CN207690795U - Semiconductor device - Google Patents
Semiconductor device Download PDFInfo
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- CN207690795U CN207690795U CN201820015701.6U CN201820015701U CN207690795U CN 207690795 U CN207690795 U CN 207690795U CN 201820015701 U CN201820015701 U CN 201820015701U CN 207690795 U CN207690795 U CN 207690795U
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 52
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000000463 material Substances 0.000 claims description 17
- 230000005611 electricity Effects 0.000 claims 1
- 238000004806 packaging method and process Methods 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 24
- 239000005022 packaging material Substances 0.000 description 18
- 239000012790 adhesive layer Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 8
- 230000017525 heat dissipation Effects 0.000 description 8
- 238000005538 encapsulation Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000003466 welding Methods 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 3
- 230000005669 field effect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/0601—Structure
- H01L2224/0603—Bonding areas having different sizes, e.g. different heights or widths
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/34—Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
- H01L2224/36—Structure, shape, material or disposition of the strap connectors prior to the connecting process
- H01L2224/37—Structure, shape, material or disposition of the strap connectors prior to the connecting process of an individual strap connector
- H01L2224/37001—Core members of the connector
- H01L2224/3701—Shape
- H01L2224/37012—Cross-sectional shape
- H01L2224/37013—Cross-sectional shape being non uniform along the connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/34—Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
- H01L2224/39—Structure, shape, material or disposition of the strap connectors after the connecting process
- H01L2224/40—Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
- H01L2224/401—Disposition
- H01L2224/40151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/40221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/40245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/34—Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
- H01L2224/39—Structure, shape, material or disposition of the strap connectors after the connecting process
- H01L2224/41—Structure, shape, material or disposition of the strap connectors after the connecting process of a plurality of strap connectors
- H01L2224/4101—Structure
- H01L2224/4103—Connectors having different sizes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73221—Strap and wire connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- Lead Frames For Integrated Circuits (AREA)
Abstract
Description
技术领域technical field
本实用新型一般系关于半导体装置,具体而言,本实用新型关于共汲极的晶体管晶片的封装结构。The utility model generally relates to a semiconductor device, and specifically, the utility model relates to a package structure of a common-drain transistor wafer.
背景技术Background technique
目前现有的共汲极集成电路的封装结构大多采用打线焊接方式连接集成电路接脚与晶片的各个接触垫而达成电性连接,因此散热效果较差,且阻值相对较高,直接影响晶片的源极-源极导通电阻(Rsson)。另一方面来说,晶圆级晶片尺寸封装(WLCSP)结构是将晶片直接焊接在印刷电路板上,虽然尺寸可较小且有较低的元件阻值,但是不利于表面封装技术的制程使用。At present, most of the packaging structures of the existing common-drain integrated circuits use wire bonding to connect the pins of the integrated circuit and the contact pads of the chip to achieve electrical connection, so the heat dissipation effect is poor, and the resistance value is relatively high, which directly affects The source-to-source on-resistance (Rsson) of the chip. On the other hand, the Wafer Level Chip Scale Package (WLCSP) structure is to directly solder the chip on the printed circuit board. Although the size can be smaller and the component resistance is lower, it is not conducive to the process of surface mount technology. .
实用新型内容Utility model content
鉴于现有技术的问题,本实用新型的一目的在于提供一种半导体装置,具有低导通电阻及高散热效果的封装结构。In view of the problems in the prior art, an object of the present invention is to provide a packaging structure of a semiconductor device with low on-resistance and high heat dissipation effect.
本实用新型的另一目的在于提供一种半导体装置装置,其利用多个金属夹片分别连接共汲极的晶体管晶片的源极及闸极,有效简化制程。Another object of the present invention is to provide a semiconductor device, which uses a plurality of metal clips to respectively connect the source and the gate of the common-drain transistor chip, thereby effectively simplifying the manufacturing process.
本实用新型的又一目的在于提供一种半导体装置,其利用金属夹片作为封装结构的接脚,连接共汲极的多个晶体管的源极,以提升电性连接的可靠度及散热效果。Another object of the present invention is to provide a semiconductor device, which utilizes metal clips as the pins of the packaging structure to connect the sources of multiple transistors that are drained together, so as to improve the reliability of the electrical connection and the heat dissipation effect.
于一实施例中,本实用新型提供一种半导体装置,其包含基板、晶片、第一夹片及第二夹片,晶片包含共汲极的第一晶体管及第二晶体管,共汲极连接基板;第一夹片连接第一晶体管的源极;第二夹片连接第二晶体管的源极,且第一夹片及第二夹片彼此电性分离。In one embodiment, the utility model provides a semiconductor device, which includes a substrate, a chip, a first clip and a second clip, the chip includes a first transistor and a second transistor with a common drain, and the common drain is connected to the substrate ; the first clip is connected to the source of the first transistor; the second clip is connected to the source of the second transistor, and the first clip and the second clip are electrically separated from each other.
于一实施例中,本实用新型的半导体装置更包含封装材料层,封装材料层覆盖晶片、第一夹片及第二夹片于基板上。In one embodiment, the semiconductor device of the present invention further includes an encapsulation material layer covering the chip, the first clip and the second clip on the substrate.
于一实施例中,第一夹片及第二夹片至少其中一个的顶表面至少部分裸露于封装材料层外。In one embodiment, the top surface of at least one of the first clip and the second clip is at least partially exposed outside the packaging material layer.
于一实施例中,第一夹片及第二夹片至少其中一个具有接脚部裸露于封装材料层外。In one embodiment, at least one of the first clip and the second clip has a pin exposed outside the packaging material layer.
于一实施例中,本实用新型的半导体装置更包含第三夹片及第四夹片,第三夹片连接第一晶体管的闸极,且第四夹片连接第二晶体管的闸极。In one embodiment, the semiconductor device of the present invention further includes a third clip and a fourth clip, the third clip is connected to the gate of the first transistor, and the fourth clip is connected to the gate of the second transistor.
于一实施例中,本实用新型的半导体装置更包含封装材料层,封装材料层覆盖晶片、第一夹片、第二夹片、第三夹片及第四夹片于基板上。In one embodiment, the semiconductor device of the present invention further includes an encapsulation material layer covering the chip, the first clip, the second clip, the third clip and the fourth clip on the substrate.
于一实施例,第三夹片及第四夹片至少其中一个的顶表面至少部分裸露于封装材料层外。In one embodiment, the top surface of at least one of the third clip and the fourth clip is at least partially exposed outside the packaging material layer.
于一实施例,第三夹片及第四夹片至少其中一个具有接脚部裸露于封装材料层外。In one embodiment, at least one of the third clip and the fourth clip has a pin exposed outside the packaging material layer.
于一实施例,本实用新型的半导体装置更包含第一导线及第二导线,第一导线连接第一晶体管的闸极,且第二导线连接第二晶体管的闸极。In one embodiment, the semiconductor device of the present invention further includes a first wire and a second wire, the first wire is connected to the gate of the first transistor, and the second wire is connected to the gate of the second transistor.
于一实施例,本实用新型的半导体装置更包含第一接触部及第二接触部,第一夹片及第二夹片分别连接第一接触部及第二接触部,以电连接第一晶体管的源极与第一接触部,且电连接第二晶体管的源极与第二接触部。In one embodiment, the semiconductor device of the present invention further includes a first contact portion and a second contact portion, and the first clip and the second clip are respectively connected to the first contact portion and the second contact portion to electrically connect the first transistor The source of the second transistor is connected to the first contact portion, and the source electrode of the second transistor is electrically connected to the second contact portion.
相较于现有技术,根据本实用新型所公开的半导体装置采用夹片来进行共汲极的两个晶体管的源极及/或闸极的电性连接,可在一次制程中使所有夹片连接完成,简化制程步骤,有效改善晶片的源极-源极导通电阻(Rsson),并且提升散热效果。再者,本实用新型所公开的半导体装置可直接采用夹片的部分作为封装结构的接脚,减少电性连接的焊接位置,亦可有效改善现有技术中因焊接不良而导致开路或电性连接不良的现象。Compared with the prior art, the semiconductor device disclosed in the present invention uses clips to electrically connect the sources and/or gates of the two transistors that share the drain, so that all the clips can be made in one process. The connection is completed, the process steps are simplified, the source-source on-resistance (Rsson) of the chip is effectively improved, and the heat dissipation effect is improved. Furthermore, the semiconductor device disclosed in the utility model can directly use the part of the clip as the pin of the package structure, reducing the welding position of the electrical connection, and can also effectively improve the open circuit or electrical failure caused by poor welding in the prior art. Poor connection phenomenon.
关于本实用新型的优点与精神可以通过以下的实用新型详述及所附附图得到进一步的了解。The advantages and spirit of the present utility model can be further understood through the following detailed description of the utility model and the accompanying drawings.
附图说明Description of drawings
图1为本实用新型的一实施例的半导体装置的平面图。FIG. 1 is a plan view of a semiconductor device according to an embodiment of the present invention.
图1A为图1的半导体装置的一实施例的侧视图。FIG. 1A is a side view of an embodiment of the semiconductor device of FIG. 1 .
图1B为图1的半导体装置的另一实施例的侧视图。FIG. 1B is a side view of another embodiment of the semiconductor device of FIG. 1 .
图2为本实用新型的另一实施例的半导体装置的平面图。FIG. 2 is a plan view of a semiconductor device according to another embodiment of the present invention.
图2A为图2的半导体装置的一实施例的侧视图。FIG. 2A is a side view of an embodiment of the semiconductor device of FIG. 2 .
图2B为图2的半导体装置的另一实施例的侧视图。FIG. 2B is a side view of another embodiment of the semiconductor device of FIG. 2 .
图3为本实用新型的又一实施例的半导体装置的平面图。FIG. 3 is a plan view of a semiconductor device according to another embodiment of the present invention.
图3A为图3的半导体装置的一实施例的侧视图。FIG. 3A is a side view of an embodiment of the semiconductor device of FIG. 3 .
图3B为图3的半导体装置的另一实施例的侧视图。FIG. 3B is a side view of another embodiment of the semiconductor device of FIG. 3 .
图4为本实用新型的另一实施例的半导体装置的平面图。FIG. 4 is a plan view of a semiconductor device according to another embodiment of the present invention.
图4A为图4的半导体装置的一实施例的侧视图。FIG. 4A is a side view of an embodiment of the semiconductor device of FIG. 4 .
图4B为图4的半导体装置的另一实施例的侧视图。FIG. 4B is a side view of another embodiment of the semiconductor device of FIG. 4 .
主要元件符号说明:Description of main component symbols:
1、2、3、4半导体装置1, 2, 3, 4 semiconductor devices
110基板110 substrate
112第一接触部112 first contact part
114第二接触部114 second contact part
116第三接触部116 third contact part
118第四接触部118 fourth contact part
20晶片20 chips
22共汲极22 common drain
210第一晶体管210 first transistor
212源极212 source
214闸极214 gate
220第二晶体管220 second transistor
222源极222 source
224闸极224 gate
31第一夹片31 first clip
312垂直段312 vertical segments
314水平段314 horizontal section
316顶表面316 top surface
32第二夹片32 second clip
322垂直段322 vertical segments
324水平段324 horizontal sections
326顶表面326 top surface
33第一导线33 first wire
34第二导线34 second wire
40、40’封装材料层40, 40' layers of encapsulation material
41第三夹片41 third clip
42第四夹片42 fourth clip
51第一夹片51 first clip
512接脚部512 pins
514水平段514 horizontal section
516顶表面516 top surface
52第二夹片52 second clip
522接脚部522 pins
524水平段524 horizontal sections
526顶表面526 top surface
61第三夹片61 third clip
62第四夹片62 fourth clip
具体实施方式Detailed ways
现在将详细参考本实用新型的示范性实施例,并在附图中说明所述示范性实施例的实例。为简化附图起见,一些常见惯用的结构与元件在附图中将以简单示意的方式绘示之。另外,在附图及实施方式中所使用相同或类似标号的元件/构件是用来代表相同或类似部分。在下述诸实施例中,当元件被指为“连接”或“耦接”至另一元件时,其可为直接连接或耦接至另一元件,或可能存在介于其间的元件或特定材料,例如:胶体或焊料。Reference will now be made in detail to the exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. For the sake of simplifying the drawings, some common structures and components will be shown in a simple and schematic way in the drawings. In addition, elements/members with the same or similar numbers used in the drawings and embodiments are used to represent the same or similar parts. In the following embodiments, when an element is referred to as being "connected" or "coupled" to another element, it may be directly connected or coupled to the other element, or there may be intervening elements or specific materials , for example: colloid or solder.
如图1及图1A所示,于一实施例,半导体装置1包含基板110、晶片20、第一夹片31及第二夹片32。晶片20包含共汲极22的第一晶体管210及第二晶体管220,且共汲极22连接基板110。第一夹片31连接第一晶体管210的源极212,第二夹片32连接第二晶体管220的源极222,且第一夹片31及第二夹片32彼此电性分离。As shown in FIG. 1 and FIG. 1A , in one embodiment, the semiconductor device 1 includes a substrate 110 , a wafer 20 , a first clip 31 and a second clip 32 . The chip 20 includes a first transistor 210 and a second transistor 220 having a common drain 22 , and the common drain 22 is connected to the substrate 110 . The first clip 31 is connected to the source 212 of the first transistor 210 , the second clip 32 is connected to the source 222 of the second transistor 220 , and the first clip 31 and the second clip 32 are electrically separated from each other.
具体而言,在晶片20中,第一晶体管210及第二晶体管220较佳为两个尺寸相同且共用汲极22的金氧半场效晶体管(MOSFETs),且两个金氧半场效晶体管的源极及闸极相互分离。换句话说,第一晶体管210的源极212及闸极214与第二晶体管220的源极及闸极224彼此分离。于此实施例,第一晶体管210的源极212及闸极214与第二晶体管220的源极及闸极224较佳与第一晶体管210及第二晶体管220的共汲极22分别位于晶片20的相对表面。例如,第一晶体管210及第二晶体管220的共汲极22位于晶片20的下表面,且第一晶体管210的源极212及闸极214与第二晶体管220的源极222及闸极224位于晶片20的上表面,而使得共汲极22的第一晶体管210及第二晶体管220形成单一半导体晶片结构。Specifically, in the chip 20, the first transistor 210 and the second transistor 220 are preferably two metal-oxide-semiconductor field-effect transistors (MOSFETs) with the same size and a common drain 22, and the two metal-oxide-semiconductor field-effect transistors The source and gate are separated from each other. In other words, the source 212 and the gate 214 of the first transistor 210 are separated from the source and the gate 224 of the second transistor 220 . In this embodiment, the source 212 and gate 214 of the first transistor 210 and the source and gate 224 of the second transistor 220 are preferably located on the chip 20 with the common drains 22 of the first transistor 210 and the second transistor 220 respectively. the opposite surface. For example, the common drains 22 of the first transistor 210 and the second transistor 220 are located on the lower surface of the chip 20, and the source 212 and the gate 214 of the first transistor 210 and the source 222 and the gate 224 of the second transistor 220 are located at the lower surface of the chip 20. The upper surface of the wafer 20, so that the first transistor 210 and the second transistor 220 of the common drain 22 form a single semiconductor wafer structure.
基板110可为与晶片20的第一晶体管210及第二晶体管220的共汲极22形成电连接的导线架、接合垫、或接点板。晶片20设置于基板110上,且较佳通过例如导电粘着层(例如焊锡)使得第一晶体管210及第二晶体管220的共汲极22电连接基板110。半导体装置1更包含第一接触部112、第二接触部114、第三接触部116及第四接触部118。第一接触部112、第二接触部114、第三接触部116及第四接触部118可为与晶片20的第一晶体管210及第二晶体管220的源极212/222及闸极214/224形成电连接的导线架、接合垫、或接点板,第一接触部112电连接第一晶体管210的源极212,第二接触部114电连接第二晶体管220的源极222,第三接触部116电连接第一晶体管210的闸极214,第四接触部118电连接第二晶体管220的闸极224。The substrate 110 can be a lead frame, a bonding pad, or a contact plate electrically connected to the common drains 22 of the first transistor 210 and the second transistor 220 of the chip 20 . The chip 20 is disposed on the substrate 110 , and the common drains 22 of the first transistor 210 and the second transistor 220 are preferably electrically connected to the substrate 110 through, for example, a conductive adhesive layer (such as solder). The semiconductor device 1 further includes a first contact portion 112 , a second contact portion 114 , a third contact portion 116 and a fourth contact portion 118 . The first contact portion 112, the second contact portion 114, the third contact portion 116 and the fourth contact portion 118 can be connected to the source 212/222 and the gate 214/224 of the first transistor 210 and the second transistor 220 of the wafer 20. A lead frame, bonding pad, or contact plate forming an electrical connection, the first contact portion 112 is electrically connected to the source electrode 212 of the first transistor 210, the second contact portion 114 is electrically connected to the source electrode 222 of the second transistor 220, and the third contact portion 116 is electrically connected to the gate 214 of the first transistor 210 , and the fourth contact 118 is electrically connected to the gate 224 of the second transistor 220 .
具体而言,第一夹片31设置于第一晶体管210及第一接触部112上,使得第一晶体管210的源极212可通过第一夹片31与第一接触部112形成电性连接。于一实施例中,第一夹片31可通过导电粘着层与第一晶体管210的源极212形成电性连接并可通过导电粘着层与第一接触部112形成电性连接。Specifically, the first clip 31 is disposed on the first transistor 210 and the first contact portion 112 , so that the source 212 of the first transistor 210 can be electrically connected to the first contact portion 112 through the first clip 31 . In one embodiment, the first clip 31 can be electrically connected to the source 212 of the first transistor 210 through the conductive adhesive layer and can be electrically connected to the first contact portion 112 through the conductive adhesive layer.
类似地,第二夹片32设置于第二晶体管220及第二接触部114上,使得第二晶体管220的源极222可通过第二夹片32与第二接触部114形成电性连接。于一实施例中,第二夹片32可通过导电粘着层与第二晶体管220的源极222形成电性连接并可通过导电粘着层与第二接触部114形成电性连接,使得第二晶体管220的源极222能够通过第二夹片32与第二接触部114形成电性连接。Similarly, the second clip 32 is disposed on the second transistor 220 and the second contact portion 114 , so that the source 222 of the second transistor 220 can be electrically connected to the second contact portion 114 through the second clip 32 . In one embodiment, the second clip 32 can be electrically connected to the source 222 of the second transistor 220 through the conductive adhesive layer and can be electrically connected to the second contact portion 114 through the conductive adhesive layer, so that the second transistor The source 222 of 220 can be electrically connected to the second contact portion 114 through the second clip 32 .
举例而言,如图1A所示,第一夹片31与第二夹片32较佳可为预压成型的金属夹片,例如L型的铜片。第一夹片31与第二夹片32的水平段314/324分别位于第一晶体管210的源极212与第二晶体管220的源极222上,而第一夹片31与第二夹片32的垂直段312/322分别向下朝第一接触部112与第二接触部114延伸。由此,第一夹片31的水平段314可通过导电粘着层与第一晶体管210的源极212形成电性连接,且垂直段312可通过导电粘着层与第一接触部112形成电性连接。同理,第二夹片32的水平段324可通过导电粘着层与第二晶体管220的源极212形成电性连接,且垂直段322可通过导电粘着层与第二接触部114形成电性连接。For example, as shown in FIG. 1A , the first clip 31 and the second clip 32 are preferably pre-pressed metal clips, such as L-shaped copper sheets. The horizontal sections 314/324 of the first clip 31 and the second clip 32 are located on the source 212 of the first transistor 210 and the source 222 of the second transistor 220 respectively, and the first clip 31 and the second clip 32 The vertical segments 312 / 322 of the vertical segments extend downward toward the first contact portion 112 and the second contact portion 114 respectively. Thus, the horizontal section 314 of the first clip 31 can be electrically connected to the source 212 of the first transistor 210 through the conductive adhesive layer, and the vertical section 312 can be electrically connected to the first contact portion 112 through the conductive adhesive layer. . Similarly, the horizontal section 324 of the second clip 32 can be electrically connected to the source 212 of the second transistor 220 through the conductive adhesive layer, and the vertical section 322 can be electrically connected to the second contact portion 114 through the conductive adhesive layer. .
于此实施例,半导体装置1更包含第一导线33及第二导线34,第一导线33连接第一晶体管210的闸极214与第三接触部116,且第一导线34连接该第二晶体管220的闸极224与第四接触部118。由此,第三接触部116电连接第一晶体管210的闸极214,且第四接触部118电连接第二晶体管220的闸极224。于一实施例,第一导线33及第二导线34较佳为铜导线,但不以此为限。In this embodiment, the semiconductor device 1 further includes a first wire 33 and a second wire 34, the first wire 33 is connected to the gate 214 of the first transistor 210 and the third contact portion 116, and the first wire 34 is connected to the second transistor The gate 224 of 220 is connected to the fourth contact 118 . Thus, the third contact portion 116 is electrically connected to the gate 214 of the first transistor 210 , and the fourth contact portion 118 is electrically connected to the gate 224 of the second transistor 220 . In one embodiment, the first wire 33 and the second wire 34 are preferably copper wires, but not limited thereto.
于一实施例中,如图1及图1A所示,半导体装置1更包含封装材料层40来包覆晶片20,以阻隔水气或其他物质对晶片20造成腐蚀或损坏。具体而言,封装材料层40覆盖晶片20、第一夹片31、第二夹片32、第一导线33及第二导线34于基板110上。于此实施例,第一夹片31的顶表面316及第二夹片322的顶表面326完全被封装材料层40包覆,仅基板110、第一接触部112、第二接触部114、第三接触部116及第四接触部118裸露于封装材料层40外。In one embodiment, as shown in FIG. 1 and FIG. 1A , the semiconductor device 1 further includes an encapsulation material layer 40 to cover the chip 20 to prevent moisture or other substances from corroding or damaging the chip 20 . Specifically, the packaging material layer 40 covers the chip 20 , the first clip 31 , the second clip 32 , the first wire 33 and the second wire 34 on the substrate 110 . In this embodiment, the top surface 316 of the first clip 31 and the top surface 326 of the second clip 322 are completely covered by the packaging material layer 40, only the substrate 110, the first contact portion 112, the second contact portion 114, the second contact portion The third contact portion 116 and the fourth contact portion 118 are exposed outside the packaging material layer 40 .
此外,封装材料层40更可至少部分包覆第一夹片31与第二夹片32。于一实施例中,如图1B所示,第一夹片31及第二夹片32至少其中一个的顶表面316、326至少部分裸露于封装材料层40’外。换句话说,封装材料层40’可露出第一夹片31的顶表面316、第二夹片32的顶表面326或其组合,以协助晶片20进行散热,但不以此为限。In addition, the packaging material layer 40 can at least partially cover the first clip 31 and the second clip 32 . In one embodiment, as shown in FIG. 1B , the top surface 316, 326 of at least one of the first clip 31 and the second clip 32 is at least partially exposed outside the packaging material layer 40'. In other words, the packaging material layer 40' may expose the top surface 316 of the first clip 31, the top surface 326 of the second clip 32 or a combination thereof to assist the chip 20 to dissipate heat, but not limited thereto.
于另一实施例,如图2及图2A所示,半导体装置2更包含第三夹片41及第四夹片42,第三夹片41连接第一晶体管210的闸极214,且第四夹片42连接第二晶体管220的闸极224。具体而言,半导体装置2利用第三夹片41及第四夹片42取代上述实施例的第一导线33及第二导线34,使得第一晶体管210的闸极214通过第三夹片41电连接第三接触部116,且第二晶体管220的闸极224通过第三夹片42电连接第四接触部118。举例而言,第三夹片41及第四夹片42可为类似上述第一夹片31及第二夹片32的预压成型金属夹片结构,例如L型的铜片。由此,夹片41/42的水平段可通过导电粘着层与晶体管210/220的闸极214/224形成电性连接,且夹片41/42的垂直段可通过导电粘着层与接触部116/118形成电性连接,使得晶体管210/220的闸极214/224能够通过夹片41/42与接触部116/118形成电性连接。In another embodiment, as shown in FIG. 2 and FIG. 2A, the semiconductor device 2 further includes a third clip 41 and a fourth clip 42, the third clip 41 is connected to the gate 214 of the first transistor 210, and the fourth The clip 42 is connected to the gate 224 of the second transistor 220 . Specifically, the semiconductor device 2 uses the third clip 41 and the fourth clip 42 to replace the first wire 33 and the second wire 34 in the above embodiment, so that the gate 214 of the first transistor 210 is electrically connected through the third clip 41. The third contact portion 116 is connected, and the gate 224 of the second transistor 220 is electrically connected to the fourth contact portion 118 through the third clip 42 . For example, the third clip 41 and the fourth clip 42 can be pre-pressed metal clip structures similar to the above-mentioned first clip 31 and second clip 32 , such as L-shaped copper sheets. Thus, the horizontal section of the clip 41/42 can be electrically connected to the gate 214/224 of the transistor 210/220 through the conductive adhesive layer, and the vertical section of the clip 41/42 can be connected to the contact portion 116 through the conductive adhesive layer. /118 forms an electrical connection, so that the gate 214/224 of the transistor 210/220 can form an electrical connection with the contact portion 116/118 through the clip 41/42.
当第一晶体管210的源极212及闸极214及第二晶体管220的源极222及闸极224分别利用第一夹片31、第三夹片41、第二夹片32及第四夹片42电连接第一接触部112、第三接触部116、第二接触部114及第四接触部118时,可利用一次的夹片制程而完成所有的连接,无须另外进行打线制程,有效简化制程步骤。When the source 212 and the gate 214 of the first transistor 210 and the source 222 and the gate 224 of the second transistor 220 respectively use the first clip 31, the third clip 41, the second clip 32 and the fourth clip 42 When electrically connecting the first contact portion 112, the third contact portion 116, the second contact portion 114, and the fourth contact portion 118, all the connections can be completed by one clip manufacturing process without additional wire bonding process, which effectively simplifies Process steps.
类似地,封装材料层40可覆盖晶片20、第一夹片31、第二夹片32、第三夹片41及第四夹片42于基板110上,以阻隔水气或其他物质对晶片20造成腐蚀或损坏。于一实施例中,类似图2A所示,第三夹片41及第四夹片42可完全被封装材料层40包覆。于另一实施例中,类似图2B所示,第三夹片41及第四夹片42至少其中一个的顶表面可至少部分裸露于封装材料层40’外。Similarly, the packaging material layer 40 can cover the chip 20 , the first clip 31 , the second clip 32 , the third clip 41 and the fourth clip 42 on the substrate 110 to prevent moisture or other substances from affecting the chip 20 cause corrosion or damage. In one embodiment, as shown in FIG. 2A , the third clip 41 and the fourth clip 42 can be completely covered by the packaging material layer 40 . In another embodiment, as shown in FIG. 2B , the top surface of at least one of the third clip 41 and the fourth clip 42 may be at least partially exposed outside the packaging material layer 40'.
在此需注意,依据实际应用,封装材料层40’可至少部分包覆第一夹片31、第二夹片32、第三夹片41及第四夹片42,而露出第一夹片31、第二夹片32、第三夹片41及第四夹片42至少其中一个的部分表面,不限于附图所示。It should be noted here that according to practical applications, the encapsulation material layer 40 ′ may at least partially cover the first clip 31 , the second clip 32 , the third clip 41 and the fourth clip 42 , while exposing the first clip 31 , the partial surface of at least one of the second clamping piece 32 , the third clamping piece 41 and the fourth clamping piece 42 are not limited to those shown in the drawings.
再者,上述实施例中虽绘示通过夹片31、32电连接接触部112、114,但是夹片可具有不同的设计变化。于另一实施例,如图3及图3A所示,半导体装置3包含基板110、第三接触部116及第四接触部118,但不包含上述的第一接触部112及第二接触部114。相应于此,半导体装置3的第一夹片51及第二夹片52取代图1的第一夹片31及第二夹片32,并分别具有接脚部512及522,以作为半导体装置3的接脚。具体而言,第一夹片51及第二夹片52为垂直段末端向外弯折延伸而形成接脚部512及522的Z型铜片。举例而言,第一夹片51的水平段514位于第一晶体管210的源极212上,且垂直段自水平段514的末端向下弯折延伸一段距离,然后再向外弯折水平延伸形成接脚部512。接脚部512的底表面较佳与基板110的底表面共平面。类似地,第二夹片52的水平段524位于第二晶体管220的源极222上,且垂直段自水平段524的末端向下弯折延伸一段距离,然后再向外弯折水平延伸形成接脚部522。接脚部522的底表面较佳与基板110的底表面共平面。当封装材料层包覆晶片20、第一夹片51及第二夹片52时,第一夹片51及第二夹片52的接脚部512及522裸露于封装材料层40外。由此,可免除夹片与接触部的焊接,不仅简化制程,解决焊接造成电阻增加的问题,亦可提升散热效果。Moreover, although the above-mentioned embodiment shows that the contact portions 112 , 114 are electrically connected by the clips 31 , 32 , the clips may have different designs. In another embodiment, as shown in FIG. 3 and FIG. 3A, the semiconductor device 3 includes a substrate 110, a third contact portion 116, and a fourth contact portion 118, but does not include the above-mentioned first contact portion 112 and second contact portion 114. . Correspondingly, the first clip 51 and the second clip 52 of the semiconductor device 3 replace the first clip 31 and the second clip 32 of FIG. pins. Specifically, the first clamping piece 51 and the second clamping piece 52 are Z-shaped copper pieces whose ends of the vertical section are bent and extended outward to form the pin portions 512 and 522 . For example, the horizontal section 514 of the first clip 51 is located on the source 212 of the first transistor 210, and the vertical section is bent downward from the end of the horizontal section 514 for a certain distance, and then bent outward and extended horizontally to form Pin portion 512 . The bottom surface of the pin portion 512 is preferably coplanar with the bottom surface of the substrate 110 . Similarly, the horizontal section 524 of the second clip 52 is located on the source 222 of the second transistor 220, and the vertical section bends downward from the end of the horizontal section 524 and extends for a certain distance, and then bends outward and extends horizontally to form a junction. Foot 522 . The bottom surface of the pin portion 522 is preferably coplanar with the bottom surface of the substrate 110 . When the packaging material layer covers the chip 20 , the first clip 51 and the second clip 52 , the pin portions 512 and 522 of the first clip 51 and the second clip 52 are exposed outside the packaging material layer 40 . Therefore, the welding between the clip and the contact portion can be avoided, which not only simplifies the manufacturing process, solves the problem of increased resistance caused by welding, but also improves the heat dissipation effect.
类似地,如图3B所示,第一夹片51及第二夹片52不仅接脚部512及522裸露于封装材料层40’的下表面,第一夹片51及第二夹片52的顶表面516及526也部分裸露于封装材料层40’的上表面,使得散热效果更加提升。Similarly, as shown in FIG. 3B , not only the pin portions 512 and 522 of the first clip 51 and the second clip 52 are exposed on the lower surface of the packaging material layer 40 ′, but also the first clip 51 and the second clip 52 The top surfaces 516 and 526 are also partially exposed on the upper surface of the packaging material layer 40 ′, so that the heat dissipation effect is further improved.
于另一实施例,如图4及图4A所示,与图3的差别在于,半导体装置4的第三夹片61及第四夹片62取代图3的第一导线33及第二导线34,并分别具有接脚部,以作为半导体装置4的接脚。由此,可免除夹片与接触部的焊接,不仅简化制程,解决焊接造成电阻增加的问题,亦可提升散热效果。In another embodiment, as shown in FIG. 4 and FIG. 4A , the difference from FIG. 3 is that the third clip 61 and the fourth clip 62 of the semiconductor device 4 replace the first wire 33 and the second wire 34 of FIG. 3 , and respectively have pin portions as pins of the semiconductor device 4 . Therefore, the welding between the clip and the contact portion can be avoided, which not only simplifies the manufacturing process, solves the problem of increased resistance caused by welding, but also improves the heat dissipation effect.
类似图4B所示,第三夹片61及第四夹片62不仅接脚部可裸露于封装材料层40’的下表面,第三夹片61及第四夹片62的顶表面也部分裸露于封装材料层40’的上表面,使得散热效果更加提升。As shown in FIG. 4B , not only the pins of the third clip 61 and the fourth clip 62 can be exposed on the lower surface of the packaging material layer 40 ′, but the top surfaces of the third clip 61 and the fourth clip 62 are also partially exposed. On the upper surface of the encapsulation material layer 40 ′, the heat dissipation effect is further improved.
本实用新型已由上述实施例加以描述,然而上述实施例仅为例示目的而非用于限制。本领域技术人员当知在不悖离本实用新型精神下,于此特别说明的实施例可有例示实施例的其他修改。因此,本实用新型范畴亦涵盖此类修改且仅由所附权利要求限制。The utility model has been described by the above-mentioned embodiments, but the above-mentioned embodiments are only for illustration purposes and not for limitation. Those skilled in the art will appreciate that other modifications of the illustrated embodiments can be made to the embodiments specifically described herein without departing from the spirit of the present invention. Accordingly, the scope of the present invention also covers such modifications and is limited only by the appended claims.
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