CN206839413U - Dual-wavelength laser marking machine - Google Patents
Dual-wavelength laser marking machine Download PDFInfo
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- CN206839413U CN206839413U CN201720439550.2U CN201720439550U CN206839413U CN 206839413 U CN206839413 U CN 206839413U CN 201720439550 U CN201720439550 U CN 201720439550U CN 206839413 U CN206839413 U CN 206839413U
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- laser
- eyeglass
- focus lamp
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Abstract
A kind of dual-wavelength laser marking machine, including first laser device, second laser, the first beam expander, the second beam expander, the first eyeglass, the second eyeglass, scanning galvanometer and focus lamp；Above-mentioned dual-wavelength laser marking machine, first laser device and second laser can export laser simultaneously, pass through the first beam expander and the second beam expander respectively, after two beams are swashed into combiner by the first eyeglass and the second eyeglass again, import the scanning galvanometer with dual wavelength total reflection plated film, line focus mirror focuses on, by a set of control software and hardware, so as to realize the function with dual-wavelength laser mark.Two lasers can work simultaneously, also can work independently, and switch different laser optical paths by electricity control, it may not be necessary to change marking device, you can different wave length laser index carving is realized, it is simple to operate.
Description
Technical field
It the utility model is related to laser mark printing device, more particularly to a kind of dual-wavelength laser marking machine.
Background technology
Laser marking machine (laser marking machine) is stamped forever in a variety of material surfaces with laser beam
Long mark.The effect of mark is to expose deep layer material by the evaporation of entry material, so as to carve fineness pattern, trade mark and
Word, laser marking machine are broadly divided into, CO2Laser marking machine, semiconductor laser marking, laser marking machine and YAG swash
Light marking machine.When traditional laser marking machine needs to carry out mark using the laser of different wave length, it usually needs change mark dress
Put, operation is more troublesome.
Utility model content
In consideration of it, it is necessary to provide a kind of operation relatively simple dual-wavelength laser marking machine.
A kind of dual-wavelength laser marking machine, including first laser device, second laser, the first beam expander, the second beam expander,
First eyeglass, the second eyeglass, scanning galvanometer and focus lamp；
The first laser of the first laser device transmitting is emitted to first eyeglass by first beam expander, described
First laser is emitted to the scanning galvanometer through first eyeglass, is emitted to after scanning galvanometer reflection described poly-
Jiao Jing, and focused on by the focus lamp；
The second laser of the second laser transmitting is emitted to second eyeglass by second beam expander, described
Second laser is by being emitted to first eyeglass after the second lens reflecting, then by being emitted to institute after first lens reflecting
Scanning galvanometer is stated, is emitted to the focus lamp after scanning galvanometer reflection, and focus on by the focus lamp；
Wherein, two surfaces of first eyeglass are coated with the anti-reflection film matched with the first laser, and described first
The surface that eyeglass receives the second laser irradiation is also coated with the reflectance coating matched with the second laser；
The surface that second eyeglass receives the second laser irradiation is coated with the reflectance coating matched with the second laser；
In the scanning galvanometer, X reflecting optics plate double to the first laser and the second laser with Y reflecting optics
45 ° of films that are all-trans of wavelength；
The first laser device is solid ultraviolet laser, and the second laser is solid fiber laser；Or
The first laser device is solid fiber laser, and the second laser is solid ultraviolet laser.
In one of the embodiments, the transmission direction of the first laser of the first laser device transmitting and first mirror
Piece is in 45 ° of angles, and the transmission direction for the second laser that the second laser is sent and second eyeglass are in 45 ° of angles, institute
State the first eyeglass and second eyeglass be arranged in parallel.
In one of the embodiments, the focus lamp is pair that surface is coated with the first laser and the second laser
The focus lamp of wavelength anti-reflection film.
In one of the embodiments, the focus lamp is the focus lamp of two single wavelengths, in different laser lists
When being solely operated, it is focused by the focus lamp for switching different.
A kind of dual-wavelength laser marking machine, including first laser device, second laser, the first beam expander, the second beam expander,
First eyeglass, scanning galvanometer and focus lamp；
The first laser of the first laser device transmitting is emitted to first eyeglass by first beam expander, described
First laser is emitted to the scanning galvanometer through first eyeglass, is emitted to after scanning galvanometer reflection described poly-
Jiao Jing, and focused on by the focus lamp；
The second laser of the second laser transmitting is emitted to first eyeglass by second beam expander, then leads to
The scanning galvanometer is emitted to after crossing first lens reflecting, the focusing is emitted to after scanning galvanometer reflection
Mirror, and focused on by the focus lamp；
Wherein, two surfaces of first eyeglass are coated with the anti-reflection film matched with the first laser, and described first
The surface that eyeglass receives the second laser irradiation is coated with the reflectance coating matched with the second laser；
In the scanning galvanometer, X reflecting optics are coated with to the first laser and the second laser with Y reflecting optics
45 ° of films that are all-trans of dual wavelength；
The first laser device is solid ultraviolet laser, and the second laser is solid fiber laser；Or
The first laser device is solid fiber laser, and the second laser is solid ultraviolet laser.
In one of the embodiments, the first laser device and the second laser vertical output laser.
In one of the embodiments, the focus lamp is pair that surface is coated with the first laser and the second laser
The focus lamp of wavelength anti-reflection film.
In one of the embodiments, the focus lamp is the focus lamp of two single wavelengths, in different laser lists
When being solely operated, it is focused by the focus lamp for switching different.
Above-mentioned dual-wavelength laser marking machine, first laser device and second laser can export laser simultaneously, respectively by
One beam expander and the second beam expander, then by the first eyeglass and the second eyeglass by after the sharp combiner of two beams, importing has dual wavelength complete
The scanning galvanometer of plated film is reflected, line focus mirror focuses on, by a set of control software and hardware, so as to realize with dual-wavelength laser
The function of mark.Two lasers can work simultaneously, also can work independently, and switch different laser lights by electricity control
Road, it may not be necessary to change marking device, you can different wave length laser light marking is realized, it is simple to operate.
Brief description of the drawings
Fig. 1 is the structural representation of the dual-wavelength laser marking machine of first embodiment.
Embodiment
In order that the purpose of this utility model, technical scheme and advantage become apparent from, it is right below in conjunction with drawings and Examples
The utility model is further elaborated.It should be appreciated that specific embodiment described herein is only explaining this reality
With new, it is not used to limit the utility model.
Referring to Fig. 1, the dual-wavelength laser marking machine 100 of first embodiment, including first laser device 10, second laser
Device 20, the first beam expander 30, the second beam expander 40, the first eyeglass 50, the second eyeglass 60, scanning galvanometer 70 and focus lamp 80.
First laser device 10 launches first laser.Second laser 20 launches second laser.First laser device 10 is solid
Ultraviolet laser, second laser 20 are solid fiber laser；Or first laser device 10 is solid fiber laser, second swashs
Light device 20 is solid ultraviolet laser.A transmitting Ultra-Violet Laser i.e. in first laser device 10 and second laser 20, it is another
Individual transmitting infrared laser.In the present embodiment, the output laser parallel with second laser 20 of first laser device 10.
First beam expander 30, the second beam expander 40, carry out expanding calibration to first laser and second laser respectively.Specifically
, the focal length of wherein one light path is first calibrated, then by adjusting the beam expander of another laser optical path come calibrated focal length.
Two surfaces of the first eyeglass 50 are coated with the anti-reflection film matched with first laser, and the first eyeglass 50 receives second and swashed
The surface of light irradiation is also coated with the reflectance coating matched with second laser.The surface that second eyeglass 60 receives second laser irradiation is coated with
The reflectance coating matched with second laser.
The transmission direction for the first laser that first laser device 10 is launched and the first eyeglass 50 are in 45 ° of angles, second laser
The transmission direction of 20 second lasers sent and the second eyeglass 60 are in 45 ° of angles, and the first eyeglass 50 is parallel with the second eyeglass 60 to be set
Put.
When first laser device 10 is solid ultraviolet laser, and second laser 20 is solid fiber laser, the first mirror
Two surfaces of piece 50 are coated with the anti-reflection film matched with Ultra-Violet Laser, and the first eyeglass 50 receives the surface plating of infrared laser irradiation
There is the reflectance coating matched with infrared laser.The surface that second eyeglass 60 receives infrared laser irradiation is coated with what is matched with infrared laser
Reflectance coating.Specifically, wherein for Ultra-Violet Laser by the first eyeglass 50 with Ultra-Violet Laser angle at 45 °, another way is infrared all the way
Laser passes through second eyeglass 60 at 45 ° with infrared laser, and infrared laser is reflexed into the first eyeglass 50.The one side of first eyeglass 50
Be coated with to 45 ° of anti-reflection films of Ultra-Violet Laser, another side be coated with to 45 ° of anti-reflection films of Ultra-Violet Laser with to 45 ° of high-reflecting films of infrared laser, the
Two eyeglasses 60 are coated with to 45 ° of high-reflecting films of infrared laser, and two beams are swashed into combiner so as to realize.
In scanning galvanometer 70, X reflecting optics and Y reflecting optics are coated with to first laser and second laser dual wavelength
45 ° of films that are all-trans.
Focus lamp 80 can be the focus lamp for the dual wavelength anti-reflection film that surface is coated with first laser and second laser.Focus lamp
80 can also be the focus lamp of two single wavelengths, when different lasers is individually operated, by switching different gather
Burnt mirror is focused, now, without the first beam expander 30 and the second beam expanding lens 40 regulation calibrated focal length.
The first laser that first laser device 10 is launched is emitted to the first eyeglass 50 by the first beam expander 30, and first laser is saturating
Cross the first eyeglass 50 and be emitted to scanning galvanometer 70, be scanned through being emitted to focus lamp 80 after galvanometer 70 reflects, and pass through focus lamp
80 focus on.The second laser that second laser 20 is launched is emitted to the second eyeglass 60 by the second beam expander 40, and second laser is led to
The first eyeglass 50 is emitted to after crossing the reflection of the second eyeglass 60, then scanning galvanometer 70 is emitted to after being reflected by the first eyeglass 50, is passed through
Overscanning galvanometer 70 is emitted to focus lamp 80 after reflecting, and is focused on by focus lamp 80.
It is appreciated that first laser device 10 is not limited to parallel output laser with second laser 20.In the second embodiment party
In formula, first laser device 10 and second laser 20 can also vertical output laser.Now, the structure of dual-wavelength laser marking machine
Essentially identical with the structure of the dual-wavelength laser marking machine 100 of first embodiment, difference is, second embodiment
First laser device 10 and the vertical output laser of second laser 20 in dual-wavelength laser marking machine, and the second eyeglass 60 is omitted, directly
Connect and the laser that second laser 20 is launched is exposed into the first eyeglass 50, after being reflected by the first eyeglass 50, you can swash two beams
Combiner.
The dual-wavelength laser marking machine of first embodiment and second embodiment, first laser device 10 and second laser
20, laser can be exported simultaneously, respectively by the first beam expander 30 and the second beam expander 40, then by the first eyeglass 50 by two beam laser
After closing beam, import the scanning galvanometer 70 with dual wavelength total reflection plated film, line focus mirror 80 focuses on, by a set of control software and
Hardware, so as to realize the function with dual-wavelength laser mark.Two Hes of laser 10 of above-mentioned dual-wavelength laser marking machine 100
20 can work simultaneously, also can work independently, and switch different laser optical paths by electricity control, it may not be necessary to change mark
Device, you can different wave length laser light marking is realized, it is simple to operate.
Above-mentioned dual-wavelength laser marking machine 100, it is not necessary to dynamic focus control, it is simple in construction.When focus lamp 80 uses table
It is another by the focal length of fixed beam of laser when face is coated with the focus lamp of the dual wavelength anti-reflection film of first laser and second laser
Shu Jiguang is adjusted by adjustable beam expander；When the focus lamp of two single wavelengths of use of focus lamp 80, in different laser
When device is individually operated, it is focused by the focus lamp for switching different, now, is expanded without the first beam expander 30 and second
Mirror 40 adjusts calibrated focal length.
It the above is only preferred embodiment of the present utility model, it is noted that for the ordinary skill people of the art
Member, on the premise of the utility model principle is not departed from, can also make some improvements and modifications, and these improvements and modifications also should
It is considered as the scope of protection of the utility model.
Claims (8)
1. a kind of dual-wavelength laser marking machine, it is characterised in that including first laser device, second laser, the first beam expander,
Two beam expanders, the first eyeglass, the second eyeglass, scanning galvanometer and focus lamp；
The first laser of first laser device transmitting is emitted to first eyeglass by first beam expander, and described first
The first eyeglass is emitted to the scanning galvanometer described in laser light, and the focusing is emitted to after scanning galvanometer reflection
Mirror, and focused on by the focus lamp；
The second laser of second laser transmitting is emitted to second eyeglass by second beam expander, and described second
Laser is by being emitted to first eyeglass after the second lens reflecting, then by being emitted to described sweep after first lens reflecting
Galvanometer is retouched, is emitted to the focus lamp after scanning galvanometer reflection, and focus on by the focus lamp；
Wherein, two surfaces of first eyeglass are coated with the anti-reflection film matched with the first laser, first eyeglass
The surface for receiving the second laser irradiation is also coated with the reflectance coating matched with the second laser；
The surface that second eyeglass receives the second laser irradiation is coated with the reflectance coating matched with the second laser；
In the scanning galvanometer, X reflecting optics are plated to the first laser and the second laser dual wavelength with Y reflecting optics
45 ° of films that are all-trans；
The first laser device is solid ultraviolet laser, and the second laser is solid fiber laser；Or
The first laser device is solid fiber laser, and the second laser is solid ultraviolet laser.
2. dual-wavelength laser marking machine as claimed in claim 1, it is characterised in that the first of the first laser device transmitting swashs
The transmission direction of light and first eyeglass are in 45 ° of angles, the transmission direction for the second laser that the second laser is sent and
Second eyeglass is in 45 ° of angles, and first eyeglass and second eyeglass be arranged in parallel.
3. dual-wavelength laser marking machine as claimed in claim 1, it is characterised in that the focus lamp is that surface is coated with described the
The focus lamp of one laser and the dual wavelength anti-reflection film of the second laser.
4. dual-wavelength laser marking machine as claimed in claim 1, it is characterised in that the focus lamp is two single wavelengths
Focus lamp, when different lasers is individually operated, it is focused by the focus lamp for switching different.
5. a kind of dual-wavelength laser marking machine, it is characterised in that including first laser device, second laser, the first beam expander,
Two beam expanders, the first eyeglass, scanning galvanometer and focus lamp；
The first laser of first laser device transmitting is emitted to first eyeglass by first beam expander, and described first
The first eyeglass is emitted to the scanning galvanometer described in laser light, and the focusing is emitted to after scanning galvanometer reflection
Mirror, and focused on by the focus lamp；
The second laser of the second laser transmitting is emitted to first eyeglass by second beam expander, then passes through institute
The scanning galvanometer is emitted to after stating the first lens reflecting, the focus lamp is emitted to after scanning galvanometer reflection, and
Focused on by the focus lamp；
Wherein, two surfaces of first eyeglass are coated with the anti-reflection film matched with the first laser, first eyeglass
The surface for receiving the second laser irradiation is coated with the reflectance coating matched with the second laser；
In the scanning galvanometer, X reflecting optics are coated with to the first laser and the second laser double wave with Y reflecting optics
45 ° of long films that are all-trans；
The first laser device is solid ultraviolet laser, and the second laser is solid fiber laser；Or
The first laser device is solid fiber laser, and the second laser is solid ultraviolet laser.
6. dual-wavelength laser marking machine as claimed in claim 5, it is characterised in that the first laser device and described second swashs
Light device vertical output laser.
7. dual-wavelength laser marking machine as claimed in claim 5, it is characterised in that the focus lamp is that surface is coated with described the
The focus lamp of one laser and the dual wavelength anti-reflection film of the second laser.
8. dual-wavelength laser marking machine as claimed in claim 5, it is characterised in that the focus lamp is two single wavelengths
Focus lamp, when different lasers is individually operated, it is focused by the focus lamp for switching different.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720439550.2U CN206839413U (en) | 2017-04-24 | 2017-04-24 | Dual-wavelength laser marking machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720439550.2U CN206839413U (en) | 2017-04-24 | 2017-04-24 | Dual-wavelength laser marking machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206839413U true CN206839413U (en) | 2018-01-05 |
Family
ID=60793806
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720439550.2U Expired - Fee Related CN206839413U (en) | 2017-04-24 | 2017-04-24 | Dual-wavelength laser marking machine |
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| Country | Link |
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| CN (1) | CN206839413U (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109759693A (en) * | 2019-03-14 | 2019-05-17 | 广州新可激光设备有限公司 | An optimized dual-laser marking equipment |
| CN110125096A (en) * | 2019-06-06 | 2019-08-16 | 哈尔滨工业大学 | A kind of laser composite cleaning system and method |
| CN111531279A (en) * | 2020-05-29 | 2020-08-14 | 青岛星成激光科技有限公司 | Metal surface colorful frosting processing method |
| CN112756938A (en) * | 2021-01-20 | 2021-05-07 | 深圳市鑫镭创科自动化科技有限公司 | Double-beam laser screen-disassembling method and device based on mobile phone software control |
| CN113030264A (en) * | 2021-03-22 | 2021-06-25 | 上海航天设备制造总厂有限公司 | 3D prints quick synchronous scanning device of many galvanometers that shakes of online defect detection |
| CN113340814A (en) * | 2021-05-20 | 2021-09-03 | 武汉大学 | Material increase manufacturing laser ultrasonic online detection device and method based on receiving coaxiality |
-
2017
- 2017-04-24 CN CN201720439550.2U patent/CN206839413U/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109759693A (en) * | 2019-03-14 | 2019-05-17 | 广州新可激光设备有限公司 | An optimized dual-laser marking equipment |
| CN110125096A (en) * | 2019-06-06 | 2019-08-16 | 哈尔滨工业大学 | A kind of laser composite cleaning system and method |
| CN110125096B (en) * | 2019-06-06 | 2021-08-06 | 哈尔滨工业大学 | A laser compound cleaning system and method |
| CN111531279A (en) * | 2020-05-29 | 2020-08-14 | 青岛星成激光科技有限公司 | Metal surface colorful frosting processing method |
| CN112756938A (en) * | 2021-01-20 | 2021-05-07 | 深圳市鑫镭创科自动化科技有限公司 | Double-beam laser screen-disassembling method and device based on mobile phone software control |
| CN112756938B (en) * | 2021-01-20 | 2022-05-06 | 深圳市鑫镭创科自动化科技有限公司 | Double-beam laser screen-disassembling method and device based on mobile phone software control |
| CN113030264A (en) * | 2021-03-22 | 2021-06-25 | 上海航天设备制造总厂有限公司 | 3D prints quick synchronous scanning device of many galvanometers that shakes of online defect detection |
| CN113340814A (en) * | 2021-05-20 | 2021-09-03 | 武汉大学 | Material increase manufacturing laser ultrasonic online detection device and method based on receiving coaxiality |
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| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
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| CF01 | Termination of patent right due to non-payment of annual fee |