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CN116682761A - Glue removing device - Google Patents

Glue removing device Download PDF

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Publication number
CN116682761A
CN116682761A CN202310712418.4A CN202310712418A CN116682761A CN 116682761 A CN116682761 A CN 116682761A CN 202310712418 A CN202310712418 A CN 202310712418A CN 116682761 A CN116682761 A CN 116682761A
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CN
China
Prior art keywords
photoresist
thickness measuring
chip
thickness
photoresist removing
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202310712418.4A
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Chinese (zh)
Inventor
丁雪苗
赵公魄
赵芝强
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Boffotto Ltd
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Boffotto Ltd
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Priority to CN202310712418.4A priority Critical patent/CN116682761A/en
Publication of CN116682761A publication Critical patent/CN116682761A/en
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67121Apparatus for making assemblies not otherwise provided for, e.g. package constructions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/24Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

The application relates to a photoresist removing device, which comprises a photoresist removing working cavity formed in a photoresist removing working table, wherein the photoresist removing working cavity is used for accommodating a chip to be photoresist removed; a controller; the photoresist removing execution device is arranged on the photoresist removing workbench and can output photoresist removing light beams into the photoresist removing working cavity, and the photoresist removing execution device is electrically connected with the controller; the thickness measuring and transmitting device is arranged on the photoresist stripping workbench and is used for generating thickness measuring light rays to the chip; and the thickness measuring receiving equipment is arranged on the photoresist stripping workbench and is used for receiving thickness measuring light reflected by the chip, and the thickness measuring transmitting equipment and the thickness measuring receiving equipment are respectively and electrically connected with the controller. The whole process of the photoresist removing device work of this scheme need not the manpower and intervenes, can effectively promote photoresist removing operation efficiency and chip thickness measurement efficiency, and can guarantee thickness measurement precision, makes photoresist get rid of thoroughly when guaranteeing chip safety, avoids causing the influence to the processingquality of chip follow-up process flow.

Description

去胶装置Glue removal device

技术领域technical field

本申请涉及芯片加工技术领域,特别是涉及一种去胶装置。The present application relates to the technical field of chip processing, in particular to a glue removing device.

背景技术Background technique

芯片作为控制中枢,被广泛装备在各种智能交互设备或自动化加工设备中,其性能优劣将在很大程度上影响着智能交互设备和自动化加工设备的工作性能与稳定性。芯片制程中,涉及一道采用光刻胶进行蚀刻加工的工序,而在蚀刻加工结束后,多余的光刻胶就不再需要,此时就需要先将多余的光刻胶去除干净,再将芯片传送至后续工艺流程,以避免光刻胶对后续工艺流程加工质量的干扰。As the control center, the chip is widely equipped in various intelligent interactive devices or automatic processing equipment, and its performance will greatly affect the working performance and stability of intelligent interactive devices and automatic processing equipment. In the chip manufacturing process, it involves a process of etching with photoresist. After the etching process is completed, the excess photoresist is no longer needed. At this time, it is necessary to remove the excess photoresist before removing the chip. It is sent to the subsequent process flow to avoid the photoresist from interfering with the processing quality of the subsequent process flow.

目前,针对光刻胶的去除工作通常采用去胶设备自动加工完成,但光刻胶的去除程度以及是否去除干净,则仍然需要根据工艺工程师的经验和频繁停机测试芯片厚度来人工判断,一来操作繁琐,费时耗力,影响去胶作业效率,二来去胶时长无法精准把握,时间过长,会对芯片表面造成损伤,时间过短,又会导致光刻胶去除不干净、不彻底。At present, the removal of photoresist is usually completed by automatic processing with deglue equipment, but the degree of photoresist removal and whether it is completely removed still needs to be manually judged based on the experience of the process engineer and frequent shutdowns to test the thickness of the chip. The operation is cumbersome, time-consuming and labor-intensive, which affects the efficiency of the glue removal operation. Second, the length of the glue removal cannot be accurately grasped. If the time is too long, it will cause damage to the chip surface. If the time is too short, the photoresist will not be removed cleanly and thoroughly.

发明内容Contents of the invention

基于此,有必要针对操作费时耗力,影响去胶作业效率,容易造成芯片损伤,光刻胶去除不干净的问题,提供一种去胶装置。Based on this, it is necessary to provide a glue removal device for the problems that the operation is time-consuming and labor-intensive, affects the efficiency of the glue removal operation, easily causes chip damage, and does not remove the photoresist cleanly.

本申请提供一种去胶装置,其包括:The application provides a glue removal device, which includes:

去胶工作台,所述去胶工作台的内部形成有去胶工作腔,所述去胶工作腔内用于容置待去胶的芯片;A glue-removing workbench, the inside of the glue-removing workbench is formed with a glue-removing working chamber, and the glue-removing working chamber is used to accommodate chips to be glued;

控制器;controller;

去胶执行设备,所述去胶执行设备装设在所述去胶工作台上并能够向所述去胶工作腔内输出去胶光束,所述去胶执行设备与所述控制器电性连接;Glue removal execution equipment, the glue removal execution equipment is installed on the glue removal workbench and can output glue removal light beams into the glue removal working chamber, and the glue removal execution equipment is electrically connected with the controller ;

测厚发射设备,所述测厚发射设备装设在所述去胶工作台上,所述测厚发射设备用于向所述芯片发生测厚光线;以及,Thickness measuring and transmitting equipment, the thickness measuring and transmitting equipment is installed on the deglue workbench, and the thickness measuring and transmitting equipment is used to generate thickness measuring light to the chip; and,

测厚接收设备,所述测厚接收设备装设在所述去胶工作台上,所述测厚接收设备用于接收由所述芯片反射而来的所述测厚光线,所述测厚发射设备和所述测厚接收设备分别与所述控制器电性连接。Thickness measurement receiving device, the thickness measurement receiving device is installed on the glue removal workbench, the thickness measurement receiving device is used to receive the thickness measurement light reflected by the chip, and the thickness measurement emits The device and the thickness measuring receiving device are respectively electrically connected to the controller.

上述方案的去胶装置应用于去除芯片上的光刻胶的加工场合中,工作时首先将待去胶的芯片放入去胶工作台的去胶工作腔内,紧接着开启去胶执行设备,与此同时或者一段时间后再启动测厚发射设备和测厚接收设备,去胶执行设备能对芯片发射去胶光束,从而将芯片表面的光刻胶烧蚀去除,在此过程中,测厚发射设备同步向芯片表面发射测厚光线,测厚光线接触到芯片后发生反射并回到测厚接收设备中,控制器根据测厚发射设备发出测厚光线的时间和测厚光线到达测厚接收设备的时间便能推算出此时芯片的实时厚度值,当实时厚度值与控制器内预存的芯片厚度值相等时,控制器随即向去胶执行设备发出停止指令,从而立即关停去胶执行设备向芯片表面继续发射去胶光束,避免去胶光束接触芯片表面而造成损伤,且相较于现有手动测厚作业方式而言,本方案的去胶装置工作全程无需人力干预,能有效提升去胶作业效率和芯片厚度测量效率,且可保证测厚精准度,保证芯片安全的同时使光刻胶去除干净彻底,避免对芯片后续工序流程的加工质量造成影响。The deglue device of the above scheme is applied to the processing occasion of removing the photoresist on the chip. When working, first put the chip to be deglue into the deglue working chamber of the degumming workbench, and then turn on the degumming execution equipment. At the same time or after a period of time, start the thickness measurement transmitting device and the thickness measurement receiving device. The glue removal execution device can emit a glue removal beam to the chip, so as to ablate and remove the photoresist on the chip surface. During this process, the thickness measurement The transmitting device emits thickness measuring light to the surface of the chip synchronously. The thickness measuring light is reflected after touching the chip and returns to the thickness measuring receiving device. The time of the equipment can calculate the real-time thickness value of the chip at this time. When the real-time thickness value is equal to the pre-stored chip thickness value in the controller, the controller will immediately send a stop command to the glue removal execution device, thereby immediately shutting down the glue removal execution The equipment continues to emit glue-removing light beams to the chip surface to avoid damage caused by the glue-removing beam touching the chip surface. Compared with the existing manual thickness measurement operation method, the glue-removing device of this solution does not require human intervention throughout the work, which can effectively improve The efficiency of deglue operation and the efficiency of chip thickness measurement can ensure the accuracy of thickness measurement, ensure the safety of the chip and completely remove the photoresist, so as to avoid affecting the processing quality of the subsequent process of the chip.

下面对本申请的技术方案作进一步的说明:The technical scheme of the present application is described further below:

在其中一个实施例中,所述测厚发射设备包括测厚光线发射器,所述测厚接收设备包括测厚光线接收器,所述测厚光线发射器和所述测厚光线接收器分别设置于所述去胶执行设备的相对两侧,且所述测厚光线发射器和所述测厚光线接收器均与所述去胶工作台的台面倾斜设置。In one of the embodiments, the thickness measurement emitting device includes a thickness measurement light transmitter, and the thickness measurement receiving device includes a thickness measurement light receiver, and the thickness measurement light transmitter and the thickness measurement light receiver are respectively set The thickness-measuring light transmitter and the thickness-measuring light receiver are arranged on opposite sides of the glue-removing execution device and are inclined to the table top of the glue-removing workbench.

在其中一个实施例中,所述测厚发射设备还包括第一真空隔断阀,所述第一真空隔断阀装设在所述测厚光线发射器上。In one of the embodiments, the thickness measuring and transmitting device further includes a first vacuum isolation valve, and the first vacuum isolation valve is installed on the thickness measuring light transmitter.

在其中一个实施例中,所述测厚接收设备还包括第二真空隔断阀,所述第二真空隔断阀装设在所述测厚光线接收器上。In one of the embodiments, the thickness measurement receiving device further includes a second vacuum isolation valve, and the second vacuum isolation valve is installed on the thickness measurement light receiver.

在其中一个实施例中,所述去胶工作台包括载架和工作台主体,所述载架可活动的设置于所述工作台主体的顶面,所述去胶执行设备、所述测厚发射设备和所述测厚接收设备分别装设在所述载架上。In one of the embodiments, the glue removal workbench includes a carrier and a workbench body, the carrier is movably arranged on the top surface of the workbench body, the glue removal execution equipment, the thickness measuring The transmitting device and the thickness-measuring receiving device are installed on the carrier respectively.

在其中一个实施例中,所述工作台主体的顶面设有第一轨道和第二轨道,所述第一轨道与所述第二轨道橡胶布置且相互接通,所述载架的底部安装有移动块,所述移动块可活动的装设于所述第一轨道或所述第二轨道上。In one of the embodiments, the top surface of the main body of the workbench is provided with a first track and a second track, the first track and the second track are rubber arranged and connected to each other, and the bottom of the carrier is installed There is a moving block, and the moving block is movably installed on the first track or the second track.

在其中一个实施例中,所述载架上设置有围绕所述载架且平行于所述工作台主体的台面的环形轨道,所述环形轨道上可活动的安装有第一转动组件和第二转动组件,所述测厚发射设备装设于所述第一转动组件并能在竖直平面内转动,所述测厚接收设备装设于所述第二转动组件并能在竖直平面内转动。In one of the embodiments, the carrier is provided with an annular track surrounding the carrier and parallel to the table surface of the workbench body, and the first rotating assembly and the second rotating assembly are movably installed on the annular track. A rotating assembly, the thickness measuring transmitting device is installed on the first rotating assembly and can rotate in a vertical plane, and the thickness measuring receiving device is installed on the second rotating assembly and can rotate in a vertical plane .

在其中一个实施例中,所述第一转动组件和所述第二转动组件均包括座体、阻尼套和转动体,所述座体装设在所述载架上,且所述座体设有转孔,所述转动体设有转轴部,所述转轴部可转动的插置于所述转孔内,所述阻尼套套设于所述转轴部与所述转孔的孔壁之间。In one of the embodiments, both the first rotating assembly and the second rotating assembly include a seat body, a damping sleeve and a rotating body, the seat body is installed on the carrier, and the seat body is provided There is a rotating hole, the rotating body is provided with a rotating shaft part, and the rotating shaft part is rotatably inserted in the rotating hole, and the damping sleeve is sleeved between the rotating shaft part and the wall of the rotating hole.

在其中一个实施例中,所述去胶装置还包括支撑台和夹具,所述支撑台装设在所述去胶工作腔内,所述夹具设置于所述支撑台的台面并用于装夹固定待去胶的所述芯片。In one of the embodiments, the glue removal device further includes a support table and a clamp, the support table is installed in the glue removal working chamber, and the clamp is arranged on the table of the support table and used for clamping and fixing The chips to be glued.

在其中一个实施例中,所述去胶执行设备采用等离子发生器。In one of the embodiments, the deglue performing device adopts a plasma generator.

附图说明Description of drawings

构成本申请的一部分的附图用来提供对本申请的进一步理解,本申请的示意性实施例及其说明用于解释本申请,并不构成对本申请的不当限定。The drawings constituting a part of the application are used to provide further understanding of the application, and the schematic embodiments and descriptions of the application are used to explain the application, and do not constitute an improper limitation to the application.

为了更清楚地说明本申请实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings that need to be used in the description of the embodiments will be briefly introduced below. Obviously, the drawings in the following description are only some embodiments of the present application. For those skilled in the art, other drawings can also be obtained based on these drawings without creative effort.

图1为本申请一实施例的去胶装置的轴测结构图。FIG. 1 is an axonometric structural view of a glue removing device according to an embodiment of the present application.

图2为图1的正视结构图。FIG. 2 is a front structural view of FIG. 1 .

图3为图2的俯视结构图。FIG. 3 is a top structural view of FIG. 2 .

附图标记说明:Explanation of reference signs:

100、去胶装置;10、去胶工作台;11、去胶工作腔;12、载架;13、工作台主体;20、去胶执行设备;30、测厚发射设备;31、测厚光线发射器;32、第一真空隔断阀;40、测厚接收设备;41、测厚光线接收器;42、第二真空隔断阀;50、支撑台;60、夹具;200、芯片。100. Degumming device; 10. Degumming workbench; 11. Degumming working chamber; 12. Carrier; 13. Workbench main body; 20. Degumming execution equipment; Transmitter; 32. First vacuum isolating valve; 40. Thickness measuring receiving device; 41. Thickness measuring light receiver; 42. Second vacuum isolating valve; 50. Support platform; 60. Fixture; 200. Chip.

具体实施方式Detailed ways

为使本申请的上述目的、特征和优点能够更加明显易懂,下面结合附图对本申请的具体实施方式做详细的说明。在下面的描述中阐述了很多具体细节以便于充分理解本申请。但是本申请能够以很多不同于在此描述的其它方式来实施,本领域技术人员可以在不违背本申请内涵的情况下做类似改进,因此本申请不受下面公开的具体实施例的限制。In order to make the above-mentioned purpose, features and advantages of the present application more obvious and understandable, the specific implementation manners of the present application will be described in detail below in conjunction with the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the application. However, the present application can be implemented in many other ways different from those described here, and those skilled in the art can make similar improvements without departing from the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.

在本申请的描述中,需要理解的是,若有出现这些术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”、“轴向”、“径向”、“周向”等,这些术语指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本申请和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。In the description of the present application, it should be understood that if any of these terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", " Front", "Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise", "Axial", "radial", "circumferential", etc., the orientation or positional relationship indicated by these terms is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the application and simplifying the description, rather than indicating Or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore should not be construed as limiting the application.

此外,若有出现这些术语“第一”、“第二”,这些术语仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本申请的描述中,若有出现术语“多个”,“多个”的含义是至少两个,例如两个,三个等,除非另有明确具体的限定。In addition, if these terms "first" and "second" appear, these terms are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, the features defined as "first" and "second" may explicitly or implicitly include at least one of these features. In the description of the present application, if the term "plurality" appears, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise specifically defined.

在本申请中,除非另有明确的规定和限定,若有出现术语“安装”、“相连”、“连接”、“固定”等,这些术语应做广义理解。例如,可以是固定连接,也可以是可拆卸连接,或成一体;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系,除非另有明确的限定。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本申请中的具体含义。In this application, unless otherwise clearly specified and limited, if any terms such as "mounted", "connected", "connected" and "fixed" appear, these terms should be interpreted in a broad sense. For example, it can be a fixed connection, or a detachable connection, or integrated; it can be a mechanical connection, or it can be an electrical connection; it can be a direct connection or an indirect connection through an intermediary, or it can be the internal communication of two components Or the interaction relationship between two elements, unless expressly defined otherwise. Those of ordinary skill in the art can understand the specific meanings of the above terms in this application according to specific situations.

在本申请中,除非另有明确的规定和限定,若有出现第一特征在第二特征“上”或“下”等类似的描述,其含义可以是第一和第二特征直接接触,或第一和第二特征通过中间媒介间接接触。而且,第一特征在第二特征“之上”、“上方”和“上面”可是第一特征在第二特征正上方或斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”可以是第一特征在第二特征正下方或斜下方,或仅仅表示第一特征水平高度小于第二特征。In this application, unless otherwise clearly specified and limited, if there is a similar description that the first feature is "on" or "under" the second feature, the meaning may be that the first and second features are in direct contact, or The first and second features are in indirect contact through an intermediary. Moreover, "above", "above" and "above" the first feature on the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. "Below", "beneath" and "beneath" the first feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is less horizontally than the second feature.

需要说明的是,若元件被称为“固定于”或“设置于”另一个元件,它可以直接在另一个元件上或者也可以存在居中的元件。若一个元件被认为是“连接”另一个元件,它可以是直接连接到另一个元件或者可能同时存在居中元件。如若存在,本申请所使用的术语“垂直的”、“水平的”、“上”、“下”、“左”、“右”以及类似的表述只是为了说明的目的,并不表示是唯一的实施方式。It should be noted that, if an element is referred to as being “fixed on” or “disposed on” another element, it may be directly on the other element or there may be an intervening element. If an element is considered to be "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. As used herein, the terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions are used for purposes of illustration only and are not intended to be exclusive implementation.

参阅图1至图3,为本申请一实施例展示的去胶装置100,包括去胶工作台10、控制器、去胶执行设备20、测厚发射设备30以及测厚接收设备40。Referring to FIG. 1 to FIG. 3 , a glue removal device 100 shown in an embodiment of the present application includes a glue removal workbench 10 , a controller, a glue removal execution device 20 , a thickness measurement transmitting device 30 and a thickness measurement receiving device 40 .

去胶工作台10采用箱型结构设计,结构简单且规整,制造成本低,因此去胶工作台10的内部形成有去胶工作腔11,去胶工作腔11内用于容置待去胶的芯片200。一般来讲,去胶工作腔11内一次或者说一个加工周期内通常仅安装一块芯片200;当然,也可以选择同时安装两块或以上数量的芯片200,由此提升去胶装置100单个加工周期的加工能力,减少频繁装卸芯片200的停机耗时,提高芯片200加工效率。The glue-removing workbench 10 adopts a box-shaped structure design, the structure is simple and regular, and the manufacturing cost is low. Therefore, a glue-removing work chamber 11 is formed inside the glue-removing workbench 10. Chip 200. Generally speaking, only one chip 200 is usually installed in the glue-removing working chamber 11 once or in one processing cycle; of course, two or more chips 200 can also be installed at the same time, thereby improving the single processing cycle of the glue-removing device 100. processing capacity, reduce downtime for frequent loading and unloading of the chip 200, and improve the processing efficiency of the chip 200.

容易理解的,芯片200安装和取出可以通过人力操作实现,也可以通过自动上下料设备(如上下料机械手等)自动完成,具体根据实际需要进行灵活选择即可。It is easy to understand that the installation and removal of the chip 200 can be done manually, or automatically by automatic loading and unloading equipment (such as loading and unloading manipulators, etc.), which can be flexibly selected according to actual needs.

去胶执行设备20装设在去胶工作台10上并能够向去胶工作腔11内输出去胶光束,去胶执行设备20与控制器电性连接。例如,本实施例中去胶执行设备20采用等离子发生器。也即上述的去胶光束具体为等离子光束。等离子发生器能向芯片200发射等离子光束,等离子光束对光刻胶去除效果好,有助于提升光刻胶去除效率和去除洁净度。The glue removal execution device 20 is installed on the glue removal workbench 10 and can output the glue removal light beam into the glue removal working chamber 11 , and the glue removal execution device 20 is electrically connected with the controller. For example, the deglue performing device 20 in this embodiment adopts a plasma generator. That is, the above-mentioned glue-removing beam is specifically a plasma beam. The plasma generator can emit a plasma beam to the chip 200 , and the plasma beam has a good effect on photoresist removal, which helps to improve photoresist removal efficiency and removal cleanliness.

请继续参阅图2,此外,测厚发射设备30装设在去胶工作台10上,测厚发射设备30用于向芯片200发生测厚光线;测厚接收设备40装设在去胶工作台10上,测厚接收设备40用于接收由芯片200反射而来的测厚光线,测厚发射设备30和测厚接收设备40分别与控制器电性连接。Please continue to refer to FIG. 2 , in addition, the thickness measuring transmitting device 30 is installed on the glue removing workbench 10, and the thickness measuring emitting device 30 is used to generate thickness measuring light to the chip 200; the thickness measuring receiving device 40 is installed on the glue removing workbench 10 , the thickness measurement receiving device 40 is used to receive the thickness measurement light reflected by the chip 200 , and the thickness measurement transmitting device 30 and the thickness measurement receiving device 40 are respectively electrically connected to the controller.

需要说明的是,膜厚发射设备用于发射出的以及膜厚接收设备用于接收的测厚光线具体为X射线。因此用于测量芯片200厚度的工作原理可简述为:利用X射线的穿透能力,对物质进行探测。当X射线通过材料时会与材料内部原子发生相互作用,包括散射和吸收。在材料表面附近的原子与X射线相互作用较剧而发生散射,影响相对较小,而在深处的原子发生的散射就比较少,主要是吸收。因此,利用X射线在材料内部吸收的能量和由此造成的衰减和散射,可以确定材料的厚度。It should be noted that the thickness measuring light emitted by the film thickness emitting device and received by the film thickness receiving device is specifically X-rays. Therefore, the working principle for measuring the thickness of the chip 200 can be briefly described as: using the penetrating ability of X-rays to detect substances. When X-rays pass through a material, they interact with atoms inside the material, including scattering and absorption. Atoms near the surface of the material interact strongly with X-rays and scatter, and the impact is relatively small, while atoms in the depths scatter less and mainly absorb. Therefore, using the energy absorbed by the X-rays inside the material and the resulting attenuation and scattering, the thickness of the material can be determined.

综上,实施本实施例技术方案将具有如下有益效果:上述方案的去胶装置100应用于去除芯片200上的光刻胶的加工场合中,工作时首先将待去胶的芯片200放入去胶工作台10的去胶工作腔11内,紧接着开启去胶执行设备20,与此同时或者一段时间后再启动测厚发射设备30和测厚接收设备40,去胶执行设备20能对芯片200发射去胶光束,从而将芯片200表面的光刻胶烧蚀去除,在此过程中,测厚发射设备30同步向芯片200表面发射测厚光线,测厚光线接触到芯片200后发生反射并回到测厚接收设备40中,控制器根据测厚发射设备30发出测厚光线的时间和测厚光线到达测厚接收设备40的时间便能推算出此时芯片200的实时厚度值,当实时厚度值与控制器内预存的芯片200厚度值相等时,控制器随即向去胶执行设备20发出停止指令,从而立即关停去胶执行设备20向芯片200表面继续发射去胶光束,避免去胶光束接触芯片200表面而造成损伤,且相较于现有手动测厚作业方式而言,本方案的去胶装置100工作全程无需人力干预,能有效提升去胶作业效率和芯片200厚度测量效率,且可保证测厚精准度,保证芯片200安全的同时使光刻胶去除干净彻底,避免对芯片200后续工序流程的加工质量造成影响。In summary, the implementation of the technical solution of this embodiment will have the following beneficial effects: the adhesive removal device 100 of the above solution is applied to the processing occasion of removing the photoresist on the chip 200, and the chip 200 to be removed is first put into the In the glue removal working chamber 11 of the glue workbench 10, the glue removal execution device 20 is started immediately, and at the same time or after a period of time, the thickness measurement transmitting device 30 and the thickness measurement receiving device 40 are started. 200 emits a glue-removing light beam to ablate and remove the photoresist on the surface of the chip 200. During this process, the thickness measuring and emitting device 30 synchronously emits a thickness measuring light to the surface of the chip 200, and the thickness measuring light is reflected after touching the chip 200 and Returning to the thickness measuring receiving device 40, the controller can calculate the real-time thickness value of the chip 200 at this time according to the time when the thickness measuring emitting device 30 emits the thickness measuring light and the time when the thickness measuring light reaches the thickness measuring receiving device 40. When the thickness value is equal to the chip 200 thickness value pre-stored in the controller, the controller immediately sends a stop command to the glue removal execution device 20, thereby immediately shutting down the glue removal execution device 20 and continuing to emit glue removal beams to the surface of the chip 200 to avoid glue removal The light beam touches the surface of the chip 200 to cause damage, and compared with the existing manual thickness measurement operation method, the deglue device 100 of this solution does not require human intervention throughout the work, which can effectively improve the efficiency of the deglue operation and the thickness measurement efficiency of the chip 200. Moreover, the thickness measurement accuracy can be guaranteed, and the photoresist can be completely removed while ensuring the safety of the chip 200 , so as to avoid affecting the processing quality of the chip 200 subsequent process flow.

请继续参阅图2,在上述实施例的基础上,测厚发射设备30包括测厚光线发射器31,测厚接收设备40包括测厚光线接收器41,测厚光线发射器31和测厚光线接收器41分别设置于去胶执行设备20的相对两侧,且测厚光线发射器31和测厚光线接收器41均与去胶工作台10的台面倾斜设置。如此设置后,测厚光线发射器31向芯片200发射X射线,X射线更易于在芯片200表面以合适角度产生反射,从而使X射线更准确的返回至测厚光线接收器41,以便准确且快速的完成对芯片200厚度的实时测量。Please continue to refer to FIG. 2 , on the basis of the above-mentioned embodiment, the thickness measuring transmitting device 30 includes a thickness measuring light emitter 31, the thickness measuring receiving device 40 includes a thickness measuring light receiver 41, the thickness measuring light emitter 31 and the thickness measuring light The receivers 41 are respectively arranged on opposite sides of the glue removal execution device 20 , and the thickness measurement light emitter 31 and the thickness measurement light receiver 41 are both arranged obliquely to the surface of the glue removal workbench 10 . After such setting, the thickness-measuring light emitter 31 emits X-rays to the chip 200, and the X-rays are more likely to be reflected at a suitable angle on the surface of the chip 200, so that the X-rays can return to the thickness-measuring light receiver 41 more accurately, so as to accurately and The real-time measurement of the thickness of the chip 200 is quickly completed.

进一步地,测厚发射设备30还包括第一真空隔断阀32,第一真空隔断阀32装设在测厚光线发射器31上。同理,测厚接收设备40还包括第二真空隔断阀42,第二真空隔断阀42装设在测厚光线接收器41上。当检测发现芯片200的实时厚度值等于预存的芯片200厚度值后,控制器除了关停等离子发生器以外,也会同步向第一真空隔断阀32和第二真空隔断阀42发出指令,控制第一真空隔断阀32和第二真空隔断阀42关闭,从而就能将测厚光线发射器31和测厚光线接收器41的光路切断,停止X射线继续射出,避免检测人员取出芯片200时受到X射线的伤害。Further, the thickness measuring and emitting device 30 also includes a first vacuum isolation valve 32 , and the first vacuum isolation valve 32 is installed on the thickness measuring light transmitter 31 . Similarly, the thickness measurement receiving device 40 further includes a second vacuum isolation valve 42 installed on the thickness measurement light receiver 41 . When it is detected that the real-time thickness value of the chip 200 is equal to the pre-stored chip 200 thickness value, the controller, in addition to shutting down the plasma generator, will also synchronously send instructions to the first vacuum isolation valve 32 and the second vacuum isolation valve 42 to control the first vacuum isolation valve 32 and the second vacuum isolation valve 42. A vacuum isolating valve 32 and a second vacuum isolating valve 42 are closed, so that the optical path of the thickness measuring light transmitter 31 and the thickness measuring light receiver 41 can be cut off, and the X-rays are stopped to continue to emit, so as to prevent the inspector from being subjected to X rays when taking out the chip 200. Ray damage.

请继续参阅图1至图3,此外,在上述任一实施例的基础上,去胶工作台10包括载架12和工作台主体13,载架12可活动的设置于工作台主体13的顶面,去胶执行设备20、测厚发射设备30和测厚接收设备40分别装设在载架12上。工作时,操作载架12相对工作台主体13进行活动,能灵活改变去胶执行设备20、测厚发射设备30和测厚接收设备40的位置,从而能将芯片200表面不同部位的光刻胶完全去除以及对芯片200进行完整的厚度测量,保证光刻胶去除洁净度以及芯片200厚度测量精度。Please continue to refer to FIGS. 1 to 3. In addition, on the basis of any of the above-mentioned embodiments, the glue removal workbench 10 includes a carrier 12 and a workbench main body 13, and the carrier 12 is movably arranged on the top of the workbench main body 13. On the surface, the glue removal execution device 20 , the thickness measurement transmitting device 30 and the thickness measurement receiving device 40 are installed on the carrier 12 respectively. During work, the operation carrier 12 moves relative to the main body 13 of the workbench, and the positions of the deglue execution device 20, the thickness measurement transmitting device 30 and the thickness measurement receiving device 40 can be flexibly changed, so that the photoresist on different parts of the surface of the chip 200 can be removed. Complete removal and complete thickness measurement of the chip 200 ensure the cleanliness of photoresist removal and the thickness measurement accuracy of the chip 200 .

具体而言,在上述实施例中工作台主体13的顶面设有第一轨道和第二轨道,第一轨道与第二轨道橡胶布置且相互接通,载架12的底部安装有移动块,移动块可活动的装设于第一轨道或第二轨道上。因而移动块能在相交的第一轨道或者第二轨道上灵活移动,使去胶执行设备20、测厚发射设备30和测厚接收设备40能对准芯片200和光刻胶的不同部位,保证可加工性和可检测性。Specifically, in the above embodiment, the top surface of the workbench main body 13 is provided with a first track and a second track, the first track and the second track are rubber arranged and connected to each other, and the bottom of the carrier 12 is equipped with a moving block, The moving block can be movably installed on the first track or the second track. Therefore, the moving block can move flexibly on the intersecting first track or second track, so that the glue removal execution device 20, the thickness measurement transmitting device 30 and the thickness measurement receiving device 40 can be aligned with different parts of the chip 200 and the photoresist, ensuring Processability and detectability.

或者,作为上述实施例的可替代方案,在另一些实施例中载架12上设置有围绕载架12且平行于工作台主体13的台面的环形轨道,环形轨道上可活动的安装有第一转动组件和第二转动组件,测厚发射设备30装设于第一转动组件并能在竖直平面内转动,测厚接收设备40装设于第二转动组件并能在竖直平面内转动。通过沿着水平方向延伸设置的环形轨道运动,能使测厚发射设备30和测厚接收设备40获得与芯片200不同的周向相对位置,在此基础上测厚发射设备30和测厚接收设备40通过相应的第一转动组件和第二转动组件竖直相适转动,便能使测厚光线到达芯片200不同部位,完成对芯片200不同部位的厚度实时测量。Or, as an alternative to the above-mentioned embodiments, in some other embodiments, the carrier 12 is provided with an annular track that surrounds the carrier 12 and is parallel to the table surface of the workbench main body 13, and the annular track is movably installed with a first The rotating assembly and the second rotating assembly, the thickness measuring transmitting device 30 is installed on the first rotating assembly and can rotate in the vertical plane, and the thickness measuring receiving device 40 is installed on the second rotating assembly and can rotate in the vertical plane. By moving along the circular track extending in the horizontal direction, the thickness measuring transmitting device 30 and the thickness measuring receiving device 40 can obtain different circumferential relative positions from the chip 200. On this basis, the thickness measuring transmitting device 30 and the thickness measuring receiving device 40 through the corresponding vertical rotation of the first rotating assembly and the second rotating assembly, the thickness measuring light can reach different parts of the chip 200 to complete the real-time measurement of the thickness of different parts of the chip 200.

在一些实施例中,第一转动组件和第二转动组件均包括座体、阻尼套和转动体,座体装设在载架12上,且座体设有转孔,转动体设有转轴部,转轴部可转动的插置于转孔内,阻尼套套设于转轴部与转孔的孔壁之间。因而转动体的转轴部在转孔内旋转,便能使第一转动组件和第二转动组件提供测厚发射设备30和测厚接收设备40所需的旋转自由度;进一步地,阻尼套增加转轴部与转孔的孔壁直径的摩擦阻力,使得测厚发射设备30和测厚接收设备40能够固定在转动后的角度位置不发生随意转动,有助于保证芯片200厚度测量准确度。In some embodiments, both the first rotating assembly and the second rotating assembly include a seat body, a damping sleeve and a rotating body, the seat body is installed on the carrier 12, and the seat body is provided with a rotating hole, and the rotating body is provided with a rotating shaft portion, The rotating shaft part is rotatably inserted in the rotating hole, and the damping sleeve is sleeved between the rotating shaft part and the wall of the rotating hole. Therefore, the rotating shaft part of the rotating body rotates in the rotating hole, so that the first rotating assembly and the second rotating assembly can provide the required rotational degrees of freedom for the thickness measuring transmitting device 30 and the thickness measuring receiving device 40; further, the damping sleeve increases the rotating shaft. The frictional resistance between the hole wall diameter of the head and the rotating hole enables the thickness-measuring transmitting device 30 and the thickness-measuring receiving device 40 to be fixed at the angular position after the rotation without random rotation, which helps to ensure the accuracy of the thickness measurement of the chip 200.

可选地,阻尼套采用橡胶套。Optionally, the damping sleeve adopts a rubber sleeve.

请继续参阅图2,此外,在上述任一实施例的基础上,去胶装置100还包括支撑台50和夹具60,支撑台50装设在去胶工作腔11内,夹具60设置于支撑台50的台面并用于装夹固定待去胶的芯片200。夹具60能将芯片200装夹固定,使整个去胶加工和测厚过程中芯片200位置保持稳定。Please continue to refer to Fig. 2, in addition, on the basis of any of the above-mentioned embodiments, the glue removal device 100 also includes a support table 50 and a clamp 60, the support table 50 is installed in the glue removal working chamber 11, and the clamp 60 is arranged on the support table 50 and is used for clamping and fixing the chip 200 to be glued. The clamp 60 can clamp and fix the chip 200, so that the position of the chip 200 can be kept stable during the whole process of glue removal and thickness measurement.

可选地,夹具60可以是机械夹具60,或者真空吸附设备等等,具体根据实际需要进行灵活选择即可。Optionally, the clamp 60 may be a mechanical clamp 60, or a vacuum adsorption device, etc., which can be flexibly selected according to actual needs.

以上所述实施例的各技术特征可以进行任意的组合,为使描述简洁,未对上述实施例中的各个技术特征所有可能的组合都进行描述,然而,只要这些技术特征的组合不存在矛盾,都应当认为是本说明书记载的范围。The technical features of the above-mentioned embodiments can be combined arbitrarily. To make the description concise, all possible combinations of the technical features in the above-mentioned embodiments are not described. However, as long as there is no contradiction in the combination of these technical features, should be considered as within the scope of this specification.

以上所述实施例仅表达了本申请的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对申请专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本申请构思的前提下,还可以做出若干变形和改进,这些都属于本申请的保护范围。因此,本申请专利的保护范围应以所附权利要求为准。The above-mentioned embodiments only express several implementation modes of the present application, and the description thereof is relatively specific and detailed, but should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make several modifications and improvements without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the scope of protection of the patent application should be based on the appended claims.

Claims (10)

1. A photoresist remover, comprising:
a photoresist removing working chamber is formed in the photoresist removing working table, and the photoresist removing working chamber is used for accommodating a chip to be photoresist removed;
a controller;
the photoresist removing execution device is arranged on the photoresist removing workbench and can output photoresist removing light beams into the photoresist removing working cavity, and the photoresist removing execution device is electrically connected with the controller;
the thickness measuring and transmitting device is arranged on the photoresist removing workbench and is used for generating thickness measuring rays to the chip; the method comprises the steps of,
the thickness measuring receiving device is arranged on the photoresist stripping workbench and is used for receiving the thickness measuring light reflected by the chip, and the thickness measuring transmitting device and the thickness measuring receiving device are respectively and electrically connected with the controller.
2. The photoresist stripping apparatus according to claim 1, wherein the thickness measuring and transmitting device comprises a thickness measuring light emitter, the thickness measuring and receiving device comprises a thickness measuring light receiver, the thickness measuring light emitter and the thickness measuring light receiver are respectively arranged on two opposite sides of the photoresist stripping device, and the thickness measuring light emitter and the thickness measuring light receiver are obliquely arranged with a table top of the photoresist stripping workbench.
3. The photoresist stripper apparatus of claim 2, wherein the thickness measuring emitter device further comprises a first vacuum shut-off valve mounted on the thickness measuring light emitter.
4. The photoresist stripper apparatus of claim 2, wherein the thickness measuring receiving device further comprises a second vacuum shut-off valve mounted on the thickness measuring light receiver.
5. The photoresist stripper according to claim 1, wherein the photoresist stripper comprises a carriage and a main body, the carriage is movably disposed on a top surface of the main body, and the photoresist stripping device, the thickness measuring device and the thickness measuring device are respectively mounted on the carriage.
6. The photoresist stripper according to claim 5, wherein the top surface of the table body is provided with a first rail and a second rail, the first rail and the second rail are arranged in rubber and are mutually communicated, the bottom of the carriage is provided with a moving block, and the moving block is movably arranged on the first rail or the second rail.
7. The photoresist stripper according to claim 5, wherein the carrier is provided with an annular track surrounding the carrier and parallel to the table surface of the table main body, a first rotating assembly and a second rotating assembly are movably mounted on the annular track, the thickness measuring transmitting device is mounted on the first rotating assembly and can rotate in a vertical plane, and the thickness measuring receiving device is mounted on the second rotating assembly and can rotate in a vertical plane.
8. The photoresist stripper according to claim 7, wherein the first and second rotating assemblies each comprise a base, a damping sleeve and a rotator, the base is mounted on the carrier, the base is provided with a rotating hole, the rotator is provided with a rotating shaft, the rotating shaft is rotatably inserted into the rotating hole, and the damping sleeve is sleeved between the rotating shaft and the wall of the rotating hole.
9. The photoresist stripper according to any one of claims 1 to 8, further comprising a support table and a clamp, wherein the support table is mounted in the photoresist stripping working chamber, and the clamp is disposed on a table top of the support table and is used for clamping and fixing the chip to be stripped.
10. The photoresist stripper according to claim 9, wherein the photoresist stripper performing apparatus employs a plasma generator.
CN202310712418.4A 2023-06-15 2023-06-15 Glue removing device Pending CN116682761A (en)

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Application Number Priority Date Filing Date Title
CN202310712418.4A CN116682761A (en) 2023-06-15 2023-06-15 Glue removing device

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060082785A1 (en) * 2004-02-09 2006-04-20 Alan Janos In-situ absolute measurement process and apparatus for film thickness, film removal rate, and removal endpoint prediction
JP2015021081A (en) * 2013-07-19 2015-02-02 日東電工株式会社 Thermal peeling type adhesive tape and cutting-off method of electronic component
CN209102598U (en) * 2018-09-19 2019-07-12 深圳市华讯方舟太赫兹科技有限公司 A kind of optical test set
CN113031408A (en) * 2019-12-25 2021-06-25 盛美半导体设备(上海)股份有限公司 Photoresist removing method and device
CN114772544A (en) * 2022-03-08 2022-07-22 苏州子山半导体科技有限公司 Dry pulse plasma etching photoresist removing method with deep silicon etching and engraving functions

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060082785A1 (en) * 2004-02-09 2006-04-20 Alan Janos In-situ absolute measurement process and apparatus for film thickness, film removal rate, and removal endpoint prediction
JP2015021081A (en) * 2013-07-19 2015-02-02 日東電工株式会社 Thermal peeling type adhesive tape and cutting-off method of electronic component
CN209102598U (en) * 2018-09-19 2019-07-12 深圳市华讯方舟太赫兹科技有限公司 A kind of optical test set
CN113031408A (en) * 2019-12-25 2021-06-25 盛美半导体设备(上海)股份有限公司 Photoresist removing method and device
CN114772544A (en) * 2022-03-08 2022-07-22 苏州子山半导体科技有限公司 Dry pulse plasma etching photoresist removing method with deep silicon etching and engraving functions

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