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CN115198232A - A kind of high toughness erosion resistant coating and preparation method thereof - Google Patents

A kind of high toughness erosion resistant coating and preparation method thereof Download PDF

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CN115198232A
CN115198232A CN202210607780.0A CN202210607780A CN115198232A CN 115198232 A CN115198232 A CN 115198232A CN 202210607780 A CN202210607780 A CN 202210607780A CN 115198232 A CN115198232 A CN 115198232A
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coating
target
vacuum chamber
erosion
substrate
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朱晓东
于雷鸣
李雁淮
孙军
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Xian Jiaotong University
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641Nitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation

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  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention belongs to the technical field of material surface coatings, and discloses a high-toughness anti-erosion coating which is a Ni-Cr-N ternary coating, wherein the atomic percent of Ni element is 2-80%, the atomic percent of Cr element is 10-80%, and the atomic percent of N element is 1-50%. The preparation method of the high-toughness erosion-resistant coating selects the NiCr alloy target with proper element proportion and corresponding deposition process parameters, adopts the multi-arc ion plating technology to evaporate the metal Cr target and the NiCr alloy target, and combines the metal Cr target and the metal Cr alloy target with Ar and N in a vacuum chamber 2 N in the mixed gas 2 The gas reacts to form a Ni-Cr-N ternary coating with proper proportion of Ni and Cr elements, namely a high-toughness anti-erosion coating on the surface of the substrate. The ratio of Ni to Cr and the number of NiCr and Cr targets in the NiCr alloy target as the target material are adjusted to ensure that the NiCr alloy target is formed by the alloy materialThe Ni and Cr content in the coating is easy to control, and the method has simple operation, stable process and easy implementation.

Description

一种高韧性抗冲蚀涂层及其制备方法A kind of high toughness erosion resistant coating and preparation method thereof

技术领域technical field

本发明属于材料表面涂层技术领域,具体是一种高韧性抗冲蚀涂层及其制备方法。The invention belongs to the technical field of material surface coatings, in particular to a high-toughness anti-erosion coating and a preparation method thereof.

背景技术Background technique

冲蚀磨损是指高速颗粒在特定角度范围对材料的冲击所引起的磨损。零件在冲蚀下外形尺寸发生变化,效率降低或失效,典型零件比如发动机叶片、泵的叶片。为了降低冲蚀对零件的损伤,延长零件寿命,人们将气相沉积硬质涂层应用在零件表面以提高其抗冲蚀损伤性能。零件受到颗粒冲蚀时往往冲蚀角度范围较广,为了有效提高零件抗低冲角冲蚀时的微切削损伤,同时抵抗高冲角冲蚀时裂纹的萌发和扩展,要求耐冲蚀材料兼具较高的硬度和良好的韧性。研究报道的新型多层陶瓷涂层虽然具有高硬度,但是这种硬质涂层会降低零件的疲劳寿命,而金属/陶瓷多层复合涂层往往无法兼顾耐高冲角和低冲角冲蚀。Erosive wear refers to the wear caused by the impact of high-speed particles on materials in a specific angle range. The dimensions of the parts change under erosion, and the efficiency is reduced or failed. Typical parts such as engine blades and pump blades. In order to reduce the damage to the parts caused by erosion and prolong the life of the parts, people apply the vapor-deposited hard coating on the surface of the parts to improve its erosion resistance performance. When the parts are eroded by particles, the erosion angle range is often wide. In order to effectively improve the micro-cutting damage of the parts when they are eroded by low attack angles, and at the same time resist the germination and expansion of cracks when they are eroded by high attack angles, erosion-resistant materials are required. With high hardness and good toughness. Although the new multilayer ceramic coating reported in the study has high hardness, this hard coating will reduce the fatigue life of the part, while the metal/ceramic multilayer composite coating often cannot balance the erosion resistance of high attack angle and low attack angle. .

针对上述问题,本申请采用氮化物强化金属相的复合涂层可以使涂层硬度大幅度提高,在提高金属基体抗冲蚀性能的同时,保留金属高韧性和抗疲劳性能的优点,故用氮化物强化金属基涂层作为兼具抗冲蚀和抗疲劳的新型涂层有良好的应用前景,目前研究CrN硬质相增强Ni基金属抗冲蚀涂层的文献尚未见报道,市面上不存在类似的材料设计。In view of the above problems, the use of nitride-strengthened metal phase composite coatings in the present application can greatly improve the hardness of the coating, while improving the erosion resistance of the metal matrix, while retaining the advantages of high metal toughness and fatigue resistance, so nitrogen is used. As a new type of coating with both erosion resistance and fatigue resistance, metal-based coatings have good application prospects. At present, the literature on CrN hard phase-enhanced Ni-based metal anti-erosion coatings has not been reported, and there is no such thing on the market. Similar Material Design.

发明内容SUMMARY OF THE INVENTION

本发明的目的是针对以上问题,本发明提供了一种高韧性抗冲蚀涂层及其制备方法,以解决背景技术中提出的问题。The purpose of the present invention is to address the above problems, and the present invention provides a high-toughness anti-erosion coating and a preparation method thereof to solve the problems raised in the background art.

为实现上述目的,本发明提供如下技术方案:一种高韧性抗冲蚀涂层,所述高韧性抗冲蚀涂层为Ni-Cr-N三元涂层,且Ni元素的原子百分比为2~80%,Cr元素的原子百分比为10~80%,N元素的原子百分比为1~50%。In order to achieve the above-mentioned purpose, the present invention provides the following technical solutions: a high-toughness anti-erosion coating, the high-toughness anti-erosion coating is a Ni-Cr-N ternary coating, and the atomic percentage of the Ni element is 2 ~80%, the atomic percentage of Cr element is 10-80%, and the atomic percentage of N element is 1-50%.

作为本发明的一种优选技术方案,所述高韧性抗冲蚀涂层的硬度为5~12GPa;划痕法测得膜基结合力大于80N;粒度在200μm二氧化硅砂粒以45°冲蚀角,130m/s速度对涂层进行冲蚀,涂层冲蚀率为0.32~0.66mg/g。As a preferred technical solution of the present invention, the hardness of the high-toughness erosion-resistant coating is 5-12GPa; the bonding force of the film base measured by the scratch method is greater than 80N; the particle size is 200μm silica sand is eroded at 45° The coating was eroded at a speed of 130 m/s, and the erosion rate of the coating was 0.32-0.66 mg/g.

本申请还提出了一种高韧性抗冲蚀涂层制备方法,具体操作步骤如下:The application also proposes a method for preparing a high-toughness anti-erosion coating, and the specific operation steps are as follows:

1)将金属Cr靶和NiCr合金靶置于多弧离子镀设备真空室内的靶座上,基底置于样品台上;1) The metal Cr target and the NiCr alloy target are placed on the target seat in the vacuum chamber of the multi-arc ion plating equipment, and the base is placed on the sample stage;

2)对多弧离子镀设备真空室抽真空,然后向真空室内通入氩气并对基底表面进行辉光溅射清洗;2) evacuating the vacuum chamber of the multi-arc ion plating equipment, then feeding argon into the vacuum chamber and performing glow sputtering cleaning on the surface of the substrate;

3)向多弧离子镀设备真空室内通入氩气,引燃Cr靶电弧,先在基底表面沉积一层Cr金属层作为打底层;3) Pour argon gas into the vacuum chamber of the multi-arc ion plating equipment to ignite the Cr target arc, and first deposit a layer of Cr metal layer on the surface of the substrate as a bottom layer;

4)向多弧离子镀设备真空室内通入氩气与氮气的混合气体,引燃NiCr靶电弧,沉积得到Ni-Cr-N高韧性抗冲蚀涂层。4) A mixed gas of argon and nitrogen is introduced into the vacuum chamber of the multi-arc ion plating equipment to ignite the NiCr target arc, and the Ni-Cr-N high-toughness erosion-resistant coating is obtained by deposition.

作为本发明的一种优选技术方案,所述1)步骤中的NiCr合金靶中Ni和Cr总量不低于为98%,且Cr的含量为20%~80%、Ni的含量为80%~20%。由于Ni不形成氮化物,涂层中以Ni为主的金属具有高韧性和抗疲劳特性。涂层中的Cr元素与氮形成的化合物具有高硬度且纳米级弥散分布的特点,不仅提高了涂层的整体硬度和强度,又保留了Ni基涂层高韧性的特点,在不同冲角条件下均具有优异的抗冲蚀性能。As a preferred technical solution of the present invention, the total amount of Ni and Cr in the NiCr alloy target in the step 1) is not less than 98%, the content of Cr is 20% to 80%, and the content of Ni is 80% ~20%. Since Ni does not form nitrides, the Ni-dominated metal in the coating has high toughness and fatigue resistance. The compound formed by Cr element and nitrogen in the coating has the characteristics of high hardness and nano-scale dispersion, which not only improves the overall hardness and strength of the coating, but also retains the high toughness of the Ni-based coating. Both have excellent erosion resistance.

作为本发明的一种优选技术方案,所述1)步骤中的基底为金属基底,且金属为钛合金、锆合金、钢或高温合金。As a preferred technical solution of the present invention, the substrate in the step 1) is a metal substrate, and the metal is titanium alloy, zirconium alloy, steel or superalloy.

作为本发明的一种优选技术方案,所述步骤2)中抽真空,直至真空室气压低于6×10-3Pa。As a preferred technical solution of the present invention, vacuum is evacuated in the step 2) until the air pressure in the vacuum chamber is lower than 6×10 -3 Pa.

作为本发明的一种优选技术方案,所述步骤2)中真空室通入氩气,使真空室气压在1.0~2.0Pa,然后在基底上施加-200~-900V的偏压,使气体发生辉光放电,通过电离的氩离子对基底表面进行溅射清洗不少于5min。As a preferred technical solution of the present invention, in the step 2), argon gas is introduced into the vacuum chamber to make the vacuum chamber pressure at 1.0-2.0Pa, and then a bias voltage of -200--900V is applied on the substrate to generate gas. Glow discharge, and sputter cleaning of the substrate surface by ionized argon ions for not less than 5 min.

作为本发明的一种优选技术方案,所述步骤3)中在沉积开始前真空室通入氩气,控制真空室气压在0.2~1.6Pa,基底施加-40V~-200V偏压,引燃金属Cr靶电弧,在基底表面沉积一层Cr金属打底层。As a preferred technical solution of the present invention, in the step 3), argon gas is introduced into the vacuum chamber before the deposition starts, the pressure of the vacuum chamber is controlled at 0.2-1.6Pa, and the substrate is biased with -40V--200V to ignite the metal The Cr target arc is used to deposit a layer of Cr metal on the surface of the substrate.

作为本发明的一种优选技术方案,所述步骤4)中,采用多弧离子镀方式制备Ni-Cr-N薄膜,工艺参数为:通入氩气与氮气混合气体,控制氩气与氮气气流量分别为10~200sccm与10~1200sccm,工作气压为0.3-4.0Pa,基底的偏压范围为-40V~-200V。As a preferred technical solution of the present invention, in the step 4), the Ni-Cr-N film is prepared by multi-arc ion plating, and the process parameters are: feeding a mixed gas of argon and nitrogen, and controlling argon and nitrogen. The flow rates are respectively 10-200 sccm and 10-1200 sccm, the working air pressure is 0.3-4.0 Pa, and the bias voltage range of the substrate is -40V--200V.

作为本发明的一种优选技术方案,所述步骤4)中,采用多弧离子镀方式制备Ni-Cr-N薄膜,沉积靶材数量为4个NiCr合金靶和4个金属Cr靶,按照工艺需要可选择开启靶的数量和组合,靶电流范围为50~150A,持续时间为20~600min。As a preferred technical solution of the present invention, in the step 4), the Ni-Cr-N film is prepared by multi-arc ion plating, and the number of deposition targets is 4 NiCr alloy targets and 4 metal Cr targets. According to the process It is necessary to select the number and combination of open targets, the target current range is 50-150A, and the duration is 20-600min.

与现有技术相比,本发明的有益效果如下:Compared with the prior art, the beneficial effects of the present invention are as follows:

本发明提供的高韧性抗冲蚀涂层的制备方法,选用了元素比例合适的NiCr合金靶以及相应的沉积工艺参数,采用多弧离子镀技术蒸发金属Cr靶和NiCr合金靶,并与真空室中Ar和N2混合气体中的N2气反应,在基底表面形成了获得了Ni、Cr元素比例适当的Ni-Cr-N三元涂层,即高韧性抗冲蚀涂层。通过调节靶材NiCr合金靶中Ni与Cr比例以及NiCr和Cr靶数量,使得该涂层中Ni和Cr的含量容易控制,并且该方法操作简单,工艺稳定,易于实施;The preparation method of the high-toughness erosion-resistant coating provided by the present invention selects a NiCr alloy target with appropriate element ratio and corresponding deposition process parameters, adopts the multi-arc ion plating technology to evaporate the metal Cr target and the NiCr alloy target, and is combined with the vacuum chamber. The N 2 gas in the mixed gas of Ar and N 2 reacts to form a Ni-Cr-N ternary coating with a proper ratio of Ni and Cr elements on the surface of the substrate, that is, a high-toughness erosion-resistant coating. By adjusting the ratio of Ni and Cr in the target NiCr alloy target and the number of NiCr and Cr targets, the content of Ni and Cr in the coating is easy to control, and the method is simple to operate, stable in process, and easy to implement;

本发明提供的高韧性抗冲蚀涂层(Ni-Cr-N三元涂层),其中Ni、Cr、N元素的原子百分比分别为2~80%、10~80%、1~50%。该涂层克服了现有硬质抗冲蚀涂层韧性的不足的问题,兼具高硬度和高韧性的特点,使其在压气机叶片、泥浆泵等承受冲蚀的零件上具有良好的应用前景。In the high toughness erosion resistant coating (Ni-Cr-N ternary coating) provided by the present invention, the atomic percentages of Ni, Cr and N elements are respectively 2-80%, 10-80% and 1-50%. The coating overcomes the problem of insufficient toughness of the existing hard erosion resistant coatings, and has the characteristics of high hardness and high toughness, making it suitable for compressor blades, mud pumps and other parts that are subject to erosion. prospect.

附图说明Description of drawings

图1为本发明制得的高韧性抗冲蚀涂层的XRD图;Fig. 1 is the XRD figure of the high toughness anti-erosion coating that the present invention makes;

图2为本发明制得的高韧性抗冲蚀涂层的表面形貌。Fig. 2 is the surface morphology of the high toughness erosion resistant coating prepared by the present invention.

具体实施方式Detailed ways

下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

实施例1Example 1

1)将4块金属Cr靶和4块NiCr合金靶置于多弧离子镀设备真空室内的靶座上,NiCr合金靶中Ni:Cr比例为80:20;1) Place 4 metal Cr targets and 4 NiCr alloy targets on the target base in the vacuum chamber of the multi-arc ion plating equipment, and the ratio of Ni:Cr in the NiCr alloy targets is 80:20;

2)选用钛合金作为基底材料,将其打磨抛光,清洗吹干后,置于真空室内的样品台上;2) Select titanium alloy as the base material, grind and polish it, clean and dry it, and place it on the sample stage in the vacuum chamber;

3)对多弧离子镀设备真空室抽真空,直至真空室气压低于6×10-3Pa,通入氩气,控制气压为1.0Pa,在基底上施加-900V偏压,使气体发生辉光放电,对基底表面进行溅射清洗20min;3) Evacuate the vacuum chamber of the multi-arc ion plating equipment until the pressure of the vacuum chamber is lower than 6×10 -3 Pa, pass argon gas, control the pressure to 1.0Pa, and apply -900V bias on the substrate to make the gas glow. Photodischarge, sputter cleaning the substrate surface for 20min;

4)沉积开始前向多弧离子镀设备真空室通入氩气,控制气压为0.2Pa,基底偏压调至-40V,引燃Cr靶电弧,在基底表面沉积一层厚度约0.1微米的Cr金属打底层;4) Before the deposition starts, pass argon gas into the vacuum chamber of the multi-arc ion plating equipment, control the air pressure to 0.2Pa, adjust the substrate bias to -40V, ignite the Cr target arc, and deposit a layer of Cr with a thickness of about 0.1 microns on the substrate surface. metal bottom layer;

5)向多弧离子镀设备真空室内通入氩气与氮气的混合气体,控制氩气和氮气流量为10sccm与200sccm,真空室气压为0.3Pa,偏压为-40V,引燃4块NiCr靶和1块Cr靶,NiCr靶和Cr靶电流分别为100A和50A,时间为90min,镀膜结束后,停止通入氩气与氮气,保持真空状态,至基底温度≤60℃,最终制得高韧性抗冲蚀涂层(Ni-Cr-N三元硬质涂层)。涂层中元素的原子百分含量为48.8Ni-26.8Cr-24.4N,涂层的硬度为8.7GPa,膜基结合力大于100N,冲蚀率为0.58mg/g。5) Pour a mixture of argon and nitrogen into the vacuum chamber of the multi-arc ion plating equipment, control the flow rates of argon and nitrogen to be 10sccm and 200sccm, the vacuum chamber pressure is 0.3Pa, the bias voltage is -40V, and 4 pieces of NiCr targets are ignited And 1 piece of Cr target, the current of NiCr target and Cr target is 100A and 50A respectively, and the time is 90min. After the coating is finished, stop feeding argon and nitrogen, keep the vacuum state, until the substrate temperature is less than or equal to 60℃, and finally high toughness is obtained. Erosion resistant coating (Ni-Cr-N ternary hard coating). The atomic percentage of elements in the coating is 48.8Ni-26.8Cr-24.4N, the hardness of the coating is 8.7GPa, the bonding force of the film base is greater than 100N, and the erosion rate is 0.58mg/g.

实施例2Example 2

1)将4块金属Cr靶和4块NiCr合金靶置于多弧离子镀设备真空室内的靶座上,NiCr合金靶中Ni:Cr比例为80:20;1) Place 4 metal Cr targets and 4 NiCr alloy targets on the target base in the vacuum chamber of the multi-arc ion plating equipment, and the ratio of Ni:Cr in the NiCr alloy targets is 80:20;

2)选用钛合金作为基底材料,将其打磨抛光,清洗吹干后,置于真空室内的样品台上;2) Select titanium alloy as the base material, grind and polish it, clean and dry it, and place it on the sample stage in the vacuum chamber;

3)对多弧离子镀设备真空室抽真空,直至真空室气压低于6×10-3Pa,通入氩气,控制气压为1.5Pa,在基底上施加-600V偏压,使气体发生辉光放电,对基底表面进行溅射清洗15min;3) Evacuate the vacuum chamber of the multi-arc ion plating equipment until the pressure of the vacuum chamber is lower than 6×10 -3 Pa, pass argon gas, control the air pressure to 1.5Pa, and apply -600V bias on the substrate to make the gas glow. Photodischarge, sputter cleaning the substrate surface for 15min;

4)沉积开始前向多弧离子镀设备真空室通入氩气,控制气压为0.4Pa,基底偏压调至-80V,引燃Cr靶电弧,在基底表面沉积一层Cr金属打底层;4) Before the deposition starts, feed argon into the vacuum chamber of the multi-arc ion plating equipment, control the air pressure to be 0.4Pa, adjust the substrate bias to -80V, ignite the Cr target arc, and deposit a layer of Cr metal on the substrate surface to play the bottom layer;

5)向多弧离子镀设备真空室内通入氩气与氮气的混合气体,控制氩气和氮气流量为380sccm与10sccm,真空室气压为1.0Pa,偏压为-60V,引燃4块NiCr靶,设置靶电流为60A,时间为120min,镀膜结束后,停止通入氩气与氮气,保持真空状态,至基底温度≤60℃,最终制得高韧性抗冲蚀涂层(Ni-Cr-N三元硬质涂层)。涂层中元素的原子百分含量为79.7Ni-19.3Cr-1.0N,涂层的硬度为5.3GPa,膜基结合力大于100N,冲蚀率为0.66mg/g。5) Pour the mixed gas of argon and nitrogen into the vacuum chamber of the multi-arc ion plating equipment, control the flow of argon and nitrogen to be 380sccm and 10sccm, the vacuum chamber pressure is 1.0Pa, the bias voltage is -60V, and 4 pieces of NiCr targets are ignited , set the target current to 60A and the time to 120min. After the coating is over, stop feeding argon and nitrogen, keep the vacuum state until the substrate temperature is less than or equal to 60 °C, and finally obtain a high-toughness erosion-resistant coating (Ni-Cr-N ternary hard coating). The atomic percentage of elements in the coating is 79.7Ni-19.3Cr-1.0N, the hardness of the coating is 5.3GPa, the bonding force of the film base is greater than 100N, and the erosion rate is 0.66mg/g.

实施例3Example 3

1)将4块金属Cr靶和4块NiCr合金靶置于多弧离子镀设备真空室内的靶座上,NiCr合金靶中Ni:Cr比例为20:80;1) Place 4 pieces of metal Cr targets and 4 pieces of NiCr alloy targets on the target base in the vacuum chamber of the multi-arc ion plating equipment, and the ratio of Ni:Cr in the NiCr alloy targets is 20:80;

2)选用镍基高温合金作为基底材料,将其打磨抛光,清洗吹干后,置于真空室内的样品台上;2) Select nickel-based superalloy as the base material, grind and polish it, clean and dry it, and place it on the sample stage in the vacuum chamber;

3)对多弧离子镀设备真空室抽真空,直至真空室气压低于6×10-3Pa,通入氩气,控制气压为1.0Pa,在基底上施加-800V偏压,使气体发生辉光放电,对基底表面进行溅射清洗30min;3) Evacuate the vacuum chamber of the multi-arc ion plating equipment until the pressure of the vacuum chamber is lower than 6×10 -3 Pa, pass argon gas, control the pressure to 1.0Pa, and apply -800V bias on the substrate to make the gas glow. Photodischarge, sputter cleaning the substrate surface for 30min;

4)沉积开始前向多弧离子镀设备真空室通入氩气,控制气压为0.8Pa,基底偏压调至-100V,引燃Cr靶电弧,在基底表面沉积一层Cr金属打底层;4) Before the deposition starts, pass argon into the vacuum chamber of the multi-arc ion plating equipment, control the air pressure to 0.8Pa, adjust the substrate bias to -100V, ignite the Cr target arc, and deposit a layer of Cr metal on the substrate surface to play the bottom layer;

5)向多弧离子镀设备真空室内通入氩气与氮气的混合气体,控制氩气和氮气流量为10sccm与1200sccm,真空室气压为4.0Pa,偏压为-120V,引燃1块NiCr靶和4块Cr靶,NiCr靶和Cr靶电流分别为50A和150A,时间为240min,镀膜结束后,停止通入氩气与氮气,保持真空状态,至基底温度≤60℃,最终制得高韧性抗冲蚀涂层(Ni-Cr-N三元硬质涂层)。涂层中元素的原子百分含量为2.1Ni-49.2Cr-48.7N,涂层的硬度为12.0GPa,膜基结合力大于80N,冲蚀率为0.32mg/g。5) Pour the mixed gas of argon and nitrogen into the vacuum chamber of the multi-arc ion plating equipment, control the flow rates of argon and nitrogen to be 10sccm and 1200sccm, the vacuum chamber pressure is 4.0Pa, the bias voltage is -120V, and 1 piece of NiCr target is ignited And 4 pieces of Cr target, the current of NiCr target and Cr target is 50A and 150A respectively, and the time is 240min. After the coating is finished, stop feeding argon and nitrogen, keep the vacuum state, until the substrate temperature is less than or equal to 60℃, and finally obtain high toughness. Erosion resistant coating (Ni-Cr-N ternary hard coating). The atomic percentage of elements in the coating is 2.1Ni-49.2Cr-48.7N, the hardness of the coating is 12.0GPa, the bonding force of the film base is greater than 80N, and the erosion rate is 0.32mg/g.

实施例4Example 4

1)将4块金属Cr靶和4块NiCr合金靶置于多弧离子镀设备真空室内的靶座上,NiCr合金靶中Ni:Cr比例为80:20;1) Place 4 metal Cr targets and 4 NiCr alloy targets on the target base in the vacuum chamber of the multi-arc ion plating equipment, and the ratio of Ni:Cr in the NiCr alloy targets is 80:20;

2)选用锆合金作为基底材料,将其打磨抛光,清洗吹干后,置于真空室内的样品台上;2) Select zirconium alloy as the base material, grind and polish it, clean and dry it, and place it on the sample stage in the vacuum chamber;

3)对多弧离子镀设备真空室抽真空,直至真空室气压低于6×10-3Pa,通入氩气,控制气压为1.0Pa,在基底上施加-900V偏压,使气体发生辉光放电,对基底表面进行溅射清洗30min;3) Evacuate the vacuum chamber of the multi-arc ion plating equipment until the pressure of the vacuum chamber is lower than 6×10 -3 Pa, pass argon gas, control the pressure to 1.0Pa, and apply -900V bias on the substrate to make the gas glow. Photodischarge, sputter cleaning the substrate surface for 30min;

4)沉积开始前向多弧离子镀设备真空室通入氩气,控制气压为0.6Pa,基底偏压调至-120V,引燃Cr靶电弧,在基底表面沉积一层Cr金属打底层;4) Before the deposition starts, pass argon into the vacuum chamber of the multi-arc ion plating equipment, control the air pressure to 0.6Pa, adjust the substrate bias to -120V, ignite the Cr target arc, and deposit a layer of Cr metal on the substrate surface to play the bottom layer;

5)向多弧离子镀设备真空室内通入氩气与氮气的混合气体,控制氩气和氮气流量为40sccm与500sccm,真空室气压为1.5Pa,偏压为-200V,引燃4块NiCr靶和3块Cr靶,NiCr靶和Cr靶电流分别为150A和120A,时间为20min,镀膜结束后,停止通入氩气与氮气,保持真空状态,至基底温度≤60℃,最终制得高韧性抗冲蚀涂层(Ni-Cr-N三元硬质涂层)。涂层中元素的原子百分含量为38.4Ni-31.7Cr-29.9N,涂层的硬度为9.0GPa,约为钛合金基体的3倍。膜基结合力大于100N,冲蚀率为0.46mg/g,抗冲蚀能力为钛合金基体的2.6倍,具体情况详见表1与表2。5) Pour the mixed gas of argon and nitrogen into the vacuum chamber of the multi-arc ion plating equipment, control the flow of argon and nitrogen to be 40sccm and 500sccm, the vacuum chamber pressure is 1.5Pa, the bias voltage is -200V, and 4 pieces of NiCr targets are ignited And 3 pieces of Cr target, the current of NiCr target and Cr target is 150A and 120A respectively, and the time is 20min. After the coating is finished, stop feeding argon and nitrogen, keep the vacuum state, until the substrate temperature is less than or equal to 60℃, and finally obtain high toughness. Erosion resistant coating (Ni-Cr-N ternary hard coating). The atomic percentage of the elements in the coating is 38.4Ni-31.7Cr-29.9N, and the hardness of the coating is 9.0GPa, which is about 3 times that of the titanium alloy substrate. The bonding force of the film base is greater than 100N, the erosion rate is 0.46mg/g, and the erosion resistance is 2.6 times that of the titanium alloy base. For details, see Table 1 and Table 2.

实施例5Example 5

1)将4块金属Cr靶和4块NiCr合金靶置于多弧离子镀设备真空室内的靶座上,NiCr合金靶中Ni:Cr比例为80:20;1) Place 4 metal Cr targets and 4 NiCr alloy targets on the target base in the vacuum chamber of the multi-arc ion plating equipment, and the ratio of Ni:Cr in the NiCr alloy targets is 80:20;

2)选用H13钢作为基底材料,将其打磨抛光,清洗吹干后,置于真空室内的样品台上;2) Select H13 steel as the base material, grind and polish it, clean and dry it, and place it on the sample stage in the vacuum chamber;

3)对多弧离子镀设备真空室抽真空,直至真空室气压低于6×10-3Pa,通入氩气,控制气压为2.0Pa,在基底上施加-200V偏压,使气体发生辉光放电,对基底表面进行溅射清洗30min;3) Evacuate the vacuum chamber of the multi-arc ion plating equipment until the pressure of the vacuum chamber is lower than 6×10 -3 Pa, pass argon gas, control the pressure to 2.0Pa, and apply -200V bias on the substrate to make the gas glow. Photodischarge, sputter cleaning the substrate surface for 30min;

4)沉积开始前向多弧离子镀设备真空室通入氩气,控制气压为1.6Pa,基底偏压调至-200V,引燃Cr靶电弧,在基底表面沉积一层Cr金属打底层;4) Before the deposition starts, pass argon gas into the vacuum chamber of the multi-arc ion plating equipment, control the air pressure to 1.6Pa, adjust the substrate bias to -200V, ignite the Cr target arc, and deposit a layer of Cr metal on the substrate surface to play the bottom layer;

5)向多弧离子镀设备真空室内通入氩气与氮气的混合气体,控制氩气和氮气流量为200sccm与100sccm,真空室气压为0.8Pa,偏压为-100V,引燃2块NiCr靶和2块Cr靶,NiCr靶和Cr靶电流分别为50A和50A,时间为600min,镀膜结束后,停止通入氩气与氮气,保持真空状态,至基底温度≤60℃,最终制得高韧性抗冲蚀涂层(Ni-Cr-N三元硬质涂层)。涂层中元素的原子百分含量为28.3Ni-45.6Cr-26.1N,涂层的硬度为8.4GPa,膜基结合力大于100N,冲蚀率为0.53mg/g。5) Pour the mixed gas of argon and nitrogen into the vacuum chamber of the multi-arc ion plating equipment, control the flow of argon and nitrogen to be 200sccm and 100sccm, the vacuum chamber pressure is 0.8Pa, the bias voltage is -100V, and 2 pieces of NiCr targets are ignited And 2 pieces of Cr target, the current of NiCr target and Cr target is 50A and 50A respectively, and the time is 600min. After the coating is finished, stop feeding argon and nitrogen, keep the vacuum state, until the substrate temperature is less than or equal to 60℃, and finally obtain high toughness. Erosion resistant coating (Ni-Cr-N ternary hard coating). The atomic percentage of the elements in the coating is 28.3Ni-45.6Cr-26.1N, the hardness of the coating is 8.4GPa, the bonding force of the film base is greater than 100N, and the erosion rate is 0.53mg/g.

表1本发明制得的高韧性抗冲蚀涂层(实施例4)的硬度和结合力Table 1 Hardness and bonding force of the high-toughness erosion-resistant coating (Example 4) prepared by the present invention

Figure BDA0003671028000000071
Figure BDA0003671028000000071

表2本发明制得的高韧性抗冲蚀涂层(实施例4)与钛合金基体冲蚀率对比表Table 2 Comparison table of erosion rate between high toughness erosion resistant coating (Example 4) made by the present invention and titanium alloy substrate

Figure BDA0003671028000000081
Figure BDA0003671028000000081

需要说明的是,在本文中,诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来,而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物品或者设备所固有的要素。It should be noted that, in this document, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any relationship between these entities or operations. any such actual relationship or sequence exists. Moreover, the terms "comprising", "comprising" or any other variation thereof are intended to encompass a non-exclusive inclusion such that a process, method, article or device that includes a list of elements includes not only those elements, but also includes not explicitly listed or other elements inherent to such a process, method, article or apparatus.

尽管已经示出和描述了本发明的实施例,对于本领域的普通技术人员而言,可以理解在不脱离本发明的原理和精神的情况下可以对这些实施例进行多种变化、修改、替换和变型,本发明的范围由所附权利要求及其等同物限定。Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, and substitutions can be made in these embodiments without departing from the principle and spirit of the invention and modifications, the scope of the present invention is defined by the appended claims and their equivalents.

Claims (10)

1. A high toughness, erosion resistant coating characterized by: the high-toughness anti-erosion coating is a Ni-Cr-N ternary metal-nitride multiphase single-layer coating, wherein the atomic percent of Ni element is 2-80%, the atomic percent of Cr element is 10-80%, and the atomic percent of N element is 1-50%.
2. A high toughness impact resistant coating according to claim 1 wherein: the hardness of the high-toughness anti-erosion coating is 5-12 GPa; the bonding force of the film base is more than 80N measured by a scratch method; the silicon dioxide sand grains with the grain size of 200 mu m erode the coating at an erosion angle of 45 degrees and a speed of 130m/s, and the erosion rate of the coating is 0.32-0.66 mg/g.
3. A preparation method of a high-toughness anti-erosion coating is characterized by comprising the following specific operation steps:
1) Placing a metal Cr target and a metal NiCr alloy target on a target seat in a vacuum chamber of multi-arc ion plating equipment, and placing a substrate on a sample table;
2) Vacuumizing a vacuum chamber of the multi-arc ion plating equipment, introducing argon into the vacuum chamber, and performing glow sputtering cleaning on the surface of the substrate;
3) Introducing argon into a vacuum chamber of multi-arc ion plating equipment, igniting a Cr target arc, and depositing a Cr metal layer on the surface of a substrate to be used as a priming layer;
4) And introducing mixed gas of argon and nitrogen into a vacuum chamber of the multi-arc ion plating equipment, igniting NiCr target arc, and depositing to obtain the Ni-Cr-N high-toughness anti-erosion coating.
4. A method of producing a high toughness erosion resistant coating in accordance with claim 3, wherein: the total amount of Ni and Cr in the NiCr alloy target in the step 1) is not less than 98%, the content of Cr is 20-80%, and the content of Ni is 80-20%.
5. A method of producing a high toughness erosion resistant coating in accordance with claim 3, wherein: the substrate in the step 1) is a metal substrate, and the metal is titanium alloy, zirconium alloy, steel or high-temperature alloy.
6. A process for preparing a high toughness impact resistant coating as claimed in claim 3, wherein: vacuumizing in the step 2) until the air pressure of the vacuum chamber is lower than 6 x 10 -3 Pa。
7. A process for preparing a high toughness impact resistant coating as claimed in claim 3, wherein: introducing argon into the vacuum chamber in the step 2), enabling the air pressure of the vacuum chamber to be 1.0-2.0 Pa, then applying a bias voltage of-200 to-900V on the substrate, enabling the gas to generate glow discharge, and carrying out sputtering cleaning on the surface of the substrate for not less than 5min through ionized argon ions.
8. A method of producing a high toughness erosion resistant coating in accordance with claim 3, wherein: in the step 3), argon is introduced into the vacuum chamber before deposition is started, the air pressure of the vacuum chamber is controlled to be 0.2-1.6 Pa, the substrate is applied with a bias voltage of-40V to-200V, a metal Cr target arc is ignited, and a Cr metal priming layer is deposited on the surface of the substrate.
9. A method of producing a high toughness erosion resistant coating in accordance with claim 3, wherein: in the step 4), a multi-arc ion plating mode is adopted to prepare the Ni-Cr-N film, and the technological parameters are as follows: introducing mixed gas of argon and nitrogen, controlling the flow rates of the argon and the nitrogen to be 10-200 sccm and 10-1200 sccm respectively, controlling the working pressure to be 0.3-4.0Pa, and controlling the bias range of the substrate to be-40V to-200V.
10. A method of producing a high toughness erosion resistant coating in accordance with claim 3, wherein: in the step 4), a multi-arc ion plating mode is adopted to prepare the Ni-Cr-N film, the number of the deposited target materials is 4 NiCr alloy targets and 4 metal Cr targets, the number and the combination of the starting targets can be selected according to the process requirements, the target current range is 50-150A, and the duration is 20-600 min.
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Application publication date: 20221018