CN204702805U - A kind of arc quartz holder - Google Patents
A kind of arc quartz holder Download PDFInfo
- Publication number
- CN204702805U CN204702805U CN201520368809.XU CN201520368809U CN204702805U CN 204702805 U CN204702805 U CN 204702805U CN 201520368809 U CN201520368809 U CN 201520368809U CN 204702805 U CN204702805 U CN 204702805U
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- arc
- shaped base
- curved baffle
- size
- quartz
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Abstract
The utility model provides a kind of arc quartz holder, comprises arc-shaped base and is positioned at the curved baffle at arc-shaped base two ends, offer the groove partly opened, curved baffle is provided with through hole in curved baffle upper end.Arc-shaped base and baffle plate are quartzy material.The groove partly opened is used for placing quartz pushrod or metal bar, and the size of groove and number adjust according to the size of used quartz pushrod or metal bar.The baffle plate of arc-shaped base of the present utility model and arc can combine with cavity better, ensures maximum space availability ratio; The size that mounts of arch section obtains increase; Partly open groove and can play good fixed action to placing the quartz pushrod of entering, prevent moving around of quartz pushrod; Through hole on curved baffle can ensure the homogeneity of air-flow.
Description
Technical field
The utility model relates to quartz ware field, particularly a kind of quartz holder assembly that can be used for gas-phase reaction.
Background technology
Because CVD process for preparing graphenes by chemical vapour deposition is simple, gained Graphene is of high quality, and can realize large area deposition, and is comparatively easy to transfer on various matrix and uses, and becomes the main method preparing high-quality graphene film at present gradually.But prepare Graphene needs by CVD and carry out in high-temperature vacuum cavity, due to the length of flat-temperature zone in boiler tube and the size of caliber limited, limit size and the area of single growth graphene film, be difficult to realize industrial volume production.If graphene film is undersized, follow-up device application can be affected; If the quantity of single growth is few, then directly cause the increase of production cost.Suitable single support Design is particularly important.Secondly, in chemical vapor deposition method, when under the condition at high temperature or high pressure, obvious thermal convection can occur, the stability of air-flow and the homogeneity of distribution directly affect the homogeneity of film growth.
Summary of the invention
Little few with quantity for the size of single growth graphene film in prior art, and the problem that air flow method is uneven, process provides a kind of arc quartz holder.
Arc quartz holder, comprises arc-shaped base and is positioned at the curved baffle at arc-shaped base two ends, offer the groove partly opened, curved baffle is provided with through hole in curved baffle upper end.
Further, above-mentioned arc-shaped base and baffle plate are quartzy material.
Further, the radian of arc-shaped base and width adjust according to the shape of CVD growth chamber and size; The length of arc-shaped base adjusts according to the heat preservation zone length of CVD growth chamber; The height of curved baffle adjusts according to the diameter of CVD growth chamber.
Further, the above-mentioned groove partly opened is used for placing quartz pushrod or metal bar, and the size of groove and number adjust according to the size of used quartz pushrod or metal bar.
The beneficial effects of the utility model are: the baffle plate of arc-shaped base and arc can combine with cavity better, ensures maximum space availability ratio; The size that mounts of arch section obtains increase; Partly open groove and can play good fixed action to placing the quartz pushrod of entering, prevent moving around of quartz pushrod; Through hole on curved baffle can ensure the homogeneity of air-flow.
Accompanying drawing explanation
Accompanying drawing 1 is front view of the present utility model.
Accompanying drawing 2 is side-views of the present utility model.
Accompanying drawing 3 is vertical views of the present utility model.
Number in the figure: 1, quartz holder; 2, circular CVD cavity; 11, arc-shaped base; 12, curved baffle; 121, baffle plate upper recess; 122, baffle plate through hole; H, quartz holder total height; L, quartz holder overall length.
Embodiment
Below in conjunction with accompanying drawing, embodiment of the present utility model is described.
The through hole 122 that arc quartz holder comprises arc-shaped base 11, is positioned at the curved baffle 12 at base two ends, is positioned at the groove 121 of curved baffle 12 upper end and arranges on baffle plate 12, arc-shaped base 11 and baffle plate 12 are quartzy material, described groove 121 is the half-open grooves not running through quartz baffle, groove size and shape determines according to support bar used, and support bar just can put into groove internal fixtion.The radian of arc-shaped base 11 and width adjust according to the shape of CVD growth chamber and size; The length of arc-shaped base adjusts according to the heat preservation zone length of CVD growth chamber; The height of curved baffle adjusts according to the diameter of CVD growth chamber.
In the present embodiment, quartz holder overall height H is 100mm; Quartz holder total length L is 650mm; The both sides of curved baffle 12 are plane but not cambered surface; The quantity of groove 121 is 4, is uniformly distributed and centerplane is symmetrical; Baffle plate through hole 122 is square, and quantity is 1, is of a size of 35mm × 40mm.
Last it is noted that the foregoing is only preferred embodiment of the present utility model, be not limited to the utility model, although be described in detail the utility model with reference to previous embodiment, for a person skilled in the art, it still can be modified to the technical scheme described in foregoing embodiments, or carries out equivalent replacement to wherein portion of techniques feature.All within spirit of the present utility model and principle, any amendment done, equivalent replacement, improvement etc., all should be included within protection domain of the present utility model.
Claims (4)
1. an arc quartz holder, is characterized in that: comprise arc-shaped base and be positioned at the curved baffle at arc-shaped base two ends, offer the groove partly opened, curved baffle is provided with through hole in curved baffle upper end.
2. arc quartz holder as claimed in claim 1, is characterized in that: described arc-shaped base and baffle plate are quartzy material.
3. arc quartz holder as claimed in claim 1, is characterized in that: the radian of arc-shaped base and width adjust according to the shape of CVD growth chamber and size; The length of arc-shaped base adjusts according to the heat preservation zone length of CVD growth chamber; The height of curved baffle adjusts according to the diameter of CVD growth chamber.
4. arc quartz holder as claimed in claim 1, is characterized in that: the described groove partly opened is used for placing quartz pushrod or metal bar, and the size of groove and number adjust according to the size of used quartz pushrod or metal bar.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520368809.XU CN204702805U (en) | 2015-06-02 | 2015-06-02 | A kind of arc quartz holder |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520368809.XU CN204702805U (en) | 2015-06-02 | 2015-06-02 | A kind of arc quartz holder |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204702805U true CN204702805U (en) | 2015-10-14 |
Family
ID=54282433
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520368809.XU Active CN204702805U (en) | 2015-06-02 | 2015-06-02 | A kind of arc quartz holder |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204702805U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108103481A (en) * | 2018-01-25 | 2018-06-01 | 无锡盈芯半导体科技有限公司 | Substrate holds formula quartz boat under the arm automatically |
-
2015
- 2015-06-02 CN CN201520368809.XU patent/CN204702805U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108103481A (en) * | 2018-01-25 | 2018-06-01 | 无锡盈芯半导体科技有限公司 | Substrate holds formula quartz boat under the arm automatically |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190320 Address after: No. 518-5 Zhonghui Road, Standard Factory Building of Chang'an Industrial Park, Huishan Economic Development Zone, Wuxi City, Jiangsu Province, 214000 Co-patentee after: Wuxi Sixth Element Electronic Film Technology Co., Ltd. Patentee after: Wuxi Gefei Electronic Film Technology Co.,Ltd. Address before: No. 518-5 Zhonghui Road, Standard Factory Building of Chang'an Industrial Park, Huishan Economic Development Zone, Wuxi City, Jiangsu Province, 214000 Patentee before: Wuxi Gefei Electronic Film Technology Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| CP01 | Change in the name or title of a patent holder |
Address after: No. 518-5 Zhonghui Road, Standard Factory Building of Chang'an Industrial Park, Huishan Economic Development Zone, Wuxi City, Jiangsu Province, 214000 Patentee after: WUXI GRAPHENE FILM Co.,Ltd. Patentee after: Changzhou sixth element Semiconductor Co., Ltd Address before: No. 518-5 Zhonghui Road, Standard Factory Building of Chang'an Industrial Park, Huishan Economic Development Zone, Wuxi City, Jiangsu Province, 214000 Patentee before: WUXI GRAPHENE FILM Co.,Ltd. Patentee before: Wuxi sixth element electronic film technology Co., Ltd |
|
| CP01 | Change in the name or title of a patent holder |