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CN116153867A - Chip package structure and manufacturing method thereof - Google Patents

Chip package structure and manufacturing method thereof Download PDF

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Publication number
CN116153867A
CN116153867A CN202111397744.8A CN202111397744A CN116153867A CN 116153867 A CN116153867 A CN 116153867A CN 202111397744 A CN202111397744 A CN 202111397744A CN 116153867 A CN116153867 A CN 116153867A
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chip
substrate
dielectric layer
electrically connected
layer
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曾子章
刘汉诚
林溥如
柯正达
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Unimicron Technology Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/13Mountings, e.g. non-detachable insulating substrates characterised by the shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5383Multilayer substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5386Geometry or layout of the interconnection structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of semiconductor or other solid state devices
    • H01L25/03Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10D89/00
    • H01L25/0652Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10D89/00 the devices being arranged next and on each other, i.e. mixed assemblies

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  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

本发明提供一种芯片封装结构极其制作方法,其中芯片封装结构包括基板、至少一第一芯片、黏着材料、重布线路结构以及多个第二芯片。基板具有第一表面、与第一表面相对的第二表面以及至少一凹槽。至少一第一芯片设置于凹槽中。黏着材料设置于至少一凹槽中,且位于基板与至少一第一芯片之间。重布线路结构设置于基板的第一表面上,且电性连接至至少一第一芯片。多个第二芯片设置于重布线路结构上,且电性连接至重布线路结构。本发明的芯片封装结构极其制作方法,具有可减薄整体厚度的技术效果或可有效地提升产品的良率。

Figure 202111397744

The invention provides a chip packaging structure and its manufacturing method, wherein the chip packaging structure includes a substrate, at least one first chip, an adhesive material, a redistribution circuit structure and a plurality of second chips. The substrate has a first surface, a second surface opposite to the first surface, and at least one groove. At least one first chip is disposed in the groove. The adhesive material is disposed in at least one groove and located between the substrate and at least one first chip. The redistribution circuit structure is disposed on the first surface of the substrate and is electrically connected to at least one first chip. A plurality of second chips are disposed on the redistribution circuit structure and electrically connected to the redistribution circuit structure. The chip packaging structure and the manufacturing method of the present invention have the technical effect of reducing the overall thickness or effectively improving the yield of products.

Figure 202111397744

Description

芯片封装结构及其制作方法Chip package structure and manufacturing method thereof

技术领域technical field

本发明涉及一种封装结构,尤其涉及一种芯片封装结构及其制作方法。The invention relates to a packaging structure, in particular to a chip packaging structure and a manufacturing method thereof.

背景技术Background technique

目前,在次毫米发光二极管(mini LED)面板或微型发光二极管(micro LED)面板中,通常会将次毫米发光二极管或微型发光二极管设置于印刷电路板(或IC载板)的正表面,并将已封装的驱动IC(driver IC)配置于印刷电路板(或IC载板)的背表面或侧面。如此一来,将使得面板整体的厚度增加。Currently, in submillimeter light-emitting diode (mini LED) panels or micro light-emitting diode (micro LED) panels, sub-millimeter light-emitting diodes or micro light-emitting diodes are usually arranged on the front surface of a printed circuit board (or IC substrate), and The packaged driver IC (driver IC) is disposed on the back surface or side of the printed circuit board (or IC carrier). In this way, the overall thickness of the panel will be increased.

此外,由于印刷电路板(或IC载板)常有翘曲以及铜面平坦度不佳的问题,因此会不利于微型发光二极管的巨量转移,且增加组装失败的可能性,进而影响成品的良率。In addition, since printed circuit boards (or IC substrates) often have problems of warpage and poor copper surface flatness, it is not conducive to the mass transfer of micro-LEDs, and increases the possibility of assembly failure, thereby affecting the quality of the finished product. yield.

发明内容Contents of the invention

本发明是针对一种线路基板结构及其制造方法,具有可减薄整体厚度的技术效果或可有效地提升产品的良率。The invention is aimed at a circuit substrate structure and a manufacturing method thereof, which has the technical effect of reducing the overall thickness or effectively improving the yield of products.

本发明的芯片封装结构包括基板、至少一第一芯片、黏着材料、重布线路结构以及多个第二芯片。基板具有第一表面、与第一表面相对的第二表面以及至少一凹槽。至少一第一芯片设置于凹槽中。黏着材料设置于至少一凹槽中,且位于基板与至少一第一芯片之间。重布线路结构设置于基板的第一表面上,且电性连接至至少一第一芯片。多个第二芯片设置于重布线路结构上,且电性连接至重布线路结构。The chip packaging structure of the present invention includes a substrate, at least one first chip, adhesive material, redistribution circuit structure and a plurality of second chips. The substrate has a first surface, a second surface opposite to the first surface, and at least one groove. At least one first chip is disposed in the groove. The adhesive material is disposed in at least one groove and located between the substrate and at least one first chip. The redistribution circuit structure is disposed on the first surface of the substrate and is electrically connected to at least one first chip. A plurality of second chips are disposed on the redistribution circuit structure and electrically connected to the redistribution circuit structure.

在本发明的一实施例中,上述的基板为玻璃基板或硅基板。In an embodiment of the present invention, the aforementioned substrate is a glass substrate or a silicon substrate.

在本发明的一实施例中,上述的至少一第一芯片为裸晶。In an embodiment of the present invention, the above-mentioned at least one first chip is a bare die.

在本发明的一实施例中,上述的多个第二芯片包括裸晶和/或封装芯片。In an embodiment of the present invention, the above-mentioned plurality of second chips include bare die and/or packaged chips.

在本发明的一实施例中,上述的重布线路结构包括第一介电层、第一图案化线路层、第一导通孔、第二介电层、第二图案化线路层以及第二导通孔。第一介电层设置于基板的第一表面上。第一图案化线路层设置于第一介电层上。第一导通孔贯穿第一介电层,且第一导通孔电性连接第一图案化线路层与至少一第一芯片。第二介电层设置于第一图案化线路层上。第二图案化线路层设置于第二介电层上。第二导通孔贯穿第二介电层,且第二导通孔电性连接第二图案化线路层与第一图案化线路层。In an embodiment of the present invention, the above-mentioned redistribution wiring structure includes a first dielectric layer, a first patterned wiring layer, a first via hole, a second dielectric layer, a second patterned wiring layer, and a second Via hole. The first dielectric layer is disposed on the first surface of the substrate. The first patterned circuit layer is disposed on the first dielectric layer. The first via hole penetrates the first dielectric layer, and the first via hole electrically connects the first patterned circuit layer and at least one first chip. The second dielectric layer is disposed on the first patterned circuit layer. The second patterned circuit layer is disposed on the second dielectric layer. The second via hole penetrates the second dielectric layer, and the second via hole electrically connects the second patterned circuit layer and the first patterned circuit layer.

在本发明的一实施例中,上述的至少一第一芯片的主动表面与基板的第一表面齐平。In an embodiment of the present invention, the active surface of the at least one first chip is flush with the first surface of the substrate.

在本发明的一实施例中,上述的芯片封装结构更包括连接件。连接件设置于重布线路结构上,其中多个第二芯片通过连接件电性连接至重布线路结构。In an embodiment of the present invention, the above-mentioned chip packaging structure further includes a connector. The connector is disposed on the redistribution wiring structure, wherein the plurality of second chips are electrically connected to the redistribution wiring structure through the connector.

在本发明的一实施例中,上述的连接件包括接触垫以及焊接点。接触垫可连接重布线路结构。焊接点设置于接触垫上,且焊接点可电性连接至接触垫。In an embodiment of the present invention, the above-mentioned connection element includes a contact pad and a welding point. The contact pads can be connected to the rerouting structure. The soldering point is disposed on the contact pad, and the soldering point can be electrically connected to the contact pad.

本发明的芯片封装结构的制作方法包括以下步骤:首先,提供基板,其中基板具有第一表面、与第一表面相对的第二表面以及至少一凹槽。接着,配置至少一第一芯片与黏着材料于至少一凹槽中,以使黏着材料位于基板与至少一第一芯片之间。接续,形成重布线路结构于基板的第一表面上,以电性连接至至少一第一芯片。而后,配置多个第二芯片于重布线路结构上,以电性连接至重布线路结构。The manufacturing method of the chip packaging structure of the present invention includes the following steps: firstly, a substrate is provided, wherein the substrate has a first surface, a second surface opposite to the first surface, and at least one groove. Next, disposing at least one first chip and adhesive material in at least one groove, so that the adhesive material is located between the substrate and the at least one first chip. Next, a redistribution circuit structure is formed on the first surface of the substrate to be electrically connected to at least one first chip. Then, a plurality of second chips are arranged on the redistribution circuit structure to be electrically connected to the redistribution circuit structure.

在本发明的一实施例中,上述形成重布线路结构于基板的第一表面上的方法包括以下步骤:首先,以平坦化制程形成第一介电层于基板的第一表面上。接着,形成第一图案化线路层于第一介电层上并形成第一导通孔于第一介电层中,其中第一导通孔贯穿第一介电层,且第一导通孔电性连接第一图案化线路层与至少一第一芯片。接续,形成第二介电层于第一图案化线路层上。而后,形成第二图案化线路层于第二介电层上并形成第二导通孔于第二介电层中,其中第二导通孔贯穿第二介电层,且电性连接第二图案化线路层与第一图案化线路层。In an embodiment of the present invention, the above-mentioned method for forming a redistribution wiring structure on the first surface of the substrate includes the following steps: firstly, a first dielectric layer is formed on the first surface of the substrate by a planarization process. Next, form a first patterned circuit layer on the first dielectric layer and form a first via hole in the first dielectric layer, wherein the first via hole penetrates the first dielectric layer, and the first via hole The first patterned circuit layer is electrically connected to at least one first chip. Next, a second dielectric layer is formed on the first patterned circuit layer. Then, a second patterned circuit layer is formed on the second dielectric layer and a second via hole is formed in the second dielectric layer, wherein the second via hole penetrates the second dielectric layer and is electrically connected to the second dielectric layer. The patterned circuit layer and the first patterned circuit layer.

在本发明的一实施例中,上述芯片封装结构的制作方法更包括以下步骤:形成连接件于重布线路结构上,以使多个第二芯片通过连接件电性连接至重布线路结构。In an embodiment of the present invention, the manufacturing method of the above-mentioned chip package structure further includes the following step: forming a connecting piece on the redistribution wiring structure, so that the plurality of second chips are electrically connected to the redistribution wiring structure through the connecting piece.

基于上述,在本发明一实施例的芯片封装结构中,借由将第一芯片内埋于基板中,因而使得整体的厚度得以减薄。再者,由于本实施例的第一芯片可内埋于基板且为裸晶,因此,可以避免因使用封装芯片而造成基板有翘曲的问题,也可以维持基板的刚性与平坦度,进而提升产品的良率。Based on the above, in the chip packaging structure according to an embodiment of the present invention, the overall thickness is reduced by embedding the first chip in the substrate. Furthermore, since the first chip of this embodiment can be embedded in the substrate and is a bare crystal, it can avoid the problem of warping of the substrate due to the use of packaged chips, and can also maintain the rigidity and flatness of the substrate, thereby improving Product yield.

为让本发明的上述特征和优点能更明显易懂,下文特举实施例,并配合附图作详细说明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail with reference to the accompanying drawings.

附图说明Description of drawings

图1是依照本发明一实施例的芯片封装结构的制作方法的流程图;1 is a flowchart of a method for manufacturing a chip package structure according to an embodiment of the present invention;

图2A至图2D是依照本发明一实施例的芯片封装结构的制作方法的剖面示意图。2A to 2D are schematic cross-sectional views of a manufacturing method of a chip packaging structure according to an embodiment of the present invention.

附图标记说明Explanation of reference signs

10:芯片封装结构;10: Chip packaging structure;

100:基板;100: Substrate;

102:第一表面;102: first surface;

104:第二表面;104: second surface;

106a、106b:凹槽;106a, 106b: grooves;

110a、110b:第一芯片;110a, 110b: the first chip;

112、162:主动表面;112, 162: active surface;

114:背表面;114: back surface;

116:周围表面;116: surrounding surface;

118、130:接垫;118, 130: pad;

120:黏着材料;120: adhesive material;

140:重布线路结构;140: Redistribute the line structure;

141:第一介电层;141: the first dielectric layer;

142:第一图案化线路层;142: the first patterned circuit layer;

143:第一导通孔;143: a first via hole;

144:第二介电层;144: second dielectric layer;

145:第二图案化线路层;145: the second patterned circuit layer;

146:第二导通孔;146: a second via hole;

150:连接件;150: connector;

152:接触垫;152: contact pad;

154:焊接点;154: welding point;

160a、160b、160c、160d:第二芯片;160a, 160b, 160c, 160d: second chips;

S1、S2、S3、S4:步骤。S1, S2, S3, S4: steps.

具体实施方式Detailed ways

现将详细地参考本发明的示范性实施例,示范性实施例的实例说明于附图中。只要有可能,相同组件符号在附图和描述中用来表示相同或相似部分。Reference will now be made in detail to the exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers will be used in the drawings and description to refer to the same or like parts.

图1是依照本发明一实施例的芯片封装结构的制作方法的流程图。图2A至图2D是依照本发明一实施例的芯片封装结构的制作方法的剖面示意图。FIG. 1 is a flowchart of a manufacturing method of a chip packaging structure according to an embodiment of the present invention. 2A to 2D are schematic cross-sectional views of a manufacturing method of a chip packaging structure according to an embodiment of the present invention.

本实施例的芯片封装结构10的制作方法可包括以下步骤:The manufacturing method of the chip packaging structure 10 of this embodiment may include the following steps:

首先,请同时参照图1与图2A,执行步骤S1:提供基板100。基板100具有第一表面102、与第一表面102相对的第二表面104以及至少一凹槽106a、106b(图2A中示例性地示出两个凹槽,但并不以此为限,也就是说凹槽的数量可视需求而调整)。在本实施例中,由于基板100可以为刚性基板,且基板100的第一表面102可具有极优异的平整度(flatness),因而有助于在后续制程中制作细线路(fine line)。此处,基板100可例如是玻璃基板、陶瓷基板、硅基板或其他适合的基板,但并不以此为限。First, please refer to FIG. 1 and FIG. 2A at the same time, and perform step S1: providing the substrate 100 . The substrate 100 has a first surface 102, a second surface 104 opposite to the first surface 102, and at least one groove 106a, 106b (two grooves are exemplarily shown in FIG. That is to say, the number of grooves can be adjusted according to requirements). In this embodiment, since the substrate 100 can be a rigid substrate, and the first surface 102 of the substrate 100 can have excellent flatness, it is helpful to fabricate fine lines in subsequent processes. Here, the substrate 100 may be, for example, a glass substrate, a ceramic substrate, a silicon substrate or other suitable substrates, but is not limited thereto.

在本实施例中,凹槽106a、106b由基板100的第一表面102向第二表面104的方向凹陷,且凹槽106a、106b不贯穿基板100。以剖面图观之,凹槽106a、106b可以是ㄩ型开口,但不以此为限。在本实施例中,凹槽106a、106b可例如是以湿式蚀刻(wet etching)的方式或其他合适的制程所形成。In this embodiment, the grooves 106 a , 106 b are recessed from the first surface 102 of the substrate 100 toward the second surface 104 , and the grooves 106 a , 106 b do not penetrate through the substrate 100 . Viewed from the cross-sectional view, the grooves 106a, 106b may be ㄩ-shaped openings, but not limited thereto. In this embodiment, the grooves 106a, 106b may be formed by, for example, wet etching or other suitable processes.

接着,请同时参照图1与图2B,执行步骤S2:配置至少一第一芯片110a、110b与黏着材料120于至少一凹槽106a、106b中,以使黏着材料120位于基板100与至少一第一芯片110a、110b之间。在本实施例中,每个第一芯片110a、110b可对应设置于每个凹槽106a、106b中。举例来说,如图2B所示,第一芯片110a可设置于凹槽106a中,且第一芯片110b可设置于凹槽106b中。第一芯片110a、110b具有主动表面112、与主动表面112相对的背表面114以及连接主动表面112与背表面114的周围表面116。主动表面112面向且邻近于第一表面102。在本实施例中,第一芯片110a、110b的主动表面112可与基板100的第一表面102齐平,但不以此为限。第一芯片110a、110b可以为裸晶,且第一芯片110a与第一芯片110b的功能可以相同或不同。举例来说,在本实施例中,第一芯片110a与第一芯片110b可例如是源极驱动IC(Source Drive IC)、栅极驱动IC(Gate Driver IC)或具有其他功能的芯片。在其他实施例中,第一芯片110a可例如是被动组件,且第一芯片110b可例如是表面贴装组件(SMD),本发明对此并不加以限制。Next, please refer to FIG. 1 and FIG. 2B at the same time, perform step S2: dispose at least one first chip 110a, 110b and the adhesive material 120 in at least one groove 106a, 106b, so that the adhesive material 120 is located between the substrate 100 and the at least one first chip Between a chip 110a, 110b. In this embodiment, each first chip 110a, 110b can be correspondingly disposed in each groove 106a, 106b. For example, as shown in FIG. 2B , the first chip 110a may be disposed in the groove 106a, and the first chip 110b may be disposed in the groove 106b. The first chip 110 a , 110 b has an active surface 112 , a back surface 114 opposite to the active surface 112 , and a surrounding surface 116 connecting the active surface 112 and the back surface 114 . The active surface 112 faces and is adjacent to the first surface 102 . In this embodiment, the active surface 112 of the first chip 110a, 110b may be flush with the first surface 102 of the substrate 100, but not limited thereto. The first chips 110a and 110b may be bare dies, and the functions of the first chip 110a and the first chip 110b may be the same or different. For example, in this embodiment, the first chip 110 a and the first chip 110 b may be, for example, a source driver IC (Source Drive IC), a gate driver IC (Gate Driver IC) or chips with other functions. In other embodiments, the first chip 110a may be, for example, a passive device, and the first chip 110b may be, for example, a surface mount device (SMD), which is not limited in the present invention.

黏着材料120可设置于基板100与第一芯片110a、110b的底表面114之间的间隙,且可设置于基板100与第一芯片110a、110b的周围表面116之间的间隙,也就是说,黏着材料120可覆盖第一芯片110a、110b的底表面112与周围表面116,借此可助于将第一芯片110a、110b固定于凹槽106a、106b中。在本实施例中,将第一芯片110a、110b置于凹槽106a、106b中的方法可例如是先将黏着材料120填入凹槽106a、106b中,接着再放入第一芯片110a、110b。黏着材料120可例如是树脂(resin)、环氧树脂(epoxy)或其他合适的材料,但并不以此为限。The adhesive material 120 may be disposed in the gap between the substrate 100 and the bottom surface 114 of the first chip 110a, 110b, and may be disposed in the gap between the substrate 100 and the surrounding surface 116 of the first chip 110a, 110b, that is, The adhesive material 120 can cover the bottom surface 112 and the surrounding surface 116 of the first chips 110a, 110b, thereby helping to fix the first chips 110a, 110b in the grooves 106a, 106b. In this embodiment, the method of placing the first chips 110a, 110b in the grooves 106a, 106b may be, for example, first filling the adhesive material 120 into the grooves 106a, 106b, and then placing the first chips 110a, 110b . The adhesive material 120 can be, for example, resin, epoxy or other suitable materials, but is not limited thereto.

在本实施例中,借由将第一芯片110a、110b内埋于基板100中,因而使得本实施例的芯片封装结构10(如图2D所示)的整体厚度得以减薄。再者,相较于一般的芯片封装结构将具有异质材料(即,非内埋式的芯片封装结构的封装胶体)的封装芯片设置在基板上而造成基板的翘曲,由于本实施例的芯片封装结构10中的第一芯片110a、110b可内埋于基板100且为裸晶(即,不是封装芯片),因而可以避免因使用异质材料而造成基板100有翘曲的问题,也可以维持基板100的刚性与平坦度,进而提升产品的良率。此外,由于基板100具有刚性与优异的平坦度,因而也可以有效地减少基板100发生翘曲的问题。In this embodiment, by embedding the first chips 110 a and 110 b in the substrate 100 , the overall thickness of the chip packaging structure 10 (as shown in FIG. 2D ) in this embodiment is reduced. Furthermore, compared to the general chip packaging structure, the packaging chip with heterogeneous materials (ie, the encapsulation compound of the non-embedded chip packaging structure) is placed on the substrate to cause warpage of the substrate, due to the present embodiment The first chips 110a, 110b in the chip packaging structure 10 can be embedded in the substrate 100 and are bare crystals (that is, not packaged chips), so that the problem of warpage of the substrate 100 caused by the use of heterogeneous materials can be avoided, and the substrate 100 can also be warped. The rigidity and flatness of the substrate 100 are maintained, thereby improving the yield of products. In addition, since the substrate 100 has rigidity and excellent flatness, the problem of warpage of the substrate 100 can also be effectively reduced.

接着,请同时参照图1与图2C,执行步骤S3:形成重布线路结构140于基板100的第一表面102上,以电性连接至至少一第一芯片110a、110b。在本实施例中,形成重布线路结构140于基板100的第一表面102上的步骤可例如是包括但不限于以下步骤:Next, referring to FIG. 1 and FIG. 2C , step S3 is performed: forming a redistribution wiring structure 140 on the first surface 102 of the substrate 100 to be electrically connected to at least one first chip 110a, 110b. In this embodiment, the step of forming the redistribution wiring structure 140 on the first surface 102 of the substrate 100 may include but not limited to the following steps:

首先,形成接垫118在第一芯片110a、110b的主动表面112上,并同时形成接垫130在基板100的第一表面102上,其中,接电118与接垫130可视为图案化线路层。接着,以平坦化制程(例如是压合制程)形成第一介电层141于基板100的第一表面102上,以覆盖基板100的第一表面102与第一芯片110a、110b的主动表面112。在本实施例中,第一介电层141可视为是平坦层。举例来说,在一些实施例中,当黏着材料120未填满基板100与第一芯片110a、110b之间的空隙时,则可利用第一介电层141来将所述空隙填满并提供一平整化的表面,以助于后续形成图案化线路层142。第一介电层141的材料可例如是具有整平效果的介电材料,例如是味之素(Ajinomoto Build-up Film,ABF)、聚亚酰胺(Polyimide)或其他合适的材料,但不以此为限。本实施例的第一介电层141的厚度可例如是10微米至40微米之间,但不以此为限。具体来说,第一介电层141的厚度需与图案化线路层(即接垫118、130)的厚度互相搭配。此处,本实施例的接垫118、130的厚度可例如是4微米至8微米之间,因此当第一介电层141的厚度小于10微米时,制作难度高且与高频阻抗匹配设计的弹性较小。再者,由于第一介电材料的热膨胀系数(coefficient of thermal expansion,CTE)较大,因此当第一介电层141的厚度大于40微米时,容易造成整个结构的翘曲增加。Firstly, the pads 118 are formed on the active surface 112 of the first chip 110a, 110b, and the pads 130 are formed on the first surface 102 of the substrate 100 at the same time, wherein the connection pads 118 and the pads 130 can be regarded as patterned lines layer. Next, a first dielectric layer 141 is formed on the first surface 102 of the substrate 100 by a planarization process (such as a bonding process) to cover the first surface 102 of the substrate 100 and the active surfaces 112 of the first chips 110a, 110b . In this embodiment, the first dielectric layer 141 can be regarded as a planar layer. For example, in some embodiments, when the adhesive material 120 does not fill the gap between the substrate 100 and the first chips 110a, 110b, the first dielectric layer 141 can be used to fill the gap and provide A planarized surface facilitates subsequent formation of the patterned circuit layer 142 . The material of the first dielectric layer 141 can be, for example, a dielectric material with a leveling effect, such as Ajinomoto Build-up Film (ABF), polyimide (Polyimide) or other suitable materials, but not This is the limit. The thickness of the first dielectric layer 141 in this embodiment may be, for example, between 10 microns and 40 microns, but is not limited thereto. Specifically, the thickness of the first dielectric layer 141 needs to match the thickness of the patterned circuit layer (ie, the pads 118 , 130 ). Here, the thickness of the pads 118, 130 in this embodiment can be, for example, between 4 microns and 8 microns. Therefore, when the thickness of the first dielectric layer 141 is less than 10 microns, the manufacturing difficulty is high and the high-frequency impedance matching design less elastic. Furthermore, since the coefficient of thermal expansion (CTE) of the first dielectric material is large, when the thickness of the first dielectric layer 141 is greater than 40 microns, the warpage of the entire structure is likely to increase.

接着,形成第一图案化线路层142于第一介电层141上并形成第一导通孔143于第一介电层141中。具体来说,第一导通孔143可贯穿第一介电层141,以电性连接第一图案化线路层142与第一芯片110a、110b的接垫118。此处,第一图案化线路层142与第一导通孔143的材料可例如是铜或其他导电材料。Next, a first patterned circuit layer 142 is formed on the first dielectric layer 141 and a first via hole 143 is formed in the first dielectric layer 141 . Specifically, the first via hole 143 can penetrate through the first dielectric layer 141 to electrically connect the first patterned circuit layer 142 and the pads 118 of the first chip 110a, 110b. Here, the material of the first patterned circuit layer 142 and the first via hole 143 can be, for example, copper or other conductive materials.

接着,形成第二介电层144于第一图案化线路层142上。其中,第二介电层144可例如是以压合制程、液态涂布制程或其他合适制程形成于第一图案化线路层142上,以覆盖第一介电层141、第一图案化线路层142以及第一导通孔143。在本实施例中,第二介电层144的材料可例如是感旋光性介电材料、非感旋光性介电材料或其他合适的材料。此外,第二介电层144的材料也可与第一介电层141的材料为相同或不同,本发明对此并不加以限制。本实施例的第一线路层的厚度可例如是2微米至6微米之间,且第二介电层144的厚度可例如是小于10微米,但不以此为限。当第二介电层144的厚度小于10微米时,可使整体厚度较薄,具有较低的残余应力(stress),进而可降低翘曲发生。Next, a second dielectric layer 144 is formed on the first patterned circuit layer 142 . Wherein, the second dielectric layer 144 can be formed on the first patterned circuit layer 142 by, for example, a lamination process, a liquid coating process or other suitable processes, so as to cover the first dielectric layer 141, the first patterned circuit layer 142 and the first via hole 143. In this embodiment, the material of the second dielectric layer 144 can be, for example, a photosensitive dielectric material, a non-photosensitive dielectric material, or other suitable materials. In addition, the material of the second dielectric layer 144 can also be the same as or different from that of the first dielectric layer 141 , which is not limited in the present invention. The thickness of the first wiring layer in this embodiment may be, for example, between 2 microns and 6 microns, and the thickness of the second dielectric layer 144 may be, for example, less than 10 microns, but not limited thereto. When the thickness of the second dielectric layer 144 is less than 10 micrometers, the overall thickness can be made thinner and have lower residual stress, thereby reducing warpage.

接着,形成第二图案化线路层145于第二介电层144上并形成第二导通孔146于第二介电层144中。其中,第二导通孔146贯穿第二介电层144,且电性连接第二图案化线路层145与第一图案化线路层142。至此,已制作完成本实施例的重布线路结构140。Next, a second patterned circuit layer 145 is formed on the second dielectric layer 144 and a second via hole 146 is formed in the second dielectric layer 144 . Wherein, the second via hole 146 penetrates through the second dielectric layer 144 and electrically connects the second patterned circuit layer 145 and the first patterned circuit layer 142 . So far, the redistribution circuit structure 140 of this embodiment has been fabricated.

在本实施例中,重布线路结构140示例地示出为两层的介电层(第一介电层141、第二介电层144)以及三层的图案化线路层(图案化线路层、第一图案化线路层142、第二图案化线路层145)的交互叠层结构,但本发明并不以此为限。在一些实施例中,所属技术领域中具通常知识者可依实际需求来增加重布线路结构140的叠层的数量。In this embodiment, the redistributed circuit structure 140 is exemplarily shown as a two-layer dielectric layer (first dielectric layer 141, second dielectric layer 144) and a three-layer patterned circuit layer (patterned circuit layer , the first patterned circuit layer 142, and the second patterned circuit layer 145), but the present invention is not limited thereto. In some embodiments, those skilled in the art can increase the number of stacked layers of the redistribution wiring structure 140 according to actual needs.

此外,在本实施例中,由于基板100具有刚性与优异的平坦度,因而使得设置在基板100上的重布线路结构140中的各线路(即第一图案化线路层142、第二图案化线路层145、第一导通孔143、第二导通孔146)可为细线路(fine line)。In addition, in this embodiment, since the substrate 100 has rigidity and excellent flatness, each circuit in the redistributed circuit structure 140 disposed on the substrate 100 (that is, the first patterned circuit layer 142, the second patterned circuit layer 142 The circuit layer 145 , the first via hole 143 , and the second via hole 146 ) can be fine lines.

接着,请同时参照图1与图2D,执行步骤S4:配置多个第二芯片160a、160b、160c、160d于重布线路结构140上,以电性连接至重布线路结构140。在本实施例中,配置第二芯片160a、160b、160c、160d于重布线路结构140上的步骤可例如是包括但不限于以下步骤:Next, please refer to FIG. 1 and FIG. 2D at the same time, and perform step S4: disposing a plurality of second chips 160a, 160b, 160c, 160d on the redistribution circuit structure 140 to be electrically connected to the redistribution circuit structure 140 . In this embodiment, the step of configuring the second chip 160a, 160b, 160c, 160d on the redistribution circuit structure 140 may include but not limited to the following steps:

首先,形成连接件150于重布线路结构140上。在本实施例中,连接件150可包括接触垫(contact pad)152以及焊接点(solder joint)154,但并不以此为限。在其他实施例中,连接件150可例如是导电柱(未示出)或其他合适的导电连接符(未示出)。具体来说,如图2D所示,本实施例的接触垫152可连接至重布线路结构140中的第二图案化线路层145,焊接点154可设置于接触垫152上,且焊接点154可电性连接至接触垫152。此处,接触垫152的材料可例如是铜或其他合适的金属导电材料,且焊接点154的材料可例如是锡、银、铜、金或其合金或其他合适的金属导电材料,但并不以此为限。Firstly, the connecting element 150 is formed on the redistribution wiring structure 140 . In this embodiment, the connector 150 may include a contact pad 152 and a solder joint 154 , but it is not limited thereto. In other embodiments, the connector 150 may be, for example, a conductive post (not shown) or other suitable conductive connectors (not shown). Specifically, as shown in FIG. 2D, the contact pad 152 of this embodiment can be connected to the second patterned circuit layer 145 in the redistribution circuit structure 140, the soldering point 154 can be arranged on the contact pad 152, and the soldering point 154 It can be electrically connected to the contact pad 152 . Here, the material of the contact pad 152 can be, for example, copper or other suitable metal conductive materials, and the material of the solder joint 154 can be, for example, tin, silver, copper, gold or their alloys or other suitable metal conductive materials, but not This is the limit.

接着,配置多个第二芯片160a、160b、160c、160d于连接件150上,以使多个第二芯片160a、160b、160c、160d可通过连接件150电性连接至重布线路结构140。至此,已制作完成本实施例的芯片封装结构10。Next, a plurality of second chips 160 a , 160 b , 160 c , 160 d are disposed on the connector 150 , so that the plurality of second chips 160 a , 160 b , 160 c , 160 d can be electrically connected to the redistribution wiring structure 140 through the connector 150 . So far, the chip packaging structure 10 of this embodiment has been fabricated.

在本实施例中,第二芯片160a、160b、160c、160d的主动表面162朝向连接件150,且电性连接至对应的连接件150。第二芯片160a、160b、160c、160d可以为裸晶和/或封装芯片,本发明并不以此为限。此外,第二芯片160a、第二芯片160b、第二芯片160c以及第二芯片160d的功能可以相同或不同。举例来说,在本实施例中,第二芯片160a、160b、160c、160d可例如是微型发光二极管可例如是表面安装组件(Surface Mount Device,SMD)、内存组件或具有其他功能的芯片本发明对此并不加以限制。In this embodiment, the active surfaces 162 of the second chips 160 a , 160 b , 160 c , 160 d face the connectors 150 and are electrically connected to the corresponding connectors 150 . The second chip 160a, 160b, 160c, 160d may be a bare die and/or a packaged chip, and the present invention is not limited thereto. In addition, the functions of the second chip 160a, the second chip 160b, the second chip 160c, and the second chip 160d may be the same or different. For example, in this embodiment, the second chips 160a, 160b, 160c, and 160d may be, for example, miniature light-emitting diodes, or may be, for example, surface mount devices (Surface Mount Device, SMD), memory components, or chips with other functions. This is not limited.

简言之,本实施例的芯片封装结构10包括基板100、至少一第一芯片110a、110b、黏着材料120、重布线路结构140以及多个第二芯片160a、160b、160c、160d。基板100具有第一表面102、与第一表面102相对的第二表面104以及至少一凹槽106a、106b。至少一第一芯片110a、110b设置于凹槽106a、106b中。黏着材料120设置于至少一凹槽106a、106b中,且位于基板100与至少一第一芯片110a、110b之间。重布线路结构140设置于基板100的第一表面102上,且电性连接至至少一第一芯片110a、110b。多个第二芯片160a、160b、160c、160d设置于重布线路结构140上,且电性连接至重布线路结构140。In short, the chip packaging structure 10 of the present embodiment includes a substrate 100 , at least one first chip 110a, 110b, an adhesive material 120, a redistribution wiring structure 140, and a plurality of second chips 160a, 160b, 160c, 160d. The substrate 100 has a first surface 102, a second surface 104 opposite to the first surface 102, and at least one groove 106a, 106b. At least one first chip 110a, 110b is disposed in the groove 106a, 106b. The adhesive material 120 is disposed in at least one groove 106a, 106b, and is located between the substrate 100 and at least one first chip 110a, 110b. The redistribution wiring structure 140 is disposed on the first surface 102 of the substrate 100 and is electrically connected to at least one first chip 110a, 110b. A plurality of second chips 160 a , 160 b , 160 c , 160 d are disposed on the redistribution wiring structure 140 and are electrically connected to the redistribution wiring structure 140 .

综上所述,在本发明一实施例的芯片封装结构中,借由将第一芯片内埋于基板中,因而使得本实施例的芯片封装结构的整体厚度得以减薄。再者,相较于一般的芯片封装结构将具有异质材料的封装芯片设置在基板上而造成基板的翘曲,由于本实施例的第一芯片可内埋于基板且为裸晶,因此,可以避免因使用异质材料而造成基板有翘曲的问题,也可以维持基板的刚性与平坦度,因而可有效地降低因基板翘曲所造成的组装失败的可能性,进而可提升产品的良率。To sum up, in the chip packaging structure of an embodiment of the present invention, the overall thickness of the chip packaging structure of this embodiment is reduced by embedding the first chip in the substrate. Furthermore, compared to the general chip packaging structure where the packaged chip with heterogeneous materials is placed on the substrate and causes the substrate to warp, since the first chip of this embodiment can be embedded in the substrate and is a bare crystal, therefore, It can avoid the problem of substrate warpage caused by the use of heterogeneous materials, and can also maintain the rigidity and flatness of the substrate, thus effectively reducing the possibility of assembly failure caused by substrate warpage, thereby improving product quality. Rate.

最后应说明的是:以上各实施例仅用以说明本发明的技术方案,而非对其限制;尽管参照前述各实施例对本发明进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分或者全部技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本发明各实施例技术方案的范围。Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present invention, rather than limiting them; although the present invention has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that: It is still possible to modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements for some or all of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the technical solutions of the various embodiments of the present invention. scope.

Claims (12)

1. A chip package structure, comprising:
a substrate having a first surface, a second surface opposite to the first surface, and at least one groove;
at least one first chip arranged in the at least one groove;
the adhesive material is arranged in the at least one groove and is positioned between the substrate and the at least one first chip;
the redistribution circuit structure is arranged on the first surface of the substrate and is electrically connected to the at least one first chip; and
the second chips are arranged on the rerouting circuit structure and are electrically connected to the rerouting circuit structure.
2. The chip package structure according to claim 1, wherein the substrate is a glass substrate or a silicon substrate.
3. The chip package structure of claim 1, wherein the at least one first chip is a die.
4. The chip packaging structure according to claim 1, wherein the plurality of second chips comprises bare dies and/or packaged chips.
5. The chip package structure of claim 1, wherein the rerouting circuit structure comprises:
a first dielectric layer disposed on the first surface of the substrate;
the first patterning circuit layer is arranged on the first dielectric layer;
the first via hole penetrates through the first dielectric layer and is electrically connected with the first patterned circuit layer and the at least one first chip;
the second dielectric layer is arranged on the first patterned circuit layer;
the second patterning circuit layer is arranged on the second dielectric layer; and
the second via hole penetrates through the second dielectric layer and is electrically connected with the second patterned circuit layer and the first patterned circuit layer.
6. The chip package structure of claim 1, wherein the at least one first chip has an active surface, a back surface opposite to the active surface, and a pad disposed on the active surface, and the at least one first chip is electrically connected to the redistribution circuit structure through the pad.
7. The chip package structure of claim 6, wherein the active surface of the at least one first chip is flush with the first surface of the substrate.
8. The chip package structure according to claim 1, further comprising:
the connecting piece is arranged on the rerouting circuit structure, and the plurality of second chips are electrically connected to the rerouting circuit structure through the connecting piece.
9. The chip package structure of claim 8, wherein the connection member comprises:
a contact pad connecting the rerouting circuit structure; and
and the welding point is arranged on the contact pad and is electrically connected to the contact pad.
10. The manufacturing method of the chip packaging structure is characterized by comprising the following steps:
providing a substrate, wherein the substrate is provided with a first surface, a second surface opposite to the first surface and at least one groove;
disposing at least one first chip and an adhesive material in the at least one recess such that the adhesive material is located between the substrate and the at least one first chip;
forming a redistribution circuit structure on the first surface of the substrate to be electrically connected to the at least one first chip; and
and configuring a plurality of second chips on the rerouting circuit structure to be electrically connected to the rerouting circuit structure.
11. The method of claim 10, wherein forming the redistribution structure on the first surface of the substrate comprises:
forming a first dielectric layer on the first surface of the substrate by a planarization process;
forming a first patterned circuit layer on the first dielectric layer and forming a first via hole in the first dielectric layer, wherein the first via hole penetrates through the first dielectric layer and is electrically connected with the first patterned circuit layer and the at least one first chip;
forming a second dielectric layer on the first patterned circuit layer; and
forming a second patterned circuit layer on the second dielectric layer and forming a second via hole in the second dielectric layer, wherein the second via hole penetrates through the second dielectric layer and is electrically connected with the second patterned circuit layer and the first patterned circuit layer.
12. The method of manufacturing a chip package structure according to claim 10, further comprising:
and forming a connecting piece on the rerouting circuit structure so that the plurality of second chips are electrically connected to the rerouting circuit structure through the connecting piece.
CN202111397744.8A 2021-11-19 2021-11-19 Chip package structure and manufacturing method thereof Pending CN116153867A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202111397744.8A CN116153867A (en) 2021-11-19 2021-11-19 Chip package structure and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202111397744.8A CN116153867A (en) 2021-11-19 2021-11-19 Chip package structure and manufacturing method thereof

Publications (1)

Publication Number Publication Date
CN116153867A true CN116153867A (en) 2023-05-23

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202111397744.8A Pending CN116153867A (en) 2021-11-19 2021-11-19 Chip package structure and manufacturing method thereof

Country Status (1)

Country Link
CN (1) CN116153867A (en)

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