CN116334529A - Handling method, baffles and components for components in a PVD chamber - Google Patents

Abstract

The present application relates to the field of instruments and equipment, in particular, to a processing method for components in a PVD chamber, a baffle and components. The treatment method includes: providing components with a surface roughness of 4.2-8.2 μm on the working surface; forming a first coating with a surface roughness of 7.0-9.2 μm on the working surface; and forming a first coating with a surface roughness of 8.3-11.5 μm of the second coating. Through the above method, the entire surface structure of the component can be made denser, and the subsequent material source will not enter the interior of the component, which facilitates the subsequent recovery of the material source. At the same time, the surface structure components have high bonding strength, which effectively reduces the temperature and humidity of the use scene. The effect of changes on the adhesion ability of the surface structure. In addition, the above-mentioned surface structure can also provide greater adhesion, provide adhesion for the material source, increase the recovery rate of the material source, reduce waste, and can also increase the service life of the aforementioned components.

Description

Handling method, baffles and components for components in a PVD chamber

technical field

The present application relates to the field of instruments and equipment, in particular, to a processing method for components in a PVD chamber, a baffle and components.

Background technique

Physical Vapor Deposition (Physical Vapor Deposition, PVD) refers to the use of physical methods under vacuum conditions to vaporize the surface of the material source into gaseous atoms or molecules, or partially ionize into ions, and through a low-pressure gas (or plasma) process, on the surface of the substrate A technique for depositing thin films with certain special functions.

The process flow of heterojunction cells mainly includes four steps of texture cleaning, amorphous silicon coating, TCO coating, and screen printing. Among them, TCO coating mainly uses ITO (Indiμm Tin Oxide) target material, which accounts for 10% of the battery sheet. The non-silicon cost is about 10%, and the reduction of ITO cost is the focus of the cost reduction work of heterojunction cells.

TCO (transparent conducting oxide) coating is commonly used for PVD-Physical Vapor Deposition coating, and the common one is plate (carrier) PVD coating. During the working process of the equipment, the random collision of ITO molecules in the chamber will cause the ITO molecules to sputter To the inner wall of the chamber, the carrier plate and other places, this part of the sputtered ITO is not completely collected, which will cause ITO waste; and when the ITO on the inner wall of the chamber accumulates to a certain thickness, it will drop slag, powder, etc., so the chamber The room needs to be cleaned regularly, adding extra downtime.

Contents of the invention

The purpose of the embodiments of the present application is to provide a processing method for components in a PVD chamber, a baffle and components, which aim to reduce the consumption of material sources during the PVD process.

The application provides a method for processing components in a PVD chamber, comprising:

Provide components with a surface roughness of 4.2-8.2 μm on the working surface;

forming a first coating with a surface roughness of 7.0-9.2 μm on the working surface;

forming a second coating with a surface roughness of 8.3-11.5 μm on the side of the first coating away from the working surface;

The surface roughness of the working surface is less than the surface roughness of the first coating, and the surface roughness of the first coating is less than the surface roughness of the second coating.

Prepare the surface structure on the working surface of the element by the above method, which can make the entire surface structure of the element more dense, and the subsequent material source (such as ITO) will not enter the interior of the element, which facilitates the subsequent recovery of the material source. At the same time, the surface structure element combines High strength, effectively reducing the influence of temperature and humidity changes in the use scene on the adhesion ability of the surface structure. In addition, the above-mentioned surface structure can also provide greater adhesion, provide adhesion for the material source, increase the recovery rate of the material source (such as ITO), reduce waste, and also increase the service life of the aforementioned components.

In some embodiments of the present application, a first raw material is used to form the first coating on the working surface, and the first raw material includes the following components in terms of mass percentage: 20% to 50% of the particle size 500-1000 μm quasi-spherical steel grit, 10%-30% cylindrical steel grit with a particle size of 500-1000 μm, and 10%-20% angular steel grit with a particle size of 400-800 μm.

In some embodiments of the present application, the process of forming the first coating is a thermal spraying process.

In some embodiments of the present application, the second coating is formed by using a second raw material and the side of the first coating away from the working surface, and the second raw material includes the following components in terms of mass percentage:

10% to 30% of spherical steel sand with a particle size of 200 μm to 500 μm, 10% to 40% of cylindrical steel sand with a particle size of 100 μm to 500 μm, and 10% to 40% of angular steel sand with a particle size of 100 μm to 500 μm shaped steel grit.

In some embodiments of the present application, the process for forming the second coating is a thermal spraying process.

In some embodiments of the present application, the element whose working surface has a surface roughness of 4.2-8.2 μm is manufactured through the following steps:

Particles with a diameter of 0.1 to 0.5 mm are used to perform bead peening on components with a surface roughness of 2.0 to 4.6 μm; the surface roughness of the components before bead peening is smaller than that of the working surface.

In some embodiments of the present application, the element with a surface roughness of 2.0-4.6 μm is manufactured through the following steps:

Particles with a diameter of 1.0 to 3.0 mm are used for bead peening on components with a surface-to-surface roughness of 0.8-1.2 μm.

In some embodiments of the present application, after forming the second coating, it further includes frosting the second coating, so that the roughness after frosting is 10-12 μm.

A baffle used in a PVD chamber, the surface of the baffle is obtained through the above-mentioned processing method for components in the PVD chamber.

The present application also provides an element used in a PVD chamber, at least one surface of the element used in the PVD chamber is processed by the above-mentioned processing method for the element in the PVD chamber.

Description of drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the accompanying drawings that are required in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present application, and thus It should be regarded as a limitation on the scope, and those skilled in the art can also obtain other related drawings based on these drawings without creative work.

Fig. 1 shows a main flowchart of a method for processing components in a PVD chamber provided by an embodiment of the present application.

Detailed ways

In order to make the purpose, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below. Those who do not indicate the specific conditions in the examples are carried out according to the conventional conditions or the conditions suggested by the manufacturer. The reagents or instruments used were not indicated by the manufacturer, and they were all conventional products that could be purchased from the market.

The processing method, baffles and components used in the PVD chamber according to the embodiments of the present application will be described in detail below.

Fig. 1 shows the main flowchart of the processing method for the components in the PVD chamber provided by the embodiment of the present application, please refer to Fig. 1, the present embodiment provides a processing method for the components in the PVD chamber, including:

Step S1: providing a component, the surface roughness of the working surface of the component is 4.2-8.2 μm.

In the embodiment of the present application, the aforementioned components are the carrier in the PVD chamber, and the shape and size of the carrier can be set according to the PVD equipment, which is not limited in the present application. It can be understood that, in other embodiments of the present application, the aforesaid components may also be components placed in detachable chambers such as baffles and dust covers in the PVD chamber.

The above "working surface" refers to the position where the material source will be sputtered during the operation of the PVD equipment; it can be understood that this application does not limit that the surface of the component other than the working surface cannot be used for subsequent operation processes; In other words, considering the specific manufacturing process and manufacturing cost, all surfaces of the element can be set to have a surface roughness of 4.2-8.2 μm, and all surfaces can be subjected to subsequent operating processes.

The surface roughness of the element is 4.2 μm to 8.2 μm, for example, it can be 4.2 μm, 4.3 μm, 4.4 μm, 4.5 μm, 5 μm, 5.2 μm, 5.8 μm, 6.2 μm, 6.5 μm, 7.4 μm, 7.6 μm, 8 μm, 8.2 μm and so on.

In the embodiments of the present application, an example is provided on the method of obtaining components with a surface roughness of 4.2 to 8.2 μm on the working surface, for example, using particles with a diameter of 0.1 to 0.5 mm for components with a surface roughness of 2.0 to 4.6 μm For bead peening, it should be noted that the surface roughness before bead peening is smaller than that of the working surface.

In other words, select components with a surface roughness of 2.0 μm to 4.6 μm, and perform bead peening on a surface with a surface roughness of 4.2 to 8.2 μm, using particles with a diameter of 0.1 to 0.5 mm.

"Pearl beating" refers to hitting the corresponding surface with particles, and the material of the particles can be steel.

For example, the diameter of the particles used in bead peening can be 0.1mm, 0.2mm, 0.3mm, 0.4mm, 0.5mm and so on.

For example, the surface roughness of the component can be 2.0 μm, 2.2 μm, 2.4 μm, 2.5 μm, 2.8 μm, 3 μm, 3.1 μm, 3.5 μm, 3.8 μm, 4 μm, 4.1 μm, 4.2 μm, 4.6 μm, etc.; it can be understood that the selected particles can be a single diameter, or a combination of particles with multiple diameters.

It should be noted that other methods can be used to obtain components with a working surface roughness of 4.2-8.2 μm, such as commercially available.

In the embodiments of this application, an example is provided for the method of obtaining components with a surface roughness of 2.0 μm to 4.6 μm, for example, using particles with a diameter of 1.0 to 3.0 mm to process components with a surface roughness of 0.8 to 1.2 μm beading.

A component with a surface roughness of 0.8-1.2 μm is used, and then bead peened with particles with a diameter of 1.0-3.0 mm to obtain a component with a surface roughness of 2.0-4.6 μm.

For example, the diameter of the particles used in bead peening can be 1.0mm, 1.2mm, 1.5mm, 1.8mm, 2.1mm, 2.3mm, 2.5mm, 2.8mm, 2.9mm, 3mm and so on. As above, the selected particles may be of a single diameter, or a combination of particles with multiple diameters.

The surface roughness of the component can be 0.8 μm, 0.9 μm, 1.0 μm, 1.1 μm, 1.2 μm, etc. before bead peening with particles with a diameter of 1.0-3.0 mm.

It should be noted that other methods can be used to obtain components with a surface roughness of 2.0 μm to 4.6 μm on the working surface, such as commercially available.

Step S2 is performed after obtaining the element whose working surface has a surface roughness of 4.2-8.2 μm.

Specifically, step S2 includes: forming a first coating with a surface roughness of 7.0-9.2 μm on the working surface.

For example, the surface roughness of the first coating may be 7.0 μm, 7.1 μm, 7.3 μm, 7.5 μm, 7.8 μm, 8.2 μm, 8.5 μm, 8.8 μm, 8.9 μm, 9.0 μm, 9.2 μm, and so on.

It should be noted that the surface roughness of each part of the first coating can be the same value, or the surface roughness of each part of the first coating can be different, and it can be within the range of 7.0-9.2 μm .

For example, in some embodiments of the present application, the first raw material is used to form the first coating on the working surface, wherein the first raw material includes the following components in terms of mass percentage: 20% to 50% of the particles have a particle size of 500 μm ～1000μm quasi-spherical steel grit, 10%～30% cylindrical steel grit with a particle size of 500μm～1000μm, and 10%～20% angular steel grit with a particle size of 400～800μm.

For example, in the first raw material, the particle size of the quasi-spherical steel sand can be 500 μm, 550 μm, 600 μm, 620 μm, 650 μm, 700 μm, 720 μm, 760 μm, 800 μm, 850 μm, 880 μm, 950 μm, 1000 μm, etc., in the first raw material , The quasi-spherical steel grit can be a single particle size, or a combination of various particle sizes within the range of 500 μm to 1000 μm.

The mass percentage of the quasi-spherical steel grit in the first raw material can be 20%, 22%, 25%, 30%, 34%, 38%, 43%, 48%, 49%, 50% and so on.

The particle size of cylindrical steel grit can be 500 μm, 550 μm, 600 μm, 620 μm, 650 μm, 700 μm, 720 μm, 760 μm, 800 μm, 850 μm, 880 μm, 950 μm, 1000 μm and so on. In the first raw material, the cylindrical steel grit may have a single particle size, or may be a combination of various particle sizes within the range of 500 μm to 1000 μm.

The mass percentage of cylindrical steel grit in the first raw material can be 10%, 12%, 15%, 16%, 19%, 20%, 23%, 26%, 29%, 30% and so on.

The particle size of angular steel grit can be 400 μm, 430 μm, 480 μm, 500 μm, 520 μm, 590 μm, 600 μm, 630 μm, 680 μm, 700 μm, 760 μm, 780 μm, 800 μm and so on. In the first raw material, the mass percentage of the angular steel grit in the first raw material can be 10%, 11%, 12%, 13%, 14%, 15%, 16%, 17%, 18%, 19%, 20% %etc.

In this embodiment, the first coating is formed by a thermal spraying process. It can be understood that in other embodiments of the application, other processes can be used; in addition, the first coating with a surface roughness of 7.0-9.2 μm A coating can also be formed without using the above-mentioned first raw material, and other raw materials can be selected.

It can be understood that, in some embodiments of the present application, the aforementioned first coating can only cover the working surface; A coating may cover the rest of the component in addition to the working surface.

Step S2 is performed after the first coating is prepared.

Specifically, step S2 includes: forming a second coating with a surface roughness of 8.3-11.5 μm on the side of the first coating away from the working surface.

Exemplarily, the surface roughness of the second coating may be 8.3 μm, 8.5 μm, 9 μm, 9.2 μm, 9.7 μm, 10 μm, 10.3 μm, 10.5 μm, 10.9 μm, 11 μm, 11.2 μm, 11.5 μm and so on.

It should be noted that the surface roughness of each part of the second coating may be a value, or the surface roughness of each part of the second coating may not be completely the same, and may be within the range of 8.3-11.5 μm.

As an example, the second coating can be prepared by the following method: using the second raw material and the side of the first coating away from the working surface to form the second coating, the second raw material includes the following components in terms of mass percentage: 10 %~30% of the spherical steel sand with a particle size of 200 μm to 500 μm, 10% to 40% of the cylindrical steel sand with a particle size of 100 μm to 500 μm, and 10% to 40% of the angular steel sand with a particle size of 100 μm to 500 μm steel grit.

For example, in the second raw material, the particle size of the quasi-spherical steel grit can be 200 μm, 220 μm, 260 μm, 290 μm, 300 μm, 360 μm, 400 μm, 420 μm, 460 μm, 480 μm, 500 μm, etc. The particle size of the quasi-spherical steel grit may be a single value, or may be a plurality of values in the range of 100 μm to 500 μm.

For example, the mass proportion of the quasi-spherical steel grit in the second raw material can be 10%, 12%, 15%, 18%, 20%, 22%, 25%, 28%, 30% and so on.

In the second raw material, the particle size of the cylindrical steel grit may be 100 μm, 160 μm, 200 μm, 240 μm, 300 μm, 340 μm, 400 μm, 450 μm, 500 μm or the like. The particle size of the cylindrical steel grit may be a single value, or may be a plurality of values in the range of 100 μm to 500 μm.

For example, the mass proportion of cylindrical steel grit in the second raw material can be 10%, 12%, 16%, 20%, 23%, 24%, 27%, 30%, 32%, 35%, 40%, etc. wait.

In the second raw material, the particle size of the angular steel grit may be 100 μm, 160 μm, 200 μm, 240 μm, 300 μm, 340 μm, 400 μm, 450 μm, 500 μm, or the like. The particle size of the angular steel grit may be a single value, or may be a plurality of values in the range of 100 μm to 500 μm.

For example, the mass proportion of angular steel sand in the second raw material can be 10%, 12%, 16%, 20%, 23%, 24%, 27%, 30%, 32%, 35%, 40%, etc. wait.

In some embodiments of the present application, the second coating is formed by thermal spraying. It can be understood that, in other embodiments of the present application, the second coating can also be formed by other processes; preparing the second coating The raw material of the layer is also not limited to the above-mentioned raw materials.

It should be noted that, in the present application, the surface roughness of the working surface is smaller than the surface roughness of the first coating, and the surface roughness of the first coating is smaller than the surface roughness of the second coating.

The processing method for the components in the PVD chamber provided by the embodiment of the present application has at least the following advantages:

By forming a first coating with a surface roughness of 7.0 to 9.2 μm on a working surface with a roughness of 4.2 to 8.2 μm, and then forming a second coating with a surface roughness of 8.3 to 11.5 μm on the surface of the first coating ; and the surface roughness of the working surface, the first coating and the second coating gradually increases, which can make the entire surface structure of the element more compact, and the subsequent material source will not enter the interior of the element, which is convenient for subsequent recycling. The combination strength of the structure and the components is high, which reduces the influence of temperature and humidity changes in the application scene on the adhesion ability of the surface structure. The above-mentioned surface layer structure can provide greater adhesion and provide adhesion for the material source.

For the embodiment of using the first raw material to prepare the first coating, and the second raw material to prepare the second coating, the steel grit of the first raw material and the second raw material can improve the adhesion ability of the material source and the surface layer structure of the element in the PVD chamber and contact area to avoid waste of material sources.

The present application also provides an element used in a PVD chamber, at least one surface of the element used in the PVD chamber is processed by the aforementioned processing method for the element in the PVD chamber.

Based on the above, the components used in the PVD chamber have the advantages of large surface roughness, large specific surface area, and good adsorption capacity, which can prolong the service life of the components in the PVD chamber. The service life of the PVD chamber can also be extended to 3.5 million cells.

The present application also provides a baffle used in the PVD chamber, the surface of the baffle is obtained through the aforementioned processing method for components in the PVD chamber.

This baffle has the advantages of the elements in the PVD chamber described above.

The characteristics and performance of the present application will be described in further detail below in conjunction with the examples.

Example 1

This embodiment provides a method for processing a baffle in a PVD chamber, which mainly includes the following steps:

a. Pretreatment: Carry out degreasing and decontamination treatment on the surface of the baffle to obtain a clean surface.

b. Sandblasting treatment: sandblasting treatment on the front surface of the cleaned baffle, mainly including two steps: ① smooth surface roughening: use large-diameter steel shots (the diameter of the steel shot is 1.5mm) to spray the surface of the baffle, Make the flat surface concave-convex; ②Continue to roughen the surface after concave-convex: use small-diameter steel shots (the diameter of the steel shot is 0.2mm) to spray on the surface of the baffle.

c, the surface thermal spraying treatment after sandblasting treatment prepares the first coating: the raw material of the first coating comprises the following components by weight percentage: 50% quasi-spherical steel sand (average particle diameter 800 μ m), 30% Cylindrical steel grit (average particle size 600 μm) and 20% angular steel grit (average particle size 400 μm).

D, the thermal spraying treatment on the surface of the first coating prepares the second coating: the raw material of the second coating comprises the following components by weight percentage: 50% spherical steel sand (average particle diameter at 350 μm), 30% Cylindrical steel grit (average particle size 250 μm) and 20% angular steel grit (average particle size 150 μm).

e. Coating frosting treatment: Finally, the coating surface of the baffle is frosted, and the final roughness is 10.2 μm.

Example 2

This embodiment provides a method for processing a baffle in a PVD chamber, which mainly includes the following steps:

a. Pretreatment: Carry out degreasing and decontamination treatment on the surface of the baffle to obtain a clean surface.

b. Sandblasting treatment: sandblasting treatment on the front surface of the cleaned baffle, mainly including two steps: ① smooth surface roughening: use large-diameter steel shots (the diameter of the steel shot is 2.0mm) to spray the surface of the baffle, Make the flat surface concave-convex; ② Continue to roughen the surface after concave-convex: use small-diameter steel shots (the diameter of the steel shot is 0.5mm) to spray on the surface of the baffle.

c, the surface thermal spraying treatment after sandblasting treatment prepares the first coating: the raw material of the first coating comprises the following components by weight percentage: 40% quasi-spherical steel sand (average particle diameter is 900 μ m), 35 % cylindrical steel grit (average particle size is 600 μm), 25% angular steel grit (average particle size is 300 μm).

D, the thermal spraying treatment of the first coating surface prepares the second coating: the raw material of the second coating comprises the following components by weight percentage: 40% spherical steel sand (average particle diameter is 500 μ m), 35% Cylindrical steel grit (average particle size is 300 μm) and 25% angular steel grit (average particle size is 100 μm).

e. Coating frosting treatment: Finally, frosting treatment is carried out on the coating surface of the baffle. The surface roughness of the carrier and baffle produced by the method can reach 11.0 μm.

Comparative example 1

This comparative example provides a method for processing the baffle in a PVD chamber, which mainly includes the following steps:

a. Pretreatment: Carry out degreasing and decontamination treatment on the surface of the baffle to obtain a clean surface.

b. Sandblasting treatment: sandblasting the cleaned front surface of the baffle, using steel shots with a diameter of 2.0mm to spray the surface of the baffle to make the flat surface concave-convex.

c. Preparation of coating by thermal spraying treatment on the surface after sandblasting: the raw material of the coating is spherical steel grit (average particle size is 600 μm).

e. Coating frosting treatment: Finally, frosting treatment is carried out on the coating surface of the baffle. The surface roughness of the carrier board and the baffle made by the method can reach 6.50 μm.

Comparative example 2

This comparative example provides a processing method for baffles in a PVD chamber. The difference between it and Example 1 is that there are differences in step c and step d for steel grit matching ratio and particle size in comparative example 2. The effect is to change the roughness of the surface of the carrier board; it mainly includes the following steps:

a. Pretreatment: Carry out degreasing and decontamination treatment on the surface of the baffle to obtain a clean surface.

b. Sandblasting treatment: sandblasting treatment on the front surface of the cleaned baffle, mainly including two steps: ① smooth surface roughening: use large-diameter steel shots (the diameter of the steel shot is 2.0mm) to spray the surface of the baffle, Make the flat surface concave-convex; ②Continue to roughen the surface after concave-convex: use small-diameter steel shots (the diameter of the steel shot is 0.5mm) to spray on the surface of the baffle.

c, prepare the first coating on the surface thermal spraying treatment after the blasting treatment: the raw material of the first coating comprises the following components by weight percentage: 80% quasi-spherical steel sand (average particle diameter is 1200 μ m), 10 % cylindrical steel grit (average particle size is 600 μm) and 10% angular steel grit (average particle size is 200 μm).

D, the thermal spraying treatment of the first coating surface prepares the second coating: the raw material of the second coating comprises the following components by weight percentage: 30% quasi-spherical steel sand (average particle diameter is 700 μ m), 35% Cylindrical steel grit (average particle size is 400 μm) and 35% angular steel grit (average particle size is 100 μm).

e. Coating frosting treatment: Finally, frosting treatment is carried out on the coating surface of the baffle. The surface roughness of the carrier and baffle produced by the method can reach 8.12 μm.

The baffles provided in Example 1, Comparative Example 1, and Comparative Example 2 are used in the PVD chamber, and the magnetron sputtering PVD is used for coating, and the ITO atoms can be bombarded by bombarding the ITO target with argon ions, and bombarded from the target. About 30% of the ITO raw material that comes down is deposited on the silicon wafer, and another about 70% is deposited on the carrier plate, baffle plate or other components inside the chamber. The baffle needs to absorb the ITO dust particles as much as possible to prevent the dust from randomly floating inside the chamber, which is not conducive to recycling. In the same production cycle (production of the same number of cells), the recovery rate of the carrier and baffle made by the two methods of the comparative example and the comparative example was measured.

The ITO powder recovered by the baffle of Example 1 is 35-40% of the ITO raw material bombarded on the target; the ITO powder recovered by the baffle of Comparative Example 1 is 22-25% of the ITO raw material bombarded off the target.

The ITO powder recovered by the baffle in Comparative Example 2 is 25-30% of the ITO raw material bombarded from the target. The service life of the baffle in Comparative Example 2 is about 900,000 cells.

The above descriptions are only preferred embodiments of the present application, and are not intended to limit the present application. For those skilled in the art, there may be various modifications and changes in the present application. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of this application shall be included within the protection scope of this application.

Claims (10)

1. A processing method for components in a PVD chamber, comprising: Provide components with a surface roughness of 4.2-8.2 μm on the working surface; forming a first coating with a surface roughness of 7.0-9.2 μm on the working surface; forming a second coating with a surface roughness of 8.3-11.5 μm on the side of the first coating away from the working surface; The surface roughness of the working surface is less than the surface roughness of the first coating, and the surface roughness of the first coating is less than the surface roughness of the second coating. 2. The processing method for components in a PVD chamber according to claim 1, wherein a first raw material is used to form the first coating on the working surface, and the first raw material includes The following components in percentage terms: 20% to 50% of spherical steel sand with a particle size of 500 μm to 1000 μm, 10% to 30% of cylindrical steel sand with a particle size of 500 μm to 1000 μm, and 10% to 20% of Angular steel sand with a diameter of 400-800 μm. 3. The method for processing components in a PVD chamber according to claim 1, wherein the process for forming the first coating is a thermal spraying process. 4. The processing method for components in a PVD chamber according to claim 1, characterized in that, The second coating is formed by using a second raw material and the side of the first coating away from the working surface, and the second raw material includes the following components in terms of mass percentage: 10% to 30% of spherical steel sand with a particle size of 200 μm to 500 μm, 10% to 40% of cylindrical steel sand with a particle size of 100 μm to 500 μm, and 10% to 40% of angular steel sand with a particle size of 100 μm to 500 μm shaped steel grit. 5. The method for processing components in a PVD chamber according to claim 1, wherein the process for forming the second coating is a thermal spraying process. 6. The method for processing components in a PVD chamber according to any one of claims 1-5, wherein the components whose surface roughness of the working surface is 4.2-8.2 μm are produced through the following steps: Particles with a diameter of 0.1 to 0.5 mm are used to perform bead peening on components with a surface roughness of 2.0 to 4.6 μm; the surface roughness of the components before bead peening is smaller than that of the working surface. 7. The method for processing components in a PVD chamber according to claim 6, wherein the components with a surface roughness of 2.0 to 4.6 μm are produced through the following steps: Particles with a diameter of 1.0 to 3.0 mm are used for bead peening on components with a surface-to-surface roughness of 0.8-1.2 μm. 8. The processing method for components in a PVD chamber according to any one of claims 1-5, characterized in that, after forming the second coating, it also includes frosting the second coating, so that the frosted The roughness is 10-12μm. 9. A baffle used in a PVD chamber, characterized in that, the surface of the baffle is obtained through the treatment method for components in a PVD chamber according to any one of claims 1-8. 10. An element used in a PVD chamber, characterized in that at least one surface of the element used in the PVD chamber adopts the treatment for the element in the PVD chamber according to any one of claims 1-8 method can be processed.

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