CN110482645A - A kind of sewage treatment method - Google Patents
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- 239000010865 sewage Substances 0.000 title claims abstract description 15
- 238000000034 method Methods 0.000 title claims abstract description 13
- 239000007788 liquid Substances 0.000 claims abstract description 61
- 238000000746 purification Methods 0.000 claims abstract description 23
- 239000007921 spray Substances 0.000 claims abstract description 10
- 239000002245 particle Substances 0.000 claims abstract description 9
- 230000005684 electric field Effects 0.000 claims abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 241000894006 Bacteria Species 0.000 claims abstract description 5
- 241000700605 Viruses Species 0.000 claims abstract description 4
- 238000005507 spraying Methods 0.000 claims abstract 2
- 244000005700 microbiome Species 0.000 abstract description 3
- 239000003344 environmental pollutant Substances 0.000 description 11
- 231100000719 pollutant Toxicity 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 10
- 238000000889 atomisation Methods 0.000 description 9
- 239000000243 solution Substances 0.000 description 4
- 239000002351 wastewater Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000010842 industrial wastewater Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000009688 liquid atomisation Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- -1 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 241000195493 Cryptophyta Species 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000012671 ceramic insulating material Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 244000052769 pathogen Species 0.000 description 1
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- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
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- Water Supply & Treatment (AREA)
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- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
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- Water Treatment By Electricity Or Magnetism (AREA)
Abstract
Description
技术领域technical field
本发明涉及一种污水处理方法,具体说是采用非平衡等离子体技术的污水处理方法。The invention relates to a sewage treatment method, in particular to a sewage treatment method using non-equilibrium plasma technology.
背景技术Background technique
和其他现有净水技术相比,非平衡等离子体技术具有杀灭效率高、病原体再生率低、使用成本低等特点,是一种全新的高效、清洁净水技术。它涉及化学、物理、电气、环保、生物等多门学科,可以使反应体系保持低温,在节省了能源及设备投资的同时,还使得电子有足够高的能量激发、电离、离解反应物分子,从而使得细菌、污染物、藻类等得到降解。在生活污水、医疗废水、工业废水、船舶压舱水等不同废水净化领域均有巨大应用潜力。Compared with other existing water purification technologies, non-equilibrium plasma technology has the characteristics of high killing efficiency, low pathogen regeneration rate, and low cost of use. It is a new high-efficiency and clean water purification technology. It involves many disciplines such as chemistry, physics, electricity, environmental protection, biology, etc. It can keep the reaction system at a low temperature, save energy and equipment investment, and also enable electrons to have high enough energy to excite, ionize, and dissociate reactant molecules. So that bacteria, pollutants, algae, etc. are degraded. It has great application potential in different wastewater purification fields such as domestic sewage, medical wastewater, industrial wastewater, and ship ballast water.
然而,电离空间、电离介质性质等参数对非平衡等离子体放电的电离效果有很大影响。电离空间过大、介质密度过大等因素均会导致电离效果急剧恶化。采用非平衡等离子体技术处理生活污水、医疗废水、工业废水、船舶压舱水等废水时,由于电离空间(即液体流道的孔径)尺寸过小而导致液体流量过小,易导致净化速率过慢;而且,由于待处理物均为液相,易引起非平衡等离子体放电失效,导致净化失败;况且,现有等离子体净水技术中,污水流经等离子体电极空间,势必与电极接触,这将造成电极的腐蚀、失效。However, parameters such as ionization space and properties of ionization medium have a great influence on the ionization effect of non-equilibrium plasma discharge. Factors such as too large ionization space and medium density will lead to a sharp deterioration of the ionization effect. When non-equilibrium plasma technology is used to treat domestic sewage, medical wastewater, industrial wastewater, ship ballast water and other wastewater, the liquid flow rate is too small due to the too small size of the ionization space (that is, the aperture of the liquid flow channel), which easily leads to an excessive purification rate. slow; moreover, because all the substances to be treated are in liquid phase, it is easy to cause non-equilibrium plasma discharge failure, resulting in purification failure; moreover, in the existing plasma water purification technology, the sewage flows through the plasma electrode space, which is bound to contact with the electrode. This will cause corrosion and failure of the electrodes.
发明内容Contents of the invention
针对现有技术中净化速率过慢、易引起非平衡等离子体放电失效和电极腐蚀等问题,本申请提出一种污水处理方法。Aiming at the problems in the prior art that the purification rate is too slow, non-equilibrium plasma discharge failure and electrode corrosion are easily caused, this application proposes a sewage treatment method.
为实现上述目的,本申请的技术方案为:一种污水处理方法,包括如下步骤:In order to achieve the above purpose, the technical solution of the present application is: a sewage treatment method, comprising the following steps:
S1:等离子体电源以一定电压为高压电极供电,在高压电极与接地电极之间的空间形成电场;S1: The plasma power supply supplies power to the high-voltage electrode with a certain voltage, and forms an electric field in the space between the high-voltage electrode and the ground electrode;
S2:阀门开度电子控制器控制气体流量控制阀打开,高压气瓶中的高压气体经过气体流量控制阀进入电场空间,形成等离子体射流并喷出;S2: The valve opening electronic controller controls the opening of the gas flow control valve, and the high-pressure gas in the high-pressure gas cylinder enters the electric field space through the gas flow control valve to form a plasma jet and eject it;
S3:阀门开度电子控制器控制液体流量控制阀打开,蓄液池中的待处理液体经过液体流量控制阀、过滤器、流量计后在液体雾化器的作用下以喷雾的形式喷出,并且全部喷雾场均经过非平衡等离子体射流区域;S3: The valve opening electronic controller controls the opening of the liquid flow control valve, and the liquid to be treated in the liquid reservoir passes through the liquid flow control valve, filter, and flow meter and is sprayed out in the form of a spray under the action of the liquid atomizer. And all spray fields pass through the non-equilibrium plasma jet region;
S4:对净化后的液体中的目标净化物含量进行检测:若目标净化物含量达标,则保持气体流量控制阀及高压电极的供电电压不变;若目标净化物含量不达标,则增加气体流量控制阀的开度及高压电极的供电电压;S4: Detect the content of the target pollutant in the purified liquid: if the content of the target pollutant reaches the standard, keep the power supply voltage of the gas flow control valve and the high-voltage electrode unchanged; if the content of the target pollutant does not meet the standard, increase the gas flow Control the opening of the valve and the supply voltage of the high voltage electrode;
S5:再对净化后的液体中的目标净化物含量进行检测;若目标净化物含量仍未达标,则重复步骤S4;若已达标,则完成整个工作过程;S5: Detect the content of the target pollutant in the purified liquid again; if the content of the target pollutant is still not up to the standard, repeat step S4; if it has reached the standard, complete the entire working process;
S6:在非平衡等离子体射流的作用下,雾化场中液滴颗粒内所含有的病毒、细菌、微生物等目标净化物被杀灭,完成净化过程。S6: Under the action of the non-equilibrium plasma jet, the target purification substances such as viruses, bacteria, and microorganisms contained in the droplet particles in the atomization field are killed, and the purification process is completed.
上述方法是在污水处理装置中实施的,所述装置包括:液体雾化器、非平衡等离子体射流激励器、流量计、过滤器、液体流量控制阀、气体流量控制阀、蓄液池、高压气瓶、阀门开度电子控制器、等离子体电源;所述液体雾化器依次通过流量计、过滤器、液体流量控制阀与蓄液池相连,所述液体流量控制阀还连接至阀门开度电子控制器的一端,所述阀门开度电子控制器的另一端与气体流量控制阀相连,所述气体流量控制阀位于高压气瓶与非平衡等离子体射流激励器之间的管路上,所述非平衡等离子体射流激励器与等离子体电源相连,所述液体雾化器底部的喷射区域与非平衡等离子体射流激励器一侧的射流区域重叠。The above method is implemented in a sewage treatment device, and the device includes: a liquid atomizer, an unbalanced plasma jet actuator, a flow meter, a filter, a liquid flow control valve, a gas flow control valve, a liquid storage tank, a high pressure Gas cylinder, valve opening electronic controller, plasma power supply; the liquid atomizer is connected to the liquid storage tank through a flow meter, a filter, and a liquid flow control valve in sequence, and the liquid flow control valve is also connected to the valve opening One end of the electronic controller, the other end of the valve opening electronic controller is connected to the gas flow control valve, the gas flow control valve is located on the pipeline between the high-pressure gas cylinder and the unbalanced plasma jet actuator, the The unbalanced plasma jet exciter is connected with the plasma power source, and the injection area at the bottom of the liquid atomizer overlaps with the jet area at one side of the unbalanced plasma jet exciter.
进一步的,所述非平衡等离子体射流激励器的数量为多个,均与等离子体电源相连。Further, there are multiple unbalanced plasma jet actuators, all of which are connected to the plasma power supply.
进一步的,所述液体雾化器包括雾化器体,所述雾化器体为中空圆柱体结构,在中空圆柱体结构底部设有雾化喷孔。Further, the liquid atomizer includes an atomizer body, the atomizer body is a hollow cylinder structure, and an atomization nozzle hole is arranged at the bottom of the hollow cylinder structure.
进一步的,所述雾化喷孔为圆直孔结构或交叉圆直孔结构或交叉缝结构。Further, the atomization spray hole is a circular straight hole structure or a cross circular straight hole structure or a cross slit structure.
进一步的,所述非平衡等离子体射流激励器,包括高压电极、接地电极、激励器体,所述高压电极位于激励器体中,在激励器体外壁连接有接地电极。Further, the unbalanced plasma jet exciter includes a high-voltage electrode, a ground electrode, and an exciter body, the high-voltage electrode is located in the exciter body, and a ground electrode is connected to the outer wall of the exciter body.
进一步的,所述高压电极为圆柱状或条状,其材料为钨或铜或不锈钢。Further, the high-voltage electrode is cylindrical or strip-shaped, and its material is tungsten or copper or stainless steel.
更进一步的,所述激励器体由聚四氟乙烯、玻璃、陶瓷绝缘材料构成。Furthermore, the exciter body is made of polytetrafluoroethylene, glass, and ceramic insulating materials.
更进一步的,所述蓄液池为一水槽结构,用来储存待净化液体。Furthermore, the liquid storage tank is a water tank structure, which is used to store the liquid to be purified.
本发明由于采用以上技术方案,能够取得如下的技术效果:采用非平衡等离子体射流技术可以将非平衡等离子体射入到液滴颗粒雾化场中。这样,每一个液滴颗粒均被非平衡等离子体射流所包围,大大提高净化效率。由于非平衡等离子体射流长度可长达10cm量级,因此能够采用大尺寸的雾化空间,极大地增加液体流量。采用液体雾化技术和非平衡等离子体射流技术的技术方案既能够大幅度提高净化效率,又能够大幅度提高净化流量。Due to the adoption of the above technical solutions, the present invention can achieve the following technical effects: the non-equilibrium plasma jet technology can be used to inject the non-equilibrium plasma into the droplet particle atomization field. In this way, each droplet particle is surrounded by the non-equilibrium plasma jet, which greatly improves the purification efficiency. Since the length of the unbalanced plasma jet can be as long as 10cm, a large-sized atomization space can be used to greatly increase the liquid flow. The technical solution using liquid atomization technology and unbalanced plasma jet technology can not only greatly improve the purification efficiency, but also greatly increase the purification flow rate.
附图说明Description of drawings
图1为一种污水处理装置结构示意图;Fig. 1 is a kind of sewage treatment device structural representation;
图2为液体雾化器结构示意图;Fig. 2 is a schematic structural diagram of a liquid atomizer;
图3为一种污水处理装置工作状态示意图;Fig. 3 is a schematic diagram of the working state of a sewage treatment device;
图4为实施例1的结构示意图;Fig. 4 is the structural representation of embodiment 1;
图中序号说明:1液体雾化器、2非平衡等离子体射流激励器、3流量计、4过滤器、5液体流量控制阀、6气体流量控制阀、7蓄液池、8高压气瓶、9阀门开度电子控制器、10等离子体电源、11雾化器体、12雾化喷孔、21高压电极、22接地电极、23激励器体。Description of serial numbers in the figure: 1 liquid atomizer, 2 unbalanced plasma jet actuator, 3 flow meter, 4 filter, 5 liquid flow control valve, 6 gas flow control valve, 7 liquid storage tank, 8 high-pressure gas cylinder, 9 Valve opening electronic controller, 10 plasma power supply, 11 atomizer body, 12 atomization nozzle hole, 21 high voltage electrode, 22 ground electrode, 23 exciter body.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施中的技术方案进行清楚、完整的描述,可以理解的是,所描述的实例仅仅是本发明的一部分实例,而不是全部的实施例。基于本发明的实施例,本领域的技术人员在没有做出创造性劳动的前提下所获得的所有其他实施例,都属于本发明的保护范围。The technical solutions in the implementation of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. It should be understood that the described examples are only some examples of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making creative efforts belong to the protection scope of the present invention.
实施例1Example 1
本实施例提供一种污水处理装置,包括:液体雾化器、非平衡等离子体射流激励器、流量计、过滤器、液体流量控制阀、气体流量控制阀、蓄液池、高压气瓶、阀门开度电子控制器、等离子体电源;所述液体雾化器依次通过流量计、过滤器、液体流量控制阀与蓄液池相连,所述液体流量控制阀还连接至阀门开度电子控制器的一端,所述阀门开度电子控制器的另一端与气体流量控制阀相连,所述气体流量控制阀位于高压气瓶与非平衡等离子体射流激励器之间的管路上,所述非平衡等离子体射流激励器与等离子体电源相连,所述液体雾化器底部的喷射区域与非平衡等离子体射流激励器一侧的射流区域重叠。This embodiment provides a sewage treatment device, including: a liquid atomizer, an unbalanced plasma jet actuator, a flow meter, a filter, a liquid flow control valve, a gas flow control valve, a liquid storage tank, a high-pressure gas cylinder, and a valve Opening electronic controller, plasma power supply; the liquid atomizer is connected to the liquid storage tank through a flow meter, a filter, and a liquid flow control valve in sequence, and the liquid flow control valve is also connected to the valve opening electronic controller One end, the other end of the valve opening electronic controller is connected to the gas flow control valve, the gas flow control valve is located on the pipeline between the high-pressure gas cylinder and the unbalanced plasma jet actuator, the unbalanced plasma The jet exciter is connected with the plasma power supply, and the injection area at the bottom of the liquid atomizer overlaps with the jet area at one side of the unbalanced plasma jet exciter.
优选的,如图4所示,本实施例中非平衡等离子体射流激励器的数量为3个。Preferably, as shown in FIG. 4 , the number of unbalanced plasma jet actuators in this embodiment is three.
所述液体雾化器1包括雾化器体11及雾化喷孔12,所述雾化器体11为中空圆柱体结构,所述雾化喷孔12可为圆直孔结构、交叉圆直孔结构、交叉缝结构等不同的结构。液体雾化器包括喷雾器、碰撞套。The liquid atomizer 1 includes an atomizer body 11 and an atomization nozzle hole 12, the atomizer body 11 is a hollow cylinder structure, and the atomization nozzle hole 12 can be a circular straight hole structure, a crossed circular straight Hole structure, cross seam structure and other different structures. Liquid atomizers include nebulizers and collision sleeves.
所述非平衡等离子体射流激励器2包括高压电极21、接地电极22、激励器体23,所述高压电极21可为圆柱状、条状等不同结构,其材料可为钨、铜、不锈钢等不同材料,所述激励器体23由聚四氟乙烯、玻璃、陶瓷等绝缘材料构成。The unbalanced plasma jet exciter 2 includes a high-voltage electrode 21, a ground electrode 22, and an exciter body 23. The high-voltage electrode 21 can be in a cylindrical shape, a strip shape, etc., and its material can be tungsten, copper, stainless steel, etc. Different materials, the actuator body 23 is made of polytetrafluoroethylene, glass, ceramics and other insulating materials.
所述流量计3用来控制待净化液体的流量。所述过滤器4用来过滤待净化液体4中的杂质。所述液体流量控制阀5、气体流量控制阀6分别用来控制待净化液体及高压气体。所述蓄液池7为一水槽结构,用来储存待净化液体。所述高压气瓶8用来储存高压气体。所述阀门开度电子控制器9用来控制液体流量控制阀5及气体流量控制阀6的开度。所述等离子体电源10用来为非平衡等离子体射流激励器2供电,可为直流电源、交流电源、射频电源等电源结构。The flow meter 3 is used to control the flow of the liquid to be purified. The filter 4 is used to filter impurities in the liquid 4 to be purified. The liquid flow control valve 5 and the gas flow control valve 6 are respectively used to control the liquid to be purified and the high-pressure gas. The liquid storage tank 7 is a tank structure for storing the liquid to be purified. The high-pressure gas cylinder 8 is used to store high-pressure gas. The valve opening electronic controller 9 is used to control the opening of the liquid flow control valve 5 and the gas flow control valve 6 . The plasma power supply 10 is used to supply power to the unbalanced plasma jet actuator 2, and can be a power supply structure such as a DC power supply, an AC power supply, or a radio frequency power supply.
优选的,高压电极21、接地电极22的位置可互换。Preferably, the positions of the high voltage electrode 21 and the ground electrode 22 are interchangeable.
液体雾化技术可以将连续的液相转化为离散的液滴颗粒与空气的混合物;而且,采用交叉孔、交叉缝的喷雾孔结构能够进一步的减小液滴颗粒尺寸、增大液滴颗粒分布范围。Liquid atomization technology can convert the continuous liquid phase into a mixture of discrete droplet particles and air; moreover, the spray hole structure with cross holes and cross slits can further reduce the droplet particle size and increase the droplet particle distribution scope.
实施例2Example 2
本实施例提供一种污水处理方法,包括如下步骤:The present embodiment provides a sewage treatment method, comprising the steps of:
S1:等离子体电源以一定电压为高压电极或者接地电极供电,在高压电极与接地电极之间的空间形成电场;S1: The plasma power supply supplies power to the high-voltage electrode or the ground electrode with a certain voltage, and forms an electric field in the space between the high-voltage electrode and the ground electrode;
S2:阀门开度电子控制器控制气体流量控制阀打开,高压气瓶中的高压气体经过气体流量控制阀进入电场空间,形成等离子体射流并喷出;S2: The valve opening electronic controller controls the opening of the gas flow control valve, and the high-pressure gas in the high-pressure gas cylinder enters the electric field space through the gas flow control valve to form a plasma jet and eject it;
S3:阀门开度电子控制器控制液体流量控制阀打开,蓄液池中的待处理液体经过液体流量控制阀、过滤器、流量计后在液体雾化器的作用下以喷雾的形式喷出,并且全部喷雾场均经过非平衡等离子体射流区域;S3: The valve opening electronic controller controls the opening of the liquid flow control valve, and the liquid to be treated in the liquid reservoir passes through the liquid flow control valve, filter, and flow meter and is sprayed out in the form of a spray under the action of the liquid atomizer. And all spray fields pass through the non-equilibrium plasma jet region;
S4:对净化后的液体中的目标净化物含量进行检测:若目标净化物含量达标,则保持气体流量控制阀及高压电极的供电电压不变;若目标净化物含量不达标,则增加气体流量控制阀的开度及高压电极的供电电压;S4: Detect the content of the target pollutant in the purified liquid: if the content of the target pollutant reaches the standard, keep the power supply voltage of the gas flow control valve and the high-voltage electrode unchanged; if the content of the target pollutant does not meet the standard, increase the gas flow Control the opening of the valve and the supply voltage of the high voltage electrode;
S5:再对净化后的液体中的目标净化物含量进行检测;若目标净化物含量仍未达标,则重复步骤S4;若已达标,则完成整个工作过程;S5: Detect the content of the target pollutant in the purified liquid again; if the content of the target pollutant is still not up to the standard, repeat step S4; if it has reached the standard, complete the entire working process;
S6:在非平衡等离子体射流的作用下,雾化场中液滴颗粒内所含有的病毒、细菌、微生物等目标净化物被杀灭,完成净化过程。S6: Under the action of the non-equilibrium plasma jet, the target purification substances such as viruses, bacteria, and microorganisms contained in the droplet particles in the atomization field are killed, and the purification process is completed.
以上所述仅是本发明的优选实施方式,并不用于限制本发明,应当指出,对于本技术领域的普通技术人员,在不脱离本发明技术原理的前提下,还可以做出若干改进和变型,这些改进和变型也应视为本发明的保护范围。The above is only a preferred embodiment of the present invention, and is not intended to limit the present invention. It should be pointed out that for those of ordinary skill in the art, some improvements and modifications can be made without departing from the technical principles of the present invention. , these improvements and modifications should also be regarded as the protection scope of the present invention.
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