CN213520033U - Nano-pattern substrate pattern structure - Google Patents

Abstract

The utility model relates to the field of semiconductor technology, and a nanometer figure substrate graphic structure is disclosed, including sapphire base plate and framework, the bottom fixedly connected with backing plate of sapphire base plate, the bottom of backing plate is provided with the silica gel pad, the inside wall fixedly connected with fixed plate of framework, the dead slot that runs through from top to bottom is seted up to the inside of fixed plate, the spacing post of top fixedly connected with of fixed plate, the through-hole that runs through from top to bottom is seted up to the inside of spacing post. This nanometer figure substrate graph structure, through the framework, the backing plate, the silica gel pad, the fixed plate, the dead slot, spacing post, through-hole, louvre, connecting hole, spacing hole and the cooperation each other between the heat dissipation fin strip to can be with sapphire substrate production heat transfer to silica gel pad, and dispel the heat to it through the heat dissipation fin strip of silica gel pad bottom, and can also be through spacing post, mutually supporting between through-hole and the louvre, dispel the heat with the heat from louvre department.

Description

Nano-pattern substrate pattern structure

Technical Field

The utility model relates to the field of semiconductor technology, specifically a nanometer figure substrate graph structure.

Background

The substrate is divided into a drawing substrate and a chemical engineering substrate; the drawing substrate refers to a substrate which fills the whole page with pictures or characters to form a shading, and the most common engineering substrate is a nitride substrate material and the like.

The existing substrate mostly adopts a sapphire substrate as a material, and the heat conducting property of the sapphire substrate is not very good, so that a large amount of heat can be conducted when an LED device is used, particularly a large-power device with a large area is used, the substrate can not effectively dissipate heat, the service life of the substrate is shortened, and therefore a nano-pattern substrate pattern structure is required to be provided to solve the problems.

SUMMERY OF THE UTILITY MODEL

Technical problem to be solved

The utility model provides a nanometer figure substrate graph structure possesses and is convenient for dispel the heat to the substrate, improves advantages such as life, and the heat conductivility of having solved the sapphire substrate is not fine, consequently when using the LED device, can conduct a large amount of heats, especially to the great high-power device of area for the substrate can not effectually dispel the heat, thereby reduces the life's of substrate problem.

(II) technical scheme

In order to achieve the above object, the utility model provides a following technical scheme: a nano graphic substrate graphic structure comprises a sapphire substrate and a frame body, wherein a base plate is fixedly connected to the bottom of the sapphire substrate, a silica gel pad is arranged at the bottom of the base plate, a fixed plate is fixedly connected to the inner side wall of the frame body, a hollow groove which penetrates through the inner side wall of the fixed plate from top to bottom is formed in the fixed plate, a limiting column is fixedly connected to the top of the fixed plate, a through hole which penetrates through the limiting column from top to bottom is formed in the limiting column, a heat dissipation hole which penetrates through the fixing plate from top to bottom is formed in the fixed plate, a connecting hole which penetrates through the silica gel pad from top to bottom is formed in the silica gel pad, a limiting hole is formed in the bottom of the base plate, a heat dissipation fin strip is fixedly connected to the bottom of the silica gel pad, two baffles are movably connected to the top of the frame body, the movable rod is movably inserted into the movable hole, the stop block is fixedly connected to the top of the movable rod, the spring is fixedly connected to the bottom of the stop block, and the jack is formed in the top of the frame body.

Preferably, sapphire substrate and silica gel pad all are located the inside of framework, sapphire substrate and silica gel pad's the side surface all with the inside wall overlap joint each other of framework, the bottom of silica gel pad and the top of fixed plate overlap joint each other.

Preferably, the through hole is communicated with the heat dissipation hole, the connecting hole is communicated with the limiting hole, the limiting column is movably inserted into the connecting hole, and the limiting column is movably inserted into the limiting hole.

Preferably, the heat dissipation fin strip is located inside the empty slot, and the height of the heat dissipation fin strip is equal to the height of the fixing plate.

Preferably, one end of the spring, which is far away from the stop block, is fixedly connected with the top of the inserting plate, and the spring is movably sleeved with the movable rod.

Preferably, the baffle passes through the hinge and is connected with the framework rotation, the bottom of baffle and the mutual overlap joint in top of sapphire base plate, the bottom of movable rod is pegged graft with the inside activity of jack.

Compared with the prior art, the utility model provides a nanometer figure substrate graph structure possesses following beneficial effect:

1. this nanometer figure substrate graph structure, through the framework, the backing plate, the silica gel pad, the fixed plate, the dead slot, spacing post, through-hole, louvre, connecting hole, spacing hole and the cooperation each other between the heat dissipation fin strip to can be with sapphire substrate production heat transfer to silica gel pad, and dispel the heat to it through the heat dissipation fin strip of silica gel pad bottom, and can also be through spacing post, mutually supporting between through-hole and the louvre, dispel the heat with the heat from louvre department.

2. This nanometer figure substrate graphic structure, through the baffle, the slot, the picture peg, the activity hole, the movable rod, the dog, mutually support between spring and the jack, thereby can fix framework and sapphire base plate, and upwards stimulate the dog, can drive the movable rod rebound, and make the bottom of movable rod remove from the inside of jack, then outwards remove the picture peg, make the picture peg remove from the inside of slot, then rotate the baffle, alright come out with sapphire base plate and silica gel pad from the inside of framework, be convenient for change the silica gel pad.

Drawings

FIG. 1 is a front sectional view of the present invention;

FIG. 2 is a perspective view of the frame body of the present invention;

fig. 3 is an enlarged view of a structure a in fig. 1 according to the present invention.

Wherein: 1. a sapphire substrate; 2. a frame body; 3. a base plate; 4. a silica gel pad; 5. a fixing plate; 6. an empty groove; 7. a limiting column; 8. a through hole; 9. heat dissipation holes; 10. connecting holes; 11. a limiting hole; 12. radiating fin strips; 13. a baffle plate; 14. a slot; 15. inserting plates; 16. a movable hole; 17. a movable rod; 18. a stopper; 19. a spring; 20. and (4) inserting the jack.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-3, a substrate pattern structure with nano patterns comprises a sapphire substrate 1 and a frame 2, wherein the sapphire substrate 1 has a nano pattern in its bottom, a backing plate 3 is fixedly connected to the bottom of the sapphire substrate 1, a silicone pad 4 is disposed at the bottom of the backing plate 3, the silicone pad 4 can absorb heat from the sapphire substrate 1 and dissipate heat therefrom, a fixing plate 5 is fixedly connected to the inner side wall of the frame 2, the sapphire substrate 1 and the silicone pad 4 are both located inside the frame 2, the side surfaces of the sapphire substrate 1 and the silicone pad 4 are both lapped with the inner side wall of the frame 2, the bottom of the silicone pad 4 is lapped with the top of the fixing plate 5, a through hollow 6 is formed inside the fixing plate 5, the hollow 6 is square and located at the center of the fixing plate 5, a limit post 7 is fixedly connected to the top of the fixing plate 5, the number of the limiting columns 7 is multiple, through holes 8 which penetrate through the limiting columns 7 from top to bottom are formed in the limiting columns 7, heat dissipation holes 9 which penetrate through the fixing plates 5 from top to bottom are formed in the fixing plates 5, the number of the heat dissipation holes 9 is the same as that of the limiting columns 7, and through mutual matching of the through holes 8 and the heat dissipation holes 9, heat on the silica gel pad 4 can be dissipated through sequentially passing through the through holes 8 and the heat dissipation holes 9, connecting holes 10 which penetrate through the silica gel pad 4 from top to bottom are formed in the silica gel pad 4, limiting holes 11 are formed in the bottom of the backing plate 3, the connecting holes 10 and the limiting holes 11 are the same as that of the limiting columns 7, the through holes 8 are communicated with the heat dissipation holes 9, the connecting holes 10 are communicated with the limiting holes 11, the limiting columns 7 are movably inserted into the connecting holes 10, the limiting columns 7 are, thereby, the silica gel pad 4 and the sapphire substrate 1 can be limited, the silica gel pad 4 and the sapphire substrate 1 are prevented from moving in the frame body 2, the bottom of the silica gel pad 4 is fixedly connected with a plurality of radiating fin strips 12, the radiating fin strips 12 are convenient to radiate the device, the radiating fin strips 12 are positioned in the empty slots 6, the height of the radiating fin strips 12 is equal to that of the fixed plate 5, the top of the frame body 2 is movably connected with two baffle plates 13, one sides of the two baffle plates 13 facing back are respectively provided with a slot 14, the inside of the slot 14 is movably inserted with an insert plate 15, the inside of the insert plate 15 is provided with movable holes 16 which penetrate up and down, the inside of each insert plate 15 is provided with two movable holes 16, the inside of each movable hole 16 is inserted with a movable rod 17, the top of each movable rod 17 is fixedly connected with a stop block 18, and the bottom of the stop block 18 is fixedly connected with a spring 19, under the effect of spring 19, make the bottom of movable rod 17 peg graft with the inside activity of jack 20, and can prevent that the bottom of movable rod 17 from removing from the inside of jack 20, the one end that dog 18 was kept away from to spring 19 and the top fixed connection of picture peg 15, spring 19 cup joints with movable rod 17 activity, jack 20 has been seted up at the top of framework 2, baffle 13 rotates with framework 2 through the hinge to be connected, the bottom of baffle 13 overlaps mutually with the top of sapphire base plate 1, the bottom of movable rod 17 pegs graft with the inside activity of jack 20, through framework 2, mutually support between fixed plate 5 and the baffle 13, thereby can fix sapphire base plate 1 in the inside of framework 2, prevent that sapphire base plate 1 from removing from the inside of framework 2.

When the sapphire substrate inserting device is used, the silica gel pad 4 is placed inside the frame body 2, the position of the connecting hole 10 corresponds to the position of the limiting column 7, when the bottom of the silica gel pad 4 is overlapped with the top of the fixing plate 5, the limiting column 7 is inserted into the connecting hole 10, the radiating fin 12 is located inside the hollow groove 6, the sapphire substrate 1 and the pad plate 3 are placed inside the frame body 2, the position of the limiting hole 11 corresponds to the position of the limiting column 7, the bottom of the pad plate 3 is overlapped with the top of the silica gel pad 4, the limiting hole 11 is sleeved with the top end of the limiting column 7, the inserting plate 15 is inserted into the inserting groove 14 through mutual matching of the baffle plate 13, the inserting groove 14, the inserting plate 15, the movable hole 16, the movable rod 17, the stop block 18, the spring 19 and the inserting hole 20, the inserting plate 15 is inserted into the inserting hole 14, and the bottom end of the movable rod 17 is inserted into the inserting hole 20, thereby can fix sapphire substrate 1 in the inside of framework 2, when sapphire substrate 1 produced the heat, can be with heat transfer to silica gel pad 4 on to dispel the heat to it through the heat dissipation fin 12 of silica gel pad 4 bottom, and through mutually supporting between spacing post, through-hole 8 and louvre 9, thereby can dispel the heat to the device through louvre 9, thereby improve the device's life.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (6)

1. A nanometer figure substrate graph structure, includes sapphire base plate (1) and framework (2), its characterized in that: the sapphire substrate comprises a sapphire substrate body (1), wherein a base plate (3) is fixedly connected to the bottom of the sapphire substrate body (1), a silica gel pad (4) is arranged at the bottom of the base plate (3), a fixing plate (5) is fixedly connected to the inner side wall of the frame body (2), a hollow groove (6) which penetrates through the fixing plate (5) from top to bottom is formed in the fixing plate (5), a limiting column (7) is fixedly connected to the top of the fixing plate (5), a through hole (8) which penetrates through the limiting column from top to bottom is formed in the limiting column (7), a heat dissipation hole (9) which penetrates through the fixing plate from top to bottom is formed in the fixing plate (5), a connecting hole (10) which penetrates through the silica gel pad from top to bottom is formed in the silica gel pad (4), a limiting hole (11) is formed in the bottom of the base plate, two baffle (13) are all erect to one side on the back and are equipped with slot (14), the inside activity of slot (14) is pegged graft and is had picture peg (15), the movable hole (16) that run through about the inside of picture peg (15) is seted up, the inside activity of movable hole (16) is pegged graft and is had movable rod (17), the top fixedly connected with dog (18) of movable rod (17), the bottom fixedly connected with spring (19) of dog (18), jack (20) have been seted up at the top of framework (2).

2. The substrate pattern structure of claim 1, wherein: sapphire substrate (1) and silica gel pad (4) all are located the inside of framework (2), the side surface of sapphire substrate (1) and silica gel pad (4) all overlaps joint each other with the inside wall of framework (2), the bottom of silica gel pad (4) overlaps joint each other with the top of fixed plate (5).

3. The substrate pattern structure of claim 1, wherein: the through hole (8) is communicated with the heat dissipation hole (9), the connecting hole (10) is communicated with the limiting hole (11), the limiting column (7) is movably inserted into the connecting hole (10), and the limiting column (7) is movably inserted into the limiting hole (11).

4. The substrate pattern structure of claim 1, wherein: the radiating fin strips (12) are positioned in the empty grooves (6), and the height of the radiating fin strips (12) is equal to that of the fixing plate (5).

5. The substrate pattern structure of claim 1, wherein: one end of the spring (19) far away from the stop block (18) is fixedly connected with the top of the inserting plate (15), and the spring (19) is movably sleeved with the movable rod (17).

6. The substrate pattern structure of claim 1, wherein: baffle (13) are connected through hinge and framework (2) rotation, the bottom of baffle (13) and the mutual overlap joint in top of sapphire base plate (1), the bottom of movable rod (17) is pegged graft with the inside activity of jack (20).

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