CN116379543A - Clean room for semiconductor factory building - Google Patents

Abstract

The present application discloses a clean room used in a semiconductor plant, which belongs to the technical field of clean rooms, and includes a clean work room, which includes a clean work area for high-precision processing and a clean room for pre-semiconductor process processing. In the processing service area, a separation area is set between the clean work area and the processing service area, and a curtain is arranged at intervals in the separation area, and the curtain is arranged along the length direction of the separation area, adjacent to the Both sides of the barrier curtain are provided with filter assemblies for filtering air, and the filter assemblies include first filter nets and second filter nets arranged at intervals along the separation area, and the clean working area and the processing A first ventilation system for delivering clean air is arranged in each service area, and a second ventilation system for delivering clean air is arranged in the partition area. This application has the effect of improving the air cleanliness in a clean room.

Description

A clean room for a semiconductor plant

technical field

The present application relates to the technical field of clean rooms, in particular to a clean room used in semiconductor workshops.

Background technique

Semiconductors refer to materials whose electrical conductivity is between conductors and insulators at room temperature. They are widely used in consumer electronics, communication systems, and medical equipment. Operators usually produce semiconductor products in clean rooms. The clean room can effectively control the indoor or factory air cleanliness, temperature and humidity, and airflow direction and other factors that affect the production process, and can meet the strict requirements of the semiconductor industry for the working environment.

In related technologies, a clean room generally includes a large clean space, which is equipped with a fresh air conveying system and an exhaust system. Has a central aisle and at least one production aisle. There are partitions around the production aisle, so that the structure space and the clean space in the production aisle form an independent clean micro-environment structure, and at least one ventilation pipe is set under the ceiling of the production aisle to form the return air of the clean micro-environment structure aisle.

In view of the above-mentioned related technologies, the inventor believes that the staff need to enter the production aisle from the work area of the clean room many times during the process of moving semiconductor products, and a small amount of exhaust gas or corrosive gas in the work area is easy to adhere to the surface of the staff's clothing. Furthermore, as workers enter the production aisle or other clean areas, there is a possibility of affecting the cleanliness of the air in the clean space.

Contents of the invention

In order to improve the cleanliness of the air in the clean room, the present application provides a clean room for a semiconductor workshop.

A clean room for a semiconductor workshop provided by this application adopts the following technical scheme:

A clean room for a semiconductor plant, including a clean room, the clean room includes a clean work area for high-precision processing and a processing service area for semiconductor pre-process processing, the clean work area and the A separation area is provided between the processing service areas, and barrier curtains are arranged at intervals in the separation area, and the barrier curtains are arranged along the length direction of the separation area. A filter assembly for filtering air, the filter assembly includes a first filter net and a second filter net arranged at intervals along the partition, the clean working area and the processing service area are both provided with a first filter for delivering clean air A ventilation system, the partition area is provided with a second ventilation system for delivering clean air.

By adopting the above technical solution, the setting of the curtain prevents the air in the clean working area and the processing service area from communicating with each other, and the curtain cooperates with the first filter net and the second filter net to form an independent space in the divided area. When the clean work area or processing service area enters the separation area, the operator first enters the independent space in the separation area through the filter assembly. At this time, the first ventilation system cooperates with the second ventilation system to help clean the operators, thereby preventing exhaust gas or corrosive The gas is brought into the separation area as the operator moves, so as to ensure the cleanliness of the air in the large external clean space.

Preferably, the filter assembly further includes a first guide frame and a second guide frame installed at intervals in the separation area, and the first guide frame slides along its own length direction and is provided with a plurality of guide frames for installing the first guide frame. The first positioning frame of the filter net, the second guide frame slides along its own length direction and is provided with a plurality of second positioning frames for installing the second filter net, and the first filter net and the second Adjacent sides of the filters overlap.

By adopting the above technical solution, the setting of the first positioning frame and the second positioning frame facilitates the operator to replace the first filter net and the second filter net, and the setting of the first guide frame and the second guide frame enables the operator to move the first filter net and the second filter net respectively. The positioning frame and the second positioning frame facilitate the operator to freely enter the separation area.

Preferably, a suspended ceiling board is installed on the inner top surface of the clean working room, a base is provided on the inner bottom surface of the clean working room, a first installation groove is opened on the suspended ceiling board, and a There is a second installation groove corresponding to the first installation groove, the first guide frame includes a first guide rod installed on the inner end surface of the first installation groove and a first guide rod installed in the second installation groove The second guide rod on the end face, the second guide frame includes a third guide rod installed on the inner end face of the first installation groove and a fourth guide rod installed on the inner end face of the second installation groove, so The first guide rod and the third guide rod are arranged side by side, and the second guide rod and the fourth guide rod are arranged side by side.

By adopting the above technical solution, the setting of the first installation groove and the second installation groove is convenient for accommodating the first guide frame and the second guide frame, thereby helping to reduce the waste gas or corrosive gas in the clean working area or the processing service area passing through the first The possibility of the gap between the guide frame, the second guide frame and the top surface of the clean work area or the inner ground infiltrating into the separation area.

Preferably, a collection cavity is opened in the base, and a plurality of air intake holes for communicating with the collection cavity are opened on the upper surface of the base located in the partition area, and the base An exhaust fan for discharging gas in the collection cavity is provided, a negative pressure fan for communicating with the collection cavity is arranged on the exhaust fan, and a air filter.

By adopting the above technical scheme, when the staff enters the independent space of the separation area, the second ventilation system uses the incoming clean air to blow the impurity air carried by the staff downward, and at the same time, the negative pressure fan speeds up the flow of air, so that The impurity air quickly enters the collection cavity, and then the setting of the cavity filter is beneficial to filter the impurities in the air, so that it is convenient for the operator to use the exhaust fan to remove the filtered air, and then form the air flow in the separation area.

Preferably, both the clean working area and the processing service area are provided with a plurality of partition assemblies for separating spaces, and the partition assemblies include transverse plates mounted on the base and fixedly connected to the transverse The longitudinal board on the board, the length directions of the transverse board and the longitudinal board are perpendicular to each other.

By adopting the above technical scheme, the setting of the transverse plate is beneficial to separate the space of the clean working area and the processing service area, and the cooperation of the longitudinal plate and the transverse plate is conducive to building an independent space in the clean working area and the processing service area, thereby avoiding the direct impact of exhaust gas The first filter screen and the second filter screen further reduce the overflow of air in the clean working area and the processing service area.

Preferably, the first ventilation system includes an exhaust box arranged in the ceiling board and a ventilation pipe for communicating with a high-pressure air source, the ventilation pipe communicates with the exhaust box, and the exhaust A first air outlet pipe and a second air outlet pipe are installed at intervals in the bellows, chemical filters for filtering air are installed on the first air outlet pipe and the second air outlet pipe, and the first air outlet pipe The inner bottom surface of the pipe is provided with a first exhaust hole for blowing towards the direction close to the separation area, and the inner bottom surface of the second air outlet pipe is provided with a second exhaust hole for blowing towards a direction away from the separation area.

By adopting the above technical solution, the air flow enters the exhaust box through the ventilation pipe, part of the air flow enters the first air outlet pipe, and the other part of the air flow enters the second air outlet pipe, and the air flow entering the first air outlet pipe is discharged through the first exhaust hole , so that the air close to the partition area enters the air circulation in the independent space in the partition area; and then the airflow of the second air outlet pipe is discharged through the second exhaust hole, thereby reducing the air circulation in the combined space of the transverse plate and the longitudinal plate possibility.

Preferably, a ventilation cavity is opened on the part of the base located in the clean working area and the processing service area, and a ventilation hole is opened on the inner top surface of the ventilation cavity, and the longitudinal A through passage for communicating with the exhaust box is opened in the plate, and the through passage communicates with the ventilation cavity.

By adopting the above technical scheme, the gas entering the second air outlet pipe in the exhaust box is discharged through the second exhaust hole, and then enters the ventilation cavity through the ventilation hole, and the gas in the ventilation cavity passes through the passage again. It enters the exhaust box, and then enters the circulation again after being filtered by a chemical filter to reduce loss.

Preferably, the ventilation pipe is provided with a plurality of connecting pipes for communicating with the exhaust box, and the end of the longitudinal plate located in the exhaust box is fixedly connected with a windshield, and the windshield The plates are in one-to-one correspondence with the communication pipes, and the two sides of the ends of the longitudinal plates located in the exhaust box are connected with air outlet pipes, and the air outlet pipes are arranged obliquely.

By adopting the above technical solution, on the one hand, the setting of the windshield reduces the speed of the high-pressure airflow and realizes the diversion of the airflow; The gas inside can enter the exhaust box, so as to realize the air circulation.

In summary, the present application includes at least one of the following beneficial technical effects:

1. The setting of the curtain prevents the air in the clean working area and the processing service area from communicating with each other, and the curtain cooperates with the first filter and the second filter to form an independent space in the divided area. When the operator goes from the clean working area or When the processing service area enters the separation area, the operator first enters the independent space in the separation area through the filter assembly. At this time, the first ventilation system cooperates with the second ventilation system to facilitate the cleaning of the operators, thereby preventing waste gas or corrosive gas from following the operation. Personnel move into the separation area, so as to ensure the cleanliness of the air in the large external clean space;

2. When the staff enters the independent space of the separation area, the second ventilation system uses the incoming clean air to blow the impurity air carried by the staff downward, and at the same time, the negative pressure fan accelerates the flow of air, so that the impurity air enters quickly In the collection cavity, the setting of the cavity filter is beneficial to filter the impurities in the air, so that it is convenient for the operator to use the exhaust fan to remove the filtered air, and then form the air flow in the separation area;

3. The gas entering the second air outlet pipe in the exhaust box is discharged through the second exhaust hole, and then enters the ventilation cavity through the ventilation hole, and the gas in the ventilation cavity enters the exhaust box again through the through channel Inside, and then filtered by the chemical filter and enter the circulation again to reduce the loss.

Description of drawings

FIG. 1 is a schematic structural diagram of a clean room used in a semiconductor workshop according to an embodiment of the present application.

Fig. 2 is a schematic diagram of the internal structure of the clean working room of the embodiment of the present application.

FIG. 3 is an enlarged schematic view of point A in FIG. 2 .

Explanation of reference signs: 1. Clean studio; 11. Clean work area; 12. Processing service area; 13. Partition area; 14. Ceiling board; 15. Base; 16. First installation groove; 17. Second installation Groove; 18, accommodation groove; 19, ventilation cavity; 191, ventilation hole; 2, curtain; 3, filter assembly; 31, first guide frame; 311, first guide rod; 312, second guide rod ; 32, the second guide frame; 321, the third guide rod; 322, the fourth guide rod; 33, the first filter screen; 34, the second filter screen; 35, the first positioning frame; 36, the second positioning frame; 4, the first ventilation system; 41, the exhaust box; 42, the ventilation pipe; 43, the first air outlet pipe; 44, the second air outlet pipe; 45, the chemical filter; 46, the first exhaust hole; 47, Second exhaust hole; 48, connecting pipe; 5, partition assembly; 51, transverse plate; 52, longitudinal plate; 53, through channel; 54, windshield; 55, air outlet pipe; 6, second ventilation system; 61 62, the third air outlet pipe; 63, the third exhaust hole; 64, the collection cavity; 65, the air inlet; 66, the negative pressure fan; 67, the exhaust fan; 68, the air filter.

Detailed ways

The present application will be described in further detail below in conjunction with accompanying drawings 1-3.

The embodiment of the present application discloses a clean room used in a semiconductor workshop. Referring to FIG. 1 and FIG. 2 , the clean room used in a semiconductor plant includes a clean studio 1 , which can be divided into a clean working area 11 , a processing service area 12 and a separation area 13 . The clean work area 11 is used for high-precision processing of semiconductors, the processing service area 12 is used for pre-semiconductor process processing, and the partition area 13 is located between the processing service area 12 and the clean work area 11, which is used to store other equipment and facilitate staff to pass through .

Referring to FIG. 1 and FIG. 3 , the inner top surface of the clean studio 1 is fixedly connected with a ceiling board 14 , and the ceiling board 14 covers the entire clean studio 1 . A base 15 is fixedly connected to the inner bottom surface of the clean studio 1, and the base 15 covers the entire clean studio 1. The ceiling board 14 is positioned at the bottom surface in the separation area 13 and is provided with a first installation groove 16, the length direction of the first installation groove 16 is consistent with the length direction of the ceiling board 14, the first installation groove 16 is provided with two, two first The installation slots 16 are arranged at intervals. The upper surface of the base 15 is provided with a second installation groove 17, the length direction of the second installation groove 17 is consistent with the length direction of the first installation groove 16, and the second installation groove 17 is provided with two, two second installation grooves 17 corresponds to the two first installation grooves 16 one by one.

Referring to Fig. 1 and Fig. 2, a curtain 2 is installed in the separation area 13, the length direction of the curtain 2 is consistent with the length direction of the first installation groove 16, and the curtain 2 is arranged between the two first installation grooves 16, There are two shielding curtains 2, and the two shielding curtains 2 correspond to the two first installation grooves 16 one by one. Adjacent curtains 2 are provided with filter assemblies 3 on sides away from each other, and the filter assemblies 3 correspond to the first installation grooves 16 one by one.

Referring to FIG. 1 and FIG. 3 , a single filter assembly 3 includes a first guide frame 31 , a second guide frame 32 , a first filter screen 33 and a second filter screen 34 . The first guide frame 31 includes a first guide rod 311 and a second guide rod 312, the first guide rod 311 is located in the first installation groove 16, the length direction of the first guide rod 311 is consistent with the length direction of the first installation groove 16, And the end of the first guide rod 311 is fixedly connected with the inner end surface of the first installation groove 16 . The second guide rod 312 is located in the second installation groove 17 , and the length direction of the second guide rod 312 is consistent with the length direction of the first guide rod 311 . A first positioning frame 35 is installed between the first guiding rod 311 and the second guiding rod 312 , and the first positioning frame 35 is slidingly matched with the first guiding rod 311 and the second guiding rod 312 respectively. There are multiple first positioning frames 35 , and the multiple first positioning frames 35 are arranged at intervals along the length direction of the first guide rod 311 . The first filter 33 is mounted on the first positioning frame 35 , and the setting of the first positioning frame 35 is convenient for the operator to replace the first filter 33 .

1 and 2, the second guide frame 32 includes a third guide rod 321 and a fourth guide rod 322, the third guide rod 321 is located in the first installation groove 16, the third guide rod 321 and the first guide rod 311 mutually Parallel, and the end of the third guide rod 321 is fixedly connected to the inner end surface of the first installation groove 16 , and the third guide rod 321 and the first guide rod 311 are arranged at intervals in the horizontal direction. The fourth guide rod 322 is located in the second installation groove 17 , the fourth guide rod 322 is parallel to the second guide rod 312 , and the end of the fourth guide rod 322 is fixedly connected to the inner end surface of the second installation groove 17 . The fourth guide rod 322 is in one-to-one correspondence with the third guide rod 321 . A second positioning frame 36 is disposed between the third guiding rod 321 and the fourth guiding rod 322 , and the second positioning frame 36 is slidingly engaged with the third guiding rod 321 and the fourth guiding rod 322 respectively. Moreover, there are multiple second positioning frames 36 , and the multiple second positioning frames 36 are arranged at intervals along the length direction of the third guide rod 321 . The second filter screen 34 is installed on the second positioning frame 36, the first filter screen 33 and the second filter screen 34 are used to filter the impurities in the air, and the first filter screen 33 and the second filter screen 34 are arranged alternately, the second filter screen 33 and the second filter screen 34 are arranged alternately. A filter 33 overlaps with the edge of the second filter 34 .

Referring to FIG. 2 and FIG. 3 , the clean working area 11 and the processing service area 12 are provided with a first ventilation system 4 . The first ventilation system 4 includes an exhaust box 41 and a ventilation pipe 42 . The exhaust box 41 is a hollow box, and the length direction of the exhaust box 41 is consistent with the length direction of the first installation groove 16 . The air exhaust box 41 is disposed in the ceiling board 14 , and the ceiling board 14 is provided with a receiving groove 18 for installing the air exhaust box 41 , and the bottom surface of the air exhaust box 41 is flush with the bottom surface of the ceiling board 14 . There are two exhaust boxes 41 , one exhaust box 41 is set in the clean working area 11 , and the other exhaust box 41 is set in the processing service area 12 . Ventilation pipe 42 is installed in the ceiling board 14, and there are two ventilation pipes 42, two ventilation pipes 42 correspond to two exhaust boxes 41 one by one, and a plurality of communicating pipes 48 are arranged at intervals on the ventilating pipe 42, and the communicating pipes One end of 48 communicates with ventilation pipe 42 , and the other end of communication pipe 48 communicates with exhaust box 41 .

Referring to Fig. 3, first air outlet pipe 43, the second air outlet pipe 44 are arranged in the air exhaust box 41, the length direction of the first air outlet pipe 43 is consistent with the length direction of the exhaust box, and the second air outlet pipe 44 is in line with the length direction of the exhaust box. The first air outlet pipes 43 are parallel to each other, and the first air outlet pipes 43 and the second air outlet pipes 44 are arranged at intervals. Both the first air outlet pipes 43 and the second air outlet pipes 44 are integrally formed with the exhaust box 41 .

With reference to Fig. 3, chemical filter 45 is all installed on the upper surface of first air outlet pipe 43 and second air outlet pipe 44, and chemical filter 45 is provided with a plurality of, and a plurality of chemical filter 45 is arranged at intervals, and chemical filter 45 Used to filter the air entering the first air outlet pipe 43 and the second air outlet pipe 44 . The inner bottom surface of the first air outlet pipe 43 is provided with a first air discharge hole 46, and the first air outlet pipe 43 communicates with the outside world through the first air discharge hole 46, and the first air discharge hole 46 is arranged obliquely. The end of the hole 46 away from the first air outlet pipe 43 faces the separation area 13 . The inner bottom surface of the second air outlet pipe 44 is provided with a second air discharge hole 47, and the second air outlet pipe 44 communicates with the outside world through the second air discharge hole 47, and the second air discharge hole 47 is arranged obliquely. The end of the hole 47 away from the second air outlet pipe 44 faces away from the separation area 13 .

Referring to FIG. 2 and FIG. 3 , a partition assembly 5 is provided in the clean working area 11 and the processing service area 12 , and the partition assembly 5 includes a transverse plate 51 and a longitudinal plate 52 . The bottom surface of the transverse plate 51 is fixedly connected with the upper surface of the base 15 , and the upper surface of the transverse plate 51 is fixedly connected with the bottom surface of the ceiling board 14 . A plurality of transverse plates 51 are provided, and the plurality of transverse plates 51 are arranged at intervals. There are multiple longitudinal plates 52, and the longitudinal plates 52 correspond to the transverse plates 51 one by one. The longitudinal plates 52 are arranged on the side of the transverse plate 51 close to the partition area 13. The longitudinal plates 52 are fixedly connected to the transverse plates 51. The bottom surface of the longitudinal plates 52 It is fixedly connected with the upper surface of the base 15 . The length direction of the longitudinal board 52 is perpendicular to the length direction of the transverse board 51 , and the length direction of the longitudinal board 52 is consistent with the length direction of the exhaust box 41 . The top of the longitudinal plate 52 extends into the exhaust box 41 , and the longitudinal plate 52 is located between the first air outlet pipe 43 and the second air outlet pipe 44 .

Referring to Fig. 2 and Fig. 3, the base 15 is located in the clean working area 11 and the inside of the processing service area 12 and is provided with a ventilation cavity 19, and the inner top surface of the ventilation cavity 19 is provided with a ventilation hole 191, and the ventilation hole 191 is provided with a plurality of ventilation holes 191 arranged in a matrix, and the ventilation cavity 19 communicates with the outside world through the ventilation holes 191 . A through channel 53 is opened inside the longitudinal plate 52 , and the through channel 53 is arranged vertically. One end of the through channel 53 communicates with the ventilation cavity 19 , and the other end of the through channel 53 communicates with the exhaust box 41 . A windshield 54 is arranged on the top of the longitudinal plate 52 located in the exhaust box 41 , and the windshield 54 is fixedly connected with the longitudinal plate 52 , and the length direction of the windshield 54 is consistent with that of the longitudinal plate 52 . The longitudinal plate 52 is located on the two side walls of the exhaust box 41 and is perforated with an air outlet pipe 55 , the through channel 53 communicates with the outside world through the air outlet pipe 55 , and the air outlet pipe 55 is arranged obliquely downward.

With reference to Fig. 2, Fig. 3, the second ventilation system 6 is arranged in the separation area 13, the second ventilation system 6 includes an air inlet pipe 61 and a third air outlet pipe 62, the air inlet pipe 61 is embedded in the ceiling plate 14, and the air inlet The length direction of the pipe 61 is consistent with the length direction of the ventilation pipe 42, and the air inlet pipe 61 communicates with the external air source. The third air outlet pipe 62 is arranged in the ceiling panel 14, the third air outlet pipe 62 communicates with the air inlet pipe 61, and the inner bottom surface of the third air outlet pipe 62 is provided with a plurality of third exhaust holes 63, and the plurality of The third air outlets 63 are arranged in a matrix, and the third air outlets 63 are arranged vertically. The third air outlet pipe 62 communicates with the outside through the third air outlets 63 .

With reference to Fig. 2, Fig. 3, the base 15 is located in the interior of the partition 13 and has a collection cavity 64, and the inner top surface of the collection cavity 64 is provided with a plurality of air intake holes 65, and the collection cavity 64 passes through the air intake holes 65. Connect with the outside world. A negative pressure fan 66 is installed in the base 15 , one end of the negative pressure fan 66 communicates with the collection cavity 64 , and an air filter 68 is installed at the other end of the negative pressure fan 66 . An exhaust fan 67 is embedded in the base 15 , and the exhaust fan 67 is located below the collection cavity 64 , and the exhaust fan 67 communicates with the air filter 68 .

The implementation principle of a clean room used in a semiconductor workshop in the embodiment of the present application is as follows: the setting of the curtain 2 prevents the air in the clean work area 11 and the processing service area 12 from communicating with each other, and the curtain 2 and the first filter 33, The second filter screen 34 cooperates to form an independent space in the partition area. When the operator enters the partition area 13 from the clean work area 11 or the processing service area 12, the operator first enters the independent space in the partition area 13 through the filter assembly 3. At this time, the first ventilation system 4 cooperates with the second ventilation system 6 to help clean the operators, thereby preventing waste gas or corrosive gases from being brought into the separation area 13 as the operators move, thereby ensuring the cleanliness of the air in the large external clean space.

All of the above are preferred embodiments of the application, and are not intended to limit the protection scope of the application. Therefore, all equivalent changes made according to the structure, shape, and principle of the application should be covered by the protection scope of the application. Inside.

Claims (8)

1. A clean room for a semiconductor plant, comprising a clean room (1), the clean room (1) including a clean work area (11) for high-precision processing and a process for processing in front of semiconductors Service area (12), a separation area (13) is set between the clean work area (11) and the processing service area (12), and it is characterized in that a curtain is arranged at intervals in the separation area (13) (2), the barrier curtains (2) are arranged along the length direction of the separation area (13), and the two sides of the adjacent barrier curtains (2) away from each other are provided with filter assemblies (3) for filtering air , the filter assembly (3) includes a first filter screen (33) and a second filter screen (34) arranged at intervals along the separation area (13), the clean working area (11) and the processing service area Each of the (12) is provided with a first ventilation system (4) for delivering clean air, and the partition area (13) is provided with a second ventilation system (6) for delivering clean air. 2. A clean room for a semiconductor plant according to claim 1, characterized in that: the filter assembly (3) also includes a first guide frame (31) installed at intervals in the separation area (13) ) and a second guide frame (32), the first guide frame (31) is slidably provided with a plurality of first positioning frames (35) for installing the first filter screen (33) along its own length direction, the The second guide frame (32) is slidably provided with a plurality of second positioning frames (36) for installing the second filter screen (34) along its own length direction, and the first filter screen (33) and the The adjacent sides of the second filter screen (34) overlap. 3. A kind of clean room for semiconductor factory building according to claim 2, it is characterized in that: the inner top surface of described clean working room (1) is equipped with ceiling board (14), and described clean working room ( 1) is provided with a pedestal (15) on the inner bottom surface, a first mounting groove (16) is provided on the ceiling board (14), and a first mounting groove (16) is provided on the base (15) for connecting with the first mounting groove. (16) Corresponding to the second installation groove (17), the first guide frame (31) includes a first guide rod (311) installed on the inner end surface of the first installation groove (16) and installed on the The second guide rod (312) on the inner end face of the second installation groove (17), the second guide frame (32) includes a third guide rod (312) installed on the inner end face of the first installation groove (16) 321) and the fourth guide rod (322) installed on the inner end surface of the second installation groove (17), the first guide rod (311) and the third guide rod (321) are arranged side by side, the The second guide rod (312) is arranged side by side with the fourth guide rod (322). 4. A clean room for a semiconductor workshop according to claim 3, characterized in that: a collection cavity (64) is opened in the base (15), and the base (15) is located in the The upper surface of the separation area (13) is provided with a plurality of air inlet holes (65) for communicating with the collection cavity (64), and the base (15) is provided with a hole for discharging the collection cavity. (64) The exhaust fan (67) of gas in the interior, described exhaust fan (67) is provided with the negative pressure blower (66) that is used to communicate with described collecting cavity (64), and described negative pressure blower (66) An air filter (68) is installed between the exhaust fan (67). 5. A clean room for a semiconductor factory building according to claim 3, characterized in that: said clean work area (11) and said processing service area (12) are provided with a plurality of separate spaces The partition assembly (5), the partition assembly (5) includes a transverse plate (51) mounted on the base (15) and a longitudinal plate (52) fixedly connected to the transverse plate (51), The length directions of the transverse plate (51) and the longitudinal plate (52) are perpendicular to each other. 6. A clean room for a semiconductor factory building according to claim 5, characterized in that: said first ventilation system (4) comprises an exhaust box (41) arranged in said suspended ceiling (14) And a ventilation pipe (42) for communicating with a high-pressure air source, the ventilation pipe (42) communicates with the exhaust box (41), and a first outlet is installed at intervals in the exhaust box (41). Air duct (43), the second air outlet pipe (44), the first air outlet pipe (43), the second air outlet pipe (44) are equipped with a chemical filter (45) for filtering air, so The inner bottom surface of the first air outlet pipe (43) is provided with a first exhaust hole (46) for blowing towards the direction close to the separation area (13), and the inner bottom surface of the second air outlet pipe (44) is provided with There is a second exhaust hole (47) for blowing air in a direction away from the separation area (13). 7. A clean room for a semiconductor plant according to claim 6, characterized in that: the base (15) is located in the clean working area (11) and the part of the processing service area (12) A ventilation cavity (19) is opened on the upper surface, and a ventilation hole (191) is opened on the inner top surface of the ventilation cavity (19), and a ventilation hole (191) is opened in the longitudinal plate (52). The bellows (41) communicates with a through passage (53), and the through passage (53) communicates with the ventilation cavity (19). 8. A kind of clean room for semiconductor plant according to claim 7, characterized in that: said ventilation pipe (42) is provided with a plurality of connecting pipes ( 48), the end of the longitudinal plate (52) located in the exhaust box (41) is fixedly connected with a windshield (54), and the windshield (54) is connected to the connecting pipe (48) In one-to-one correspondence, the two sides of the end of the longitudinal plate (52) located in the exhaust box (41) are connected with an air outlet pipe (55), and the air outlet pipe (55) is arranged obliquely.

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