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CN217425935U - Processing box and chip bracket installed on same - Google Patents

Processing box and chip bracket installed on same Download PDF

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Publication number
CN217425935U
CN217425935U CN202220645758.0U CN202220645758U CN217425935U CN 217425935 U CN217425935 U CN 217425935U CN 202220645758 U CN202220645758 U CN 202220645758U CN 217425935 U CN217425935 U CN 217425935U
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electrical contact
process cartridge
frame
contact portion
storage portion
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曾丽坤
武新宇
王常彪
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Ninestar Corp
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Ninestar Corp
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Abstract

The utility model discloses a handle box and install the chip support on handling the box, wherein, handle box detachably and install in imaging device, include: a frame having a first wall surface; a photosensitive member rotatably supported by the frame; an electrical contact part mounted to the frame and electrically connected to the image forming apparatus; a storage portion electrically connected to the electrical contact portion and configured to store information related to the process cartridge; the storage part is positioned on one side of the electric contact part facing the processing box; a projection size of the storage portion is smaller than a projection size of the electrical contact portion as viewed in a normal direction of the first wall surface; and/or, in the axial direction of the photosensitive member, the projection of the storage portion is located between the projection ranges of the electrical contact portions. The utility model discloses a processing box can protect storage portion well, can avoid leading to the condition that storage portion damaged because of the collision between external component and the storage portion.

Description

一种处理盒及安装在处理盒上的芯片支架A processing box and a chip support mounted on the processing box

技术领域technical field

本实用新型涉及成像设备技术领域,尤其涉及一种处理盒及安装在处理盒上的芯片支架。The utility model relates to the technical field of imaging equipment, in particular to a processing box and a chip support mounted on the processing box.

背景技术Background technique

在电子照相类型的成像设备中,已知如下构造,在所述构造中感光构件和可作用在感光构件上的处理构件一体地组装成单元作为处理盒,并且处理盒可安装在成像设备中并可从所述成像设备拆卸。通过这种构造,可以由用户自己在调色剂用完的情况下或在处理构件损坏的情况下进行维护操作,并且因此可以显著改善维护性能。In electrophotographic type image forming apparatuses, there is known a configuration in which a photosensitive member and a process member that can act on the photosensitive member are integrally assembled as a unit as a process cartridge, and the process cartridge can be installed in the image forming apparatus and Detachable from the image forming apparatus. With this configuration, the maintenance operation can be performed by the user himself in the case of running out of toner or in the case of damage to the processing member, and thus the maintenance performance can be remarkably improved.

此外,近年来,还实现了如下构造,在所述构造中用于存储与处理盒相关的信息(例如服务信息和处理信息等各种信息)的存储部分安装在处理盒上。在该构造中,在设置在成像设备的设备主组件侧上的电接触部分与设置在处理盒侧上并且电连接到存储部分的电接触部分之间形成电连接。随后,在成像设备的设备主组件与处理盒的存储部分之间进行电气通信,并且使用存储在存储部分中的信息,使得可以进一步改善图像质量和维护性能。In addition, in recent years, a configuration has also been realized in which a storage section for storing information related to the process cartridge (for example, various information such as service information and processing information) is mounted on the process cartridge. In this configuration, electrical connection is formed between the electrical contact portion provided on the apparatus main assembly side of the image forming apparatus and the electrical contact portion provided on the process cartridge side and electrically connected to the storage portion. Then, electrical communication is performed between the apparatus main assembly of the image forming apparatus and the storage portion of the process cartridge, and the information stored in the storage portion is used, so that image quality and maintenance performance can be further improved.

此外,在日本特开申请(JP-A)2004-37876中公开的处理盒中,电接触部分和存储部分彼此齐平,并且提供在处理盒的安装方向上突出的突起部。通过这种构造,在处理盒掉落等期间,接触构件在存储部分之前接触外部构件,并且因此避免由于外部构件与存储部分之间的碰撞而导致的存储部分的破损。然而,在JP-A 2004-37876中公开的构造中,存储部分和电接触部分设置在相同平面上,并且因此布置的自由度低,也不能满足安装或拆卸方便的需求。Furthermore, in the process cartridge disclosed in Japanese Laid-Open Application (JP-A) 2004-37876, the electrical contact portion and the storage portion are flush with each other, and protrusions protruding in the mounting direction of the process cartridge are provided. With this configuration, during a process cartridge drop or the like, the contact member contacts the external member before the storage portion, and thus breakage of the storage portion due to collision between the external member and the storage portion is avoided. However, in the configuration disclosed in JP-A 2004-37876, the storage portion and the electrical contact portion are provided on the same plane, and thus the degree of freedom of arrangement is low, and the demand for ease of installation or removal cannot be satisfied.

实用新型内容Utility model content

根据本实用新型的一个方面,提供了一种处理盒,可拆卸地安装于成像设备,包括:框架,具有第一壁表面;由框架可旋转地支撑的感光构件;电接触部,安装于所述框架并用于与所述成像设备电连接;存储部,与所述电接触部电连接并且构造成存储与所述处理盒相关的信息;所述存储部位于所述电接触部朝向所述处理盒的一侧;沿所述第一壁表面的法向方向观察,所述存储部的投影尺寸小于所述电接触部的投影尺寸;和/或,在所述感光构件的轴向方向上,所述存储部的投影位于所述电接触部的投影范围之间。According to one aspect of the present invention, there is provided a process cartridge detachably mounted on an image forming apparatus, comprising: a frame having a first wall surface; a photosensitive member rotatably supported by the frame; and an electrical contact portion mounted on the the frame and used for electrical connection with the image forming apparatus; a storage portion electrically connected to the electrical contact portion and configured to store information related to the process cartridge; the storage portion located on the electrical contact portion facing the process one side of the box; viewed along the normal direction of the first wall surface, the projected size of the storage portion is smaller than the projected size of the electrical contact portion; and/or, in the axial direction of the photosensitive member, The projection of the storage portion is located between the projection ranges of the electrical contact portion.

在一些实施方式中,沿所述第一壁表面的法向方向观察,在所述感光构件的轴向方向上,所述电接触部的投影范围是3.5mm-5.5mm。In some embodiments, viewed along the normal direction of the first wall surface, in the axial direction of the photosensitive member, the projected range of the electrical contact portion is 3.5mm-5.5mm.

在一些实施方式中,所述框架包括显影框架和感光框架;所述电接触部和存储部共同设置在显影框架或感光框架上。In some embodiments, the frame includes a developing frame and a photosensitive frame; the electrical contact portion and the storage portion are jointly disposed on the developing frame or the photosensitive frame.

在一些实施方式中,所述存储部位于所述感光框架和显影框架之间的间隙的范围之外。In some embodiments, the storage portion is located outside the confines of the gap between the photosensitive frame and the developing frame.

在一些实施方式中,在沿所述第一壁表面的法向方向上,所述电接触部位于所述第一壁表面的外侧。In some embodiments, the electrical contacts are located outside the first wall surface in a direction normal to the first wall surface.

在一些实施方式中,所述电接触部平行于所述第一壁表面。In some embodiments, the electrical contact is parallel to the first wall surface.

在一些实施方式中,所述电接触部与所述存储部通过柔性导电介质电连接。In some embodiments, the electrical contact portion and the storage portion are electrically connected through a flexible conductive medium.

在一些实施方式中,所述显影框架或感光框架包括端盖,所述电接触部和存储部安装于所述端盖。In some embodiments, the developing frame or photosensitive frame includes an end cap to which the electrical contacts and storage are mounted.

根据本实用新型的另一方面,提供一种安装在处理盒上的芯片支架,所述芯片支架用于将所述电接触部与所述存储部安装固定在处理盒上,所述处理盒如上述任一项所述。According to another aspect of the present invention, a chip holder mounted on a process cartridge is provided, and the chip holder is used to install and fix the electrical contact portion and the storage portion on the process cartridge, the process cartridge being such as any of the above.

在一些实施方式中,所述芯片支架可以与框架分体设置也可以一体成型。In some embodiments, the chip holder can be separately provided with the frame or can be integrally formed.

本实用新型的有益效果:本实用新型的处理盒可以将存储部很好地保护起来,可以避免由于外部构件与存储部之间的碰撞而导致存储部损坏的情况。The beneficial effects of the present invention: the process cartridge of the present invention can protect the storage part well, and can avoid the damage of the storage part due to the collision between the external components and the storage part.

附图说明Description of drawings

图1为本实用新型实施例一的处理盒的整体结构图;1 is an overall structural diagram of a process cartridge according to Embodiment 1 of the present invention;

图2为本实用新型实施例一的处理盒的剖视图;2 is a cross-sectional view of the process cartridge according to the first embodiment of the present invention;

图3为本实用新型实施例一的处理盒的另一角度的整体结构图;FIG. 3 is an overall structural diagram of the process cartridge according to the first embodiment of the present invention from another angle;

图4为图3中A处放大示意图;Fig. 4 is the enlarged schematic diagram at A place in Fig. 3;

图5为本实用新型实施例一的处理盒的芯片的结构示意图;5 is a schematic structural diagram of a chip of the process cartridge according to the first embodiment of the present invention;

图6为本实用新型实施例一的处理盒从Z方向观察的示意图;6 is a schematic view of the process cartridge according to the first embodiment of the present invention viewed from the Z direction;

图7为图6中B处放大示意图;Fig. 7 is the enlarged schematic diagram at B in Fig. 6;

图8为本实用新型实施例一的处理盒的芯片从Z方向观察的示意图;8 is a schematic diagram of the chip of the process cartridge according to the first embodiment of the present invention viewed from the Z direction;

图9为本实用新型实施例一的处理盒的芯片支架的结构图;9 is a structural diagram of a chip holder of the process cartridge according to the first embodiment of the present invention;

图10为本实用新型实施例一的处理盒的芯片和芯片支架安装示意图;10 is a schematic diagram of the installation of a chip and a chip support of the process cartridge according to the first embodiment of the present invention;

图11为本实用新型实施例一的处理盒的局部分解图;11 is a partial exploded view of the process cartridge according to the first embodiment of the present invention;

图12为本实用新型实施例一的处理盒的芯片位置的剖视图;12 is a cross-sectional view of the chip position of the process cartridge according to the first embodiment of the present invention;

图13为本实用新型实施例二的处理盒的整体结构图;13 is an overall structural diagram of the process cartridge according to the second embodiment of the present invention;

图14为图11中C处放大示意图;Fig. 14 is the enlarged schematic diagram at C in Fig. 11;

图15为本实用新型实施例二的处理盒的芯片的结构示意图;15 is a schematic structural diagram of a chip of the process cartridge according to the second embodiment of the present invention;

图16为本实用新型实施例二的处理盒从Z方向观察的局部示意图;16 is a partial schematic view of the process cartridge according to the second embodiment of the present invention viewed from the Z direction;

图17为图16中D处放大示意图;Fig. 17 is the enlarged schematic diagram at D in Fig. 16;

图18为本实用新型实施例二的处理盒的芯片从Z方向观察的示意图;18 is a schematic diagram of the chip of the process cartridge according to the second embodiment of the present invention viewed from the Z direction;

图19为本实用新型实施例二的处理盒的芯片支架一角度的结构示意图;19 is a schematic structural diagram of an angle of a chip support of the process cartridge according to the second embodiment of the present invention;

图20为本实用新型实施例二的处理盒的的芯片支架另一角度的结构示意图;20 is a schematic structural diagram of another angle of the chip holder of the process cartridge according to the second embodiment of the present invention;

图21为本实用新型实施例二的处理盒的芯片和芯片支架安装示意图;21 is a schematic diagram of the installation of a chip and a chip support of the process cartridge according to the second embodiment of the present invention;

图22为本实用新型实施例二的处理盒的局部分解图;22 is a partial exploded view of the process cartridge according to the second embodiment of the present invention;

图23为本实用新型实施例三的处理盒一角度的整体结构示意图;23 is a schematic diagram of the overall structure of the process cartridge according to the third embodiment of the present invention from one angle;

图24为本实用新型实施例三的处理盒另一角度的整体结构示意图;24 is a schematic diagram of the overall structure of another angle of the process cartridge according to the third embodiment of the present invention;

图25为图24中E处放大示意图;Figure 25 is an enlarged schematic view at E in Figure 24;

图26为本实用新型实施例三的处理盒的芯片的结构示意图;26 is a schematic structural diagram of a chip of the process cartridge according to the third embodiment of the present invention;

图27为本实用新型实施例三的处理盒的从Z方向观察的局部示意图;27 is a partial schematic view of the process cartridge according to the third embodiment of the present invention, viewed from the Z direction;

图28为图27中F处放大示意图;Figure 28 is an enlarged schematic diagram at F in Figure 27;

图29为本实用新型实施例三的处理盒的芯片支架的结构示意图;29 is a schematic structural diagram of a chip holder of a process cartridge according to Embodiment 3 of the present invention;

图30为本实用新型实施例三的处理盒的局部分解图;30 is a partial exploded view of the process cartridge according to the third embodiment of the present invention;

图31为本实用新型实施例四的处理盒的整体结构示意图;31 is a schematic diagram of the overall structure of the process cartridge according to the fourth embodiment of the present invention;

图32为本实用新型实施例四的处理盒的从Z方向观察的局部示意图;32 is a partial schematic view of the process cartridge according to the fourth embodiment of the present invention, viewed from the Z direction;

图33为图32中G处放大示意图;Figure 33 is an enlarged schematic diagram at G in Figure 32;

图34为本实用新型实施例四的处理盒的芯片的结构示意图;34 is a schematic structural diagram of a chip of the process cartridge according to the fourth embodiment of the present invention;

图35为本实用新型实施例四的处理盒的芯片从Z方向观察的示意图;35 is a schematic diagram of the chip of the process cartridge according to the fourth embodiment of the present invention viewed from the Z direction;

图36为本实用新型实施例四的处理盒的端盖与芯片安装示意图。FIG. 36 is a schematic diagram of the installation of the end cover and the chip of the process cartridge according to the fourth embodiment of the present invention.

具体实施方式Detailed ways

下面结合附图对本实用新型作进一步详细的说明,显然,所描述的实施例是本实用新型一部分实施例,而不是全部的实施例。基于本实用新型中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本实用新型保护的范围。The present utility model will be described in further detail below with reference to the accompanying drawings. Obviously, the described embodiments are a part of the embodiments of the present utility model, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of the present invention.

需要说明的是,术语“第一”、“第二”等仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本实用新型的描述中,“多个”的含义是至少两个,例如两个,三个等,除非另有明确具体的限定。It should be noted that the terms "first", "second", etc. are only used for descriptive purposes, and should not be understood as indicating or implying relative importance or implying the number of indicated technical features. Thus, a feature delimited with "first", "second" may expressly or implicitly include at least one of that feature. In the description of the present invention, "plurality" means at least two, such as two, three, etc., unless otherwise expressly and specifically defined.

在本实用新型中,除非另有明确的规定和限定,术语“安装”、“连接”、“固定”等术语应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或成一体;可以是机械连接,也可以是电连接或彼此可通讯;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系,除非另有明确的限定。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本实用新型中的具体含义。In the present utility model, unless otherwise expressly specified and limited, the terms "installation", "connection", "fixation" and other terms should be understood in a broad sense, for example, it may be a fixed connection, a detachable connection, or a Integral; may be mechanically or electrically connected or communicable with each other; may be directly connected or indirectly connected through an intermediate medium, may be internal communication between two elements or an interactive relationship between two elements, unless otherwise clearly defined. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific situations.

在本实用新型中,除非另有明确的规定和限定,第一特征在第二特征“上”或“下”可以是第一和第二特征直接接触,或第一和第二特征通过中间媒介间接接触。而且,第一特征在第二特征“之上”、“上方”和“上面”可是第一特征在第二特征正上方或斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”可以是第一特征在第二特征正下方或斜下方,或仅仅表示第一特征水平高度小于第二特征。In the present invention, unless otherwise expressly specified and defined, a first feature "on" or "under" a second feature may be in direct contact with the first and second features, or the first and second features through an intermediary indirect contact. Also, the first feature being "above", "over" and "above" the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is level higher than the second feature. The first feature being "below", "below" and "below" the second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature has a lower level than the second feature.

在以上描述中,参考术语“一个实施例”、“一些实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本实用新型的至少一个实施例或示例中。在本说明书中,对上述术语的示意性表述不必须针对的是相同的实施例或示例。而且,描述的具体特征、结构、材料或者特点可以在任一个或多个实施例或示例中以合适的方式结合。此外,在不相互矛盾的情况下,本领域的技术人员可以将本说明书中描述的不同实施例或示例以及不同实施例或示例的特征进行结合和组合。In the above description, descriptions with reference to the terms "one embodiment," "some embodiments," "example," "specific example," or "some examples", etc., mean the specific features, structures described in connection with the embodiment or example , material or feature is included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, those skilled in the art may combine and combine the different embodiments or examples described in this specification, as well as the features of the different embodiments or examples, without conflicting each other.

实施例一Example 1

电子成像设备使用例如电子照相成像处理在记录材料上形成图像。电子成像设备包括例如电子照相复印机、电子照相打印机(LED打印机,激光打印机等)、电子照相打印机型的传真机等。处理盒,可拆卸地安装到电子成像设备中,处理盒包含感光构件、用于显影形成于感光构件上的静电潜像的显影构件等。电子成像设备包括驱动头,驱动头用于将电子成像设备的驱动力传输至处理盒,使处理盒工作。Electronic imaging devices form images on recording materials using, for example, electrophotographic imaging processes. The electronic image forming apparatuses include, for example, electrophotographic copiers, electrophotographic printers (LED printers, laser printers, etc.), facsimile machines of the electrophotographic printer type, and the like. A process cartridge, which is detachably mounted in an electronic image forming apparatus, contains a photosensitive member, a developing member for developing an electrostatic latent image formed on the photosensitive member, and the like. The electronic imaging device includes a driving head, and the driving head is used for transmitting the driving force of the electronic imaging device to the process cartridge to make the process cartridge work.

如图1和图2所示,本实施例提供一种处理盒,包括框架、粉仓组件、废粉仓组件、驱动单元30、芯片40和芯片支架50。As shown in FIG. 1 and FIG. 2 , this embodiment provides a process cartridge including a frame, a toner container assembly, a waste toner container assembly, a driving unit 30 , a chip 40 and a chip holder 50 .

如图1和图2所示,框架包括显影框架10和感光框架20。粉仓组件包括用于存储碳粉的粉仓11、显影辊12、出粉刀13及安装在粉仓11内的搅拌架14。废粉仓组件包括用于收集废粉的废粉仓21、感光鼓22、充电辊23、清洁刮刀24。As shown in FIGS. 1 and 2 , the frame includes a developing frame 10 and a photosensitive frame 20 . The powder container assembly includes a powder container 11 for storing toner, a developing roller 12 , a powder discharge knife 13 and a stirring frame 14 installed in the powder container 11 . The waste toner bin assembly includes a waste toner bin 21 for collecting waste toner, a photosensitive drum 22 , a charging roller 23 , and a cleaning blade 24 .

如图2所示,显影框架10围成存储碳粉的粉仓11,显影框架10大致为长条盒子形状,显影框架10在长度方向的两端具有端面。显影框架10上可以设置有加粉口,通过加粉口向粉仓11内补充碳粉,加粉口可以开设在显影框架10的其中一个端面上。搅拌架14和显影辊12可旋转的支撑在显影框架10长度方向的两端,搅拌架14和显影辊12可在驱动单元30的作用下旋转,搅拌架14和显影辊12的轴向均沿显影框架10的长度方向。粉仓11中的碳粉通过搅拌架14搅拌,防止粉仓11内的碳粉结块,同时也可以向显影辊12方向输送碳粉,被带电的显影辊12吸附。As shown in FIG. 2 , the developing frame 10 encloses a toner bin 11 for storing toner, the developing frame 10 is roughly in the shape of a long box, and the developing frame 10 has end faces at both ends in the longitudinal direction. The developing frame 10 may be provided with a toner feeding port through which toner is replenished into the toner bin 11 , and the toner feeding port may be opened on one of the end faces of the developing frame 10 . The stirring frame 14 and the developing roller 12 are rotatably supported at both ends of the developing frame 10 in the length direction. The stirring frame 14 and the developing roller 12 can be rotated under the action of the driving unit 30 , and the axial directions of the stirring frame 14 and the developing roller 12 are both along the The length direction of the developing frame 10 . The toner in the powder bin 11 is stirred by the stirring frame 14 to prevent the toner in the powder bin 11 from agglomerating.

如图1和图2所示,感光框架20围成收集废粉的废粉仓21,感光框架20也具有长度方向,其长度方向与显影框架10的长度方向一致,感光鼓22可旋转的支撑在感光框架20在长度方向上的两端,感光鼓22的轴向与感光框架20的长度方向一致。As shown in FIG. 1 and FIG. 2 , the photosensitive frame 20 surrounds a waste toner bin 21 for collecting waste toner. The photosensitive frame 20 also has a longitudinal direction, which is consistent with the longitudinal direction of the developing frame 10 , and the photosensitive drum 22 is rotatably supported. At both ends of the photosensitive frame 20 in the longitudinal direction, the axial direction of the photosensitive drum 22 is consistent with the longitudinal direction of the photosensitive frame 20 .

为了更好地对处理盒进行说明,如图3中建立坐标系,其中感光鼓22的轴向方向为X轴方向,与感光鼓22的轴向X相垂直的方向为Y方向,与X轴、Y轴方向垂直的方向为Z轴方向。X轴与Y轴组成的平面为XY平面,Y轴与Z轴组成的平面为YZ平面,X轴与Z轴组成的平面为XZ平面。In order to better describe the process cartridge, a coordinate system is established as shown in FIG. 3 , wherein the axial direction of the photosensitive drum 22 is the X-axis direction, the direction perpendicular to the axial direction X of the photosensitive drum 22 is the Y-direction, and the X-axis direction is The direction perpendicular to the Y-axis direction is the Z-axis direction. The plane composed of the X axis and the Y axis is the XY plane, the plane composed of the Y axis and the Z axis is the YZ plane, and the plane composed of the X axis and the Z axis is the XZ plane.

如图3和图4所示,感光框架20上具有第一壁表面20a,第一壁表面20a位于XY平面上,第一壁表面20a上具有与芯片支架50结合的安装位置20a1,第一壁表面20a的法向方向沿Z轴方向。As shown in FIGS. 3 and 4 , the photosensitive frame 20 has a first wall surface 20a, the first wall surface 20a is located on the XY plane, the first wall surface 20a has a mounting position 20a1 combined with the chip holder 50, the first wall surface 20a is The normal direction of the surface 20a is along the Z-axis direction.

废粉仓21沿感光框架20的长度方向设置,废粉仓21位于感光鼓22的一侧。显影辊12吸附的碳粉通过与感光鼓22之间的电势差将碳粉转移给感光鼓22,经过转印后,清洁刮刀24与感光鼓22线性接触,清洁感光鼓22表面尚未完全转印的碳粉,即废粉,清洁后的废粉存放在废粉仓21内。充电辊23用于对感光鼓22表面充上均匀电荷,从而使感光鼓22能够吸附碳粉。The waste toner bin 21 is disposed along the length direction of the photosensitive frame 20 , and the waste toner bin 21 is located on one side of the photosensitive drum 22 . The toner adsorbed by the developing roller 12 transfers the toner to the photosensitive drum 22 through the potential difference with the photosensitive drum 22. After transfer, the cleaning blade 24 is in linear contact with the photosensitive drum 22 to clean the surface of the photosensitive drum 22 that has not been completely transferred. Toner, namely waste toner, the cleaned waste toner is stored in the waste toner bin 21 . The charging roller 23 is used to charge the surface of the photosensitive drum 22 uniformly, so that the photosensitive drum 22 can absorb toner.

感光框架20的一些部分与显影框架10的一些部分之间存在间隙60,并不是完全贴合,如图3所示,感光框架20与显影框架10在Y方向上存在间隙60。There are gaps 60 between some parts of the photosensitive frame 20 and some parts of the developing frame 10 , which are not completely fitted. As shown in FIG. 3 , there are gaps 60 in the Y direction between the photosensitive frame 20 and the developing frame 10 .

如图1所示,驱动单元30,位于框架长度方向的端面外侧,具体可以设于显影框架10在长度方向的一个或两个端面外侧,也可以设于感光框架20在长度方向的一个或两个端面外侧。驱动单元30用于接收并传递成像设备(如激光打印机)的驱动力使处理盒工作。驱动单元30可以包括动力接收件和齿轮组,从而接收成像设备的驱动力并传递,带动感光鼓22、显影辊12、搅拌架14等旋转。As shown in FIG. 1 , the driving unit 30 is located on the outside of the end face of the frame in the length direction. Specifically, it can be disposed on the outside of one or both end faces of the developing frame 10 in the length direction, and can also be disposed on one or two sides of the photosensitive frame 20 in the length direction. outside of the end face. The driving unit 30 is used to receive and transmit the driving force of the image forming apparatus (such as a laser printer) to make the process cartridge work. The driving unit 30 may include a power receiving member and a gear set, so as to receive and transmit the driving force of the image forming apparatus to drive the photosensitive drum 22 , the developing roller 12 , the stirring frame 14 and the like to rotate.

进一步的,感光框架20还可以包括端盖,端盖罩设在感光框架20长度方向的端面外侧,将驱动单元30的齿轮的一部分或全部罩盖在端盖内,起保护作用,端盖可以与感光框架20是一体设置的,也可以是分体结构,通过焊接、粘贴、卡扣、插接或其他方式固定安装在感光框架20上。Further, the photosensitive frame 20 may also include an end cap, and the end cap is provided on the outer side of the end face in the length direction of the photosensitive frame 20, and a part or all of the gears of the drive unit 30 are covered in the end cap for protection. It is provided integrally with the photosensitive frame 20, or can be a separate structure, and is fixedly installed on the photosensitive frame 20 by welding, pasting, snapping, plugging or other methods.

也可以是,显影框架10包括端盖,端盖罩设在显影框架10长度方向的端面外侧。Alternatively, the developing frame 10 may include an end cap, and the end cap is provided on the outer side of the end face of the developing frame 10 in the longitudinal direction.

如图5所示,芯片40包括存储部41和电接触部42,存储部41通过柔性导电介质43电连接电接触部42,存储部41构造为存储与处理盒相关的信息。As shown in FIG. 5 , the chip 40 includes a storage portion 41 and an electrical contact portion 42 , the storage portion 41 is electrically connected to the electrical contact portion 42 through a flexible conductive medium 43 , and the storage portion 41 is configured to store information related to the process cartridge.

在处理盒安装至成像设备时,电接触部42与成像设备电连接,从而建立芯片40与成像设备的通信。When the process cartridge is mounted to the imaging device, the electrical contacts 42 are electrically connected to the imaging device, thereby establishing communication between the chip 40 and the imaging device.

柔性导电介质43可以是导电排线或者导电箔。存储部41通过柔性导电介质43连接电接触部42,使得存储部41的位置可以设置得更灵活。The flexible conductive medium 43 may be a conductive wire or a conductive foil. The storage part 41 is connected to the electrical contact part 42 through the flexible conductive medium 43 , so that the position of the storage part 41 can be set more flexibly.

存储部41包括第一基板411以及设置在第一基板411上的晶圆412和电池413。The storage part 41 includes a first substrate 411 and a wafer 412 and a battery 413 provided on the first substrate 411 .

电接触部42设置在第二基板421一个表面上,电接触部42的数量为两个,电接触部42背向处理盒设置,即设置在第二基板421远离处理盒的表面上。The electrical contact portion 42 is disposed on one surface of the second substrate 421, and the number of the electrical contact portion 42 is two.

如图7和图8所示,芯片支架50用于安装固定芯片40,芯片支架50可拆卸地连接至感光框架20。感光框架20上具有第一壁表面20a,第一壁表面20a上具有与芯片支架50结合的安装位置20a1,具体的,安装位置20a1是形成于第一壁表面20a上的孔或槽,芯片支架50的一部分从孔或槽中插入到感光框架20中,并固定在感光框架20上,从而将芯片40安装至感光框架20上,即芯片40的存储部41和电接触部42均位于感光框架20上。As shown in FIG. 7 and FIG. 8 , the chip holder 50 is used to install and fix the chip 40 , and the chip holder 50 is detachably connected to the photosensitive frame 20 . The photosensitive frame 20 has a first wall surface 20a, and the first wall surface 20a has a mounting position 20a1 combined with the chip holder 50. Specifically, the mounting position 20a1 is a hole or groove formed on the first wall surface 20a, and the chip holder A part of the chip 50 is inserted into the photosensitive frame 20 from the hole or groove and fixed on the photosensitive frame 20, so that the chip 40 is mounted on the photosensitive frame 20, that is, the storage part 41 and the electrical contact part 42 of the chip 40 are located in the photosensitive frame 20 on.

如图3和图4所示,在芯片40安装至感光框架20后,存储部41位于电接触部42朝向处理盒的一侧,即在沿第一壁表面20a的法向方向Z上,电接触部42位于第一壁表面20a的外侧,电接触部42完全露出于第一壁表面20a外侧。电接触部42大致平行于第一壁表面20a。存储部41的一部分可以插入到第一壁表面20a上的孔或槽内,部分露出于第一壁表面20a,也可以是存储部41全部插入到第一壁表面20a上的孔或槽内。As shown in FIGS. 3 and 4 , after the chip 40 is mounted on the photosensitive frame 20, the storage portion 41 is located on the side of the electrical contact portion 42 facing the process cartridge, that is, in the normal direction Z along the first wall surface 20a, the electrical The contact portion 42 is located outside the first wall surface 20a, and the electrical contact portion 42 is completely exposed outside the first wall surface 20a. The electrical contact portion 42 is substantially parallel to the first wall surface 20a. A part of the storage part 41 may be inserted into the hole or groove on the first wall surface 20a, and part of it may be exposed on the first wall surface 20a, or all the storage part 41 may be inserted into the hole or groove on the first wall surface 20a.

存储部41在第一壁表面20a的法向方向Z上位于电接触部42的内侧,不会突出于电接触部42,由此,电接触部42可以对存储部41形成遮挡,避免外部构件碰撞存储部41。The storage portion 41 is located inside the electrical contact portion 42 in the normal direction Z of the first wall surface 20a, and does not protrude from the electrical contact portion 42. Therefore, the electrical contact portion 42 can form a shield for the storage portion 41 and avoid external components. Collision storage unit 41 .

如图6和图7所示,进一步的,沿第一壁表面20a的法向方向Z观察,存储部41的投影尺寸S1小于电接触部42的投影尺寸S2。具体的,沿第一壁表面的法向Z观察,存储部41能够被观察到的部分的面积为其投影尺寸S1,电接触部42能够被观察到的部分的面积为其投影尺寸S2,存储部41的投影尺寸S1(面积)小于电接触部42的投影尺寸S2(面积)。As shown in FIGS. 6 and 7 , further, viewed along the normal direction Z of the first wall surface 20 a, the projected size S1 of the storage portion 41 is smaller than the projected size S2 of the electrical contact portion 42 . Specifically, when viewed along the normal direction Z of the first wall surface, the area of the portion where the storage portion 41 can be observed is its projected size S1, the area of the portion where the electrical contact portion 42 can be observed is its projected size S2, and the storage portion 41 has its projected size S2. The projected dimension S1 (area) of the portion 41 is smaller than the projected dimension S2 (area) of the electrical contact portion 42 .

如图8所示,进一步的,沿第一壁表面20a的法向方向Z观察,在感光鼓的轴向X方向上,存储部41的投影位于电接触部42的投影范围之间。存储部41和电接触部42的投影位于XY平面上,在X轴方向上,存储部41的投影D1完全落入电接触部42的投影D2范围之内。As shown in FIG. 8 , further, viewed along the normal direction Z of the first wall surface 20 a , in the axial X direction of the photosensitive drum, the projection of the storage portion 41 is located between the projection ranges of the electrical contact portion 42 . The projections of the storage portion 41 and the electrical contact portion 42 are located on the XY plane, and in the X-axis direction, the projection D1 of the storage portion 41 completely falls within the range of the projection D2 of the electrical contact portion 42 .

如图8所示,优选的,电接触部42在X轴方向上的投影范围是3.5mm-5.5mm,而存储部41在X轴方向上的投影D1小于电接触部42在X轴方向上的投影D2,并完全落入到电接触部42的投影范围内。As shown in FIG. 8 , preferably, the projection range of the electrical contact portion 42 in the X-axis direction is 3.5 mm-5.5 mm, and the projection D1 of the storage portion 41 in the X-axis direction is smaller than that of the electrical contact portion 42 in the X-axis direction. The projection D2 is completely within the projection range of the electrical contact portion 42 .

通过上述的存储部41和电接触部42的位置关系设置,可以使电接触部42对存储部41形成有效的遮挡,避免外部构件与存储部41发生碰撞,导致存储部41损坏。By setting the positional relationship between the storage portion 41 and the electrical contact portion 42 described above, the electrical contact portion 42 can effectively shield the storage portion 41 to prevent the storage portion 41 from being damaged due to collision between external components and the storage portion 41 .

如图9和图10所示,本实施例中,芯片支架50包括主体,主体上设有第一安装部51、第二安装部52、第一卡接部53和第二卡接部54。As shown in FIGS. 9 and 10 , in this embodiment, the chip holder 50 includes a main body, and the main body is provided with a first mounting portion 51 , a second mounting portion 52 , a first engaging portion 53 and a second engaging portion 54 .

其中,第一安装部51用于安装芯片40的电接触部42,第二安装部52用于安装存储部41,第一卡接部53和第二卡接部54用于与感光框架20相卡合,从而将芯片支架50安装在感光框架20上。The first mounting portion 51 is used to mount the electrical contact portion 42 of the chip 40 , the second mounting portion 52 is used to mount the storage portion 41 , and the first snap portion 53 and the second snap portion 54 are used to connect with the photosensitive frame 20 . The chip holder 50 is installed on the photosensitive frame 20 by snapping together.

如图9和图10所示,在Z方向上,第一安装部51位于主体远离处理盒的一侧,第二安装部52位于第一安装部51的内侧。第一卡接部53和第二卡接部54位于主体在Y方向上的两端,第一卡接部53其中一者为凸起,另一者为弹性臂,弹性臂上也设有卡位凸起。As shown in FIGS. 9 and 10 , in the Z direction, the first mounting portion 51 is located on the side of the main body away from the process cartridge, and the second mounting portion 52 is located inside the first mounting portion 51 . The first engaging portion 53 and the second engaging portion 54 are located at both ends of the main body in the Y direction. One of the first engaging portions 53 is a protrusion and the other is an elastic arm. Bit raised.

如图10至图12所示,安装时,可以先将芯片40的存储部41安装到第二安装部52中,将芯片40的电接触部42安装到第一安装部51中,即先将芯片40安装至芯片支架50,然后将芯片支架50连同芯片40一起安装到感光框架20上。容易满足芯片40整体的安装或拆卸方便的需求。As shown in FIG. 10 to FIG. 12 , during installation, the storage part 41 of the chip 40 can be installed into the second installation part 52 first, and the electrical contact part 42 of the chip 40 can be installed into the first installation part 51 , that is, the first installation part 51 can be installed. The chip 40 is mounted on the chip holder 50 , and then the chip holder 50 together with the chip 40 is mounted on the photosensitive frame 20 . It is easy to meet the requirement of convenient installation or disassembly of the chip 40 as a whole.

如图3和图12所示,本实施例中,芯片40和芯片支架50安装在感光框架20上,存储部41被感光框架20包围,芯片40整体位于感光框架20与显影框架10的间隙60的范围之外,不会暴露在感光框架20和显影框架10之间的间隙60中,可以避免一些外部构件从间隙60中碰撞到存储部41。As shown in FIG. 3 and FIG. 12 , in this embodiment, the chip 40 and the chip holder 50 are mounted on the photosensitive frame 20 , the storage portion 41 is surrounded by the photosensitive frame 20 , and the chip 40 is located in the gap 60 between the photosensitive frame 20 and the developing frame 10 as a whole. Outside the range, it will not be exposed in the gap 60 between the photosensitive frame 20 and the developing frame 10 , and some external components can be prevented from colliding with the storage part 41 from the gap 60 .

在一些其他的实施方式中,芯片支架50也可以是与感光框架20一体设置。In some other embodiments, the chip holder 50 may also be integrally provided with the photosensitive frame 20 .

实施例二Embodiment 2

本实施例提供另一种处理盒,与实施例一不同的是,本实施例的芯片40和芯片支架50安装在显影框架10上。The present embodiment provides another process cartridge. The difference from the first embodiment is that the chip 40 and the chip holder 50 of the present embodiment are mounted on the developing frame 10 .

如图13和图14所示,本实施例中,显影框架10上具有第一壁表面10a,第一壁表面10a位于XY平面上,第一壁表面10a上具有与芯片支架50结合的安装位置10a1,第一壁表面10a的法向方向沿Z轴方向。As shown in FIG. 13 and FIG. 14 , in this embodiment, the developing frame 10 has a first wall surface 10a, the first wall surface 10a is located on the XY plane, and the first wall surface 10a has a mounting position combined with the chip holder 50 10a1, the normal direction of the first wall surface 10a is along the Z-axis direction.

如图13和图14所示,在芯片40安装至显影框架10后,存储部41位于电接触部42朝向处理盒的一侧,即在沿第一壁表面10a的法向方向Z上,电接触部42位于第一壁表面10a的外侧,电接触部42完全露出于第一壁表面10a外侧。电接触部42大致平行于第一壁表面10a。存储部41的一部分可以插入到第一壁表面10a上的安装位置10a1内,部分露出于第一壁表面10a,也可以是存储部41全部插入到第一壁表面10a上的安装位置10a1内。存储部41在第一壁表面10a的法向方向Z上位于电接触部42的内侧,不会突出于电接触部42,由此,电接触部42可以对存储部41形成遮挡,避免外部构件碰撞存储部41。As shown in FIGS. 13 and 14 , after the chip 40 is mounted on the developing frame 10, the storage portion 41 is located on the side of the electrical contact portion 42 facing the process cartridge, that is, in the normal direction Z along the first wall surface 10a, the electrical The contact portion 42 is located outside the first wall surface 10a, and the electrical contact portion 42 is completely exposed outside the first wall surface 10a. The electrical contact portion 42 is substantially parallel to the first wall surface 10a. A part of the storage part 41 may be inserted into the installation position 10a1 on the first wall surface 10a, and a part of the storage part 41 may be inserted into the installation position 10a1 on the first wall surface 10a. The storage portion 41 is located inside the electrical contact portion 42 in the normal direction Z of the first wall surface 10a, and does not protrude from the electrical contact portion 42. Therefore, the electrical contact portion 42 can form a shield for the storage portion 41 and avoid external components. Collision storage unit 41 .

如图15至图17所示,进一步的,沿第一壁表面10a的法向方向Z观察,存储部41的投影尺寸S1小于电接触部42的投影尺寸S2。具体的,沿第一壁表面的法向Z观察,存储部41能够被观察到的部分的面积为其投影尺寸S1,电接触部42能够被观察到的部分的面积为其投影尺寸S2,存储部41的投影尺寸S1(面积)小于电接触部42的投影尺寸S2(面积)。As shown in FIGS. 15 to 17 , further, viewed along the normal direction Z of the first wall surface 10 a , the projected size S1 of the storage portion 41 is smaller than the projected size S2 of the electrical contact portion 42 . Specifically, when viewed along the normal direction Z of the first wall surface, the area of the portion where the storage portion 41 can be observed is its projected size S1, the area of the portion where the electrical contact portion 42 can be observed is its projected size S2, and the storage portion 41 has its projected size S2. The projected dimension S1 (area) of the portion 41 is smaller than the projected dimension S2 (area) of the electrical contact portion 42 .

如图15和图18所示,进一步的,沿第一壁表面10a的法向方向Z观察,在感光鼓的轴向X方向上,存储部41的投影位于电接触部42的投影范围之间。存储部41和电接触部42的投影位于XY平面上,在X轴方向上,存储部41的投影D1完全落入电接触部42的投影D2范围之内。As shown in FIGS. 15 and 18 , further, viewed along the normal direction Z of the first wall surface 10a, in the axial X direction of the photosensitive drum, the projection of the storage portion 41 is located between the projection ranges of the electrical contact portion 42 . The projections of the storage portion 41 and the electrical contact portion 42 are located on the XY plane, and in the X-axis direction, the projection D1 of the storage portion 41 completely falls within the range of the projection D2 of the electrical contact portion 42 .

如图15和图18所示,优选的,电接触部42在X轴方向上的投影范围是3.5mm-5.5mm,而存储部41在X轴方向上的投影D1小于电接触部42在X轴方向上投影D2,并完全落入到电接触部42的投影范围内。As shown in FIG. 15 and FIG. 18 , preferably, the projection range of the electrical contact portion 42 in the X-axis direction is 3.5 mm-5.5 mm, and the projection D1 of the storage portion 41 in the X-axis direction is smaller than that of the electrical contact portion 42 in the X-axis direction. D2 is projected in the axial direction, and completely falls within the projected range of the electrical contact portion 42 .

与实施例一的另一个不同之处是,本实施例的芯片支架50结构不同。如图19和图20所示,本实施例中,芯片支架50包括主体,主体上设有第一安装部51、第二安装部52、第一卡接部53和第二卡接部54。其中第一安装部51用于安装芯片40的电接触部42,第二安装部52用于安装存储部41,第一卡接部53和第二卡接部54用于与显影框架10相卡合,从而将芯片支架50安装在显影框架10上。Another difference from the first embodiment is that the structure of the chip holder 50 in this embodiment is different. As shown in FIGS. 19 and 20 , in this embodiment, the chip holder 50 includes a main body, and the main body is provided with a first mounting portion 51 , a second mounting portion 52 , a first engaging portion 53 and a second engaging portion 54 . The first mounting portion 51 is used for mounting the electrical contact portion 42 of the chip 40 , the second mounting portion 52 is used for mounting the storage portion 41 , and the first engaging portion 53 and the second engaging portion 54 are used for engaging with the developing frame 10 . so that the chip holder 50 is mounted on the developing frame 10 .

如图19和图20所示,在Z方向上,第一安装部51位于主体远离处理盒的一侧,第二安装部52位于第一安装部51的内侧。在X方向上,第二安装部52位于主体的一侧,第一卡接部53和第二卡接部54位于主体的另一侧。第一卡接部53和第二卡接部54分别朝向主体在Y方向上的两侧。第一卡接部53其中一者为凸起,另一者为弹性臂,弹性臂上设有也设有卡位凸起。As shown in FIGS. 19 and 20 , in the Z direction, the first mounting portion 51 is located on the side of the main body away from the process cartridge, and the second mounting portion 52 is located inside the first mounting portion 51 . In the X direction, the second mounting portion 52 is located on one side of the main body, and the first engaging portion 53 and the second engaging portion 54 are located on the other side of the main body. The first engaging portion 53 and the second engaging portion 54 are respectively facing the two sides of the main body in the Y direction. One of the first engaging portions 53 is a protrusion, and the other is an elastic arm. The elastic arm is also provided with a locking protrusion.

如图21和图22所示,安装时,可以先将芯片40的存储部41安装到第二安装部52中,将芯片40的电接触部42安装到第一安装部51中,即先将芯片40安装至芯片支架50,然后将芯片支架50连同芯片40一起安装到显影框架10上。容易满足芯片40整体的安装或拆卸方便的需求。As shown in FIG. 21 and FIG. 22 , during installation, the storage part 41 of the chip 40 can be installed into the second installation part 52 first, and the electrical contact part 42 of the chip 40 can be installed into the first installation part 51 , that is, the first installation part 51 can be installed. The chip 40 is mounted to the chip holder 50 , and then the chip holder 50 is mounted on the developing frame 10 together with the chip 40 . It is easy to meet the requirement of convenient installation or disassembly of the chip 40 as a whole.

如图22所示,本实施例中,芯片40和芯片支架50安装在显影框架10上,芯片40整体位于显影框架10与感光框架20的间隙60的范围之外,不会暴露在显影框架10和感光框架20之间的间隙60中,可以避免一些外部构件从间隙60中碰撞到存储部41。As shown in FIG. 22 , in this embodiment, the chip 40 and the chip holder 50 are mounted on the developing frame 10 , and the chip 40 is located outside the range of the gap 60 between the developing frame 10 and the photosensitive frame 20 , and will not be exposed to the developing frame 10 In the gap 60 between the photosensitive frame 20 and the photosensitive frame 20 , some external components can be prevented from colliding with the storage part 41 from the gap 60 .

在一些其他的实施方式中,芯片支架50也可以是与显影框架10一体设置。In some other embodiments, the chip holder 50 may also be integrally provided with the developing frame 10 .

本实施例的处理盒的其他结构与实施例一相同,在此不再赘述。Other structures of the process cartridge of this embodiment are the same as those of the first embodiment, and are not repeated here.

实施例三Embodiment 3

本实施例提供又一种处理盒,与实施例一和实施例二不同的是,本实施例的芯片40结构、芯片支架50结构不同。This embodiment provides another process cartridge, which is different from Embodiment 1 and Embodiment 2 in that the structure of the chip 40 and the structure of the chip holder 50 in this embodiment are different.

如图23和图24所示,本实施例中,感光框架20还可以包括端盖70,芯片40和芯片支架50安装在端盖70上,端盖70上具有第一壁表面70a,第一壁表面70a位于XY平面上,第一壁表面70a上具有与芯片支架50结合的安装位置,第一壁表面70a的法向方向沿Z轴方向。As shown in FIG. 23 and FIG. 24 , in this embodiment, the photosensitive frame 20 may further include an end cover 70 on which the chip 40 and the chip holder 50 are mounted, and the end cover 70 has a first wall surface 70 a . The wall surface 70a is located on the XY plane, the first wall surface 70a has a mounting position combined with the chip holder 50, and the normal direction of the first wall surface 70a is along the Z-axis direction.

如图24至图26所示,在芯片40安装至端盖70后,存储部41位于电接触部42朝向处理盒的一侧,即在沿第一壁表面70a的法向方向Z上,电接触部42位于第一壁表面70a的外侧,电接触部42完全露出于第一壁表面70a外侧。电接触部42大致平行于第一壁表面70a。存储部41的一部分可以插入到第一壁表面70a上的安装位置内,部分露出于第一壁表面70a,也可以是存储部41全部插入到第一壁表面70a上的安装位置内。存储部41在第一壁表面70a的法向方向Z上位于电接触部42的内侧,不会突出于电接触部42,由此,电接触部42可以对存储部41形成遮挡,避免外部构件碰撞存储部41。在Y轴方向上,电接触部42位于存储部41的一侧。As shown in FIGS. 24 to 26 , after the chip 40 is mounted on the end cap 70, the storage portion 41 is located on the side of the electrical contact portion 42 facing the process cartridge, that is, in the normal direction Z along the first wall surface 70a, the electrical The contact portion 42 is located outside the first wall surface 70a, and the electrical contact portion 42 is completely exposed outside the first wall surface 70a. The electrical contacts 42 are generally parallel to the first wall surface 70a. A part of the storage part 41 may be inserted into the installation position on the first wall surface 70a, and part of the storage part 41 may be exposed on the first wall surface 70a, or the storage part 41 may be completely inserted into the installation position on the first wall surface 70a. The storage portion 41 is located inside the electrical contact portion 42 in the normal direction Z of the first wall surface 70a, and does not protrude from the electrical contact portion 42. Therefore, the electrical contact portion 42 can form a shield for the storage portion 41 and avoid external components. Collision storage unit 41 . In the Y-axis direction, the electrical contact portion 42 is located on one side of the storage portion 41 .

如图27和图28所示,进一步的,沿第一壁表面70a的法向方向Z观察,存储部41的投影尺寸S1小于电接触部42的投影尺寸S2。具体的,沿第一壁表面的法向Z观察,存储部41能够被观察到的部分的面积为其投影尺寸S1,电接触部42能够被观察到的部分的面积为其投影尺寸S2,存储部41(图28中的虚线部分)基本上被第一挡板55遮挡,能被观察到的面积基本为零,即存储部41的投影尺寸S1基本为零,存储部41的投影尺寸S1(面积)小于电接触部42的投影尺寸S2(面积)。As shown in FIGS. 27 and 28 , further, when viewed along the normal direction Z of the first wall surface 70 a, the projected size S1 of the storage portion 41 is smaller than the projected size S2 of the electrical contact portion 42 . Specifically, when viewed along the normal direction Z of the first wall surface, the area of the portion where the storage portion 41 can be observed is its projected size S1, the area of the portion where the electrical contact portion 42 can be observed is its projected size S2, and the storage portion 41 has its projected size S2. The portion 41 (dotted line in FIG. 28 ) is basically blocked by the first baffle 55, and the area that can be observed is basically zero, that is, the projected size S1 of the storage portion 41 is basically zero, and the projected size S1 of the storage portion 41 ( area) is smaller than the projected dimension S2 (area) of the electrical contact portion 42 .

与实施例一的另一个不同之处是,本实施例的芯片支架50结构不同。如图24所示,本实施例中,芯片支架50包括主体,主体上设有第一安装部51、第一挡板55、第一卡接部53和第二卡接部54。其中第一安装部51用于安装芯片40的电接触部42,第一卡接部53和第二卡接部54用于与端盖70相卡合,从而将芯片支架50安装在端盖70上。Another difference from the first embodiment is that the structure of the chip holder 50 in this embodiment is different. As shown in FIG. 24 , in this embodiment, the chip holder 50 includes a main body, and the main body is provided with a first mounting portion 51 , a first baffle 55 , a first engaging portion 53 and a second engaging portion 54 . The first mounting portion 51 is used for mounting the electrical contact portion 42 of the chip 40 , and the first clamping portion 53 and the second clamping portion 54 are used for engaging with the end cover 70 , so that the chip holder 50 is mounted on the end cover 70 . superior.

如图29所示,在Z方向上,第一安装部51位于主体远离处理盒的一侧。第一卡接部53和第二卡接部54分别朝向主体在Y方向上的两侧。第一卡接部53和第二卡接部54均为卡位凸起。第一挡板55在Y轴方向上位于第一安装部51的一侧,在Z方向上位于主体远离处理盒的一侧,第一挡板55用于在Z轴方向上遮挡芯片40的存储部41。As shown in FIG. 29 , in the Z direction, the first mounting portion 51 is located on the side of the main body away from the process cartridge. The first engaging portion 53 and the second engaging portion 54 are respectively facing the two sides of the main body in the Y direction. Both the first engaging portion 53 and the second engaging portion 54 are engaging protrusions. The first baffle 55 is located on the side of the first mounting portion 51 in the Y-axis direction, and is located on the side of the main body away from the process cartridge in the Z-axis direction. The first baffle 55 is used to block the storage of the chips 40 in the Z-axis direction. Section 41.

如图30所示,进一步的,端盖70上还设置有第二挡板72,第二挡板72沿YZ平面延伸,第二挡板72与端盖70在X轴的方向的端面内侧之间具有间隔71,当芯片40和芯片支架50安装到端盖70的安装位置时,存储部41插入到第二挡板72和端盖70内侧的间隔71中,使得第二挡板72能在X轴方向上遮挡存储部41。第二挡板72与端盖70为一体成型结构。As shown in FIG. 30, further, the end cover 70 is further provided with a second baffle plate 72, the second baffle plate 72 extends along the YZ plane, and the second baffle plate 72 and the inner side of the end face of the end cover 70 in the X-axis direction There is a space 71 therebetween, and when the chip 40 and the chip holder 50 are installed at the installation position of the end cap 70, the storage part 41 is inserted into the space 71 inside the second baffle 72 and the end cap 70, so that the second baffle 72 can be in The storage unit 41 is shielded in the X-axis direction. The second baffle 72 and the end cover 70 are integrally formed.

如图29所示,安装时,可以先将芯片40的存储部41以粘贴或焊接等方式安装在主体上,将芯片40的电接触部42安装到第一安装部51中,即先将芯片40安装至芯片支架50,然后将芯片支架50连同芯片40一起安装到端盖70上。容易满足芯片40整体的安装或拆卸方便的需求。As shown in FIG. 29 , during installation, the storage part 41 of the chip 40 can be installed on the main body by sticking or welding, and the electrical contact part 42 of the chip 40 can be installed in the first installation part 51, that is, the chip 40 is mounted to the chip holder 50 , and then the chip holder 50 is mounted together with the chip 40 on the end cap 70 . It is easy to meet the requirement of convenient installation or disassembly of the chip 40 as a whole.

如图25和图30所示,本实施例中,芯片40和芯片支架50安装在端盖70上,第一挡板55和第二挡板72将芯片40的存储部41遮挡,使存储部41不会暴露在感光框架20和显影框架10之间的间隙60中,可以避免一些外部构件从间隙60中碰撞到存储部41。As shown in FIG. 25 and FIG. 30 , in this embodiment, the chip 40 and the chip holder 50 are mounted on the end cover 70 , and the first baffle 55 and the second baffle 72 cover the storage part 41 of the chip 40 so that the storage part 41 is not exposed in the gap 60 between the photosensitive frame 20 and the developing frame 10 , and some external components can be prevented from colliding with the storage part 41 from the gap 60 .

在一些其他的实施方式中,显影框架10也可以包括端盖,芯片和芯片支架安装于端盖上。In some other embodiments, the developing frame 10 may also include an end cap on which the chip and the chip holder are mounted.

本实施例的处理盒的其他结构与实施例一相同,在此不再赘述。Other structures of the process cartridge of this embodiment are the same as those of the first embodiment, and are not repeated here.

实施例四Embodiment 4

本实施例提供另一个处理盒,与实施例三的不同之处在于,本实施例的芯片40结构不同,芯片支架50与端盖70为一体结构。This embodiment provides another process cartridge. The difference from the third embodiment is that the structure of the chip 40 in this embodiment is different, and the chip holder 50 and the end cover 70 are integrally formed.

如图31至图36所示,本实施例中,端盖70上的第一壁表面70a上形成有用于安装芯片40的电接触部42的第一安装部51,第一壁表面70a位于XY平面上,第一安装部51沿Z轴方向突出于第一壁表面70a设置。As shown in FIGS. 31 to 36 , in this embodiment, a first mounting portion 51 for mounting the electrical contact portion 42 of the chip 40 is formed on the first wall surface 70 a of the end cap 70 , and the first wall surface 70 a is located on the XY On a plane, the first mounting portion 51 is provided protruding from the first wall surface 70a in the Z-axis direction.

如图31和图32所示,端盖70上还设置有第二挡板72,第二挡板72沿YZ平面延伸,第二挡板72与端盖70在X轴的方向的端面内侧之间具有间隔71,当芯片40安装到端盖70的安装位置时,存储部41插入到第二挡板72和端盖70内侧的间隔71中,使得第二挡板72能在X轴方向上遮挡存储部41。As shown in FIGS. 31 and 32 , the end cover 70 is further provided with a second baffle plate 72 , the second baffle plate 72 extends along the YZ plane, and the second baffle plate 72 and the inner side of the end face of the end cover 70 in the X-axis direction There is a space 71 therebetween, and when the chip 40 is installed at the installation position of the end cap 70, the storage part 41 is inserted into the second baffle 72 and the space 71 inside the end cap 70, so that the second baffle 72 can be in the X-axis direction The storage unit 41 is shielded.

如图31至图36所示,在芯片40安装至端盖70后,存储部41位于电接触部42朝向处理盒的一侧,即在沿第一壁表面70a的法向方向Z上,电接触部42位于第一壁表面70a的外侧,电接触部42完全露出于第一壁表面70a外侧。电接触部42大致平行于第一壁表面70a。存储部41在第一壁表面70a的法向方向Z上位于电接触部42的内侧,不会突出于电接触部42,由此,电接触部42可以对存储部41形成遮挡,避免外部构件碰撞存储部41。As shown in FIGS. 31 to 36 , after the chip 40 is mounted on the end cap 70, the storage portion 41 is located on the side of the electrical contact portion 42 facing the process cartridge, that is, in the normal direction Z along the first wall surface 70a, the electrical The contact portion 42 is located outside the first wall surface 70a, and the electrical contact portion 42 is completely exposed outside the first wall surface 70a. The electrical contacts 42 are generally parallel to the first wall surface 70a. The storage portion 41 is located inside the electrical contact portion 42 in the normal direction Z of the first wall surface 70a, and does not protrude from the electrical contact portion 42. Therefore, the electrical contact portion 42 can form a shield for the storage portion 41 and avoid external components. Collision storage unit 41 .

如图32至图34所示,进一步的,沿第一壁表面70a的法向方向Z观察,存储部41的投影尺寸S1小于电接触部42的投影尺寸S2。存储部41能够被观察到的部分的面积为其投影尺寸S1,电接触部42能够被观察到的部分的面积为其投影尺寸S2,存储部41基本上被电接触部42和芯片支架50遮挡,能被观察到的面积基本为零,即存储部41的投影尺寸S1基本为零,存储部41的投影尺寸S1(面积)小于电接触部42的投影尺寸S2(面积)。As shown in FIGS. 32 to 34 , further, when viewed along the normal direction Z of the first wall surface 70 a , the projected size S1 of the storage portion 41 is smaller than the projected size S2 of the electrical contact portion 42 . The area of the portion of the storage portion 41 that can be observed is its projected size S1, the area of the portion of the electrical contact portion 42 that can be observed is its projected size S2, and the storage portion 41 is basically blocked by the electrical contact portion 42 and the chip holder 50. , the observable area is substantially zero, that is, the projected size S1 of the storage portion 41 is substantially zero, and the projected size S1 (area) of the storage portion 41 is smaller than the projected size S2 (area) of the electrical contact portion 42 .

如图35所示,进一步的,沿第一壁表面70a的法向方向Z观察,在感光鼓的轴向X方向上,存储部41的投影位于电接触部42的投影范围之间。存储部41和电接触部42的投影位于XY平面上,在X轴方向上,存储部41的投影D1完全落入电接触部42的投影D2范围之内。As shown in FIG. 35 , further, viewed along the normal direction Z of the first wall surface 70 a , in the axial X direction of the photosensitive drum, the projection of the storage portion 41 is located between the projection ranges of the electrical contact portion 42 . The projections of the storage portion 41 and the electrical contact portion 42 are located on the XY plane, and in the X-axis direction, the projection D1 of the storage portion 41 completely falls within the range of the projection D2 of the electrical contact portion 42 .

如图35所示,优选的,电接触部42的投影范围在X轴方向上的尺寸是3.5mm-5.5mm,而存储部41在X轴方向上的投影D1小于电接触部42在X轴方向上的投影D2,并完全落入到电接触部42的投影范围内。As shown in FIG. 35 , preferably, the size of the projection range of the electrical contact portion 42 in the X-axis direction is 3.5 mm-5.5 mm, and the projection D1 of the storage portion 41 in the X-axis direction is smaller than that of the electrical contact portion 42 in the X-axis direction. The projection D2 in the direction falls completely within the projection range of the electrical contact portion 42 .

通过上述的存储部41和电接触部42的位置关系设置,可以使电接触部42对存储部41形成有效的遮挡,避免外部构件与存储部41发生碰撞,导致存储部41损坏。By setting the positional relationship between the storage portion 41 and the electrical contact portion 42 described above, the electrical contact portion 42 can effectively shield the storage portion 41 to prevent the storage portion 41 from being damaged due to collision between external components and the storage portion 41 .

如图36所示,本实施例中,芯片40安装在端盖70上,电接触部42和第二挡板72将芯片40的存储部41遮挡,使存储部41不会暴露在感光框架20和显影框架10之间的间隙60中,可以避免一些外部构件从间隙60中碰撞到存储部41。As shown in FIG. 36 , in this embodiment, the chip 40 is mounted on the end cap 70 , and the electrical contact portion 42 and the second baffle 72 shield the storage portion 41 of the chip 40 so that the storage portion 41 is not exposed to the photosensitive frame 20 In the gap 60 with the developing frame 10 , some external members can be prevented from colliding with the storage part 41 from the gap 60 .

本实施例的处理盒的结构与实施例一相同,在此不再赘述。The structure of the process cartridge of this embodiment is the same as that of the first embodiment, and will not be repeated here.

以上所述的仅是本实用新型的一些实施方式。对于本领域的普通技术人员来说,在不脱离本实用新型创造构思的前提下,还可以做出若干变形和改进,这些都属于本实用新型的保护范围。The above are only some embodiments of the present invention. For those skilled in the art, without departing from the inventive concept of the present invention, several modifications and improvements can be made, which all belong to the protection scope of the present invention.

Claims (10)

1.一种处理盒,可拆卸地安装于成像设备,其特征在于,包括:1. A process cartridge, detachably mounted on an imaging device, characterized in that, comprising: 框架,具有第一壁表面;a frame having a first wall surface; 由框架可旋转地支撑的感光构件;a photosensitive member rotatably supported by the frame; 电接触部,安装于所述框架并用于与所述成像设备电连接;an electrical contact mounted on the frame and used for electrical connection with the imaging device; 存储部,与所述电接触部电连接并且构造成存储与所述处理盒相关的信息;a storage portion electrically connected to the electrical contact portion and configured to store information related to the process cartridge; 所述存储部位于所述电接触部朝向所述处理盒的一侧;the storage part is located on the side of the electrical contact part facing the process cartridge; 沿所述第一壁表面的法向方向观察,所述存储部的投影尺寸小于所述电接触部的投影尺寸;和/或,在所述感光构件的轴向方向上,所述存储部的投影位于所述电接触部的投影范围之间。Viewed along the normal direction of the first wall surface, the projected size of the storage portion is smaller than the projected size of the electrical contact portion; and/or, in the axial direction of the photosensitive member, the storage portion has a The projections lie between the projection ranges of the electrical contacts. 2.根据权利要求1所述的处理盒,其特征在于,沿所述第一壁表面的法向方向观察,在所述感光构件的轴向方向上,所述电接触部的投影范围是3.5mm-5.5mm。2 . The process cartridge according to claim 1 , wherein, viewed along the normal direction of the first wall surface, in the axial direction of the photosensitive member, the projected range of the electrical contact portion is 3.5 mm-5.5mm. 3.根据权利要求1所述的处理盒,其特征在于,所述框架包括显影框架和感光框架;3. The process cartridge according to claim 1, wherein the frame comprises a developing frame and a photosensitive frame; 所述电接触部和存储部共同设置在显影框架或感光框架上。The electrical contact portion and the storage portion are jointly disposed on the developing frame or the photosensitive frame. 4.根据权利要求3所述的处理盒,其特征在于,所述存储部位于所述感光框架和显影框架之间的间隙的范围之外。4. The process cartridge according to claim 3, wherein the storage portion is located outside the range of the gap between the photosensitive frame and the developing frame. 5.根据权利要求1-4任一项所述的处理盒,其特征在于,在沿所述第一壁表面的法向方向上,所述电接触部位于所述第一壁表面的外侧。5 . The process cartridge according to claim 1 , wherein, in a normal direction along the first wall surface, the electrical contact portion is located outside the first wall surface. 6 . 6.根据权利要求5所述的处理盒,其特征在于,所述电接触部平行于所述第一壁表面。6. The process cartridge of claim 5, wherein the electrical contact portion is parallel to the first wall surface. 7.根据权利要求5所述的处理盒,其特征在于,所述电接触部与所述存储部通过柔性导电介质电连接。7 . The process cartridge of claim 5 , wherein the electrical contact portion and the storage portion are electrically connected through a flexible conductive medium. 8 . 8.根据权利要求3所述的处理盒,其特征在于,所述显影框架或感光框架包括端盖,所述电接触部和存储部安装于所述端盖。8. The process cartridge of claim 3, wherein the developing frame or the photosensitive frame comprises an end cap, and the electrical contact portion and the storage portion are mounted on the end cap. 9.一种安装在处理盒上的芯片支架,其特征在于,所述芯片支架用于将电接触部与存储部安装固定在处理盒上,所述处理盒如权利要求1-8任一项所述。9 . A chip support mounted on a process cartridge, wherein the chip support is used to mount and fix the electrical contact portion and the storage portion on the process cartridge, and the process cartridge is as claimed in any one of claims 1 to 8 said. 10.根据权利要求9所述的芯片支架,其特征在于,所述芯片支架与框架分体设置或一体成型。10 . The chip holder according to claim 9 , wherein the chip holder and the frame are provided separately or integrally formed. 11 .
CN202220645758.0U 2022-03-23 2022-03-23 Processing box and chip bracket installed on same Active CN217425935U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023179681A1 (en) * 2022-03-23 2023-09-28 珠海纳思达信息技术有限公司 Processing cartridge and chip support mounted on processing cartridge
WO2024099408A1 (en) * 2022-11-10 2024-05-16 珠海纳思达信息技术有限公司 Processing cartridge and imaging apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023179681A1 (en) * 2022-03-23 2023-09-28 珠海纳思达信息技术有限公司 Processing cartridge and chip support mounted on processing cartridge
WO2024099408A1 (en) * 2022-11-10 2024-05-16 珠海纳思达信息技术有限公司 Processing cartridge and imaging apparatus

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