CN203266379U - Suspension polishing device based on permanent magnet rings - Google Patents
Suspension polishing device based on permanent magnet rings Download PDFInfo
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- CN203266379U CN203266379U CN 201320286877 CN201320286877U CN203266379U CN 203266379 U CN203266379 U CN 203266379U CN 201320286877 CN201320286877 CN 201320286877 CN 201320286877 U CN201320286877 U CN 201320286877U CN 203266379 U CN203266379 U CN 203266379U
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- permanent magnet
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- 239000000725 suspension Substances 0.000 title claims abstract description 51
- 238000005498 polishing Methods 0.000 title claims abstract description 31
- 238000012545 processing Methods 0.000 claims abstract description 8
- 239000007788 liquid Substances 0.000 claims abstract description 7
- 239000004744 fabric Substances 0.000 claims description 4
- 230000005389 magnetism Effects 0.000 claims 1
- 238000012937 correction Methods 0.000 description 4
- 239000006061 abrasive grain Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000007494 plate polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
一种基于永磁环的悬浮抛光装置,包括机座、悬浮基盘和研磨盘,所述悬浮基盘与加压组件连接,所述研磨盘通过主驱动器绕固定中心轴线转动,所述悬浮基盘与研磨盘相对面沿圆周方向设有楔形槽和用以放置待加工工件的加工工位,所述楔形槽中充满研磨液,所述楔形槽和加工工位间隔设置,所述研磨盘为U形研磨盘,所述悬浮抛光装置还包括第一永磁环和第二永磁环,所述第一永磁环套装在悬浮基盘外表面,所述第二永磁环套装在U形研磨盘内表面,所述悬浮基盘套装在U形研磨盘内且与U形研磨盘内壁有间隙,所述第一永磁环外圈和第二永磁环内圈磁性相同。本实用新型采用非接触连接消除摩擦和碰撞、研磨平稳、表面损伤小、质量高。
A suspension polishing device based on a permanent magnetic ring, including a machine base, a suspension base disc and a grinding disc, the suspension base disc is connected with a pressurized assembly, the grinding disc rotates around a fixed central axis through a main drive, and the suspension base The opposite surface of the disc and the grinding disc is provided with a wedge-shaped groove and a processing station for placing the workpiece to be processed along the circumferential direction. The wedge-shaped groove is filled with grinding liquid, and the wedge-shaped groove and the processing station are arranged at intervals. U-shaped grinding disc, the suspension polishing device also includes a first permanent magnet ring and a second permanent magnet ring, the first permanent magnet ring is set on the outer surface of the suspension base plate, and the second permanent magnet ring is set on the U-shaped The inner surface of the grinding disc, the suspension base disc is set in the U-shaped grinding disc and has a gap with the inner wall of the U-shaped grinding disc, and the outer ring of the first permanent magnet ring and the inner ring of the second permanent magnet ring have the same magnetic properties. The utility model adopts non-contact connection to eliminate friction and collision, smooth grinding, small surface damage and high quality.
Description
技术领域technical field
本实用新型涉及一种抛光装置,尤其是一种悬浮抛光装置。The utility model relates to a polishing device, in particular to a suspension polishing device.
背景技术Background technique
流体抛光现已成为获取超光滑表面的重要手段之一,与刚性接触式抛光相比,磨粒与工件表面的接触状态为软性接触,既可通过提升磨粒加工的等高性获取更低粗糙度的超光滑表面,又可改善磨粒与工件表面的接触状态获得少无损伤的加工效果。如专利申请号为201210140631.4的“可主动驱动的悬浮基盘抛光装置”就公布了一种使加工变质层厚度变小,同时又能获得较高的表面质量的可主动驱动的悬浮基盘抛光装置,该装置是在专利申请号为200910153716.4的“主动驱动研磨装置的修正环驱动机构”基础上,采用悬浮基盘在圆周上设有楔形槽的设计,运用流体力学现象和粉末作用,使得抛光颗粒和工件表面软性接触。但经过试验证明,该设备存在以下问题:Fluid polishing has become one of the important means to obtain ultra-smooth surfaces. Compared with rigid contact polishing, the contact state between abrasive grains and workpiece surface is soft contact, which can be obtained by improving the contour of abrasive grain processing. The ultra-smooth surface with roughness can also improve the contact state between the abrasive grains and the workpiece surface to obtain less damage-free processing effect. For example, the patent application number 201210140631.4 "Actively Driven Suspension Base Polishing Device" discloses an actively driven suspension base plate polishing device that can reduce the thickness of the processed metamorphic layer and obtain higher surface quality at the same time. , the device is based on the patent application No. 200910153716.4 "Correction Ring Drive Mechanism for Actively Driven Grinding Device", adopts the design of a wedge-shaped groove on the circumference of the suspension base plate, and uses the hydrodynamic phenomenon and powder action to make the polishing particles Soft contact with the workpiece surface. However, tests have shown that the device has the following problems:
该装置是通过主动驱动装置驱动修正环,悬浮基盘卡在修正环内,由于悬浮基盘与修正环之间仅存在摩擦约束,高速旋转的悬浮基盘转动不平稳就会造成碰撞、卡死、倾斜等现象,从而影响抛光的表面质量。The device drives the correction ring through the active drive device, and the suspension base plate is stuck in the correction ring. Since there is only friction constraint between the suspension base plate and the correction ring, the high-speed rotating suspension base plate will not rotate smoothly, which will cause collision and jamming. , Tilt and other phenomena, thus affecting the surface quality of polishing.
发明内容Contents of the invention
为了克服已有悬浮研磨抛光设备中存在的研磨不平稳、表面质量不高的不足,本实用新型提供一种采用非接触连接消除摩擦和碰撞、研磨平稳、表面损伤小、质量高的基于永磁环的悬浮抛光装置。In order to overcome the shortcomings of unstable grinding and low surface quality in the existing suspension grinding and polishing equipment, the utility model provides a non-contact connection to eliminate friction and collision, smooth grinding, small surface damage and high quality. Suspension polishing device for rings.
本实用新型解决其技术问题所采用的技术方案是:The technical scheme that the utility model solves its technical problem adopts is:
一种基于永磁环的悬浮抛光装置,包括机座、悬浮基盘和研磨盘,所述悬浮基盘与加压组件连接,所述研磨盘通过主驱动器绕固定中心轴线转动,所述悬浮基盘与研磨盘相对面沿圆周方向设有楔形槽和用以放置待加工工件的加工工位,所述楔形槽中充满研磨液,所述楔形槽和加工工位间隔设置,所述研磨盘为U形研磨盘,所述悬浮抛光装置还包括第一永磁环和第二永磁环,所述第一永磁环套装在悬浮基盘外表面,所述第二永磁环套装在U形研磨盘内表面,所述悬浮基盘套装在U形研磨盘内且与U形研磨盘内壁有间隙,所述第一永磁环外圈和第二永磁环内圈磁性相同。A suspension polishing device based on a permanent magnetic ring, including a machine base, a suspension base disc and a grinding disc, the suspension base disc is connected with a pressurized assembly, the grinding disc rotates around a fixed central axis through a main drive, and the suspension base The opposite surface of the disc and the grinding disc is provided with a wedge-shaped groove and a processing station for placing the workpiece to be processed along the circumferential direction. The wedge-shaped groove is filled with grinding liquid, and the wedge-shaped groove and the processing station are arranged at intervals. U-shaped grinding disc, the suspension polishing device also includes a first permanent magnet ring and a second permanent magnet ring, the first permanent magnet ring is set on the outer surface of the suspension base plate, and the second permanent magnet ring is set on the U-shaped The inner surface of the grinding disc, the suspension base disc is set in the U-shaped grinding disc and has a gap with the inner wall of the U-shaped grinding disc, and the outer ring of the first permanent magnet ring and the inner ring of the second permanent magnet ring have the same magnetic properties.
进一步,所述加压组件为砝码,所述砝码加压在悬浮基盘上。也可以选用其他加压组件。Further, the pressurizing component is a weight, and the weight is pressurized on the suspension base plate. Other pressurized components are also available.
更进一步,所述U形研磨盘内壁底面铺有抛光布。Furthermore, a polishing cloth is laid on the bottom surface of the inner wall of the U-shaped grinding disc.
本实用新型的技术构思为:利用了电磁异性相吸同性相斥的原理,在悬浮基盘外圈和保持环内圈套装永磁环,使得悬浮基盘与保持环之间不相互接触,避免了碰撞、卡死等现象。The technical idea of the utility model is: using the principle of electromagnetic opposites attracting the same and repelling the same, a permanent magnetic ring is installed on the outer ring of the suspension base plate and the inner ring of the retaining ring, so that the suspension base plate and the retaining ring do not contact each other, avoiding Collision, stuck and other phenomena.
悬浮基盘与研磨盘相对面沿圆周方向设有多个楔形槽,悬浮基盘与研磨盘之间充满抛光液,即所述楔形槽中充满抛光液,加工工件贴于悬浮基盘带有楔形槽的平面上且不影响楔形槽,U形研磨盘随主轴旋转,U形研磨盘内壁底面铺有抛光布,悬浮基盘与U形研磨盘之间存在相对运动,楔形槽产生的液体动压使得基盘浮起一个高度H,从而抛光液中的颗粒在抛光工件时没有强力的刚性接触而是变为抛光颗粒的软性碰撞,进而减小了工件的损伤。The opposite surface of the suspension base plate and the grinding plate is provided with a plurality of wedge-shaped grooves along the circumferential direction, and the gap between the suspension base plate and the grinding plate is filled with polishing liquid, that is, the wedge-shaped grooves are filled with polishing liquid, and the processed workpiece is attached to the suspension base plate with a wedge-shaped The U-shaped grinding disc rotates with the spindle, and the bottom surface of the inner wall of the U-shaped grinding disc is covered with polishing cloth. There is relative motion between the suspended base plate and the U-shaped grinding disc, and the hydrodynamic pressure generated by the wedge-shaped groove The substrate is raised to a height H, so that the particles in the polishing liquid do not have strong rigid contact but become soft collisions of polishing particles when polishing the workpiece, thereby reducing the damage to the workpiece.
本实用新型的有益效果主要表现在:采用非接触连接消除摩擦和碰撞、研磨平稳、表面损伤小、质量高。The beneficial effects of the utility model are mainly manifested in that non-contact connection is adopted to eliminate friction and collision, smooth grinding, small surface damage and high quality.
附图说明Description of drawings
图1是一种基于永磁环的悬浮抛光装置示意图。Fig. 1 is a schematic diagram of a suspension polishing device based on a permanent magnetic ring.
图2是一种基于永磁环的悬浮抛光装置A-A剖视图。Fig. 2 is a sectional view A-A of a suspension polishing device based on a permanent magnetic ring.
图3是一种永磁环示意图。Fig. 3 is a schematic diagram of a permanent magnet ring.
具体实施方式Detailed ways
下面结合附图对本实用新型作进一步描述。Below in conjunction with accompanying drawing, the utility model is further described.
参照图1~图3,一种基于永磁环的悬浮抛光装置,包括悬浮基盘5、U形研磨盘1和主驱动9,第一永磁环4套装在悬浮基盘5外表面,第二永磁环6套装在U形研磨盘1内表面,所述悬浮基盘5套装在U形研磨盘1内且与U形研磨盘1内壁有一定的间隙,所述第一永磁环4外圈和第二永磁环6内圈磁性相同,所述砝码7加压在悬浮基盘5上,所述U形研磨盘1内壁底面铺有抛光布2,所述研U形磨盘1通过主驱动9绕固定中心轴线转动。Referring to Figures 1 to 3, a suspension polishing device based on a permanent magnet ring includes a suspension base plate 5, a U-shaped grinding disc 1 and a main drive 9, the first
所述悬浮基盘5与U形研磨盘1相对面沿圆周方向设有多个楔形槽10,所述悬浮基盘5底面与U形研磨盘1之间充满抛光液3,所述加工工件8贴于悬浮基盘5带有楔形槽的平面上且不影响楔形槽。The opposite surface of the suspension base plate 5 and the U-shaped grinding disc 1 is provided with a plurality of wedge-
所述加压组件为砝码7,所述砝码7加压在悬浮基盘上。也可以选用其他加压组件。The pressurizing component is a
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103331692A (en) * | 2013-05-22 | 2013-10-02 | 浙江工业大学 | Suspension polishing device based on permanent magnet rings |
CN105538046A (en) * | 2015-12-09 | 2016-05-04 | 浙江工业大学 | Hydraulic pressure suspension polishing method and device thereof |
WO2020062701A1 (en) * | 2018-09-29 | 2020-04-02 | 大连理工大学 | Float polishing device and method for small-size complex surface part |
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- 2013-05-22 CN CN 201320286877 patent/CN203266379U/en not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103331692A (en) * | 2013-05-22 | 2013-10-02 | 浙江工业大学 | Suspension polishing device based on permanent magnet rings |
CN103331692B (en) * | 2013-05-22 | 2016-03-02 | 浙江工业大学 | A kind of suspension polishing device based on permanent-magnetic clamp |
CN105538046A (en) * | 2015-12-09 | 2016-05-04 | 浙江工业大学 | Hydraulic pressure suspension polishing method and device thereof |
WO2020062701A1 (en) * | 2018-09-29 | 2020-04-02 | 大连理工大学 | Float polishing device and method for small-size complex surface part |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
AV01 | Patent right actively abandoned |
Granted publication date: 20131106 Effective date of abandoning: 20160302 |
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AV01 | Patent right actively abandoned |
Granted publication date: 20131106 Effective date of abandoning: 20160302 |
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C25 | Abandonment of patent right or utility model to avoid double patenting |