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CN115289969A - Method and device for detecting substrate position abnormality - Google Patents

Method and device for detecting substrate position abnormality Download PDF

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Publication number
CN115289969A
CN115289969A CN202211042514.4A CN202211042514A CN115289969A CN 115289969 A CN115289969 A CN 115289969A CN 202211042514 A CN202211042514 A CN 202211042514A CN 115289969 A CN115289969 A CN 115289969A
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Prior art keywords
substrate
image
manipulator
detection
turntable
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吴标平
吴洽
聂鹏
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Zhongshan Kaixuan Vacuum Science and Technology Co Ltd
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Zhongshan Kaixuan Vacuum Science and Technology Co Ltd
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Priority to CN202211042514.4A priority Critical patent/CN115289969A/en
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/70Determining position or orientation of objects or cameras
    • G06T7/73Determining position or orientation of objects or cameras using feature-based methods
    • G06T7/74Determining position or orientation of objects or cameras using feature-based methods involving reference images or patches
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30164Workpiece; Machine component

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Manipulator (AREA)

Abstract

The embodiment of the disclosure provides a method and a device for detecting substrate position abnormity, wherein the method comprises the following steps: acquiring standard images of substrates respectively positioned on a manipulator and a rotating frame; acquiring detection images when the substrate is respectively positioned on the manipulator or the rotating frame again; judging whether the deviation between the position of a preset feature in the standard image and the position of the preset feature in the detection image is within a preset range or not; if the position of the substrate is not within the preset range, judging that the position of the substrate on the manipulator or the rotating frame again is abnormal. The substrate position abnormity detection method provided by the disclosure can identify whether the substrate position is abnormal or not in a visual detection mode.

Description

基片位置异常的检测方法与检测装置Method and device for detecting substrate position abnormality

技术领域technical field

本公开涉及镀膜设备技术领域,具体而言,涉及一种基片位置异常的检测方法与基片位置异常的检测装置。The present disclosure relates to the technical field of coating equipment, in particular, to a method for detecting an abnormal position of a substrate and a device for detecting an abnormal position of a substrate.

背景技术Background technique

常见的镀膜机具有自动上下基片功能,通常包括装载腔、传输腔和工艺腔。传输腔有一真空机械手,负责将装载腔中的基片搬运到工艺腔,或者从工艺腔搬运到装载腔。由于装载腔、传输腔和工艺腔工作时均为真空状态,而用于驱动机械手运动和转架旋转的伺服电机不能在真空下工作,所以在传输腔和工艺腔上分别设置磁流体进行密封。A common coating machine has the function of automatically loading and unloading substrates, and usually includes a loading chamber, a transfer chamber and a process chamber. The transfer chamber has a vacuum manipulator responsible for transporting the substrate in the loading chamber to the process chamber, or from the process chamber to the loading chamber. Since the loading chamber, transfer chamber and process chamber are all working in a vacuum state, and the servo motor used to drive the movement of the manipulator and the rotation of the turret cannot work in a vacuum, magnetic fluids are respectively installed on the transfer chamber and the process chamber for sealing.

工艺腔上的转架伺服电机通过联轴器和磁流体一端连接,磁流体另一端也通过联轴器和工件转架连接。传输腔上的机械手驱动电机通过联轴器和另一磁流体一端连接,磁流体的另一端也是通过联轴器和机械手取片机构连接。The turret servo motor on the process chamber is connected to one end of the magnetic fluid through a coupling, and the other end of the magnetic fluid is also connected to the workpiece turret through a coupling. The drive motor of the manipulator on the transfer chamber is connected to one end of the other magnetic fluid through a coupling, and the other end of the magnetic fluid is also connected to the sheet taking mechanism of the manipulator through a coupling.

在系统运行过程中,只要有一个联轴器打滑,都会造成运动部件位置不准确,从而造成基片位置异常。During the operation of the system, as long as a coupling slips, the position of the moving parts will be inaccurate, resulting in an abnormal position of the substrate.

需要说明的是,在上述背景技术部分公开的信息仅用于加强对本公开的背景的理解,因此可以包括不构成对本领域普通技术人员已知的现有技术的信息。It should be noted that the information disclosed in the above background section is only for enhancing the understanding of the background of the present disclosure, and therefore may include information that does not constitute the prior art known to those of ordinary skill in the art.

发明内容Contents of the invention

本公开实施例的目的在于提供一种基片手位置异常的检测方法与检测装置,能够通过视觉检测方式识别机基片的状态是否异常。The purpose of the embodiments of the present disclosure is to provide a detection method and detection device for an abnormal substrate hand position, which can identify whether the state of the substrate is abnormal by visual detection.

本公开的其他特性和优点将通过下面的详细描述变得显然,或部分地通过本公开的实践而习得。Other features and advantages of the present disclosure will become apparent from the following detailed description, or in part, be learned by practice of the present disclosure.

根据本公开实施例的一个方面,提供了一种基片位置异常的检测方法,该检测方法包括:According to an aspect of an embodiment of the present disclosure, a method for detecting an abnormal position of a substrate is provided, the method for detecting includes:

获取基片分别位于机械手和转架上时的标准图像;Obtain standard images when the substrate is on the manipulator and the turntable respectively;

获取基片重新分别位于机械手或转架上时的检测图像;Obtain the inspection image when the substrate is relocated on the manipulator or the turntable respectively;

判断所述标准图像中预设特征的位置与所述检测图像中所述预设特征的位置之间偏差是否在预设范围内;judging whether the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is within a preset range;

若不在所述预设范围内,则判断所述基片重新位于机械手或转架上的位置异常。If it is not within the preset range, it is judged that the position where the substrate is repositioned on the manipulator or the turntable is abnormal.

在本公开的一种示例性实施例中,所述检测方法还包括:In an exemplary embodiment of the present disclosure, the detection method further includes:

若在所述预设范围内,则判断所述基片重新位于机械手或转架上的位置正常。If it is within the preset range, it is judged that the position of the substrate on the manipulator or the turntable is normal again.

在本公开的一种示例性实施例中,所述预设特征为多个特征点,包括位于所述基片上的结构特征、位于机械手上的结构特征和位于转架上的结构特征。In an exemplary embodiment of the present disclosure, the preset feature is a plurality of feature points, including structural features on the substrate, structural features on the manipulator, and structural features on the turntable.

在本公开的一种示例性实施例中,所述预设特征为线特征。In an exemplary embodiment of the present disclosure, the preset feature is a line feature.

在本公开的一种示例性实施例中,所述机械手上设有多个第一特征;当在所述检测图像未识别出所述第一特征,则判断所述基片在所述机械手上悬挂到位;当在所述检测图像识别出所述多个第一特征,则判断所述机械手上未挂所述基片;当在所述检测图像识别出部分所述第一特征,则判断所述基片在所述机械手上未挂到位;In an exemplary embodiment of the present disclosure, the manipulator is provided with a plurality of first features; when the first features are not identified in the detection image, it is determined that the substrate is on the manipulator Hanging in place; when the multiple first features are recognized in the detection image, it is judged that the substrate is not hung on the manipulator; when part of the first features are recognized in the detection image, it is judged that the The substrate is not hung in place on the manipulator;

所述转架上设有多个第二特征;当在所述检测图像未识别出所述第二特征,则判断所述基片在所述机械手上悬挂到位;当在所述检测图像识别出所述多个第二特征,则判断所述转架上未挂所述基片;当在所述检测图像识别出部分所述第二特征,则判断所述基片在所述转架上未悬挂到位。A plurality of second features are provided on the turntable; when the second features are not recognized in the detection image, it is judged that the substrate is suspended in place on the manipulator; For the plurality of second features, it is judged that the substrate is not hung on the turntable; when part of the second features are recognized in the detection image, it is judged that the substrate is not hung on the turntable Hang in place.

在本公开的一种示例性实施例中,所述标准图像与所述检测图像的边界位置一致。In an exemplary embodiment of the present disclosure, the boundary positions of the standard image and the detection image are consistent.

根据本公开实施例的另一个方面,提供了一种基片位置异常的检测装置,该检测装置包括:According to another aspect of the embodiments of the present disclosure, a detection device for abnormal substrate position is provided, the detection device includes:

图像获取模块,用于获取基片分别位于机械手和转架上时的标准图像,以及基片重新分别位于机械手或转架上时的检测图像;The image acquisition module is used to obtain the standard image when the substrate is respectively located on the manipulator and the turntable, and the detection image when the substrate is respectively placed on the manipulator or the turntable;

图像对比模块,与所述图像获取模块连接,所述图像对比模块被配置为判断所述标准图像中预设特征的位置与所述检测图像中所述预设特征的位置之间偏差是否在预设范围内;An image comparison module, connected to the image acquisition module, the image comparison module is configured to determine whether the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is within a preset range. within the set range;

输出模块,与所述图像对比模块连接,若所述标准图像中预设特征的位置与所述检测图像中所述预设特征的位置之间偏差不在所述预设范围内,则输出所述基片重新位于机械手或转架上位置异常的信息。An output module, connected to the image comparison module, if the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is not within the preset range, then output the Information about substrate repositioning on the robot or turret where it is out of position.

在本公开的一种示例性实施例中,若所述标准图像中预设特征的位置与所述检测图像中所述预设特征的位置之间偏差在所述预设范围内,则输出所述基片重新位于机械手或转架上位置正常的信息。In an exemplary embodiment of the present disclosure, if the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is within the preset range, the output The information that the above-mentioned substrate is repositioned on the manipulator or the turntable is normal.

在本公开的一种示例性实施例中,所述机械手上设有多个第一特征;当所述图像对比模块在所述检测图像未识别出所述第一特征,则所述输出模块输出所述基片在所述机械手上悬挂到位的信息;当所述图像对比模块在所述检测图像识别出所述多个第一特征,则所述输出模块输出所述机械手上未挂所述基片的信息;当所述图像对比模块在所述检测图像识别出部分所述第一特征,则所述输出模块输出所述基片在所述机械手上未挂到位的信息;In an exemplary embodiment of the present disclosure, the manipulator is provided with a plurality of first features; when the image comparison module does not identify the first features in the detection image, the output module outputs The information that the substrate is hung in place on the manipulator; when the image comparison module recognizes the plurality of first features in the detection image, the output module outputs that the substrate is not hung on the manipulator. The information of the chip; when the image comparison module recognizes part of the first feature in the detection image, the output module outputs the information that the substrate is not hung in place on the manipulator;

所述转架上设有多个第二特征;当所述图像对比模块在所述检测图像未识别出所述第二特征,则所述输出模块输出所述基片在所述机械手上悬挂到位的信息;当所述图像对比模块在所述检测图像识别出所述多个第二特征,则所述输出模块输出所述转架上未挂所述基片的信息;当所述图像对比模块在所述检测图像识别出部分所述第二特征,则所述输出模块输出所述基片在所述转架上未悬挂到位的信息。A plurality of second features are provided on the turntable; when the image comparison module does not recognize the second features in the detection image, the output module outputs that the substrate is hung in place on the manipulator information; when the image comparison module recognizes the plurality of second features in the detection image, the output module outputs the information that the substrate is not hung on the turntable; when the image comparison module If part of the second feature is recognized in the detection image, the output module outputs information that the substrate is not suspended in place on the turntable.

在本公开的一种示例性实施例中,所述检测装置还包括:In an exemplary embodiment of the present disclosure, the detection device further includes:

显示模块,与所述输出模块连接,用于显示所述输出模块输出端的所述位置异常的信息和所述位置正常的信息;A display module, connected to the output module, for displaying information about the abnormal position and information about the normal position of the output terminal of the output module;

控制模块,与所述图像获取模块、所述图像对比模块、所述输出模块及所述显示模块连接。The control module is connected with the image acquisition module, the image comparison module, the output module and the display module.

本公开提供基片位置异常的检测方法,首先获取了基片分别位于机械手和转架上时的标准图像,接着获取基片重新分别位于机械手或转架上时的检测图像;判断标准图像中预设特征的位置与检测图像中预设特征的位置之间偏差是否在预设范围内;若不在预设范围内,则判断基片重新位于机械手或转架上的位置异常。基片位置异常通过视觉识别检测的可靠性高,且由于有简便的预设功能,操作简单快捷。The present disclosure provides a detection method for the abnormal position of the substrate. Firstly, the standard image when the substrate is respectively located on the manipulator and the turntable is obtained, and then the detection image is obtained when the substrate is respectively placed on the manipulator or the turntable again; Whether the deviation between the position of the preset feature and the position of the preset feature in the detection image is within the preset range; if it is not within the preset range, it is judged that the position of the substrate relocated on the manipulator or the turntable is abnormal. The abnormality of the substrate position is detected by visual recognition with high reliability, and due to the convenient preset function, the operation is simple and fast.

应当理解的是,以上的一般描述和后文的细节描述仅是示例性和解释性的,并不能限制本公开。It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the present disclosure.

附图说明Description of drawings

此处的附图被并入说明书中并构成本说明书的一部分,示出了符合本公开的实施例,并与说明书一起用于解释本公开的原理。显而易见地,下面描述中的附图仅仅是本公开的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。在附图中:The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the disclosure and together with the description serve to explain the principles of the disclosure. Apparently, the drawings in the following description are only some embodiments of the present disclosure, and those skilled in the art can obtain other drawings according to these drawings without creative efforts. In the attached picture:

图1为本公开的一种实施例提供的基片位置异常的检测方法的流程图;FIG. 1 is a flow chart of a method for detecting an abnormal substrate position provided by an embodiment of the present disclosure;

图2为本公开的一种实施例提供的镀膜机系统和视觉识别系统的示意图;FIG. 2 is a schematic diagram of a coating machine system and a visual recognition system provided by an embodiment of the present disclosure;

图3为本公开的一种实施例提供的视觉识别装置检测基片位置异常的工序图;FIG. 3 is a process diagram for detecting an abnormal position of a substrate by a visual recognition device provided by an embodiment of the present disclosure;

图4为本公开的一种实施例提供的视觉识别装置检测基片位置异常的工序图;FIG. 4 is a process diagram for detecting an abnormal position of a substrate by a visual recognition device provided by an embodiment of the present disclosure;

图5为本公开的一种实施例提供的机械手执行下片动作后的示意图;FIG. 5 is a schematic diagram of the manipulator after performing the unloading action provided by an embodiment of the present disclosure;

图6为本公开的一种实施例提供的机械手执行下片动作后基片不到位的示意图;FIG. 6 is a schematic diagram of the substrate not in place after the manipulator performs the unloading action provided by an embodiment of the present disclosure;

图7为本公开的一种实施例提供的机械手上未挂基片的示意图;FIG. 7 is a schematic diagram of an unhanging substrate on a manipulator provided by an embodiment of the present disclosure;

图8为本公开的一种实施例提供的机械手执行下片动作后基片偏转不到位的示意图;FIG. 8 is a schematic diagram of a deflection of the substrate that is not in place after the manipulator performs the unloading action provided by an embodiment of the present disclosure;

图9为本公开的一种实施例提供的机械手执行上片动作后基片位于转架上的示意图;FIG. 9 is a schematic diagram of a substrate positioned on a turntable after a manipulator performs a loading action according to an embodiment of the present disclosure;

图10为本公开的一种实施例提供的机械手执行上片动作后基片位于转架上不到位的示意图;FIG. 10 is a schematic diagram of the substrate being not in place on the turntable after the manipulator performs the loading action provided by an embodiment of the present disclosure;

图11为本公开的一种实施例提供的转架上未挂基片的示意图;FIG. 11 is a schematic diagram of an unhanging substrate on a turntable provided by an embodiment of the present disclosure;

图12为本公开的一种实施例提供的机械手执行上片动作后基片位于转架上偏转不到位的示意图;Fig. 12 is a schematic diagram of the substrate on the turntable after the manipulator performs the film loading action provided by an embodiment of the present disclosure;

图13为本公开的一种实施例提供的基片位置异常的检测装置的示意图。Fig. 13 is a schematic diagram of a detection device for an abnormal substrate position provided by an embodiment of the present disclosure.

具体实施方式Detailed ways

现在将参考附图更全面地描述示例实施方式。然而,示例实施方式能够以多种形式实施,且不应被理解为限于在此阐述的范例;相反,提供这些实施方式使得本公开将更加全面和完整,并将示例实施方式的构思全面地传达给本领域的技术人员。Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete and will fully convey the concept of example embodiments to those skilled in the art.

此外,所描述的特征、结构或特性可以以任何合适的方式结合在一个或更多实施例中。在下面的描述中,提供许多具体细节从而给出对本公开的实施例的充分理解。然而,本领域技术人员将意识到,可以实践本公开的技术方案而没有特定细节中的一个或更多,或者可以采用其它的方法、组元、装置、步骤等。在其它情况下,不详细示出或描述公知方法、装置、实现或者操作以避免模糊本公开的各方面。Furthermore, the described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided in order to give a thorough understanding of embodiments of the present disclosure. However, those skilled in the art will appreciate that the technical solutions of the present disclosure may be practiced without one or more of the specific details, or other methods, components, means, steps, etc. may be employed. In other instances, well-known methods, apparatus, implementations, or operations have not been shown or described in detail to avoid obscuring aspects of the present disclosure.

附图中所示的方框图仅仅是功能实体,不一定必须与物理上独立的实体相对应。即,可以采用软件形式来实现这些功能实体,或在一个或多个硬件模块或集成电路中实现这些功能实体,或在不同网络和/或处理器装置和/或微控制器装置中实现这些功能实体。The block diagrams shown in the drawings are merely functional entities and do not necessarily correspond to physically separate entities. That is, these functional entities may be implemented in software, or in one or more hardware modules or integrated circuits, or in different networks and/or processor devices and/or microcontroller devices entity.

附图中所示的流程图仅是示例性说明,不是必须包括所有的内容和操作/步骤,也不是必须按所描述的顺序执行。例如,有的操作/步骤还可以分解,而有的操作/步骤可以合并或部分合并,因此实际执行的顺序有可能根据实际情况改变。The flow charts shown in the drawings are only exemplary illustrations, and do not necessarily include all contents and operations/steps, nor must they be performed in the order described. For example, some operations/steps can be decomposed, and some operations/steps can be combined or partly combined, so the actual order of execution may be changed according to the actual situation.

本公开的实施例首先提供了一种基片位置异常的检测方法,如图1所示,该检测方法包括:Embodiments of the present disclosure firstly provide a detection method for substrate position abnormality, as shown in FIG. 1 , the detection method includes:

步骤S100、获取基片分别位于机械手和转架上时的标准图像;Step S100, obtaining standard images when the substrate is respectively located on the manipulator and the turntable;

步骤S200、获取基片重新分别位于机械手或转架上时的检测图像;Step S200, acquiring detection images when the substrate is repositioned on the manipulator or the turntable respectively;

步骤S300、判断标准图像中预设特征的位置与检测图像中预设特征的位置之间偏差是否在预设范围内;Step S300, judging whether the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is within a preset range;

步骤S400、若不在预设范围内,则判断基片重新位于机械手或转架上的位置异常。Step S400, if it is not within the preset range, it is judged that the position of the substrate on the manipulator or the turntable is abnormal.

本公开提供基片位置异常的检测方法,首先获取了基片分别位于机械手和转架上时的标准图像,接着获取基片重新分别位于机械手或转架上时的检测图像;判断标准图像中预设特征的位置与检测图像中预设特征的位置之间偏差是否在预设范围内;若不在预设范围内,则判断基片重新位于机械手或转架上的位置异常。基片位置异常通过视觉识别检测的可靠性高,且由于有简便的预设功能,操作简单快捷。The present disclosure provides a detection method for the abnormal position of the substrate. Firstly, the standard image when the substrate is respectively located on the manipulator and the turntable is obtained, and then the detection image is obtained when the substrate is respectively placed on the manipulator or the turntable again; Whether the deviation between the position of the preset feature and the position of the preset feature in the detection image is within the preset range; if it is not within the preset range, it is judged that the position of the substrate relocated on the manipulator or the turntable is abnormal. The abnormality of the substrate position is detected by visual recognition with high reliability, and due to the convenient preset function, the operation is simple and fast.

在本公开的一种实施例中,检测方法还包括:In one embodiment of the present disclosure, the detection method also includes:

步骤S500、若在预设范围内,则判断基片重新位于机械手或转架上的位置正常。Step S500, if it is within the preset range, it is judged that the position of the substrate on the manipulator or the turntable is normal again.

若标准图像中预设特征的位置与检测图像中预设特征的位置之间偏差在预设范围内,则判断基片重新移动至检测位置后的位置正常,实现了通过视觉识别算法识别基片的状态是否异常,有效地避免因位置不正确导致设备碰撞损坏的可能,可靠性高,操作简单快捷。If the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is within the preset range, it is judged that the position of the substrate after moving to the detection position is normal, and the recognition of the substrate by the visual recognition algorithm is realized. Whether the state of the device is abnormal, effectively avoiding the possibility of equipment collision damage due to incorrect position, high reliability, simple and fast operation.

下面,将对本公开提供的基片位置异常的检测方法中的各步骤进行详细的说明。In the following, each step in the method for detecting an abnormal substrate position provided by the present disclosure will be described in detail.

在步骤S100中,获取基片分别位于机械手和转架上时的标准图像。In step S100, the standard images when the substrate is respectively located on the manipulator and the turntable are acquired.

具体地,如图2所示,镀膜机包括装载腔、传输腔620和工艺腔630。传输腔620有一处于真空状态的机械手640,负责将装载腔中的基片搬运到工艺腔630,或者从工艺腔630搬运到装载腔。由于装载腔、传输腔620和工艺腔630工作时均为真空状态,而用于驱动机械手640运动的XO轴伺服电机650和转架670旋转的M轴伺服电机660不能在真空下工作,所以在传输腔620和工艺腔630上分别设置磁流体进行密封。工艺腔630上的M轴伺服电机660通过联轴器和磁流体一端连接,磁流体另一端也通过联轴器和转架670连接。传输腔620上的XO轴伺服电机650通过联轴器和另一磁流体一端连接,磁流体的另一端也是通过联轴器和机械手640连接。系统运行过程中,只要有一个联轴器打滑,都会造成运动部件位置不准确,从而造成基片位置不正。造成这种问题的情形主要分为:XO轴驱动的机械手640位置不正确、机械手640上的基片位置不正、M轴驱动的转架670位置不正确、转架670上的基片位置不正。Specifically, as shown in FIG. 2 , the coating machine includes a loading chamber, a transport chamber 620 and a process chamber 630 . The transfer chamber 620 has a robot arm 640 in a vacuum state, which is responsible for transporting the substrate in the loading chamber to the process chamber 630 or from the process chamber 630 to the loading chamber. Since the loading chamber, the transfer chamber 620 and the process chamber 630 work in a vacuum state, and the XO-axis servo motor 650 used to drive the manipulator 640 to move and the M-axis servo motor 660 to rotate the turntable 670 cannot work under vacuum, so in The transfer chamber 620 and the process chamber 630 are respectively provided with magnetic fluid for sealing. The M-axis servo motor 660 on the process chamber 630 is connected to one end of the magnetic fluid through a coupling, and the other end of the magnetic fluid is also connected to the turntable 670 through a coupling. The XO-axis servo motor 650 on the transmission chamber 620 is connected to one end of another magnetic fluid through a coupling, and the other end of the magnetic fluid is also connected to the manipulator 640 through a coupling. During the operation of the system, as long as a coupling slips, the position of the moving parts will be inaccurate, which will cause the substrate position to be incorrect. The situations that cause this problem are mainly divided into: the position of the manipulator 640 driven by the XO axis is not correct, the position of the substrate on the manipulator 640 is not correct, the position of the turntable 670 driven by the M axis is not correct, and the position of the substrate on the turntable 670 is not correct.

本公开针对机械手和转架上的基片位置不正的问题,在镀膜机上设有视觉识别装置,判别基片的状态,检测机械手640和转架670上的基片位置不正的问题。The present disclosure aims at the problem of improper position of the substrate on the manipulator and the turntable, and a visual recognition device is provided on the coating machine to judge the state of the substrate and detect the problem of incorrect position of the substrate on the manipulator 640 and the turntable 670.

其中,视觉识别装置包括工业相机和光源720、控制器710、显示器740、被检测物预设特征及辅助定位检测物。视觉识别装置包括基片位置判别算法。Among them, the visual recognition device includes an industrial camera and light source 720, a controller 710, a display 740, preset features of the detected object and auxiliary positioning of the detected object. The visual recognition device includes a substrate position discrimination algorithm.

具体地,视觉识别装置在传送腔上方设置观察窗730,工业相机和光源720架设在观察窗730上方,工作在大气状态下,观察窗730下方是真空状态下的机械手640。工业相机和光源720连接至控制器710,控制器710接收来自镀膜机控制系统610的指令,控制工业相机和光源720进行拍摄。显示器740用于显示被检测物的状态,并可通过界面设置相关参数。控制器710设有XO轴驱动的机械手位置视觉识别算法,M轴驱动的机械手位置视觉识别算法,基片位置视觉识别算法。Specifically, the visual identification device is provided with an observation window 730 above the transmission chamber. The industrial camera and light source 720 are erected above the observation window 730, and work in an atmospheric state. Below the observation window 730 is a robot arm 640 in a vacuum state. The industrial camera and light source 720 are connected to the controller 710, and the controller 710 receives instructions from the coating machine control system 610 to control the industrial camera and light source 720 to take pictures. The display 740 is used to display the state of the detected object, and related parameters can be set through the interface. The controller 710 is provided with an XO-axis driven manipulator position visual recognition algorithm, an M-axis driven manipulator position visual recognition algorithm, and a substrate position visual recognition algorithm.

其中,通过视觉识别装置获取基片在检测位置时的标准图像,以供后续对比使用。Wherein, the standard image of the substrate at the detection position is obtained by the visual recognition device for subsequent comparison.

在步骤S200中,获取基片重新分别位于机械手或转架上时的检测图像。In step S200, the detection images when the substrate is relocated on the manipulator or the turntable respectively are acquired.

具体地,如图3所示,首先启动视觉识别装置,向镀膜控制系统发送准备就绪信号,如图5所示,镀膜机控制系统驱动机械手执行下片动片,视觉识别装置启动光源和工业相机拍照,经过图像预处理后,获取机械手执行下片后的检测图像,即基片重新位于机械手上时的检测图像。Specifically, as shown in Figure 3, first start the visual recognition device, and send a ready signal to the coating control system, as shown in Figure 5, the coating machine control system drives the manipulator to execute the moving film, and the visual recognition device starts the light source and industrial camera Take a picture, and after image preprocessing, obtain the detection image after the manipulator performs unloading, that is, the detection image when the substrate is repositioned on the manipulator.

或者,如图9所示,镀膜机控制系统驱动机械手执行上片动片,视觉识别装置启动光源和工业相机拍照,经过图像预处理后,获取机械手执行上片后的检测图像,即基片重新位于转架上时的检测图像。Or, as shown in Figure 9, the control system of the coating machine drives the manipulator to load the film, and the visual recognition device starts the light source and the industrial camera to take pictures. Inspection image while on the turret.

在步骤S300中,判断标准图像中预设特征的位置与检测图像中预设特征的位置之间偏差是否在预设范围内。In step S300, it is determined whether the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detected image is within a preset range.

具体地,如图3所示,控制器调用基片位置异常检测算法,基片位置异常检测算法主要是检测基片是否偏移、是否为未挂基片或已挂基片、基片是否已经挂到位。Specifically, as shown in Figure 3, the controller invokes the substrate position anomaly detection algorithm. The substrate position anomaly detection algorithm mainly detects whether the substrate is offset, whether it is an unmounted substrate or a mounted substrate, and whether the substrate has been placed. Hang in place.

同时,通过对比基片位置异常检测算法对比标准图像与检测图像中的预设特征的位置,并判断预设特征的位置之间偏差是否在预设范围内。At the same time, compare the position of the preset feature in the standard image and the detection image by comparing the abnormal detection algorithm of the substrate position, and judge whether the deviation between the positions of the preset feature is within the preset range.

在本公开的一种实施例中,预设特征为多个特征点,包括分别位于基片上的结构特征、位于机械手上的结构特征和位于转架上的结构特征,以便于设置预设特征并对其进行提取。In one embodiment of the present disclosure, the preset feature is a plurality of feature points, including structural features on the substrate, on the manipulator, and on the turntable, so as to facilitate setting of the preset features and Extract it.

示例的,如图5所示,镀膜机控制系统驱动机械手执行下片动片,预设特征810为线特征,通过将预设特征810设置为线特征,便于对比标准图像与检测图像中预设特征的位置偏差;如图9所示,镀膜机控制系统驱动机械手执行上片动片,预设特征820为线特征,通过将预设特征820设置为线特征,便于对比标准图像与检测图像中预设特征的位置偏差。For example, as shown in Figure 5, the control system of the coating machine drives the manipulator to execute the moving film. The preset feature 810 is a line feature. By setting the preset feature 810 as a line feature, it is convenient to compare the standard image with the preset in the detection image. The positional deviation of the feature; as shown in Figure 9, the control system of the coating machine drives the manipulator to perform the loading of the film, and the preset feature 820 is a line feature. By setting the preset feature 820 as a line feature, it is convenient to compare the standard image and the detection image. Positional deviation of preset features.

其中,线特征可包括多个延伸方向,以判断基片在多个方向上是否存在位置异常。Wherein, the line feature may include multiple extending directions, so as to determine whether the substrate has position abnormality in multiple directions.

其中,标准图像与检测图像的边界位置一致,以便更加精确的对比标准图像与检测图像中预设特征的位置偏差。Wherein, the boundary positions of the standard image and the detection image are consistent, so as to compare the position deviation of the preset features in the standard image and the detection image more accurately.

在步骤S400中,若不在预设范围内,则判断基片重新位于机械手或转架上的位置异常。In step S400, if it is not within the preset range, it is determined that the position of the substrate on the manipulator or the turntable is abnormal.

具体地,如图3和图6所示,当镀膜机控制系统驱动机械手执行下片动片,若通过对比基片位置异常检测算法对比标准图像的预设特征810与检测图像中的预设特征810′的位置之间偏差A不在预设范围内,则判断基片800位置异常。Specifically, as shown in FIG. 3 and FIG. 6, when the control system of the coating machine drives the manipulator to execute the moving film, if the preset feature 810 of the standard image is compared with the preset feature in the detection image by comparing the abnormal detection algorithm of the substrate position If the deviation A between the positions of 810' is not within the preset range, it is determined that the position of the substrate 800 is abnormal.

如图3和图10所示,当镀膜机控制系统驱动机械手执行上片动片,若通过对比基片位置异常检测算法对比标准图像的预设特征820与检测图像中的预设特征820′的位置之间偏差B不在预设范围内,则判断基片800位置异常。As shown in Figure 3 and Figure 10, when the control system of the coating machine drives the manipulator to perform the loading of the moving film, if the difference between the preset feature 820 of the standard image and the preset feature 820' in the detection image is compared by comparing the abnormal detection algorithm of the substrate position If the deviation B between the positions is not within the preset range, it is determined that the position of the substrate 800 is abnormal.

其中,如检测出异常,则向镀膜控制系统发送报警信号和异常信息,镀膜机控制系统进行处理。Among them, if an abnormality is detected, an alarm signal and abnormal information will be sent to the coating control system, and the coating machine control system will process it.

在步骤S500中,若在预设范围内,则判断基片重新位于机械手或转架上的位置正常。In step S500, if it is within the preset range, it is judged that the position of the substrate on the manipulator or the turntable is normal.

具体地,如图3所示,若通过对比基片位置异常检测算法对比标准图像与检测图像中的预设特征的位置之间偏差在预设范围内,则判断基片重新移动至检测位置后的位置正常,向镀膜控制系统发送正常信号。Specifically, as shown in Figure 3, if the deviation between the position of the preset feature in the standard image and the detection image is within the preset range by comparing the abnormal detection algorithm of the substrate position, it is determined that the substrate has moved to the detection position again. The position is normal, and a normal signal is sent to the coating control system.

在本公开的一种实施例中,如图7所示,机械手上设有多个第一特征641。如图4和图5所示,当镀膜机控制系统驱动机械手执行下片动作,且当在检测图像未识别出第一特征641,则判断基片800在机械手640上悬挂到位;如图7所示,当在检测图像识别出多个第一特征641,则判断机械手640上未挂基片800;如图8所示,当在检测图像识别出部分第一特征641,则判断基片800在机械手640上未挂到位。其中,第一特征641为机械手640上挂钩的结构特征。In an embodiment of the present disclosure, as shown in FIG. 7 , a plurality of first features 641 are provided on the manipulator. As shown in Figure 4 and Figure 5, when the control system of the coating machine drives the manipulator to perform the unloading action, and when the first feature 641 is not recognized in the detection image, it is judged that the substrate 800 is suspended on the manipulator 640 in place; as shown in Figure 7 As shown, when a plurality of first features 641 are recognized in the detection image, it is judged that the substrate 800 is not hung on the manipulator 640; as shown in FIG. The manipulator 640 is not in place. Wherein, the first feature 641 is a structural feature of the hook on the manipulator 640 .

在本公开的一种实施例中,如图11所示,转架上设有多个第二特征671。如图4和图9所示,当镀膜机控制系统驱动机械手执行上片动作,且当在检测图像未识别出第二特征671,则判断基片800在转架670上悬挂到位;如图11所示,当在检测图像识别出多个第二特征,则判断转架670上未挂基片800;如图12所示,当在检测图像识别出部分第二特征671,则判断基片800在转架670上未悬挂到位。其中,第二特征671为转架670上挂钩的结构特征。In one embodiment of the present disclosure, as shown in FIG. 11 , a plurality of second features 671 are provided on the turret. As shown in Figure 4 and Figure 9, when the control system of the coating machine drives the manipulator to perform the loading action, and when the second feature 671 is not recognized in the detection image, it is determined that the substrate 800 is suspended on the turntable 670 in place; as shown in Figure 11 As shown, when a plurality of second features are recognized in the detection image, it is judged that the substrate 800 is not hung on the turntable 670; as shown in FIG. Not hanging in place on turret 670. Wherein, the second feature 671 is a structural feature of the hook on the turntable 670 .

本公开的实施例还供了一种基片位置异常的检测装置,如图13所示,该检测装置900包括:Embodiments of the present disclosure also provide a detection device for an abnormal substrate position. As shown in FIG. 13 , the detection device 900 includes:

图像获取模块910,用于获取基片分别位于机械手和转架上时的标准图像,以及基片重新分别位于机械手或转架上时的检测图像;An image acquisition module 910, configured to acquire a standard image when the substrate is respectively placed on the manipulator and the turntable, and a detection image when the substrate is respectively placed on the manipulator or the turntable;

图像对比模块920,与图像获取模块910连接,图像对比模块920被配置为判断标准图像中预设特征的位置与检测图像中预设特征的位置之间偏差是否在预设范围内;The image comparison module 920 is connected to the image acquisition module 910, and the image comparison module 920 is configured to determine whether the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is within a preset range;

输出模块930,与图像对比模块920连接,若标准图像中预设特征的位置与检测图像中预设特征的位置之间偏差不在预设范围内,则输出基片重新位于机械手或转架上位置异常的信息。The output module 930 is connected to the image comparison module 920. If the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is not within the preset range, the output substrate is relocated to the position on the manipulator or the turntable unusual information.

本公开提供基片位置异常的检测装置,图像获取模块首先获取了基片分别位于机械手和转架上时的标准图像,接着获取基片重新分别位于机械手或转架上时的检测图像;图像对比模块判断标准图像中预设特征的位置与检测图像中预设特征的位置之间偏差是否在预设范围内;若不在预设范围内,则输出模块输出基片重新位于机械手或转架上位置异常的信息。基片位置异常通过视觉识别检测的可靠性高,且由于有简便的预设功能,操作简单快捷。The disclosure provides a detection device for substrate position abnormality. The image acquisition module first acquires the standard images when the substrate is respectively located on the manipulator and the turntable, and then acquires the detection image when the substrate is respectively placed on the manipulator or the turntable again; image comparison The module judges whether the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is within the preset range; if it is not within the preset range, the output module outputs the substrate and repositions it on the manipulator or the turntable unusual information. The abnormality of the substrate position is detected by visual recognition with high reliability, and due to the convenient preset function, the operation is simple and fast.

在本公开的一种实施例中,若图像对比模块920对比出标准图像中预设特征的位置与检测图像中预设特征的位置之间偏差在预设范围内,则输出基片重新位于机械手或转架上位置正常的信息。In one embodiment of the present disclosure, if the image comparison module 920 compares that the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is within a preset range, the output substrate is relocated to the manipulator Or the information that the position on the carousel is normal.

在本公开的一种实施例中,检测装置还包括:显示模块,显示模块与输出模块连接,用于显示输出模块输出端的位置异常信息和位置正常信息。In an embodiment of the present disclosure, the detection device further includes: a display module connected to the output module for displaying abnormal position information and normal position information of the output terminal of the output module.

在本公开的一种实施例中,检测装置还包括:控制模块。控制模块与图像获取模块、图像对比模块、输出模块及显示模块连接,控制图像获取模块、图像对比模块、输出模块及显示模块连接进行工作。In an embodiment of the present disclosure, the detection device further includes: a control module. The control module is connected with the image acquisition module, the image comparison module, the output module and the display module, and controls the connection of the image acquisition module, the image comparison module, the output module and the display module to work.

其中,图像获取模块910可包括工业相机和光源720;图像对比模块920、输出模块930与控制模块可集成在控制器710中;显示模块可包括显示器740。Wherein, the image acquisition module 910 may include an industrial camera and a light source 720 ; the image comparison module 920 , the output module 930 and the control module may be integrated in the controller 710 ; the display module may include a display 740 .

在本公开的一种实施例中,机械手上设有多个第一特征;当图像对比模块在检测图像未识别出第一特征,则输出模块输出基片在机械手上悬挂到位的信息;当图像对比模块在检测图像识别出多个第一特征,则输出模块输出机械手上未挂基片的信息;当图像对比模块在检测图像识别出部分第一特征,则输出模块输出基片在机械手上未挂到位的信息;In an embodiment of the present disclosure, the manipulator is provided with a plurality of first features; when the image comparison module does not recognize the first feature in the detection image, the output module outputs the information that the substrate is suspended on the manipulator; when the image When the comparison module recognizes multiple first features in the detection image, the output module outputs information that the substrate is not hung on the manipulator; when the image comparison module recognizes some first features in the detection image, the output module outputs the information that the substrate is not hung on the manipulator information in place;

在本公开的一种实施例中,转架上设有多个第二特征;当图像对比模块在检测图像未识别出第二特征,则输出模块输出基片在机械手上悬挂到位的信息;当图像对比模块在检测图像识别出多个第二特征,则输出模块输出转架上未挂基片的信息;当图像对比模块在检测图像识别出部分第二特征,则输出模块输出基片在转架上未悬挂到位的信息。In an embodiment of the present disclosure, multiple second features are provided on the turntable; when the image comparison module does not recognize the second feature in the detection image, the output module outputs the information that the substrate is suspended on the manipulator; when When the image comparison module recognizes multiple second features in the detection image, the output module outputs the information that the substrate is not hung on the turntable; Information not hanging in place on shelf.

本领域技术人员在考虑说明书及实践这里公开的发明后,将容易想到本公开的其它实施方案。本申请旨在涵盖本公开的任何变型、用途或者适应性变化,这些变型、用途或者适应性变化遵循本公开的一般性原理并包括本公开未公开的本技术领域中的公知常识或惯用技术手段。说明书和实施例仅被视为示例性的,本公开的真正范围和精神由下面的权利要求指出。Other embodiments of the present disclosure will be readily apparent to those skilled in the art from consideration of the specification and practice of the invention disclosed herein. This application is intended to cover any modification, use or adaptation of the present disclosure, and these modifications, uses or adaptations follow the general principles of the present disclosure and include common knowledge or conventional technical means in the technical field not disclosed in the present disclosure . The specification and examples are to be considered exemplary only, with a true scope and spirit of the disclosure being indicated by the following claims.

应当理解的是,本公开并不局限于上面已经描述并在附图中示出的精确结构,并且可以在不脱离其范围进行各种修改和改变。本公开的范围仅由所附的权利要求来限制。It should be understood that the present disclosure is not limited to the precise constructions which have been described above and shown in the drawings, and various modifications and changes may be made without departing from the scope thereof. The scope of the present disclosure is limited only by the appended claims.

Claims (10)

1.一种基片位置异常的检测方法,其特征在于,包括:1. A detection method for substrate position abnormality, characterized in that, comprising: 获取基片分别位于机械手和转架上时的标准图像;Obtain standard images when the substrate is on the manipulator and the turntable respectively; 获取基片重新分别位于机械手或转架上时的检测图像;Obtain the inspection image when the substrate is relocated on the manipulator or the turntable respectively; 判断所述标准图像中预设特征的位置与所述检测图像中所述预设特征的位置之间偏差是否在预设范围内;judging whether the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is within a preset range; 若不在所述预设范围内,则判断所述基片重新位于机械手或转架上的位置异常。If it is not within the preset range, it is judged that the position where the substrate is repositioned on the manipulator or the turntable is abnormal. 2.根据权利要求1所述的检测方法,其特征在于,所述检测方法还包括:2. detection method according to claim 1, is characterized in that, described detection method also comprises: 若在所述预设范围内,则判断所述基片重新位于机械手或转架上的位置正常。If it is within the preset range, it is judged that the position of the substrate on the manipulator or the turntable is normal again. 3.根据权利要求1所述的检测方法,其特征在于,所述预设特征为多个特征点,包括位于所述基片上的结构特征、位于机械手上的结构特征和位于转架上的结构特征。3. The detection method according to claim 1, wherein the preset feature is a plurality of feature points, including structural features on the substrate, structural features on the manipulator, and structures on the turntable feature. 4.根据权利要求1所述的检测方法,其特征在于,所述预设特征为线特征。4. The detection method according to claim 1, wherein the preset feature is a line feature. 5.根据权利要求1所述的检测方法,其特征在于,所述机械手上设有多个第一特征;当在所述检测图像未识别出所述第一特征,则判断所述基片在所述机械手片上悬挂到位;当在所述检测图像识别出所述多个第一特征,则判断所述机械手上未挂所述基片;当在所述检测图像识别出部分所述第一特征,则判断所述基片在所述机械手上未挂到位;5. The detection method according to claim 1, wherein the manipulator is provided with a plurality of first features; when the first features are not recognized in the detection image, it is judged that the substrate is The manipulator is suspended in place; when the plurality of first features are recognized in the detection image, it is judged that the substrate is not hung on the manipulator; when part of the first features are recognized in the detection image , it is judged that the substrate is not hung in place on the manipulator; 所述转架上设有多个第二特征;当在所述检测图像未识别出所述第二特征,则判断所述基片在所述转架上悬挂到位;当在所述检测图像识别出所述多个第二特征,则判断所述转架上未挂所述基片;当在所述检测图像识别出部分所述第二特征,则判断所述基片在所述转架上未悬挂到位。The turntable is provided with a plurality of second features; when the second feature is not recognized in the detection image, it is judged that the substrate is suspended in place on the turntable; If the multiple second features are detected, it is judged that the substrate is not hung on the turntable; when part of the second features are recognized in the detection image, it is judged that the substrate is on the turntable Not hanging in place. 6.根据权利要求1所述的检测方法,其特征在于,所述标准图像与所述检测图像的边界位置一致。6 . The detection method according to claim 1 , wherein the boundary position of the standard image is consistent with that of the detection image. 6 . 7.一种基片位置异常的检测装置,其特征在于,包括:7. A detection device for abnormal substrate position, characterized in that it comprises: 图像获取模块,用于获取基片分别位于机械手和转架上时的标准图像,以及基片重新分别位于机械手或转架上时的检测图像;The image acquisition module is used to obtain the standard image when the substrate is respectively located on the manipulator and the turntable, and the detection image when the substrate is respectively placed on the manipulator or the turntable; 图像对比模块,与所述图像获取模块连接,所述图像对比模块被配置为判断所述标准图像中预设特征的位置与所述检测图像中所述预设特征的位置之间偏差是否在预设范围内;An image comparison module, connected to the image acquisition module, the image comparison module is configured to determine whether the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is within a preset range. within the set range; 输出模块,与所述图像对比模块连接,若所述标准图像中预设特征的位置与所述检测图像中所述预设特征的位置之间偏差不在所述预设范围内,则输出所述基片重新位于机械手或转架上位置异常的信息。An output module, connected to the image comparison module, if the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is not within the preset range, then output the Information about substrate repositioning on the robot or turret where it is out of position. 8.根据权利要求7所述的检测装置,其特征在于,若所述标准图像中预设特征的位置与所述检测图像中所述预设特征的位置之间偏差在所述预设范围内,则输出所述基片重新位于机械手或转架上位置正常的信息。8. The detection device according to claim 7, wherein if the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is within the preset range , then output the information that the substrate is located on the manipulator or the turntable again and the position is normal. 9.根据权利要求7所述的检测装置,其特征在于,所述机械手上设有多个第一特征;当所述图像对比模块在所述检测图像未识别出所述第一特征,则所述输出模块输出所述基片在所述机械手上悬挂到位的信息;当所述图像对比模块在所述检测图像识别出所述多个第一特征,则所述输出模块输出所述机械手上未挂所述基片的信息;当所述图像对比模块在所述检测图像识别出部分所述第一特征,则所述输出模块输出所述基片在所述机械手上未挂到位的信息;9. The detection device according to claim 7, wherein the manipulator is provided with a plurality of first features; when the image comparison module does not identify the first features in the detection image, the The output module outputs the information that the substrate is hung in place on the manipulator; when the image comparison module recognizes the plurality of first features in the detection image, the output module outputs the information that is not on the manipulator. Hanging the information of the substrate; when the image comparison module recognizes part of the first feature in the detection image, the output module outputs the information that the substrate is not hung on the manipulator; 所述转架上设有多个第二特征;当所述图像对比模块在所述检测图像未识别出所述第二特征,则所述输出模块输出所述基片在所述机械手上悬挂到位的信息;当所述图像对比模块在所述检测图像识别出所述多个第二特征,则所述输出模块输出所述转架上未挂所述基片的信息;当所述图像对比模块在所述检测图像识别出部分所述第二特征,则所述输出模块输出所述基片在所述转架上未悬挂到位的信息。A plurality of second features are provided on the turntable; when the image comparison module does not recognize the second features in the detection image, the output module outputs that the substrate is hung in place on the manipulator information; when the image comparison module recognizes the plurality of second features in the detection image, the output module outputs the information that the substrate is not hung on the turntable; when the image comparison module If part of the second feature is identified in the detection image, the output module outputs information that the substrate is not suspended in place on the turntable. 10.根据权利要求8所述的检测装置,其特征在于,所述检测装置还包括:10. detection device according to claim 8, is characterized in that, described detection device also comprises: 显示模块,与所述输出模块连接,用于显示所述输出模块输出端的所述位置异常的信息和所述位置正常的信息;A display module, connected to the output module, for displaying information about the abnormal position and information about the normal position of the output terminal of the output module; 控制模块,与所述图像获取模块、所述图像对比模块、所述输出模块及所述显示模块连接。The control module is connected with the image acquisition module, the image comparison module, the output module and the display module.
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