CN115679240A - High-energy plasma spray gun device and method for in-situ atomization of metal or ceramic powder - Google Patents
High-energy plasma spray gun device and method for in-situ atomization of metal or ceramic powder Download PDFInfo
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Abstract
本发明公开了一种原位雾化金属或陶瓷粉末的高能等离子喷枪装置,包括枪体及穿设在枪体中的Y型阳极和阴极,Y型阳极与阴极之间形成容纳高能等离子体的空腔,与枪体形成冷却通道,且阴极与枪体、Y型阳极之间设置有绝缘套筒,绝缘套筒上分别开设有工作气路、冷却水路,Y型阳极的后端外周面上开设有送粉通道,送粉通道与空腔的中轴线夹角α=10°~80°;本发明的方法为:开启装置送入工作气体和冷却水,将金属或陶瓷粉末送入Y型通道结构中加热熔化而雾化。本发明的高能等离子喷枪装置通过设置Y型通道结构,提高高能等离子体射流的喷射温度和压力,促进难熔金属或高熔点陶瓷粉末充分熔化形成液滴,获得细小均匀雾化粉末,获得高质量涂层。
The invention discloses a high-energy plasma spray gun device for in-situ atomization of metal or ceramic powder, comprising a gun body and a Y-shaped anode and a cathode pierced in the gun body, and a chamber for containing high-energy plasma is formed between the Y-shaped anode and the cathode. The cavity forms a cooling channel with the gun body, and an insulating sleeve is arranged between the cathode, the gun body, and the Y-shaped anode. The insulating sleeve is respectively provided with a working gas path and a cooling water path, and the outer peripheral surface of the rear end of the Y-shaped anode There is a powder feeding channel, and the angle between the powder feeding channel and the central axis of the cavity is α=10°~80°; the method of the present invention is: the opening device sends working gas and cooling water, and metal or ceramic powder is sent into the Y-shaped In the channel structure, it is heated and melted to be atomized. The high-energy plasma spray gun device of the present invention improves the injection temperature and pressure of the high-energy plasma jet by setting a Y-shaped channel structure, promotes the full melting of refractory metal or high-melting point ceramic powder to form liquid droplets, and obtains fine and uniform atomized powder and high-quality coating.
Description
技术领域technical field
本发明属于金属或陶瓷粉末的专用设备技术领域,特别涉及了一种原位雾化金属或陶瓷粉末的高能等离子喷枪装置及方法。The invention belongs to the technical field of special equipment for metal or ceramic powder, and in particular relates to a high-energy plasma spray gun device and method for atomizing metal or ceramic powder in situ.
背景技术Background technique
高能等离子喷涂技术是在普通大气等离子喷涂技术基础上发展而来的新型喷涂工艺,具有功率高、能量密度大以及喷涂颗粒飞行速度快等优点,是今后等离子喷涂技术发展的方向。其中,高能等离子喷枪是用于形成和控制高能等离子体弧以及喷涂材料和保护气输送的装置,也是高能等离子喷涂设备的核心部件。但由于难熔金属及陶瓷材料的高熔点特性,目前使用的一般高能等离子喷枪难以将其充分熔化,虽然增大喷涂功率有助于提高难熔金属及陶瓷材料的熔化程度,但伴随着阳极易烧蚀、使用寿命短的突出问题。High-energy plasma spraying technology is a new type of spraying process developed on the basis of ordinary atmospheric plasma spraying technology. It has the advantages of high power, high energy density and fast flying speed of sprayed particles. It is the development direction of plasma spraying technology in the future. Among them, the high-energy plasma spray gun is a device used to form and control the high-energy plasma arc, spray materials and shielding gas delivery, and is also the core component of the high-energy plasma spray equipment. However, due to the high melting point characteristics of refractory metals and ceramic materials, it is difficult to fully melt them with the general high-energy plasma spray guns currently used. Although increasing the spraying power helps to improve the melting degree of refractory metals and ceramic materials, but with the anode The outstanding problems of easy ablation and short service life.
发明内容Contents of the invention
本发明所要解决的技术问题在于针对上述现有技术的不足,提供一种原位雾化金属或陶瓷粉末的高能等离子喷枪装置。该装置通过设置Y型阳极形成Y型通道结构,使得高能等离子体射流的喷射直径逐渐缩小,从而对高能等离子体进行强烈的机械压缩,提高高能等离子体射流的喷射温度和压力,促进了难熔金属或高熔点陶瓷材料充分熔化形成液滴,获得细小均匀难熔金属或陶瓷雾化粉末,有利于获得高质量难熔金属或陶瓷涂层,解决了常规增大喷涂功率导致阳极烧蚀影响使用寿命的难题。The technical problem to be solved by the present invention is to provide a high-energy plasma spray gun device for atomizing metal or ceramic powder in situ in view of the above-mentioned deficiencies in the prior art. The device forms a Y-shaped channel structure by setting a Y-shaped anode, so that the injection diameter of the high-energy plasma jet is gradually reduced, thereby performing a strong mechanical compression on the high-energy plasma, increasing the injection temperature and pressure of the high-energy plasma jet, and promoting the refractory The metal or high-melting point ceramic material is fully melted to form droplets, and a fine and uniform refractory metal or ceramic atomized powder is obtained, which is conducive to obtaining high-quality refractory metal or ceramic coating, and solves the problem of anode ablation caused by conventional increased spraying power. The problem of longevity.
为解决上述技术问题,本发明采用的技术方案为:原位雾化金属或陶瓷粉末的高能等离子喷枪装置,其特征在于,包括枪体以及穿设在枪体中并活动配合连接的Y型阳极和阴极,且Y型阳极的后端和阴极的前端均伸出枪体,所述Y型阳极1与阴极之间形成用于容纳高能等离子体的空腔,所述Y型阳极、阴极与枪体之间形成冷却通道,且阴极的外周与枪体的内壁、Y型阳极的内壁之间设置有绝缘套筒,所述绝缘套筒上分别开设有与容纳高能等离子体的空腔连通的工作气路、与冷却通道连通的冷却水路,所述Y型阳极1中伸出枪体的后端外周面上开设有与容纳高能等离子体的空腔连通的送粉通道,所述送粉通道与容纳高能等离子体的空腔的中轴线夹角α=10°~80°。In order to solve the above-mentioned technical problems, the technical solution adopted in the present invention is: a high-energy plasma spray gun device for in-situ atomization of metal or ceramic powder, which is characterized in that it includes a gun body and a Y-shaped anode that is pierced in the gun body and is movably connected. and the cathode, and the rear end of the Y-shaped anode and the front end of the cathode all extend out of the gun body, and a cavity for containing high-energy plasma is formed between the Y-shaped anode 1 and the cathode, and the Y-shaped anode, the cathode and the gun A cooling channel is formed between the bodies, and an insulating sleeve is provided between the outer circumference of the cathode and the inner wall of the gun body and the inner wall of the Y-shaped anode. The air path and the cooling water path communicated with the cooling channel, the Y-shaped anode 1 protruding from the rear end of the gun body is provided with a powder feeding channel communicating with the cavity containing the high-energy plasma, and the powder feeding channel is connected with the The included angle of the central axis of the cavity containing the high-energy plasma is α=10°~80°.
上述的原位雾化金属或陶瓷粉末的高能等离子喷枪装置,其特征在于,所述送粉通道的入口处连接有旋气型送粉头,所述旋气型送粉头安装在送粉架上,且送粉架固定环绕在Y型阳极的外周。The above-mentioned high-energy plasma spray gun device for atomizing metal or ceramic powder in situ is characterized in that a cyclone-type powder feeding head is connected to the entrance of the powder feeding channel, and the cyclone-type powder feeding head is installed on the powder feeding rack On, and the powder feeding rack is fixed around the outer circumference of the Y-shaped anode.
上述的原位雾化金属或陶瓷粉末的高能等离子喷枪装置,其特征在于,所述旋气型送粉头由内管和外管环套而成,且内管的顶端连接有顶部进料口,外管的侧壁上连接有侧向进气口,所述侧向进气口与内管和外管之间的腔体连通。The above-mentioned high-energy plasma spray gun device for atomizing metal or ceramic powder in situ is characterized in that the cyclone-type powder feeding head is formed by an inner tube and an outer tube, and the top of the inner tube is connected with a top feeding port , the side wall of the outer tube is connected with a side air inlet, and the side air inlet communicates with the cavity between the inner tube and the outer tube.
上述的原位雾化金属或陶瓷粉末的高能等离子喷枪装置,其特征在于,所述送粉通道的数量为3~6个,且均匀分布在Y型阳极中伸出枪体的后端外周面上。The above-mentioned high-energy plasma spray gun device for atomizing metal or ceramic powder in situ is characterized in that the number of the powder feeding channels is 3 to 6, and they are evenly distributed on the outer peripheral surface of the rear end of the gun body protruding from the Y-shaped anode superior.
上述的原位雾化金属或陶瓷粉末的高能等离子喷枪装置,其特征在于,所述冷却通道中Y型阳极的外壁上分布有水冷加强块。The above-mentioned high-energy plasma spray gun device for atomizing metal or ceramic powder in situ is characterized in that water-cooling reinforcement blocks are distributed on the outer wall of the Y-shaped anode in the cooling channel.
上述的原位雾化金属或陶瓷粉末的高能等离子喷枪装置,其特征在于,所述阴极为沿枪体的中轴线移动的可伸缩阴极。The above-mentioned high-energy plasma spray gun device for atomizing metal or ceramic powder in situ is characterized in that the cathode is a retractable cathode that moves along the central axis of the gun body.
另外,本发明还公开了一种利用上述的高能等离子喷枪装置进行原位雾化金属或陶瓷粉末的方法,其特征在于,该方法的具体过程为:开启高能等离子喷枪装置,将工作气体经工作气路送入Y型通道结构中并形成高能等离子体,并将冷却水经冷却水路送入冷却通道进行冷却,同时将金属或陶瓷粉末经送粉通道送入Y型通道结构中与高能等离子体相互作用,使得金属或陶瓷粉末被加热熔化并在高能等离子体的高速剪切作用下被撕裂雾化,冷却后形成金属或陶瓷雾化粉末。In addition, the present invention also discloses a method for in-situ atomization of metal or ceramic powder using the above-mentioned high-energy plasma spray gun device. The air path is sent into the Y-shaped channel structure to form high-energy plasma, and the cooling water is sent into the cooling channel through the cooling water channel for cooling. At the same time, the metal or ceramic powder is sent into the Y-shaped channel structure through the powder feeding channel to form high-energy plasma The interaction causes the metal or ceramic powder to be heated and melted and torn and atomized under the high-speed shear of the high-energy plasma, and the metal or ceramic atomized powder is formed after cooling.
上述的方法,其特征在于,所述金属或陶瓷粉末的粒径为10μm~100μm,所述金属或陶瓷雾化粉末的粒径为1μm~5μm。The above method is characterized in that the particle size of the metal or ceramic powder is 10 μm to 100 μm, and the particle size of the metal or ceramic atomized powder is 1 μm to 5 μm.
本发明与现有技术相比具有以下优点:Compared with the prior art, the present invention has the following advantages:
1、本发明的高能等离子喷枪装置通过设置Y型阳极以形成容纳高能等离子体的Y型通道结构,使得高能等离子体射流的喷射直径逐渐缩小,从而对高能等离子体进行强烈的机械压缩,提高了高能等离子体的能量密度与速度,有利于提高高能等离子体射流的喷射温度和压力,促进了难熔金属或高熔点陶瓷粉末充分熔化形成液滴,获得细小均匀难熔金属或陶瓷雾化粉末,有利于获得低孔隙率、低致密度和高结合强度的难熔金属或陶瓷涂层。1, the high-energy plasma torch device of the present invention forms the Y-shaped channel structure that holds high-energy plasma by arranging Y-type anode, makes the injection diameter of high-energy plasma jet dwindle gradually, thereby carries out strong mechanical compression to high-energy plasma, has improved The energy density and speed of the high-energy plasma are conducive to increasing the injection temperature and pressure of the high-energy plasma jet, promoting the full melting of refractory metal or high-melting point ceramic powder to form droplets, and obtaining fine and uniform refractory metal or ceramic atomized powder. It is beneficial to obtain refractory metal or ceramic coatings with low porosity, low density and high bonding strength.
2、本发明的高能等离子喷枪装置通过设置送粉通道与容纳高能等离子体的空腔的中轴线的夹角α=10°~80°,使得难熔金属或陶瓷粉末形成发散性小的锥形粉末流并由圆周向圆心旋转汇聚,延长了难熔金属或陶瓷粉末的运动路径,增加了难熔金属或陶瓷粉末与高温、高压高能等离子体射流的接触面积,使难熔金属或陶瓷粉末迅速被充分加热并原位雾化,获得颗粒细小均匀的难熔金属或陶瓷雾化粉末,提高了喷涂形成涂层的致密性,减低了涂层的孔隙率。2. The high-energy plasma spray gun device of the present invention makes the refractory metal or ceramic powder form a conical shape with small divergence by setting the angle α=10°~80° between the powder feeding channel and the central axis of the cavity containing the high-energy plasma The powder flow rotates and gathers from the circumference to the center of the circle, which prolongs the movement path of the refractory metal or ceramic powder, increases the contact area between the refractory metal or ceramic powder and the high-temperature, high-pressure, high-energy plasma jet, and makes the refractory metal or ceramic powder rapidly It is fully heated and atomized in situ to obtain refractory metal or ceramic atomized powder with fine and uniform particles, which improves the compactness of the coating formed by spraying and reduces the porosity of the coating.
3、本发明的高能等离子喷枪装置通过在送粉通道上连接旋气型送粉头,并在旋气型送粉头上分别设置顶部进料口和侧向进气口,实现了混合气-固两相流与扰流气的独立输送过程,使得容纳高能等离子体的空腔中扰流气与混合气-固两相流作用产生涡旋,促进难熔金属或陶瓷粉末形成锥形粉末流,有利于获得细小均匀的难熔金属或陶瓷雾化粉末,避免难熔金属或陶瓷粉末的损失和旋气型送粉头的堵塞。3. The high-energy plasma spray gun device of the present invention realizes the mixed gas- The independent delivery process of the solid two-phase flow and the disturbing gas makes the vortex generated by the interaction between the disturbing gas and the mixed gas-solid two-phase flow in the cavity containing the high-energy plasma, and promotes the refractory metal or ceramic powder to form a conical powder flow, which is effective It is beneficial to obtain fine and uniform refractory metal or ceramic atomized powder, avoiding the loss of refractory metal or ceramic powder and the blockage of cyclone powder feeding head.
4、本发明的高能等离子喷枪装置通过在送粉通道上连接旋气型送粉头,使得难熔金属或陶瓷粉末以旋转形式进入高能等离子体中,促进两者充分混合并相互作用,从而使得大尺寸(10μm~100μm)的金属或陶瓷粉末充分受热熔化而快速雾化成尺寸细小(1μm~5μm)的难熔金属或陶瓷雾化粉末,且提高了送粉效率。4. The high-energy plasma spray gun device of the present invention connects the cyclone-type powder feeding head on the powder feeding channel, so that the refractory metal or ceramic powder enters the high-energy plasma in the form of rotation, and promotes the two to fully mix and interact, so that Large-sized (10μm~100μm) metal or ceramic powders are fully heated and melted to quickly atomize into small-sized (1μm~5μm) refractory metal or ceramic atomized powders, and the powder feeding efficiency is improved.
5、本发明的高能等离子喷枪装置通过设置阴极为可伸缩阴极,以调节与Y型阳极的中心距离,进而调节用于容纳高能等离子体的空腔的位置、形状和尺寸,有效控制了高能等离子体喷射形成的高能等离子体射流的特性,便于根据不同种类难熔金属或陶瓷粉末的熔点性能进行调节,在保证难熔金属或陶瓷粉末充分熔化的同时减小了能量浪费,节约了制备成本。5. The high-energy plasma torch device of the present invention effectively controls the high-energy plasma by setting the cathode as a retractable cathode to adjust the center distance from the Y-shaped anode, and then adjusting the position, shape and size of the cavity for containing the high-energy plasma. The characteristics of the high-energy plasma jet formed by the body jet are convenient to adjust according to the melting point properties of different types of refractory metals or ceramic powders, which reduces energy waste and saves preparation costs while ensuring full melting of refractory metals or ceramic powders.
6、本发明通过在冷却通道中Y型阳极的外壁上分布水冷加强块,增大Y型阳极与冷却水的接触面积,提高了通入冷却通道中的冷却水对Y型阳极的冷却效果,进一步减少了高热量对Y型阳极及枪体的不良影响。6. The present invention increases the contact area between the Y-type anode and the cooling water by distributing the water-cooling reinforcing block on the outer wall of the Y-type anode in the cooling channel, and improves the cooling effect of the cooling water passing into the cooling channel on the Y-type anode. The adverse effect of high heat on the Y-shaped anode and the gun body is further reduced.
下面通过附图和实施例对本发明的技术方案作进一步的详细描述。The technical solutions of the present invention will be described in further detail below with reference to the drawings and embodiments.
附图说明Description of drawings
图1为本发明高能等离子喷枪装置的结构示意图。Fig. 1 is a schematic structural view of the high-energy plasma spray gun device of the present invention.
图2为本发明高能等离子喷枪装置中旋气型送粉头与送粉架的连接关系示意图。Fig. 2 is a schematic diagram of the connection relationship between the cyclone-type powder feeding head and the powder feeding frame in the high-energy plasma spray gun device of the present invention.
图3为本发明高能等离子喷枪装置中旋气型送粉头的结构示意图。Fig. 3 is a schematic structural view of the cyclone-type powder feeding head in the high-energy plasma spray gun device of the present invention.
图4为本发明实施例2中氧化锆陶瓷粉末的SEM图。Fig. 4 is an SEM image of zirconia ceramic powder in Example 2 of the present invention.
图5为本发明实施例2中氧化锆陶瓷雾化粉末的SEM图。Fig. 5 is an SEM image of zirconia ceramic atomized powder in Example 2 of the present invention.
图6为本发明实施例3中氧化铝陶瓷粉末的SEM图。Fig. 6 is a SEM image of alumina ceramic powder in Example 3 of the present invention.
图7为本发明实施例3中氧化铝陶瓷雾化粉末的SEM图。Fig. 7 is an SEM image of alumina ceramic atomized powder in Example 3 of the present invention.
图8为本发明实施例4中氧化铝陶瓷雾化粉末的SEM图。Fig. 8 is a SEM image of alumina ceramic atomized powder in Example 4 of the present invention.
图9为本发明实施例5中NiCoCrAlY合金粉末的SEM图。Fig. 9 is a SEM image of NiCoCrAlY alloy powder in Example 5 of the present invention.
图10为本发明实施例5中NiCoCrAlY合金雾化粉末的SEM图。Fig. 10 is a SEM image of NiCoCrAlY alloy atomized powder in Example 5 of the present invention.
图11为本发发明实施例6中NiCoCrAlY合金雾化粉末的SEM图。Fig. 11 is a SEM image of NiCoCrAlY alloy atomized powder in Example 6 of the present invention.
附图标记说明:
具体实施方式Detailed ways
实施例1Example 1
如图1所示,本实施例的高能等离子喷枪装置包括枪体8以及穿设在枪体8中并活动配合连接的Y型阳极1和阴极5,且Y型阳极1的后端和阴极5的前端均伸出枪体8,所述Y型阳极1与阴极5之间形成用于容纳高能等离子体的空腔,所述Y型阳极1、阴极5与枪体8之间形成冷却通道,且阴极5的外周与枪体8的内壁、Y型阳极1的内壁之间设置有绝缘套筒7,所述绝缘套筒7上分别开设有与容纳高能等离子体的空腔连通的工作气路4、与冷却通道连通的冷却水路6,所述Y型阳极1中伸出枪体8的后端外周面上开设有与容纳高能等离子体的空腔连通的送粉通道2,所述送粉通道2与容纳高能等离子体的空腔的中轴线夹角α为10°~80°。As shown in Figure 1, the high-energy plasma torch device of the present embodiment comprises
如图1所示,本实施例的高能等离子喷枪装置中在主体结构枪体8中设置活动配合连接的Y型阳极1和阴极5,通常,Y型阳极1和阴极5的中轴线重合并形成枪体8的中轴线,使得Y型阳极1和阴极5调整至合适位置并通过配合连接稳固安装在枪体8中,提高了高能等离子喷枪装置的结构稳定性和装配灵活性;而Y型阳极1与阴极5之间形成用于容纳高能等离子体的空腔,即通过Y型阳极1和阴极5的配合连接位置确定了用于容纳高能等离子体的空腔的位置、形状和尺寸,进而控制了高能等离子体喷射形成的高能等离子体射流的场特性,保证了高能等离子体射流的高温、高压特性,从而对送入的难熔金属或陶瓷粉末进行高能的原位雾化,保证原位喷雾过程的稳定、顺利进行;基于Y型阳极1的外型结构为Y型,Y型阳极1和阴极5之间形成的用于容纳高能等离子体的空腔为Y型通道结构,使得高能等离子体射流的喷射直径逐渐缩小,从而对高能等离子体进行强烈的机械压缩,提高了高能等离子体的能量密度与速度,有利于提高高能等离子体射流的喷射温度和压力,促进了高熔点陶瓷材料的充分熔化。As shown in Figure 1, in the high-energy plasma torch device of the present embodiment, the Y-shaped anode 1 and the
本实施例中通过设置Y型阳极1、阴极5与枪体8之间形成冷却通道,使得冷却通道环绕在Y型阳极1的外周,用于对Y型阳极1进行实时冷却,减少空腔中高能等离子体射流的高热量对Y型阳极1及枪体8的不良影响,避免过热造成原位雾化的温度过高、难熔金属或陶瓷粉末产生烧损,保证了原位雾化过程的高效进行。In this embodiment, a cooling channel is formed between the Y-shaped anode 1, the
本实施例中在阴极5的外周与枪体8的内壁、Y型阳极1的内壁之间设置绝缘套筒7,将阴极5与枪体8、Y型阳极1隔开并绝缘,避免了阴极5与枪体8、Y型阳极1之间接触产生短路甚至漏电危险,提高了原位雾化的安全性;同时,通过在绝缘套筒7上开设有与容纳高能等离子体的空腔连通的工作气路4,用于向容纳高能等离子体的空腔中输入工作气体,通常工作气体为氩气、氢气或氩气与氢气的混合气体,工作气体在Y型阳极1、阴极5的作用下经电离形成高温、高压等离子体射流(通常5000 K以上),作为能量源实现了对难熔金属或陶瓷粉末的原位雾化,通过在绝缘套筒7上开设有与冷却通道连通的冷却水路6,用于向冷却通道中通入冷却水,以迅速吸收并携带转移高能等离子体射流的热量,提高了实时冷却效率。In the present embodiment, an insulating sleeve 7 is set between the periphery of the
本实施例中通过设置Y型阳极1的后端和阴极5的前端均伸出枪体8,通常将阴极5中伸出枪体8的前端与外界电源连接,从而为高能等离子体的形成提供强电场,同时在Y型阳极1中伸出枪体8的后端外周面上开设有与容纳高能等离子体的空腔连通的送粉通道2,以将难熔金属或陶瓷粉末经送粉通道2送入空腔中与高温、高压高能等离子体射流混合作用,并受热迅速熔化并雾化成细小熔滴,通过设置送粉通道2与容纳高能等离子体的空腔的中轴线夹角α为10°~80°,使得送入的难熔金属或陶瓷粉末沿着容纳高能等离子体的空腔的中轴线形成发散性小的锥形粉末流,并沿着中轴线由圆周向圆心旋转汇聚,进入高能等离子体的高温端,延长了难熔金属或陶瓷粉末的运动路径,增加了难熔金属或陶瓷粉末与高温、高压高能等离子体射流的接触面积,提高了加热速率,从而使得汇聚过程中难熔金属或陶瓷粉末与高温、高压高能等离子体射流混合并迅速被充分加热,原位雾化形成细小熔滴,通常细小熔滴直径仅为难熔金属或陶瓷粉末原始颗粒的1/10~1/20,进而喷出冷却获得颗粒细小均匀的难熔金属或陶瓷雾化粉末,该难熔金属或陶瓷雾化粉末喷涂在基底上形成结构致密的涂层,解决了目前等离子喷枪形成的等离子体射流对难熔金属如NiCoCrAlY合金粉末粒子、NiCrAlY合金粉末粒子或高熔点陶瓷材料如氧化锆(ZrO2)、氧化铝(Al2O3)、氧化铬(Cr2O3)与氧化钛(TiO2)等陶瓷粉末熔化不足、造成其形成的涂层内部高孔隙率的现象,适用于高性能难熔金属及陶瓷涂层的加工制备。通常,难熔金属及陶瓷粉末的熔点越高,送粉通道2与容纳高能等离子体的空腔的中轴线夹角α越小,综合考虑加工难易因素,设置α为10°~80°。In this embodiment, the rear end of the Y-shaped anode 1 and the front end of the
如图2所示,进一步地,本实施例中所述送粉通道2的入口处连接有旋气型送粉头9,所述旋气型送粉头9安装在送粉架12上,且送粉架12固定环绕在Y型阳极1的外周。本实施例中通过在送粉通道2的入口处连接旋气型送粉头9,利用气体将难熔金属或陶瓷粉末经送粉通道2送入容纳高能等离子体的空腔进行原位雾化,使得难熔金属或陶瓷粉末以旋转形式进入高能等离子体中,使得两者充分混合并相互作用,从而使得大尺寸(10μm~100μm)的难熔金属或陶瓷粉末充分受热熔化,进而快速雾化成尺寸细小(1μm~5μm)的难熔金属或陶瓷雾化粉末,且提高了送粉效率;同时将旋气型送粉头9安装在送粉架12上,且送粉架12固定环绕在Y型阳极1的外周,使得旋气型送粉头9与送粉通道2的连接稳定性,避免了旋气型送粉头9的松动脱落,尤其是送粉过程中因气体通入旋气型送粉头9中产生压力导致松动脱落,进一步保证了原位雾化过程的稳定、顺利进行。As shown in Figure 2, further, the entrance of the powder feeding channel 2 in this embodiment is connected with a cyclone-type
如图3所示,进一步地,本实施例中所述旋气型送粉头9由内管和外管环套而成,且内管的顶端连接有顶部进料口10,外管的侧壁上连接有侧向进气口11,所述侧向进气口11与内管和外管之间的腔体连通。本实施例中通过设置旋气型送粉头9由内管和外管环套而成,形成内管内部腔体和内管、外管环套腔体两个独立的腔体空间,同时在内管的顶端连接顶部进料口10,用于将难熔金属或陶瓷粉末与送粉气的混合气-固两相流经顶部进料口10进入旋气型送粉头9、再经送粉通道2进入容纳高能等离子体的空腔中,实现了独立的气流送粉过程,通过在外管的侧壁上连接侧向进气口11,且侧向进气口11与内管和外管之间的腔体连通,用于将扰流气经侧向进气口11送入旋气型送粉头9、再经送粉通道2进入容纳高能等离子体的空腔中,并与混合气-固两相流作用产生涡旋,进一步促进难熔金属或陶瓷粉末形成锥形粉末流,从而迅速被充分加热形成细小熔滴,获得细小均匀的难熔金属或陶瓷雾化粉末;因此,本实施例中的混合气-固两相流与干扰气的送入均为独立的过程,两者互不干扰,在进入容纳高能等离子体的空腔中才互相作用,避免了混合气-固两相流与干扰气在旋气型送粉头9中即发生作用、导致难熔金属或陶瓷粉末残留在旋气型送粉头9造成损失、甚至堵塞旋气型送粉头9影响送粉过程的顺利进行。As shown in Figure 3, further, the cyclone-type
进一步地,本实施例中所述送粉通道2的数量为3~6个,且均匀分布在Y型阳极1中伸出枪体8的后端外周面上。本实施例中通过增加送粉通道2的数量,并控制送粉通道2均匀分布在Y型阳极1中伸出枪体8的后端外周面上,使得难熔金属或陶瓷粉末经各送粉通道2均匀送入容纳高能等离子体的空腔中,提高了送粉效率,以及难熔金属或陶瓷粉末与高温、高压高能等离子体射流混合均匀程度,进一步提高了难熔金属或陶瓷雾化粉末的尺寸均匀性。Further, in this embodiment, the number of powder feeding channels 2 is 3 to 6, and they are evenly distributed on the outer peripheral surface of the rear end of the Y-shaped anode 1 protruding from the
如图1所示,进一步地,本实施例中所述冷却通道中Y型阳极1的外壁上分布有水冷加强块3。本实施例中通过在冷却通道中Y型阳极1的外壁上分布水冷加强块3,增大Y型阳极1与冷却水的接触面积,提高了通入冷却通道中的冷却水对Y型阳极1的冷却效果,进一步减少了高热量对Y型阳极1及枪体8的不良影响。As shown in FIG. 1 , further, water-cooling reinforcing
进一步地,本实施例中所述阴极5为沿枪体8的中轴线移动的可伸缩阴极。本实施例中设置阴极5为沿枪体8的中轴线移动的可伸缩阴极,通过将阴极5沿着沿枪体8的中轴线前后移动伸缩以调节与Y型阳极1的中心距离,进而调节用于容纳高能等离子体的空腔的位置、形状和尺寸,有效控制了高能等离子体喷射形成的高能等离子体射流的特性。Further, the
本发明的原位雾化金属或陶瓷粉末的方法通过实施例2~实施例6进行详细描述。The method for atomizing metal or ceramic powder in situ of the present invention is described in detail through Examples 2 to 6.
实施例2Example 2
本实施例制备方法的具体过程为:开启高能等离子喷枪装置,设置送粉通道2与容纳高能等离子体的空腔的中轴线夹角α为30°,将工作气体氩气经工作气路4送入Y型通道结构中并形成高能等离子体,并将冷却水经冷却水路6送入冷却通道进行冷却,同时将粒径约为45μm的氧化锆陶瓷粉末(如图4所示)经送粉通道2送入Y型通道结构中与高能等离子体射流相互作用,使得氧化锆陶瓷粉末被加热熔化并在高能等离子体的高速剪切作用下被撕裂雾化,形成细小的氧化锆陶瓷液滴,经冷却得到粒径为1μm~5μm的氧化锆陶瓷雾化粉末(如图5所示)。The specific process of the preparation method in this embodiment is: turn on the high-energy plasma spray gun device, set the angle α between the powder feeding channel 2 and the central axis of the cavity containing the high-energy plasma to be 30°, and send the working gas argon through the working gas path 4. into the Y-shaped channel structure and form high-energy plasma, and the cooling water is sent into the cooling channel through the cooling water channel 6 for cooling, and the zirconia ceramic powder (as shown in Figure 4) with a particle size of about 45 μm is passed through the powder feeding channel 2. It is sent into the Y-shaped channel structure to interact with the high-energy plasma jet, so that the zirconia ceramic powder is heated and melted, and is torn and atomized under the high-speed shear of the high-energy plasma to form fine zirconia ceramic droplets. Zirconia ceramic atomized powder with a particle size of 1 μm to 5 μm was obtained after cooling (as shown in Figure 5).
实施例3Example 3
本实施例与实施例2的不同之处为:设置送粉通道2与容纳高能等离子体的空腔的中轴线夹角α为60°,采用的陶瓷粉末为粒径为80μm~100μm的氧化铝陶瓷粉末(如图6所示),雾化后经冷却得到粒径约为5μm的氧化铝陶瓷雾化粉末(如图7所示)。The difference between this embodiment and Embodiment 2 is that the angle α between the powder feeding channel 2 and the central axis of the cavity containing the high-energy plasma is set to 60°, and the ceramic powder used is alumina with a particle size of 80 μm to 100 μm. Ceramic powder (as shown in Figure 6), atomized and cooled to obtain alumina ceramic atomized powder with a particle size of about 5 μm (as shown in Figure 7).
实施例4Example 4
本实施例与实施例2的不同之处为:设置送粉通道2与容纳高能等离子体的空腔的中轴线夹角α为45°,采用的陶瓷粉末为粒径为80μm~100μm的氧化铝陶瓷粉末,雾化后经冷却得到粒径约为3μm的氧化铝陶瓷雾化粉末(如图8所示)。The difference between this embodiment and Embodiment 2 is that the angle α between the powder feeding channel 2 and the central axis of the cavity containing the high-energy plasma is set to 45°, and the ceramic powder used is alumina with a particle size of 80 μm to 100 μm. Ceramic powder, atomized and cooled to obtain alumina ceramic atomized powder with a particle size of about 3 μm (as shown in Figure 8).
实施例5Example 5
本实施例与实施例2的不同之处为:设置送粉通道2与容纳高能等离子体的空腔的中轴线夹角α为10°,采用的难熔金属粉末为粒径为50μm~70μm的NiCoCrAlY合金粉末(如图9所示),雾化后经冷却得到粒径约为10μm的NiCoCrAlY合金雾化粉末(如图10所示)。The difference between this embodiment and Embodiment 2 is: the angle α between the central axis of the powder feeding channel 2 and the cavity containing the high-energy plasma is set to 10°, and the refractory metal powder used is 50 μm to 70 μm in particle size. NiCoCrAlY alloy powder (as shown in Figure 9), after atomization, cooled to obtain NiCoCrAlY alloy atomized powder with a particle size of about 10 μm (as shown in Figure 10).
实施例6Example 6
本实施例与实施例2的不同之处为:设置送粉通道2与容纳高能等离子体的空腔的中轴线夹角α为80°,采用的难熔金属粉末为粒径为50μm~70μm的NiCoCrAlY合金粉末(如图9所示),雾化后经冷却得到粒径约为1μm~3μm的NiCoCrAlY合金雾化粉末(如图11所示)。The difference between this embodiment and Embodiment 2 is: the angle α between the central axis of the powder feeding channel 2 and the cavity containing the high-energy plasma is set to 80°, and the refractory metal powder used is 50 μm~70 μm in particle size. NiCoCrAlY alloy powder (as shown in Figure 9), atomized and cooled to obtain NiCoCrAlY alloy atomized powder with a particle size of about 1 μm to 3 μm (as shown in Figure 11).
以上所述,仅是本发明的较佳实施例,并非对本发明作任何限制。凡是根据发明技术实质对以上实施例所作的任何简单修改、变更以及等效变化,均仍属于本发明技术方案的保护范围内。The above descriptions are only preferred embodiments of the present invention, and do not limit the present invention in any way. All simple modifications, changes and equivalent changes made to the above embodiments according to the technical essence of the invention still belong to the protection scope of the technical solution of the invention.
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Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1115693A (en) * | 1993-08-11 | 1996-01-31 | 米乐·特迈尔公司 | Plasma arc spray gun |
CN1481939A (en) * | 2002-09-12 | 2004-03-17 | 中国科学院力学研究所 | Hollow cathode axial powder feeding plasma spray gun |
KR20040091448A (en) * | 2003-04-22 | 2004-10-28 | 고려진공 주식회사 | A plasma gun |
CN201172684Y (en) * | 2007-05-23 | 2008-12-31 | 上海大豪纳米材料喷涂有限公司 | Plasma spraying gun |
CN105755421A (en) * | 2016-04-20 | 2016-07-13 | 北京科技大学 | Direct-current argon arc plasma powder spray gun and manufacturing method |
CN205464721U (en) * | 2016-01-06 | 2016-08-17 | 江苏烁石焊接科技有限公司 | Coaxial 3D printing device of silk - powder - gas - electric arc |
CN106714437A (en) * | 2015-08-18 | 2017-05-24 | 南京理工大学 | Input-power-adjustable dual-anode arc heating plasma torch |
CN207720497U (en) * | 2017-12-13 | 2018-08-10 | 神雾科技集团股份有限公司 | Plasma gun and plasma apparatus with it |
CN207720496U (en) * | 2017-12-13 | 2018-08-10 | 神雾科技集团股份有限公司 | Plasma gun and plasma apparatus with it |
CN212451593U (en) * | 2020-07-09 | 2021-02-02 | 中机凯博表面技术江苏有限公司 | Plasma spray gun |
CN214768918U (en) * | 2021-05-21 | 2021-11-19 | 宁波广新纳米材料有限公司 | Preparation equipment of nano metal coated powder |
CN215328323U (en) * | 2021-06-18 | 2021-12-28 | 湖南省冶金材料研究院有限公司 | Spray gun for plasma spraying |
-
2022
- 2022-10-31 CN CN202211344770.9A patent/CN115679240B/en active Active
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1115693A (en) * | 1993-08-11 | 1996-01-31 | 米乐·特迈尔公司 | Plasma arc spray gun |
CN1481939A (en) * | 2002-09-12 | 2004-03-17 | 中国科学院力学研究所 | Hollow cathode axial powder feeding plasma spray gun |
KR20040091448A (en) * | 2003-04-22 | 2004-10-28 | 고려진공 주식회사 | A plasma gun |
CN201172684Y (en) * | 2007-05-23 | 2008-12-31 | 上海大豪纳米材料喷涂有限公司 | Plasma spraying gun |
CN106714437A (en) * | 2015-08-18 | 2017-05-24 | 南京理工大学 | Input-power-adjustable dual-anode arc heating plasma torch |
CN205464721U (en) * | 2016-01-06 | 2016-08-17 | 江苏烁石焊接科技有限公司 | Coaxial 3D printing device of silk - powder - gas - electric arc |
CN105755421A (en) * | 2016-04-20 | 2016-07-13 | 北京科技大学 | Direct-current argon arc plasma powder spray gun and manufacturing method |
CN207720497U (en) * | 2017-12-13 | 2018-08-10 | 神雾科技集团股份有限公司 | Plasma gun and plasma apparatus with it |
CN207720496U (en) * | 2017-12-13 | 2018-08-10 | 神雾科技集团股份有限公司 | Plasma gun and plasma apparatus with it |
CN212451593U (en) * | 2020-07-09 | 2021-02-02 | 中机凯博表面技术江苏有限公司 | Plasma spray gun |
CN214768918U (en) * | 2021-05-21 | 2021-11-19 | 宁波广新纳米材料有限公司 | Preparation equipment of nano metal coated powder |
CN215328323U (en) * | 2021-06-18 | 2021-12-28 | 湖南省冶金材料研究院有限公司 | Spray gun for plasma spraying |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116903261A (en) * | 2023-07-03 | 2023-10-20 | 清华大学 | Method for producing an antimicrobial glass and antimicrobial glass |
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