CN203266380U - Anti-collision suspension polishing device - Google Patents
Anti-collision suspension polishing device Download PDFInfo
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- CN203266380U CN203266380U CN 201320286895 CN201320286895U CN203266380U CN 203266380 U CN203266380 U CN 203266380U CN 201320286895 CN201320286895 CN 201320286895 CN 201320286895 U CN201320286895 U CN 201320286895U CN 203266380 U CN203266380 U CN 203266380U
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- 239000000725 suspension Substances 0.000 title claims abstract description 56
- 238000005498 polishing Methods 0.000 title claims abstract description 37
- 238000012545 processing Methods 0.000 claims abstract description 10
- 239000012530 fluid Substances 0.000 claims description 3
- 230000003750 conditioning effect Effects 0.000 claims 4
- 238000012937 correction Methods 0.000 abstract description 18
- 239000007788 liquid Substances 0.000 abstract description 12
- 230000005389 magnetism Effects 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000006061 abrasive grain Substances 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000007494 plate polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
一种防碰撞悬浮抛光装置,包括机座、悬浮基盘、研磨盘和修正环,所述悬浮基盘与加压组件连接,所述悬浮基盘卡装在修正环内,所述修正环安装在研磨盘上,所述研磨盘通过主驱动器绕固定中心轴线转动,所述悬浮基盘与研磨盘相对面沿圆周方向设有楔形槽和用以放置待加工工件的加工工位,所述楔形槽中充满抛光液,所述楔形槽和加工工位间隔设置;所述抛光装置还包括第一永磁环和第二永磁环,所述第一永磁环套装在悬浮基盘外表面,所述第二永磁环套装在修正环内表面,所述第一次永磁环和第二永磁环之间存在间隙且第一永磁环外圈和第二永磁环内圈磁性相同。本实用新型研磨平稳、表面损伤小质量高。
An anti-collision suspension polishing device, including a machine base, a suspension base plate, a grinding disc and a correction ring, the suspension base plate is connected to a pressurized assembly, the suspension base plate is clamped in the correction ring, and the correction ring is installed On the grinding disc, the grinding disc rotates around a fixed central axis through the main drive, and the surface opposite to the grinding disc is provided with a wedge-shaped groove along the circumferential direction and a processing station for placing the workpiece to be processed. The groove is filled with polishing liquid, and the wedge-shaped groove and the processing station are arranged at intervals; the polishing device also includes a first permanent magnet ring and a second permanent magnet ring, and the first permanent magnet ring is set on the outer surface of the suspension base plate, The second permanent magnet ring is set on the inner surface of the correction ring, there is a gap between the first permanent magnet ring and the second permanent magnet ring, and the outer ring of the first permanent magnet ring and the inner ring of the second permanent magnet ring have the same magnetism . The utility model has stable grinding, small surface damage and high quality.
Description
技术领域technical field
本实用新型涉及一种抛光领域,尤其是一种悬浮抛光装置。The utility model relates to the field of polishing, in particular to a suspension polishing device.
背景技术Background technique
衬底是非晶态薄膜制备过程中不可缺少的材料,衬底性质将严重影响非晶薄膜的表面形貌,为了获得薄的、无缺陷的以及良好粘附性的合金薄膜,要求衬底具有少损伤的超光滑表面。避样机械损伤、污染、氧化、过度腐蚀等因素对表面的影响,所以,传统的化学机械抛光技术不完全适用于非晶态薄膜衬底的超精密抛光。The substrate is an indispensable material in the preparation process of the amorphous film, and the properties of the substrate will seriously affect the surface morphology of the amorphous film. In order to obtain a thin, defect-free and good adhesion alloy film, the substrate is required to have less Damaged ultra-smooth surface. Avoid the impact of mechanical damage, pollution, oxidation, excessive corrosion and other factors on the surface, so the traditional chemical mechanical polishing technology is not completely suitable for ultra-precision polishing of amorphous thin film substrates.
流体抛光现已成为获取超光滑表面的重要手段之一,与刚性接触式抛光相比,磨粒与工件表面的接触状态为软性接触,既可通过提升磨粒加工的等高性获取更低粗糙度的超光滑表面,又可改善磨粒与工件表面的接触状态获得少无损伤的加工效果。依据非晶态薄膜衬底制备的技术要求,悬浮抛光与目前常见的流体抛光具有较明显的优势。如专利申请号为201210140631.4的“可主动驱动的悬浮基盘抛光装置”就公布了一种使加工变质层厚度变小,同时又能获得较高的表面质量的可主动驱动的悬浮基盘抛光装置,该装置是在专利申请号为200910153716.4的“主动驱动研磨装置的修正环驱动机构”基础上,采用悬浮基盘在圆周上设有楔形槽的设计,运用流体力学现象和粉末作用,使得抛光颗粒和工件表面软性接触。但经过试验证明,该设备存在以下问题:Fluid polishing has now become one of the important means to obtain ultra-smooth surfaces. Compared with rigid contact polishing, the contact state between abrasive grains and workpiece surface is soft contact, which can be obtained by improving the contour of abrasive grain processing. The ultra-smooth surface with roughness can also improve the contact state between the abrasive grains and the workpiece surface to obtain less damage-free processing effect. According to the technical requirements for the preparation of amorphous thin film substrates, suspension polishing has obvious advantages over current common fluid polishing. For example, the patent application number 201210140631.4 "Actively Driven Suspension Base Polishing Device" discloses an actively driven suspension base plate polishing device that can reduce the thickness of the processed metamorphic layer and obtain higher surface quality at the same time. , the device is based on the patent application No. 200910153716.4 "Correction Ring Drive Mechanism for Actively Driven Grinding Device", adopts the design of a wedge-shaped groove on the circumference of the suspension base plate, and uses the hydrodynamic phenomenon and powder action to make the polishing particles Soft contact with the workpiece surface. However, tests have shown that the device has the following problems:
该装置是通过主动驱动装置驱动修正环,悬浮基盘卡在修正环内,悬浮基盘上方通过砝码加压,由于悬浮基盘与修正环之间仅存在摩擦约束,高速旋转的悬浮基盘转动不平稳就会造成碰撞、卡死、倾斜等现象,从而影响抛光的表面质量,另一方面,砝码作为加压装置,不能很好的控制压力大小,精度不高,初始和停止状态下,悬浮基盘楔形槽产生的液体动压小,工件易被压在研磨盘上,抛光液中颗粒会对工件作用产生损伤层,极大的影响了被加工材料的内部性能。The device drives the correction ring through the active drive device, the suspension base plate is stuck in the correction ring, and the suspension base plate is pressurized by weights. Since there is only friction constraint between the suspension base plate and the correction ring, the suspension base plate rotating at high speed If the rotation is not stable, it will cause collision, jamming, tilting, etc., which will affect the surface quality of polishing. , The liquid dynamic pressure generated by the wedge-shaped groove of the suspension base plate is small, the workpiece is easily pressed on the grinding disc, and the particles in the polishing liquid will cause a damage layer to the workpiece, which greatly affects the internal properties of the processed material.
发明内容Contents of the invention
为了克服已有技术研磨不平稳、表面质量不高的不足,本实用新型提供一种研磨平稳、表面损伤小质量高的防碰撞悬浮抛光装置。In order to overcome the disadvantages of unstable grinding and low surface quality in the prior art, the utility model provides an anti-collision suspension polishing device with stable grinding, small surface damage and high quality.
本实用新型解决其技术问题所采用的技术方案是:The technical scheme that the utility model solves its technical problem adopts is:
一种防碰撞悬浮抛光装置,包括机座、悬浮基盘、研磨盘和修正环,所述悬浮基盘与加压组件连接,所述悬浮基盘卡装在修正环内,所述修正环安装在研磨盘上,所述研磨盘通过主驱动器绕固定中心轴线转动,所述悬浮基盘与研磨盘相对面沿圆周方向设有楔形槽和用以放置待加工工件的加工工位,所述楔形槽中充满抛光液,所述楔形槽和加工工位间隔设置;所述抛光装置还包括第一永磁环和第二永磁环,所述第一永磁环套装在悬浮基盘外表面,所述第二永磁环套装在修正环内表面,所述第一次永磁环和第二永磁环之间存在间隙且第一永磁环外圈和第二永磁环内圈磁性相同。An anti-collision suspension polishing device, including a machine base, a suspension base plate, a grinding disc and a correction ring, the suspension base plate is connected with a pressurized assembly, the suspension base plate is clamped in the correction ring, and the correction ring is installed On the grinding disc, the grinding disc rotates around a fixed central axis through the main drive, and the surface opposite to the grinding disc is provided with a wedge-shaped groove along the circumferential direction and a processing station for placing the workpiece to be processed. The groove is filled with polishing liquid, and the wedge-shaped groove and the processing station are arranged at intervals; the polishing device also includes a first permanent magnet ring and a second permanent magnet ring, and the first permanent magnet ring is set on the outer surface of the suspension base plate, The second permanent magnet ring is set on the inner surface of the correction ring, there is a gap between the first permanent magnet ring and the second permanent magnet ring, and the outer ring of the first permanent magnet ring and the inner ring of the second permanent magnet ring have the same magnetism .
进一步,所述加压组件为电磁加压组件,所述电磁加压组件包括电磁铁和压力传感器,所述电磁铁固定在机座上且与悬浮基盘同心,所述电磁铁与机座之间安装有压力传感器,所述悬浮基盘为铁磁体。Further, the pressurization assembly is an electromagnetic pressurization assembly, the electromagnetic pressurization assembly includes an electromagnet and a pressure sensor, the electromagnet is fixed on the machine base and is concentric with the suspension base, and the distance between the electromagnet and the machine base is A pressure sensor is installed between them, and the suspension base plate is a ferromagnet.
本实用新型的技术构思为:悬浮基盘与研磨盘相对面沿圆周方向设有多个楔形槽,悬浮基盘与研磨盘之间充满抛光液,即所述楔形槽中充满抛光液,加工工件贴于悬浮基盘带有楔形槽的平面上且不影响楔形槽,初始状态下,悬浮基盘被电磁铁吸附,研磨盘随主轴旋转,电磁铁控制悬浮基盘慢慢与抛光液接触,悬浮基盘与研磨盘之间存在相对运动,楔形槽产生的液体动压使得基盘浮起一个高度H,从而抛光液中的颗粒在抛光工件时没有强力的刚性接触而是变为抛光颗粒的软性碰撞,进而减小了工件的损伤。The technical concept of the utility model is: a plurality of wedge-shaped grooves are arranged on the opposite surface of the suspension base plate and the grinding plate along the circumferential direction, and the space between the suspension base plate and the grinding plate is filled with polishing liquid, that is, the wedge-shaped grooves are filled with polishing liquid, and the workpiece is processed Attached to the plane with the wedge-shaped groove of the suspension base plate without affecting the wedge-shaped groove. In the initial state, the suspension base plate is attracted by the electromagnet, and the grinding disc rotates with the spindle. The electromagnet controls the suspension base plate to slowly contact with the polishing liquid, and the suspension There is relative motion between the base disc and the grinding disc, and the hydrodynamic pressure generated by the wedge-shaped groove makes the base disc float to a height H, so that the particles in the polishing liquid do not have strong rigid contact when polishing the workpiece but become soft particles of polishing particles. Sexual collision, thereby reducing the damage to the workpiece.
悬浮基盘为铁磁体,所述铁磁体是指在磁场作用下产生与外磁场相同的强烈的附加磁场的物质,所述铁磁体包括铁钴镍等。带线圈的电磁铁能够通过改变通入电流的大小来改变磁力的大小和方向,控制所述悬浮基盘慢慢放置在带有抛光液的研磨盘上,电磁铁与机座之间安装有力传感器,可准确测量出电磁铁与悬浮基盘之间力的大小,采用计算机闭环控制,得到精确的施加压力,解决了因砝码加载不可控,从而在液体动压还未形成时造成工件与研磨盘之间磨损,影响抛光质量的问题。The suspending base plate is a ferromagnet, and the ferromagnet refers to a substance that generates the same strong additional magnetic field as the external magnetic field under the action of a magnetic field, and the ferromagnet includes iron, cobalt, nickel and the like. The electromagnet with a coil can change the magnitude and direction of the magnetic force by changing the magnitude of the incoming current, and control the suspension substrate to be slowly placed on the grinding disc with the polishing liquid, and a force sensor is installed between the electromagnet and the machine base , can accurately measure the magnitude of the force between the electromagnet and the suspension base plate, and adopt computer closed-loop control to obtain accurate pressure, which solves the problem of uncontrollable weight loading, which causes the workpiece and grinding when the liquid dynamic pressure has not yet formed. Abrasion between discs affects the quality of polishing.
利用了电磁异性相吸同性相斥的原理,在悬浮基盘外圈和修正环内圈套装永磁环,使得悬浮基盘与修正环之间不相互接触,避免了碰撞、卡死等现象。Utilizing the principle that the opposite sex attracts the same sex and repels the same sex, the permanent magnetic ring is installed on the outer ring of the suspension base plate and the inner ring of the correction ring, so that the suspension base plate and the correction ring do not contact each other, avoiding collisions, jamming and other phenomena.
本实用新型的有益效果主要表现在:精确加压、研磨平稳、表面损伤小质量高。The beneficial effects of the utility model are mainly manifested in: precise pressurization, stable grinding, small surface damage and high quality.
附图说明Description of drawings
图1是防碰撞悬浮抛光装置示意图。Fig. 1 is a schematic diagram of an anti-collision suspension polishing device.
图2是悬浮基盘示意图。Fig. 2 is a schematic diagram of a suspended substrate.
具体实施方式Detailed ways
下面结合附图对本实用新型作进一步描述。Below in conjunction with accompanying drawing, the utility model is further described.
参照图1和图2,一种防碰撞悬浮抛光装置,包括机座7、悬浮基盘3、研磨盘1和修正环5,所述悬浮基盘3与加压组件连接,所述悬浮基盘3卡装在修正环5内,所述修正环5安装在研磨盘1上,所述研磨盘1通过主驱动器11绕固定中心轴线转动,所述悬浮基盘3与研磨盘1相对面沿圆周方向设有楔形槽12和用以放置待加工工件的加工工位,所述楔形槽12中充满抛光液,所述楔形槽12和加工工位间隔设置;所述抛光装置还包括第一永磁环9和第二永磁环4,所述第一永磁环9套装在悬浮基盘3外表面,所述第二永磁环4套装在修正环5内表面,所述第一次永磁环9和第二永磁环4之间存在间隙且第一永磁环外圈和第二永磁环内圈磁性相同。Referring to Fig. 1 and Fig. 2, a kind of anti-collision suspension polishing device comprises machine base 7, suspension base plate 3, grinding disc 1 and correction ring 5, and described suspension base plate 3 is connected with pressurized assembly, and described suspension base plate 3 is clamped in the correction ring 5, the correction ring 5 is installed on the grinding disc 1, the grinding disc 1 rotates around the fixed central axis through the
进一步,所述加压组件为电磁加压组件,所述电磁加压组件包括电磁铁6和压力传感器8,所述电磁铁6固定在机座7上且与悬浮基盘3同心,所述电磁铁6与机座7之间安装有压力传感器8,所述悬浮基盘3为铁磁体。Further, the pressurization assembly is an electromagnetic pressurization assembly, the electromagnetic pressurization assembly includes an electromagnet 6 and a pressure sensor 8, the electromagnet 6 is fixed on the machine base 7 and is concentric with the suspension base plate 3, the electromagnetic pressurization assembly A pressure sensor 8 is installed between the iron 6 and the base 7, and the suspension base plate 3 is a ferromagnet.
本实施例中,所述悬浮基盘3与研磨盘1相对面沿圆周方向设有多个楔形槽12,所述楔形槽12中充满抛光液,所述加工工件13贴于悬浮基盘3带有楔形槽的平面上且不影响楔形槽。In this embodiment, the opposite surface of the suspension base plate 3 and the grinding disc 1 is provided with a plurality of wedge-
初始状态下,所述悬浮基盘3吸附在电磁铁6上与研磨盘1不接触,所述研磨盘1绕中心轴线开始转动,所述力传感器8可准确得到电磁铁6与悬浮基盘3间相互作用力的大小,再通过计算机闭环控制,调整通入电磁铁6线圈电流的大小和方向,控制所述悬浮基盘3慢慢放置在带有抛光液2的研磨盘1上,并施加抛光所需的压力大小。In the initial state, the suspension base plate 3 is adsorbed on the electromagnet 6 and does not contact the grinding disc 1, and the grinding disc 1 starts to rotate around the central axis, and the force sensor 8 can accurately obtain the contact between the electromagnet 6 and the suspension base plate 3. The magnitude of the mutual interaction force is controlled by a computer closed-loop to adjust the size and direction of the coil current of the electromagnet 6, and the suspension base plate 3 is slowly placed on the grinding disc 1 with the
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CN103317430B (en) * | 2013-05-22 | 2015-08-19 | 浙江工业大学 | Anticollision suspension polishing device |
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