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CN115259308A - Device and method for treating wastewater by atomizing plasma - Google Patents

Device and method for treating wastewater by atomizing plasma Download PDF

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Publication number
CN115259308A
CN115259308A CN202210951134.6A CN202210951134A CN115259308A CN 115259308 A CN115259308 A CN 115259308A CN 202210951134 A CN202210951134 A CN 202210951134A CN 115259308 A CN115259308 A CN 115259308A
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plasma
wastewater
atomized
fixing plate
blades
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杨德正
李瑶
陈金成
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Jinzhou Sihai Biochemistry Co ltd
Dalian University of Technology
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Jinzhou Sihai Biochemistry Co ltd
Dalian University of Technology
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/48Treatment of water, waste water, or sewage with magnetic or electric fields

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  • Life Sciences & Earth Sciences (AREA)
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  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

The invention discloses a device and a method for treating wastewater by atomized plasma, wherein the wastewater to be treated is atomized into uniform liquid drops by an atomization system on the upper part of the device and sprayed to a discharge plasma area on the lower part of the device; the atomized wastewater passes through a discharge plasma region and is directly contacted with plasma for treatment; the treated wastewater automatically enters a collecting device to be circularly treated. The invention adopts the method for treating the wastewater by the atomized plasma to separate the atomized area from the plasma area, the plasma characteristic is not influenced by the wastewater, and the method is suitable for treating the industrial wastewater with different components. The removal rate of COD of the industrial wastewater with different high concentrations after being treated by the method is higher than 99 percent.

Description

雾化等离子体处理废水的装置及其方法Device and method for treating wastewater with atomized plasma

技术领域technical field

本发明涉及等离子体技术处理废水领域,尤其涉及一种雾化等离子体处理废水的装置及其方法。The invention relates to the field of plasma technology for treating wastewater, in particular to a device and method for treating wastewater with atomized plasma.

背景技术Background technique

水环境污染已成为当今世界亟待解决的重点问题。随着我国化工、纺织、印染以及医药行业的不断发展,废水成分越来越复杂,废水排放量越来越大,对生态平衡乃至人体的健康造成了严重的影响。传统的生物处理法以及物理化学处理法等已无法解决废水中的复杂组分,难以达到废水的净化以及排放标准。面对此境况,等离子体技术作为一种零污染、低排放环境友好型的高级氧化技术应运而生,该技术利用高压放电能够产生具有强氧化性的自由基,高能电子,处于激发态的原子分子等高活性的粒子,从而可以与废水中的复杂成分进行反应,将大分子污染物裂解为小分子安全物质,与此同时,等离子体技术所具有的光热特性会促进污染物的降解反应的进行。Water pollution has become an urgent problem in the world today. With the continuous development of my country's chemical, textile, printing and dyeing and pharmaceutical industries, the composition of wastewater is becoming more and more complex, and the amount of wastewater discharge is increasing, which has a serious impact on ecological balance and human health. Traditional biological treatment methods and physical and chemical treatment methods have been unable to solve the complex components in wastewater, and it is difficult to meet the purification and discharge standards of wastewater. Faced with this situation, plasma technology emerged as a zero-pollution, low-emission, environmentally friendly advanced oxidation technology. This technology uses high-voltage discharge to generate strong oxidizing free radicals, high-energy electrons, and atoms in an excited state. Molecules and other highly active particles can react with complex components in wastewater to crack macromolecular pollutants into small molecular safe substances. At the same time, the photothermal characteristics of plasma technology will promote the degradation of pollutants. carried out.

目前,已有不同形式的放电等离子体技术应用于废水处理,但均存在等离子体与废水的有效接触面积小,处理效率低,适用的废水类型有限等问题。国内申请号201110191165.8中公开的“一种低温等离子体水处理装置”中提出利用介质阻挡放电产生的等离子体处理深度为5.0-10.0cm的废水,降低废水中所含污染物的浓度,然而,放电等离子体区域不能完全覆盖5.0-10.0cm深度的废水,且该种形式产生的放电等离子体处理废水的效果受到废水电导率的限制。At present, different forms of discharge plasma technology have been applied to wastewater treatment, but there are problems such as small effective contact area between plasma and wastewater, low treatment efficiency, and limited types of applicable wastewater. "A Low-Temperature Plasma Water Treatment Device" disclosed in the domestic application number 201110191165.8 proposes to use the plasma generated by dielectric barrier discharge to treat wastewater with a depth of 5.0-10.0cm to reduce the concentration of pollutants contained in wastewater. However, the discharge The plasma area cannot completely cover the wastewater at a depth of 5.0-10.0cm, and the effect of the discharge plasma generated in this form to treat wastewater is limited by the conductivity of the wastewater.

国内申请号201610324278.3中公开的“一种水下脉冲旋转滑动弧低温等离子体污水处理装置”中提出利用水下滑动弧放电等离子体进行污水处理,该方法也存在放电等离子体特性受废水电导率影响,适用的废水类型有限的问题。因此,开发出一种能大批量高效处理多类型废水的方法势在必行。Domestic application number 201610324278.3 discloses "an underwater pulse rotating sliding arc low-temperature plasma sewage treatment device" which proposes to use underwater sliding arc discharge plasma for sewage treatment. This method also has the characteristics of discharge plasma affected by the conductivity of wastewater. , applicable to limited types of wastewater. Therefore, it is imperative to develop a method that can efficiently treat multiple types of wastewater in large quantities.

发明内容Contents of the invention

本发明的目的是提供一种雾化等离子体处理废水的装置及其方法,采用具有高功率输出的电源激励产生高能量密度的等离子体,使雾化的废水可以全部经过放电等离子体区域,提高等离子体与废水的有效接触面积以及废水处理量,满足不同类型的废水处理需求以及大规模工业应用的需求。The object of the present invention is to provide a device and method for treating wastewater with atomized plasma, which uses a power supply with high power output to stimulate plasma with high energy density, so that the atomized wastewater can pass through the discharge plasma area, improving The effective contact area between plasma and wastewater and the wastewater treatment capacity can meet the needs of different types of wastewater treatment and large-scale industrial applications.

为实现上述目的,采用的技术方案如下:In order to achieve the above purpose, the technical scheme adopted is as follows:

具体方法为:The specific method is:

雾化等离子体处理废水的装置,包括雾化系统,装置壳体,至少一组滑动弧电极;A device for treating wastewater with atomized plasma, including an atomizing system, a device housing, and at least one set of sliding arc electrodes;

雾化系统,包括雾化喷嘴、喷嘴固定板,雾化喷嘴固定在喷嘴固定板上,喷嘴固定板位于装置壳体上方;The atomization system includes an atomization nozzle and a nozzle fixing plate, the atomization nozzle is fixed on the nozzle fixing plate, and the nozzle fixing plate is located above the device housing;

装置壳体内自上到下依次为雾化区域、等离子区域;From top to bottom in the device housing, there are atomization area and plasma area;

每组滑动弧电极包括两个刀片和一个起弧吹气管,两个刀片均固定于电极侧固定板上,两个刀片之间留有距离,距离为1mm;两个刀片分别与交流高压电源、地线相连;Each set of sliding arc electrodes includes two blades and an arc blowing pipe. The two blades are fixed on the fixed plate on the electrode side. There is a distance between the two blades, the distance is 1mm; connected to ground;

起弧吹气管位于两个刀片之间,并安装在电极侧固定板圆心处,起弧吹气管前端短于刀片底端,起弧吹气管前端与刀片底端的距离为0.5mm;The arc blowing pipe is located between the two blades and installed at the center of the fixed plate on the electrode side. The front end of the arc blowing pipe is shorter than the bottom end of the blade, and the distance between the front end of the arc blowing pipe and the bottom end of the blade is 0.5mm;

将滑动弧电极分别安装于装置壳体等离子区域侧边的支口处;Install the sliding arc electrodes respectively at the branch openings on the side of the plasma area of the device housing;

装置壳体底部设有出水口,出水口处设有收集装置。A water outlet is provided at the bottom of the device housing, and a collecting device is provided at the water outlet.

装置壳体的支口为圆柱形,倾斜设置,其中心轴线与竖直方向的夹角为30-60°The fulcrum of the device housing is cylindrical and inclined, and the angle between the central axis and the vertical direction is 30-60°

滑动弧电极的刀片为滑动弧刀片,尾端设有螺纹杆,通过螺纹安装在电极侧固定板上;The blade of the sliding arc electrode is a sliding arc blade, with a threaded rod at the end, which is installed on the fixed plate on the electrode side through threads;

电极侧固定板上设有多组不同间距的螺纹孔,用于安装螺纹杆。There are multiple sets of threaded holes with different pitches on the fixed plate on the electrode side for installing threaded rods.

雾化等离子体处理废水的方法,将待处理的废水通过装置上部雾化系统雾化成均匀的液滴,向装置下部的等离子区域喷洒;雾化后的废水将全部经过等离子区域并与等离子体直接接触进行处理;处理后的废水自动进入收集装置以待进行循环处理。The method of treating wastewater with atomized plasma, the wastewater to be treated is atomized into uniform droplets through the atomization system on the upper part of the device, and sprayed to the plasma area at the lower part of the device; the atomized wastewater will all pass through the plasma area and directly contact with the plasma Contact for treatment; the treated wastewater automatically enters the collection device for recycling.

所述的被雾化的废水的流量为不大于10L/min,喷洒的距离小于1m,喷洒角度不大于100°,雾化的液滴直径小于50μm。The flow rate of the atomized wastewater is not greater than 10L/min, the spraying distance is less than 1m, the spraying angle is not greater than 100°, and the diameter of the atomized droplets is less than 50μm.

所述的等离子区域由滑动弧电极(4)产生,滑动弧电极(4)由高压交流电源驱动,输出电压不大于40kV,频率不高于25kHz。The plasma region is generated by the sliding arc electrode (4), and the sliding arc electrode (4) is driven by a high-voltage AC power supply, the output voltage is not greater than 40kV, and the frequency is not higher than 25kHz.

起弧吹气管中通入流速1-10L/min的空气、氧气、氮气或者其不同比例的混合气体。Air, oxygen, nitrogen or their mixed gas with a flow rate of 1-10L/min is passed into the arc blowing pipe.

与现有技术相比,本发明的废水处理方法及装置有以下优点:Compared with the prior art, the wastewater treatment method and device of the present invention have the following advantages:

本发明提供的雾化等离子体处理废水的方法及装置将雾化系统与等离子体区域分离,等离子体特性不受废水影响,可适用于不同组分废水的处理;The method and device for treating wastewater with atomized plasma provided by the present invention separate the atomizing system from the plasma area, and the characteristics of the plasma are not affected by the wastewater, and can be applied to the treatment of wastewater with different components;

本发明提供的雾化等离子体处理废水的方法及装置将污水雾化后再经过等离子体区域进行处理,滑动弧电极处于雾化喷嘴正下方,所有雾化的废水均可经过等离子体区域,有效的提高了污水与等离子体的接触面积,提高了污水的处理效率。The method and device for treating wastewater with atomized plasma provided by the present invention atomize the sewage and then pass through the plasma area for treatment. The sliding arc electrode is located directly under the atomizing nozzle, and all atomized wastewater can pass through the plasma area, effectively The contact area between sewage and plasma is greatly improved, and the treatment efficiency of sewage is improved.

本发明提供的雾化等离子体处理废水的方法及装置操作简便,成本低廉,处理污水量大,可满足工业需要。The method and device for treating wastewater with atomized plasma provided by the invention are easy to operate, low in cost, and have a large amount of treated sewage, which can meet industrial needs.

本发明提供的雾化等离子体处理废水的方法及装置在处理污水的过程中不需要添加化学试剂以及催化剂,不会产生二次污染,有利于环保。The method and device for treating wastewater with atomized plasma provided by the present invention do not need to add chemical reagents and catalysts in the process of treating wastewater, do not generate secondary pollution, and are beneficial to environmental protection.

附图说明Description of drawings

图1是本发明一种雾化等离子体处理废水的装置结构示意图。Fig. 1 is a schematic structural diagram of a device for treating wastewater with atomized plasma according to the present invention.

图中:1-雾化喷嘴、2-喷嘴固定板、3-装置壳体、4-滑动弧电极、5-起弧吹气管、6-电极侧固定板、7-出水口、8-高压电源、9-支口、10-收集装置。In the figure: 1-atomizing nozzle, 2-nozzle fixing plate, 3-device shell, 4-sliding arc electrode, 5-arc blowing pipe, 6-electrode side fixing plate, 7-water outlet, 8-high voltage power supply , 9-branch, 10-collection device.

具体实施方式Detailed ways

下面结合说明书附图对本发明的实施方式进行具体的说明。Embodiments of the present invention will be specifically described below in conjunction with the accompanying drawings.

如图1所示,雾化等离子体处理废水的装置,包括雾化系统,装置壳体3,至少一组滑动弧电极4;As shown in Figure 1, the device for treating wastewater with atomized plasma includes an atomizing system, a device housing 3, and at least one set of sliding arc electrodes 4;

雾化系统,包括雾化喷嘴1、喷嘴固定板2,雾化喷嘴1固定在喷嘴固定板2上,喷嘴固定板2位于装置壳体3上方;The atomization system includes an atomization nozzle 1 and a nozzle fixing plate 2, the atomization nozzle 1 is fixed on the nozzle fixing plate 2, and the nozzle fixing plate 2 is located above the device housing 3;

装置壳体3内自上到下依次为雾化区域、等离子区域;Inside the device housing 3, from top to bottom, there are atomization area and plasma area;

装置壳体3为密封的有机玻璃壳体,装置壳体3为正方体,长度为300-500mm。装置壳体3等离子区域的正面、背面、左侧面、以及右侧面的中心位置处分别开有支口9,支口9为圆柱形,其中心轴线与竖直方向的夹角为30-60°,支口9长度为50-250mm。The device casing 3 is a sealed plexiglass casing, and the device casing 3 is a cube with a length of 300-500mm. The front, back, left side, and right side of the plasma area of the device housing 3 are respectively provided with branch openings 9 at the central positions. The branch openings 9 are cylindrical, and the angle between the central axis and the vertical direction is 30- 60 °, the length of the branch port 9 is 50-250mm.

每组滑动弧电极4包括两个刀片和一个起弧吹气管5,两个刀片均固定于电极侧固定板6上,两个刀片之间留有距离,距离为1mm;两个刀片分别与交流高压电源8、地线相连;Each group of sliding arc electrodes 4 includes two blades and an arc blowing pipe 5, and the two blades are fixed on the electrode side fixing plate 6, leaving a distance of 1mm between the two blades; the two blades are respectively connected to the AC High-voltage power supply 8, connected to the ground wire;

起弧吹气管5位于两个刀片之间,并安装在电极侧固定板6圆心处,起弧吹气管5前端短于刀片底端,起弧吹气管5前端与刀片底端的距离为0.5mm;The arcing air blowing pipe 5 is located between the two blades and is installed at the center of the electrode side fixing plate 6. The front end of the arcing air blowing pipe 5 is shorter than the bottom end of the blade, and the distance between the front end of the arcing air blowing pipe 5 and the bottom end of the blade is 0.5mm;

将滑动弧电极4分别安装于装置壳体3等离子区域侧边的支口9处;The sliding arc electrodes 4 are respectively installed at the branch 9 on the side of the plasma area of the device housing 3;

装置壳体3底部设有出水口7,出水口7处设有收集装置10。收集装置10为密封的绝缘箱体,容积为不小于375L。A water outlet 7 is provided at the bottom of the device housing 3, and a collecting device 10 is provided at the water outlet 7. The collection device 10 is a sealed insulating box with a volume of not less than 375L.

装置壳体3的支口9为圆柱形,倾斜设置,其中心轴线与竖直方向的夹角为30-60°。The branch 9 of the device housing 3 is cylindrical and inclined, and the angle between its central axis and the vertical direction is 30-60°.

滑动弧电极4的刀片为滑动弧刀片,尾端设有螺纹杆,通过螺纹安装在电极侧固定板6上;The blade of the sliding arc electrode 4 is a sliding arc blade, and the tail end is provided with a threaded rod, which is installed on the electrode side fixing plate 6 through threads;

电极侧固定板6上设有多组不同间距的螺纹孔,用于安装螺纹杆。The fixed plate 6 on the electrode side is provided with multiple sets of threaded holes with different pitches for installing threaded rods.

具体的:所滑动弧电极4的刀片材质为304白钢,长度为100-120mm,螺纹杆的长度为100-200mm,通过改变螺纹杆的长度可以改变雾化系统与等离子体区域的距离。Specifically: the blade material of the sliding arc electrode 4 is 304 white steel, the length is 100-120 mm, and the length of the threaded rod is 100-200 mm. By changing the length of the threaded rod, the distance between the atomization system and the plasma area can be changed.

电极侧固定板6圆心处开有直径为4-6mm的圆孔用于固定起弧吹气管5;电极侧固定板6上呈中心对称的开有5对圆孔,用于固定滑动弧电极4的螺纹杆,圆孔直径与螺纹杆直径一致,5对圆孔圆心间的距离不同,通过选择不同的用于固定刀片的圆孔,可以改变一组滑动弧电极4的中两个刀片之间的距离,其距离为1-5mm可调。There is a round hole with a diameter of 4-6mm in the center of the electrode side fixing plate 6 for fixing the arc blowing pipe 5; the electrode side fixing plate 6 is centered with 5 pairs of round holes symmetrical to the center for fixing the sliding arc electrode 4 The diameter of the round hole is the same as that of the threaded rod, and the distances between the centers of the five pairs of round holes are different. By selecting different round holes for fixing the blades, the distance between the two blades in a set of sliding arc electrodes 4 can be changed. The distance is adjustable from 1-5mm.

雾化等离子体处理废水的方法,将待处理的废水通过装置上部雾化系统雾化成均匀的液滴,向装置下部的等离子区域喷洒;雾化后的废水将全部经过等离子区域并与等离子体直接接触进行处理;处理后的废水自动进入收集装置10以待进行循环处理。The method of treating wastewater with atomized plasma, the wastewater to be treated is atomized into uniform droplets through the atomization system on the upper part of the device, and sprayed to the plasma area at the lower part of the device; the atomized wastewater will all pass through the plasma area and directly contact with the plasma contact for treatment; the treated waste water automatically enters the collection device 10 to be circulated.

被雾化的废水的流量为0-10L/min,喷洒的距离为0-1m,喷洒角度0-100°,雾化的液滴大小为0-50μm。The flow rate of the atomized wastewater is 0-10L/min, the spraying distance is 0-1m, the spraying angle is 0-100°, and the atomized droplet size is 0-50μm.

等离子区域由滑动弧电极4产生,滑动弧电极4由高压交流电源驱动,输出电压为0-40kV,频率为0-25kHz。The plasma area is generated by the sliding arc electrode 4, and the sliding arc electrode 4 is driven by a high-voltage AC power supply with an output voltage of 0-40kV and a frequency of 0-25kHz.

起弧吹气管5中通入流速1-10L/min的空气、氧气、氮气或者其不同比例的混合气体。Air, oxygen, nitrogen or a mixture thereof with a flow rate of 1-10 L/min is fed into the arc blowing pipe 5 .

实施例1:Example 1:

实验所用废水:工业废水。Waste water used in the experiment: industrial waste water.

实验条件:电压9kV,频率10kHz,起弧吹气管5中通入5L/min的空气,被雾化的废水的流量为400mL/min,喷洒的距离为0.1m,喷洒角度30°,处理结果如下表所示:Experimental conditions: voltage 9kV, frequency 10kHz, 5L/min of air is passed into the arc blowing pipe 5, the flow rate of the atomized wastewater is 400mL/min, the spraying distance is 0.1m, and the spraying angle is 30°. The treatment results are as follows As shown in the table:

测试项目Test items 处理前(mg/L)Before treatment (mg/L) 处理后((mg/L))After treatment ((mg/L)) CODCOD 125000125000 9191

测试方法:重铬酸钾法(铬法)Test method: potassium dichromate method (chromium method)

实施例2:Example 2:

实验所用废水:工业废水。Waste water used in the experiment: industrial waste water.

实验条件:电压10kV,频率12kHz,起弧吹气管中通入6L/min的空气,被雾化的废水流量为600mL/min,喷洒距离为0.2m,喷洒角度20°,处理结果如下表所示:Experimental conditions: voltage 10kV, frequency 12kHz, 6L/min of air is introduced into the arc blowing pipe, the flow rate of the atomized wastewater is 600mL/min, the spraying distance is 0.2m, and the spraying angle is 20°. The treatment results are shown in the table below :

测试项目Test items 处理前(mg/L)Before treatment (mg/L) 处理后((mg/L))After treatment ((mg/L)) CODCOD 1540015400 23twenty three

测量方法:重铬酸钾法(铬法)Measuring method: potassium dichromate method (chromium method)

实验结果表明本发明所提供的雾化等离子体处理废水的方法及装置可以有效的处理工业废水。Experimental results show that the method and device for treating wastewater with atomized plasma provided by the present invention can effectively treat industrial wastewater.

Claims (8)

1. The device for treating the wastewater by the atomized plasma is characterized by comprising an atomization system, a device shell (3) and at least one group of sliding arc electrodes (4);
the atomizing system comprises an atomizing nozzle (1) and a nozzle fixing plate (2), wherein the atomizing nozzle (1) is fixed on the nozzle fixing plate (2), and the nozzle fixing plate (2) is positioned above the device shell (3);
an atomization area and a plasma area are sequentially arranged in the device shell (3) from top to bottom;
each group of sliding arc electrodes (4) comprises two blades and an arc-starting gas blowing pipe (5), wherein the two blades are fixed on an electrode side fixing plate (6), a distance is reserved between the two blades, and the two blades are respectively connected with an alternating-current high-voltage power supply (8) and a ground wire;
the arc-starting air blowing pipe (5) is positioned between the two blades and is arranged at the circle center of the electrode side fixing plate (6), and the front end of the arc-starting air blowing pipe (5) is shorter than the bottom ends of the blades;
respectively installing sliding arc electrodes (4) at branch ports (9) on the side edge of a plasma region of a device shell (3);
a water outlet (7) is arranged at the bottom of the device shell (3), and a collecting device (10) is arranged at the water outlet (7).
2. An atomized plasma wastewater treatment plant according to claim 1, characterized in that the branch mouth (9) of the plant housing (3) is cylindrical and is arranged obliquely.
3. An atomized plasma wastewater treatment device according to claim 1, characterized in that the sliding arc electrode (4) has a sliding arc blade and a threaded rod at the end, and is mounted on the electrode side fixing plate (6) by a thread.
4. An atomized plasma wastewater treatment plant as set forth in claim 3, characterized in that the electrode-side fixing plate (6) is provided with a plurality of sets of threaded holes with different pitches for mounting threaded rods.
5. A method for treating wastewater by using atomized plasma, characterized in that the apparatus for treating wastewater by using atomized plasma according to any one of claims 1 to 4 comprises the steps of:
atomizing the wastewater to be treated into uniform liquid drops through an atomizing system on the upper part of the device, and spraying the uniform liquid drops to a plasma region on the lower part of the device;
the atomized wastewater completely passes through a plasma region and is directly contacted with plasma for treatment;
the treated wastewater automatically enters a collecting device (10) to be circularly treated.
6. A method for treating waste water with atomized plasma according to claim 5, wherein the atomized waste water has a flow rate of not more than 10L/min, a spraying distance of less than 1m, a spraying angle of not more than 100 °, and an atomized droplet diameter of less than 50 μm.
7. A method for treating wastewater according to claim 5, characterized in that said plasma region is generated by a sliding arc electrode (4), said sliding arc electrode (4) being driven by a high voltage AC power supply, the output voltage being not more than 40kV and the frequency being not more than 25kHz.
8. The method for treating wastewater by using atomized plasma as claimed in claim 5, wherein air, oxygen, nitrogen or mixed gas thereof in different proportions is introduced into the arc-starting gas blowing pipe (5) at a flow rate of 1-10L/min.
CN202210951134.6A 2022-08-09 2022-08-09 Device and method for treating wastewater by atomizing plasma Pending CN115259308A (en)

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1557731A (en) * 2004-01-16 2004-12-29 浙江大学 Sliding arc discharge plasma organic wastewater treatment device
CN101066791A (en) * 2007-06-19 2007-11-07 中山大学 Three-phase AC sliding arc unbalanced plasma sewage treatment device
CN104276627A (en) * 2014-09-11 2015-01-14 中山大学 Method of sterilizing effluent of non-thermal electric arc plasma sewage treatment plant
US20160325991A1 (en) * 2014-01-08 2016-11-10 Drexel University Non-thermal plasma cleaning of dirty synthesis gas
CN107344779A (en) * 2016-05-06 2017-11-14 魏星 A kind of gliding arc discharge low-temperature plasma sewage-treating reactor
CN110482646A (en) * 2019-09-18 2019-11-22 大连民族大学 A kind of ship ballasting purification method for effluent
CN110510706A (en) * 2019-10-12 2019-11-29 大连民族大学 A kind of medical wastewater treatment method
CN114599143A (en) * 2020-12-04 2022-06-07 中国科学院大连化学物理研究所 A sliding arc discharge plasma generation system

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1557731A (en) * 2004-01-16 2004-12-29 浙江大学 Sliding arc discharge plasma organic wastewater treatment device
CN101066791A (en) * 2007-06-19 2007-11-07 中山大学 Three-phase AC sliding arc unbalanced plasma sewage treatment device
US20160325991A1 (en) * 2014-01-08 2016-11-10 Drexel University Non-thermal plasma cleaning of dirty synthesis gas
CN104276627A (en) * 2014-09-11 2015-01-14 中山大学 Method of sterilizing effluent of non-thermal electric arc plasma sewage treatment plant
CN107344779A (en) * 2016-05-06 2017-11-14 魏星 A kind of gliding arc discharge low-temperature plasma sewage-treating reactor
CN110482646A (en) * 2019-09-18 2019-11-22 大连民族大学 A kind of ship ballasting purification method for effluent
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CN114599143A (en) * 2020-12-04 2022-06-07 中国科学院大连化学物理研究所 A sliding arc discharge plasma generation system

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