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CN204257687U - A kind of light emitting diode construction - Google Patents

A kind of light emitting diode construction Download PDF

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Publication number
CN204257687U
CN204257687U CN201420755635.8U CN201420755635U CN204257687U CN 204257687 U CN204257687 U CN 204257687U CN 201420755635 U CN201420755635 U CN 201420755635U CN 204257687 U CN204257687 U CN 204257687U
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light
emitting diode
electrode
semiconductor layer
light emitting
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彭康伟
林素慧
许圣贤
林潇雄
刘传桂
郑建森
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Quanzhou Sanan Semiconductor Technology Co Ltd
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Xiamen Sanan Optoelectronics Technology Co Ltd
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Abstract

本实用新型提出了一种发光二极管结构,通过N电极区域设有表面粗糙的凹槽结构,从而增加发光面积,改变全反射临界角,减少了发生全反射现象,以达到提升发光二极管的光萃取效率;通过在表面粗糙的凹槽结构上形成N电极,可以增加电极与凹槽结构的接触面积,从而增加电极粘附性,提高发光二极管的可靠性。

The utility model proposes a light-emitting diode structure, which is provided with a rough groove structure in the N electrode area, thereby increasing the light-emitting area, changing the critical angle of total reflection, and reducing the occurrence of total reflection, so as to improve the light extraction of the light-emitting diode Efficiency: By forming the N electrode on the groove structure with rough surface, the contact area between the electrode and the groove structure can be increased, thereby increasing the adhesion of the electrode and improving the reliability of the light emitting diode.

Description

一种发光二极管结构A light emitting diode structure

技术领域 technical field

本实用新型涉及半导体技术领域,尤其是一种可以增加出光面积、提高光萃取效率的发光二极管结构。 The utility model relates to the technical field of semiconductors, in particular to a light emitting diode structure which can increase the light output area and improve the light extraction efficiency.

背景技术 Background technique

发光二极管(英文为Light Emitting Diode,简称LED)是半导体二极管的一种,它能将电能转化为光能,发出黄、绿、蓝等各种颜色的可见光及红外和紫外不可见光。 Light Emitting Diode (English for Light Emitting Diode, LED for short) is a kind of semiconductor diode, which can convert electrical energy into light energy, and emit visible light of various colors such as yellow, green, and blue, as well as infrared and ultraviolet invisible light.

如图1所示,在常规正装发光二极管结构中,包括基板100,由下往上堆叠的N型层101、发光区102、P型层103、电流扩展层105、P电极106以及设置在裸露的N型层107表面上的N电极106。由于N电极区域107是平面结构,不利于光导出,且光滑平面会增加发生全反射机率,限制了光的萃取效率。 As shown in FIG. 1 , in a conventional front-mount light-emitting diode structure, it includes a substrate 100, an N-type layer 101 stacked from bottom to top, a light-emitting region 102, a P-type layer 103, a current spreading layer 105, a P-electrode 106, and an exposed N-electrode 106 on the surface of N-type layer 107 . Since the N electrode region 107 has a planar structure, it is not conducive to light extraction, and a smooth surface will increase the probability of total reflection, which limits the light extraction efficiency.

发明内容 Contents of the invention

为解决上述现有技术中存在的问题,本实用新型提出一种发光二极管结构。 In order to solve the above-mentioned problems in the prior art, the utility model proposes a light emitting diode structure.

本实用新型解决其技术问题所采用的技术方案是:一种发光二极管结构,包括:由第一半导体层、第二半导体层及夹在两层之间的量子阱层组成的发光外延层,以及位于第二半导体层上的P电极、位于第一半导体层上的N电极,其特征在于:所述N电极区域设有表面粗糙的凹槽结构。 The technical solution adopted by the utility model to solve the technical problem is: a light-emitting diode structure, including: a light-emitting epitaxial layer composed of a first semiconductor layer, a second semiconductor layer and a quantum well layer sandwiched between the two layers, and The P electrode on the second semiconductor layer and the N electrode on the first semiconductor layer are characterized in that: the N electrode region is provided with a rough groove structure.

优选地,所述凹槽结构呈上宽下窄。 Preferably, the groove structure is wide at the top and narrow at the bottom.

优选地,所述凹槽结构的粗糙表面由若干个凹/凸透镜组成。 Preferably, the rough surface of the groove structure is composed of several concave/convex lenses.

优选地,所述凹/凸透镜呈周期性规则分布或者随机分布。 Preferably, the concave/convex lenses are distributed regularly or randomly.

优选地,所述凹槽结构为沿第二半导体层表面向下贯穿至第一半导体层内部。 Preferably, the groove structure penetrates down to the inside of the first semiconductor layer along the surface of the second semiconductor layer.

优选地,所述凹槽结构仅形成于第一半导体层。 Preferably, the groove structure is only formed on the first semiconductor layer.

优选地,在所述P电极与发光外延层之间形成电流扩展层。 Preferably, a current spreading layer is formed between the P electrode and the light emitting epitaxial layer.

优选地,所述发光外延层为氮化镓基半导体层,其发射的光波波长小于500nm。 Preferably, the light-emitting epitaxial layer is a gallium nitride-based semiconductor layer, and the wavelength of light emitted by it is less than 500nm.

与现有技术相比,本实用新型的有益效果包括且不局限于: Compared with the prior art, the beneficial effects of the utility model include and are not limited to:

本实用新型通过N电极区域设有表面粗糙的凹槽结构,从而增加发光面积,改变全反射临界角,减少了发生全反射现象,以达到提升发光二极管的光萃取效率;通过在表面粗糙的凹槽结构上形成N电极,可以增加电极与凹槽结构的接触面积,从而增加电极粘附性,提高发光二极管的可靠性。 The utility model is provided with a rough groove structure in the N electrode area, thereby increasing the luminous area, changing the critical angle of total reflection, and reducing the occurrence of total reflection, so as to improve the light extraction efficiency of the light-emitting diode; Forming the N electrode on the groove structure can increase the contact area between the electrode and the groove structure, thereby increasing the adhesion of the electrode and improving the reliability of the light emitting diode.

本实用新型的其它特征和优点将在随后的说明书中阐述,并且,部分地从说明书中变得显而易见,或者通过实施本实用新型而了解。本实用新型的目的和其他优点可通过在说明书、权利要求书以及附图中所特别指出的结构来实现和获得。 Other features and advantages of the present invention will be set forth in the following description, and, in part, will be apparent from the description, or can be learned by practicing the present invention. The objectives and other advantages of the utility model can be realized and obtained by the structures particularly pointed out in the specification, claims and accompanying drawings.

附图说明 Description of drawings

附图用来提供对本实用新型的进一步理解,并且构成说明书的一部分,与本实用新型的实施例一起用于解释本实用新型,并不构成对本实用新型的限制。此外,附图数据是描述概要,不是按比例绘制。 The accompanying drawings are used to provide a further understanding of the utility model, and constitute a part of the description, and are used to explain the utility model together with the embodiments of the utility model, and do not constitute a limitation to the utility model. In addition, the drawing data are descriptive summaries and are not drawn to scale.

图1为常规正装的氮化镓基发光二极管结构的剖视示意图。 FIG. 1 is a schematic cross-sectional view of a conventional front-mounted gallium nitride-based light-emitting diode structure.

图2为本实用新型实施例1的氮化镓基发光二极管结构的剖视示意图。 FIG. 2 is a schematic cross-sectional view of the structure of a GaN-based light-emitting diode according to Embodiment 1 of the present invention.

图3为图2中的凹槽结构放大示意图。 FIG. 3 is an enlarged schematic view of the groove structure in FIG. 2 .

图4为本实用新型实施例2的氮化镓基发光二极管结构的凹槽结构示意图。 FIG. 4 is a schematic diagram of the groove structure of the GaN-based light-emitting diode structure according to Embodiment 2 of the present invention.

图中各标号表示:100,200:基板;101,201:N型层;102,202:量子阱层;103,203:P型层;104,204:电流扩展层;105,205:P电极;106,206:N电极;107,207:N电极区域;208:凹槽结构。 The symbols in the figure indicate: 100, 200: substrate; 101, 201: N-type layer; 102, 202: quantum well layer; 103, 203: P-type layer; 104, 204: current spreading layer; 105, 205: P electrode ; 106, 206: N-electrode; 107, 207: N-electrode region; 208: groove structure.

具体实施方式 Detailed ways

以下将结合附图及实施例来详细说明本实用新型的实施方式,借此对本实用新型如何应用技术手段来解决技术问题,并达成技术效果的实现过程能充分理解并据以实施。需要说明的是,只要不构成冲突,本实用新型中的各个实施例以及各实施例中的各个特征可以相互结合,所形成的技术方案均在本实用新型的保护范围之内。 The implementation of the utility model will be described in detail below in conjunction with the accompanying drawings and examples, so as to fully understand and implement the implementation process of how to apply technical means to solve technical problems and achieve technical effects in the utility model. It should be noted that, as long as there is no conflict, each embodiment and each feature in each embodiment of the utility model can be combined with each other, and the formed technical solutions are all within the protection scope of the utility model.

以下将结合附图及实施例来详细说明本实用新型的实施方式,借此对本实用新型如何应用技术手段来解决技术问题,并达成技术效果的实现过程能充分理解并据以实施。 The implementation of the utility model will be described in detail below in conjunction with the accompanying drawings and examples, so as to fully understand and implement the implementation process of how to apply technical means to solve technical problems and achieve technical effects in the utility model.

实施例1Example 1

如图2所示,一种正装的发光二极管结构,包括基板200、由第一半导体层(N型层)201、第二半导体层(P型层)203及夹在两层之间的量子阱层202组成的发光外延层,以及位于P型层203上的电流扩展层204、位于电流扩展层204上的P电极205和位于N型层201上的N电极206。 As shown in Figure 2, a positive light-emitting diode structure includes a substrate 200, a first semiconductor layer (N-type layer) 201, a second semiconductor layer (P-type layer) 203, and a quantum well sandwiched between the two layers. Layer 202 consists of a light emitting epitaxial layer, a current spreading layer 204 on the P-type layer 203 , a P electrode 205 on the current spreading layer 204 , and an N electrode 206 on the N-type layer 201 .

上述发光外延层可以通过采用金属有机化合物化学气相沉淀(英文缩写为MOCVD)在生长基板200上或通过覆晶技术粘结在散热性基板200上。上述发光二极管为蓝光系发光二极管,发光外延层材料为GaN基化合物。电极一般可直接形成于发光外延层上或是形成于发光外延层上的电流扩展层,用于连通外部电源,激发P-N结发光。 The above-mentioned light-emitting epitaxial layer can be deposited on the growth substrate 200 by using metal organic compound chemical vapor deposition (MOCVD for English abbreviation) or bonded on the heat-dissipating substrate 200 by flip-chip technology. The above-mentioned light-emitting diode is a blue-light light-emitting diode, and the material of the light-emitting epitaxial layer is a GaN-based compound. Generally, the electrodes can be directly formed on the light-emitting epitaxial layer or formed on the current spreading layer on the light-emitting epitaxial layer, and are used to connect to an external power source to stimulate the P-N junction to emit light.

在本实施例,基板200优选蓝宝石,电流扩展层204优选ITO(氧化铟锡化合物);在所述蓝宝石基板200与N型层201还可以形成现有技术习知的缓冲层以及不掺杂氮化镓层等;在所述P型层203与电流扩展层204还可以形成现有技术常用的SiO2电流阻挡层等。 In this embodiment, the substrate 200 is preferably sapphire, and the current spreading layer 204 is preferably ITO (indium tin oxide compound); on the sapphire substrate 200 and the N-type layer 201, a buffer layer known in the prior art and an undoped nitrogen layer can also be formed. Gallium oxide layer, etc.; the SiO 2 current blocking layer commonly used in the prior art can also be formed on the P-type layer 203 and the current spreading layer 204 .

如图3所示,在本实施例,N电极区域207设置有上宽下窄的凹槽结构208,该凹槽结构的表面呈粗糙状,且由若干个不规则(随机分布)的凹透镜组成,其通过沿第二半导体层表面向下蚀刻至第一半导体层内部形成。 As shown in FIG. 3, in this embodiment, the N electrode region 207 is provided with a groove structure 208 with a wide top and a narrow bottom. The surface of the groove structure is rough and consists of several irregular (randomly distributed) concave lenses. , which is formed by etching down the surface of the second semiconductor layer into the interior of the first semiconductor layer.

在形成凹槽结构208之后,分别在电流扩展层204和凹槽结构208上的N型层201上制作P电极205和N电极206,从而实现P、N电极与发光外延层电性耦合。 After the groove structure 208 is formed, a P electrode 205 and an N electrode 206 are respectively formed on the current spreading layer 204 and the N-type layer 201 on the groove structure 208, so as to realize electrical coupling between the P and N electrodes and the light-emitting epitaxial layer.

如图2的光路示意图所示,由于通过N电极区域设有表面粗糙的凹槽结构,即若干个凹透镜比常规的平面光滑结构面积增加,于是当发光外延层将光源出射,该光源经由各该凹透镜表面出射,增加发光面积;此外,由于表面粗糙的凹槽结构改变了全反射临界角,减少了发生全反射现象,以达到提升发光二极管的光萃取效率;再者,通过在表面粗糙的凹槽结构上形成N电极,可以增加电极与凹槽结构的接触面积,从而增加电极粘附性,提高发光二极管的可靠性。 As shown in the schematic diagram of the optical path in Figure 2, since the N electrode area is provided with a rough groove structure, that is, the area of several concave lenses is increased compared with the conventional flat smooth structure, so when the light emitting epitaxial layer emits the light source, the light source passes through each of the The surface of the concave lens emits light to increase the light-emitting area; in addition, due to the rough groove structure on the surface, the critical angle of total reflection is changed, which reduces the occurrence of total reflection, so as to improve the light extraction efficiency of the light-emitting diode; moreover, through the rough surface Forming the N electrode on the groove structure can increase the contact area between the electrode and the groove structure, thereby increasing the adhesion of the electrode and improving the reliability of the light emitting diode.

实施例2Example 2

如图4所示,与实施例1不同的是,本实施例的凹槽结构208仅形成于第一半导体层(N型层)101,且凹槽结构表面由若干个周期性阵列(规则分布)凹透镜组成。 As shown in Figure 4, different from Embodiment 1, the groove structure 208 of this embodiment is only formed on the first semiconductor layer (N-type layer) 101, and the surface of the groove structure consists of several periodic arrays (regularly distributed ) Concave lens composition.

综上所述,本实用新型的发光二极管结构设计精神在于:通过在N电极区域设有表面粗糙的凹槽结构,从而增加发光面积,改变全反射临界角,减少了光损耗,以达到提升发光二极管的光萃取效率;通过在表面粗糙的凹槽结构上形成N电极,可以增加电极与凹槽结构的接触面积,从而增加电极粘附性,提高发光二极管的可靠性。 To sum up, the design spirit of the light emitting diode structure of the present invention lies in: by providing a rough groove structure in the N electrode area, the light emitting area is increased, the critical angle of total reflection is changed, and light loss is reduced, so as to improve light emission. The light extraction efficiency of the diode; by forming the N electrode on the groove structure with rough surface, the contact area between the electrode and the groove structure can be increased, thereby increasing the adhesion of the electrode and improving the reliability of the light emitting diode.

很明显地,本实用新型的说明不应理解为仅仅限制在上述实施例,而是包括利用本实用新型构思的全部实施方式。 Obviously, the description of the present utility model should not be construed as only being limited to the above-mentioned embodiments, but includes all implementations utilizing the concept of the present utility model.

Claims (8)

1.一种发光二极管结构,包括:由第一半导体层、第二半导体层及夹在两层之间的量子阱层组成的发光外延层,以及位于第二半导体层上的P电极、位于第一半导体层上的N电极,其特征在于:所述N电极区域设有表面粗糙的凹槽结构。 1. A light-emitting diode structure, comprising: a light-emitting epitaxial layer composed of a first semiconductor layer, a second semiconductor layer and a quantum well layer sandwiched between the two layers, and a P electrode positioned on the second semiconductor layer, positioned on the second semiconductor layer An N electrode on a semiconductor layer is characterized in that: the N electrode region is provided with a rough groove structure. 2.根据权利要求1所述的一种发光二极管结构,其特征在于:所述凹槽结构呈上宽下窄。 2 . The LED structure according to claim 1 , wherein the groove structure is wide at the top and narrow at the bottom. 3.根据权利要求1所述的一种发光二极管结构,其特征在于:所述凹槽结构的粗糙表面由若干个凹/凸透镜组成。 3. The light emitting diode structure according to claim 1, wherein the rough surface of the groove structure is composed of several concave/convex lenses. 4.根据权利要求3所述的一种发光二极管结构,其特征在于:所述凹/凸透镜呈周期性规则分布或者随机分布。 4 . The LED structure according to claim 3 , wherein the concave/convex lenses are distributed regularly or randomly. 5.根据权利要求1所述的一种发光二极管结构,其特征在于:所述凹槽结构为沿第二半导体层表面向下贯穿至第一半导体层内部。 5 . The light emitting diode structure according to claim 1 , wherein the groove structure penetrates downwardly from the surface of the second semiconductor layer to the inside of the first semiconductor layer. 5 . 6.根据权利要求1所述的一种发光二极管结构,其特征在于:所述凹槽结构仅形成于第一半导体层。 6 . The light emitting diode structure according to claim 1 , wherein the groove structure is only formed in the first semiconductor layer. 7.根据权利要求1所述的一种发光二极管结构,其特征在于:在所述P电极与发光外延层之间形成电流扩展层。 7 . The light emitting diode structure according to claim 1 , wherein a current spreading layer is formed between the P electrode and the light emitting epitaxial layer. 8.根据权利要求1所述的一种发光二极管结构,其特征在于:所述发光外延层为氮化镓基半导体层,其发射的光波波长小于500nm。 8 . The light emitting diode structure according to claim 1 , wherein the light emitting epitaxial layer is a GaN-based semiconductor layer, and the wavelength of light emitted by it is less than 500 nm.
CN201420755635.8U 2014-12-05 2014-12-05 A kind of light emitting diode construction Expired - Lifetime CN204257687U (en)

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Effective date of registration: 20231102

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Granted publication date: 20150408