CN217883934U - ECR negative hydrogen ion source - Google Patents
ECR negative hydrogen ion source Download PDFInfo
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- CN217883934U CN217883934U CN202221703673.XU CN202221703673U CN217883934U CN 217883934 U CN217883934 U CN 217883934U CN 202221703673 U CN202221703673 U CN 202221703673U CN 217883934 U CN217883934 U CN 217883934U
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- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 title claims abstract description 13
- 150000002500 ions Chemical class 0.000 abstract description 18
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 14
- 239000001257 hydrogen Substances 0.000 abstract description 14
- -1 hydrogen ions Chemical class 0.000 abstract description 12
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 238000010884 ion-beam technique Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 229910052805 deuterium Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
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Abstract
Description
技术领域technical field
本发明涉及一种ECR源，尤指一种ECR负氢离子源。The invention relates to an ECR source, in particular to an ECR negative hydrogen ion source.
背景技术Background technique
电子回旋共振离子源(ECR-ElectronCyclotronResonance)是微波源，一般分为高电荷态高频ECR源和单电荷态强流2.45GHzECR源。中、高电荷态的产生通过高能电子与粒子的非弹性碰撞获得，电子在绕磁力线回旋运动时从微波场中获得能量。因此，为获得高能电子，高电荷态ECR离子源需要一个很强的约束磁场和很高的微波频率。2.45GHzECR离子源主要用来产生单电荷态强流正负离子束，它使用2.45GHz的微波加上不大于0.1T的磁场就可以产生超高密度的等离子体。目前2.45GHzECR离子源广泛用于产生强流高功率质子束或氘离子束，上述两种离子束都是正离子束。Electron cyclotron resonance ion source (ECR-ElectronCyclotronResonance) is a microwave source, generally divided into high-charge state high-frequency ECR source and single-charge state high-current 2.45GHz ECR source. The production of medium and high charge states is obtained through the inelastic collision between high-energy electrons and particles, and the electrons obtain energy from the microwave field when they orbit around the magnetic field lines. Therefore, in order to obtain high-energy electrons, a high-charge state ECR ion source requires a strong confinement magnetic field and a high microwave frequency. The 2.45GHz ECR ion source is mainly used to generate strong positive and negative ion beams in a single charge state. It uses 2.45GHz microwaves and a magnetic field not greater than 0.1T to generate ultra-high-density plasma. At present, 2.45GHz ECR ion sources are widely used to generate high-current and high-power proton beams or deuterium ion beams, both of which are positive ion beams.
由于2.45GHzECR离子源具有体积小、结构简单、维护便利、造价也相对低廉等优点。尽管ECR离子源有以上诸多优点，但因为无法控制等离子体电子温度，难以获得较高的负氢产额，所以实际中只是被广泛用于质子源，为此发明一种可以控制等离子体电子温度，提高负氢产额的ECR负氢离子源。The 2.45GHz ECR ion source has the advantages of small size, simple structure, convenient maintenance, and relatively low cost. Although the ECR ion source has many advantages above, it is difficult to obtain a high negative hydrogen yield because it cannot control the plasma electron temperature, so it is only widely used in the proton source in practice. , an ECR negative hydrogen ion source that increases negative hydrogen production.
发明内容Contents of the invention
针对所述在现实中难以实现引出量大的ECR负氢离子的问题，旨在提供一种通过利用磁场对带电粒子进行约束的一种ECR负氢离子源。本发明所采用的技术方案是：一种ECR负氢离子源，在离子源的放电室外周设置电磁铁，用扫描电源给电磁铁供电。Aiming at the problem that it is difficult to extract a large amount of ECR negative hydrogen ions in reality, it is intended to provide a source of ECR negative hydrogen ions that confines charged particles by using a magnetic field. The technical scheme adopted in the present invention is: an ECR negative hydrogen ion source, an electromagnet is arranged around a discharge chamber of the ion source, and a scanning power supply is used to supply power to the electromagnet.
所述的电磁铁为交变电磁铁，提供变化的磁场。The electromagnet is an alternating electromagnet, which provides a changing magnetic field.
本发明所达到的有益效果是：本发明通过简单的结构设计，就能解决目前技术上难以解决的问题，即通过利用扫描电源给电磁铁供电，通过控制电源输出电流的扫描幅度和频率，实现对等离子体电子温度控制，而合适的电子温度下，能够增大负氢离子的碰撞截面，即促进电荷交换，产生更多的负氢离子，实现了高产额的ECR负氢离子源。The beneficial effects achieved by the present invention are: the present invention can solve the difficult problems in the current technology through simple structural design, that is, by using the scanning power supply to supply power to the electromagnet, and by controlling the scanning amplitude and frequency of the output current of the power supply, realizing The plasma electron temperature is controlled, and at an appropriate electron temperature, the collision cross section of negative hydrogen ions can be increased, that is, charge exchange can be promoted, more negative hydrogen ions can be generated, and a high-yield ECR negative hydrogen ion source can be realized.
附图说明Description of drawings
图1是本发明中ECR负氢离子源的结构示意图。Fig. 1 is the structural representation of ECR negative hydrogen ion source in the present invention.
图2是本发明中扫描电源给电磁铁供电后电磁铁产生的磁场强度波形图。Fig. 2 is a waveform diagram of the magnetic field strength generated by the electromagnet after the scanning power supply supplies power to the electromagnet in the present invention.
附图标注说明：1-电磁铁，2-放电室。Description of drawings: 1-electromagnet, 2-discharge chamber.
具体实施方式Detailed ways
以下通过具体实施例来详细说明本发明的具体实施方式：The specific embodiment of the present invention is described in detail below by specific examples:
如图1-2所示，在离子源的放电室2外周增加设置的电磁铁1以提供磁场，并利用扫描电源给电磁铁供电，并通过控制电源输出电流的扫描幅度和频率，实现电磁铁的电流控制，从而控制放电室内的磁场，实现对等离子体电子温度控制，从而增大负氢离子的碰撞截面，提高负氢离子的产额。As shown in Figure 1-2, an electromagnet 1 is added to the periphery of the discharge chamber 2 of the ion source to provide a magnetic field, and the electromagnet is powered by a scanning power supply, and the electromagnet is realized by controlling the scanning amplitude and frequency of the output current of the power supply. Current control, so as to control the magnetic field in the discharge chamber, realize the temperature control of plasma electrons, thereby increasing the collision cross section of negative hydrogen ions and increasing the output of negative hydrogen ions.
一台离子源的性能根本上是由电离室(放电室)内等离子体的性质决定的，而等离子体的性质与下列因素密切相关：周围的磁场和电场分布；放电室表面状况及伴随所发生的相关效应；放电室内工作气压等；同时离子的产生和消亡是一对紧密联系的过程，在离子源中，总是设法加强电离，产生更多的离子和电子，同时尽可能地避免离子的损失，设法提高离子的寿命，离子损失和消亡的基本过程是荷交交换、复合、扩扩散损失。本发明通过在放电室2外部设置变化的磁场，并利用扫描电源给电磁铁1供电，根据电子回旋频率公式ωce＝eB/m所示，其中B是磁场强度，m是电子质量，e是电子所带电荷，得知在变化的磁场下，电子回旋共振频率是变化的，这就使电子的回旋共振频率和电场频率可以不一直重合，通过上述控制离子体电子温度。更具体的是，本发明中的ECR负氢离子源，电子回旋共振所需的轴向磁场由电磁铁1提供，电磁铁1由扫描电源供电，由于产生的是变化磁场，通过控制电源输出电流的扫描幅度和频率，实现了对等离子体电子温度的控制，而合适的等离子体的电子温度，能够增大负氢离子的碰撞截面，促进电荷交换，从而提高放电室2内的负氢离子的产额。The performance of an ion source is fundamentally determined by the properties of the plasma in the ionization chamber (discharge chamber), and the properties of the plasma are closely related to the following factors: the surrounding magnetic field and electric field distribution; the surface conditions of the discharge chamber and the accompanying events The related effects; the working pressure in the discharge chamber, etc.; at the same time, the generation and extinction of ions is a pair of closely related processes. In the ion source, always try to strengthen the ionization, generate more ions and electrons, and at the same time avoid the ionization as much as possible. Loss, trying to improve the life of ions, the basic process of ion loss and demise is charge exchange, recombination, diffusion loss. The present invention sets the changing magnetic field outside the discharge chamber 2, and utilizes the scanning power supply to supply power to the electromagnet 1, according to the electronic cyclotron frequency formula ω ce =eB/m, wherein B is the magnetic field strength, m is the electron mass, and e is It is known that the electron cyclotron resonance frequency changes under the changing magnetic field, which makes the electron cyclotron resonance frequency and the electric field frequency not always overlap, and the electron temperature of the ion is controlled by the above. More specifically, in the ECR negative hydrogen ion source in the present invention, the axial magnetic field required for electron cyclotron resonance is provided by the electromagnet 1, and the electromagnet 1 is powered by a scanning power supply. The scanning amplitude and frequency realize the control of the plasma electron temperature, and the appropriate plasma electron temperature can increase the collision cross section of the negative hydrogen ions, promote the charge exchange, thereby increasing the negative hydrogen ion in the discharge chamber 2. yield.
综上所述，本发明的技术方案，通过利用扫描电源给电磁铁供电，通过控制电源输出电流的扫描幅度和频率，实现对等离子体电子温度控制，而合适的电子温度下，能够增大负氢离子的碰撞截面，即促进电荷交换，产生更多的负氢离子，间接上弱化了复合和扩散过程导致离子源消亡的影响，克服了实际生产中，常规的ECR离子源中，只能产生少量的负氢离子，实现了高产额的ECR负氢离子源。In summary, the technical solution of the present invention realizes temperature control of plasma electrons by using a scanning power supply to supply power to the electromagnet, and by controlling the scanning amplitude and frequency of the output current of the power supply. The collision cross section of hydrogen ions, which promotes charge exchange and produces more negative hydrogen ions, indirectly weakens the influence of recombination and diffusion processes leading to the demise of ion sources, overcoming the fact that in actual production, conventional ECR ion sources can only produce A small amount of negative hydrogen ions realizes a high-yield ECR negative hydrogen ion source.
以上所述仅为本发明的优选实施例而已，并不用于限制本发明，尽管参照前述实施例对本发明进行了详细的说明，对于本领域的技术人员来说，其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换。凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still understand the foregoing embodiments The recorded technical solutions are modified, or some of the technical features are equivalently replaced. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included within the protection scope of the present invention.
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| CN115831705A (en) * | 2022-07-01 | 2023-03-21 | 散裂中子源科学中心 | ECR negative hydrogen ion source capable of controlling plasma electron temperature |
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| CN115831705A (en) * | 2022-07-01 | 2023-03-21 | 散裂中子源科学中心 | ECR negative hydrogen ion source capable of controlling plasma electron temperature |
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