CN1152104C - Composition for polishing substrate for magnetic disk and method for producing substrate for magnetic disk - Google Patents
Composition for polishing substrate for magnetic disk and method for producing substrate for magnetic disk Download PDFInfo
- Publication number
- CN1152104C CN1152104C CNB008012024A CN00801202A CN1152104C CN 1152104 C CN1152104 C CN 1152104C CN B008012024 A CNB008012024 A CN B008012024A CN 00801202 A CN00801202 A CN 00801202A CN 1152104 C CN1152104 C CN 1152104C
- Authority
- CN
- China
- Prior art keywords
- titanium dioxide
- polishing
- composition
- magnetic disk
- abrasive composition
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Abstract
A composition for polishing a substrate for a magnetic disk, which comprises water, fine titanium oxide particles and a polishing promoter, characterized in that 90 to 100 % of the titanium oxide constituting said particles has the same crystal structure; and a method for producing a substrate for a magnetic disk using the composition. The composition can be used for polishing a substrate for a magnetic disk, at an economical polishing rate, so as to have a reduced surface roughness and to become free from the occurrence of fine defects such as projections, scraches by abrasion and micropits.
Description
Technical field
The present invention relates to a kind of abrasive composition of magnetic disk substrate, relate more specifically to a kind of abrasive composition and the method for preparing magnetic disk substrate of magnetic disk substrate, obtain high-precision magnetic disk surface thus, so that can reduce the flying height (flying-height) of magnetic head apart from disk.
Background technology
Disk (storage hard disk) is widely used in the external storage of computer and word processor as a kind of access means fast.The representative instance of this disk is preparation like this: make the Al alloy base material make original base material through being electroless plated in surperficial plating NiP, polish the surface of original base material, form Cr alloy underlayer, Co alloy magnetic film and carbon protective film in order by sputter thereafter.
When magnetic disk surface is irregular or remaining during than the also high tubercle of magnetic head floats height, the magnetic head that floats at a high speed above the disk by predetermined height can clash into this tubercle, causes magnetic head to damage.If nodosity and polishing damage on the magnetic disk substrate, when on base material, forming Cr alloy underlayer or Co alloy magnetic film so, the defective that will produce tubercle on the surface of described magnetic film and cause because of polishing damage, thus cause disk not have high-precision level and smooth surface.Therefore, in order to prepare the high disk of surface accuracy, the base material of disk must accurately polish.
In sum, proposed a lot of abrasive compositions, said composition is removed tubercle or is reduced the tubercle height, and seldom causes polishing damage during the polishing magnetic disk substrate.For example, can have so precision, so that magnetic head does not clash into the tubercle of disk in the flying height of routine with containing the abrasive composition polishing magnetic disk substrate of the about 1 micron aluminum compound of aluminum oxide or granularity as abrasive grains.But, even use this composition, can not obtain the high surface accuracy of disk, to satisfy at present to requirement of high recording density.Simultaneously, use that to comprise granularity be the abrasive composition that the silica colloidal particle of tens nanometers is made abrasive grains, can be easy to realize high surface accuracy.But, use this composition can not obtain needed productive rate, because grinding rate is low.In addition, when polishing magnetic disk substrate for a long time with this composition, the circumferential edges of base material is exceedingly ground (this phenomenon is called " (roll-off) roll-offs ").
Japanese Patent Application Publication 10-121035 number has disclosed the abrasive composition of a kind of meticulous titanium dioxide granule as abrasive grains, and the size of described titanium dioxide granule is a submicron.Use this composition can be easy to realize high surface accuracy and grinding rate.Comprise rutile titanium dioxide in the disclosed composition of above-mentioned publication.Put down in writing in this publication: rutile titanium dioxide has little structure cell, closely knit structure and high rigidity, thereby, described composition shows excellent polishing efficiency, and put down in writing the per-cent (be rutile-type per-cent) of rutile titanium dioxide in whole titanium dioxide and be preferably 10-80%, because rutile titanium dioxide has the trend that forms polishing damage.
It is that the titanium dioxide of 10-80% is preferable that aforementioned publication has been described rutile-type per-cent.But when the coexistence of the titanium dioxide of several different crystal structures, titanium dioxide can not grind equably or is levigate forming meticulous particle, thereby is difficult to obtain the size-grade distribution of high precision and high sharpness (sharpness).Therefore, use when containing the abrasive composition of this titanium dioxide, although meeting such as small defective such as dolly dimple and little cut appearance-be not frequently-on magnetic disk substrate, and the output of base material also can reduce.
Be used to have the abrasive composition of the aluminium magnetic disk substrate of high density magnetic recording ability, must have sufficient quality, obtaining high-precision magnetic disk surface, thereby help the reduction of magnetic head floats height.
Disclosure of the Invention
In sum, target of the present invention provides a kind of method that is used for the abrasive composition of magnetic disk substrate and prepares magnetic disk substrate, and said composition and method can reduce the roughness of magnetic disk surface; Do not form irregular or tubercle, polishing damage and as tiny flaws such as dolly dimple and little cuts; Can prepare compact disk; And can under energy-saving speed, polish.
The inventor has carried out extensive studies and has found, during broken the or levigate polishing compounds of forming by titanium dioxide, obtained sharp-pointed particle size distribution figure, described titanium dioxide has single structure type as far as possible and does not comprise a large amount of crystal with different structure; But also find, when using this compound, can obtain reducing the high-precision magnetic disk substrate surface of magnetic head floats height, and can prevent common polishing damage, the appearance of the tiny flaw that particularly causes by tiny polishing damage.The present invention has finished on the basis of these discoveries.As long as there is one type crystalline structure (single crystalline structure) to account for more than 90% or 90% of titanium dioxide, used titanium dioxide can be the titanium dioxide of any crystalline structure type.
Therefore, the invention provides a kind of magnetic disk substrate abrasive composition, it comprises water, meticulous titanium dioxide granule at least and grinds promotor, it is characterized in that it is the titanium dioxide with single crystalline structure type that used titanium dioxide has 90-100%.
In addition, the method for preparing magnetic disk substrate comprises the step that aforementioned abrasive composition is provided.
Abrasive composition of the present invention can be advantageously used in high record density and (be generally 1Gbit/inch
2Above recording density) base material, as be used for the magnetic disk substrate of diamagnetic effect (MR) magnetic head.In addition, consider the enhancing of reliability, said composition also can be used for the disk that recording density is lower than above-mentioned recording density value effectively.
Preferred forms
On the magnetic disk substrate of routine, the above polishing damage of about 10 nanometers of the degree of depth will have problems.Simultaneously, on the hard disk base material-target of the present invention of low flying height type, the tiny polishing damage of about 5 nanometers of the degree of depth though do not have problems, can be induced the magnetic properties mistake.Therefore, the magnetic disk substrate with this trickle damage is considered to drop on outside the acceptable usage range.
Be contained in the titanium dioxide fine granular in the abrasive composition of the present invention as polishing compounds, comprise quantity and be the titanium dioxide of forming by the single type crystalline structure of 90-100%.That is to say that it is that 90-100% and type are any one titanium dioxide in anatase octahedrite, rutile and the brookite type that described particle comprises quantity.This particle can comprise and quantitatively is lower than 10% the titanium dioxide with other one or both structures.For example, this particle comprise quantity be 90% or above anatase titanium dioxide and quantity be lower than 10% rutile-type and/or brookite type titanium dioxide.When the titanium dioxide of being made up of the single type crystalline structure that this particle comprised quantitatively is lower than 90%, other titanium dioxide that promptly has other one or both structures quantitatively surpasses at 10% o'clock, is difficult to obtain sharp-pointed size-grade distribution.
Can determine the crystalline structure of titanium dioxide by the X-ray diffraction method (using CuK α line) that describes below.Can by in the X-ray diffraction corresponding to the peak intensity of (110) face (rutile) and ratio corresponding to the peak intensity of (101) face (anatase octahedrite), obtain the per-cent of rutile titanium dioxide by calculating.(101) face (anatase octahedrite) is overlapping with (120) face (brookite), but (121) face (brookite) (relative intensity is 90%) is not overlapping with whole anatase octahedrite face.Therefore, (120) intensity of face (brookite) (100/90 times) can obtain on the basis of anatase octahedrite face peak intensity, and the actual percentage of anatase octahedrite and brookite type titanium dioxide can obtain on the basis of the peak intensity of the intensity of (120) face (brookite) and (101) face (anatase octahedrite).
In the present invention, the method for preparing titanium dioxide has no particular limits.Typical preparation method has sulphate process and chloride process, and sulphate process comprises reaction, fusing, hydrolysis and the calcining between sulfuric acid and ilmenite (ilmenite) or the titanium slag; In chloride process, the mineral rutile dewaters in the temperature range of red heat, and mineral are contacted in being heated to about 800 ℃ chlorination furnace with chlorine, and titanium is gasified with muriatic form, distill described muriate and, obtain titanium dioxide thus the decomposition of product titanium tetrachloride direct heat.
The crystalline structure of titanium dioxide is described below.Prepare in the vapor phase process of titanium dioxide at the mixture by burning titanium tetrachloride and oxygen, at first low temperature generates stable anatase titanium dioxide down.When titanium dioxide during through thermal treatment and in the burning of 816-1040 ℃ temperature range, generate brookite type titanium dioxide, and than the higher temperature range of said temperature scope the time, generate rutile titanium dioxide (Rikagaku-Jiten, the 3rd edition, the 514-515 page or leaf).
Surpass the titanium dioxide that 90% single type crystalline structure is formed by content, commercial be available, and this titanium dioxide (if desired) can be used for the present invention by grinding or remove after the coarse-grained granularity adjustment.
In the size-grade distribution of the secondary granule of titanium dioxide used in the present invention, when granularity is positioned at the particulate cumulative amount and is the point of 90 weight %, just be called " D90 " (being that granularity is that D90 or following amounts of particles are 90 weight %), and when granularity is positioned at the particulate cumulative amount and is the point of 10 weight %, just be called " D10 " (being that granularity is that D10 or following amounts of particles are 10 weight %), the ratio of D90 and D10, promptly D90/D10 is preferably below 3, more preferably below 2.7.In this case, ratio is low more, and size-grade distribution is just sharp-pointed more.
In the present invention, the secondary granule of titanium dioxide preferably has the mean particle size of 0.1-1.0 micron.Use the dynamic light scattering method of Microtrac UPA 150 (Honeywell products), measure the mean particle size of this secondary granule by controlled standard substance.
When using the titanium dioxide fine granular, the grinding rate of base material depends on the size of secondary granule to a great extent.When the size of secondary granule increased, grinding rate raise, but the trend of polishing damage also raises.Therefore, the magnetic properties problem of disk may take place.In addition, be difficult to alleviate on the base material polishing damage in so much so that this base material can be as the base material of low flying height type hard disk.So, the mean particle size of the secondary granule of titanium dioxide be preferably 1.0 microns or below.Consider the raising of grinding rate and the reduction of (over-mastication at the undesirable substrate surface circumferential edges place) effect of roll-offing, described mean particle size be preferably 0.1 micron or more than.
Simultaneously, when the size of primary granule increased, the trend of polishing damage also raise.When the mean particle size of secondary granule falls within the above-mentioned scope, and primary granule is when very little, and grinding rate increases and can avoid the appearance of polishing damage.Therefore, the mean value of primary particle size (being the mean value of maximum particle diameter and minimum grain size) preferably falls within the scope of 0.01-0.6 micron, and this mean value is determined by using SEM (scanning electronic microscope) photo.
If the quantity of titanium dioxide is little in the abrasive composition of the present invention, grinding rate is just low so.When described quantity was big, grinding rate was just higher, but when this quantity surpassed 15 weight %, grinding rate no longer similarly increased.Consider the cost in the practicality, be limited to 20 weight % on this quantity.Therefore, the quantity of titanium dioxide preferably falls within the scope of 2-20 weight % in the abrasive composition.
In abrasive composition of the present invention, titanium dioxide shows the physical grinding effect.In order further to strengthen polishing efficiency, in composition, added the grinding promotor that base material is had chemical action.The example of spendable grinding promotor comprises aluminum nitrate (Al (NO
3)
3), Tai-Ace S 150 (Al
2(SO
4)
3), oxalic acid aluminium (Al
2(C
2O
4)
3), iron nitrate (Fe (NO
3)
3), Aluctyl (Al (C
3H
5O
3)
3), gluconic acid (C
6H
12O
7) and oxysuccinic acid (C
4H
6O
5).Certainly, aluminium salt and nitrate are preferred, and aluminum nitrate is particularly preferred.These grind promotor and can use separately, also can two or more be used in combination.Grind promotor base material is shown as chemical actions such as corrosion, so, the polishing efficiency of base material, the combination of the chemical action by grinding promotor and the physical grinding effect of titanium dioxide, and raising significantly.In addition, for improving mill efficiency effectively, except that grinding promotor, also add water miscible oxygenant in the composition.Spendable water-soluble oxidizers comprises hydrogen peroxide (H
2O
2), nitric acid, potassium permanganate (KMnO
4), perchloric acid (HClO
4), sodium perchlorate (NaClO
4) and clorox (NaClO).These oxygenants can use separately, also can two or more be used in combination.Even the oxygenant quantity that is added in the composition is very big, oxidant in effect also no longer increases, thus the consumption of oxygenant be 10 weight % or following be suitable.
The quantity of the grinding promotor that comprises in the composition of the present invention is 0.1-20 weight %, is preferably 1-15 weight %.When this quantity was lower than 0.1 weight %, grinding rate reduced.Therefore, required time of base material of polishing pre-determined quantity is elongated, so the circumferential edges of substrate surface is by undesirably over-mastication.When the quantity of grinding promotor increased to 15 weight %, grinding rate increased.But when this quantity surpassed 15 weight %, grinding rate no longer increased.Therefore, do not produce a contrary effect although add the above grinding promotor of 15 weight %, from the angle of economy, the upper limit of this quantity should be defined as 20 weight %.
Should be noted that the consumption of above-mentioned every kind of composition in composition, is the consumption when polishing magnetic disk substrate with said composition.Therefore, high efficiency is that preparation earlier and transportation comprise the abrasive composition of consumption greater than the aforementioned composition of specified volume, according to service condition composition are diluted to aforementioned consumption then.
Magnetic disk substrate abrasive composition of the present invention is a kind of soup compound, and comprising titanium dioxide, grinding promotor and water, described titanium dioxide comprises the titanium dioxide that quantity is aforementioned Detitanium-ore-type, rutile-type or the brookite type of 90-100%.If desired, described composition can further comprise water miscible oxygenant.In addition, said composition can also comprise acid or the alkali of tensio-active agent, sanitas and adjustment pH.When composition comprises as acid aluminium salts such as aluminum nitrates when grinding promotor, the pH of composition is preferably 2-5.When pH was lower than 2, composition can cause the corrosion and the operational issue of polissoir, and when pH was higher than 5, polishing efficiency can reduce, and this is unsatisfactory.
Abrasive composition of the present invention can prepare by the mode identical with conventional abrasive composition, and the titanium dioxide suspending that is about to be made up of aforementioned crystalline structure and will grind promotor and be added in the formed suspension in water.
Abrasive composition of the present invention does not have special restriction to the type of hard disk base material.But, when composition of the present invention is used for aluminium base, during particularly through the aluminium base of electroless-plating plating NiP, physical grinding effect by titanium dioxide and grind synergy between the chemical action of promotor can obtain high-quality glazed surface in industrial favourable mode.
As described in following, polish.The polishing pad that is generally used for the pulpous state abrasive composition is placed on the original base material of disk, make the rotation of described pad or original base material, between pad and original base material, infeed the abrasive composition of pulpous state simultaneously.
Comprise disk, seldom contain, and have about 3-5 surfaceness (Ra) and excellent uniformity coefficient just like trickle defectives such as dolly dimple and little cuts with the base material of abrasive composition polishing of the present invention.
Embodiment
Describing the present invention in more detail in the mode of embodiment below, is limitation of the present invention but these embodiment should be understood as.
(embodiment 1 to 16)
As highly purified titanium dioxide, Super Titania F-10 (rutile titanium dioxide: 98 weight %, anatase titanium dioxide: 2 weight %) and Super Titania F-4 (anatase titanium dioxide: 95 weight %, rutile titanium dioxide: 5 weight %) (product of Showa Titanium K.K.) uses the broken machine of medium stirring mill (medium-stirring mill) to grind respectively.Remove a small amount of coarse particles in two types of titanium dioxide, obtain mean particle size thus and be 0.3 micron titanium dioxide granule.For every kind of titanium dioxide, measure the content of crystalline structure type and the type with RAD-2B (Rigaku Denki product).In table 1, this titanium dioxide of two types, promptly Super Titania F-10 and Super Titania F-4 illustrate with titanium dioxide (1) and titanium dioxide (2) respectively.
Described granularity is the dynamic light scattering method by controlled standard substance, uses Microtrac UPA 150 (Honeywell products) to measure.The measuring result of granularity is shown in Table 1.
Then, in the ratio shown in the table 2, the titanium dioxide that obtains above, the oxygenant that grinds in promotor and some examples are mixed, to prepare different moisture abrasive compositions.Polishing is to carry out with following polishing machine and abrasive composition under the condition below.When aluminum nitrate was used as grinding promotor, the pH of abrasive composition was 2.3-4.1.
The polishing test
Used base material
3.5 the inch the aluminium disk, above it through the electroless-plating plating NiP.
Polishing machine and polishing condition
Polishing trier: 4-groove Twp-sided polishing machine
Polishing pad: kid leather packing (model: Politex DG, the product of Rodel)
The rotating speed of following table face: 60 rev/mins
The input speed of former moisture abrasive composition: 50 ml/min
Polishing time: 5 minutes
Operating pressure: 50 gram per centimeters
2
The evaluation of polishing characteristic
Grinding rate: calculate by the Different Weight of aluminium disk before and after polishing
Surfaceness (Ra): measure by using Talystep, Talydata 2000 (product of Rank Taylor Hobson)
The degree of depth of polishing damage and polishing depression can obtain by the 3D shape analytical method with the surface analyzer that contact pilotage (stylus) is housed (P-12 type, the product of TENCOR).
The evaluation result of polishing characteristic is shown in table 2.In table 2, the degree of depth that grade " A " refers to polishing damage or polishing depression is the following situations of 5 nanometers, and the degree of depth that grade " B " refers to polishing damage or polishing depression is the situation of 5-10 nanometer.In embodiment and Comparative Examples, there be not of the situation appearance of the degree of depth of polishing damage or polishing depression above 10 nanometers.
Incidentally, the content of brookite type titanium dioxide is the titanium dioxide abrasive composition of 90-100%, also shows the effect identical with the composition of embodiment.
(Comparative Examples 1 and 2)
With Super Titania F-1 (rutile titanium dioxide: 50 weight %, 50 weight %) and Super Titania F-2 (rutile titanium dioxide: 16 weight % anatase titanium dioxide:, anatase titanium dioxide: 84 weight %) (product of Showa Titanium K.K.) as titanium dioxide, Zhi Bei moisture abrasive composition is shown in Table 2 thus.Polish by the mode identical with embodiment.The results are shown in Table 2.The measuring result of the granularity of titanium dioxide granule sees Table 1.In table 1 and table 2, SuperTitania F-2 and Super Titania F-1 illustrate with titanium dioxide (3) and titanium dioxide (4) respectively.
Table 1
| The type of titanium dioxide | The crystalline structure of titanium dioxide and content (weight %) | Primary particle diameter (on average) (micron) | Secondary particle diameter (on average) (micron) | D90/D10 |
| Titanium dioxide (1) | Rutile-type 98 Detitanium-ore-types 2 | 0.2 | 0.3 | 2.4 |
| Titanium dioxide (2) | Detitanium-ore-type 95 rutile-types 5 | 0.05 | 0.3 | 2.6 |
| Titanium dioxide (3) | Rutile-type 16 Detitanium-ore-types 84 | 0.06 | 0.3 | 3.4 |
| Titanium dioxide (4) | Rutile-type 50 Detitanium-ore-types 50 | 0.1 | 0.5 | 3.4 |
Industrial applicibility
With abrasive composition polishing disk of the present invention, reduced the roughness of disk glazed surface, also reduced on the glazed surface incidence as trickle defectives such as dolly dimple and little cuts.In addition, can polish with high polishing velocity.Comprise the hard disk that can be used as low flying height type through the disk of polishing disk, and can realize high record density.
Particularly, comprise and be especially suitable for use as the media of high record density through the disk of polishing disk (recording density is 1Gbit/inch
2More than), as media as the magnetic head that utilizes diamagnetic effect.Consider that for high reliability described disk also is suitable as the low media of the more above-mentioned value of recording density.
Table 2
| Abrasive | Grind promotor | Oxygenant | Grinding rate (micron/minute) | Surfaceness (Ra) () | Polishing damage | Depression | |
| Kind quantity (weight %) | Kind quantity (weight %) | Kind quantity (weight %) | |||||
| Embodiment 1 embodiment 2 embodiment 3 embodiment 4 embodiment 5 embodiment 6 embodiment 7 embodiment 8 embodiment 9 | Titanium dioxide (1) 1 titanium dioxide (1) 5 titanium dioxide (1) 10 titanium dioxide (1) 20 titanium dioxide (1) 5 titanium dioxide (1) 5 titanium dioxide (1) 5 titanium dioxide (1) 5 titanium dioxide (1) 5 | Nitric acid aluminium 5.0 nitric acid aluminium 5.0 nitric acid aluminium 5.0 nitric acid aluminium 5.0 nitric acid aluminium 0.05 nitric acid aluminium 0.1 nitric acid aluminium 1.0 nitric acid aluminium 2.0 nitric acid aluminium 10.0 | - - - - - - - - - | 0.12 0.25 0.28 0.30 0.10 0.13 0.17 0.21 0.29 | 4 4 5 6 5 4 4 4 4 | A A A A A A A A A | A A A A A A A A A |
| Embodiment 10 | Titanium dioxide (2) 5 | Aluminum nitrate 5.0 | - | 0.28 | 4 | A | A |
| Embodiment 11 embodiment 12 | Titanium dioxide (1) 5 titanium dioxide (1) 5 | Aluminum nitrate 2.0 aluminum nitrates 2.0 | H 2O 2 1.0 HNO 3 0.2 | 0.25 0.25 | 4 4 | A A | A A |
| Embodiment 13 embodiment 14 embodiment 15 embodiment 16 | Titanium dioxide (1) 5 titanium dioxide (1) 5 titanium dioxide (1) 5 titanium dioxide (1) 5 | Oxalic acid aluminium 2.0 iron nitrates 2.0 Aluctyls 2.0 glyconic acids 1.0 | - - - - | 0.16 0.20 0.18 0.17 | 6 5 5 5 | A A A A | A A A A |
| Comparative Examples 1 Comparative Examples 2 | Titanium dioxide (3) 5 titanium dioxide (4) 5 | Aluminum nitrate 5.0 aluminum nitrates 5.0 | - - | 0.21 0.23 | 4 6 | B B | B B |
Claims (8)
1. an abrasive composition that is used for magnetic disk substrate wherein comprises water, titanium dioxide granule and grinding promotor at least, it is characterized in that the titanium dioxide of 90-100% is made up of single crystalline structure.
2. the abrasive composition of claim 1, wherein in the size-grade distribution of the secondary granule of titanium dioxide granule, the particle cumulative amount be the granularity at 90 weight % (D90) some places and ratio that the particle cumulative amount is the granularity at 10 weight % (D10) some places be 3 or below.
3. claim 1 or 2 abrasive composition, the secondary granule of wherein said titanium dioxide granule has the mean particle size of 0.1-1.0 micron.
4. each abrasive composition of claim 1 to 3, wherein said grinding promotor is aluminium salt or nitrate.
5. the abrasive composition of claim 4, wherein said aluminium salt is aluminum nitrate.
6. each abrasive composition of claim 1 to 5 wherein comprises water miscible oxygenant.
7. method for preparing magnetic disk substrate, this method comprise the step that each abrasive composition of claim 1 to 6 is offered the initial disk of disk.
8. method for preparing magnetic disk substrate, this method comprises the steps, provide claim 1 to 6 each abrasive composition between the initial substrate of disk and polishing pad, described disk initial substrate and described polishing pad have a step in rotation at least simultaneously.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP181753/1999 | 1999-06-28 | ||
| JP18175399 | 1999-06-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1315991A CN1315991A (en) | 2001-10-03 |
| CN1152104C true CN1152104C (en) | 2004-06-02 |
Family
ID=16106296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB008012024A Expired - Fee Related CN1152104C (en) | 1999-06-28 | 2000-06-28 | Composition for polishing substrate for magnetic disk and method for producing substrate for magnetic disk |
Country Status (5)
| Country | Link |
|---|---|
| CN (1) | CN1152104C (en) |
| AU (1) | AU5704300A (en) |
| MY (1) | MY128169A (en) |
| TW (1) | TW581803B (en) |
| WO (1) | WO2001000745A1 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4095833B2 (en) * | 2002-05-30 | 2008-06-04 | 株式会社フジミインコーポレーテッド | Polishing composition |
| WO2011030580A1 (en) * | 2009-09-10 | 2011-03-17 | 積水化学工業株式会社 | Photosensitive composition and printed wiring board |
| KR101257336B1 (en) * | 2012-04-13 | 2013-04-23 | 유비머트리얼즈주식회사 | Polishing slurry and method of polishing using the same |
| EP4189028A4 (en) * | 2020-08-03 | 2024-08-07 | CMC Materials LLC | TITANIUM DIOXIDE-CONTAINING CHEMICAL-MECHANICAL POLISHING SUSPENSION WITH RUTHENIUM |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3733599B2 (en) * | 1993-08-11 | 2006-01-11 | 住友化学株式会社 | Metal oxide powder and method for producing the same |
| JPH10121035A (en) * | 1996-08-30 | 1998-05-12 | Showa Denko Kk | Composition for polishing magnetic disk substrate |
| JPH11198028A (en) * | 1998-01-14 | 1999-07-27 | Showa Alum Corp | Polishing agent for magnetic disk substrate and polishing method |
-
2000
- 2000-06-27 MY MYPI20002906 patent/MY128169A/en unknown
- 2000-06-27 TW TW89112650A patent/TW581803B/en not_active IP Right Cessation
- 2000-06-28 AU AU57043/00A patent/AU5704300A/en not_active Abandoned
- 2000-06-28 CN CNB008012024A patent/CN1152104C/en not_active Expired - Fee Related
- 2000-06-28 WO PCT/JP2000/004245 patent/WO2001000745A1/en active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| TW581803B (en) | 2004-04-01 |
| AU5704300A (en) | 2001-01-31 |
| WO2001000745A1 (en) | 2001-01-04 |
| MY128169A (en) | 2007-01-31 |
| CN1315991A (en) | 2001-10-03 |
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