CN110482645B - Sewage treatment method - Google Patents
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- 239000010865 sewage Substances 0.000 title claims abstract description 16
- 238000000034 method Methods 0.000 title claims abstract description 14
- 239000007788 liquid Substances 0.000 claims abstract description 69
- 238000000746 purification Methods 0.000 claims abstract description 18
- 239000007921 spray Substances 0.000 claims abstract description 12
- 239000000126 substance Substances 0.000 claims abstract description 10
- 239000002245 particle Substances 0.000 claims abstract description 9
- 230000005684 electric field Effects 0.000 claims abstract description 8
- 238000000889 atomisation Methods 0.000 claims abstract description 7
- 241000894006 Bacteria Species 0.000 abstract description 4
- 239000003344 environmental pollutant Substances 0.000 abstract description 4
- 231100000719 pollutant Toxicity 0.000 abstract description 4
- 241000700605 Viruses Species 0.000 abstract description 3
- 244000005700 microbiome Species 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000002351 wastewater Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000010842 industrial wastewater Substances 0.000 description 2
- 238000009688 liquid atomisation Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- -1 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 241000195493 Cryptophyta Species 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000012671 ceramic insulating material Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
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- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
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Abstract
本发明公开了一种污水处理方法,等离子体电源以一定电压为高压电极供电,在高压电极与接地电极之间的空间形成电场;高压气瓶中的高压气体经过气体流量控制阀进入电场空间,形成等离子体射流并喷出;蓄液池中的待处理液体经过液体流量控制阀、过滤器、流量计后在液体雾化器的作用下以喷雾的形式喷出;对净化后的液体中的目标净化物含量进行检测:若目标净化物含量达标,则保持气体流量控制阀及高压电极的供电电压不变;若目标净化物含量不达标,则增加气体流量控制阀的开度及高压电极的供电电压;在非平衡等离子体射流的作用下,雾化场中液滴颗粒内所含有的病毒、细菌、微生物等目标净化物被杀灭,完成净化过程。
The invention discloses a sewage treatment method. A plasma power supply supplies power to a high-voltage electrode with a certain voltage, and an electric field is formed in the space between the high-voltage electrode and the ground electrode; the high-pressure gas in the high-pressure gas cylinder enters the electric field space through a gas flow control valve, The plasma jet is formed and sprayed; the liquid to be treated in the liquid reservoir is sprayed in the form of spray under the action of the liquid atomizer after passing through the liquid flow control valve, filter and flow meter; Detecting the target pollutant content: if the target pollutant content reaches the standard, keep the power supply voltage of the gas flow control valve and the high-voltage electrode unchanged; if the target pollutant content does not meet the standard, increase the opening of the gas flow control valve and the high-voltage electrode. Power supply voltage; under the action of the non-equilibrium plasma jet, the target purification substances such as viruses, bacteria and microorganisms contained in the droplet particles in the atomization field are killed to complete the purification process.
Description
技术领域technical field
本发明涉及一种污水处理方法,具体说是采用非平衡等离子体技术的污水处理方法。The invention relates to a sewage treatment method, in particular to a sewage treatment method using non-equilibrium plasma technology.
背景技术Background technique
和其他现有净水技术相比,非平衡等离子体技术具有杀灭效率高、病原体再生率低、使用成本低等特点,是一种全新的高效、清洁净水技术。它涉及化学、物理、电气、环保、生物等多门学科,可以使反应体系保持低温,在节省了能源及设备投资的同时,还使得电子有足够高的能量激发、电离、离解反应物分子,从而使得细菌、污染物、藻类等得到降解。在生活污水、医疗废水、工业废水、船舶压舱水等不同废水净化领域均有巨大应用潜力。Compared with other existing water purification technologies, non-equilibrium plasma technology has the characteristics of high killing efficiency, low pathogen regeneration rate and low cost of use. It is a new high-efficiency and clean water purification technology. It involves many disciplines such as chemistry, physics, electricity, environmental protection, biology, etc. It can keep the reaction system at a low temperature, while saving energy and equipment investment, it also enables electrons to have high enough energy to excite, ionize, and dissociate reactant molecules. Thus, bacteria, pollutants, algae, etc. are degraded. It has great application potential in different wastewater purification fields such as domestic sewage, medical wastewater, industrial wastewater, and ship ballast water.
然而,电离空间、电离介质性质等参数对非平衡等离子体放电的电离效果有很大影响。电离空间过大、介质密度过大等因素均会导致电离效果急剧恶化。采用非平衡等离子体技术处理生活污水、医疗废水、工业废水、船舶压舱水等废水时,由于电离空间(即液体流道的孔径)尺寸过小而导致液体流量过小,易导致净化速率过慢;而且,由于待处理物均为液相,易引起非平衡等离子体放电失效,导致净化失败;况且,现有等离子体净水技术中,污水流经等离子体电极空间,势必与电极接触,这将造成电极的腐蚀、失效。However, parameters such as the ionization space and the properties of the ionization medium have a great influence on the ionization effect of the non-equilibrium plasma discharge. Factors such as too large ionization space and too large medium density will cause the ionization effect to deteriorate sharply. When using non-equilibrium plasma technology to treat wastewater such as domestic sewage, medical wastewater, industrial wastewater, and ship ballast water, the liquid flow rate is too small due to the small size of the ionization space (that is, the pore size of the liquid flow channel), which may easily lead to excessive purification rate. Moreover, since the objects to be treated are all in liquid phase, it is easy to cause the failure of the non-equilibrium plasma discharge, resulting in the failure of purification; moreover, in the existing plasma water purification technology, the sewage flows through the plasma electrode space and is bound to come into contact with the electrode. This will cause corrosion and failure of the electrodes.
发明内容SUMMARY OF THE INVENTION
针对现有技术中净化速率过慢、易引起非平衡等离子体放电失效和电极腐蚀等问题,本申请提出一种污水处理方法。Aiming at the problems in the prior art that the purification rate is too slow, and the non-equilibrium plasma discharge failure and electrode corrosion are easily caused, the present application proposes a sewage treatment method.
为实现上述目的,本申请的技术方案为:一种污水处理方法,包括如下步骤:In order to achieve the above purpose, the technical scheme of the present application is: a sewage treatment method, comprising the following steps:
S1:等离子体电源以一定电压为高压电极供电,在高压电极与接地电极之间的空间形成电场;S1: The plasma power supply supplies power to the high-voltage electrode with a certain voltage, and an electric field is formed in the space between the high-voltage electrode and the ground electrode;
S2:阀门开度电子控制器控制气体流量控制阀打开,高压气瓶中的高压气体经过气体流量控制阀进入电场空间,形成等离子体射流并喷出;S2: the valve opening electronic controller controls the gas flow control valve to open, and the high-pressure gas in the high-pressure gas cylinder enters the electric field space through the gas flow control valve, forming a plasma jet and ejecting;
S3:阀门开度电子控制器控制液体流量控制阀打开,蓄液池中的待处理液体经过液体流量控制阀、过滤器、流量计后在液体雾化器的作用下以喷雾的形式喷出,并且全部喷雾场均经过非平衡等离子体射流区域;S3: The valve opening electronic controller controls the opening of the liquid flow control valve, and the liquid to be treated in the liquid reservoir is sprayed in the form of a spray under the action of the liquid atomizer after passing through the liquid flow control valve, filter and flowmeter. And all the spray fields pass through the non-equilibrium plasma jet area;
S4:对净化后的液体中的目标净化物含量进行检测:若目标净化物含量达标,则保持气体流量控制阀及高压电极的供电电压不变;若目标净化物含量不达标,则增加气体流量控制阀的开度及高压电极的供电电压;S4: Detect the target purifier content in the purified liquid: if the target purifier content reaches the standard, keep the power supply voltage of the gas flow control valve and the high-voltage electrode unchanged; if the target purifier content does not meet the standard, increase the gas flow The opening of the control valve and the power supply voltage of the high voltage electrode;
S5:再对净化后的液体中的目标净化物含量进行检测;若目标净化物含量仍未达标,则重复步骤S4;若已达标,则完成整个工作过程;S5: Then, the content of the target purified substance in the purified liquid is detected; if the content of the target purified substance has not yet reached the standard, repeat step S4; if it has reached the standard, then complete the entire working process;
S6:在非平衡等离子体射流的作用下,雾化场中液滴颗粒内所含有的病毒、细菌、微生物等目标净化物被杀灭,完成净化过程。S6: Under the action of the non-equilibrium plasma jet, the target purification substances such as viruses, bacteria, and microorganisms contained in the droplet particles in the atomization field are killed, and the purification process is completed.
上述方法是在污水处理装置中实施的,所述装置包括:液体雾化器、非平衡等离子体射流激励器、流量计、过滤器、液体流量控制阀、气体流量控制阀、蓄液池、高压气瓶、阀门开度电子控制器、等离子体电源;所述液体雾化器依次通过流量计、过滤器、液体流量控制阀与蓄液池相连,所述液体流量控制阀还连接至阀门开度电子控制器的一端,所述阀门开度电子控制器的另一端与气体流量控制阀相连,所述气体流量控制阀位于高压气瓶与非平衡等离子体射流激励器之间的管路上,所述非平衡等离子体射流激励器与等离子体电源相连,所述液体雾化器底部的喷射区域与非平衡等离子体射流激励器一侧的射流区域重叠。The above method is implemented in a sewage treatment device, and the device includes: a liquid atomizer, an unbalanced plasma jet exciter, a flow meter, a filter, a liquid flow control valve, a gas flow control valve, a liquid reservoir, a high pressure Gas cylinder, valve opening electronic controller, plasma power supply; the liquid atomizer is connected to the liquid reservoir through a flow meter, a filter and a liquid flow control valve in turn, and the liquid flow control valve is also connected to the valve opening One end of the electronic controller, the other end of the valve opening electronic controller is connected with a gas flow control valve, the gas flow control valve is located on the pipeline between the high-pressure gas cylinder and the unbalanced plasma jet exciter, the The unbalanced plasma jet exciter is connected to the plasma power source, and the spray area at the bottom of the liquid atomizer overlaps with the jet area on one side of the unbalanced plasma jet exciter.
进一步的,所述非平衡等离子体射流激励器的数量为多个,均与等离子体电源相连。Further, there are multiple unbalanced plasma jet exciters, all of which are connected to the plasma power source.
进一步的,所述液体雾化器包括雾化器体,所述雾化器体为中空圆柱体结构,在中空圆柱体结构底部设有雾化喷孔。Further, the liquid atomizer includes an atomizer body, the atomizer body is a hollow cylindrical structure, and an atomizing nozzle hole is arranged at the bottom of the hollow cylindrical structure.
进一步的,所述雾化喷孔为圆直孔结构或交叉圆直孔结构或交叉缝结构。Further, the atomizing nozzles are of a round and straight hole structure or a crossed round and straight hole structure or a crossed slot structure.
进一步的,所述非平衡等离子体射流激励器,包括高压电极、接地电极、激励器体,所述高压电极位于激励器体中,在激励器体外壁连接有接地电极。Further, the unbalanced plasma jet exciter includes a high voltage electrode, a ground electrode and an exciter body, the high voltage electrode is located in the exciter body, and a ground electrode is connected to the outer wall of the exciter.
进一步的,所述高压电极为圆柱状或条状,其材料为钨或铜或不锈钢。Further, the high-voltage electrode is cylindrical or bar-shaped, and its material is tungsten, copper or stainless steel.
更进一步的,所述激励器体由聚四氟乙烯、玻璃、陶瓷绝缘材料构成。Further, the exciter body is made of polytetrafluoroethylene, glass, and ceramic insulating materials.
更进一步的,所述蓄液池为一水槽结构,用来储存待净化液体。Further, the liquid storage tank is a water tank structure for storing the liquid to be purified.
本发明由于采用以上技术方案,能够取得如下的技术效果:采用非平衡等离子体射流技术可以将非平衡等离子体射入到液滴颗粒雾化场中。这样,每一个液滴颗粒均被非平衡等离子体射流所包围,大大提高净化效率。由于非平衡等离子体射流长度可长达10cm量级,因此能够采用大尺寸的雾化空间,极大地增加液体流量。采用液体雾化技术和非平衡等离子体射流技术的技术方案既能够大幅度提高净化效率,又能够大幅度提高净化流量。Due to the adoption of the above technical solutions, the present invention can achieve the following technical effects: using the non-equilibrium plasma jet technology, the non-equilibrium plasma can be injected into the droplet particle atomization field. In this way, each droplet particle is surrounded by the non-equilibrium plasma jet, which greatly improves the purification efficiency. Since the length of the non-equilibrium plasma jet can be up to the order of 10 cm, a large-sized atomization space can be used, which greatly increases the liquid flow rate. The technical scheme using liquid atomization technology and non-equilibrium plasma jet technology can not only greatly improve the purification efficiency, but also greatly improve the purification flow.
附图说明Description of drawings
图1为一种污水处理装置结构示意图;Figure 1 is a schematic structural diagram of a sewage treatment device;
图2为液体雾化器结构示意图;Fig. 2 is the structural representation of liquid atomizer;
图3为一种污水处理装置工作状态示意图;3 is a schematic diagram of a working state of a sewage treatment device;
图4为实施例1的结构示意图;Fig. 4 is the structural representation of
图中序号说明:1液体雾化器、2非平衡等离子体射流激励器、3流量计、4过滤器、5液体流量控制阀、6气体流量控制阀、7蓄液池、8高压气瓶、9阀门开度电子控制器、10等离子体电源、11雾化器体、12雾化喷孔、21高压电极、22接地电极、23激励器体。Description of the serial numbers in the figure: 1 liquid atomizer, 2 unbalanced plasma jet exciter, 3 flowmeter, 4 filter, 5 liquid flow control valve, 6 gas flow control valve, 7 liquid reservoir, 8 high pressure gas cylinder, 9 valve opening electronic controller, 10 plasma power supply, 11 atomizer body, 12 atomization nozzle, 21 high voltage electrode, 22 ground electrode, 23 exciter body.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施中的技术方案进行清楚、完整的描述,可以理解的是,所描述的实例仅仅是本发明的一部分实例,而不是全部的实施例。基于本发明的实施例,本领域的技术人员在没有做出创造性劳动的前提下所获得的所有其他实施例,都属于本发明的保护范围。The technical solutions in the implementation of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. It can be understood that the described examples are only some examples of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the present invention.
实施例1Example 1
本实施例提供一种污水处理装置,包括:液体雾化器、非平衡等离子体射流激励器、流量计、过滤器、液体流量控制阀、气体流量控制阀、蓄液池、高压气瓶、阀门开度电子控制器、等离子体电源;所述液体雾化器依次通过流量计、过滤器、液体流量控制阀与蓄液池相连,所述液体流量控制阀还连接至阀门开度电子控制器的一端,所述阀门开度电子控制器的另一端与气体流量控制阀相连,所述气体流量控制阀位于高压气瓶与非平衡等离子体射流激励器之间的管路上,所述非平衡等离子体射流激励器与等离子体电源相连,所述液体雾化器底部的喷射区域与非平衡等离子体射流激励器一侧的射流区域重叠。This embodiment provides a sewage treatment device, including: a liquid atomizer, an unbalanced plasma jet exciter, a flow meter, a filter, a liquid flow control valve, a gas flow control valve, a liquid reservoir, a high-pressure gas cylinder, and a valve Opening electronic controller, plasma power supply; the liquid atomizer is connected to the liquid storage tank through a flow meter, a filter and a liquid flow control valve in turn, and the liquid flow control valve is also connected to the valve opening electronic controller. One end, the other end of the valve opening electronic controller is connected with the gas flow control valve, the gas flow control valve is located on the pipeline between the high-pressure gas cylinder and the unbalanced plasma jet exciter, the unbalanced plasma The jet exciter is connected to the plasma power source, and the jet region at the bottom of the liquid atomizer overlaps the jet region on one side of the unbalanced plasma jet exciter.
优选的,如图4所示,本实施例中非平衡等离子体射流激励器的数量为3个。Preferably, as shown in FIG. 4 , the number of unbalanced plasma jet exciters in this embodiment is three.
所述液体雾化器1包括雾化器体11及雾化喷孔12,所述雾化器体11为中空圆柱体结构,所述雾化喷孔12可为圆直孔结构、交叉圆直孔结构、交叉缝结构等不同的结构。液体雾化器包括喷雾器、碰撞套。The
所述非平衡等离子体射流激励器2包括高压电极21、接地电极22、激励器体23,所述高压电极21可为圆柱状、条状等不同结构,其材料可为钨、铜、不锈钢等不同材料,所述激励器体23由聚四氟乙烯、玻璃、陶瓷等绝缘材料构成。The unbalanced
所述流量计3用来控制待净化液体的流量。所述过滤器4用来过滤待净化液体4中的杂质。所述液体流量控制阀5、气体流量控制阀6分别用来控制待净化液体及高压气体。所述蓄液池7为一水槽结构,用来储存待净化液体。所述高压气瓶8用来储存高压气体。所述阀门开度电子控制器9用来控制液体流量控制阀5及气体流量控制阀6的开度。所述等离子体电源10用来为非平衡等离子体射流激励器2供电,可为直流电源、交流电源、射频电源等电源结构。The
优选的,高压电极21、接地电极22的位置可互换。Preferably, the positions of the
液体雾化技术可以将连续的液相转化为离散的液滴颗粒与空气的混合物;而且,采用交叉孔、交叉缝的喷雾孔结构能够进一步的减小液滴颗粒尺寸、增大液滴颗粒分布范围。Liquid atomization technology can convert a continuous liquid phase into a mixture of discrete droplet particles and air; moreover, the use of cross-hole and cross-slit spray hole structure can further reduce droplet particle size and increase droplet particle distribution scope.
实施例2Example 2
本实施例提供一种污水处理方法,包括如下步骤:The present embodiment provides a sewage treatment method, comprising the following steps:
S1:等离子体电源以一定电压为高压电极或者接地电极供电,在高压电极与接地电极之间的空间形成电场;S1: The plasma power supply supplies power to the high-voltage electrode or the ground electrode with a certain voltage, and an electric field is formed in the space between the high-voltage electrode and the ground electrode;
S2:阀门开度电子控制器控制气体流量控制阀打开,高压气瓶中的高压气体经过气体流量控制阀进入电场空间,形成等离子体射流并喷出;S2: the valve opening electronic controller controls the gas flow control valve to open, and the high-pressure gas in the high-pressure gas cylinder enters the electric field space through the gas flow control valve, forming a plasma jet and ejecting;
S3:阀门开度电子控制器控制液体流量控制阀打开,蓄液池中的待处理液体经过液体流量控制阀、过滤器、流量计后在液体雾化器的作用下以喷雾的形式喷出,并且全部喷雾场均经过非平衡等离子体射流区域;S3: The valve opening electronic controller controls the opening of the liquid flow control valve, and the liquid to be treated in the liquid reservoir is sprayed in the form of a spray under the action of the liquid atomizer after passing through the liquid flow control valve, filter and flowmeter. And all the spray fields pass through the non-equilibrium plasma jet area;
S4:对净化后的液体中的目标净化物含量进行检测:若目标净化物含量达标,则保持气体流量控制阀及高压电极的供电电压不变;若目标净化物含量不达标,则增加气体流量控制阀的开度及高压电极的供电电压;S4: Detect the target purifier content in the purified liquid: if the target purifier content reaches the standard, keep the power supply voltage of the gas flow control valve and the high-voltage electrode unchanged; if the target purifier content does not meet the standard, increase the gas flow The opening of the control valve and the power supply voltage of the high voltage electrode;
S5:再对净化后的液体中的目标净化物含量进行检测;若目标净化物含量仍未达标,则重复步骤S4;若已达标,则完成整个工作过程;S5: Then, the content of the target purified substance in the purified liquid is detected; if the content of the target purified substance has not yet reached the standard, repeat step S4; if it has reached the standard, then complete the entire working process;
S6:在非平衡等离子体射流的作用下,雾化场中液滴颗粒内所含有的病毒、细菌、微生物等目标净化物被杀灭,完成净化过程。S6: Under the action of the non-equilibrium plasma jet, the target purification substances such as viruses, bacteria, and microorganisms contained in the droplet particles in the atomization field are killed, and the purification process is completed.
以上所述仅是本发明的优选实施方式,并不用于限制本发明,应当指出,对于本技术领域的普通技术人员,在不脱离本发明技术原理的前提下,还可以做出若干改进和变型,这些改进和变型也应视为本发明的保护范围。The above are only preferred embodiments of the present invention and are not intended to limit the present invention. It should be pointed out that for those skilled in the art, without departing from the technical principles of the present invention, several improvements and modifications can also be made. , these improvements and modifications should also be regarded as the protection scope of the present invention.
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