CN116973993A - Sector graded filter and preparation method thereof - Google Patents
Sector graded filter and preparation method thereof Download PDFInfo
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- CN116973993A CN116973993A CN202311139794.5A CN202311139794A CN116973993A CN 116973993 A CN116973993 A CN 116973993A CN 202311139794 A CN202311139794 A CN 202311139794A CN 116973993 A CN116973993 A CN 116973993A
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- 238000002360 preparation method Methods 0.000 title abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 53
- 239000011521 glass Substances 0.000 claims abstract description 48
- 230000008859 change Effects 0.000 claims abstract description 18
- 238000004026 adhesive bonding Methods 0.000 claims abstract description 13
- 239000003292 glue Substances 0.000 claims abstract description 10
- 238000000151 deposition Methods 0.000 claims description 29
- 230000008021 deposition Effects 0.000 claims description 23
- 238000001228 spectrum Methods 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 16
- 238000007747 plating Methods 0.000 claims description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 150000002500 ions Chemical class 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 238000004321 preservation Methods 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 239000010408 film Substances 0.000 abstract description 60
- 230000005540 biological transmission Effects 0.000 abstract description 7
- 239000012788 optical film Substances 0.000 abstract description 7
- 238000005516 engineering process Methods 0.000 description 19
- 238000013461 design Methods 0.000 description 16
- 230000003287 optical effect Effects 0.000 description 14
- 230000007246 mechanism Effects 0.000 description 6
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- 238000011161 development Methods 0.000 description 3
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- 238000002834 transmittance Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
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- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
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- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical group [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
- G02B5/288—Interference filters comprising deposited thin solid films comprising at least one thin film resonant cavity, e.g. in bandpass filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
The invention relates to the technical field of optical films, in particular to a fan-shaped graded filter and a preparation method thereof. Comprising the following steps: a first K9 glass substrate and a second K9 glass substrate; the upper surface and the lower surface of the first K9 glass substrate are respectively plated with a long wave cut-off filter film SWPF and a gradual change narrow band filter film V-NBPF; the upper surface and the lower surface of the second K9 glass substrate are respectively plated with a graded shortwave cut-off filter film V-LWPF and a graded long wave cut-off filter film V-SWPF; the lower surface of the first K9 glass substrate and the upper surface of the second K9 glass substrate are glued through a cold glue gluing layer; the cold glue bonding layer is arranged on the outer sides of the peripheries of the surfaces of the first K9 glass substrate and the second K9 glass substrate, so that a spacing layer with a cavity is formed between the first K9 glass substrate and the second K9 glass substrate. The circular graded filter has small volume and light weight, and can correspond to different transmission wave bands by changing the angle position of the filter.
Description
Technical Field
The invention relates to the technical field of optical films, and relates to a design and preparation technology for a beam splitting element-sector graded filter, in particular to a sector graded filter and a preparation method thereof.
Background
The light splitting element is an important component of the spectrum technology, and the existing light splitting element is generally based on a complex optical system designed by a prism and grating light splitting technology, a tunable filter light splitting technology and the like, which not only brings about difficulty in design, but also becomes a design bottleneck of miniaturization and light weight of a spectrum instrument.
The fan-shaped graded filter is a novel light splitting element. It has the characteristics of small volume, light weight, durability, convenience, reliability and the like, is especially suitable for spectroscopic instruments with tight requirements on structure and medium resolution. Because the fan-shaped graded filter can be driven by a motor to rotate in the man-beam, the rapid wavelength scanning can be easily realized. This is extremely convenient and advantageous for examining things whose spectrum changes rapidly, and is also an indispensable spectroscopic element in automated instruments.
From the interference effect of light, the optical properties of the film depend on the ratio of the optical thickness of each film to the wavelength of light. Thus, given that all materials are non-dispersive, multiplying all thicknesses by a constant factor results in a shift in the optical properties of the film. Such thickness shifts naturally occur on the film surface due to non-uniformity of the film thickness distribution during film deposition. In many cases researchers have tended to reduce this phenomenon to ensure that the optical properties of the developed film are stable across the substrate surface. In contrast, if a deposited film can be uniformly wedge-shaped in thickness along one spatial direction by increasing the non-uniformity of the film thickness, a film with spatially variable optical properties can be produced, which will provide new ideas and developments for the study of film optical devices.
The prior art is mainly divided into the following two technologies:
(1) LVF linear filter scheme: related products LVF for developing CVF are developed in China, the LVF is an optical device with spectral characteristics changing linearly with the position, the research, development and manufacturing cost is low, and the LVF is formed by plating a plurality of layers of film systems with thickness changing on the surface of a substrate by adopting processes such as an ion auxiliary method or an ion beam sputtering method. LVF has a near continuous spectral path compared to conventional narrowband filters. Through investigation, LVF is produced by changshan optical-Chen-Zhuang-Ching-Zhong-photoelectric-technology Co., ltd. The preparation process of the linear gradient filter from visible light to short wave infrared is provided in China, but the preparation process of the linear gradient filter in the spectral range of (1.7-14.3) mu m is still not provided. When the linear gradient filter is used, the linear gradient filter is matched with a linear detector array with multiple pixels, each pixel on the detector can detect specific wavelength, and CVF transmits radiation with specific wavelength when the CVF rotates at a constant speed and is only received by a single-pixel detector. Because of the limitation of linearity, the linear graded filter cannot realize the measurement of high-sensitivity spectrum and high-speed spectrum modes.
(2) Multichannel filter unit scheme: and integrating the spectroscopic characteristics directly into an image sensor on-chip spectroscopic technique on the detection device. On-chip spectroscopic methods based on different principle schemes have emerged, such as on-chip frequency filters based on micro-resonators, integrated diffraction gratings, waveguide grating arrays, etc. The European microelectronic center (IMEC) is based on Fabry-Perot interference theory, and the designed Fabry-Perot monochromatic filter unit has center transmission wavelength dependent on thickness L of Fabry-Perot cavity, and can control the central wavelength of single filter element by controlling the thickness of spacer layer to realize the selection of different central wavelength filter characteristics. The IMEC makes the filter device on the photosensitive surface of the image sensor by means of the top microelectronic technology, and establishes a periodic corresponding relation with the photosensitive pixels, thereby realizing the information acquisition of a plurality of spectrum channels on the photosensitive chip. The number of spectrum channels of the multispectral chip reported by the current publication reaches 16. Because of the ubiquitous higher order interference secondary peaks of Fabry-Perot cavity devices, the broadening of the operating range of the devices is limited. In addition, the method is realized by adopting a multiple-overlay technology, the requirement on the manufacturing precision is extremely high, one aspect restricts the expansion of the number of channels, and the other aspect restricts the development and popularization of the technology due to high cost.
Based on the above, the special process manufacturing technology of the fan-shaped graded filter component is currently in a blank state in China, so that a fan-shaped graded filter and a manufacturing method thereof are developed to overcome the above defects.
Disclosure of Invention
The invention aims to provide a fan-shaped gradient filter and a preparation method thereof, and the three key technologies of wide-cut-off infrared narrow-band filter design and preparation technology, peak wavelength linear change technology along an angular vector and mask mechanism design technology are mastered.
(1) A wide cut-off infrared narrow-band filter film design and a preparation technology. The membrane system design is carried out based on a method of adding a plurality of Fabry-Perot structures and matching membrane stacks and a method of combining the intrinsic spectral characteristics of a substrate and a cut-off membrane system. And (3) researching the influence of a film thickness error rule on passband waveforms and transmittance, and forming a wide-cut infrared narrow-band filter film design and preparation technology.
(2) A process technique in which the peak wavelength of transmission varies linearly with the angular vector. And (3) researching the realization way of gradual change of the thickness of the film layer along with the angular vector on the substrate, and exploring an indirect (optical and crystal oscillation) control method to realize the precise control of gradual change of the thickness of the film layer and achieve the linear change of the peak wavelength of the transmission spectrum along with the angular vector.
(3) Mask mechanism design technology. By means of system analysis, theoretical calculation, simulation and the like, a mask mechanism and a film thickness gradient mathematical model are established, the design of a rotating mechanism, the shape of a fixed mask plate, the shape of the rotating mask plate and the rotating mechanism is developed, the compatible control of an evaporation system of coating equipment is well achieved, the film deposition with the thickness linearly changing along with an angular vector is realized, and a special mask mechanism design technology for the sector wavelength gradient filter is formed.
In order to solve the above technical problems, the present invention provides a fan-shaped graded filter, including: a first K9 glass substrate and a second K9 glass substrate; the upper surface and the lower surface of the first K9 glass substrate are respectively plated with a long wave cut-off filter film SWPF and a gradual change narrow band filter film V-NBPF; the upper surface and the lower surface of the second K9 glass substrate are respectively plated with a graded shortwave cut-off filter film V-LWPF and a graded long wave cut-off filter film V-SWPF;
the lower surface of the first K9 glass substrate and the upper surface of the second K9 glass substrate are glued through a cold glue gluing layer; the cold glue bonding layer is arranged on the outer sides of the peripheries of the surfaces of the first K9 glass substrate and the second K9 glass substrate, so that a spacing layer with a cavity is formed between the first K9 glass substrate and the second K9 glass substrate.
Preferably, the thickness of the first K9 glass substrate and the second K9 glass substrate is 1.35+/-0.05 mm.
Preferably, the thickness of the long wave cut filter SWPF is about 15um, and the thickness of the graded narrow band filter V-NBPF is 5-12um.
Preferably, the thickness of the graded shortwave cut-off filter film V-LWPF is 5-12um, and the thickness of the graded shortwave cut-off filter film V-SWPF is 20-40um.
Preferably, the thickness of the cold glue bonding layer is 2+/-0.1 um.
Preferably, the graded filter is arranged in a fan-shaped structure.
The invention also provides the following technical scheme: the preparation method of the sector graded filter comprises the following steps:
step one: and opening gradual change design software of the fan-shaped gradual change filter, inputting relevant parameters, and obtaining the rotation speed of 100r/min, wherein the rotation speed ratio is 1:2;
step two: placing the cleaned part to be plated into a processed film plating clamp, placing the processed film plating clamp into a part disc of a film plating machine, compacting a vacuum chamber door, and starting vacuumizing;
step three: background trueThe air degree P is less than or equal to 3.0X10 -6 The coating procedure is started after the heat preservation of the chamber temperature of 180 ℃ for 10 min;
step four: depositing a silicon film layer; adopting an electron gun for deposition, wherein the deposition beam is 500mA, an ion source is not used, 1.6sccm of oxygen is filled, and the deposition rate is 0.8nm/s;
step five: depositing a silicon oxide film layer; adopting an electron gun for deposition, wherein the deposition beam is 300mA, an ion source is not used, 10sccm of oxygen is filled, and the deposition rate is 1nm/s;
step six: repeating the fourth step and the fifth step according to the actual spectrum requirement;
step seven: after plating, taking a piece after 10 min;
step eight: repeating the second step to the seventh step according to the actual spectrum requirement;
step nine: and (3) bonding the two parts obtained in the second step to the eighth step together by using cold glue according to the bonding mode of the sector graded filter to prepare the sector graded filter.
The design principle of the invention is as follows: the sector wavelength gradient filter is a broadband cut-off narrowband interference filter which is used in a wide spectrum range and has transmission peaks which are gradually changed along the circumference. To realize narrow-band interference filtering, a narrow-band interference filtering film is designed by using a Fabry-Perot concept; to realize circumferential gradual change of the transmission peak value, according to the principle that the transmission peak value wavelength of the interference filter film is in direct proportion to the optical thickness of the film layer, the thickness of each film layer of the prepared filter film is required to linearly change along the circumference; to realize broadband cut-off, the absorption and cut-off film system of the sector wavelength graded filter substrate is used. Therefore, the thickness of each layer of the narrow-band interference filter film is linearly changed along the circumference, namely the fan-shaped wavelength gradual change narrow-band interference filter film (for short, the fan-shaped gradual change filter film), and the physical thickness of the gradual change object filter film layer is in direct proportion to the position of the narrow-band peak value.
Compared with the prior art, the invention has the following beneficial effects:
(1) Aiming at the LVF linear graded filter, a plurality of detectors are needed, and CVF transmits radiation with specific wavelength when rotating at uniform speed and is only received by a single-pixel detector.
(2) The circular graded filter with variable optical characteristics is used as a light splitting element, compared with the traditional light splitting element, the circular graded filter is small in size and light in weight, and different transmission wave bands can be corresponding to the angular positions of the filter. As a light-splitting element, the circular graded filter needs to have a wide working range, high cut-off degree, high pass band transmittance and other technical indexes, and the research on the channel number, the preparation technology and the test technology of the multi-channel unit filter at present reaches the bottleneck. The CVF fan-shaped gradual change filter has the advantages of less equipment, more processes, less overlay and low processing cost.
Drawings
Fig. 1 is a diagram showing a film layer distribution of a fan-shaped graded filter provided by the invention.
Fig. 2 is a schematic diagram of a gradient design software interface of a fan-shaped gradient filter provided by the invention.
FIG. 3 is a graph (1.3-2.4 um) showing the measured spectrum of the fan-shaped graded filter provided by the invention.
In the figure: 1-K9 glass substrate I, 2-K9 glass substrate II, 3-long wave cut-off filter SWPF, 4-gradual narrow band filter V-NBPF, 5-gradual short wave cut-off filter V-LWPF, 6-gradual long wave cut-off filter V-SWPF, 7-spacer layer.
Detailed Description
The invention is described in further detail below with reference to the drawings and the specific examples. The advantages and features of the present invention will become more apparent from the following description. It should be noted that the drawings are in a very simplified form and are all to a non-precise scale, merely for convenience and clarity in aiding in the description of embodiments of the invention.
Example 1
As shown in fig. 1, the present invention provides a fan-shaped graded filter, which is arranged in a fan-shaped structure. Comprising the following steps: a first K9 glass substrate 1 and a second K9 glass substrate 2; the upper surface and the lower surface of the first K9 glass substrate 1 are respectively plated with a long wave cut filter film SWPF 3 and a gradual change narrow band filter film V-NBPF 4; the upper surface and the lower surface of the second K9 glass substrate 2 are respectively plated with a graded shortwave cut-off filter film V-LWPF 5 and a graded long wave cut-off filter film V-SWPF 6;
the lower surface of the first K9 glass substrate 1 and the upper surface of the second K9 glass substrate 2 are glued by a cold glue gluing layer; the cold glue bonding layer is arranged on the outer sides of the peripheries of the surfaces of the first K9 glass substrate 1 and the second K9 glass substrate 2, so that a spacing layer 7 with a cavity is formed between the first K9 glass substrate 1 and the second K9 glass substrate 2.
The thickness of the K9 glass substrate I1 and the K9 glass substrate II 2 is 1.35 plus or minus 0.05mm.
The thickness of the long wave cut filter SWPF 3 is about 15um (determined by the optical film design), and the thickness of the graded narrow band filter V-NBPF 4 is 5-12um (about thickness determined by the optical film design).
The thickness of the graded short wave cut filter film V-LWPF 5 is 5-12um (about thickness, determined by the optical film design) and the thickness of the graded long wave cut filter film V-SWPF 6 is 20-40um (about thickness, determined by the optical film design).
The thickness of the cold glue bonding layer is 2+/-0.1 um (the thickness can ensure that interference does not occur in the cold glue bonding layer and the absorption of glue to light after 4.4um can also be ensured).
Example 2
The embodiment of the invention specifically provides a preparation method of a fan-shaped graded filter, which comprises the following steps:
step one: the sector gradient filter gradient design software shown in fig. 2 (namely, the POLTGUIDE1 software shown in fig. 2) is opened, relevant parameters are input, and the rotation speed is 100r/min, and the rotation speed ratio is 1:2; at this rotational speed, the influence of the deposition thickness influenced by the shielding portion on the entire optical film can be avoided.
Step two: placing the cleaned part to be plated into a processed film plating clamp, placing the processed film plating clamp into a part disc of a film plating machine, compacting a vacuum chamber door, and starting vacuumizing.
Step three: the background vacuum degree P is less than or equal to 3.0X10 -6 The coating procedure is started after the heat preservation of the chamber temperature of 180 ℃ for 10 min; the background vacuum can ensure that the impurity gas in the vacuum chamber is as little as possible, and the relative purity of the film components is ensured.
Step four: and depositing a silicon film layer. And adopting an electron gun for deposition, wherein the deposition beam is 500mA, an ion source is not used, 1.6sccm of oxygen is filled, and the deposition rate is 0.8nm/s. The beam can ensure that the deposition rate reaches 0.8nm/s, and the oxygen flow can ensure that the optical constant of the deposited silicon film layer meets the practical requirement.
Step five: and depositing a silicon oxide film layer. And adopting an electron gun for deposition, wherein the deposition beam is 300mA, an ion source is not used, 10sccm of oxygen is filled, and the deposition rate is 1nm/s. The beam can ensure that the deposition rate reaches 1nm/s, and the oxygen flow can ensure that the optical constant of the deposited silicon film layer meets the practical requirement.
Step six: and repeating the fourth step and the fifth step according to the actual spectrum requirements.
Step seven: and after plating, taking the workpiece after 10 minutes. After the equipment is cooled, the parts in the equipment are ensured not to be damaged by severe cold and hot changes, and precise accessories of the equipment are ensured not to be damaged.
Step eight: repeating the second step to the seventh step according to the actual spectrum requirement.
Step nine: and (3) gluing the two parts obtained in the second to eighth steps by using cold glue according to the gluing mode shown in fig. 1. The part is blocked to ultraviolet light after being processed, the commonly used photosensitive adhesive needs to use an ultraviolet light source, and other glues can not meet the requirements of optical and mechanical properties at the same time.
Step ten: a fan-shaped graded filter is obtained, a measuring system is used for measuring, and a spectrum shown in fig. 3 is obtained by a fan-shaped graded filter measuring method.
The equipment required for the experiment is as follows: sector graded filter design software and a computer; a high-precision vacuum coating machine, an ultra-clean workbench, a silicon film material and a silicon oxide ring; spectrophotometers (for testing spectra).
Environmental requirements: cleaning; the temperature is 20-25 ℃; the relative humidity is 30-50%.
The above description is only illustrative of the preferred embodiments of the present invention and is not intended to limit the scope of the present invention, and any alterations and modifications made by those skilled in the art based on the above disclosure shall fall within the scope of the appended claims.
Claims (7)
1. A fan-shaped graded filter, comprising: a first K9 glass substrate and a second K9 glass substrate; the upper surface and the lower surface of the first K9 glass substrate are respectively plated with a long wave cut-off filter film SWPF and a gradual change narrow band filter film V-NBPF; the upper surface and the lower surface of the second K9 glass substrate are respectively plated with a graded shortwave cut-off filter film V-LWPF and a graded long wave cut-off filter film V-SWPF;
the lower surface of the first K9 glass substrate and the upper surface of the second K9 glass substrate are glued through a cold glue gluing layer; the cold glue bonding layer is arranged on the outer sides of the peripheries of the surfaces of the first K9 glass substrate and the second K9 glass substrate, so that a spacing layer with a cavity is formed between the first K9 glass substrate and the second K9 glass substrate.
2. The scalloped gradient filter of claim 1 wherein the thickness of the first K9 glass substrate and the second K9 glass substrate is 1.35 ± 0.05mm.
3. A fan-shaped graded filter as claimed in claim 1, wherein the long-wave cut filter SWPF has a thickness of 15um, and the graded narrow-band filter V-NBPF has a thickness of 5-12um.
4. A fan-shaped graded filter as claimed in claim 1, wherein the thickness of the graded shortwave cut filter film V-LWPF is 5-12um, and the thickness of the graded long wave cut filter film V-SWPF is 20-40um.
5. A graded fan filter as claimed in claim 1, wherein the cold glue layer is glued to a thickness of 2±0.1um.
6. A segmented filter according to claim 1, wherein the filter is arranged in a segmented configuration.
7. The method for manufacturing a segment gradation filter according to any one of claims 1 to 6, comprising the steps of:
step one: and opening gradual change design software of the fan-shaped gradual change filter, inputting relevant parameters, and obtaining the rotation speed of 100r/min, wherein the rotation speed ratio is 1:2;
step two: placing the cleaned part to be plated into a processed film plating clamp, placing the processed film plating clamp into a part disc of a film plating machine, compacting a vacuum chamber door, and starting vacuumizing;
step three: the background vacuum degree P is less than or equal to 3.0X10 -6 The coating procedure is started after the heat preservation of the chamber temperature of 180 ℃ for 10 min;
step four: depositing a silicon film layer; adopting an electron gun for deposition, wherein the deposition beam is 500mA, an ion source is not used, 1.6sccm of oxygen is filled, and the deposition rate is 0.8nm/s;
step five: depositing a silicon oxide film layer; adopting an electron gun for deposition, wherein the deposition beam is 300mA, an ion source is not used, 10sccm of oxygen is filled, and the deposition rate is 1nm/s;
step six: repeating the fourth step and the fifth step according to the actual spectrum requirement;
step seven: after plating, taking a piece after 10 min;
step eight: repeating the second step to the seventh step according to the actual spectrum requirement;
step nine: and (3) bonding the two parts obtained in the second step to the eighth step together by using cold glue according to the bonding mode of the sector graded filter to prepare the sector graded filter.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202311139794.5A CN116973993A (en) | 2023-09-06 | 2023-09-06 | Sector graded filter and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202311139794.5A CN116973993A (en) | 2023-09-06 | 2023-09-06 | Sector graded filter and preparation method thereof |
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| CN116973993A true CN116973993A (en) | 2023-10-31 |
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| CN202311139794.5A Pending CN116973993A (en) | 2023-09-06 | 2023-09-06 | Sector graded filter and preparation method thereof |
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