CN2539749Y - Evaporator for chemical vapour-phase deposition proplastid - Google Patents
Evaporator for chemical vapour-phase deposition proplastid Download PDFInfo
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- CN2539749Y CN2539749Y CN 02215556 CN02215556U CN2539749Y CN 2539749 Y CN2539749 Y CN 2539749Y CN 02215556 CN02215556 CN 02215556 CN 02215556 U CN02215556 U CN 02215556U CN 2539749 Y CN2539749 Y CN 2539749Y
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- carrier gas
- proplastid
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- heater
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- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
The utility model relates to an evaporator for chemical vapor-phase deposition proplastid, comprising a shell which has a cylinder type upper part and an inverted cone type lower part, a proplastid storage tank, a heater, a carrier gas bottle, a flow meter and a carrier gas heater. The outer wall of the shell is provided with a heating insulation layer controlled in sections; the upper part of the shell is equipped with a liquid input and a carrier gas input; the inner of the shell is provided with an atomization section, a vaporization section and a buffer section from top to bottom; an atomizer is installed in the atomization section; the vaporization section has a plurality of cross partition boards vertical to the longitudinal shaft of the shell, thereby forming an S-shaped channel; the proplastid storage tank is communicated with the atomizer via the heater; the carrier gas in the carrier gas bottle is put into the shell via the flow meter and the carrier gas heater; the bottom of the shell is provided with a vapor output which is communicated with a chemical vapor deposition device; the vaporization section and the place close to the vapor output are respectively equipped with a temperature control thermocouple. The evaporator has the characteristics of high efficiency, liquid quality protection and uniform vapor-liquid components, is suitable for the vaporization of the large flow, one-component and multi-component proplastids of the glass coating on float glass production lines.
Description
Technical field
The utility model relates to the vaporizer of chemical vapor deposition proplastid, in particular for the vaporizer of the proplastid in the online chemical vapor deposition process of float glass.
Background technology
Utilizing chemical vapor deposition process can on glass substrate, plate multiple metal and nonmetal and oxide compound, nitride and carbide thin film on the floatation glass production line, as: a-Si, SiO
2, SiC, Ti, TiO
2, TiN
3Cr
2O
3, Al
2O
3, SnO
2Deng.At the certain thickness SnO of deposition on glass
2-F or SnO
2-Sb film can prepare the heat insulating glass of infrared reflection and absorption, and deposition is with TiO
2For the film of main body can prepare the glass with self-cleaning function.The character of film depends on the atmosphere of the composition and the environment of proplastid.Providing the reaction mixing gas of stable components, homogeneous to chemical vapor deposition means is the prerequisite of preparation high quality functional membrane glass, thereby the vaporizer of reactant proplastid seems particularly important for chemical vapor deposition process.
Known that now it is gas that the proplastid that can be used for glass coating has only minority at normal temperatures, great majority are liquid and solid.These liquid and solid need be delivered to chemical vapor deposition means after the vaporization by vaporizer under certain temperature and pressure again.At present great majority are to adopt the vaporizer of bubbler as the chemical vapor deposition proplastid, and the vaporizer that adopts heat pipe or hot wall type is also arranged.
Bubbler is that a kind of liquid that will prepare vaporization places in the container of certain temperature (being lower than boiling point), feeds carrier gas quantitative, certain temperature, and in the gas-to-liquid contact process, carrier gas carries out a kind of vapourizing unit near saturated liquid vapour.For the vaporizing liquid of one-component, this is a kind of effective vapourizing unit.But for the multi-component liquid that mixes, because the vapour pressure difference of each component, the vaporization rate under same temperature is different.Thereby, the problem that the polycomponent mixing liquid adopts the bubbler vaporization can cause liquid phase and vapour phase composition to differ.In addition, some proplastid contacts oxygen containing carrier gas for a long time under higher temperature, and the tendency of slow decomposition is arranged, and makes proplastid rotten.And the vaporization efficiency of bubbler is lower, is unsuitable for the vaporization of big flow proplastid.There are the problems referred to above equally in heat pipe-type and hot wall type vaporizer.
Summary of the invention
The purpose of this utility model provides a kind of efficient, big flow, is suitable for the vaporizer of the chemical vapor deposition proplastid of single component and polycomponent mixing liquid vaporization.
The vaporizer of chemical vapor deposition proplastid of the present utility model comprises that top is round tube type, the bottom is the tapered housing of rounding, the proplastid storage tank, well heater, carrier gas bottle, under meter, the carrier gas well heater, the outer wall of housing has the heat tracing layer of subregion control, housing top is provided with liquid inlet and carrier gas input port, the range of atomization is arranged in the housing from top to bottom successively, vaporizing zone, buffer zone, spraying gun is installed in the range of atomization, vaporizing zone has some cross partitions of installing perpendicular to the housing longitudinal axis, form S type passage, proplastid storage tank heater via is communicated with spraying gun, the carrier gas of carrier gas bottle is through under meter, carrier gas well heater input housing, housing bottom has the gas outlet, it is connected with chemical vapor deposition means, is respectively equipped with temperature-control heat couple at vaporizing zone with near the gas exit.
During work, the mixing liquid in the proplastid storage tank injects spraying gun by heater heats after metering to design temperature, liquid mist is changed into the drop of 5～30 μ m through spraying gun.Carrier gas in the carrier gas bottle is injected in the vaporizer to the design temperature and at range of atomization formation cyclone through under meter metering and carrier gas heater heats.Be located at the heat tracing layer of the subregion control of vaporizer outer wall, provide heat energy, to quicken the vaporization of droplet to the range of atomization.Fluid through the range of atomization, vaporizing zone, buffer zone be to outlet, sends into chemical vapor deposition means, the temperature of outlet area is higher than 10～15 ℃ of vaporizing zones.The vaporizing zone dividing plate prolongs the fluidic path on the one hand, and it is again a scatterer on the other hand, and residual droplet is vaporized fully.
The vaporizer of chemical vapor deposition proplastid of the present utility model utilizes spraying gun to atomize at a high speed to the mixing liquid through heating, has the effect and the characteristics of forced vaporization, has avoided the problem that each component can not be vaporized synchronously in the polycomponent mixing liquid.The heating of liquid heater via short period of time is also once passed through, and has avoided bubbler to repeat for a long time to heat and has made the rotten disadvantage of proplastid.The liquid vaporizer that reinjects after being heated to design temperature has also alleviated the thermal load of vaporizer, has therefore improved the working efficiency of vaporizer greatly.Can be used for the (〉=1000g/min) vaporization of proplastid of big flow.
Description of drawings
Accompanying drawing is a structural representation of the present utility model.
Embodiment
With reference to accompanying drawing, the vaporizer of the chemical vapor deposition proplastid of invention comprises that top is round tube type, the bottom is the tapered housing of rounding 11, proplastid storage tank 7, well heater 6, carrier gas bottle 1, under meter 2, carrier gas well heater 3, the outer wall of housing 11 has the heat tracing layer 12 of subregion control, can adopt electricity or oil heating, housing top is provided with liquid inlet and carrier gas input port, generally establish 2～4 carrier gas input port, supply nitrogen respectively, argon gas, the input of gas with various such as air, for making input gas form cyclone, usually, carrier gas input port and inner walls are oriented in a tangential direction.Range of atomization 8, vaporizing zone 9, buffer zone 13 are arranged in the housing from top to bottom successively, spraying gun 5 is installed in the range of atomization, vaporizing zone 9 has some cross partitions 10 of installing perpendicular to the housing longitudinal axis, form S type passage, the output channel heater via 6 of proplastid storage tank 7 enters housing from liquid inlet, be communicated with spraying gun 5, the carrier gas of carrier gas bottle is through under meter 2, carrier gas well heater 3 input housings 11, housing bottom has gas outlet 15, it is connected with chemical vapor deposition means 16, is respectively equipped with temperature- control heat couple 4,14 at vaporizing zone with near the gas exit.
Claims (3)
1. the vaporizer of chemical vapor deposition proplastid, it is characterized in that it comprises that top is round tube type, the bottom is the tapered housing of rounding [11], proplastid storage tank [7], well heater [6], carrier gas bottle [1], under meter [2], carrier gas well heater [3], the outer wall of housing [11] has the heat tracing layer [12] of subregion control, housing top is provided with liquid inlet and carrier gas input port, range of atomization [8] is arranged in the housing from top to bottom successively, vaporizing zone [9], buffer zone [13], spraying gun [5] is installed in the range of atomization, vaporizing zone [9] has some cross partitions [10] of installing perpendicular to the housing longitudinal axis, form S type passage, proplastid storage tank [7] heater via [6] is communicated with spraying gun [5], the carrier gas of carrier gas bottle is through under meter [2], carrier gas well heater [3] input housing [11], housing bottom has gas outlet [15], it is connected with chemical vapor deposition means [16], is respectively equipped with temperature-control heat couple [4] at vaporizing zone with near the gas exit, [14].
2. by the described vaporizer of claim 1, it is characterized in that carrier gas input port and housing [11] inwall is oriented in a tangential direction.
3. by the described vaporizer of claim 1, it is characterized in that said heat tracing layer [12] adopts electricity or oil heating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02215556 CN2539749Y (en) | 2002-02-01 | 2002-02-01 | Evaporator for chemical vapour-phase deposition proplastid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02215556 CN2539749Y (en) | 2002-02-01 | 2002-02-01 | Evaporator for chemical vapour-phase deposition proplastid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2539749Y true CN2539749Y (en) | 2003-03-12 |
Family
ID=33694671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 02215556 Expired - Lifetime CN2539749Y (en) | 2002-02-01 | 2002-02-01 | Evaporator for chemical vapour-phase deposition proplastid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2539749Y (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101066051B (en) * | 2007-06-06 | 2012-07-04 | 广州进出口商品检验技术研究所 | Bromomethane vaporizer |
| CN101998981B (en) * | 2008-04-11 | 2015-03-25 | Sika技术股份公司 | Method for applying an adhesive compound to a substrate |
| CN104803597A (en) * | 2015-04-20 | 2015-07-29 | 通鼎互联信息股份有限公司 | Feeding system for optical fiber preform production |
| CN107917822A (en) * | 2016-10-09 | 2018-04-17 | 李进 | The device and method for sampling and gasifying for more boiling point mixed liquors |
| CN108369911A (en) * | 2015-12-18 | 2018-08-03 | 株式会社日立国际电气 | The manufacturing method of retention device, gasifier, substrate board treatment and semiconductor device |
| CN110643975A (en) * | 2018-06-27 | 2020-01-03 | 东北大学 | Evaporation and transportation device for metal organic chemical source liquid |
| CN110965046A (en) * | 2019-12-31 | 2020-04-07 | 威海中玻新材料技术研发有限公司 | Ultra-thin liquid film rotary separating type vaporizing device |
| CN112495691A (en) * | 2020-10-27 | 2021-03-16 | 南京科赫科技有限公司 | Material deep coating device for gas purification |
| CN113789499A (en) * | 2021-10-15 | 2021-12-14 | 浙江生波智能装备有限公司 | Atomizing heating device for vacuum coating |
| CN113913787A (en) * | 2021-10-15 | 2022-01-11 | 浙江生波智能装备有限公司 | Novel film preparation process and vacuum coating equipment |
| CN113969397A (en) * | 2021-10-15 | 2022-01-25 | 浙江生波智能装备有限公司 | Coating control method of novel vacuum coating equipment |
| CN115613005A (en) * | 2021-07-16 | 2023-01-17 | 长鑫存储技术有限公司 | Atomization device and thin film deposition system |
| CN116083882A (en) * | 2023-02-07 | 2023-05-09 | 深圳奥拦科技有限责任公司 | Atomizer and PECVD coating device |
-
2002
- 2002-02-01 CN CN 02215556 patent/CN2539749Y/en not_active Expired - Lifetime
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101066051B (en) * | 2007-06-06 | 2012-07-04 | 广州进出口商品检验技术研究所 | Bromomethane vaporizer |
| CN101998981B (en) * | 2008-04-11 | 2015-03-25 | Sika技术股份公司 | Method for applying an adhesive compound to a substrate |
| CN104803597A (en) * | 2015-04-20 | 2015-07-29 | 通鼎互联信息股份有限公司 | Feeding system for optical fiber preform production |
| CN108369911A (en) * | 2015-12-18 | 2018-08-03 | 株式会社日立国际电气 | The manufacturing method of retention device, gasifier, substrate board treatment and semiconductor device |
| CN108369911B (en) * | 2015-12-18 | 2022-06-17 | 株式会社国际电气 | Storage device, vaporizer, substrate processing apparatus, and method for manufacturing semiconductor device |
| CN107917822A (en) * | 2016-10-09 | 2018-04-17 | 李进 | The device and method for sampling and gasifying for more boiling point mixed liquors |
| CN107917822B (en) * | 2016-10-09 | 2024-05-07 | 李进 | Device and method for sampling and gasifying multi-boiling mixed liquor |
| CN110643975B (en) * | 2018-06-27 | 2021-09-28 | 东北大学 | Evaporation and transportation device for metal organic chemical source liquid |
| CN110643975A (en) * | 2018-06-27 | 2020-01-03 | 东北大学 | Evaporation and transportation device for metal organic chemical source liquid |
| CN110965046A (en) * | 2019-12-31 | 2020-04-07 | 威海中玻新材料技术研发有限公司 | Ultra-thin liquid film rotary separating type vaporizing device |
| CN110965046B (en) * | 2019-12-31 | 2024-05-28 | 威海中玻新材料技术研发有限公司 | Ultra-thin liquid film rotary-off type vaporizing device |
| CN112495691A (en) * | 2020-10-27 | 2021-03-16 | 南京科赫科技有限公司 | Material deep coating device for gas purification |
| CN112495691B (en) * | 2020-10-27 | 2022-04-12 | 南京科赫科技有限公司 | Filter bag depth coating device for flue gas purification |
| CN115613005A (en) * | 2021-07-16 | 2023-01-17 | 长鑫存储技术有限公司 | Atomization device and thin film deposition system |
| CN113789499A (en) * | 2021-10-15 | 2021-12-14 | 浙江生波智能装备有限公司 | Atomizing heating device for vacuum coating |
| CN113913787A (en) * | 2021-10-15 | 2022-01-11 | 浙江生波智能装备有限公司 | Novel film preparation process and vacuum coating equipment |
| CN113969397A (en) * | 2021-10-15 | 2022-01-25 | 浙江生波智能装备有限公司 | Coating control method of novel vacuum coating equipment |
| CN116083882A (en) * | 2023-02-07 | 2023-05-09 | 深圳奥拦科技有限责任公司 | Atomizer and PECVD coating device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C56 | Change in the name or address of the patentee |
Owner name: CHEN HUA; HAN GAORONG; WENG WENJIAN; DU PIYI; ZHAO Free format text: FORMER NAME OR ADDRESS: CHEN HUA; HAN GAORONG; WENG WENJIAN; DU PIYI |
|
| CP01 | Change in the name or title of a patent holder |
Patentee after: Chen Hua Patentee after: Han Gaorong Patentee after: Weng Wenjian Patentee after: Du Piyi Patentee after: Zhao Nianwei Patentee before: Chen Hua Patentee before: Han Gaorong Patentee before: Weng Wenjian Patentee before: Du Piyi |
|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP03 | Change of name, title or address |
Address after: Zhejiang city of Hangzhou province Xihu District GUCUI Road No. 8 new technology building seven floor, zip code: 310012 Patentee after: Hangzhou Bluestar New Material Technical Co., Ltd. Address before: Building 6, building 119, Wensanlu Road, Hangzhou, Zhejiang, Xihu District: 310013 Patentee before: Lanxing New Material Technology Co., Ltd., Zhejiang Univ. |
|
| C56 | Change in the name or address of the patentee |
Owner name: HANGZHOU LANXING NEW MATERIALS TECHNOLOGY CO., LTD Free format text: FORMER NAME: LANXING NEW MATERIAL TECHNOLOGY CO., LTD., ZHEJIANG UNIV. |
|
| C17 | Cessation of patent right | ||
| CX01 | Expiry of patent term |
Expiration termination date: 20120201 Granted publication date: 20030312 |