CN201825869U - Double-silver low-radiation glass - Google Patents
Double-silver low-radiation glass Download PDFInfo
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- CN201825869U CN201825869U CN2010205031164U CN201020503116U CN201825869U CN 201825869 U CN201825869 U CN 201825869U CN 2010205031164 U CN2010205031164 U CN 2010205031164U CN 201020503116 U CN201020503116 U CN 201020503116U CN 201825869 U CN201825869 U CN 201825869U
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Abstract
本实用新型公开了一种双银低辐射玻璃，膜层结构依次为：玻璃、第一基层电介质组合层、第二基层电介质组合层、第一阻挡层、第一AgCu层、第二阻挡层、第一上层电介质组合层、第一隔层电介质组合层、第二隔层电介质组合层、第三隔层电介质组合层、第三阻挡层、第二AgCu层、第四阻挡层、上层电介质组合层；其中，第一阻挡层、第二阻挡层、第三阻挡层、第四阻挡层膜层材质为还原性大于AgCu的材料。采用独特的膜层结构、新工艺、新方法，使该双银低辐射玻璃具有低辐射率、高耐热性的优点，能在700℃高温下进行钢化、热弯和弯钢化等强化处理。
The utility model discloses a double-silver low-radiation glass. The film layer structure is as follows: glass, first base layer dielectric combination layer, second base layer dielectric combination layer, first barrier layer, first AgCu layer, second barrier layer, First upper dielectric composite layer, first interlayer dielectric composite layer, second interlayer dielectric composite layer, third interlayer dielectric composite layer, third barrier layer, second AgCu layer, fourth barrier layer, upper dielectric composite layer ; Wherein, the material of the first barrier layer, the second barrier layer, the third barrier layer and the fourth barrier layer is a material whose reducibility is greater than that of AgCu. The unique film structure, new process and new method make the double-silver low-emissivity glass have the advantages of low emissivity and high heat resistance, and can be tempered, hot-bent and bent-tempered at a high temperature of 700°C.
Description
[technical field]
The utility model relates to the special glass field, relates in particular to a kind of pair of silver low radiation glass.
[background technology]
Low emissivity glass is a kind of at glass surface deposition one deck infrared reflection material, visible light in the sunlight can be seen through, again as the infrared reflection mirror, the special glass that the infrared rays in the sunlight is foreclosed and simultaneously object secondary rays heat reflection gone back.By using low emissivity glass, can reach the effect of controlling sunlight, save energy, heat regulating and controlling and improving environment.
In the processing of traditional low emissivity glass, owing to reasons such as Ag layer in heat treatment process are oxidized easily, cause low emissivity glass can't carry out follow-up thermal treatment, can not be by tempering, can only first tempering plated film again, this mode has following shortcoming:
1. can not realize the curved arc glass coating
Modern architecture and automotive windshield extensively adopt curved tempering and hot bending glass, and traditional off-line low radiation coated glass can not be bent follow-up hot-work such as tempering and hot bending and handle.Traditional building Coated Glass Line can not be on curved tempering and hot bending glass substrate plated film.
2. the plated film operational efficiency is low
The charging ratio of toughened glass plated film has only about 75%, just can only bring into play 75% of plated film line production capacity.The toughened glass plated film needs the enough operative employees of configuration by artificial load and unloading piece, has increased the labor wage expenditure, and the speed of simultaneously artificial loading, unloading sheet has restricted the plated film walking speed again, and the operation of plated film line is uneconomical.
The order management workload is big, and the whole process single from the system of producing, that the production that places an order is added up all wants special mechanism to go operation, expends a large amount of resources.
The production cycle of various sticking patch is long, and the waste product that occurs in plated film and the hollow operation is wanted sticking patch, and glass is also wanted sticking patch in the damage of erecting stage.These sticking patch are included production order once more in and are arranged production, and the sticking patch cycle is long.
3. glass transportation cost height
Off-line is low-emission coated to be used after must synthesizing double glazing, and the transportation of double glazing has increased the transportation expenditure.For example: the double glazing of 6mm low emissivity glass+white glass of 12mm gas cloud+6mm, the volume of transportation goods is the twice of monolithic glass.
The tradition low emissivity glass elder generation tempering mode of plated film has again hindered its application greatly.
[utility model content]
Based on this, be necessary to provide a kind of can first plated film after two silver low radiation glass of tempering.
A kind of pair of silver low radiation glass, film layer structure is followed successively by: glass, first basic unit's dielectric combination layer, second basic unit's dielectric combination layer, first blocking layer, an AgCu layer, second blocking layer, the first upper strata dielectric combination layer, the first interlayer dielectric combination layer, the second interlayer dielectric combination layer, the 3rd interlayer dielectric combination layer, the 3rd blocking layer, the 2nd AgCu layer, the 4th blocking layer, upper strata dielectric combination layer; Wherein, described first blocking layer, second blocking layer, the 3rd blocking layer, the 4th blocking layer rete material are the material of reductibility greater than AgCu.
Preferably, described first basic unit's dielectric combination layer thickness is 20～25nm.
Preferably, the described second interlayer dielectric combination layer thickness is 45～50nm.
Preferably, described second basic unit's dielectric combination layer, the first interlayer dielectric combination layer, the 3rd interlayer dielectric combination layer thickness 10～15nm.
Preferably, described upper strata dielectric combination layer thickness is 35～45nm.
Preferably, described first blocking layer, second blocking layer, the 3rd blocking layer, the 4th barrier layer thickness are respectively 1～1.5nm.
Preferably, a described AgCu layer, the 2nd AgCu layer thickness are 10～13nm.
Preferably, described upper strata dielectric combination layer comprises the first upper strata dielectric combination layer that is deposited on described the 4th blocking layer and is deposited on the second upper strata dielectric combination layer on the described first upper strata dielectric combination layer.
Preferably, the thickness of the described first upper strata dielectric combination layer is 10～15nm.
Preferably, the thickness of the described second upper strata dielectric combination layer is 25～30nm.
Above-mentioned pair of silver low radiation glass replaces traditional silver layer with the AgCu layer; by design thicknesses of layers and material; make the film material reductibility on AgCu layer both sides stronger than AgCu; oxygen had high affinity; in the heat treatment process of product, the film material on AgCu layer both sides obtains oxygen sooner than AgCu, plays the effect of protection AgCu layer; thereby make the AgCu layer not oxidized in heat treatment process, can be by tempering.
[description of drawings]
Fig. 1 is the structural representation of two silver low radiation glass of an embodiment;
Fig. 2 is the manufacturing flow chart of two silver low radiation glass of an embodiment.
[embodiment]
A kind of pair of silver low radiation glass as shown in Figure 1 comprises the following structure that is arranged in order: glass, first basic unit's dielectric combination layer, second basic unit's dielectric combination layer, first blocking layer, an AgCu layer, second blocking layer, the first upper strata dielectric combination layer, the first interlayer dielectric combination layer, the second interlayer dielectric combination layer, the 3rd interlayer dielectric combination layer, the 3rd blocking layer, the 2nd AgCu layer, the 4th blocking layer, upper strata dielectric combination layer; Wherein, first blocking layer, second blocking layer, the 3rd blocking layer, the 4th blocking layer rete material are the material of reductibility greater than AgCu.
First basic unit's dielectric combination layer, the second interlayer dielectric combination layer are by comprising NbO
x, TiO
x, NiCrO
xConstitute with metal oxide at least a among the ZnO:Al; Second basic unit's dielectric combination layer, the first interlayer dielectric combination layer, the 3rd interlayer dielectric combination layer are made of the metal oxide that comprises AZO; The upper strata dielectric combination layer is by comprising AZO and SiO
xN
yIn at least a oxide compound or nitride or oxynitride constitute; First basic unit's dielectric combination layer thickness is 25～30nm; The second interlayer dielectric combination layer thickness is 45～50nm; Second basic unit's dielectric combination layer, the first interlayer dielectric combination layer, the 3rd interlayer dielectric combination layer thickness are 10～15nm; The thickness of upper strata dielectric combination layer is 35～45nm; Wherein, AZO is the Al that mixed
2O
3ZnO.
First blocking layer, second blocking layer, the 3rd blocking layer, the 4th blocking layer are made of metal or metal oxide at least a in the incomplete oxidation thing that comprises Nb and Nb; First blocking layer, second blocking layer, the 3rd blocking layer, the 4th barrier layer thickness are 1～1.5nm; The one AgCu layer, the 2nd AgCu layer are 70～80% by mass ratio Ag, and Cu is 30～20% yellow gold formation.
Preferably, two silver-bearing copper layer thicknesses relation satisfies the color value scope in product appearance color such as the following table:
| The monolithic appearance color | The glass surface reflected colour | Rete face reflected colour | Transmitted colour |
| Y? | Less than 9 | Less than 3.5 | Greater than 58 |
| L*? | Less than 35 | Less than 20 | Greater than 80 |
| a*? | -1～-2? | -1～-2.5? | -1～-3? |
| b*? | -5～-6? | -2～-4.5? | -0.5～-2? |
Preferred, an AgCu layer, the 2nd AgCu layer thickness are 10～13nm.
Preferably, the upper strata dielectric combination layer comprises first upper strata dielectric combination layer that is deposited on the 4th blocking layer and the second upper strata dielectric combination layer that is deposited on the first upper strata dielectric combination layer; The first upper strata dielectric combination layer is made of the oxide compound that comprises AZO; The second upper strata dielectric combination layer is by comprising SiO
xN
yOxide compound or nitride or oxynitride constitute; The thickness of the first upper strata dielectric combination layer is 10～15nm; The thickness of the second upper strata dielectric combination layer is 35～40nm.
Preferred, first, second upper strata dielectric combination layer is formed with the stack of differing materials alternating sputtering usually.
The manufacture method of above-mentioned pair of silver low radiation glass as shown in Figure 2 comprises the step that deposits each rete successively, and is specific as follows:
Clean glass, drying is placed on magnetron sputtering area;
The intermediate frequency power supply utmost point sputtering sedimentation first basic unit's dielectric combination layer of turning out cloudy of putting english;
The intermediate frequency power supply utmost point sputtering sedimentation second basic unit's dielectric combination layer of turning out cloudy of putting english;
Direct supply adds pulse sputtering sedimentation first blocking layer;
Direct supply adds pulse sputtering sedimentation the one AgCu layer;
Direct supply adds pulse sputtering sedimentation second blocking layer;
The intermediate frequency power supply utmost point sputtering sedimentation first interlayer dielectric combination layer of turning out cloudy of putting english;
The intermediate frequency power supply utmost point sputtering sedimentation second interlayer dielectric combination layer of turning out cloudy of putting english;
Intermediate frequency power supply utmost point sputtering sedimentation the 3rd interlayer dielectric combination layer of turning out cloudy of putting english;
Direct supply adds pulse sputtering sedimentation the 3rd blocking layer;
Direct supply adds pulse sputtering sedimentation the 2nd AgCu layer;
Direct supply adds pulse sputtering sedimentation the 4th blocking layer;
The intermediate frequency power supply utmost point sputtering sedimentation upper strata dielectric combination layer of turning out cloudy of putting english;
Inspection after construction;
Wherein, described first blocking layer, second blocking layer, the 3rd blocking layer, the 4th blocking layer rete material are the material of reductibility greater than AgCu.
Preferably, the put english utmost point sputter of turning out cloudy of intermediate frequency power supply is to carry out in argon nitrogen or argon oxygen atmosphere, and frequency is 40kHz, and power is 20～90kW; It is to carry out in argon atmosphere that direct supply adds the pulse sputter, and power is 2～5kW.
Wherein, intermediate frequency power supply is put english to turn out cloudy and is carried out in argon oxygen atmosphere when utmost point sputtering sedimentation forms oxide skin, and carries out in argon nitrogen atmosphere when formation of deposits nitride or oxynitride.
Direct supply adds when the pulse sputtering sedimentation forms metal level or alloy layer and carries out in argon atmosphere, and carries out in argon oxygen atmosphere during the formation of deposits oxide skin.
The vacuum magnetic-control sputtering plated film is adopted in the preparation of two silver low radiation glass, and each rete can be by the one matter formation of deposits, also can be by several different materials formation of deposits successively.
Below in conjunction with specific embodiment two silver low radiation glass and manufacture method thereof are further described.
Embodiment 1
The film layer structure of this pair silver low radiation glass embodiment 1 is followed successively by: glass, NbO
x, AZO, Nb, AgCu, Nb, AZO, NbO
X, AZO, Nb, AgCu, Nb, AZO, SiO
xN
y
In the present embodiment, first basic unit's dielectric combination layer is NbO
xLayer, thickness is 26nm.
In the present embodiment, second basic unit's dielectric combination layer is the AZO layer, and thickness is 10nm.
In the present embodiment, first blocking layer is the Nb layer, and thickness is 1nm.
In the present embodiment, an AgCu layer thickness is 11nm, and an AgCu layer is 75% by mass ratio Ag, and Cu is 25% yellow gold formation; In other embodiment, the quality of Ag is 70～80% than scope.
In the present embodiment, second blocking layer is the Nb layer, and thickness is 1nm.
In the present embodiment, the first interlayer dielectric combination layer is the AZO layer, and thickness is 10nm.
In the present embodiment, the second interlayer dielectric combination layer is NbO
xLayer, thickness is 55nm.
In the present embodiment, the 3rd interlayer dielectric combination layer is the AZO layer, and thickness is 10nm.
In the present embodiment, the 3rd blocking layer is the Nb layer, and thickness is 1nm.
In the present embodiment, the 2nd AgCu layer thickness is 13nm, and the 2nd AgCu layer is 75% by mass ratio Ag, and Cu is 25% yellow gold formation; In other embodiment, the quality of Ag is 70～80% than scope.
In the present embodiment, the 4th blocking layer is the Nb layer, and thickness is 1nm.
In the present embodiment, the upper strata dielectric combination layer is by the first upper strata dielectric combination layer of two kinds of compounds formation of deposits successively and the second upper strata dielectric combination layer; Wherein, the first upper strata dielectric combination layer is the AZO layer, and thickness is 10nm, and the second upper strata dielectric combination layer is SiO
xN
yLayer, thickness is 30nm.
The concrete manufacturing process of above-mentioned each rete is:
SiO
xN
yLayer deposition adopts the intermediate frequency power supply utmost point sputtering sedimentation in argon nitrogen atmosphere of turning out cloudy of putting english, and the vacuum magnetic-control sputtering plant capacity is 80～90kW, and the intermediate frequency power supply frequency is 40kHz.
NbO
xLayer deposition adopts intermediate frequency power supply to put english to turn out cloudy the utmost point to carry out in argon oxygen atmosphere, and the vacuum magnetic-control sputtering plant capacity is 50～60kW, and the intermediate frequency power supply frequency is 40kHz.
AZO layer deposition adopts intermediate frequency power supply to put english to turn out cloudy the utmost point to carry out in argon oxygen atmosphere, and the vacuum magnetic-control sputtering plant capacity is 20～30kW, and the intermediate frequency power supply frequency is 40kHz.
Nb layer deposition adopts direct supply to add pulse and sputters in the argon atmosphere and carry out, and the vacuum magnetic-control sputtering plant capacity is 2kW.
AgCu layer deposition adopts direct supply to add pulse and sputters in the argon atmosphere and carry out, and the vacuum magnetic-control sputtering plant capacity is 5kW.
This pair silver low radiation glass optical property and thermal characteristics are as follows:
Radiant ratio ε≤0.05, (structure is hollow product: the heat transfer coefficient U-value＜1.4W/m two silver low radiation glass of 6mm+12mm gas cloud+6mm common white glass)
2K selects coefficient Lsg 〉=1.85.
Its each silver-bearing copper layer thickness relation satisfies the color value scope in product appearance color such as the following table:
| The monolithic appearance color | The glass surface reflected colour | Rete face reflected colour | Transmitted colour |
| Y? | Less than 9 | Less than 3.5 | Greater than 58 |
| L*? | Less than 35 | Less than 20 | Greater than 80 |
| a*? | -1～-2? | -1～-2.5? | -1～-3? |
| b*? | -5～-6? | -2～-4.5? | -0.5～-2? |
Embodiment 2
The film layer structure of this pair silver low radiation glass embodiment 2 is followed successively by: glass, NbO
x, AZO, Nb, AgCu, Nb, AZO, NbO
X, AZO, Nb, AgCu, Nb, AZO, SiO
xN
y
In the present embodiment, first basic unit's dielectric combination layer is NbO
xLayer, thickness is 21nm.
In the present embodiment, second basic unit's dielectric combination layer is the AZO layer, and thickness is 15nm.
In the present embodiment, first blocking layer is the Nb layer, and thickness is 1.5nm.
In the present embodiment, an AgCu layer thickness is 11nm, and the 2nd AgCu layer is 75% by mass ratio Ag, and Cu is 25% yellow gold formation; In other embodiment, the quality of Ag is 70～80% than scope.
In the present embodiment, second blocking layer is the Nb layer, and thickness is 1.5nm.
In the present embodiment, the first interlayer dielectric combination layer is the AZO layer, and thickness is 15nm.
In the present embodiment, the second interlayer dielectric combination layer is NbO
xLayer, thickness is 50nm.
In the present embodiment, the 3rd interlayer dielectric combination layer is the AZO layer, and thickness is 15nm.
In the present embodiment, the 3rd blocking layer is the Nb layer, and thickness is 1.5nm.
In the present embodiment, the 2nd AgCu layer thickness is 13nm, and the 2nd AgCu layer is 75% by mass ratio Ag, and Cu is 25% yellow gold formation; In other embodiment, the quality of Ag is 70～80% than scope.
In the present embodiment, the 4th blocking layer is the Nb layer, and thickness is 1.5nm.
In the present embodiment, the upper strata dielectric combination layer is by the first upper strata dielectric combination layer of two kinds of compounds formation of deposits successively and the second upper strata dielectric combination layer; Wherein, the first upper strata dielectric combination layer is the AZO layer, and thickness is 15nm, and the second upper strata dielectric combination layer is SiO
xN
yLayer, thickness is 25nm.
The concrete manufacturing process of above-mentioned each rete is:
SiO
xN
yLayer deposition adopts the intermediate frequency power supply utmost point sputtering sedimentation in argon nitrogen atmosphere of turning out cloudy of putting english, and the vacuum magnetic-control sputtering plant capacity is 80～90kW, and the intermediate frequency power supply frequency is 40kHz.
NbO
xLayer deposition adopts intermediate frequency power supply to put english to turn out cloudy the utmost point to carry out in argon oxygen atmosphere, and the vacuum magnetic-control sputtering plant capacity is 50～60kW, and the intermediate frequency power supply frequency is 40kHz.
AZO layer deposition adopts intermediate frequency power supply to put english to turn out cloudy the utmost point to carry out in argon oxygen atmosphere, and the vacuum magnetic-control sputtering plant capacity is 20～30kW, and the intermediate frequency power supply frequency is 40kHz.
Nb layer deposition adopts direct supply to add pulse and sputters in the argon atmosphere and carry out, and the vacuum magnetic-control sputtering plant capacity is 2kW.
AgCu layer deposition adopts direct supply to add pulse and sputters in the argon atmosphere and carry out, and the vacuum magnetic-control sputtering plant capacity is 5kW.
This pair silver low radiation glass optical property and thermal characteristics are as follows:
Radiant ratio ε≤0.05, (structure is hollow product: the heat transfer coefficient U-value＜1.4W/m two silver low radiation glass of 6mm+12mm gas cloud+6mm common white glass)
2K selects coefficient Lsg 〉=1.85.
Its two silver-bearing coppers layer thickness relation satisfies the color value scope in product appearance color such as the following table:
| The monolithic appearance color | The glass surface reflected colour | Rete face reflected colour | Transmitted colour |
| Y? | Less than 9 | Less than 3.5 | Greater than 58 |
| L*? | Less than 35 | Less than 20 | Greater than 80 |
| a*? | -1～-2? | -1～-2.5? | -1～-3? |
| b*? | -5～-6? | -2～-4.5? | -0.5～-2? |
This pair of silver low radiation glass substitutes Ag to obtain neutral transmitted colour with AgCu; by design thicknesses of layers and material; make the film material reductibility on AgCu layer both sides stronger than AgCu; oxygen had high affinity; in the heat-processed of product, the film material on AgCu layer both sides obtains oxygen sooner than AgCu, plays the effect of protection AgCu layer; thereby make the AgCu layer not oxidized in heat treatment process, can be by tempering.
Utilize AZO and NbO
xOptical performance stability before and after the distinctive resistance toheat of novel material and the thermal treatment allows novel material NbO
xWith SiO
xN
yBe asymmetric high low-refraction and match, alleviate the rete specific absorption; By novel coating process, make the rete on AgCu layer and both sides fine and close more.So further this pair of optimization silver low radiation glass makes high temperature when it can better adapt to tempering.
Its two silver-bearing coppers layer thickness relation satisfies the color value scope in product appearance color such as the following table:
| The monolithic appearance color | The glass surface reflected colour | Rete face reflected colour | Transmitted colour |
| Y? | Less than 9 | Less than 3.5 | Greater than 58 |
| L*? | Less than 35 | Less than 20 | Greater than 80 |
| a*? | -1～-2? | -1～-2.5? | -1～-3? |
| b*? | -5～-6? | -2～-4.5? | -0.5～-2? |
Make that like this this argentiferous low emissivity glass outward appearance is better, select coefficient higher.
First, second upper strata dielectric combination layer is formed with the stack of differing materials alternating sputtering usually, is convenient to control membrane uniformity, stability and reasonable optical effect.
Dielectric combination layer is an antireflection film layer, play a part simultaneously to connect glass and functional layer, and adhesiveproperties is good between the glass, and has alleviated the internal stress of whole low-radiation film.The upper strata dielectric combination layer has directly increased described pair of silver low radiation glass scratch resistance, wear-resisting and erosion-resisting performance.Dielectric combination layer adopts the intermediate frequency power supply with good arc extinction performance of frequency 40kHz to put english to turn out cloudy utmost point sputter to form, and the specific refractory power matched well makes the reflectivity of product and transmitance reach ideal value.
The two silver low radiation glass that adopt unique film layer structure, novel process, novel method to make have the advantage of low-E, high heat resistance, can carry out intensive treatment such as tempering, hot bending and curved tempering under 700 ℃ of high temperature; Has endurance quality simultaneously, satisfy long-distance transport, store (storage time can above eight months), can satisfy in the strange land requirement of following process such as processing, cut, break off with the fingers and thumb sheet, edging, boring, cleaning, and in said process, product is demoulding, not oxidation not, is convenient to extensive popularization.
The above embodiment has only expressed embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model claim.Should be pointed out that for the person of ordinary skill of the art under the prerequisite that does not break away from the utility model design, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (10)
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| CN2010205031164U CN201825869U (en) | 2010-08-24 | 2010-08-24 | Double-silver low-radiation glass |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102501449A (en) * | 2011-11-25 | 2012-06-20 | 林嘉宏 | Four-silver low emissivity coated glass capable of being processed in foreign places and manufacturing method thereof |
| CN102514279A (en) * | 2011-11-25 | 2012-06-27 | 林嘉宏 | Four-silver coated glass with low radiation and manufacturing technique thereof |
| CN104786591A (en) * | 2015-04-20 | 2015-07-22 | 林嘉佑 | Low-radiation coated glass containing silver-copper alloy and preparation method of low-radiation coated glass |
| CN108996919A (en) * | 2018-07-31 | 2018-12-14 | 吴江南玻华东工程玻璃有限公司 | Through color it is neutral can tempering list silver low-radiation coated glass and preparation method thereof |
-
2010
- 2010-08-24 CN CN2010205031164U patent/CN201825869U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102501449A (en) * | 2011-11-25 | 2012-06-20 | 林嘉宏 | Four-silver low emissivity coated glass capable of being processed in foreign places and manufacturing method thereof |
| CN102514279A (en) * | 2011-11-25 | 2012-06-27 | 林嘉宏 | Four-silver coated glass with low radiation and manufacturing technique thereof |
| CN104786591A (en) * | 2015-04-20 | 2015-07-22 | 林嘉佑 | Low-radiation coated glass containing silver-copper alloy and preparation method of low-radiation coated glass |
| CN104786591B (en) * | 2015-04-20 | 2017-04-12 | 林嘉佑 | Low-radiation coated glass containing silver-copper alloy and preparation method of low-radiation coated glass |
| CN108996919A (en) * | 2018-07-31 | 2018-12-14 | 吴江南玻华东工程玻璃有限公司 | Through color it is neutral can tempering list silver low-radiation coated glass and preparation method thereof |
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