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CN205376562U - Refraction luminous device - Google Patents

Refraction luminous device Download PDF

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Publication number
CN205376562U
CN205376562U CN201620066500.XU CN201620066500U CN205376562U CN 205376562 U CN205376562 U CN 205376562U CN 201620066500 U CN201620066500 U CN 201620066500U CN 205376562 U CN205376562 U CN 205376562U
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layer
light
compound layer
quantum well
emitting
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Chinese (zh)
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牛宝
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Hebei Yibei Information Technology Co Ltd
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Hebei Yibei Information Technology Co Ltd
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Abstract

一种折射光源发光器件,包括硅衬底具有一个上表面,上表面具有凹槽,凹槽内设置有半导体层,半导体层依次设置缓冲层反射层,掺杂的下化合物层,量子阱层,上化合物层,上电极设置在上化合物层上,下电极设置在下化合物层上,分别设置在槽体两侧,量子阱层下部设置的下化合物层和量子阱层上部设置的上化合物层是导电的,分别连接下上电极,整体作为发光层。凹槽内发光层内侧设置有圆弧状棱镜体,将发光层所发出的光线整合,缓冲层包括高温缓冲层和低温缓冲层。本实用新型通过棱镜的设置克服了,传统发光器件光源效果不佳的问题。

A refraction light source light-emitting device, comprising a silicon substrate with an upper surface, the upper surface has a groove, a semiconductor layer is arranged in the groove, and the semiconductor layer is sequentially arranged with a buffer layer, a reflective layer, a doped lower compound layer, a quantum well layer, On the upper compound layer, the upper electrode is set on the upper compound layer, and the lower electrode is set on the lower compound layer, which are respectively set on both sides of the tank body. The lower compound layer set under the quantum well layer and the upper compound layer set above the quantum well layer are conductive. The lower and upper electrodes are respectively connected, and the whole is used as a light-emitting layer. Arc-shaped prisms are arranged inside the light-emitting layer in the groove to integrate the light emitted by the light-emitting layer, and the buffer layer includes a high-temperature buffer layer and a low-temperature buffer layer. The utility model overcomes the problem of poor light source effect of traditional light-emitting devices through the arrangement of prisms.

Description

一种折射光源发光器件A refraction light source light emitting device

技术领域technical field

本实用新型属于半导体领域,更具体的说本实用新型涉及一种半导体发光器件。The utility model belongs to the field of semiconductors, more specifically the utility model relates to a semiconductor light emitting device.

背景技术Background technique

固态光源,例如发光二极管(LED)和激光二极管,比白炽灯或荧光灯等形式的照明具有显著的优势。将红色,绿色和蓝色三种原色以合理阵列形式布置,可以调节作为白光或彩色光源。此时,固态光源是通常更有效,并比传统的白炽灯或荧光灯产生更少的热量。固态照明技术虽然在技术上具有一定的优势,但现有的半导体结构和器件用于固态照明费用相对昂贵。传统的固态光源是通过在诸如碳化硅或蓝宝石之类的衬底上设置发光材料层来实现发光。Solid-state light sources, such as light-emitting diodes (LEDs) and laser diodes, offer significant advantages over forms of lighting such as incandescent or fluorescent lamps. The three primary colors of red, green and blue are arranged in a reasonable array, which can be adjusted as a white or colored light source. At this point, solid-state light sources are generally more efficient and generate less heat than traditional incandescent or fluorescent lights. Although solid-state lighting technology has certain technical advantages, the existing semiconductor structures and devices are relatively expensive for solid-state lighting. Traditional solid-state light sources emit light by placing a layer of luminescent material on a substrate such as silicon carbide or sapphire.

实用新型内容Utility model content

本实用新型提供了一种新型的折射光源发光器件,通过器件表面的透镜的设置,可以有效改善光线效果。The utility model provides a novel refraction light source light-emitting device, which can effectively improve the light effect through the arrangement of the lens on the surface of the device.

一种折射光源发光器件,包括硅衬底具有一个上表面,上表面具有凹槽,凹槽内设置有半导体层,半导体层依次设置缓冲层反射层,掺杂的下化合物层,量子阱层,上化合物层,上电极设置在上化合物层上,下电极设置在下化合物层上,分别设置在槽体两侧,A refraction light source light-emitting device, comprising a silicon substrate with an upper surface, the upper surface has a groove, a semiconductor layer is arranged in the groove, and the semiconductor layer is sequentially arranged with a buffer layer, a reflective layer, a doped lower compound layer, a quantum well layer, The upper compound layer, the upper electrode is arranged on the upper compound layer, and the lower electrode is arranged on the lower compound layer, respectively arranged on both sides of the tank body,

量子阱层下部设置的下化合物层和量子阱层上部设置的上化合物层是导电的,分别连接下上电极,整体作为发光层。The lower compound layer arranged under the quantum well layer and the upper compound layer arranged above the quantum well layer are conductive, respectively connected to the lower and upper electrodes, and serve as a light-emitting layer as a whole.

凹槽内发光层内侧设置有圆弧状棱镜体,将发光层所发出的光线整合,缓冲层包括高温缓冲层和低温缓冲层。Arc-shaped prisms are arranged inside the light-emitting layer in the groove to integrate the light emitted by the light-emitting layer, and the buffer layer includes a high-temperature buffer layer and a low-temperature buffer layer.

缓冲层,反射层和量子阱层可使用原子层沉积来形成,金属有机化学气相沉积,等离子体增强化学气相沉积,化学气相沉积或物理气相沉积。掺杂下化合物层和上化合物层可以通过沉积形成。The buffer layer, reflective layer and quantum well layer can be formed using atomic layer deposition, metal organic chemical vapor deposition, plasma enhanced chemical vapor deposition, chemical vapor deposition or physical vapor deposition. Doping the lower compound layer and the upper compound layer may be formed by deposition.

发射光时,电压通过分别连接在掺杂下化合物层和上化合物层的下部和上部电极施加。电流通过量子阱层产生发光。When light is emitted, a voltage is applied through the lower and upper electrodes connected to the doped lower compound layer and the upper compound layer, respectively. Current passing through the quantum well layer produces light emission.

下化合物层和上化合物层可以是n掺杂的,而另一个p掺杂。所公开的结构可适合用于发射绿色,蓝色和其他颜色的灯。The lower compound layer and the upper compound layer may be n-doped and the other p-doped. The disclosed structures are suitable for use with green, blue and other colored lamps.

本实用新型通过棱镜的设置克服了,传统发光器件光源效果不佳的问题。The utility model overcomes the problem of poor light source effect of traditional light-emitting devices through the arrangement of prisms.

附图说明Description of drawings

图1为本实用新型剖视图。Fig. 1 is a sectional view of the utility model.

图2为本实用新型半导体层结构图。Fig. 2 is a structure diagram of the semiconductor layer of the present invention.

具体实施方式detailed description

一种折射光源发光器件,包括硅衬底5具有一个上表面,上表面具有凹槽,凹槽内设置有半导体层2,半导体层2依次设置缓冲层231反射层232,下化合物层240,量子阱层250,上化合物层260,上电极1设置在上化合物层260上,下电极4设置在下化合物层240上,分别设置在槽体两侧,A refraction light source light-emitting device, comprising a silicon substrate 5 with an upper surface, the upper surface has a groove, a semiconductor layer 2 is arranged in the groove, a buffer layer 231, a reflective layer 232, a lower compound layer 240, and a quantum The well layer 250, the upper compound layer 260, the upper electrode 1 is arranged on the upper compound layer 260, and the lower electrode 4 is arranged on the lower compound layer 240, respectively arranged on both sides of the tank body,

量子阱层250下部设置的下化合物层240,量子阱层250,上部设置的上化合物层260是导电的,分别连接下上电极,整体作为发光层。The lower compound layer 240 and the quantum well layer 250 disposed on the lower part of the quantum well layer 250, and the upper compound layer 260 disposed on the upper part are conductive, respectively connected to the lower and upper electrodes, and serve as a light-emitting layer as a whole.

凹槽内发光层内侧设置有圆弧状棱镜体,将发光层所发出的光线整合,缓冲层包括高温缓冲层和低温缓冲层,Arc-shaped prisms are arranged inside the light-emitting layer in the groove to integrate the light emitted by the light-emitting layer. The buffer layer includes a high-temperature buffer layer and a low-temperature buffer layer.

缓冲层,反射层和量子阱层可使用原子层沉积来形成,金属有机化学气相沉积,等离子体增强化学气相沉积,化学气相沉积或物理气相沉积。掺杂下化合物层240和上化合物层260可以通过沉积形成。The buffer layer, reflective layer and quantum well layer can be formed using atomic layer deposition, metal organic chemical vapor deposition, plasma enhanced chemical vapor deposition, chemical vapor deposition or physical vapor deposition. The doped lower compound layer 240 and the upper compound layer 260 may be formed by deposition.

发射光时,电压通过分别连接在掺杂下化合物层240和上化合物层260的下部和上部电极施加。电流通过量子阱层250产生发光。When light is emitted, a voltage is applied through the lower and upper electrodes connected to the doped lower compound layer 240 and the upper compound layer 260, respectively. Current passes through the quantum well layer 250 to generate light.

下化合物层和上化合物层可以是n掺杂的,而另一个p掺杂。所公开的结构可适合用于发射绿色,蓝色和其他颜色的灯。The lower compound layer and the upper compound layer may be n-doped and the other p-doped. The disclosed structures are suitable for use with green, blue and other colored lamps.

需要注意的是,而本领域人员所进行的改动和变化不脱离本实用新型的精神和范围,则都应在本实用新型所附权利要求的保护范围内。It should be noted that changes and changes made by those skilled in the art do not depart from the spirit and scope of the utility model, and should all be within the protection scope of the appended claims of the utility model.

Claims (3)

1.一种折射光源发光器件,包括硅衬底具有一个上表面,其特征在于,上表面具有凹槽,凹槽内设置有半导体层,半导体层依次设置缓冲层反射层,掺杂的下化合物层,量子阱层,上化合物层,上电极设置在上化合物层上,下电极设置在下化合物层上,分别设置在槽体两侧,量子阱层下部设置的下化合物层和量子阱层上部设置的上化合物层是导电的,分别连接下上电极,整体作为发光层,凹槽内发光层内侧设置有圆弧状棱镜体。1. A refraction light source light-emitting device, comprising a silicon substrate with an upper surface, is characterized in that the upper surface has a groove, and a semiconductor layer is arranged in the groove, and the semiconductor layer is successively provided with a buffer layer reflective layer, and the doped lower compound Layer, quantum well layer, upper compound layer, the upper electrode is set on the upper compound layer, the lower electrode is set on the lower compound layer, respectively set on both sides of the tank body, the lower compound layer set on the lower part of the quantum well layer and the upper part of the quantum well layer set The upper compound layer is conductive, respectively connected to the lower and upper electrodes, and the whole is used as a light-emitting layer, and an arc-shaped prism is arranged inside the light-emitting layer in the groove. 2.如权利要求1所述的一种折射光源发光器件,其特征在于:缓冲层包括高温缓冲层和低温缓冲层。2. A refractive light source light-emitting device according to claim 1, wherein the buffer layer comprises a high-temperature buffer layer and a low-temperature buffer layer. 3.如权利要求1所述的一种折射光源发光器件,其特征在于:缓冲层,反射层和量子阱层可使用原子层沉积、金属有机化学气相沉积,等离子体增强化学气相沉积,化学气相沉积或物理气相沉积来形成。3. A kind of refraction light source light-emitting device as claimed in claim 1, it is characterized in that: buffer layer, reflection layer and quantum well layer can use atomic layer deposition, metal organic chemical vapor deposition, plasma enhanced chemical vapor deposition, chemical vapor phase deposition deposition or physical vapor deposition.
CN201620066500.XU 2016-01-25 2016-01-25 Refraction luminous device Expired - Fee Related CN205376562U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201620066500.XU CN205376562U (en) 2016-01-25 2016-01-25 Refraction luminous device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201620066500.XU CN205376562U (en) 2016-01-25 2016-01-25 Refraction luminous device

Publications (1)

Publication Number Publication Date
CN205376562U true CN205376562U (en) 2016-07-06

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Country Status (1)

Country Link
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Granted publication date: 20160706