB44596A DE1086510B (en) | 1957-05-11 | 1957-05-11 | Process for the production of metal coatings by vacuum deposition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEB44596A DE1086510B (en) | 1957-05-11 | 1957-05-11 | Process for the production of metal coatings by vacuum deposition |
Publications (1)
Publication Number | Publication Date |
---|---|
DE1086510B true DE1086510B (en) | 1960-08-04 |
Family
ID=6967375
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DEB44596A Pending DE1086510B (en) | 1957-05-11 | 1957-05-11 | Process for the production of metal coatings by vacuum deposition |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE1086510B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2632549A1 (en) * | 1975-07-25 | 1977-02-10 | Rca Corp | COATING FOR INSULATING SUBSTRATES, IN PARTICULAR VIDEO DISCS |
US4650698A (en) * | 1983-08-19 | 1987-03-17 | Kabushiki Kaisha Toshiba | Method of forming a thin film of a metal or metal compound on a substrate |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH299720A (en) * | 1951-06-23 | 1954-06-30 | Alois Dr Vogt | Process for the production of surface layers of high electrical conductivity and great mechanical adhesive strength as well as surface layer produced by this process. |
-
1957
- 1957-05-11 DE DEB44596A patent/DE1086510B/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH299720A (en) * | 1951-06-23 | 1954-06-30 | Alois Dr Vogt | Process for the production of surface layers of high electrical conductivity and great mechanical adhesive strength as well as surface layer produced by this process. |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2632549A1 (en) * | 1975-07-25 | 1977-02-10 | Rca Corp | COATING FOR INSULATING SUBSTRATES, IN PARTICULAR VIDEO DISCS |
US4650698A (en) * | 1983-08-19 | 1987-03-17 | Kabushiki Kaisha Toshiba | Method of forming a thin film of a metal or metal compound on a substrate |
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