CN202591170U - Plasma free radical cleaning spray gun with normal-pressure double radio-frequency electrodes - Google Patents

Abstract

A plasma free radical cleaning spray gun with dual radio frequency electrodes at normal pressure comprises two radio frequency electrodes, a dielectric barrier, two ground electrodes and a radio frequency power supply. Nozzle, except for the nozzle surface, the other sides of the spray gun are all metal plates, the two ground electrodes are covered by a dielectric barrier layer, and there are two radio frequency electrodes between the two ground electrodes, forming three nozzles, and the two radio frequency electrodes are also covered Coated with a dielectric barrier layer, the working gas is ejected from the nozzle of the spray gun. Under normal pressure, after the power is turned on, glow plasma is generated at the three nozzles, and the free radicals in the plasma are ejected outwards under the airflow , the spray gun is used to clean the organic matter on the surface of substrates such as silicon wafers and glass.

Description

A Plasma Radical Cleaning Spray Gun with Double Radio Frequency Electrodes at Normal Pressure

technical field

The utility model relates to a plasma free radical cleaning spray gun with double radio frequency electrodes at normal pressure. The spray gun generates plasma by the dielectric barrier discharge of the double radio frequency electrodes. After spraying out and reaching the surface of substrates such as silicon wafers and glass, it reacts with organic matter on the surface of the substrate to achieve the purpose of cleaning the surface of the substrate. the

Background technique

In semiconductor production, silicon wafers must be cleaned strictly. Even a small amount of pollution will cause device failure. In addition, other substrates such as liquid crystal glass panels need to be cleaned of organic pollutants, and the performance of the material surface needs to be improved. surface adhesion. The traditional cleaning method is the wet chemical method. The wet chemical method cannot be accurately controlled, the cleaning is not thorough, and the cleaning solution is easy to pollute the environment; High, and due to ion sputtering in the vacuum chamber, it is easy to sputter metal atoms on the vacuum wall; the existing normal pressure cleaning technology has the disadvantages of easy introduction of new impurities and complex electrode structure. the

The utility model introduces a plasma free radical cleaning spray gun with normal pressure double radio frequency electrodes. The spray gun includes two radio frequency electrodes, two ground electrodes, and two adjacent radio frequency electrodes between the two ground electrodes. The plasma radical cleaning spray gun with double radio frequency electrodes at atmospheric pressure adopts the form of dielectric barrier radio The mixed gas of gas and oxygen is the working gas, which produces glow discharge. The plasma free radical beam is ejected from three nozzles. When it reaches the surface of a substrate such as a silicon wafer, the main component of the beam is active free radicals. The free radicals and Photoresist or other organic substances react to produce carbon dioxide, water and other products to achieve the purpose of cleaning. In addition to cleaning substrates such as liquid crystal glass plates, the spray gun can also improve the adhesion of their surfaces.

The advantages of the plasma radical cleaning spray gun with dual radio frequency electrodes at atmospheric pressure are that the discharge between the radio frequency electrodes increases the discharge area, reduces the introduction of metal impurities, and simplifies the structure of the spray gun. the

Utility model content

The plasma free radical cleaning spray gun with dual radio frequency electrodes at normal pressure includes two radio frequency electrodes, a dielectric barrier layer, two ground electrodes and a radio frequency power supply. The surface is the nozzle, except the surface of the nozzle, the other sides of the spray gun are all metal plates, the two ground electrodes are covered by a dielectric barrier layer, and the two ground electrodes are two RF electrodes, forming three nozzles, two RF electrodes Covered by a dielectric barrier layer, the working gas is ejected from the nozzle of the spray gun. Under normal pressure, after the power is turned on, glow plasma is generated in the three nozzles, and the free radicals in the plasma are carried outward by the airflow. squirt. the

The plasma free radical cleaning spray gun with double radio frequency electrodes at normal pressure is characterized in that the ground electrode and the radio frequency electrode are made of metal materials. the

The plasma radical cleaning spray gun with double radio frequency electrodes at normal pressure is characterized in that: the ground electrode and the radio frequency electrode and the three nozzles formed between the radio frequency electrode and the radio frequency electrode are equal in size and the width range is 0.5-2.0 mm. the

The plasma free radical cleaning spray gun with double radio frequency electrodes at normal pressure is characterized in that two adjacent radio frequency electrodes are located between the two ground electrodes. the

The utility model is a plasma free radical cleaning spray gun with double radio frequency electrodes at normal pressure. The substrate reacts with the photoresist or other organic matter on the surface of the substrate to generate carbon dioxide, water, etc., which can be directly discharged into the atmosphere. The spray gun can not only clean the substrates such as liquid crystal glass plates, but also improve the adhesion of the surface. the

The advantages of the plasma radical cleaning spray gun with dual radio frequency electrodes at atmospheric pressure are that the discharge between the radio frequency electrodes increases the discharge area, reduces the introduction of metal impurities, and simplifies the structure of the spray gun. The main purpose of the utility model is to clean the photoresist and organic pollutants on the silicon wafer, or to clean the organic pollutants on the surface of other substrates such as glass. the

Description of drawings

Fig. 1 is a schematic diagram of the principle of a plasma free radical cleaning spray gun with atmospheric pressure dual radio frequency electrodes of the present invention. the

Fig. 2 is an outline view of a plasma free radical cleaning spray gun with atmospheric pressure dual radio frequency electrodes of the present invention. the

Detailed ways

Please refer to Fig. 1, the plasma free radical cleaning spray gun of this normal pressure dual radio frequency electrode, comprises two radio frequency electrodes 107, the dielectric barrier layer 106 of coating radio frequency electrode, two ground electrodes 108, the dielectric barrier layer of coating ground electrode 109 , a radio frequency power supply 105 , a spray gun housing 104 , an air supply source 101 , a flow meter 102 and an air supply pipeline 103 . The two ground electrodes are connected with the spray gun shell, and the dielectric barrier is made of insulating materials such as quartz or ceramics. The gas supply source 101 provides argon and oxygen. When the gas passes through the flow meter 102, a mixed gas is formed in a certain proportion. After passing through the gas supply pipeline 103, the mixed gas evenly enters the gap between the ground electrode 108 and the radio frequency electrode 107 and the two radio frequency electrodes. The gap between the electrodes, when the radio frequency electrode 107 is connected to the radio frequency power supply 105, plasma is generated in the three nozzles, and the plasma free radical beam is ejected from the nozzle under the drive of the air flow, and when it reaches the substrate surface At this time, the beam component is mainly free radicals 110, and the free radicals react with the photoresist or other organic substances on the substrate surface to generate carbon dioxide, water and other products. In addition to removing the photoresist or other organic substances on the substrate surface, the spray gun also The surface of substrates such as liquid crystal panels can be modified. the

Please refer to Fig. 2, the plasma free radical cleaning spray gun of this normal pressure double radio frequency electrode, the gas supply line 103 is connected with the air inlet 202 of spray gun, and working gas enters the inside of spray gun through air inlet 202, and the outside of radio frequency electrode 107 is coated with Dielectric barrier layer, the ground electrode 108 is covered with a dielectric barrier layer, between the radio frequency electrodes and between the radio frequency electrode and the ground electrode are three nozzles, when the spray gun is working, a high-density free radical beam is ejected at the nozzle, and the radio frequency electrode It is isolated from the housing 104 by an insulating block 201 . the

The utility model has been described above in conjunction with specific embodiments with reference to the accompanying drawings. However, it should be noted that, for those skilled in the art, without departing from the spirit and scope of the utility model, the above-mentioned implementation can be There are many changes and modifications that fall within the scope of the claims of the present invention. the

Claims (4)

1. A plasma free radical cleaning spray gun with dual radio frequency electrodes at atmospheric pressure, comprising two radio frequency electrodes, a dielectric barrier, two ground electrodes and a radio frequency power supply, is characterized in that: the spray gun is a cuboid, one side of which is connected to the air inlet The opposite surface is the nozzle, except for the nozzle surface, the other sides of the spray gun are metal plates, the two ground electrodes are covered by a dielectric barrier layer, and the two ground electrodes are two radio frequency electrodes, forming three nozzles, The two radio frequency electrodes are covered by a dielectric barrier layer, and the working gas is ejected from the nozzle of the spray gun. Under normal pressure, after the power is turned on, glow plasma is generated in the three nozzles, and the free radicals in the plasma Spray outwards while carrying. 2. The plasma free radical cleaning spray gun with dual radio frequency electrodes at atmospheric pressure as claimed in claim 1, characterized in that: the ground electrode and the radio frequency electrode are made of metal materials. 3. the plasma free radical cleaning spray gun of normal pressure dual radio frequency electrodes as claimed in right 1, it is characterized in that: the size of three nozzles formed between the ground electrode and the radio frequency electrode and the radio frequency electrode and the radio frequency electrode is equal, and the width range is 0.5 -2.0mm. 4. The plasma free radical cleaning spray gun with double radio frequency electrodes at atmospheric pressure as claimed in claim 1, characterized in that: two adjacent radio frequency electrodes are between the two ground electrodes. the

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