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CN204625811U - The super anti-corrosion nickel plating-chromium parts of multilayer - Google Patents

The super anti-corrosion nickel plating-chromium parts of multilayer Download PDF

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CN204625811U
CN204625811U CN201520136531.3U CN201520136531U CN204625811U CN 204625811 U CN204625811 U CN 204625811U CN 201520136531 U CN201520136531 U CN 201520136531U CN 204625811 U CN204625811 U CN 204625811U
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layer
nickel
nickel dam
nickel layer
corrosion
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郝敬军
钱黎明
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Jiaxing Minhui Automotive Parts Co Ltd
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Abstract

本实用新型公开的多层超耐蚀镀镍-铬部件及其制造方法,其中多层超耐蚀镀镍-铬部件包括基材;预处理镀层,其沉积在整个基材上,在预处理镀层上形成有镀铜层;和基础层,其形成于镀铜层上;和功能层,其形成于基础层上,其中功能层包括低电位镍层和形成于低电位镍层上的微孔镍层;和装饰层,其形成于微孔镍层上,装饰层为三价铬镀层或者六价铬镀层的任一。本实用新型通过在部件表面设置的微孔、镀铬工艺基础上,增加低电位镍镀层,从而提高产品的耐腐蚀性能,尤其是三价铬镀铬产品的耐腐蚀性能,可促使更环保的三价铬产品更大规模的推广应用。

The utility model discloses a multi-layer super corrosion-resistant nickel-chrome plated part and a manufacturing method thereof, wherein the multi-layer super corrosion-resistant nickel-chrome plated part includes a base material; a pretreatment coating, which is deposited on the entire base material, is A copper-plated layer is formed on the plating layer; and a base layer, which is formed on the copper-plated layer; and a functional layer, which is formed on the base layer, wherein the functional layer includes a low-potential nickel layer and micropores formed on the low-potential nickel layer a nickel layer; and a decorative layer, which is formed on the microporous nickel layer, and the decorative layer is any one of a trivalent chromium plating layer or a hexavalent chromium plating layer. The utility model increases the low-potential nickel coating on the basis of the micropores and chrome-plating process on the surface of the component, thereby improving the corrosion resistance of the product, especially the corrosion resistance of the trivalent chrome-plated product, which can promote a more environmentally friendly trivalent Larger-scale promotion and application of chromium products.

Description

多层超耐蚀镀镍-铬部件Multilayer Super Corrosion Resistant Nickel-Chrome Plated Components

技术领域 technical field

本实用新型涉及一种具有表面镀层结构的工件,特别是一种多层超耐蚀镀镍-铬部件。 The utility model relates to a workpiece with a surface coating structure, in particular to a multi-layer super corrosion-resistant nickel-chromium plated part.

本申请中电势差均为以相邻两层各自作为一个整体测得的标准电势之差。 In this application, the potential difference is the difference between the standard potentials measured by taking each of the two adjacent layers as a whole.

背景技术 Background technique

欧洲市场对环保要求的越来越严,以及各主机厂对电镀耐蚀性的要求越来越高,目前三价铬电镀无法满足特定环境的腐蚀要求(同时达到耐盐雾试验80h和耐俄罗斯泥试验336h)。 The European market has increasingly stringent environmental protection requirements, and the main engine manufacturers have higher and higher requirements for electroplating corrosion resistance. At present, trivalent chromium electroplating cannot meet the corrosion requirements of specific environments (at the same time, it can meet the salt spray test 80h and Russia Mud test 336h).

电镀工业上一般应用先镀双层镍或三层镍再镀铬的方法提高工件的防腐能力,被广泛应用的双层镍工艺有:半光镍+光镍+无裂纹铬,被广泛应用的三层镍工艺有:半光镍+光镍+微孔镍+无裂纹铬,或者半光镍+光镍+微裂纹镍+无裂纹铬,但由于铬层自身的应力大,工业上很难得到一种完全没有裂纹或孔隙的铬电镀层(包括六价铬和三价铬镀层),暴露在空气中的铬电镀层被钝化后,其电位比镍正,当遇到大气中的腐蚀介质时,便与镍层构成腐蚀电池,造成装饰性的镍电镀层在极端环境中出现大量不规则的腐蚀,甚至镍层大面积腐蚀导致铬层的脱落。为了进一步改善镀层的防腐能力,微孔镍和微裂纹镍被应用到光镍镀层上,微裂纹镍在光镍层上镀一层高应力特殊镍层,在镀铬后就会由于应力产生大量的微裂纹;而微孔镍层在多层镍中将腐蚀电流分散,防止形成深度的腐蚀点,避免可见腐蚀。由于单独使用微裂纹镍层,产品表面发雾,光亮度差,且未有提及三价铬镀制,且由于单独使用微孔镍或微裂纹镍,对耐蚀性的提高是有限的。 In the electroplating industry, the method of firstly plating double-layer nickel or triple-layer nickel and then chromium plating is generally used to improve the anti-corrosion ability of the workpiece. The layer nickel process includes: semi-bright nickel + light nickel + microporous nickel + crack-free chromium, or semi-bright nickel + light nickel + micro-crack nickel + crack-free chromium, but due to the high stress of the chromium layer itself, it is difficult to obtain in industry A chromium electroplating layer (including hexavalent chromium and trivalent chromium plating) without cracks or pores at all. After the chromium electroplating layer exposed to the air is passivated, its potential is more positive than that of nickel. When it encounters the corrosive medium in the atmosphere At the same time, it will form a corrosion battery with the nickel layer, causing a large number of irregular corrosions in the decorative nickel plating layer in extreme environments, and even large-area corrosion of the nickel layer will cause the chromium layer to fall off. In order to further improve the anti-corrosion ability of the coating, microporous nickel and micro-cracked nickel are applied to the light nickel coating. Micro-cracked nickel is coated with a high-stress special nickel layer on the light nickel layer. Microcracks; while the microporous nickel layer disperses the corrosion current in the multilayer nickel to prevent the formation of deep corrosion points and avoid visible corrosion. Due to the use of micro-cracked nickel layer alone, the surface of the product is foggy and the brightness is poor, and there is no mention of trivalent chromium plating, and due to the use of micro-porous nickel or micro-cracked nickel alone, the improvement of corrosion resistance is limited.

现有技术中,如中国专利申请(公开号:CN102766894 A)涉及一种用于微裂纹镍电镀的电镀液及其应用,该微裂纹镍电镀液的主要组成如下: 氯化镍:180~260克/升,醋酸:20~60毫升/升,ELPELYT MR:80~120毫升/升,62A:1~5毫升/升。在塑料件表面微裂纹镍电镀工艺流程为:A.塑料件表面金属化,B.光亮铜,C.半亮镍,D.高硫镍E.光亮镍,F.微孔镍,G.水洗,H.光亮铬,I.水洗,J.干燥;虽然该技术方案中采用该四层镍镍电镀液在塑料表面进行电镀在一定程度上提高了塑料件的抗腐蚀性,然而该工艺的抗腐蚀能力仍然无法达到含有除冰盐(CaCl2)腐蚀环境的要求,高硫镍电镀层局部有发雾现象,此外该方法中由于塑胶表面处理不到位,造成镀层深镀能力差,镀层易发脆,电镀处理后的塑胶作为汽车部件(格栅、饰条、门把手)后使用寿命短。而有关介绍微裂纹镍的工艺,如中国专利申请(公开号:CN101705508A)涉及一种用于微裂纹镍电镀的电镀液及其应用,该微裂纹镍电镀液的主要组成如下:氯化镍:180~260克/升,醋酸:20~60毫升/升,ELPELYT MR:80~120毫升/升,62A:1~5毫升/升,专利文献中描述的实例的评价实际限制为六价铬镀,没有谈及三价铬电镀。 In the prior art, as the Chinese patent application (publication number: CN102766894 A) relates to a kind of electroplating solution and its application for micro-crack nickel electroplating, the main composition of this micro-crack nickel electroplating solution is as follows: Nickel chloride: 180~260 g/l, acetic acid: 20-60 ml/l, ELPELYT MR: 80-120 ml/l, 62A: 1-5 ml/l. The micro-crack nickel plating process on the surface of plastic parts is: A. Metallization of plastic parts, B. Bright copper, C. Semi-bright nickel, D. High sulfur nickel, E. Bright nickel, F. Microporous nickel, G. Washing , H. bright chromium, I. washing, J. drying; although adopting this four-layer nickel-nickel electroplating solution to carry out electroplating on the plastic surface has improved the corrosion resistance of plastic parts to a certain extent in this technical scheme, yet the anticorrosion property of this process The corrosion ability still cannot meet the requirements of the corrosive environment containing deicing salt (CaCl 2 ), and the high-sulfur nickel electroplating layer has local fogging phenomenon. In addition, due to the insufficient plastic surface treatment in this method, the deep plating ability of the coating layer is poor, and the coating layer is prone to cracking. Brittle, electroplated plastics have a short service life after being used as automotive parts (grilles, trims, door handles). And about the technique of introducing micro-crack nickel, as Chinese patent application (publication number: CN101705508A) relates to a kind of electroplating solution and application thereof for micro-crack nickel electroplating, the main composition of this micro-crack nickel electroplating solution is as follows: nickel chloride: 180-260 g/l, acetic acid: 20-60 ml/l, ELPELYT MR: 80-120 ml/l, 62A: 1-5 ml/l, the evaluation of examples described in the patent literature is actually limited to hexavalent chromium plating , did not talk about trivalent chromium plating.

发明内容 Contents of the invention

为解决上述问题,本实用新型公开了一种多层超耐蚀镀镍-铬部件,通过有机结合地利用功能层多层镍结构的耐腐蚀特性和电化学性能,既保证了微孔镍层的外观光亮特性,又具有包含微孔镍的功能层的双重耐蚀性,可使产品达到超高耐蚀性和结构稳定性,即便在低电位镍层受到腐蚀后,微孔镍层同样可以起到支持和延缓腐蚀的效果。 In order to solve the above problems, the utility model discloses a multi-layer super corrosion-resistant nickel-chromium plated part, which ensures the corrosion resistance and electrochemical performance of the multi-layer nickel structure of the functional layer in an organic combination, which not only ensures the microporous nickel layer The bright appearance and the double corrosion resistance of the functional layer containing microporous nickel can make the product achieve ultra-high corrosion resistance and structural stability. Even after the low potential nickel layer is corroded, the microporous nickel layer can also Play a role in supporting and retarding corrosion.

本实用新型公开的多层超耐蚀镀镍-铬部件部件,该部件包括: The utility model discloses a multi-layer super corrosion-resistant nickel-chromium plated component, which comprises:

基材; Substrate;

预处理镀层,其沉积在整个基材上,在预处理镀层上形成有镀铜层;和 a pretreatment coating deposited over the entire substrate with a copper plating layer formed on the pretreatment coating; and

基础层,其形成于镀铜层上;和 a base layer formed on the copper plating layer; and

功能层,其形成于基础层上,其中功能层包括低电位镍层和形成于低电位镍层上的微孔镍层;和 A functional layer formed on the base layer, wherein the functional layer includes a low-potential nickel layer and a microporous nickel layer formed on the low-potential nickel layer; and

装饰层,其形成于微孔镍层上,所述装饰层为三价铬镀层或者六价铬 镀层的任一。 A decorative layer is formed on the microporous nickel layer, and the decorative layer is any of a trivalent chromium coating or a hexavalent chromium coating.

作为一种优选,微孔镍层与低电位镍层之间的电位差为10-120mv范围内。 As a preference, the potential difference between the microporous nickel layer and the low potential nickel layer is in the range of 10-120mv.

作为一种优选,低电位镍层包括有高硫镍层、微裂纹镍层中一层或两层之间的复合镀层。 As a preference, the low-potential nickel layer includes a high-sulfur nickel layer, one layer of the micro-cracked nickel layer or a composite coating between the two layers.

作为一种优选,微孔镍层与低电位镍层之间的电位差为20-100mv范围内。 As a preference, the potential difference between the microporous nickel layer and the low potential nickel layer is in the range of 20-100mv.

作为一种优选,当低电位镍层采用微裂纹镍层与高硫镍层的复合镀层时,微裂纹镍层与高硫镍层之间电位差为10-80mv内。这里当腐蚀到达低电位镍层时,由于微裂纹镍层的电位比高硫镍层的电位高,此时高硫镍层又被作为阳极性镀层优先腐蚀,延长微裂纹镍层的腐蚀,从而进一步提升了耐腐蚀度。 As a preference, when the low-potential nickel layer adopts the composite coating of the micro-cracked nickel layer and the high-sulfur nickel layer, the potential difference between the micro-cracked nickel layer and the high-sulfur nickel layer is within 10-80mv. Here, when the corrosion reaches the low-potential nickel layer, since the potential of the micro-cracked nickel layer is higher than that of the high-sulfur nickel layer, the high-sulfur nickel layer is preferentially corroded as an anodic coating, prolonging the corrosion of the micro-cracked nickel layer, thereby Further improved corrosion resistance.

本实用新型公开的多层超耐蚀镀镍-铬部件部件的一种改进,基础层包括半光镍层、高硫镍层、全光镍层、沙丁镍层中的一层或多层。 An improvement of the multi-layer super corrosion-resistant nickel-chromium plated parts disclosed in the utility model, the base layer includes one or more layers of semi-bright nickel layer, high-sulfur nickel layer, full-bright nickel layer, and satin nickel layer .

本实用新型公开的多层超耐蚀镀镍-铬部件部件的一种改进,基础层为半光镍层和全光镍层之间的复合,其中,半光镍层形成于镀铜层上,全光镍层形成于半光镍层上。 An improvement of the multi-layer super-corrosion-resistant nickel-chrome plated parts disclosed in the utility model, the base layer is a compound between a semi-gloss nickel layer and a full-gloss nickel layer, wherein the semi-gloss nickel layer is formed on the copper plating layer , the full-bright nickel layer is formed on the semi-bright nickel layer.

本实用新型公开的多层超耐蚀镀镍-铬部件部件的一种改进,基础层为半光镍层和沙丁镍层之间的复合,其中,半光镍层形成于镀铜层上,沙丁镍层形成于半光镍层上。 An improvement of the multi-layer super-corrosion-resistant nickel-chrome plated parts disclosed in the utility model, the base layer is a compound between a semi-gloss nickel layer and a satin nickel layer, wherein the semi-gloss nickel layer is formed on the copper-plated layer, A satin nickel layer is formed on the semi-gloss nickel layer.

作为一种优选,全光镍层或沙丁镍层任一与低电位镍层之间的电位差为0-100mv范围内。 As a preference, the potential difference between any one of the all-bright nickel layer or satin nickel layer and the low-potential nickel layer is in the range of 0-100mv.

作为一种优选,半光镍层与全光镍层、半光镍层与沙丁镍层之间的电位差为100-200mv范围内。 As a preference, the potential difference between the semi-bright nickel layer and the full-bright nickel layer, between the semi-bright nickel layer and the satin nickel layer is within the range of 100-200mv.

本实用新型公开的多层超耐蚀镀镍-铬部件部件的一种改进,基础层为半光镍层、高硫镍层和全光镍层之间的复合,其中,半光镍层形成于镀铜层上,高硫镍层形成于半光镍层上,全光镍层形成于高硫镍层上。 An improvement of the multi-layer super corrosion-resistant nickel-chrome plating parts disclosed in the utility model, the base layer is a compound between the semi-gloss nickel layer, the high-sulfur nickel layer and the full-bright nickel layer, wherein the semi-gloss nickel layer is formed On the copper plating layer, the high-sulfur nickel layer is formed on the semi-bright nickel layer, and the full-bright nickel layer is formed on the high-sulfur nickel layer.

本实用新型公开的多层超耐蚀镀镍-铬部件部件的一种改进,基础层为 半光镍层、高硫镍层和沙丁镍层之间的复合,其中,半光镍层形成于镀铜层上,高硫镍层形成于半光镍层上,沙丁镍层形成于高硫镍层上。 An improvement of the multi-layer super corrosion-resistant nickel-chromium plating parts disclosed in the utility model, the base layer is a compound between a semi-gloss nickel layer, a high-sulfur nickel layer and a satin nickel layer, wherein the semi-gloss nickel layer is formed on On the copper plating layer, the high-sulfur nickel layer is formed on the semi-bright nickel layer, and the satin nickel layer is formed on the high-sulfur nickel layer.

本实用新型公开的多层超耐蚀镀镍-铬部件部件的一种改进,基础层为半光镍层、全光镍层和沙丁镍层之间的复合,其中,半光镍层形成于镀铜层上,全光镍层形成于半光镍层上,沙丁镍层形成于全光镍层上。 An improvement of the multi-layer super corrosion-resistant nickel-chromium plated parts disclosed in the utility model, the base layer is a compound between a semi-gloss nickel layer, a full-gloss nickel layer and a satin nickel layer, wherein the semi-gloss nickel layer is formed on On the copper plating layer, the full-bright nickel layer is formed on the semi-bright nickel layer, and the satin nickel layer is formed on the full-bright nickel layer.

本实用新型提供的多层超耐蚀镀镍-铬部件,其包括以下:基体;预处理镀层(可以包括化学镍层、打底镍层任一或者二者复合),其形成于整个基体上;镀铜层,其形成于预处理镀层上;基础层(可以包括全光镍层、半光镍层、沙丁镍层、高硫镍层中任一或者多种复合),其形成于镀铜层上;低电位镍镀层,其形成于基础镀层上,微孔镍层,其形成与低电位镍层上,其中低电位镍镀层和微孔镍镀层之间的电势差在10mV至120mV的范围内;和装饰层(可以为铬镀层,如三价铬镀层或者六价铬镀层的任一),其形成于微孔镍镀层上,并且具有微孔结构和微裂纹结构的至少任何之一。 The multi-layer super corrosion-resistant nickel-chrome plated part provided by the utility model comprises the following: a substrate; a pretreatment coating (can include any one of the chemical nickel layer and the primer nickel layer or a combination of the two), which is formed on the entire substrate Copper-plated layer, which is formed on the pretreatment coating; base layer (can include any or more composites in full-gloss nickel layer, semi-gloss nickel layer, satin nickel layer, high-sulfur nickel layer), which is formed on the plated layer On the copper layer; a low-potential nickel coating formed on the base coating, a microporous nickel layer formed on the low-potential nickel layer, wherein the potential difference between the low-potential nickel coating and the microporous nickel coating is in the range of 10mV to 120mV and a decorative layer (which may be a chromium coating, such as any of a trivalent chromium coating or a hexavalent chromium coating), which is formed on the microporous nickel coating and has at least any one of a microporous structure and a microcrack structure.

本实用新型提供的多层超耐蚀镀镍-铬部件的制造方法,其包括以下步骤:将预处理镀层形成于整个基体上;将镀铜层形成于预处理镀层上;将基础层形成于镀铜层上,其中基础层包括半光镍层、高硫镍层、全光镍层、沙丁镍层中至少任何之一;将贵低电位镍镀层形成于基础镀层上,将微孔镍层形成于低电位镍层上,其中低电位镍镀层和微孔镍镀层之间的电势差在10mV至120mV的范围内;将装饰层形成于微孔镍层上。 The manufacturing method of the multi-layer super corrosion-resistant nickel-chromium plating parts provided by the utility model comprises the following steps: forming the pretreatment coating on the whole substrate; forming the copper plating layer on the pretreatment coating; forming the base layer on the On the copper plating layer, wherein the base layer includes at least any one of a semi-gloss nickel layer, a high-sulfur nickel layer, a full-gloss nickel layer, and a satin nickel layer; the noble low-potential nickel coating is formed on the base coating, and the microporous nickel A layer is formed on the low-potential nickel layer, wherein the potential difference between the low-potential nickel plating layer and the microporous nickel layer is in the range of 10mV to 120mV; and the decoration layer is formed on the microporous nickel layer.

本实用新型公开的多层超耐蚀镀镍-铬部件的制造方法的一种改进,基础层包括半光镍层、高硫镍层、全光镍层、沙丁镍层中的一层或多层。 An improvement of the manufacturing method of the multi-layer super corrosion-resistant nickel-chrome plated parts disclosed by the utility model, the base layer includes a layer of semi-bright nickel layer, high-sulfur nickel layer, full-bright nickel layer, satin nickel layer or multiple layers.

作为优选,半光镍层采用镀半光镍镀液电镀而成,镀半光镍镀液包括成分及浓度为(单位体积镀液中添加量):含水硫酸镍200-300g/L,含水氯化镍35-50g/L,硼酸35-50g/L,半光亮镍初级光亮剂3.0-7.0ml/L(确信乐思化学贸易(上海)有限公司以下简称乐思,麦德美科技(苏州)有限公司以下简称麦德美,如乐思的BTL MU或麦德美的NIMAC SF DUCT),半光亮镍次级光亮剂0.3-1.0ml/L(如乐思的TL-2或麦德美的NIMAC SF LEVELER),电位差调整剂0.8-1.2ml/L(如乐思的B补或麦德美的NIMAC  SF MAINTENANCE),润湿剂2.0-3.0ml/L(如乐思的62A或麦德美的NIMAC 32C WETTER)。半光镍层镀制时操作温度控制在50~60℃之间,pH值控制在3.6~4.6之间,电流密度为2~5ASD,操作时间控制在12~24min之间,通过直流电电解的方式使镍沉积在电镀件镀铜层表面上,要求半光镍镀层厚度不低于8微米。 As preferably, the semi-gloss nickel layer is formed by electroplating with a semi-gloss nickel plating solution, and the semi-gloss nickel plating solution includes components and concentrations (addition amount per unit volume of the plating solution): hydrated nickel sulfate 200-300g/L, hydrated chlorine Nickel 35-50g/L, boric acid 35-50g/L, semi-bright nickel primary brightener 3.0-7.0ml/L (convinced Lesi Chemical Trading (Shanghai) Co., Ltd. hereinafter referred to as Lesi, MacDermid Technology (Suzhou) Co., Ltd. is hereinafter referred to as MacDermid, such as BTL MU of Lesi or NIMAC SF DUCT of MacDermid), semi-bright nickel secondary brightener 0.3-1.0ml/L (such as TL-2 of Lesi or NIMAC SF of MacDermid LEVELER), potential difference adjuster 0.8-1.2ml/L (such as Lesi’s B supplement or Macderma’s NIMAC SF MAINTENANCE), wetting agent 2.0-3.0ml/L (such as Lesi’s 62A or Maidermid’s NIMAC 32C WETTER). During semi-bright nickel layer plating, the operating temperature is controlled between 50-60°C, the pH value is controlled between 3.6-4.6, the current density is 2-5ASD, and the operating time is controlled between 12-24min, through direct current electrolysis To deposit nickel on the surface of the copper plating layer of the electroplated part, the thickness of the semi-gloss nickel plating layer is required to be not less than 8 microns.

作为优选,全光镍层采用镀全光镍镀液电镀而成,镀全光镍镀液包括成分及浓度为(单位体积镀液中添加量):含水硫酸镍220-340g/L,含水氯化镍40-50g/L,硼酸35-40g/L,光亮镍柔软剂8-12ml/L(如乐思的63或麦德美的NIMAC 14 INDEX),光亮镍主光剂0.5-0.9ml/L(如乐思的66E或麦德美的NiMac Chanllenger Plus),润湿剂2.0-3.0ml/L(如乐思的62A或麦德美的NIMAC 32C WETTER)。全光镍层镀制时操作温度控制在50~60℃之间,pH值控制在3.6~4.6之间,电流密度为2~5ASD,操作时间控制在9~20min之间,通过直流电电解的方式使镍沉积在电镀件镀半光镍表面上,要求全光镍镀层厚度不低于5微米。 As preferably, the full-bright nickel layer is formed by electroplating with a full-bright nickel plating solution, and the full-bright nickel plating solution includes components and concentrations (addition amount per unit volume of the plating solution): aqueous nickel sulfate 220-340g/L, aqueous chlorine Nickel 40-50g/L, boric acid 35-40g/L, bright nickel softener 8-12ml/L (such as Lesi's 63 or Macdermid's NIMAC 14 INDEX), bright nickel main light agent 0.5-0.9ml/L (such as Schleich's 66E or MacDermid's NiMac Challenger Plus), wetting agent 2.0-3.0ml/L (such as Schleich's 62A or MacDermid's NIMAC 32C WETTER). During the all-bright nickel layer plating, the operating temperature is controlled between 50-60°C, the pH value is controlled between 3.6-4.6, the current density is 2-5ASD, and the operating time is controlled between 9-20min, through direct current electrolysis To deposit nickel on the semi-gloss nickel-plated surface of the electroplated part, the thickness of the full-bright nickel coating is required to be not less than 5 microns.

作为优选,高硫镍层采用镀高硫镍镀液电镀而成,镀高硫镍镀液包括成分及浓度为(单位体积镀液中添加量):含水硫酸镍的浓度为250-350g/L,含水氯化镍的浓度为35-60g/L,硼酸的浓度为35-65g/L,高硫添加剂的浓度为3-10ml/L,润湿剂的浓度为0.5-3ml/L(如乐思的62A或麦德美的NIMAC 32C WETTER)。 As preferably, the high-sulfur nickel layer is formed by electroplating with a high-sulfur nickel plating solution, and the high-sulfur nickel plating solution includes components and concentrations (addition amount per unit volume of the plating solution): the concentration of aqueous nickel sulfate is 250-350g/L , the concentration of aqueous nickel chloride is 35-60g/L, the concentration of boric acid is 35-65g/L, the concentration of high-sulfur additive is 3-10ml/L, and the concentration of wetting agent is 0.5-3ml/L (such as Le Si 62A or MacDermid's NIMAC 32C WETTER).

作为优选,沙丁镍层采用镀沙丁镍镀液电镀而成,镀沙丁镍镀液包括成分及浓度为(单位体积镀液中添加量):含水硫酸镍的浓度为250-350g/L,含水氯化镍的浓度为35-60g/L,硼酸的浓度为35-65g/L,辅助添加剂的浓度为5-20ml/L(如乐思的Elpelyt pearlbrite carrier K4或Elpelyt carrier brightener H),沙丁镍形成剂的浓度为0.1-0.6ml/L(如乐思的Elpelyt pearlbrite additive K6AL)。 As preferably, the satin nickel layer is formed by electroplating with satin nickel plating solution, and the satin nickel plating solution includes composition and concentration (addition amount in the unit volume plating solution): the concentration of aqueous nickel sulfate is 250-350g/L , the concentration of aqueous nickel chloride is 35-60g/L, the concentration of boric acid is 35-65g/L, the concentration of auxiliary additives is 5-20ml/L (such as Elpelyt pearlbrite carrier K4 or Elpelyt carrier brightener H of Lesi), The concentration of nickel satin forming agent is 0.1-0.6ml/L (such as Elpelyt pearlbrite additive K6AL from Schleich).

在上述的制造方法中,低电位镍层包括有高硫镍层、微裂纹镍层中一层或两层之间的复合。 In the above-mentioned manufacturing method, the low-potential nickel layer includes a high-sulfur nickel layer, a layer of micro-cracked nickel layer or a composite between the two layers.

作为优选,微孔镍层采用镀微孔镍镀液电镀而成,镀微孔镍镀液包括 成分及浓度为(单位体积镀液中添加量):含水硫酸镍300-350g/L,含水氯化镍50-60g/L,硼酸40-50g/L,镍封光亮剂6-12ml/L(如乐思的63或麦德美的NIMAC 14 INDEX),镍封主光剂4-7.5ml/L(如乐思的610CFC或麦德美的NIMAC 33),镍封颗粒0.2-1.5g/L(如乐思的ENHANCER或麦德美的NiMac Hypore XL分散剂),镍封颗粒分散剂0.5-3ml/L,湿润剂1-5ml/L。微孔镍层镀制时操作温度控制在50~60℃之间,pH值控制在3.8~4.6之间,电流密度为2~5ASD,操作时间控制在2~8min之间,通过直流电电解的方式使镍沉积在电镀件上,要求镍镀层厚度不低于1.5微米。 As preferably, the microporous nickel layer is formed by electroplating with a microporous nickel plating solution, and the microporous nickel plating solution includes composition and concentration (addition amount per unit volume of the plating solution): aqueous nickel sulfate 300-350g/L, aqueous chlorine Nickel 50-60g/L, boric acid 40-50g/L, nickel sealing brightener 6-12ml/L (such as Lesi's 63 or Macdermid's NIMAC 14 INDEX), nickel sealing main brightening agent 4-7.5ml/L (such as Schleich's 610CFC or MacDermid's NIMAC 33), nickel-sealed particles 0.2-1.5g/L (such as Schleich's ENHANCER or MacDermid's NiMac Hypore XL dispersant), nickel-sealed particle dispersant 0.5-3ml/L , Wetting agent 1-5ml/L. When the microporous nickel layer is plated, the operating temperature is controlled between 50-60°C, the pH value is controlled between 3.8-4.6, the current density is 2-5ASD, and the operating time is controlled between 2-8min, through direct current electrolysis. To deposit nickel on the electroplated parts, the thickness of the nickel coating is required to be not less than 1.5 microns.

作为优选,微裂纹镍层采用镀微裂纹镍镀液电镀而成,镀微裂纹镍镀液包括成分及浓度为(单位体积镀液中添加量):含水氯化镍:180-260g/L,醋酸:10-40ml/L,PN-1A:40-90g/L,PN-2A:1-5ml/L,湿润剂:1-5ml/L(如乐思的62A或麦德美的NIMAC 32C WETTER)。微裂纹镍层镀制时操作温度控制在25~35℃之间,pH值控制在3.6~4.6之间,电流密度为5~9ASD,操作时间控制在2~8min之间,通过直流电电解的方式使镍沉积在电镀件镀光镍层表面上,要求微裂纹镍镀层厚度不低于1.0微米。 As preferably, the microcrack nickel layer is formed by electroplating with microcrack nickel plating solution, and the microcrack nickel plating solution includes composition and concentration (addition amount per unit volume of plating solution): aqueous nickel chloride: 180-260g/L, Acetic acid: 10-40ml/L, PN-1A: 40-90g/L, PN-2A: 1-5ml/L, wetting agent: 1-5ml/L (such as Schleiser’s 62A or MacDermid’s NIMAC 32C WETTER) . When the micro-cracked nickel layer is plated, the operating temperature is controlled between 25-35°C, the pH value is controlled between 3.6-4.6, the current density is 5-9ASD, and the operating time is controlled between 2-8min, through direct current electrolysis. To deposit nickel on the surface of the light-plated nickel layer of the electroplated part, the thickness of the micro-cracked nickel layer is required to be not less than 1.0 microns.

作为优选,高硫镍层采用镀高硫镍镀液电镀而成,镀高硫镍镀液包括成分及浓度为(单位体积镀液中添加量):含水硫酸镍250-350g/L,含水氯化镍35-60g/L,硼酸35-65g/L,高硫添加剂3-10ml/L,润湿剂0.5-3ml/L(如乐思的62A或麦德美的NIMAC 32C WETTER)。高硫镍层镀制时温度控制在55~65℃之间,pH至控制在2.0~3.5之间,电流密度为2~6ASD,操作时间控制在2~8min之间,通过直流电电解的方式使镍沉积在电镀件镀基础镀层表面上,高硫镍层厚度不低于1.0微米。 As preferably, the high-sulfur nickel layer is formed by electroplating with a high-sulfur nickel plating solution, and the high-sulfur nickel plating solution includes components and concentrations (addition amount per unit volume of the plating solution): aqueous nickel sulfate 250-350g/L, aqueous chlorine Nickel 35-60g/L, boric acid 35-65g/L, high-sulfur additive 3-10ml/L, wetting agent 0.5-3ml/L (such as 62A from Lesi or NIMAC 32C WETTER from MacDermid). When the high-sulfur nickel layer is plated, the temperature is controlled between 55-65°C, the pH is controlled between 2.0-3.5, the current density is 2-6ASD, and the operating time is controlled between 2-8min. Nickel is deposited on the surface of the basic coating of electroplated parts, and the thickness of the high-sulfur nickel layer is not less than 1.0 microns.

在上述的制造方法中,还包括基材前期预处理工序,其中包括ABS树脂在内的非金属类基材前期预处理工序至少包括有表面油脂处理工序、表面亲水、表面粗化处理工序、表面中和处理工序、表面预浸、表面活化处理工序以及表面解胶处理工序;而金属类基材则在表面油脂处理工序进行除油后即可进行后续镀制工作,同样适用以下陈述的非金属基础前期预处理工序中的相应工序。 In the above-mentioned manufacturing method, it also includes the pre-treatment process of the base material, wherein the pre-treatment process of the non-metal base material including ABS resin at least includes the surface oil treatment process, the surface hydrophilic, the surface roughening process, Surface neutralization treatment process, surface pre-dipping, surface activation treatment process and surface debonding treatment process; and metal substrates can be followed by subsequent plating after degreasing in the surface grease treatment process, and the non- The corresponding process in the pre-treatment process of the metal foundation.

在上述的制造方法中,非金属类基材前期预处理工序具体为将基材坯件在氢氧化钠、碳酸钠、表面活性剂和硅酸钠混合溶液中清洗去油脂,去油脂后浸入铬酸酐和硫酸混合液中进行表面粗化处理,然后放入盐酸溶液中进行表面中和,中和后采用胶体钯溶液进行表面活化处理,接着在硫酸溶液中进行表面解胶处理。 In the above-mentioned manufacturing method, the pre-treatment process of the non-metallic substrate is specifically to clean the substrate blank in a mixed solution of sodium hydroxide, sodium carbonate, surfactant and sodium silicate to remove grease, and then immerse the substrate in chromium The surface is roughened in the mixed solution of acid anhydride and sulfuric acid, and then placed in hydrochloric acid solution for surface neutralization. After neutralization, the surface is activated with colloidal palladium solution, and then the surface is degummed in sulfuric acid solution.

作为优选,表面油脂处理工序的混合溶液中包括成分及浓度为:氢氧化钠的浓度为20-50g/L,碳酸钠的浓度为10-40g/L,表面活性剂1-3g/L,硅酸钠的浓度为10-40g/L。 As preferably, the composition and concentration included in the mixed solution of the surface oil treatment process are: the concentration of sodium hydroxide is 20-50g/L, the concentration of sodium carbonate is 10-40g/L, surfactant 1-3g/L, silicon The concentration of sodium acid is 10-40g/L.

作为优选,表面亲水工序的硫酸溶液浓度为20-100g/L,整面剂0.5-2ml/L。 Preferably, the concentration of the sulfuric acid solution in the surface hydrophilic step is 20-100g/L, and the finishing agent is 0.5-2ml/L.

作为优选,表面粗化处理工序的混合液中包括成分及浓度为:铬酸酐的浓度为330-480g/L,硫酸的浓度为330-480g/L。 Preferably, the components and concentrations included in the mixed liquid in the surface roughening treatment step are: the concentration of chromic anhydride is 330-480 g/L, and the concentration of sulfuric acid is 330-480 g/L.

作为优选,表面中和工序的混合溶液中包括成分及浓度为:盐酸30-100ml/L,水合肼15-60ml/L。 Preferably, the components and concentrations included in the mixed solution in the surface neutralization step are: hydrochloric acid 30-100ml/L, hydrazine hydrate 15-60ml/L.

作为优选,表面预浸工序的盐酸溶液浓度为40-120ml/L。 Preferably, the concentration of the hydrochloric acid solution in the surface pre-soaking process is 40-120ml/L.

作为优选,表面活化处理的胶体钯溶液中包括成分及浓度为:盐酸180-280ml/L,氯化钯的浓度为20-60ppm,氯化亚锡的浓度1-6g/L。 Preferably, the colloidal palladium solution for surface activation treatment includes components and concentrations: hydrochloric acid 180-280ml/L, palladium chloride concentration 20-60ppm, stannous chloride concentration 1-6g/L.

作为优选,表面解胶处理工序的硫酸溶液浓度为40-100g/L。 Preferably, the concentration of the sulfuric acid solution in the surface degumming treatment process is 40-100 g/L.

在上述的制造方法中,预处理镀层可以包括化学镍层或者打底镍层中的任一或者两层复合。当化学镍层和打底镍层同时存在时,则化学镍层形成于基材上,打底镍层形成于化学镍层上。 In the above-mentioned manufacturing method, the pretreatment coating may include any one of the chemical nickel layer or the primer nickel layer or a combination of the two layers. When the chemical nickel layer and the underlying nickel layer exist simultaneously, the chemical nickel layer is formed on the substrate, and the underlying nickel layer is formed on the chemical nickel layer.

作为优选,镀化学镍工序混合溶液中包括成分及浓度为:硫酸镍的浓度为15-40g/L,次亚磷酸钠的浓度为20-50g/L,氯化铵的浓度为10-50g/L,柠檬酸钠的浓度为10-40g/L,氨水调节pH值至8.6-9.2。 As preferably, include composition and concentration in the mixed solution of electroless nickel plating process: the concentration of nickel sulfate is 15-40g/L, the concentration of sodium hypophosphite is 20-50g/L, the concentration of ammonium chloride is 10-50g/L L, the concentration of sodium citrate is 10-40g/L, and ammonia water adjusts the pH value to 8.6-9.2.

作为优选,镀打底镍工序的混合溶液中包括成分及浓度为:含水硫酸镍的浓度为180-280g/L,含水氯化镍的浓度为35-60g/L,硼酸的浓度为35-60g/L,湿润剂的浓度为1-3ml/L(如乐思的62A或麦德美的NIMAC 32C WETTER)。 As preferably, the composition and concentration included in the mixed solution of the nickel plating process are as follows: the concentration of aqueous nickel sulfate is 180-280g/L, the concentration of aqueous nickel chloride is 35-60g/L, and the concentration of boric acid is 35-60g /L, the concentration of wetting agent is 1-3ml/L (such as 62A of Lesi or NIMAC 32C WETTER of Mai Demei).

当化学镍层和打底镍层在基体上同时存在时,基材在化学沉镍中,已经通过氧化还原反应使得基材表面覆盖了一层较薄的导电的镍层;而在镀打底镍中,则采用电化学的方法在化学镍上镀上一层镍,进一步加强镀层的导电性。本步骤中,含水硫酸镍、含水氯化镍提供电化学反应所需镍离子。 When the chemical nickel layer and the bottoming nickel layer exist on the substrate at the same time, the substrate has been covered with a thin conductive nickel layer through the oxidation-reduction reaction in the electroless nickel deposition; In nickel, a layer of nickel is plated on the chemical nickel by electrochemical method to further enhance the conductivity of the coating. In this step, the hydrated nickel sulfate and hydrated nickel chloride provide the nickel ions required for the electrochemical reaction.

在上述的制造方法中,镀铜层工序的混合溶液中各组分以及浓度为:硫酸铜的浓度为160-260g/L,硫酸的浓度为50-100g/L,氯离子的浓度为40-100ppm,整平剂的浓度为0.2-1ml/L(如乐思的1560酸铜添加剂系列),走位剂的浓度为0.2-1ml/L(如乐思的1561酸铜添加剂系列),开缸剂的浓度为2-10ml/L(如乐思的1562酸铜添加剂系列)。 In the above-mentioned manufacturing method, each component and concentration in the mixed solution of copper plating layer process are: the concentration of copper sulfate is 160-260g/L, the concentration of sulfuric acid is 50-100g/L, the concentration of chloride ion is 40- 100ppm, the concentration of the leveling agent is 0.2-1ml/L (such as the 1560 acid copper additive series of Lesi), the concentration of the displacer is 0.2-1ml/L (such as the 1561 acid copper additive series of Lesi), open the cylinder The concentration of the additive is 2-10ml/L (such as the 1562 acid copper additive series of Lesi).

在上述的制造方法中,装饰层为六价铬镀层或者三价铬镀层中的任一。其中三价铬镀层可以为三价白铬镀层或者三价黑铬镀层或者其它种类的三价铬镀层。当装饰层为三价铬镀层时,在三价铬镀层表面还可以含有钝化膜。 In the above manufacturing method, the decorative layer is either hexavalent chromium plating or trivalent chromium plating. The trivalent chromium coating may be trivalent white chromium coating or trivalent black chromium coating or other types of trivalent chromium coating. When the decorative layer is a trivalent chromium coating, a passivation film may also be included on the surface of the trivalent chromium coating.

作为优选,镀六价铬工序的镀液包括成分及浓度为:铬酐的浓度为260-360g/L,硫酸的浓度为0.5-3g/L,装饰铬光亮剂的浓度为2.0-3.0ml/L(如乐思的1120F或日本金属化工的7000C),铬雾抑制剂0.1-0.4ml/L。要求铬镀层不低于0.1μm。 As preferably, the plating solution of hexavalent chromium plating process includes composition and concentration: the concentration of chromic anhydride is 260-360g/L, the concentration of sulfuric acid is 0.5-3g/L, the concentration of decorative chrome brightener is 2.0-3.0ml/ L (such as Lesi's 1120F or Nippon Metal Chemical's 7000C), chromium mist inhibitor 0.1-0.4ml/L. It is required that the chromium plating layer is not less than 0.1μm.

作为优选,镀三价白铬工序的镀液包括成分及浓度为:含水氯化铬的浓度为90-150g/L,甲酸钾的浓度为50-100g/L,溴化铵的浓度为8-25g/L,氯化铵的浓度为40-60g/L,氯化钾的浓度为40-100g/L,乙酸钠的浓度为10-60g/L,硼酸的浓度为40-80g/L,润湿剂的浓度为0.5-2.5ml/L。要求铬镀层不低于0.1μm。 As preferably, the plating solution of trivalent white chromium plating process comprises composition and concentration: the concentration of aqueous chromium chloride is 90-150g/L, the concentration of potassium formate is 50-100g/L, and the concentration of ammonium bromide is 8-150g/L. 25g/L, the concentration of ammonium chloride is 40-60g/L, the concentration of potassium chloride is 40-100g/L, the concentration of sodium acetate is 10-60g/L, and the concentration of boric acid is 40-80g/L. The concentration of the wet agent is 0.5-2.5ml/L. It is required that the chromium plating layer is not less than 0.1μm.

作为优选,镀三价黑铬工序的镀液包括成分及浓度为:含水氯化铬的浓度为150-250g/L,草酸的浓度为2-5g/L,乙酸铵的浓度为3-10g/L,氯化铵的浓度为20-40g/L,硼酸的浓度为20-41g/L,添加剂的浓度为0.5-3g/L。要求铬镀层不低于0.1μm。 Preferably, the plating solution of the trivalent black chromium plating process includes components and concentrations: the concentration of aqueous chromium chloride is 150-250g/L, the concentration of oxalic acid is 2-5g/L, and the concentration of ammonium acetate is 3-10g/L. L, the concentration of ammonium chloride is 20-40g/L, the concentration of boric acid is 20-41g/L, and the concentration of additives is 0.5-3g/L. It is required that the chromium plating layer is not less than 0.1μm.

镀微裂纹镍是指在基材表面镀一层均与的含有无数个裂纹的镀层,可 以分散腐蚀电流,降低腐蚀电流密度。镀微孔镍是指在塑胶表面镀一层均匀的含有无数个不导电微粒的镀层,可以进一步分散腐蚀电流,降低腐蚀电流密度,全面提高镀层抗蚀性。 Nickel plating with microcracks refers to plating a uniform coating containing countless cracks on the surface of the substrate, which can disperse the corrosion current and reduce the corrosion current density. Microporous nickel plating refers to plating a layer of uniform coating containing countless non-conductive particles on the plastic surface, which can further disperse the corrosion current, reduce the corrosion current density, and comprehensively improve the corrosion resistance of the coating.

在镀半光镍、镀全光镍步骤中,稳定剂均采用了硼酸而非在化学沉镍中的柠檬酸钠,这是因为在镀半光镍、镀全光镍步骤时更关注镀层的深镀能力以及镀层的致密性。 In the steps of semi-bright nickel plating and full-bright nickel plating, boric acid is used as a stabilizer instead of sodium citrate in electroless nickel plating, because more attention is paid to the quality of the coating during the steps of semi-bright nickel plating and full-bright nickel plating. Deep plating ability and denseness of coating.

功能层中微裂纹镍层、微孔镍层或者两者结合能起到防腐蚀和保护基材的原因在于,工件上镀层金属/底材金属极其容易形成腐蚀电池,在阴阳极电位确定的情况下,其腐蚀速率由镀层金属(阴极)表面底材金属(阳极)暴露面积的比率所控制。当只有一处的腐蚀点时,这时阴极/阳极比率最大,腐蚀电流就集中在这一点,腐蚀速率就变得很大,容易向内形成孔蚀,但当金属镀层表面存在较多潜在的腐蚀点时,阴极/阳极比率较小,腐蚀电流被分配到各处,原来腐蚀点上的电流就明显地减少了,腐蚀速率也大大降低。同时,由于微孔或裂纹之间的分割,使镀层阴极形成不连续,被分割后的镀层由大面积变成小面积,如此又进一步限制了阴极/阳极比率。然而随着时问的推移,当镀层表面受到外界因素影响开始出现大型裂纹时,微裂纹、微孔结构的潜在的腐蚀电池就会被引发,从而其到保护受腐蚀点的作用,从而就可以起到双核降低腐蚀电流密度的作用,从而极大提升了耐腐蚀度。 The reason why the microcracked nickel layer, microporous nickel layer or the combination of the two in the functional layer can prevent corrosion and protect the substrate is that the plating metal/substrate metal on the workpiece is extremely easy to form a corrosion cell. The corrosion rate is controlled by the ratio of the exposed area of the substrate metal (anode) to the surface of the coating metal (cathode). When there is only one corrosion point, the cathode/anode ratio is the largest at this time, the corrosion current is concentrated at this point, the corrosion rate becomes very large, and it is easy to form pitting corrosion inward, but when there are more potential corrosion points on the surface of the metal coating At the corrosion point, the cathode/anode ratio is small, the corrosion current is distributed everywhere, the current on the original corrosion point is significantly reduced, and the corrosion rate is also greatly reduced. At the same time, due to the division between micropores or cracks, the cathode of the coating is discontinuous, and the divided coating changes from a large area to a small area, which further limits the cathode/anode ratio. However, as time goes by, when the surface of the coating is affected by external factors and large cracks begin to appear, the potential corrosion cells of micro-cracks and micro-porous structures will be triggered, thereby protecting the corrosion points, so that it can be It plays the role of dual core to reduce the corrosion current density, thus greatly improving the corrosion resistance.

低电位镍抗腐蚀机理 Anticorrosion Mechanism of Low Potential Nickel

第一步:在零件表面有腐蚀介质时,微孔处暴露在外的镍层作为阳极性镀层先遭受腐蚀,腐蚀电流的大小由镀层的表面积决定,在大量不连续微孔的作用下,遭受腐蚀的镍层面积将大大增多且不连续,在腐蚀电流一定的情况下,这些“微孔”极大的分散了腐蚀电流,降低了腐蚀速率,延缓的腐蚀速度。 Step 1: When there is a corrosive medium on the surface of the part, the exposed nickel layer at the micropores is first corroded as an anodic coating. The size of the corrosion current is determined by the surface area of the coating. Under the action of a large number of discontinuous micropores, it is corroded. The area of the nickel layer will be greatly increased and discontinuous. Under the condition of a certain corrosion current, these "micropores" greatly disperse the corrosion current, reduce the corrosion rate, and delay the corrosion rate.

第二步:当腐蚀到达低电位镍层时,由于微孔镍电位较低电位镍电位高,此时低电位镍被作为阳极性镀层优先腐蚀(即低电位层优先作为牺牲层),微孔镍中的腐蚀被终止。在大量不连续微裂纹的作用下,遭受腐蚀的 镍层面积将大大增多且不连续,在腐蚀电流一定的情况下,这些“微孔”极大的分散了腐蚀电流,再次降低了腐蚀速率,延缓的腐蚀速度。 Step 2: When the corrosion reaches the low-potential nickel layer, because the potential of the microporous nickel is lower than the potential of the nickel, the potential of the nickel is high. At this time, the low-potential nickel is preferentially corroded as an anodic coating (that is, the low-potential layer is preferentially used as a sacrificial layer), and the micropore Corrosion in nickel is stopped. Under the action of a large number of discontinuous microcracks, the area of the corroded nickel layer will be greatly increased and discontinuous. Under the condition of a certain corrosion current, these "micropores" greatly disperse the corrosion current and reduce the corrosion rate again. Delayed corrosion rate.

第三步:腐蚀在低电位镍中进一步向下延伸直到基础镀层(包括低电位镍以下镀层)时,由于基础镀层的电位同样比低电位镍高,低电位镍同样被当做了阳极性镀层,此时向下延伸的腐蚀在基础镀层被终止,腐蚀方向在低电位镍中横向进行,这样又进一步延缓了腐蚀至底材的时间,大大降底了腐蚀的速度。 The third step: When the corrosion extends further down in the low-potential nickel until the base coating (including the coating below the low-potential nickel), since the potential of the base coating is also higher than that of the low-potential nickel, the low-potential nickel is also regarded as an anodic coating. At this time, the corrosion extending downward is terminated in the base coating, and the corrosion direction is carried out laterally in the low-potential nickel, which further delays the time for corrosion to the substrate and greatly reduces the corrosion rate.

与现有技术相比,本实用新型的优点在于:本实用新型基材表面电镀得到的微孔镍层和低电位镍层,具有高防腐蚀性能,高硬度,高耐磨性,镀层结合力好,光亮度高等优点;同时以具有高电位特性的微孔镍层以及具有低电位特性的多层镍——低电位镍层为功能层,并以低电位镍层为牺牲层,以具有微孔结构的微孔镍层能够分散电化学腐蚀的微电流,延缓在受到腐蚀发生,同时形成还能够通过微孔结构在氧化后形成氧化物进行支持,可以在作为牺牲层的低电位镍层受到较为严重的腐蚀后对其形成支撑,降低零件镀层损毁速度。设置的作为牺牲层的低电位镍层具有较低的电势,在零件表面镀层发生电化学腐蚀时,低电位镍层优先发生腐蚀,并且具有微孔镍层或者微裂纹镍层时,其微孔或者微裂纹结构同样能够起到分散腐蚀微电流,同时在低电位镍层外侧还具有外层结构时(如装饰层或者保护层时)还可以通过微孔或者微裂纹结构对外侧结构进行支持,增强材料结构的稳固性。另外本实用新型方案利用微孔镍和微裂纹镍的孔隙结构,在增强材料结构支持性能的同时,还可以起到降低镀层质量和降低原料耗费的作用。同时其微孔隙结构还能够在发生氧化腐蚀时形成大面积的氧化物薄膜结构,从而极大地延缓腐蚀的发生。 Compared with the prior art, the utility model has the advantages that: the microporous nickel layer and the low-potential nickel layer obtained by electroplating the substrate surface of the utility model have high anti-corrosion performance, high hardness, high wear resistance, and coating bonding force Good, high brightness and other advantages; at the same time, the microporous nickel layer with high potential characteristics and the multilayer nickel with low potential characteristics—the low potential nickel layer are used as the functional layer, and the low potential nickel layer is used as the sacrificial layer to have micro The microporous nickel layer with a porous structure can disperse the microcurrent of electrochemical corrosion, delay the occurrence of corrosion, and at the same time form oxides to support the formation of oxides after oxidation through the microporous structure, which can be used as a sacrificial layer. After more serious corrosion, it forms a support to reduce the damage speed of the coating of the part. The low-potential nickel layer set as a sacrificial layer has a lower potential. When electrochemical corrosion occurs on the surface coating of the part, the low-potential nickel layer corrodes preferentially, and when there is a microporous nickel layer or a microcracked nickel layer, its micropores Or the micro-crack structure can also disperse the corrosion micro-current, and at the same time, when there is an outer layer structure outside the low-potential nickel layer (such as a decorative layer or a protective layer), the outer structure can also be supported by the micro-pore or micro-crack structure. Enhance the stability of the material structure. In addition, the utility model scheme utilizes the pore structure of microporous nickel and microcracked nickel, which can reduce the quality of the coating and reduce the consumption of raw materials while enhancing the structural support performance of the material. At the same time, its microporous structure can also form a large-area oxide film structure when oxidation and corrosion occur, thereby greatly delaying the occurrence of corrosion.

附图说明 Description of drawings

图1为本实用新型多层超耐蚀镀镍-铬部件的一实施例的镀层结构示意图(以ABS为零件基材)。 Fig. 1 is the coating structure schematic diagram of an embodiment of the multilayer super corrosion-resistant nickel-chromium plating part of the present invention (using ABS as the part base material).

图2为本实用新型多层超耐蚀镀镍-铬部件的一实施例的镀层结构示 意图(以ABS为零件基材)。 Fig. 2 is the coating structure schematic diagram of an embodiment of the multilayer super corrosion-resistant nickel-chromium plating part of the present invention (with ABS as part base material).

图3为本实用新型多层超耐蚀镀镍-铬部件的一实施例的镀层结构示意图(以ABS为零件基材)。 3 is a schematic diagram of the coating structure of an embodiment of the multilayer super corrosion-resistant nickel-chromium plated part of the present invention (using ABS as the part base material).

图4为本实用新型多层超耐蚀镀镍-铬部件的一实施例的镀层结构示意图(以ABS为零件基材)。 4 is a schematic diagram of the coating structure of an embodiment of the multi-layer super corrosion-resistant nickel-chromium plated part of the present invention (using ABS as the part base material).

图5为本实用新型多层超耐蚀镀镍-铬部件的一实施例的镀层结构示意图(以ABS为零件基材)。 5 is a schematic diagram of the coating structure of an embodiment of the multilayer super corrosion-resistant nickel-chrome plated part of the present invention (using ABS as the part base material).

图6现有技术的镀镍部件CASS 72小时后金相图,图6中(a)为实验后样品的正面金相图,图6中(b)为实验后样品的侧面(断面)金相图。 Metallographic diagram after 72 hours of nickel-plated part CASS of Fig. 6 prior art, among Fig. 6 (a) is the front metallographic diagram of sample after experiment, among Fig. 6 (b) is the side (section) metallographic diagram of sample after experiment picture.

图7本实用新型镀镍部件CASS 72小时后金相图,图7中(a)为实验后样品的正面金相图,图7中(a)为实验后样品的侧面金相图。 Fig. 7 metallographic diagram after 72 hours of nickel-plated part CASS of the utility model, among Fig. 7 (a) is the front metallographic diagram of sample after experiment, among Fig. 7 (a) is the side metallographic diagram of sample after experiment.

图8现有技术的镀镍部件氟石膏实验进行168和336小时之后的图片。 Fig. 8 The pictures of the nickel-plated parts of the prior art after the fluorogypsum experiment was carried out for 168 and 336 hours.

图9本实用新型镀镍部件氟石膏实验进行168和336小时之后的图片。 Fig. 9 is the pictures after 168 hours and 336 hours of the fluorine gypsum experiment of the nickel-plated part of the utility model.

图10本实用新型的多层镍腐蚀原理图(以ABS为零件基材)。 Fig. 10 is the multilayer nickel corrosion principle diagram of the utility model (using ABS as the part base material).

图11本实用新型镀镍和\或铬部件的一种实施例的电位差示意图(低电位镍层为高硫镍层或者微裂纹镍层的任一,基础层为半光镍层与全光镍层的复合)。 Fig. 11 potential difference schematic diagram of an embodiment of nickel-plated and/or chromium parts of the utility model (the low-potential nickel layer is any one of high-sulfur nickel layer or micro-crack nickel layer, and the base layer is semi-gloss nickel layer and full-gloss nickel layer Nickel layer composite).

图12本实用新型镀镍和\或铬部件的一种实施例的电位差示意图(低电位镍层为高硫镍层或者微裂纹镍层的任一,基础层为半光镍层与沙丁镍层的复合)。 Fig. 12 potential difference schematic diagram of an embodiment of nickel-plated and\or chromium parts of the utility model (the low-potential nickel layer is any one of high-sulfur nickel layer or micro-crack nickel layer, and the base layer is semi-gloss nickel layer and satin Nickel layer composite).

图13本实用新型镀镍和\或铬部件的一种实施例的电位差示意图(低电位镍层为高硫镍层或者微裂纹镍层的任一,基础层为半光镍层、高硫镍层以及全光镍层的复合)。 Fig. 13 potential difference schematic diagram of an embodiment of nickel plating and/or chromium parts of the utility model (the low-potential nickel layer is any one of high-sulfur nickel layer or micro-crack nickel layer, and the base layer is semi-gloss nickel layer, high-sulfur nickel layer Nickel layer and full nickel layer composite).

图14本实用新型镀镍和\或铬部件的一种实施例的电位差示意图(低电位镍层为高硫镍层或者微裂纹镍层的任一,基础层为半光镍层、高硫镍层以及沙丁镍层的复合)。 Fig. 14 potential difference schematic diagram of an embodiment of the utility model nickel-plated and/or chromium parts (the low-potential nickel layer is either a high-sulfur nickel layer or a micro-crack nickel layer, and the base layer is a semi-gloss nickel layer, a high-sulfur layer Nickel layer and satin nickel layer composite).

图15本实用新型镀镍和\或铬部件的一种实施例的电位差示意图(低电位镍层为高硫镍层或者微裂纹镍层的任一,基础层为半光镍层、全光镍 层以及沙丁镍层的复合)。 Fig. 15 potential difference schematic diagram of an embodiment of nickel-plated and/or chromium parts of the utility model (the low-potential nickel layer is any of high-sulfur nickel layer or micro-crack nickel layer, and the base layer is semi-gloss nickel layer, full-gloss nickel layer Nickel layer and satin nickel layer composite).

图16本实用新型镀镍和\或铬部件的一种实施例的电位差示意图(低电位镍层为高硫镍层与微裂纹镍层的复合层,基础层为半光镍层与全光镍层的复合)。 Fig. 16 potential difference schematic diagram of an embodiment of nickel-plated and/or chromium parts of the utility model (the low-potential nickel layer is a composite layer of a high-sulfur nickel layer and a micro-crack nickel layer, and the base layer is a semi-gloss nickel layer and a full-gloss nickel layer Nickel layer composite).

图17本实用新型镀镍和\或铬部件的一种实施例的电位差示意图(低电位镍层为高硫镍层与微裂纹镍层的复合层,基础层为半光镍层与沙丁镍层的复合)。 Fig. 17 potential difference schematic diagram of an embodiment of the utility model nickel-plated and/or chromium parts (the low-potential nickel layer is a composite layer of high-sulfur nickel layer and micro-crack nickel layer, and the base layer is a semi-gloss nickel layer and satin Nickel layer composite).

图18本实用新型镀镍和\或铬部件的一种实施例的电位差示意图(低电位镍层为高硫镍层与微裂纹镍层的复合层,基础层为半光镍层、高硫镍层以及全光镍层的复合)。 Fig. 18 potential difference schematic diagram of an embodiment of the utility model nickel-plated and/or chromium parts (the low-potential nickel layer is a composite layer of a high-sulfur nickel layer and a micro-crack nickel layer, and the base layer is a semi-gloss nickel layer, a high-sulfur layer Nickel layer and full nickel layer composite).

图19本实用新型镀镍和\或铬部件的一种实施例的电位差示意图(低电位镍层为高硫镍层与微裂纹镍层的复合层,基础层为半光镍层、高硫镍层以及沙丁镍层的复合)。 Fig. 19 potential difference schematic diagram of an embodiment of nickel plating and/or chromium parts of the utility model (the low-potential nickel layer is a composite layer of high-sulfur nickel layer and micro-crack nickel layer, the base layer is a semi-gloss nickel layer, high-sulfur Nickel layer and satin nickel layer composite).

图20本实用新型镀镍和\或铬部件的一种实施例的电位差示意图(低电位镍层为高硫镍层与微裂纹镍层的复合层,基础层为半光镍层、全光镍层以及沙丁镍层的复合)。 Fig. 20 The potential difference schematic diagram of a kind of embodiment of nickel-plated and/or chromium parts of the utility model (low-potential nickel layer is the composite layer of high-sulfur nickel layer and micro-crack nickel layer, base layer is semi-gloss nickel layer, full-gloss nickel layer Nickel layer and satin nickel layer composite).

附图标记列表:1、基材;2、预处理镀层;21、腐蚀空缺;3、镀铜层;31、表面微孔;32、腐蚀孔;4、功能层;141、低电位镍层;142、微孔镍层;6、基础层;61、高硫镍层;62、半光镍层;63、全光镍层;64、沙丁镍层;801、腐蚀介质;802、装饰层;805、腐蚀面;808、打底镍层;809、化学镍层;810、ABS基材。 List of reference signs: 1. Substrate; 2. Pretreatment coating; 21. Corrosion vacancy; 3. Copper plating layer; 31. Surface micropore; 32. Corrosion hole; 4. Functional layer; 141. Low potential nickel layer; 142. Microporous nickel layer; 6. Base layer; 61. High-sulfur nickel layer; 62. Semi-bright nickel layer; 63. Full-gloss nickel layer; 64. Satin nickel layer; 801. Corrosive medium; 802. Decorative layer; 805, corrosion surface; 808, primer nickel layer; 809, chemical nickel layer; 810, ABS substrate.

具体实施方式 Detailed ways

下面结合附图和具体实施方式,进一步阐明本实用新型,应理解下述具体实施方式仅用于说明本实用新型而不用于限制本实用新型的范围。 The utility model will be further explained below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the following specific embodiments are only used to illustrate the utility model and are not intended to limit the scope of the utility model.

以下对本实用新型多层超耐蚀镀镍-铬部件的镀层结构进行说明,这里本实用新型基材可以采用金属、塑料以及其它能够适用电镀的部件。 The coating structure of the multi-layer super corrosion-resistant nickel-chrome plated part of the present invention is described below, where the base material of the present invention can be metal, plastic and other parts suitable for electroplating.

结构实施例1 Structural Example 1

如图1所示,本实施例的多层超耐蚀镀镍-铬部件,该部件包括:基材1(ABS材质);预处理镀层2包括化学镍层809、打底镍层808和镀铜层3,化学镍层809沉积在整个基材1上,打底镍层808沉积在化学镍层809上,在打底镍层808上形成有镀铜层3;和基础层6,其形成于镀铜层3上,其中基础层6包括半光镍层62和全光镍层63,半光镍层62形成于镀铜层3上,全光镍层63形成于半光镍层62上;和功能层4,其形成于基础层6的全光镍层63上,其中功能层4包括低电位镍层141和微孔镍层142,其中低电位镍层141为高硫镍层和微裂纹镍层(可以是高硫镍层形成于镀铜层3上,微裂纹镍层形成于高硫镍层上;也可以是微裂纹镍层形成于镀铜层3上,高硫镍层形成于微裂纹镍层上),微孔镍层142形成于低电位镍层141上;和装饰层802,其形成于微孔镍层142上,其中装饰层为三价白铬镀层,这里全光镍层63与低电位镍层141之间的电位差为0-100mv范围内,半光镍层62与全光镍层63之间的电位差为100-200mv范围内。 As shown in Figure 1, the multilayer super corrosion-resistant nickel-chromium plating part of the present embodiment, this part comprises: base material 1 (ABS material); Copper layer 3, chemical nickel layer 809 is deposited on the entire substrate 1, and a bottoming nickel layer 808 is deposited on the chemical nickel layer 809, and a copper plating layer 3 is formed on the bottoming nickel layer 808; and base layer 6, which forms On the copper plating layer 3, wherein the base layer 6 includes a semi-bright nickel layer 62 and a full-bright nickel layer 63, the semi-bright nickel layer 62 is formed on the copper-plated layer 3, and the full-bright nickel layer 63 is formed on the semi-bright nickel layer 62 and a functional layer 4, which is formed on the full light nickel layer 63 of the base layer 6, wherein the functional layer 4 includes a low-potential nickel layer 141 and a microporous nickel layer 142, wherein the low-potential nickel layer 141 is a high-sulfur nickel layer and a microporous nickel layer. Crack nickel layer (can be that high-sulfur nickel layer is formed on copper-plated layer 3, and micro-crack nickel layer is formed on high-sulfur nickel layer; It can also be that micro-crack nickel layer is formed on copper-plate layer 3, and high-sulfur nickel layer forms On the micro-cracked nickel layer), the microporous nickel layer 142 is formed on the low-potential nickel layer 141; and the decoration layer 802, which is formed on the microporous nickel layer 142, wherein the decoration layer is a trivalent white chromium plating layer, here all light The potential difference between the nickel layer 63 and the low-potential nickel layer 141 is in the range of 0-100mv, and the potential difference between the semi-bright nickel layer 62 and the full-bright nickel layer 63 is in the range of 100-200mv.

结构实施例2 Structural Example 2

如图2所示,本实施例的多层超耐蚀镀镍-铬部件,该部件包括:基材1(ABS材质);预处理镀层2包括化学镍层809、打底镍层808和镀铜层3,化学镍层809沉积在整个基材1上,打底镍层808沉积在化学镍层809上,在打底镍层808上形成有镀铜层3;和基础层6,其形成于镀铜层3上,其中基础层6包括半光镍层62和沙丁镍层64,半光镍层62形成于镀铜层3上,沙丁镍层64形成于半光镍层62上;和功能层4,其形成于基础层6的沙丁镍层64上,其中功能层4包括低电位镍层141和微孔镍层142,其中低电位镍层141为高硫镍层和微裂纹镍层(可以是高硫镍层形成于镀铜层3上,微裂纹镍层形成于高硫镍层上;也可以是微裂纹镍层形成于镀铜层3上,高硫镍层形成于微裂纹镍层上),微孔镍层142形成于低电位镍层141上;和装饰层802,其形成于微孔镍层142上,其中装饰层为三价白铬镀层,这里沙丁镍层64与低电位镍层141之间的电位差为0-100mv范围内,半光镍层62与全光镍层63之间的电位差为100-200mv范围内。 As shown in Figure 2, the multilayer super corrosion-resistant nickel-chromium plating part of the present embodiment, this part comprises: base material 1 (ABS material); Copper layer 3, chemical nickel layer 809 is deposited on the entire substrate 1, and a bottoming nickel layer 808 is deposited on the chemical nickel layer 809, and a copper plating layer 3 is formed on the bottoming nickel layer 808; and base layer 6, which forms On the copper plating layer 3, wherein the base layer 6 includes a semi-bright nickel layer 62 and a satin nickel layer 64, the semi-bright nickel layer 62 is formed on the copper plating layer 3, and the satin nickel layer 64 is formed on the semi-bright nickel layer 62; And the functional layer 4, which is formed on the satin nickel layer 64 of the base layer 6, wherein the functional layer 4 includes a low-potential nickel layer 141 and a microporous nickel layer 142, wherein the low-potential nickel layer 141 is a high-sulfur nickel layer and microcracks Nickel layer (can be that the high-sulfur nickel layer is formed on the copper-plated layer 3, and the micro-crack nickel layer is formed on the high-sulfur nickel layer; it can also be that the micro-crack nickel layer is formed on the copper-plated layer 3, and the high-sulfur nickel layer is formed on the copper-plated layer 3 On the micro-crack nickel layer), the microporous nickel layer 142 is formed on the low-potential nickel layer 141; and the decoration layer 802, which is formed on the microporous nickel layer 142, wherein the decoration layer is a trivalent white chromium plating layer, where satin nickel The potential difference between the layer 64 and the low-potential nickel layer 141 is in the range of 0-100mv, and the potential difference between the semi-bright nickel layer 62 and the full-bright nickel layer 63 is in the range of 100-200mv.

结构实施例3 Structural Example 3

如图3所示,本实施例的多层超耐蚀镀镍-铬部件,该部件包括:基材1(ABS材质);预处理镀层2包括化学镍层809、打底镍层808和镀铜层3,化学镍层809沉积在整个基材1上,打底镍层808沉积在化学镍层809上,在打底镍层808上形成有镀铜层3;和基础层6,其形成于镀铜层3上,其中基础层6包括半光镍层62、高硫镍层61和全光镍层63,半光镍层62形成于镀铜层3上,高硫镍层61形成于半光镍层62上,全光镍层63形成于高硫镍层61上;和功能层4,其形成于基础层6的全光镍层63上,其中功能层4包括低电位镍层141和微孔镍层142,其中低电位镍层141为高硫镍层和微裂纹镍层(可以是高硫镍层形成于镀铜层3上,微裂纹镍层形成于高硫镍层上;也可以是微裂纹镍层形成于镀铜层3上,高硫镍层形成于微裂纹镍层上),微孔镍层142形成于低电位镍层141上;和装饰层802,其形成于微孔镍层142上,其中装饰层为三价白铬镀层。 As shown in Figure 3, the multilayer super corrosion-resistant nickel-chromium plating part of the present embodiment, this part comprises: base material 1 (ABS material); Copper layer 3, chemical nickel layer 809 is deposited on the entire substrate 1, and a bottoming nickel layer 808 is deposited on the chemical nickel layer 809, and a copper plating layer 3 is formed on the bottoming nickel layer 808; and base layer 6, which forms On the copper-plated layer 3, wherein the base layer 6 includes a semi-bright nickel layer 62, a high-sulfur nickel layer 61 and a full-bright nickel layer 63, the semi-bright nickel layer 62 is formed on the copper-plated layer 3, and the high-sulfur nickel layer 61 is formed on On the semi-bright nickel layer 62, the full-bright nickel layer 63 is formed on the high-sulfur nickel layer 61; and the functional layer 4, which is formed on the full-bright nickel layer 63 of the base layer 6, wherein the functional layer 4 includes a low-potential nickel layer 141 And the microporous nickel layer 142, wherein the low-potential nickel layer 141 is a high-sulfur nickel layer and a micro-crack nickel layer (can be that the high-sulfur nickel layer is formed on the copper-plated layer 3, and the micro-crack nickel layer is formed on the high-sulfur nickel layer; It can also be that the micro-crack nickel layer is formed on the copper-plated layer 3, the high-sulfur nickel layer is formed on the micro-crack nickel layer), the micro-porous nickel layer 142 is formed on the low-potential nickel layer 141; and the decoration layer 802 is formed on the On the microporous nickel layer 142, the decorative layer is a trivalent white chromium plating layer.

结构实施例4 Structural Example 4

如图4所示,本实施例的多层超耐蚀镀镍-铬部件,该部件包括:基材1(ABS材质);预处理镀层2包括化学镍层809、打底镍层808和镀铜层3,化学镍层809沉积在整个基材1上,打底镍层808沉积在化学镍层809上,在打底镍层808上形成有镀铜层3;和基础层6,其形成于镀铜层3上,其中基础层6包括半光镍层62、高硫镍层61和沙丁镍层64,半光镍层62形成于镀铜层3上,高硫镍层61形成于半光镍层62上,沙丁镍层64形成于高硫镍层61上;和功能层4,其形成于基础层6的沙丁镍层64上,其中功能层4包括低电位镍层141和微孔镍层142,其中低电位镍层141为高硫镍层和微裂纹镍层(可以是高硫镍层形成于镀铜层3上,微裂纹镍层形成于高硫镍层上;也可以是微裂纹镍层形成于镀铜层3上,高硫镍层形成于微裂纹镍层上),微孔镍层142形成于低电位镍层141上;和装饰层802,其形成于微孔镍层142上,其中装饰层为三价白铬镀层。 As shown in Figure 4, the multilayer super corrosion-resistant nickel-chromium plating part of the present embodiment, this part comprises: base material 1 (ABS material); Copper layer 3, chemical nickel layer 809 is deposited on the entire substrate 1, and a bottoming nickel layer 808 is deposited on the chemical nickel layer 809, and a copper plating layer 3 is formed on the bottoming nickel layer 808; and base layer 6, which forms On the copper plating layer 3, the base layer 6 includes a semi-bright nickel layer 62, a high-sulfur nickel layer 61 and a satin nickel layer 64, the semi-bright nickel layer 62 is formed on the copper plating layer 3, and the high-sulfur nickel layer 61 is formed on the semi-gloss nickel layer On the light nickel layer 62, a satin nickel layer 64 is formed on the high-sulfur nickel layer 61; and a functional layer 4, which is formed on the satin nickel layer 64 of the base layer 6, wherein the functional layer 4 includes a low-potential nickel layer 141 and Microporous nickel layer 142, wherein the low-potential nickel layer 141 is a high-sulfur nickel layer and a micro-crack nickel layer (can be that the high-sulfur nickel layer is formed on the copper-plated layer 3, and the micro-crack nickel layer is formed on the high-sulfur nickel layer; also It can be that the micro-crack nickel layer is formed on the copper-plated layer 3, the high-sulfur nickel layer is formed on the micro-crack nickel layer), the micro-porous nickel layer 142 is formed on the low-potential nickel layer 141; and the decoration layer 802 is formed on the micro-crack nickel layer. On the hole nickel layer 142, the decorative layer is a trivalent white chromium plating layer.

结构实施例5 Structural Example 5

如图5所示,本实施例的多层超耐蚀镀镍-铬部件,该部件包括:基材1(ABS材质);预处理镀层2包括化学镍层809、打底镍层808和镀铜层3, 化学镍层809沉积在整个基材1上,打底镍层808沉积在化学镍层809上,在打底镍层808上形成有镀铜层3;和基础层6,其形成于镀铜层3上,其中基础层6包括半光镍层62、全光镍层63和沙丁镍层64,半光镍层62形成于镀铜层3上,全光镍层63形成于半光镍层62上,沙丁镍层64形成于全光镍层63上;和功能层4,其形成于基础层6的沙丁镍层64上,其中功能层4包括低电位镍层141和微孔镍层142,其中低电位镍层141为高硫镍层和微裂纹镍层(可以是高硫镍层形成于镀铜层3上,微裂纹镍层形成于高硫镍层上;也可以是微裂纹镍层形成于镀铜层3上,高硫镍层形成于微裂纹镍层上),微孔镍层142形成于低电位镍层141上;和装饰层802,其形成于微孔镍层142上,其中装饰层为三价白铬镀层。 As shown in Figure 5, the multilayer super corrosion-resistant nickel-chromium plating part of the present embodiment, this part comprises: base material 1 (ABS material); Copper layer 3, chemical nickel layer 809 is deposited on the entire base material 1, and a bottoming nickel layer 808 is deposited on the chemical nickel layer 809, and a copper plating layer 3 is formed on the bottoming nickel layer 808; and a base layer 6, which forms On the copper-plated layer 3, wherein the base layer 6 includes a semi-gloss nickel layer 62, a full-gloss nickel layer 63 and a satin nickel layer 64, the semi-gloss nickel layer 62 is formed on the copper-plate layer 3, and the full-gloss nickel layer 63 is formed on the half-gloss nickel layer On the light nickel layer 62, the satin nickel layer 64 is formed on the full light nickel layer 63; and the functional layer 4, which is formed on the satin nickel layer 64 of the base layer 6, wherein the functional layer 4 includes a low potential nickel layer 141 and Microporous nickel layer 142, wherein the low-potential nickel layer 141 is a high-sulfur nickel layer and a micro-crack nickel layer (can be that the high-sulfur nickel layer is formed on the copper-plated layer 3, and the micro-crack nickel layer is formed on the high-sulfur nickel layer; also It can be that the micro-crack nickel layer is formed on the copper-plated layer 3, the high-sulfur nickel layer is formed on the micro-crack nickel layer), the micro-porous nickel layer 142 is formed on the low-potential nickel layer 141; and the decoration layer 802 is formed on the micro-crack nickel layer. On the hole nickel layer 142, the decorative layer is a trivalent white chromium plating layer.

结构实施例6-10与结构实施例1-5的唯一区别仅在于:低电位镍层141为微裂纹镍层。 The only difference between structural examples 6-10 and structural examples 1-5 is that the low-potential nickel layer 141 is a micro-cracked nickel layer.

结构实施例11-15与结构实施例1-5的唯一区别仅在于:低电位镍层141为高硫镍层。 The only difference between structural examples 11-15 and structural examples 1-5 is that the low-potential nickel layer 141 is a high-sulfur nickel layer.

结构实施例16-30与结构实施例1-15的唯一区别仅在于:装饰层802为六价铬镀层。 The only difference between structural examples 16-30 and structural examples 1-15 is that the decoration layer 802 is a hexavalent chromium plating layer.

结构实施例31-45与结构实施例1-15的唯一区别仅在于:装饰层802为三价黑铬镀层。 The only difference between the structural examples 31-45 and the structural examples 1-15 is that the decoration layer 802 is a trivalent black chromium plating layer.

结构实施例46-90与结构实施例1-45的唯一区别仅在于:预处理镀层2包括打底镍层808和镀铜层3,打底镍层808沉积在整个基材1上,在打底镍层808上形成有镀铜层3。 The only difference between Structural Examples 46-90 and Structural Examples 1-45 is that: the pretreatment coating 2 includes a bottoming nickel layer 808 and a copper plating layer 3, and the bottoming nickel layer 808 is deposited on the entire substrate 1. A copper plating layer 3 is formed on the bottom nickel layer 808 .

结构实施例91-135与结构实施例1-45的唯一区别仅在于:预处理镀层2包括化学镍层809和镀铜层3,化学镍层809沉积在整个基材1上,在化学镍层809上形成有镀铜层3。 The only difference between Structural Examples 91-135 and Structural Examples 1-45 is that the pretreatment coating 2 includes the chemical nickel layer 809 and the copper plating layer 3, the chemical nickel layer 809 is deposited on the entire substrate 1, and the chemical nickel layer Copper plating layer 3 is formed on 809 .

结构实施例136-180与结构实施例1-45的唯一区别仅在于:不存在预处理镀层2,直接在基材1上形成有镀铜层3。 The only difference between Structural Examples 136-180 and Structural Examples 1-45 is that there is no pretreatment plating layer 2 , and a copper plating layer 3 is directly formed on the base material 1 .

结构实施例181-360与结构实施例1-180的唯一区别仅在于:基材1为pp材质。 The only difference between the structural example 181-360 and the structural example 1-180 is that the substrate 1 is made of pp material.

结构实施例361-540与结构实施例1-180的唯一区别仅在于:基材1为尼龙材质; The only difference between structural examples 361-540 and structural examples 1-180 is that the base material 1 is made of nylon;

结构实施例541-720与结构实施例1-180的唯一区别仅在于:基材1为pc材质; The only difference between Structural Example 541-720 and Structural Example 1-180 is that the base material 1 is made of pc;

结构实施例721-900与结构实施例1-180的唯一区别仅在于:基材1为pet材质; The only difference between Structural Example 721-900 and Structural Example 1-180 is that the substrate 1 is made of pet material;

结构实施例901-1080与结构实施例1-180的唯一区别仅在于:基材1为胶木材质; The only difference between Structural Example 901-1080 and Structural Example 1-180 is that the substrate 1 is bakelite;

结构实施例1081-1260与结构实施例1-180的唯一区别仅在于:基材1为铸铁(包括而不限于灰口铸铁、白口铸铁、球墨铸铁、蠕墨铸铁、可锻铸铁以及合金铸铁等)材质; The only difference between structural examples 1081-1260 and structural examples 1-180 is that the base material 1 is cast iron (including but not limited to gray cast iron, white cast iron, nodular cast iron, vermicular cast iron, malleable cast iron and alloy cast iron, etc.) material;

结构实施例1261-1440与结构实施例1-180的唯一区别仅在于:基材1为钢质(包括各种普通钢、不锈钢等)以及铝合金材质、镁合金材质; The only difference between the structural examples 1261-1440 and the structural examples 1-180 is that the base material 1 is made of steel (including various common steels, stainless steel, etc.), aluminum alloy, and magnesium alloy;

这里所有结构实施例中,微孔镍层142与低电位镍层141之间的电位差为10-120mv范围内,所述低电位镍层141包括有高硫镍层、微裂纹镍层中一层或两层之间的复合镀层,所述微孔镍层142与低电位镍层141之间的电位差为20-100mv范围内,当低电位镍层141采用微裂纹镍层与高硫镍层的复合镀层时,微裂纹镍层与高硫镍层之间电位差为10-80mv内。 In all structural embodiments here, the potential difference between the microporous nickel layer 142 and the low-potential nickel layer 141 is in the range of 10-120mv, and the low-potential nickel layer 141 includes one of the high-sulfur nickel layer and the micro-crack nickel layer. layer or a composite coating between the two layers, the potential difference between the microporous nickel layer 142 and the low-potential nickel layer 141 is in the range of 20-100mv, when the low-potential nickel layer 141 adopts micro-crack nickel layer and high-sulfur nickel When the composite coating is applied, the potential difference between the micro-cracked nickel layer and the high-sulfur nickel layer is within 10-80mv.

如图11-图20所示通过结构实施例1-15可以形成不同的电位差示意图。 As shown in FIGS. 11-20 , different potential differences can be formed through structural embodiments 1-15.

本实用新型技术方案中所采用的基材1材质还可以为其它可以用于在其表面镀制铜、镍、铬镀层的材料。 The material of the base material 1 adopted in the technical solution of the utility model can also be other materials that can be used for plating copper, nickel, and chrome coatings on its surface.

本实用新型实施例中溶液的溶剂除特别说明外均为水(包括而不限于蒸馏水、去离子水、低硬度水等),浓度均以单位体积或者质量的溶液计量。 The solvent of the solution in the embodiment of the utility model is water (including but not limited to distilled water, deionized water, low hardness water, etc.) unless otherwise specified, and the concentration is measured by the solution per unit volume or mass.

以下实施例零件的基材优选采用ABS材质。 The base material of the parts in the following examples is preferably made of ABS.

制备实施例1-5 Preparation Examples 1-5

本实用新型一种实施例的镀镍部件的制造方法如下,将基材的表面进行预处理(预处理依次包括如下步骤:表面去油脂、表面亲水处理、表面 粗化处理、表面中和处理、预浸、表面活化处理、表面解胶处理);将预处理镀层(包括化学沉镍和打底镍)沉积在整个基材上,由基材表面顺次向外形成的化学镍层和打底镍层,并将镀铜层形成于预处理镀层(打底镍层外)上;和将基础层形成于镀铜层上,这里的基础层为半光镍层、高硫镍层和沙丁镍层,半光镍层形成于镀铜层上,高硫镍层形成于半光镍层上,沙丁镍层形成于高硫镍层上;和将功能层中的低电位层形成于基础层的全光镍层上,这里低电位镍层为高硫镍层;和将功能层中的微孔镍层形成于高硫镍层上;和将装饰层形成于微孔镍层上,这里的装饰层为三价白铬层。 The manufacture method of the nickel-plated parts of an embodiment of the present invention is as follows, the surface of base material is carried out pretreatment (pretreatment comprises the following steps successively: surface degrease, surface hydrophilic treatment, surface roughening treatment, surface neutralization treatment , pre-dipping, surface activation treatment, surface debonding treatment); deposit the pre-treatment coating (including chemical nickel deposition and primer nickel) on the entire substrate, and the chemical nickel layer and primer layer formed from the surface of the substrate in sequence The bottom nickel layer, and the copper plating layer is formed on the pretreatment plating layer (outside the bottom nickel layer); and the base layer is formed on the copper plating layer, where the base layer is a semi-light nickel layer, a high-sulfur nickel layer and satin The nickel layer, the semi-gloss nickel layer is formed on the copper plating layer, the high-sulfur nickel layer is formed on the semi-gloss nickel layer, the satin nickel layer is formed on the high-sulfur nickel layer; and the low potential layer in the functional layer is formed on the base On the all-light nickel layer of the layer, the low-potential nickel layer is a high-sulfur nickel layer here; and the microporous nickel layer in the functional layer is formed on the high-sulfur nickel layer; and the decorative layer is formed on the microporous nickel layer, here The decorative layer is a trivalent white chromium layer.

微孔镍层与高硫镍层(低电位镍层)之间的电位差分别为10、20、30、40、50、60、70、80、90、100、110、120mv的任一或者10-120范围内的其它任意值(实施例1-5可以分别选择10-120中不同数值为相应实施例中微孔镍层与低电位镍层间的电位差,各实施例中微孔镍层与低电位镍层间的电位差也可以相同)。微孔镍层为在产品表面镀一层均匀的并含有无数个不导电颗粒和导电颗粒的镍层,这样使得ABS基材工件表面具有高防腐蚀性能,高硬度,高耐磨性,镀层结合力好,光亮度高等优点。 The potential difference between the microporous nickel layer and the high-sulfur nickel layer (low potential nickel layer) is 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 110, 120mv or 10 Other arbitrary values in the range of -120 (embodiments 1-5 can select different numerical values in 10-120 respectively to be the potential difference between the microporous nickel layer and the low-potential nickel layer in the corresponding embodiment, the microporous nickel layer in each embodiment The potential difference with the low-potential nickel layer may also be the same). The microporous nickel layer is a nickel layer that is uniformly plated on the surface of the product and contains countless non-conductive particles and conductive particles, so that the surface of the ABS substrate workpiece has high corrosion resistance, high hardness, high wear resistance, and the coating is combined Good strength, high brightness and other advantages.

在上述零件上镍电镀的方法包括如下步骤: The method for nickel electroplating on the above-mentioned parts comprises the steps:

(1)表面去油脂:将ABS基材在氢氧化钠NaOH、碳酸钠Na2CO3、硅酸钠Na2SiO3和表面活性剂的混合溶液中清洗处理。本步骤中,混合溶液中各组分在不同实施例中的浓度配比见表一。表面活性剂为普通表面活性剂如十二烷基磺酸钠、十八烷基磺酸钠等。 (1) Surface degreasing: Clean the ABS substrate in a mixed solution of sodium hydroxide NaOH, sodium carbonate Na 2 CO 3 , sodium silicate Na 2 SiO 3 and surfactant. In this step, the concentration ratio of each component in the mixed solution in different embodiments is shown in Table 1. Surfactants are common surfactants such as sodium dodecylsulfonate, sodium octadecylsulfonate and the like.

表一 Table I

(2)表面亲水处理:在硫酸和整面剂混合溶液中进行。本步骤中硫酸和整面剂在不同实施例中的浓度配比见表二: (2) Surface hydrophilic treatment: carried out in a mixed solution of sulfuric acid and finishing agent. In this step, the concentration ratio of sulfuric acid and surface finishing agent in different embodiments is shown in Table 2:

表二 Table II

(3)表面粗化处理:去油脂后在铬酸酐CrO3和硫酸H2SO4混合液中进行。本步骤中,铬酸酐CrO3和硫酸H2SO4在不同实施例中的浓度配比见表三: (3) Surface roughening treatment: after degreasing, carry out in a mixed solution of chromic anhydride CrO 3 and sulfuric acid H 2 SO 4 . In this step, the concentration ratios of chromic anhydride CrO3 and sulfuric acid H2SO4 in different embodiments are shown in Table 3 :

表三 Table three

(4)表面中和处理:将表面粗化处理后的ABS基材放入盐酸和水合肼的混合溶液中进行。本步骤中,盐酸和水合肼在不同实施例的浓度配比见表四: (4) Surface neutralization treatment: put the ABS substrate after surface roughening treatment into a mixed solution of hydrochloric acid and hydrazine hydrate. In this step, the concentration ratios of hydrochloric acid and hydrazine hydrate in different embodiments are shown in Table 4:

表四 Table four

(5)表面预浸:表面中和处理后的基材在盐酸溶液中进行,本步骤中,盐酸溶液在不同实施例的浓度配比见表五: (5) Surface pre-soaking: the base material after surface neutralization treatment is carried out in hydrochloric acid solution. In this step, the concentration ratio of hydrochloric acid solution in different embodiments is shown in Table 5:

表五 Table five

(6)表面活化处理:中和后采用胶体钯溶液进行表面活化处理,胶体钯溶液中盐酸、氯化钯PdCl2和氯化亚锡SnCl2在不同实施例的浓度配比见表六: (6) surface activation treatment: adopt colloidal palladium solution to carry out surface activation treatment after neutralization, hydrochloric acid, palladium chloride PdCl in the colloidal palladium solution 2 and stannous chloride SnCl 2 concentration ratios in different embodiments are shown in Table 6:

表六 Table six

(7)表面解胶处理:在硫酸H2SO4溶液中进行。本步骤中硫酸溶液在不同实施例的浓度配比见表七: (7) Surface degumming treatment: carried out in sulfuric acid H 2 SO 4 solution. In this step, the concentration ratio of sulfuric acid solution in different embodiments is shown in Table 7:

表七 Table Seven

(8)镀化学镍层:在含有硫酸镍、次亚磷酸钠、柠檬酸钠C6H5Na3O7、氯化铵以及氨水(氨水用来调节溶液的pH为8.6-9.2)的混合溶液中进行。本步骤中,混合溶液中各组分在不同实施例中的浓度配比见表八。 (8) Electroless nickel plating layer: mixed with nickel sulfate, sodium hypophosphite, sodium citrate C 6 H 5 Na 3 O 7 , ammonium chloride and ammonia water (ammonia water is used to adjust the pH of the solution to 8.6-9.2) in solution. In this step, the concentration ratio of each component in the mixed solution in different embodiments is shown in Table 8.

表八 table eight

(9)镀打底镍层:在含有含水硫酸镍Ni2SO4-6H2O、含水氯化镍NiCl2--6H2O、硼酸H3BO3和湿润剂的混合溶液中进行。本步骤中,混合溶液中各组分在不同实施例中的浓度配比见表九。表九中湿润剂为如乐思的62A或麦德美的NIMAC 32C WETTER。 (9) Primer nickel plating: carried out in a mixed solution containing aqueous nickel sulfate Ni 2 SO 4 -6H 2 O, aqueous nickel chloride NiCl 2 --6H 2 O, boric acid H 3 BO 3 and a wetting agent. In this step, the concentration ratio of each component in the mixed solution in different embodiments is shown in Table 9. The wetting agent in Table 9 is 62A from Rosuria or NIMAC 32C WETTER from MacDermid.

表九 Table nine

(10)镀铜层:在硫酸铜CuSO4、硫酸H2SO4、氯离子、整平剂、走位剂和开缸剂的混合溶液中进行。本步骤中,混合溶液中各组分在不同实施例的浓度配比见表十。这里整平剂为乐思的1560酸铜添加剂系列,走位剂为乐思的1561酸铜添加剂系列,开缸剂为乐思的1562酸铜添加剂系列。 (10) Copper plating layer: carried out in a mixed solution of copper sulfate CuSO 4 , sulfuric acid H 2 SO 4 , chloride ions, leveling agent, displacement agent and cylinder opener. In this step, the concentration ratio of each component in the mixed solution in different embodiments is shown in Table 10. Here the leveling agent is Schleich’s 1560 acid copper additive series, the positioning agent is Schleich’s 1561 acid copper additive series, and the cylinder opener is Schleich’s 1562 acid copper additive series.

表十 table ten

(11)镀半光镍层:在含水硫酸镍Ni2SO4-6H2O、含水氯化镍NiCl2-6H2O和硼酸H3BO3、半光亮镍初级光亮剂、半光亮镍次级光亮剂、电位差调整剂和润湿剂的混合溶液中进行。本步骤中,混合溶液中各组分在不同实施例的浓度配比分别见表十一。这里湿润剂为如乐思的62A或麦德美的NIMAC 32C WETTER,半光亮镍初级光亮剂为乐思的BTL MU或麦德美的NIMAC SF DUCT,半光亮镍次级光亮剂为乐思的TL-2或麦德美的NIMAC SF LEVELER,电位差调整剂为乐思的B补或麦德美的NIMAC SF MAINTENANCE。 (11) Semi-bright nickel plating layer: in aqueous nickel sulfate Ni 2 SO 4 -6H 2 O, aqueous nickel chloride NiCl 2 -6H 2 O and boric acid H 3 BO 3 , semi-bright nickel primary brightener, semi-bright nickel secondary It is carried out in the mixed solution of grade brightener, potential difference regulator and wetting agent. In this step, the concentration ratios of the components in the mixed solution in different embodiments are shown in Table 11. The wetting agent here is such as Schleich’s 62A or MacDermid’s NIMAC 32C WETTER, the semi-bright nickel primary brightener is Schleich’s BTL MU or MacDermid’s NIMAC SF DUCT, and the semi-bright nickel secondary brightener is Schleich’s TL- 2 or NIMAC SF LEVELER of Mai Demei, the potential difference regulator is B supplement of Lesi or NIMAC SF MAINTENANCE of Mai Demei.

表十一 Table Eleven

(12)镀高硫镍层:在含水硫酸镍、含水氯化镍、硼酸、高硫添加剂和润湿剂的混合溶液中进行。本步骤中,混合溶液中各组分在不同实施例的浓度配比分别见表十二。这里湿润剂为如乐思的62A或麦德美的NIMAC 32C WETTER。 (12) High-sulfur nickel plating layer: carried out in a mixed solution of aqueous nickel sulfate, aqueous nickel chloride, boric acid, high-sulfur additives and wetting agents. In this step, the concentration ratios of the components in the mixed solution in different embodiments are shown in Table 12. The wetting agent here is 62A of Rosex or NIMAC 32C WETTER of MacDermid.

表十二 Table 12

(13)镀沙丁镍层:在含水硫酸镍、含水氯化镍、硼酸、辅助添加剂和沙丁镍形成剂的混合溶液中进行。本步骤中,混合溶液中各组分在不同实施例的浓度配比分别见表十三。这里辅助添加剂为乐思的Elpelyt pearlbrite carrier K4或Elpelyt carrier brightener H,沙丁镍形成剂为乐思的Elpelyt pearlbrite additive K6AL。 (13) Sardine nickel plating layer: carried out in a mixed solution of aqueous nickel sulfate, aqueous nickel chloride, boric acid, auxiliary additives and satin nickel forming agent. In this step, the concentration ratio of each component in the mixed solution in different embodiments is shown in Table 13. Here the auxiliary additive is Elpelyt pearlbrite carrier K4 or Elpelyt carrier brightener H from Schleich, and the nickel satin forming agent is Elpelyt pearlbrite additive K6AL from Schleich.

表十三 Table 13

(14)镀高硫镍层(低电位层):在含水硫酸镍、含水氯化镍、硼酸、高硫添加剂和润湿剂的混合溶液中进行。本步骤中,混合溶液中各组分在不同实施例的浓度配比分别见表十四。这里的湿润剂为如乐思的62A或麦德美的NIMAC 32C WETTER。 (14) Plating a high-sulfur nickel layer (low potential layer): carried out in a mixed solution of aqueous nickel sulfate, aqueous nickel chloride, boric acid, high-sulfur additives and wetting agents. In this step, the concentration ratio of each component in the mixed solution in different embodiments is shown in Table 14. The wetting agent here is 62A of Rosex or NIMAC 32C WETTER of MacDermid.

表十四 Table Fourteen

(15)镀微孔镍层:在含水硫酸镍、含水氯化镍、硼酸、镍封光亮剂、镍封主光剂和镍封颗粒载体的混合溶液中进行。本步骤中,混合溶液中各组分在不同实施例的浓度配比分别见表十五。这里镍封光亮剂为乐思的63; 镍封主光剂为乐思的610CFC;镍封颗粒载体为乐思的ENHANCER。 (15) Microporous nickel plating layer: carried out in a mixed solution of aqueous nickel sulfate, aqueous nickel chloride, boric acid, nickel sealing brightener, nickel sealing main brightening agent and nickel sealing particle carrier. In this step, the concentration ratios of the components in the mixed solution in different embodiments are shown in Table 15. Here, the nickel sealing brightener is Schleich's 63; the nickel sealing main brightener is Schleich's 610CFC; the nickel sealing particle carrier is Schleich's ENHANCER.

表十五 Table 15

(16)镀三价白铬层(装饰层):在含水氯化铬、甲酸钾、溴化铵、氯化铵、氯化钾、乙酸钠、硼酸、润湿剂的混合溶液中进行。本步骤中,混合溶液中各组分在不同实施例中的浓度配比见表十六。这里湿润剂为如乐思的62A或麦德美的NIMAC 32C WETTER。 (16) Trivalent white chromium plating layer (decorative layer): carried out in a mixed solution containing chromium chloride, potassium formate, ammonium bromide, ammonium chloride, potassium chloride, sodium acetate, boric acid, and wetting agent. In this step, the concentration ratio of each component in the mixed solution in different embodiments is shown in Table 16. The wetting agent here is 62A of Rosex or NIMAC 32C WETTER of MacDermid.

表十六 Table 16

以上制备实施例CASS实验达到96-120h及以上,氟石膏实验则达到稳定336h以上。 The CASS experiment of the above preparation examples reaches 96-120h and above, and the fluorogypsum experiment reaches a stability of more than 336h.

制备实施例6-10与制备实施例1-5的唯一区别仅在于,低电位镍层为微裂纹层。镀微裂纹镍层在含水氯化镍、醋酸、PN-1A、PN-2A、湿润剂的 混合溶液中进行。本步骤中,混合溶液中各组分在不同实施例中的浓度配比见表十七。这里的湿润剂为如乐思的62A或麦德美的NIMAC 32C WETTER。 The only difference between Preparation Examples 6-10 and Preparation Examples 1-5 is that the low-potential nickel layer is a microcrack layer. The microcracked nickel layer is plated in a mixed solution of aqueous nickel chloride, acetic acid, PN-1A, PN-2A, and a wetting agent. In this step, the concentration ratio of each component in the mixed solution in different embodiments is shown in Table 17. The wetting agent here is 62A of Rosex or NIMAC 32C WETTER of MacDermid.

表十七 Table 17

制备实施例11-15与制备实施例1-5的唯一区别仅在于,低电位镍层包括有高硫镍层(各实施例镀液对应地顺次参见表十四所示)、微裂纹镍层(各实施例镀液对应地顺次参见表十七所示)两层之间的复合。此时微裂纹层与高硫镍层之间电位差为10、20、30、40、50、60、70、80的任一或10-80范围的任意值mv。 The only difference between Preparation Examples 11-15 and Preparation Examples 1-5 is that the low-potential nickel layer includes a high-sulfur nickel layer (each embodiment plating solution is shown in Table 14 in sequence), micro-cracked nickel layer (each embodiment plating solution is shown in Table 17 in sequence correspondingly) compound between two layers. At this time, the potential difference between the microcrack layer and the high-sulfur nickel layer is any one of 10, 20, 30, 40, 50, 60, 70, 80 or any value in the range of 10-80 mv.

制备实施例16-30与制备实施例1-15的唯一区别仅在于,装饰层为六价铬层。镀六价铬层在铬酐、硫酸、装饰铬光亮剂和铬雾抑制剂的混合溶液中进行。本步骤中,混合溶液中各组分在不同实施例中的浓度配比见表十八。这里装饰铬光亮剂为乐思的1120F或日本金属化工的7000C。 The only difference between Preparation Examples 16-30 and Preparation Examples 1-15 is that the decoration layer is a hexavalent chromium layer. The hexavalent chromium plating layer is carried out in a mixed solution of chromic anhydride, sulfuric acid, decorative chrome brightener and chromium mist inhibitor. In this step, the concentration ratio of each component in the mixed solution in different embodiments is shown in Table 18. The decorative chrome brightener here is 1120F from Schleich or 7000C from Nippon Metal Chemical Industry.

表十八 Table 18

制备实施例31-45与制备实施例1-15的唯一区别仅在于,装饰层为三价黑铬层。镀三价黑铬层在含水氯化铬、草酸、乙酸铵、氯化铵、硼酸和添加剂的混合溶液中进行。本步骤中,混合溶液中各组分在不同实施例中的浓度配比见表十九。 The only difference between Preparation Examples 31-45 and Preparation Examples 1-15 is that the decorative layer is a trivalent black chromium layer. The trivalent black chromium plating layer is carried out in a mixed solution containing chromium chloride, oxalic acid, ammonium acetate, ammonium chloride, boric acid and additives. In this step, the concentration ratio of each component in the mixed solution in different embodiments is shown in Table 19.

表十九 Table nineteen

制备实施例46-90与制备实施例1-45的唯一区别仅在于,基础层包括由镀铜层表面顺次向外形成的半光镍层(各实施例镀液对应地顺次参见表十一所示)和全光镍层。镀全光镍层在含水硫酸镍Ni2SO4-6H2O、含水氯化镍NiCl2-6H2O、硼酸H3BO3、光亮镍柔软剂、光亮镍主光剂和润湿剂的混合溶液中进行。本步骤中,混合溶液中各组分在不同实施例的浓度配比分别见表二十。这里湿润剂为如乐思的62A或麦德美的NIMAC 32C WETTER,光亮镍柔软剂为乐思的63或麦德美的NIMAC 14 INDEX,光亮镍主光剂为乐思的66E或麦德美的NiMac Chanllenger Plus。 The only difference between Preparation Examples 46-90 and Preparation Examples 1-45 is that the base layer includes a semi-gloss nickel layer formed sequentially outwards from the surface of the copper plating layer (see Table 10 for each embodiment plating solution correspondingly in sequence) 1) and full-gloss nickel layer. The full-bright nickel layer is coated with aqueous nickel sulfate Ni 2 SO 4 -6H 2 O, aqueous nickel chloride NiCl 2 -6H 2 O, boric acid H 3 BO 3 , bright nickel softener, bright nickel main light agent and wetting agent in a mixed solution. In this step, the concentration ratio of each component in the mixed solution in different embodiments is shown in Table 20. The wetting agent here is 62A of Rusys or NIMAC 32C WETTER of MacDermid, the softener of bright nickel is 63 of Nias or NIMAC 14 INDEX of Macdermid, and the main brightening agent of bright nickel is 66E of NiMac or NiMac Chanllenger of Macdermid Plus.

表二十 Table twenty

制备实施例91-135与制备实施例1-45的唯一区别仅在于,基础层包括由镀铜层表面顺次向外形成的半光镍层(各实施例镀液对应地顺次参见表十一所示)和沙丁镍层(各实施例镀液对应地顺次参见表十三所示)。 The only difference between Preparation Examples 91-135 and Preparation Examples 1-45 is that the base layer includes a semi-gloss nickel layer formed sequentially outwards from the surface of the copper-plated layer (each embodiment plating solution is correspondingly referred to in Table 10 in sequence) 1) and satin nickel layer (each embodiment plating solution is correspondingly shown in Table 13 in sequence).

制备实施例136-180与制备实施例1-45的唯一区别仅在于,基础层包括由镀铜层表面顺次向外形成的半光镍层(各实施例镀液对应地顺次参见表十一所示)、高硫层(各实施例镀液对应地顺次参见表十二所示)和全光镍层(各实施例镀液对应地顺次参见表二十所示)。 The only difference between Preparation Examples 136-180 and Preparation Examples 1-45 is that the base layer includes a semi-gloss nickel layer formed outwards from the surface of the copper-plated layer (each embodiment plating solution is correspondingly referred to in Table 10 in sequence) 1), high-sulfur layer (each embodiment plating solution is correspondingly shown in Table 12) and all-bright nickel layer (each embodiment plating solution is correspondingly shown in Table 20).

制备实施例181-225与制备实施例1-45的唯一区别仅在于,基础层包 括由镀铜层表面顺次向外形成的半光镍层(各实施例镀液对应地顺次参见表十一所示)、全光镍层(各实施例镀液对应地顺次参见表二十所示)和沙丁镍层(各实施例镀液对应地顺次参见表十三所示)。 The only difference between the preparation examples 181-225 and the preparation examples 1-45 is that the base layer includes a semi-gloss nickel layer formed sequentially outwards from the surface of the copper plating layer (each embodiment plating solution is correspondingly referred to in the table sequentially) Shown in eleven), full light nickel layer (each embodiment plating solution is correspondingly shown in Table 20 in sequence) and satin nickel layer (each embodiment plating solution is correspondingly shown in Table 13 in sequence).

制备实施例226-450与制备实施例1-225的唯一区别仅在于,镍封光亮剂为麦德美的NIMAC 14 INDEX;镍封主光剂为麦德美的NIMAC 33;镍封颗粒载体为麦德美的NiMac Hypore XL分散剂。 The only difference between Preparation Example 226-450 and Preparation Example 1-225 is that the nickel sealing brightener is Macdermid’s NIMAC 14 INDEX; the nickel sealing main brightening agent is Macdermid’s NIMAC 33; the nickel sealing particle carrier is Macdermid Midea NiMac Hypore XL dispersant.

制备实施例451-900与制备实施例1-450的唯一区别仅在于,镀微孔镍镀液还包括微孔粉颗粒0.3-0.8ml/L(在此处实施例中关于微孔粉颗粒的用量可以选择一下任意值:0.3、0.32、0.33、0.34、0.37、0.39、0.4、0.42、0.43、0.44、0.47、0.49、0.5、0.52、0.53、0.54、0.57、0.59、0.6、0.62、0.63、0.64、0.67、0.69、0.7、0.72、0.73、0.74、0.77、0.79、0.8),乐思的618;湿润剂1.0-3.0ml/L(在此处实施例中关于湿润剂的用量可以选择一下任意值:1、1.2、1.3、1.4、1.7、1.9、2、2.2、2.3、2.4、2.7、2.9、3.0),乐思的62A。 The only difference between Preparation Example 451-900 and Preparation Example 1-450 is that the microporous nickel plating solution also includes microporous powder particles 0.3-0.8ml/L (in this embodiment about microporous powder particles The dosage can choose any value: 0.3, 0.32, 0.33, 0.34, 0.37, 0.39, 0.4, 0.42, 0.43, 0.44, 0.47, 0.49, 0.5, 0.52, 0.53, 0.54, 0.57, 0.59, 0.6, 0.62, 0.63, 0.64 , 0.67, 0.69, 0.7, 0.72, 0.73, 0.74, 0.77, 0.79, 0.8), Lesi's 618; wetting agent 1.0-3.0ml/L (you can choose any value for the amount of wetting agent in the examples here : 1, 1.2, 1.3, 1.4, 1.7, 1.9, 2, 2.2, 2.3, 2.4, 2.7, 2.9, 3.0), Lesi’s 62A.

制备实施例901-1350与制备实施例451-900的唯一区别仅在于,镀微孔镍镀液中微孔粉颗粒为麦德美的NiMac Hypore XL粉剂;湿润剂为麦德美的NIMAC 32C WETTER。 The only difference between Preparation Example 901-1350 and Preparation Example 451-900 is that the microporous powder particles in the microporous nickel plating bath are NiMac Hypore XL powder from MacDermid; the wetting agent is NIMAC 32C WETTER from MacDermid.

制备实施例1351-2700与制备实施例1-1350的唯一区别仅在于,预处理镀层为化学镍层(各实施例镀液对应地顺次参见表八所示)。 The only difference between Preparation Example 1351-2700 and Preparation Example 1-1350 is that the pretreatment coating is an electroless nickel layer (see Table 8 for the corresponding plating solutions of each example).

制备实施例2701-4050与制备实施例1-1350的唯一区别仅在于,预处理镀层为打底镍层(各实施例镀液对应地顺次参见表九所示)。 The only difference between Preparation Examples 2701-4050 and Preparation Examples 1-1350 is that the pretreatment coating is a primer nickel layer (refer to Table 9 for the corresponding plating solutions of each embodiment).

制备实施例4051-5400与制备实施例1-1350的唯一区别仅在于,基材表面不存在预处理镀层,镀铜层直接形成于基材表面。 The only difference between Preparation Examples 4051-5400 and Preparation Examples 1-1350 is that there is no pretreatment coating on the surface of the substrate, and the copper plating layer is directly formed on the surface of the substrate.

以上制备实施例中PN-1A、PN-2A均为安美特(中国)化学有限公司市售产品。 In the above preparation examples, PN-1A and PN-2A are commercially available products from Atotech (China) Chemical Co., Ltd.

综合以上所有实施例,可以看出,本实用新型技术方案所有实施例通过CASS实验达到96-120h及以上(现有技术则提出为40-48h),氟石膏实验则达到稳定336h以上(现有技术所得到的产品则不稳定,无法进行量化 表征)。 Based on all the above embodiments, it can be seen that all the embodiments of the technical solution of the present invention reach 96-120h and above through the CASS experiment (the prior art then proposes to be 40-48h), and the fluorogypsum experiment then reaches a stability of more than 336h (the existing The product obtained by the technology is unstable and cannot be quantified).

本实用新型技术方案中基材还可以采用包括而不限于PC、PP、尼龙、PET、胶木及铸铁、钢制、铝合金、镁合金等材料在内的材料制成的。在选用除ABS外的其它基材时,预处理镀层可以根据实际材质的性能以及工艺需求进行选择有预处理镀层或无预处理镀层。 In the technical solution of the utility model, the base material can also be made of materials including but not limited to PC, PP, nylon, PET, bakelite, cast iron, steel, aluminum alloy, magnesium alloy and the like. When selecting other substrates except ABS, the pretreatment coating can be selected according to the actual material performance and process requirements with pretreatment coating or without pretreatment coating.

如图7为本实用新型一个实施例所得到的镀镍部件样品经过72h CASS实验后得到的腐蚀状态图,与图6为现有技术的镀镍部件样品经过72h CASS实验后(同等实验条件下)得到的腐蚀状态图,经过对比可以直观地看到,现有的样品在实验后存在大量的镀层剥落以及腐蚀后产生的腐蚀空缺21,严重地影响了产品镀层的质量。图7则可以看出,本实用新型得到的镀镍样品则在表面仅仅存在一定数量的表面微孔31,而断面显示则同样仅仅存在较小的腐蚀孔32,无论是表面微孔以及牺牲层产生的腐蚀孔都没有能够破坏部件的镀层结构,不影响产品的使用和美观。 Fig. 7 is the corrosion state figure obtained after the nickel-plated part sample obtained by an embodiment of the utility model through the 72h CASS experiment, and Fig. 6 is after the nickel-plated part sample of the prior art through the 72h CASS experiment (under the same experimental conditions ) obtained by comparing the corrosion state diagram, it can be seen intuitively that the existing samples have a large number of coating peelings after the experiment and corrosion vacancies 21 after corrosion, which seriously affects the quality of the product coating. As can be seen from Fig. 7, the nickel-plated sample obtained by the utility model only has a certain number of surface micropores 31 on the surface, while the cross-section shows that there are only small corrosion holes 32, no matter the surface micropores and the sacrificial layer. The resulting corrosion holes are not able to damage the coating structure of the components, and do not affect the use and appearance of the product.

图8和图9则分别为现有技术的镀镍部件样品以及本实用新型一个实施例所得的镀镍部件样品经氟石膏实验(336h、336h、168h)后的样品表面腐蚀状态图(图中圆内部分为实验区域),图中可以看出,现有技术的镀镍部件样品表面均受到不同程度的腐蚀,而本实用新型得到的样品则受到腐蚀程度非常轻微,基本没有变色。由此可见,毫无疑问的本实用新型技术方案得到的镀镍部件具有更为优良的镀层稳定性和耐腐蚀性,使得镀镍部件更为耐用,美观。 Fig. 8 and Fig. 9 are respectively the sample surface corrosion state figure (in the figure) of the nickel-plated part sample of the prior art and the nickel-plated part sample gained by an embodiment of the utility model through the fluorogypsum experiment (336h, 336h, 168h) The inside of the circle is divided into experimental areas), as can be seen from the figure, the surface of the nickel-plated parts sample of the prior art is corroded to varying degrees, while the sample obtained by the utility model is corroded very slightly, and basically does not have discoloration. It can be seen that there is no doubt that the nickel-plated part obtained by the technical solution of the utility model has better plating stability and corrosion resistance, making the nickel-plated part more durable and beautiful.

如图10所示,本实用新型方案得到的镀镍部件受到腐蚀时的机理为:图中为在ABS基材810上逐层地形成化学镍层809、打底镍层808、镀铜层3、基础层6、低电位镍层141、微孔镍层142和装饰层802。腐蚀介质801于微孔镍层142的微孔结构分散腐蚀电流并进入低电位镍层141(减小实际参与腐蚀的面积,具有较小的腐蚀面积,形成多个独立的腐蚀点,从而分散腐蚀电流,延缓腐蚀速度),在腐蚀形成腐蚀面805后,当腐蚀面805贯穿低电位镍层141后遇到高电势的基础层6和镀铜层3后中止纵向腐蚀,变为横向腐蚀直至将整个低电位镍层141腐蚀完,才会进行下一步 的腐蚀,直至镀层结构被整体破坏。 As shown in Figure 10, the mechanism when the nickel-plated parts obtained by the utility model scheme is corroded is: in the figure, the chemical nickel layer 809, the nickel layer 808, and the copper-plated layer 3 are formed layer by layer on the ABS base material 810. , base layer 6 , low potential nickel layer 141 , microporous nickel layer 142 and decoration layer 802 . The corrosion medium 801 disperses the corrosion current in the microporous structure of the microporous nickel layer 142 and enters the low potential nickel layer 141 (reduces the area actually involved in corrosion, has a smaller corrosion area, forms a plurality of independent corrosion points, thereby disperses corrosion current, slowing down the corrosion rate), after corrosion forms the corrosion surface 805, when the corrosion surface 805 penetrates the low-potential nickel layer 141 and encounters the high-potential base layer 6 and the copper plating layer 3, the vertical corrosion is stopped, and the horizontal corrosion becomes until the After the entire low-potential nickel layer 141 has been corroded, the next step of corrosion will be carried out until the coating structure is destroyed as a whole.

如图11至图20的镀层电位图则可以看出,本实施例方案中,无论低电位镍层是单一层或者复合层结构,均为受到腐蚀时以低电位镍层为牺牲层,低电位镍层为高硫镍层与微裂纹镍层的复合层时,高硫镍层与微裂纹镍层的电位的高低随实际生产工艺进行调节,可以是高硫镍层电势稍高,也可以是微裂纹镍层电势稍高。在低电位镍层完全腐蚀时则依照电腐蚀优先次序优先腐蚀基础层,降低对表层结构的破坏。 As can be seen from the coating potential diagrams in Figures 11 to 20, in this embodiment, no matter whether the low-potential nickel layer is a single layer or a composite layer structure, the low-potential nickel layer is used as a sacrificial layer when being corroded, and the low-potential nickel layer is used as a sacrificial layer. When the nickel layer is a composite layer of the high-sulfur nickel layer and the micro-cracked nickel layer, the potential of the high-sulfur nickel layer and the micro-cracked nickel layer is adjusted with the actual production process, and the potential of the high-sulfur nickel layer can be slightly higher, or it can be The potential of the micro-cracked nickel layer is slightly higher. When the low-potential nickel layer is completely corroded, the base layer will be corroded first in accordance with the priority order of electric corrosion to reduce the damage to the surface structure.

本处实施例对本实用新型要求保护的技术范围中点值未穷尽之处,同样都在本实用新型要求保护的范围内。 The embodiment here does not exhaust the mid-point value of the technical scope claimed by the utility model, and all of them are also within the scope of the utility model.

本实用新型方案所公开的技术手段不仅限于上述技术手段所公开的技术手段,还包括由以上技术特征任意组合所组成的技术方案。以上是本实用新型的具体实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本实用新型原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也视为本实用新型的保护范围。 The technical means disclosed in the solution of the utility model are not limited to the technical means disclosed in the above technical means, but also include technical solutions composed of any combination of the above technical features. The above are the specific embodiments of the present utility model, and it should be pointed out that for those of ordinary skill in the art, without departing from the principle of the present utility model, some improvements and modifications can also be made, and these improvements and modifications are also considered It is the protection scope of the utility model.

Claims (11)

1. the super anti-corrosion nickel plating-chromium parts of multilayer, these parts comprise:
Base material;
Pre-treatment coating, its deposition over the whole substrate, pre-treatment coating is formed with copper plate; With
Basal layer, it is formed on copper plate; With
Functional layer, it is formed on basal layer, and wherein functional layer comprises low potential nickel dam and is formed at the micropore nickel dam on low potential nickel dam; With
Ornament layer, it is formed on micropore nickel dam, and described ornament layer is the arbitrary of trivalent chromium coating or sexavalent chrome coating.
2. the super anti-corrosion nickel plating-chromium parts of multilayer according to claim 1, is characterized in that: the potential difference between described micropore nickel dam and low potential nickel dam is within the scope of 10-120mv.
3. the super anti-corrosion nickel plating-chromium parts of multilayer according to claim 2, is characterized in that: described low potential nickel dam include one deck in high-sulfur nickel dam, tiny crack nickel dam or two-layer between composite deposite.
4. the super anti-corrosion nickel plating-chromium parts of the multilayer according to Claims 2 or 3, is characterized in that: the potential difference between described micropore nickel dam and low potential nickel dam is within the scope of 20-100mv.
5. the super anti-corrosion nickel plating-chromium parts of multilayer according to claim 3, is characterized in that: when low potential nickel dam adopts the composite deposite of tiny crack nickel dam and high-sulfur nickel dam, between tiny crack nickel dam and high-sulfur nickel dam, potential difference is in 10-80mv.
6. the super anti-corrosion nickel plating-chromium parts of multilayer according to claim 1, is characterized in that: described basal layer comprise in half light nickel dam, high-sulfur nickel dam, full light nickel dam, husky fourth nickel dam one or more layers.
7. the super anti-corrosion nickel plating-chromium parts of multilayer according to claim 6, is characterized in that: described basal layer is the compound between half light nickel dam and full light nickel dam, and wherein, half light nickel dam is formed on copper plate, and full light nickel dam is formed on half light nickel dam.
8. the super anti-corrosion nickel plating-chromium parts of multilayer according to claim 6, it is characterized in that: described basal layer is the compound between half light nickel dam and Sha Ding nickel dam, wherein, half light nickel dam is formed on copper plate, and husky fourth nickel dam is formed on half light nickel dam.
9. the super anti-corrosion nickel plating-chromium parts of multilayer according to claim 6, it is characterized in that: described basal layer is half light nickel dam, high-sulfur nickel dam and the compound entirely between light nickel dam, wherein, half light nickel dam is formed on copper plate, high-sulfur nickel dam is formed on half light nickel dam, and full light nickel dam is formed on high-sulfur nickel dam.
10. the super anti-corrosion nickel plating-chromium parts of multilayer according to claim 6, it is characterized in that: described basal layer is half light nickel dam, compound between high-sulfur nickel dam and Sha Ding nickel dam, wherein, half light nickel dam is formed on copper plate, high-sulfur nickel dam is formed on half light nickel dam, and husky fourth nickel dam is formed on high-sulfur nickel dam.
The super anti-corrosion nickel plating-chromium parts of 11. multilayer according to claim 6, it is characterized in that: described basal layer is half light nickel dam, full compound between light nickel dam and Sha Ding nickel dam, wherein, half light nickel dam is formed on copper plate, full light nickel dam is formed on half light nickel dam, and husky fourth nickel dam is formed on full light nickel dam.
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CN104775143A (en) * 2015-03-11 2015-07-15 嘉兴敏惠汽车零部件有限公司 Multilayer ultra corrosion resistant nickel-chromium plating part and manufacturing method thereof
CN104775142A (en) * 2015-03-11 2015-07-15 嘉兴敏惠汽车零部件有限公司 Ultra-corrosion-resistant nickel-chromium plating component and manufacturing method thereof
CN104790004A (en) * 2015-03-11 2015-07-22 嘉兴敏惠汽车零部件有限公司 Nickel and/or chromium plated component and manufacturing method thereof
CN106498480A (en) * 2016-11-29 2017-03-15 延康汽车零部件如皋有限公司 A kind of nickel seals handling process
CN108374186A (en) * 2018-03-30 2018-08-07 芜湖强振汽车紧固件有限公司 A kind of automobile-used fastener electro-plating method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104775143A (en) * 2015-03-11 2015-07-15 嘉兴敏惠汽车零部件有限公司 Multilayer ultra corrosion resistant nickel-chromium plating part and manufacturing method thereof
CN104775142A (en) * 2015-03-11 2015-07-15 嘉兴敏惠汽车零部件有限公司 Ultra-corrosion-resistant nickel-chromium plating component and manufacturing method thereof
CN104790004A (en) * 2015-03-11 2015-07-22 嘉兴敏惠汽车零部件有限公司 Nickel and/or chromium plated component and manufacturing method thereof
CN104775142B (en) * 2015-03-11 2020-08-18 嘉兴敏惠汽车零部件有限公司 Super-corrosion-resistant nickel-chromium plated part and manufacturing method thereof
CN104775143B (en) * 2015-03-11 2020-08-18 嘉兴敏惠汽车零部件有限公司 Multilayer super corrosion resistant nickel-chromium plated component and method of making same
CN106498480A (en) * 2016-11-29 2017-03-15 延康汽车零部件如皋有限公司 A kind of nickel seals handling process
CN108374186A (en) * 2018-03-30 2018-08-07 芜湖强振汽车紧固件有限公司 A kind of automobile-used fastener electro-plating method

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