CN116043193A - Vapor deposition furnace - Google Patents
Vapor deposition furnace Download PDFInfo
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- CN116043193A CN116043193A CN202211555620.2A CN202211555620A CN116043193A CN 116043193 A CN116043193 A CN 116043193A CN 202211555620 A CN202211555620 A CN 202211555620A CN 116043193 A CN116043193 A CN 116043193A
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- 238000007740 vapor deposition Methods 0.000 title claims abstract description 25
- 238000010438 heat treatment Methods 0.000 claims abstract description 36
- 230000005855 radiation Effects 0.000 claims abstract description 28
- 239000000463 material Substances 0.000 claims abstract description 26
- 230000002093 peripheral effect Effects 0.000 claims abstract description 11
- 238000004321 preservation Methods 0.000 claims abstract description 10
- 239000002131 composite material Substances 0.000 claims description 35
- 229920000049 Carbon (fiber) Polymers 0.000 claims description 28
- 239000004917 carbon fiber Substances 0.000 claims description 28
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 27
- 239000000498 cooling water Substances 0.000 claims description 8
- 239000000835 fiber Substances 0.000 claims description 7
- 239000000919 ceramic Substances 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000003032 molecular docking Methods 0.000 claims 2
- 230000000694 effects Effects 0.000 abstract description 8
- 230000008021 deposition Effects 0.000 abstract description 7
- 239000010410 layer Substances 0.000 description 50
- 238000009413 insulation Methods 0.000 description 24
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000000151 deposition Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 210000001503 joint Anatomy 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Muffle Furnaces And Rotary Kilns (AREA)
Abstract
The present invention provides a vapor deposition furnace comprising: the device comprises a furnace body, wherein a furnace bottom plate is arranged at the bottom of the furnace body, a plurality of material columns used for fixing products are arranged on the furnace bottom plate, and air inlets are formed in the material columns; the air inlet box is arranged at the lower end of the furnace body and communicated with all the material columns so as to realize air inlet of the air inlet hole of each material column; the bottom heating device is arranged corresponding to the air inlet box and is used for heating the air inlet box; the inner container is arranged in the furnace body, and the lower end of the inner container is coated with all the material columns; the heat preservation layer is arranged on the inner wall of the furnace body; the peripheral heating device is arranged on the inner side of the heat preservation layer and is higher than the inner container; and the top radiation device is arranged at the top of the furnace body and is provided with a heat radiation surface towards the inner container. The invention can ensure relatively uniform temperature, thereby avoiding the influence of overhigh temperature in the middle area on the deposition effect, and simultaneously ensuring the film quality of the bottom product and the top product.
Description
Technical Field
The invention belongs to the technical field of film preparation equipment, and particularly relates to a vapor deposition furnace.
Background
The vapor deposition furnace is a product of time development progress and is used for producing and preparing composite materials and the like, and is a technology for forming solid deposits by chemical reaction of chemical substances in a gaseous state or a vapor state on a gas-phase or gas-solid interface in a reactor by utilizing various energy sources such as heating, plasma excitation or light radiation in a chemical reaction mode. In a simple way, it is: two or more gaseous starting materials are introduced into a reaction chamber and then they chemically react with each other to form a new material which is deposited on the substrate surface. In contrast to CVD and PVD, the deposition process involves a chemical reaction, which is a vapor phase chemical growth process. The chemical vapor deposition furnace adopts a structural form of bottom air inlet, top air exhaust and peripheral side heating, which can lead to the temperature of the middle area to be higher than that of the top and bottom and influence the deposition effect. And the bottom position deposition thickness is poor due to bottom air intake.
Disclosure of Invention
The present invention aims to solve at least one of the above technical problems in the prior art. Therefore, the invention provides the vapor deposition furnace, which ensures relatively uniform temperature by correspondingly improving the top and the bottom of the furnace body, thereby avoiding the influence of overhigh temperature in the middle area on the deposition effect and ensuring the film quality of the bottom product.
According to an embodiment of the present invention, a vapor deposition furnace includes: the device comprises a furnace body, wherein a furnace bottom plate is arranged at the bottom of the furnace body, a plurality of material columns used for fixing products are arranged on the furnace bottom plate, and air inlets are formed in the material columns; the air inlet box is arranged at the lower end of the furnace body and communicated with all the material columns so as to realize air inlet of the air inlet hole of each material column; the bottom heating device is arranged corresponding to the air inlet box and is used for heating the air inlet box; the inner container is arranged in the furnace body, and the lower end of the inner container is coated with all the material columns; the heat preservation layer is arranged on the inner wall of the furnace body; the peripheral heating device is arranged on the inner side of the heat preservation layer and is higher than the inner container; and the top radiation device is arranged at the top of the furnace body and is provided with a heat radiation surface towards the inner container.
The vapor deposition furnace provided by the embodiment of the invention has at least the following beneficial effects:
by adopting the vapor deposition furnace with the structure, the air inlet can be heated by the bottom heating device, so that the preheating is realized, the condition that the temperature of a bottom product is low due to the air inlet is relieved, and the film forming quality is improved. And the heated gas enters the furnace body through the material column, so that the uniformity of the gas can be ensured. And simultaneously, the heat is reflected by combining the top radiation device, so that the temperature of a top product can be ensured, and the film forming quality is improved. Therefore, the invention can ensure relatively uniform temperature, thereby avoiding the influence of overhigh temperature in the middle area on the deposition effect, and simultaneously ensuring the film quality of the bottom product and the top product.
According to some embodiments of the invention, an air inlet pipe is arranged at the bottom of the air inlet box, air outlet holes are uniformly formed in the air inlet pipe, a slow release plate is arranged in the middle of the air inlet box, a slit is formed in the slow release plate, and a heating pipe is arranged between the slow release plate and the air inlet pipe by the bottom heating device, so that the air inlet box is divided into a heating chamber below the slow release plate and a cache chamber above the slow release plate by the slow release plate.
According to some embodiments of the invention, each of the material columns is provided with an opening and closing valve to control opening and closing of the corresponding air inlet hole through the opening and closing valve.
According to some embodiments of the present invention, the heat insulation layer is sequentially provided with a first heat insulation composite layer, a second heat insulation composite layer and a third heat insulation composite layer from inside to outside, wherein the first heat insulation composite layer is a radiation protection layer, a cooling water channel is arranged in the second heat insulation composite layer, and the third heat insulation composite layer is a ceramic fiber layer.
According to some embodiments of the invention, a cooling water wall is arranged in the side wall of the furnace body.
According to some embodiments of the invention, the liner is a multi-layer carbon fiber composite structure.
According to some embodiments of the invention, each layer of the carbon fiber composite structure comprises a first carbon fiber base layer, a carbon fiber surrounding layer, a second carbon fiber base layer and a carbon fiber vertical fiber layer from inside to outside.
According to some embodiments of the invention, the peripheral side heating device comprises:
the annular heat conducting plate is arranged around the inner container and is higher than the inner container in height;
and the heating pipe is arranged on the outer peripheral side of the annular heat conducting plate.
According to some embodiments of the invention, the top radiating device comprises from bottom to top:
the lower end face of the radiation plate is provided with a reflective coating;
the heat preservation layer is attached to the upper end face of the radiation plate, and the periphery is connected with the heat preservation layer.
According to some embodiments of the invention, the vapor deposition furnace is further provided with an exhaust system provided with an exhaust pipe connected to the center position of the radiation plate, an exhaust gas treatment device for butt joint of the exhaust pipe, and a negative pressure device for butt joint of the exhaust gas treatment device.
Additional aspects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention.
Drawings
The invention is further described with reference to the accompanying drawings and examples, in which:
FIG. 1 is a schematic view of an overall structure of the present invention;
FIG. 2 is a schematic view of a structure of the inlet box;
FIG. 3 is a partial structural cross-sectional view of a furnace sidewall;
fig. 4 is a schematic structural exploded view of a single-layer carbon fiber composite structure of the inner container.
Detailed Description
Embodiments of the present invention are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are illustrative only and are not to be construed as limiting the invention.
In the description of the present invention, it should be understood that the direction or positional relationship indicated with respect to the description of the orientation, such as up, down, etc., is based on the direction or positional relationship shown in the drawings, is merely for convenience of describing the present invention and simplifying the description, and does not indicate or imply that the apparatus or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the present invention.
In the description of the present invention, plural means two or more. The description of the first and second is for the purpose of distinguishing between technical features only and should not be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.
In the description of the present invention, unless explicitly defined otherwise, terms such as arrangement, installation, connection, etc. should be construed broadly and the specific meaning of the terms in the present invention can be reasonably determined by a person skilled in the art in combination with the specific contents of the technical scheme.
Referring to fig. 1 to 4, a vapor deposition furnace according to an embodiment of the present invention includes a furnace body 100, a bottom heating device, a liner 102, an insulating layer 104, a peripheral heating device 103, a top radiation device 101, and an air intake box 200. The bottom of the furnace body 100 is provided with a furnace bottom plate, a plurality of material columns 204 for fixing products are arranged on the furnace bottom plate, and air inlets are formed in the material columns 204. The air inlet box 200 is arranged at the lower end of the furnace body 100 and is communicated with all the material columns 204 so as to realize air inlet of each material column 204. The bottom heating means is arranged corresponding to the inlet box 200 for heating the inlet box 200. The liner 102 is disposed in the furnace body 100, and the lower end of the liner 102 is wrapped with all the material columns 204. The insulating layer 104 is provided on the inner wall of the furnace body 100. The peripheral heating device 103 is disposed inside the heat insulation layer 104 and has a height higher than the liner 102. The top radiation device 101 is provided at the top of the furnace body 100, and is provided with a heat radiation surface toward the inner container 102. By adopting the vapor deposition furnace with the structure, the air inlet can be heated by the bottom heating device, so that the preheating is realized, the condition that the temperature of a bottom product is low due to the air inlet is relieved, and the film forming quality is improved. And simultaneously, the heat is reflected by combining the top radiation device 101, so that the temperature of a top product can be ensured, and the film forming quality is improved. Therefore, the invention can ensure relatively uniform temperature, thereby avoiding the influence of overhigh temperature in the middle area on the deposition effect, and simultaneously ensuring the film quality of the bottom product and the top product.
Referring to fig. 2, it can be understood that in some embodiments of the present invention, the air inlet pipe 201 is disposed at the bottom of the air inlet box 200, the air inlet pipe 201 is uniformly disposed horizontally along the S-shaped direction, and the air outlet holes are uniformly formed on the pipe wall at the upper end thereof. Meanwhile, a slow release plate 203 is horizontally arranged in the middle of the air inlet box 200, and a plurality of slits are uniformly formed in the slow release plate 203. The bottom heating device is provided with a heating pipe 202 horizontally arranged at a position between the slow release plate 203 and the air inlet pipe 201, and the heating pipe 202 is similar to the air inlet pipe 201, is horizontally arranged along the S-shaped direction and corresponds to each other up and down, so that the air inlet is quickly heated through the heating pipe 202 after the air outlet hole comes out. The air inlet box 200 is divided into a heating chamber below the slow release plate 203 and a buffer chamber above the slow release plate 203 by the slow release plate 203. By adopting the structural arrangement of the embodiment, the air inlet is preheated by the heating pipe 202, then enters the buffer chamber for diffusion and mixing, and is fed into the furnace body 100 through the material column 204, so that the air inlet temperature can be ensured to be uniform, and the problem of nonuniform local temperature can be effectively avoided. The size of the slit can be flexibly set, and the slit can ensure the air inlet efficiency and can not cause blockage.
To achieve the air intake control, each of the material columns 204 is provided with an opening and closing valve to control the opening and closing of the corresponding air intake hole by the opening and closing valve.
Considering that the conventional deposition furnace is generally cooled in a cold wall form, the cooling effect is limited due to the arrangement of the heat insulation structure inside. Accordingly, in some embodiments of the present invention, the heat insulation layer 104 is sequentially provided with a first heat insulation composite layer 1041, a second heat insulation composite layer 1042 and a third heat insulation composite layer 1043 from inside to outside, wherein the first heat insulation composite layer 1041 is a radiation protection layer, a cooling water path is provided in the second heat insulation composite layer 1042, and the third heat insulation composite layer 1043 is a ceramic fiber layer. And cooling water walls 1044 are provided in the side walls of the furnace body 100. By adopting the structural arrangement of the embodiment, the inner temperature of the furnace body 100 can be ensured through the arrangement of the first heat-preserving composite layer 1041, the heat overflow is avoided, meanwhile, the structure has good effect on the maintenance of the external environment of the furnace body 100, and the high temperature of the outer surface of the furnace body 100 can be avoided. The second thermal insulation composite layer 1042 can cooperate with the cooling water wall 1044 to form double cooling, so as to improve the cooling effect and efficiency. The third insulation composite 1043 provides a layer of insulation basic assurance. The second thermal insulation composite layer 1042 is made of conventional thermal insulation materials, and the cooling water path is produced and arranged in a mode of arranging pipelines in the second thermal insulation composite layer 1042.
In some embodiments of the present invention, the liner 102 is a multi-layer carbon fiber composite structure. Because most of the conventional vapor deposition furnaces are small-scale production type equipment, the conventional vapor deposition furnaces are not suitable for mass production and production of large-size products, the strength and performance requirements of the inner container 102 can be improved by adopting the multi-layer carbon fiber composite structure to manufacture the inner container 102, so that the production requirements of mass production and production of large-size products can be met, namely, the size of the inner container 102 can be greatly increased compared with the size of the conventional structure.
Specifically, each carbon fiber composite structure comprises a first carbon fiber base layer 1024, a carbon fiber surrounding layer 1023, a second carbon fiber base layer 1022 and a carbon fiber vertical fiber layer 1021 from inside to outside. Wherein the carbon fiber surrounding layer 1023 is disposed on the first carbon fiber base layer 1024 in a winding manner, and the carbon fibers in the carbon fiber vertical fiber layer 1021 are disposed on the second carbon fiber base layer 1022 in a vertically distributed manner. Thereby ensuring the structural strength of the carbon fiber composite structure. In this way, a plurality of carbon fiber composite structures are compositely stacked. The design, the debugging and the reverse debugging of the actual production process are integrated, and the carbon fiber composite structure is preferably overlapped with 110-130 layers, so that the film production quality is compatible on the basis of ensuring the structural strength, and the optimal solution of the two is realized.
In some embodiments of the present invention, the circumferential side heating means 103 includes an annular heat conductive plate disposed around the inner bladder 102 and having a height higher than the inner bladder 102, and a heating pipe 202 provided at an outer circumferential side of the annular heat conductive plate. By adopting the structural arrangement of the embodiment, heat radiation and heat conduction are realized through the annular heat conducting plate, and uniform and consistent temperature can be ensured.
In some embodiments of the present invention, the top radiation device 101 includes a radiation plate and a heat insulation layer from bottom to top, the lower end surface of the radiation plate is provided with a reflective coating, the heat insulation layer is attached to the upper end surface of the radiation plate, and the peripheral side is connected to the heat insulation layer 104. In this embodiment, by setting the top radiation device 101, the temperature of the top of the furnace body 100 can be effectively ensured.
In some embodiments of the invention, the vapor deposition furnace is further provided with an exhaust system provided with an exhaust pipe 105 connected to the center position of the radiation plate, an exhaust gas treatment device 106 abutting the exhaust pipe 105, and a negative pressure device 107 abutting the exhaust gas treatment device 106. Wherein the exhaust treatment device 106 and the negative pressure device 107 may be of a construction known in the art. The reacted gas can be rapidly discharged through the exhaust system, and impurities such as tar in the gas are treated.
The present invention has been described in detail with reference to the embodiments, but the present invention is not limited to the embodiments, and various changes can be made within the knowledge of those skilled in the art without departing from the spirit of the present invention.
Claims (10)
1. A vapor deposition furnace, comprising:
the device comprises a furnace body, wherein a furnace bottom plate is arranged at the bottom of the furnace body, a plurality of material columns used for fixing products are arranged on the furnace bottom plate, and air inlets are formed in the material columns;
the air inlet box is arranged at the lower end of the furnace body and communicated with all the material columns so as to realize air inlet of the air inlet hole of each material column;
the bottom heating device is arranged corresponding to the air inlet box and is used for heating the air inlet box;
the inner container is arranged in the furnace body, and the lower end of the inner container is coated with all the material columns;
the heat preservation layer is arranged on the inner wall of the furnace body;
the peripheral heating device is arranged on the inner side of the heat preservation layer and is higher than the inner container;
and the top radiation device is arranged at the top of the furnace body and is provided with a heat radiation surface towards the inner container.
2. The vapor deposition furnace according to claim 1, wherein the bottom of the air inlet box is provided with an air inlet pipe, air outlet holes are uniformly formed in the air inlet pipe, a slow release plate is arranged in the middle of the air inlet box, the slow release plate is provided with a slit, and a heating pipe is arranged between the slow release plate and the air inlet pipe by the bottom heating device, so that the air inlet box is divided into a heating chamber below the slow release plate and a cache chamber above the slow release plate by the slow release plate.
3. The vapor deposition furnace according to claim 1, wherein each of the material columns is provided with an opening and closing valve to control opening and closing of the corresponding air intake hole by the opening and closing valve.
4. The vapor deposition furnace of claim 1, wherein the heat-insulating layer is provided with a first heat-insulating composite layer, a second heat-insulating composite layer and a third heat-insulating composite layer from inside to outside in sequence, wherein the first heat-insulating composite layer is a radiation-proof layer, a cooling water channel is arranged in the second heat-insulating composite layer, and the third heat-insulating composite layer is a ceramic fiber layer.
5. The vapor deposition furnace according to claim 4, wherein a cooling water wall is provided in a side wall of the furnace body.
6. The vapor deposition furnace of claim 1, wherein the liner is a multi-layered carbon fiber composite structure.
7. The vapor deposition furnace of claim 6, wherein each layer of the carbon fiber composite structure comprises a first carbon fiber base layer, a carbon fiber surrounding layer, a second carbon fiber base layer, and a carbon fiber vertical fiber layer from inside to outside.
8. The vapor deposition furnace according to claim 1, wherein the peripheral side heating means comprises:
the annular heat conducting plate is arranged around the inner container and is higher than the inner container in height;
and the heating pipe is arranged on the outer peripheral side of the annular heat conducting plate.
9. The vapor deposition furnace according to claim 1, wherein the top radiation device comprises from bottom to top:
the lower end face of the radiation plate is provided with a reflective coating;
the heat preservation layer is attached to the upper end face of the radiation plate, and the periphery is connected with the heat preservation layer.
10. The vapor deposition furnace according to claim 9, further comprising an exhaust system having an exhaust pipe connected to a central position of the radiation plate, an exhaust gas treatment device for docking the exhaust pipe, and a negative pressure device for docking the exhaust gas treatment device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211555620.2A CN116043193A (en) | 2022-12-06 | 2022-12-06 | Vapor deposition furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211555620.2A CN116043193A (en) | 2022-12-06 | 2022-12-06 | Vapor deposition furnace |
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| CN116043193A true CN116043193A (en) | 2023-05-02 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211555620.2A Pending CN116043193A (en) | 2022-12-06 | 2022-12-06 | Vapor deposition furnace |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11176759A (en) * | 1997-11-27 | 1999-07-02 | Lg Semicon Co Ltd | Heating apparatus for chemical vapor deposition |
| US6572371B1 (en) * | 2002-05-06 | 2003-06-03 | Messier-Bugatti | Gas preheater and process for controlling distribution of preheated reactive gas in a CVI furnace for densification of porous annular substrates |
| US20060046059A1 (en) * | 2004-08-26 | 2006-03-02 | Arico Alan A | Chemical vapor deposition apparatus and method |
| CN107779843A (en) * | 2017-12-11 | 2018-03-09 | 湖南顶立科技有限公司 | A kind of chemical vapor deposition stove |
| CN111455349A (en) * | 2020-04-01 | 2020-07-28 | 北京北方华创微电子装备有限公司 | Semiconductor processing equipment |
| FR3114107A1 (en) * | 2020-09-15 | 2022-03-18 | Safran Ceramics | Shims for substrates densified by chemical vapor infiltration |
-
2022
- 2022-12-06 CN CN202211555620.2A patent/CN116043193A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11176759A (en) * | 1997-11-27 | 1999-07-02 | Lg Semicon Co Ltd | Heating apparatus for chemical vapor deposition |
| US6572371B1 (en) * | 2002-05-06 | 2003-06-03 | Messier-Bugatti | Gas preheater and process for controlling distribution of preheated reactive gas in a CVI furnace for densification of porous annular substrates |
| US20060046059A1 (en) * | 2004-08-26 | 2006-03-02 | Arico Alan A | Chemical vapor deposition apparatus and method |
| CN107779843A (en) * | 2017-12-11 | 2018-03-09 | 湖南顶立科技有限公司 | A kind of chemical vapor deposition stove |
| CN111455349A (en) * | 2020-04-01 | 2020-07-28 | 北京北方华创微电子装备有限公司 | Semiconductor processing equipment |
| FR3114107A1 (en) * | 2020-09-15 | 2022-03-18 | Safran Ceramics | Shims for substrates densified by chemical vapor infiltration |
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