CN1171311C - Semiconductor package - Google Patents
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- CN1171311C CN1171311C CNB001324357A CN00132435A CN1171311C CN 1171311 C CN1171311 C CN 1171311C CN B001324357 A CNB001324357 A CN B001324357A CN 00132435 A CN00132435 A CN 00132435A CN 1171311 C CN1171311 C CN 1171311C
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 29
- 238000007789 sealing Methods 0.000 claims abstract 2
- 239000008393 encapsulating agent Substances 0.000 claims description 23
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 5
- 238000003466 welding Methods 0.000 abstract description 18
- 238000004519 manufacturing process Methods 0.000 abstract description 14
- 238000000465 moulding Methods 0.000 abstract description 14
- 238000004806 packaging method and process Methods 0.000 abstract description 13
- 239000011347 resin Substances 0.000 abstract description 13
- 229920005989 resin Polymers 0.000 abstract description 13
- 239000003292 glue Substances 0.000 abstract description 10
- 239000000084 colloidal system Substances 0.000 abstract description 9
- 238000005538 encapsulation Methods 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 239000000126 substance Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 229920000620 organic polymer Polymers 0.000 description 5
- 239000002904 solvent Substances 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000012858 packaging process Methods 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229940126214 compound 3 Drugs 0.000 description 2
- 230000032798 delamination Effects 0.000 description 2
- 238000003912 environmental pollution Methods 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Lead Frames For Integrated Circuits (AREA)
Abstract
Description
本发明涉及一种半导体封装件的制法,尤指一种用以将晶片封装于具有开槽的封装胶体中,且该封装胶体具有一盖件,以将该开槽气密封盖住的半导体封装件的制法。The invention relates to a manufacturing method of a semiconductor package, in particular to a semiconductor package for encapsulating a chip in an encapsulant with a slot, and the encapsulant has a cover to airtightly cover the slot The method of making the package.
为适应不同类型的电子产品的需求,半导体封装件(Semiconductor Package)因而有不同的结构。其中一种常见的为影像感应封装件(Image Sensor Package),如紫外线可抹除EP-ROM或CMOS等。这种影像感应封装件的结构是将一导线架封设于一具有开槽的封装胶体中,使晶片粘接至导线架的外露于该开槽中的晶片座上,然后以焊线电性连接该晶片与导线架的导脚外露于该开槽中的内导脚,而使晶片由该导脚与外界电性连结,最后再以一透明的盖片封盖住该开槽,而使该晶片与外界气密隔离。In order to meet the needs of different types of electronic products, semiconductor packages (Semiconductor Package) have different structures. One of the common ones is Image Sensor Package, such as EP-ROM or CMOS that can be erased by ultraviolet rays. The structure of this image sensor package is to seal a lead frame in a potting compound with a slot, make the chip bond to the chip seat exposed in the slot of the lead frame, and then electrically connect the lead frame with a wire. The guide pins connecting the chip and the lead frame are exposed to the inner guide pins in the slot, so that the chip is electrically connected to the outside through the guide pins, and finally the slot is covered with a transparent cover sheet, so that The wafer is hermetically isolated from the outside world.
这种已知的影像感应封装件由于结构上的特殊性,使其在封装制作过程上产生诸多问题并影响至制成品的合格率与可靠性,已经提出若干改进的制作过程以解决制作过程上的问题。美国专利第5,070,041号“用溶剂从经涂覆的导线架上清除溢胶的方法”一案揭示了一种在去除于导线架上的溢胶时,不致损及封装胶体且能增进导线架与晶片间的电性连接性的封装制作过程。该美国专利是在一导线架于封装胶体成形后不为其包覆的部位上涂覆一层有机高分子物质,然后将经涂覆的导线架以封装树脂部分包覆而形成一封装胶体,并于该涂覆有高分子物质处上形成一开槽,而将该包覆有导线架的封装胶体浸入用以溶解该有机高分子物质层的溶剂中,以将该有机高分子物质层去除,然后粘着并电性连接一晶片至该导线架外露于该开槽中的部位上,继而以一盖片气密地封盖住该封装胶体的开槽而完成这种半导体封装件的封装制作过程。Due to the particularity of the structure of this known image sensing package, it causes many problems in the packaging and manufacturing process and affects the yield and reliability of the finished product. Several improved manufacturing processes have been proposed to solve the manufacturing process. on the question. U.S. Patent No. 5,070,041 "Method of Removing Glue Overflow from a Coated Lead Frame Using a Solvent" discloses a method for removing the overflow glue on the lead frame without damaging the encapsulant and improving the contact between the lead frame and the lead frame. The packaging process for the electrical connectivity between chips. The U.S. patent is to coat a layer of organic polymer substance on the part of a lead frame that is not covered by the encapsulation compound after molding, and then partially cover the coated lead frame with encapsulation resin to form an encapsulation compound. and forming a groove on the place coated with the polymer substance, and immersing the encapsulation colloid coated with the lead frame in a solvent for dissolving the organic polymer substance layer, so as to remove the organic polymer substance layer , and then adhere and electrically connect a chip to the part of the lead frame exposed in the slot, and then use a cover sheet to hermetically seal the slot of the encapsulant to complete the encapsulation of the semiconductor package process.
这种封装制作过程虽可改进已知影像感应封装件制法上的若干缺点,但在模压剂涂布有机高分子物质于导线架上及在模压后将的于溶剂中溶解的步骤不仅繁复与耗时,而造成制造成本的增加外,且以溶剂将有机高分子物质溶解后产生的溶液会造成环境污染,而不利于环保,但若予以处理,则会增加额外成本。因而,该美国专利的制法仍存在诸多缺点有待解决。Although this packaging manufacturing process can improve some shortcomings of the known image sensor packaging method, the steps of coating the organic polymer substance on the lead frame with the molding agent and dissolving it in the solvent after molding are not only complicated and complicated. It is time-consuming and causes an increase in manufacturing cost, and the solution produced by dissolving the organic polymer substance with a solvent will cause environmental pollution, which is not conducive to environmental protection, but if it is disposed of, it will increase additional costs. Thereby, the method for making of this U.S. patent still has many shortcomings to be solved.
本发明的一个目的在于提供一种导线架具有凹部的半导体封装件,在模压制作过程中能避免导线架的晶片粘置区与导线焊接区上发生溢胶。An object of the present invention is to provide a semiconductor package with a lead frame having a concave portion, which can avoid glue overflow on the chip bonding area and the wire bonding area of the lead frame during the molding process.
本发明的另一个目的是提供一种导线架具有凹部的半导体封装件,在模压制作过程完成后,不需要清除溢胶能简化封装制作过程、降低制造成本且无环境污染。Another object of the present invention is to provide a semiconductor package with a lead frame having a concave portion. After the molding process is completed, there is no need to remove overflowing glue, which can simplify the package manufacturing process, reduce manufacturing costs, and cause no environmental pollution.
为达成本发明上述及其它目的,本发明的导线架具有凹部的半导体封装件包括一具有晶片粘置区与导线焊接区的导线架;一粘置于该导线架的晶片粘置区上的晶片;多个用以电性连接该晶片至导线架的导线焊接区的导线;部分包覆该导线架的封装胶体,其具有一开槽以便在该封装胶体成型时,使该晶片粘置区与导线焊接区外露于该开槽中;以及一用以封盖住该开槽的盖片,以使该晶片与导线与外界气密隔离;其特征在于:该导线架的晶片粘置区与该封装胶体相接的部位上形成有一凹部,以及该导线焊接区与该封装胶体相接的部位上形成有至少一凹部。In order to achieve the above and other objects of the present invention, the semiconductor package with a lead frame of the present invention having a concave portion includes a lead frame with a chip bonding area and a wire bonding area; a chip bonded to the chip bonding area of the lead frame ; a plurality of wires for electrically connecting the chip to the wire bonding area of the lead frame; the encapsulant partially covering the lead frame has a slot so that the chip bonding area and the lead frame can be bonded when the encapsulant is molded The wire soldering area is exposed in the slot; and a cover sheet is used to cover the slot, so that the chip and the wire are airtightly isolated from the outside; A recess is formed on the part where the encapsulation compound is connected, and at least one recess is formed on the part where the wire welding area and the encapsulation compound are in contact.
该导线架上的凹部能以已知的冲压(stamping)或蚀刻(Etching)等方式形成,其宽度范围宜为0.5至2.0mm间,而深度范围则宜为0.04至0.15mm间,以在模压时,使用以形成该封装胶体的树脂模流于流入该凹部与封装用的模具内壁间形成的狭窄空间时,使流速减缓而不致溢胶于该导线架的晶片粘置区与导线焊接区上。同时,为使树脂模流为凹部减缓流速的效果强化,该凹部的形成可以多阶化。The concave portion on the lead frame can be formed by known stamping (stamping) or etching (Etching). When the resin mold used to form the encapsulant flows into the narrow space formed between the concave part and the inner wall of the mold for encapsulation, the flow rate is slowed down so that the glue does not overflow on the chip bonding area and the wire bonding area of the lead frame. . At the same time, in order to strengthen the effect of slowing down the flow velocity of the resin mold flow to the concave portion, the formation of the concave portion can be multi-staged.
在本发明的一较佳实施例中,该导线架是由晶片座及多个导脚所构成,此时,该晶片座的上表面形成供晶片粘置的晶片粘置区,而该凹部则形成于晶片座的周缘上;各导脚具有为封装胶体部分包覆的内导脚以及外露于该封装胶体外作为晶片与外界电性连接的媒介的外导脚,内导脚上表面邻近该晶片的部位形成为导线焊接区,以供导线与之端接用,且该导线焊接区不为封装胶体包覆而外露于封装胶体的开槽中,同时,该导线焊接区与内导脚上表面为封装胶体包覆部位的相接处设有前述的凹部,但于该内导脚相对于该晶片座的端部上也设有凹部。In a preferred embodiment of the present invention, the lead frame is composed of a chip base and a plurality of guide pins. At this time, the upper surface of the wafer base forms a chip bonding area for the chip to stick to, and the recess is Formed on the periphery of the chip seat; each lead has an inner lead partially covered by the encapsulant and an outer lead exposed outside the encapsulant as a medium for the chip to be electrically connected to the outside world, and the upper surface of the inner lead is adjacent to the The part of the chip is formed as a wire welding area for the termination of the wire, and the wire welding area is not covered by the encapsulant, but exposed in the slot of the encapsulant. The above-mentioned concave portion is provided at the junction of the surface where the encapsulating gel coats the portion, but a concave portion is also provided on the end of the inner lead relative to the wafer seat.
在本发明的另一较佳实施例中,该导线架仅由多个的导脚所构成,即,晶片乃利用导脚的内导脚为支撑结构(Supporting Carrier)而直接粘置于内导脚上,以减少晶片与导线架间的接触面积,避免脱层(Delamination)的发生。因而,在这个实施例中,各该导脚的内导脚的上表面上自各导脚的内端部朝外导脚的方向,依次形成为供晶片粘置的晶片粘置区、供导线焊接的导线焊接区、以及为封装胶体包覆的胶体覆盖区;此时,该晶片粘置区的凹部设置在该内导脚的端部上,而导线焊接区的凹部则形成于该内导脚的导线焊接区与胶体覆盖区相接处之上。In another preferred embodiment of the present invention, the lead frame is only composed of a plurality of guide pins, that is, the chip is directly bonded to the inner guide using the inner guide pin of the guide pin as a supporting structure (Supporting Carrier). Foot, to reduce the contact area between the chip and the lead frame, to avoid the occurrence of delamination (Delamination). Therefore, in this embodiment, on the upper surface of the inner lead pin of each lead pin, the direction from the inner end of each lead pin towards the direction of the outer lead pin is successively formed as a chip bonding area for bonding a chip, for wire welding. The wire bonding area, and the colloid covering area covered by the encapsulation gel; at this time, the concave part of the chip bonding area is set on the end of the inner lead, and the concave part of the wire bonding area is formed on the inner lead Above the junction of the wire welding area and the colloid coverage area.
以下以较佳实施例结合附图进一步详细说明本发明的特点与功效。The characteristics and effects of the present invention will be further described in detail below with reference to the accompanying drawings.
图1是本发明第一实施例的导线架的剖视图;1 is a sectional view of a lead frame according to a first embodiment of the present invention;
图2是本发明第一实施例的导线架置入封装用模具内的剖视图;Fig. 2 is a cross-sectional view of the lead frame of the first embodiment of the present invention inserted into the packaging mold;
图3是本发明第一实施例的导线架被封装胶体部分包覆的剖视图;3 is a cross-sectional view of the lead frame partially covered by the encapsulant according to the first embodiment of the present invention;
图4是本发明第一实施例的半导体封装件的剖视图;4 is a cross-sectional view of a semiconductor package according to a first embodiment of the present invention;
图5是本发明第二实施例的导线架置于封装用模具内的剖视图;5 is a cross-sectional view of a lead frame placed in a packaging mold according to a second embodiment of the present invention;
图6是本发明第三实施例的导线架的剖视图;以及6 is a cross-sectional view of a lead frame according to a third embodiment of the present invention; and
图7是本发明第四实施例的导线架的剖视图。7 is a cross-sectional view of a lead frame according to a fourth embodiment of the present invention.
图示符号说明Explanation of icon symbols
1、1a、1b、1c导线架 10晶片座1, 1a, 1b,
11、11a、11b 导脚 101、101c、117b晶片粘置区11, 11a,
102 周缘102 Perimeter
103、103a、103c、115、115a、115b、115c、116a、116b103, 103a, 103c, 115, 115a, 115b, 115c, 116a, 116b
凹部concave part
111、111a、111b 外导脚 112、112a、112b内导脚111, 111a, 111b
113、113a、113b 端部 114 导线焊接区113, 113a,
114a、114b、114c 焊接区 2 模具114a, 114b, 114c welding area 2 mold
20 上模 21 下模20
200 凸块 3 封装胶体200 bumps 3 encapsulants
4 晶片 5、5b金线4 Chip 5, 5b gold wire
6 盖件6 cover
图1所示者是用在本发明第一实施例的半导体封装件中的导线架的剖视图。FIG. 1 is a cross-sectional view of a lead frame used in a semiconductor package according to a first embodiment of the present invention.
如图1所示,该导线架1包括一晶片座10以及多个导脚11。该晶片座10的上表面形成为供晶片粘置用的晶片粘置区101,于其周缘102凹设出一凹部103。至于该导脚11则各具有一外导脚111及一与之接连的内导脚112,各内导脚112的上表面于端部113与外导脚111间的适当位置上形成有供导线焊接的导线焊接区114,并在该导线焊接区114与内导脚112的上表面为随后用以部分包覆该导线架1的封装胶体(将详述于后)所盖覆的部位的相接处上凹设有一凹部115。此外,该凹部103、115能用已知的冲压(Stamping)、蚀刻(Etching)或其它适用的方式形成,并无特定限制;且其深度宜为0.04至0.15mm的间,而宽度为0.5至2.0mm的间。As shown in FIG. 1 , the lead frame 1 includes a
参照图2,该导线架1先置入封装用的模具2中以进行模压(Molding),而形成一用以部分包覆该导线架1的封装胶体3(示于图3)。该模具2的上模20与下模21合模后,该导线架1的晶片粘置区101及导线焊接区114分别接抵至上模20上用以形成封装胶体3上的开槽30(参照图3)的凸块200的底面上,以在模压进行时,用以形成该封装胶体3的封装树脂不会覆盖至该导线架1的晶片粘置区101及导线焊接区114上。当融熔的封装树脂模流流入导线架1与上模20的凸块200间的凹部103及115内时,由于流道变窄,使流入该凹部103及115内的树脂模流会因而加速吸收模具2的热量,使粘度变大而减缓流速,故可避免树脂模流溢胶于导线架的晶片粘置区101及导线焊接区114上,从而免除模压完成后的溢胶去除处理,而得简化封装制作过程,降低制造成本,并确保上片(Die Bond)及焊线(Wire Bond)作业的品质。Referring to FIG. 2 , the lead frame 1 is first put into a packaging mold 2 for molding to form an encapsulant 3 (shown in FIG. 3 ) for partially covering the lead frame 1 . After the
参照图3,本发明第一实施例的导线架1于前述的模压制作过程完成后,为成型的封装胶体3所部分包覆,而使其晶片粘置区101及导线焊接区114分别外露于由凸块200形成的开槽30中,以利于上片与焊线作业的实施,同时,该导线架1的外导脚111会外露出该封装胶体3,而该导线架1的其馀部分则均为封装胶体3所包覆。Referring to FIG. 3 , the lead frame 1 of the first embodiment of the present invention is partially covered by the molded encapsulant 3 after the aforementioned molding process is completed, so that the
如图4所示,封装胶体3成型后,将晶片4粘置于该导线架1外露于开槽30中的晶片粘置区101上,粘接二者的胶粘介质可采用已知的银胶(Silver Paste)或胶粘片(Adhesive Tape)。之后,以金线5电性连接该晶片4与内导脚112,使晶片4由外导脚111与外界导电地接连,而该内导脚112与金线5连接的部位即在该导线焊接区114上。最后,以常用的环氧树脂或丙烯酸树脂等胶粘剂将一盖件6粘接至该封装胶体3之上,使气密地封盖住该开槽30而将外露于该开槽30中的晶片4与金线5与外界气密隔离;该盖件6可以是石英玻璃片或塑胶片等透明片件,或为有色玻璃片、陶瓷片或有色塑胶片等不透明片件。如此,即完成本发明第一实施例的半导体封装件的封装过程。As shown in Figure 4, after the encapsulation compound 3 is molded, the chip 4 is glued on the
如图5所示者,为本发明第二实施例的半导体封装件的剖视图。其结构大致同于前述的第一实施例,不同处仅在于导线架的结构。该第二实施例的导线架1a,于各导脚11a的端部113a上复凹设有一凹部116a;该凹部116a的作用亦同于该导线架1a上的凹部103a与115a,在模压制作过程中,使封装树脂模流于流入该凹部116a时,会增加粘度而减缓其流速,使树脂模流不致溢胶至内导脚112a的导线焊接区114a上,以进一步确保导线焊接区114a的不受污染。As shown in FIG. 5 , it is a cross-sectional view of a semiconductor package according to a second embodiment of the present invention. Its structure is substantially the same as the aforementioned first embodiment, the only difference lies in the structure of the lead frame. In the lead frame 1a of the second embodiment, a recess 116a is recessed on the end 113a of each guide pin 11a; the function of the recess 116a is also the same as that of the recesses 103a and 115a on the lead frame 1a, during the molding process When the encapsulation resin mold flow flows into the concave portion 116a, the viscosity will be increased to slow down its flow rate, so that the resin mold flow will not overflow to the wire welding area 114a of the inner lead 112a, so as to further ensure that the wire welding area 114a is not tight. Infected.
如图6所示者为本发明第三实施例的半导体封装件的剖视图。该第三实施例的半导体封装件的结构大致同于前述的第一实施例,不同处仅在于其使用的导线架。该第三实施例的导线架1b无晶片座,而仅由多个的导脚11b所构成。各导脚11b亦具有外导脚111b及与之相接的内导脚112b,各内导脚112b的上表面自其端部113b朝外导脚111b的方向依次形成有供晶片粘置用的晶片粘置区117b、供导线焊接用的导线焊接区114b以及为封装胶体包覆的胶体覆盖区118b;同时,该端部113b设有一凹部116b以防止封装树脂模流于模压制作过程中溢胶至该晶片粘置区117b上,而该内导脚112b于导线焊接区114b及胶体覆盖区118b相接处则凹设有一凹部115b,使在模压制作过程中避免该导线焊接区114b上发生溢胶。将晶片4b粘置于该内导脚112b的晶片粘置区117b上时,以及焊接金线5b以电性连接该晶片4b与内导脚112b的导线焊接区114b时,能确保前者的粘接品质及后者的焊接品质。FIG. 6 is a cross-sectional view of a semiconductor package according to a third embodiment of the present invention. The structure of the semiconductor package of the third embodiment is substantially the same as that of the first embodiment, the only difference lies in the lead frame used. The lead frame 1b of the third embodiment does not have a chip holder, but only consists of a plurality of guide pins 11b. Each guide pin 11b also has an outer guide pin 111b and an inner guide pin 112b connected thereto, and the upper surface of each inner guide pin 112b is sequentially formed with holes for wafer bonding from its end 113b toward the direction of the outer guide pin 111b. Chip bonding area 117b, wire bonding area 114b for wire bonding, and colloid covering area 118b covered by encapsulation gel; at the same time, the end 113b is provided with a concave portion 116b to prevent the encapsulation resin from overflowing during the molding process To the chip sticking area 117b, and the inner lead 112b is provided with a recess 115b at the junction of the wire welding area 114b and the colloid covering area 118b, so as to avoid overflow on the wire welding area 114b during the molding process. glue. When sticking the chip 4b on the chip bonding area 117b of the inner lead 112b, and welding the gold wire 5b to electrically connect the chip 4b and the wire bonding area 114b of the inner lead 112b, the former bonding can be ensured quality and the latter welding quality.
图7所示者为本发明第四实施例的半导体封装件的剖视图。该第四实施例的半导体封装件的结构大致同于前述的第一实施例,其不同处仅在于所使用的导线架。该第四实施例使用的导线架1c上的凹部103c与115c予以多阶梯化的处理,即,在凹部103c与115c成型时,使其深度具有由深而浅的阶梯状变化,以便于模压制作过程中,使流入该凹部103c与115c内的树脂模流吸收热量的速度增快,而得进一步减缓其流速,以能更有效地避免溢胶发生在晶片粘置区101c与导线焊接区114c上。FIG. 7 is a cross-sectional view of a semiconductor package according to a fourth embodiment of the present invention. The structure of the semiconductor package of the fourth embodiment is substantially the same as that of the first embodiment, the only difference lies in the used lead frame. The
上述的具体实施例仅用以详细说明本发明的特点及功效,并非以此限定本发明的可实施范围,在未脱离本发明所揭示的技术范围与精神下,任何运用本发明所完成的等效改变与修饰,均仍为本发明所揭示的申请专利范围所涵盖。The above-mentioned specific embodiments are only used to describe the characteristics and effects of the present invention in detail, and are not intended to limit the scope of the present invention. Without departing from the technical scope and spirit disclosed in the present invention, any implementation of the present invention, etc. Effective changes and modifications are still covered by the scope of the patent application disclosed in the present invention.
Claims (11)
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CN100533696C (en) * | 2007-01-17 | 2009-08-26 | 陈冠群 | Manufacturing method of semiconductor element |
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