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CN114911136A - Mask plate pre-alignment system and method and screen-stretching equipment - Google Patents

Mask plate pre-alignment system and method and screen-stretching equipment Download PDF

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CN114911136A
CN114911136A CN202110181904.9A CN202110181904A CN114911136A CN 114911136 A CN114911136 A CN 114911136A CN 202110181904 A CN202110181904 A CN 202110181904A CN 114911136 A CN114911136 A CN 114911136A
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offset
reticle
module
adsorption
alignment
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吴福龙
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/707Chucks, e.g. chucking or un-chucking operations or structural details
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049Technique, e.g. interferometric
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)

Abstract

The embodiment of the invention discloses a mask plate pre-alignment system and a method and a mesh opening device, wherein the mask plate pre-alignment system comprises a pre-alignment module, a transmission module and an offset detection module; the offset detection module is used for detecting the offset of the mask plate after the mask plate is flattened by the pre-alignment module; the pre-alignment module is used for adjusting the position of the mask plate according to the rotation offset so as to compensate the rotation offset; the transmission module is also used for adjusting the position of the mask plate according to the distance offset so as to compensate the distance offset. According to the technical scheme of the invention, the offset detection module detects the offset of the mask after the mask is flattened, so that the influence of the mask wrinkles and other conditions on the detection of the offset of the mask can be avoided, and the accuracy of the detection of the offset of the mask is ensured. The mask plate pre-alignment system can not only realize the compensation of the rotary offset, but also realize the compensation of the distance offset in the set direction, thereby improving the pre-alignment precision of the mask plate.

Description

掩模版预对准系统和方法、张网设备Reticle pre-alignment system and method, and netting equipment

技术领域technical field

本发明实施例涉及半导体工艺设备技术领域,尤其涉及一种掩模版预对准系统和方法、张网设备。Embodiments of the present invention relate to the technical field of semiconductor process equipment, and in particular, to a reticle pre-alignment system and method, and a net stretching device.

背景技术Background technique

在半导体工艺设备中,掩模版预对准系统为其中一个重要的系统。In semiconductor processing equipment, the reticle pre-alignment system is one of the important systems.

掩模版预对准系统中,传输机械手把金属薄膜传送到张网设备的夹爪交接位,夹爪将其传送到工件台。在夹爪对金属薄膜进行搬运前,需要预对准装置对金属薄膜进行补偿,才能保证预对准系统的对准精度。In the reticle pre-alignment system, the transfer manipulator transfers the metal film to the handover position of the jaws of the web-stretching equipment, and the jaws transfer it to the workpiece table. Before the metal film is transported by the gripper, a pre-alignment device is required to compensate the metal film to ensure the alignment accuracy of the pre-alignment system.

通常,在经过掩模版预对准系统对掩模版的预对准之后,将掩模版传输至张网设备的工作台。然而,现有预对准系统大多难以保证对掩模版的预对准精度,导致张网精度较差。Typically, after the reticle has been pre-aligned by a reticle pre-alignment system, the reticle is transferred to the stage of the screen-stretching apparatus. However, most of the existing pre-alignment systems are difficult to ensure the pre-alignment accuracy of the reticle, resulting in poor screen-stretching accuracy.

发明内容SUMMARY OF THE INVENTION

本发明提供一种掩模版预对准系统和方法、张网设备,以实现提高预对准系统的预对准精度,进而提高张网精度。The present invention provides a reticle pre-alignment system and method, and a screen-stretching device, so as to improve the pre-alignment accuracy of the pre-alignment system and further improve the web-stretching accuracy.

第一方面,本发明实施例提供了一种掩模版预对准系统,包括:预对准模块、传送模块、偏移量检测模块;偏移量检测模块分别与预对准模块和传送模块连接;传送模块用于将掩模版从预对准模块传输至工作台;In a first aspect, an embodiment of the present invention provides a reticle pre-alignment system, including: a pre-alignment module, a transmission module, and an offset detection module; the offset detection module is respectively connected to the pre-alignment module and the transmission module ; the transfer module is used to transfer the reticle from the pre-alignment module to the table;

偏移量检测模块用于掩模版在预对准模块展平后,检测掩模版的偏移量,偏移量至少包括掩模版相对于参考平面的旋转偏移量和在设定方向上的距离偏移量,并将旋转偏移量发送至预对准模块以及将距离偏移量发送至传送模块;The offset detection module is used to detect the offset of the reticle after the reticle is flattened by the pre-alignment module. The offset includes at least the rotation offset of the reticle relative to the reference plane and the distance in the set direction. offset, and send the rotation offset to the pre-alignment module and the distance offset to the transmission module;

预对准模块用于根据旋转偏移量调整掩模版的位置,以对旋转偏移量进行补偿;The pre-alignment module is used to adjust the position of the reticle according to the rotation offset to compensate for the rotation offset;

传送模块还用于根据距离偏移量调整掩模版的位置,以对距离偏移量进行补偿。The transfer module is also used to adjust the position of the reticle according to the distance offset to compensate for the distance offset.

可选的,预对准模块包括支撑板,支撑板的设定表面划分为中心放置区和边缘吸附区,边缘吸附区至少位于中心放置区的相对两侧;Optionally, the pre-alignment module includes a support plate, the set surface of the support plate is divided into a center placement area and an edge adsorption area, and the edge adsorption areas are located at least on opposite sides of the center placement area;

边缘吸附区包括吸附结构,吸附结构用于对掩模版进行吸附以使掩模版在设定表面展平。The edge suction area includes a suction structure, and the suction structure is used for suctioning the reticle to flatten the reticle on the set surface.

可选的,吸附结构包括吸附接头以及包括多个第一吸附孔的吸附本体,吸附本体设置于支撑板的设定表面;Optionally, the adsorption structure includes an adsorption joint and an adsorption body including a plurality of first adsorption holes, and the adsorption body is arranged on a setting surface of the support plate;

支撑板中包括气道,吸附接头通过支撑板中的气道与第一吸附孔连通。The support plate includes an air channel, and the adsorption joint is communicated with the first adsorption hole through the air channel in the support plate.

可选的,第一吸附孔的孔径为2-20微米,第一吸附孔在边缘吸附区均匀分布。Optionally, the diameter of the first adsorption holes is 2-20 microns, and the first adsorption holes are uniformly distributed in the edge adsorption area.

可选的,在边缘吸附区,支撑板的开设有多个第二吸附孔,吸附结构包括第二吸附孔和吸附接头,吸附接头与第二吸附孔连通;Optionally, in the edge adsorption area, the support plate is provided with a plurality of second adsorption holes, the adsorption structure includes a second adsorption hole and an adsorption joint, and the adsorption joint is communicated with the second adsorption hole;

可选的,第二吸附孔的直径大于15微米;Optionally, the diameter of the second adsorption hole is greater than 15 microns;

可选的,第二吸附孔均匀排布。Optionally, the second adsorption holes are evenly arranged.

可选的,预对准模块还包括第一控制单元和驱动单元,第一控制单元分别与偏移量检测模块和驱动单元电连接,驱动单元与支撑板连接;Optionally, the pre-alignment module further includes a first control unit and a drive unit, the first control unit is electrically connected to the offset detection module and the drive unit respectively, and the drive unit is connected to the support plate;

第一控制单元用于根据旋转偏移量向驱动单元发送第一控制信号,以使驱动单元驱动支撑板转动以调整掩模版的位置。The first control unit is used for sending a first control signal to the driving unit according to the rotation offset, so that the driving unit drives the supporting plate to rotate to adjust the position of the reticle.

可选的,传送模块包括第二控制单元和抓取单元,第二控制单元分别与偏移量检测模块和抓取单元电连接,第二控制单元根据距离偏移量向抓取单元发送第二控制信号,以使抓取单元在抓取掩模版后在设定方向上调整掩模版的位置。Optionally, the transmission module includes a second control unit and a grasping unit, the second control unit is electrically connected to the offset detection module and the grasping unit respectively, and the second control unit sends the second control unit to the grasping unit according to the distance offset. A control signal to make the grasping unit adjust the position of the reticle in the set direction after grasping the reticle.

可选的,设定方向为与预对准模块指向工作台的方向垂直的方向。Optionally, the set direction is a direction perpendicular to the direction in which the pre-alignment module points to the workbench.

第二方面,本发明实施例还提供了一种掩模版预对准方法,包括:In a second aspect, an embodiment of the present invention also provides a reticle pre-alignment method, including:

在掩模版在预对准模块展平后,偏移量检测模块检测掩模版的偏移量,偏移量至少包括掩模版相对于参考平面的旋转偏移量和在参考平面的设定方向上的距离偏移量,并将旋转偏移量发送至预对准模块以及将距离偏移量发送至传送模块;After the reticle is flattened by the pre-alignment module, the offset detection module detects the offset of the reticle, and the offset at least includes the rotational offset of the reticle relative to the reference plane and the set direction of the reference plane and send the rotation offset to the pre-alignment module and the distance offset to the transfer module;

预对准模块根据旋转偏移量调整掩模版的位置,以对旋转偏移量进行补偿;The pre-alignment module adjusts the position of the reticle according to the rotation offset to compensate for the rotation offset;

传送模块根据距离偏移量调整掩模版的位置,以对距离偏移量进行补偿。The transfer module adjusts the position of the reticle according to the distance offset to compensate for the distance offset.

可选的,在掩模版在预对准模块展平后,偏移量检测模块检测掩模版的偏移量之前,还包括:Optionally, after the reticle is flattened by the pre-alignment module and before the offset detection module detects the offset of the reticle, the method further includes:

传送模块夹取掩模版张紧后放置于预对准模块的支撑板的设定表面;The transfer module clamps the reticle and places it on the set surface of the support plate of the pre-alignment module;

吸附结构对掩模版进行吸附以使掩模版在设定表面展平;The adsorption structure adsorbs the reticle to flatten the reticle on the set surface;

传送模块释放掩模版。The transfer module releases the reticle.

可选的,在传送模块根据距离偏移量调整掩模版的位置,以对距离偏移量进行补偿之前,还包括:Optionally, before the transfer module adjusts the position of the reticle according to the distance offset to compensate for the distance offset, the method further includes:

传送模块夹取掩模版;The transfer module clamps the reticle;

吸附结构停止对掩模版的吸附。The adsorption structure stops the adsorption of the reticle.

可选的,预对准模块还包括第一控制单元和驱动单元;预对准模块根据旋转偏移量调整掩模版的位置,以对旋转偏移量进行补偿,包括:Optionally, the pre-alignment module further includes a first control unit and a driving unit; the pre-alignment module adjusts the position of the reticle according to the rotational offset to compensate for the rotational offset, including:

第一控制单元根据旋转偏移量向驱动单元发送第一控制信号,以使驱动单元驱动支撑板转动以调整掩模版的位置。The first control unit sends a first control signal to the drive unit according to the rotation offset, so that the drive unit drives the support plate to rotate to adjust the position of the reticle.

可选的,传送模块包括第二控制单元和抓取单元;传送模块根据距离偏移量调整掩模版的位置,以对距离偏移量进行补偿,包括:Optionally, the transfer module includes a second control unit and a grasping unit; the transfer module adjusts the position of the reticle according to the distance offset to compensate for the distance offset, including:

第二控制单元根据距离偏移量向抓取单元发送第二控制信号,以使抓取单元在抓取掩模版后在设定方向上调整掩模版的位置。The second control unit sends a second control signal to the grabbing unit according to the distance offset, so that the grabbing unit adjusts the position of the reticle in the set direction after grabbing the reticle.

可选的,在传送模块根据距离偏移量调整掩模版的位置,以对距离偏移量进行补偿之后,还包括:Optionally, after the transmission module adjusts the position of the reticle according to the distance offset to compensate for the distance offset, the method further includes:

传送模块将掩模版放置于支撑板的设定表面,吸附结构对掩模版进行吸附,传送模块释放掩模版;The transfer module places the reticle on the set surface of the support plate, the adsorption structure adsorbs the reticle, and the transfer module releases the reticle;

偏移量检测模块检测旋转偏移量和距离偏移量是否满足设定要求,在旋转偏移量不满足设定要求时,返回执行预对准模块根据旋转偏移量调整掩模版的位置,以对旋转偏移量进行补偿及其后续步骤;在距离偏移量不满足设定要求时,返回执行传送模块根据距离偏移量调整掩模版的位置,以对距离偏移量进行补偿及其后续步骤。The offset detection module detects whether the rotation offset and distance offset meet the set requirements. When the rotation offset does not meet the set requirements, it returns to execute the pre-alignment module to adjust the position of the reticle according to the rotation offset. In order to compensate the rotation offset and its subsequent steps; when the distance offset does not meet the set requirements, return to execute the transfer module to adjust the position of the reticle according to the distance offset to compensate for the distance offset and Next steps.

第三方面,本发明实施例还提供了一种张网设备,包括第一方面提供的掩模版预对准系统。In a third aspect, an embodiment of the present invention further provides a net stretching device, including the reticle pre-alignment system provided in the first aspect.

本发明实施例提供了掩模版预对准系统和方法、张网设备,其中掩模版预对准系统包括预对准模块、传送模块、偏移量检测模块;偏移量检测模块用于掩模版在预对准模块展平后,检测掩模版的偏移量,偏移量至少包括掩模版相对于参考平面的旋转偏移量和在设定方向上的距离偏移量;预对准模块用于根据旋转偏移量调整掩模版的位置,以对旋转偏移量进行补偿;传送模块还用于根据距离偏移量调整掩模版的位置,以对距离偏移量进行补偿。本实施例中,偏移量检测模块检测掩模版的偏移量在掩模版展平之后进行检测,可以避免因掩模版褶皱等情况对掩模版的偏移量检测的影响,保证对掩模版的偏移量检测的准确性。并且,掩模版预对准系统不但可以实现对旋转偏移量的补偿,还可实现对设定方向上的距离偏移量的补偿,进而提高掩模版预对准的精度,进而提高张网精度。Embodiments of the present invention provide a reticle pre-alignment system and method, and a netting device, wherein the reticle pre-alignment system includes a pre-alignment module, a transfer module, and an offset detection module; the offset detection module is used for the reticle After the pre-alignment module is flattened, the offset of the reticle is detected, and the offset includes at least the rotational offset of the reticle relative to the reference plane and the distance offset in the set direction; the pre-alignment module uses The position of the reticle is adjusted according to the rotation offset to compensate for the rotation offset; the transmission module is also used to adjust the position of the reticle according to the distance offset to compensate for the distance offset. In this embodiment, the offset detection module detects the offset of the reticle after the reticle is flattened, which can avoid the influence on the offset detection of the reticle due to reticle wrinkles and other conditions, and ensure the reticle offset. Accuracy of offset detection. In addition, the reticle pre-alignment system can not only compensate for the rotational offset, but also compensate for the distance offset in the set direction, thereby improving the accuracy of the reticle pre-alignment, thereby improving the accuracy of the screen. .

附图说明Description of drawings

图1是本发明实施例提供的一种掩模版预对准系统的结构示意图;1 is a schematic structural diagram of a reticle pre-alignment system provided by an embodiment of the present invention;

图2是本发明实施例提供的预对准模块的结构示意图;2 is a schematic structural diagram of a pre-alignment module provided by an embodiment of the present invention;

图3是图2的仰视图;Fig. 3 is the bottom view of Fig. 2;

图4是图2的局部放大图;Fig. 4 is a partial enlarged view of Fig. 2;

图5是本发明实施例提供的一种掩模版预对准方法的流程图;5 is a flowchart of a reticle pre-alignment method provided by an embodiment of the present invention;

图6是本发明实施例提供的另一种掩模版预对准方法的流程图。FIG. 6 is a flowchart of another reticle pre-alignment method provided by an embodiment of the present invention.

具体实施方式Detailed ways

本发明实施例提供了一种掩模版预对准系统,本实施例的掩模版预对准系统,可用于将掩模版传输给张网设备之前对掩模版进行偏移量的补偿以改善张网精度。与之相应的,本发明还提供一种采用该掩模版预对准系统对掩模版进行预对准的方法。下面结合附图和实施例对本发明作进一步的详细说明。可以理解的是,此处所描述的具体实施例仅仅用于解释本发明,而非对本发明的限定。另外还需要说明的是,为了便于描述,附图中仅示出了与本发明相关的部分而非全部结构。An embodiment of the present invention provides a reticle pre-alignment system. The reticle pre-alignment system of this embodiment can be used to compensate the offset of the reticle before transferring the reticle to the screen-stretching device to improve the screen-stretching precision. Correspondingly, the present invention also provides a method for pre-aligning a reticle by using the reticle pre-alignment system. The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, the drawings only show some but not all structures related to the present invention.

图1是本发明实施例提供的一种掩模版预对准系统的结构示意图,参考图1,该掩模版预对准系统包括:预对准模块110、传送模块120、偏移量检测模块130;偏移量检测模块130分别与预对准模块110和传送模块120连接;传送模块120用于将掩模版200从预对准模块110传输至工作台140;偏移量检测模块130用于掩模版200在预对准模块110展平后,检测掩模版的偏移量,偏移量至少包括掩模版200相对于参考平面的旋转偏移量和在设定方向上的距离偏移量,并将旋转偏移量发送至预对准模块110以及将距离偏移量发送至传送模块120;预对准模块110用于根据旋转偏移量调整掩模版的位置,以对旋转偏移量进行补偿;传送模块120还用于根据距离偏移量调整掩模版的位置,以对距离偏移量进行补偿。1 is a schematic structural diagram of a reticle pre-alignment system provided by an embodiment of the present invention. Referring to FIG. 1 , the reticle pre-alignment system includes: a pre-alignment module 110 , a transmission module 120 , and an offset detection module 130 The offset detection module 130 is respectively connected with the pre-alignment module 110 and the transfer module 120; the transfer module 120 is used to transfer the reticle 200 from the pre-alignment module 110 to the workbench 140; After the reticle 200 is flattened by the pre-alignment module 110, the offset of the reticle is detected, and the offset at least includes the rotation offset of the reticle 200 relative to the reference plane and the distance offset in the set direction, and The rotation offset is sent to the pre-alignment module 110 and the distance offset is sent to the transmission module 120; the pre-alignment module 110 is used to adjust the position of the reticle according to the rotation offset to compensate for the rotation offset ; The transmission module 120 is also used to adjust the position of the reticle according to the distance offset to compensate for the distance offset.

参考图1,可选的,掩模版预对准系统还包括版库150和传输机械手160。版库150可用来存放掩模版。版库150可以包括多个掩模版放置位,示例性的,掩模版放置位可以是托盘,掩模版可以放置在掩模版放置位上。传输机械手160可以用于从版库150中取走掩模版并传输至预对准模块110。可选的,传输机械手160位于预对准模块110和版库150之间。Referring to FIG. 1 , optionally, the reticle pre-alignment system further includes a plate library 150 and a transfer robot 160 . Reticle 150 may be used to store reticles. The plate library 150 may include a plurality of reticle placement positions, for example, the reticle placement positions may be trays, and the reticle may be placed on the reticle placement positions. The transfer robot 160 may be used to remove the reticle from the reticle 150 and transfer to the pre-alignment module 110 . Optionally, the transfer robot 160 is located between the pre-alignment module 110 and the plate library 150 .

掩模版在传输过程中,不可避免地会存在位置的偏移。本实施例中,掩模版预对准系统还包括偏移量检测模块130、预对准模块110和传送模块120,待掩模版在预对准模块110的表面展平后,偏移量检测模块130检测掩模版的偏移量,该掩模版的偏移量至少包括旋转偏移量和在设定方向上距离偏移量。本实施例中偏移量检测模块130检测掩模版的偏移量在掩模版展平之后进行检测,可以避免因掩模版褶皱等情况对掩模版的偏移量检测的影响,保证对掩模版的偏移量检测的准确性。其中偏移量检测模块130可以是光学检测设备,也可以是其他可以实现检测至少包括掩模版相对于参考平面的旋转偏移量和在设定方向上的距离偏移量的偏移量的设备。During the transmission process of the reticle, there will inevitably be a positional offset. In this embodiment, the reticle pre-alignment system further includes an offset detection module 130, a pre-alignment module 110 and a transfer module 120. After the reticle is flattened on the surface of the pre-alignment module 110, the offset detection module 130 detects an offset of the reticle, the offset of the reticle including at least a rotation offset and a distance offset in a set direction. In this embodiment, the offset detection module 130 detects the offset of the reticle and performs the detection after the reticle is flattened, which can avoid the influence on the offset detection of the reticle due to the wrinkles of the reticle and the like, and ensure the accuracy of the reticle. Accuracy of offset detection. The offset detection module 130 may be an optical detection device, or other devices that can detect the offset including the rotation offset of the reticle relative to the reference plane and the distance offset in the set direction. .

偏移量检测模块130将检测到的旋转偏移量发送至预对准模块110,预对准模块110接收到旋转偏移量后,根据该旋转偏移量的大小对掩模版的位置进行调节,具体是将掩模版向与旋转偏移量相反的方向旋转,示例性的,旋转偏移量为相对于参考平面顺时针旋转了15度,则根据旋转偏移量对掩模版的位置进行调节时,可以调节掩模版逆时针转动,例如可以逆时针旋转15度,以补偿旋转偏移量。偏移量检测模块130还将检测到的距离偏移量发送至传送模块120,在预对准模块110对旋转偏移量进行补偿后,传送模块120根据设定方向上的距离偏移量对掩模版的位置进行调节,以补偿设定方向上的距离偏移量。示例性的,掩模版在设定方向上的距离偏移量为0.3毫米时,可以调节掩模版向与设定方向相反的方向移动0.3毫米,进而补偿设定方向上的距离偏移量。本实施例的掩模版预对准系统,可以实现对掩模版的旋转偏移量和距离偏移量的补偿。在对掩模版的偏移量进行补偿后,传送模块120可以将掩模版传送至工作台140,工作台140可以属于张网设备,进而也有利于提高张网精度。The offset detection module 130 sends the detected rotation offset to the pre-alignment module 110. After receiving the rotation offset, the pre-alignment module 110 adjusts the position of the reticle according to the rotation offset. , which is to rotate the reticle in the opposite direction to the rotation offset. Exemplarily, the rotation offset is 15 degrees clockwise relative to the reference plane, and the position of the reticle is adjusted according to the rotation offset. , the reticle can be adjusted to rotate counterclockwise, eg, 15 degrees counterclockwise, to compensate for the rotation offset. The offset detection module 130 also sends the detected distance offset to the transmission module 120. After the pre-alignment module 110 compensates the rotation offset, the transmission module 120 adjusts the distance offset according to the distance offset in the set direction. The position of the reticle is adjusted to compensate for the distance offset in the set direction. Exemplarily, when the distance offset of the reticle in the set direction is 0.3 mm, the reticle can be adjusted to move 0.3 mm in the opposite direction to the set direction, thereby compensating for the distance offset in the set direction. The reticle pre-alignment system of this embodiment can realize the compensation for the rotational offset and the distance offset of the reticle. After compensating for the offset of the reticle, the transfer module 120 can transfer the reticle to the worktable 140 , and the worktable 140 can belong to a net-stretching device, which is also beneficial to improve the net-stretching precision.

本实施例提供的掩模版预对准系统,包括预对准模块、传送模块、偏移量检测模块;偏移量检测模块用于掩模版在预对准模块展平后,检测掩模版的偏移量,偏移量至少包括掩模版相对于参考平面的旋转偏移量和在设定方向上的距离偏移量;预对准模块用于根据旋转偏移量调整掩模版的位置,以对旋转偏移量进行补偿;传送模块还用于根据距离偏移量调整掩模版的位置,以对距离偏移量进行补偿。本实施例中,偏移量检测模块检测掩模版的偏移量在掩模版展平之后进行检测,可以避免因掩模版褶皱等情况对掩模版的偏移量检测的影响,保证对掩模版的偏移量检测的准确性。并且,掩模版预对准系统不但可以实现对旋转偏移量的补偿,还可实现对设定方向上的距离偏移量的补偿,进而提高掩模版预对准的精度,进而提高张网精度。The reticle pre-alignment system provided in this embodiment includes a pre-alignment module, a transfer module, and an offset detection module; the offset detection module is used to detect the offset of the reticle after the reticle is flattened by the pre-alignment module. Offset, the offset includes at least the rotation offset of the reticle relative to the reference plane and the distance offset in the set direction; the pre-alignment module is used to adjust the position of the reticle according to the rotation offset to align the The rotation offset is used to compensate; the transfer module is also used to adjust the position of the reticle according to the distance offset to compensate for the distance offset. In this embodiment, the offset detection module detects the offset of the reticle after the reticle is flattened, which can avoid the influence on the offset detection of the reticle due to reticle wrinkles and other conditions, and ensure the reticle offset. Accuracy of offset detection. In addition, the reticle pre-alignment system can not only compensate for the rotational offset, but also compensate for the distance offset in the set direction, thereby improving the accuracy of the reticle pre-alignment, thereby improving the accuracy of the screen. .

继续参考图1,在上述技术方案的基础上,可选的,设定方向x为与预对准模块110指向工作台140的方向垂直的方向。Continuing to refer to FIG. 1 , on the basis of the above technical solution, optionally, the setting direction x is a direction perpendicular to the direction in which the pre-alignment module 110 points to the worktable 140 .

其中工作台140位于预对准模块110远离板库的一侧。具体的,传统预对准系统中,传送模块120只在预对准模块110指向工作台140的方向或者工作台140指向预对准模块110的方向y上进行移动,实现掩模版在预对准模块110和工作台140之间的传输,相应的,当掩模版在预对准模块110指向工作台140的方向或者工作台140指向预对准模块110的方向上有偏移时,可以通过传送模块120进行补偿;而忽略了与预对准模块110指向工作台140的方向垂直的方向的偏移量。本实施例中,设置设定方向x为与预对准模块110指向工作台140的方向垂直的方向,传送模块120可在与预对准模块110指向工作台140的方向垂直的方向进行移动,使得掩模版在与预对准模块110指向工作台140的方向垂直的方向有偏移时,及时通过传送模块120进行调整,进而提高预对准的精度。The worktable 140 is located on the side of the pre-alignment module 110 away from the board library. Specifically, in the conventional pre-alignment system, the transfer module 120 only moves in the direction y in which the pre-alignment module 110 points to the worktable 140 or the direction y in which the worktable 140 points to the pre-alignment module 110, so as to realize the pre-alignment of the reticle. The transfer between the module 110 and the worktable 140, correspondingly, when the reticle is offset in the direction in which the pre-alignment module 110 points to the worktable 140 or the direction in which the worktable 140 points to the pre-alignment module 110, it can be transmitted by Module 120 compensates; the offset in a direction perpendicular to the direction in which pre-alignment module 110 points to table 140 is ignored. In this embodiment, the setting direction x is set as a direction perpendicular to the direction in which the pre-alignment module 110 points to the worktable 140, and the transfer module 120 can move in a direction perpendicular to the direction in which the pre-alignment module 110 points to the worktable 140. When the reticle is offset in a direction perpendicular to the direction in which the pre-alignment module 110 points to the worktable 140, the reticle can be adjusted by the transfer module 120 in time, thereby improving the precision of the pre-alignment.

图2是本发明实施例提供的预对准模块的结构示意图,参考图2,可选的,预对准模块110包括支撑板111,支撑板111的设定表面划分为中心放置区1111和边缘吸附区1112,边缘吸附区1112至少位于中心放置区1111的相对两侧;FIG. 2 is a schematic structural diagram of a pre-alignment module provided by an embodiment of the present invention. Referring to FIG. 2, optionally, the pre-alignment module 110 includes a support plate 111, and the setting surface of the support plate 111 is divided into a center placement area 1111 and an edge The adsorption area 1112, the edge adsorption area 1112 is located at least on opposite sides of the center placement area 1111;

边缘吸附区1112包括吸附结构,吸附结构用于对掩模版进行吸附以使掩模版在设定表面展平。The edge adsorption area 1112 includes an adsorption structure, and the adsorption structure is used to adsorb the reticle to flatten the reticle on the set surface.

参考图2,图2示例性地示出了边缘吸附区1112位于中心放置区1111相对两侧的情况。具体的,支撑板111的设定表面为支撑板111用于放置掩模版的表面。边缘吸附区1112设置于吸附结构,该吸附结构可以用于吸附掩模版,可选的,在偏移量检测模块130检测掩模版的偏移量(包括旋转偏移量Rz和距离偏移量)前,通过吸附结构对掩模版进行吸附,使得掩模版放置在支撑板111的设定表面后,掩模版的边缘被边缘吸附区1112的吸附结构吸附,进而使得掩模版的边缘受力而展平,防止掩模版出现褶皱,进而保证偏移量检测模块130检测到掩模版偏移量的准确性。Referring to FIG. 2 , FIG. 2 exemplarily shows a situation where the edge adsorption areas 1112 are located on opposite sides of the center placement area 1111 . Specifically, the set surface of the support plate 111 is the surface of the support plate 111 for placing the reticle. The edge adsorption area 1112 is arranged on the adsorption structure, and the adsorption structure can be used to adsorb the reticle. Optionally, the offset detection module 130 detects the offset of the reticle (including the rotation offset Rz and the distance offset). Before, the reticle is adsorbed by the adsorption structure, so that after the reticle is placed on the set surface of the support plate 111, the edge of the reticle is adsorbed by the adsorption structure of the edge adsorption area 1112, so that the edge of the reticle is flattened by force , to prevent the reticle from wrinkling, thereby ensuring the accuracy of the offset detection module 130 detecting the offset of the reticle.

需要说明的是,在本发明其他可选实施例中,边缘吸附区1112还可围绕中心放置区1111,进而使得掩模版放置在支撑板111的设定表面后,掩模版的各个边缘都可受吸附结构的吸附力而更加展平。It should be noted that, in other optional embodiments of the present invention, the edge adsorption area 1112 can also surround the center placement area 1111, so that after the reticle is placed on the set surface of the support plate 111, each edge of the reticle can be affected by The adsorption force of the adsorption structure is more flat.

图3是图2的仰视图,参考图2和图3,可选的,吸附结构包括吸附接头114以及包括多个第一吸附孔的吸附本体113,吸附本体113设置于支撑板111的设定表面;FIG. 3 is a bottom view of FIG. 2 . Referring to FIG. 2 and FIG. 3 , optionally, the adsorption structure includes an adsorption joint 114 and an adsorption body 113 including a plurality of first adsorption holes. The adsorption body 113 is set at the setting of the support plate 111 surface;

支撑板111中包括气道,吸附接头114通过支撑板111中的气道与第一吸附孔连通。The support plate 111 includes an air channel, and the adsorption joint 114 communicates with the first adsorption hole through the air channel in the support plate 111 .

可选的,吸附本体113可以是陶瓷片,陶瓷片可以粘附于支撑板111的设定表面。支撑板111中开设气道,吸附接头114通过气道与吸附本体113的第一吸附孔连通,进而通过吸附接头114抽取空气来实现吸附结构对掩模版的吸附。Optionally, the adsorption body 113 may be a ceramic sheet, and the ceramic sheet may be adhered to the set surface of the support plate 111 . An air passage is provided in the support plate 111 , and the adsorption joint 114 communicates with the first adsorption hole of the adsorption body 113 through the air passage, and then air is extracted through the adsorption joint 114 to realize the adsorption of the reticle by the adsorption structure.

在上述技术方案的基础上,可选的,第一吸附孔的孔径为2-20微米,第一吸附孔在边缘吸附区1112均匀分布。On the basis of the above technical solution, optionally, the diameter of the first adsorption holes is 2-20 microns, and the first adsorption holes are uniformly distributed in the edge adsorption zone 1112 .

具体的,第一吸附孔的孔径较小,且分步密集,支撑板111的厚度较厚,因此直接在支撑板111上形成第一吸附孔工艺上不易实现。本实施例中,包括多个第一吸附孔的吸附本体113为外加于支撑板111的结构,相对与在支撑板111上直接进行开孔,工艺上相对更加容易实现。并且,第一吸附孔在边缘吸附区1112均匀分布,进而使得掩模版的边缘均匀受力,进而保证掩模版在吸附结构的吸附下,可以被拉伸至更加平整。可选的,吸附接头114设置于与设定表面的相对表面。Specifically, the diameter of the first adsorption hole is small and the steps are dense, and the thickness of the support plate 111 is relatively thick, so it is difficult to realize the process of directly forming the first adsorption hole on the support plate 111 . In this embodiment, the adsorption body 113 including a plurality of first adsorption holes is a structure externally attached to the support plate 111 , which is relatively easier to implement in the process than directly opening the holes on the support plate 111 . In addition, the first adsorption holes are evenly distributed in the edge adsorption area 1112, so that the edges of the reticle are uniformly stressed, thereby ensuring that the reticle can be stretched to be more flat under the adsorption of the adsorption structure. Optionally, the adsorption joint 114 is disposed on the surface opposite to the setting surface.

在本发明其他可选实施例中,在边缘吸附区,支撑板的开设有多个第二吸附孔,吸附结构包括第二吸附孔和吸附接头,吸附接头与第二吸附孔连通;可选的,第二吸附孔的直径大于15微米。In other optional embodiments of the present invention, in the edge adsorption area, the support plate is provided with a plurality of second adsorption holes, the adsorption structure includes second adsorption holes and adsorption joints, and the adsorption joints communicate with the second adsorption holes; optional , the diameter of the second adsorption hole is greater than 15 microns.

具体的,可以直接在支撑板上开设过孔作为第二吸附孔,相比于外加与支撑板的吸附本体,直接在支撑板上开设第二吸附孔时,第二吸附孔的直径需要大于上述实施例中第一吸附孔的直径,进而使得工艺上较为容易实现。本实施例的预对准模块结构,无需外接吸附结构的吸附本体,有利于节约成本。Specifically, a via hole can be directly opened on the support plate as the second adsorption hole. Compared with the adsorption body attached to the support plate, when the second adsorption hole is directly opened on the support plate, the diameter of the second adsorption hole needs to be larger than the above-mentioned The diameter of the first adsorption hole in the embodiment makes the process easier to realize. The pre-alignment module structure of this embodiment does not require an external adsorption body of the adsorption structure, which is beneficial to saving costs.

可选的,第二吸附孔均匀排布,进而使得掩模版的边缘均匀受力,进而保证掩模版在吸附结构的吸附下,可以被拉伸至更加平整。可选的,边缘吸附区中至少包括一列第二吸附孔,其中第二吸附孔排布的列方向可以是平行于边缘吸附区形成的矩形中,长边的延伸方向。Optionally, the second adsorption holes are evenly arranged, so that the edges of the reticle are evenly stressed, thereby ensuring that the reticle can be stretched to be more flat under the adsorption of the adsorption structure. Optionally, the edge adsorption area includes at least one row of second adsorption holes, wherein the row direction of the arrangement of the second adsorption holes may be parallel to the extension direction of the long side of the rectangle formed by the edge adsorption area.

在上述各实施例的基础上,可选的,预对准模块还包括第一控制单元和驱动单元,第一控制单元分别与偏移量检测模块和驱动单元电连接,驱动单元与支撑板连接;On the basis of the above embodiments, optionally, the pre-alignment module further includes a first control unit and a drive unit, the first control unit is electrically connected to the offset detection module and the drive unit, respectively, and the drive unit is connected to the support plate ;

第一控制单元用于根据旋转偏移量向驱动单元发送第一控制信号,以使驱动单元驱动支撑板转动以调整掩模版的位置。The first control unit is used for sending a first control signal to the driving unit according to the rotation offset, so that the driving unit drives the supporting plate to rotate to adjust the position of the reticle.

具体的,驱动单元可以用于驱动支撑板转动,掩模版放置于支撑板上,因此可通过支撑板的转动带动掩模版转动,进而实现对掩模版旋转偏移量的补偿。第一控制单元在接收到偏移量检测模块检测到的旋转偏移量后,可产生与对应与旋转偏移量的补偿量的第一控制信号,驱动单元根据该第一控制信号来驱动支撑板转动,来带动掩模版转动,进而对掩模版的旋转偏移量进行补偿。可选的,第一控制单元可以包括单片机。Specifically, the driving unit can be used to drive the support plate to rotate, and the reticle is placed on the support plate. Therefore, the rotation of the support plate can drive the reticle to rotate, thereby realizing compensation for the rotational offset of the reticle. After receiving the rotation offset detected by the offset detection module, the first control unit can generate a first control signal corresponding to the compensation amount of the rotation offset, and the drive unit drives the support according to the first control signal The plate rotates to drive the reticle to rotate, thereby compensating for the rotational offset of the reticle. Optionally, the first control unit may include a single-chip microcomputer.

在上述各实施例的基础上,可选的,传送模块包括第二控制单元和抓取单元,第二控制单元分别与偏移量检测模块和抓取单元电连接,第二控制单元根据距离偏移量向抓取单元发送第二控制信号,以使抓取单元在抓取掩模版后在设定方向上调整掩模版的位置。On the basis of the above embodiments, optionally, the transmission module includes a second control unit and a grasping unit, the second control unit is electrically connected to the offset detection module and the grasping unit, respectively, and the second control unit is offset according to the distance. The shift amount sends a second control signal to the grasping unit, so that the grasping unit adjusts the position of the reticle in the set direction after grasping the reticle.

可选的,抓取单元为夹爪。具体的,抓取单元可以用于夹取掩模版,并调整掩模版在设定方向上的位置。第二控制单元在接收到偏移量检测模块检测到的距离偏移量后,可产生与对应与距离偏移量的补偿量的第二控制信号,驱动单元根据该第二控制信号来夹取掩模版在设定方向上移动,进而对掩模版的旋转偏移量进行补偿。可选的,第二控制单元可以包括单片机。Optionally, the grasping unit is a gripper. Specifically, the grasping unit can be used to grip the reticle and adjust the position of the reticle in the set direction. After the second control unit receives the distance offset detected by the offset detection module, it can generate a second control signal corresponding to the compensation amount of the distance offset, and the driving unit clips the distance according to the second control signal. The reticle is moved in the set direction, compensating for the rotational offset of the reticle. Optionally, the second control unit may include a single-chip microcomputer.

图4是图2的局部放大图。参考图2-图4,可选的,预对准模块还包括支撑框架115,第一隔板04、第二隔板05、电机动子06、动子安装架07、电机定子08、定子安装架09、传感器支架10、限位传感器11、传感器挡片12、第一安装板13、万向滚珠14、摩擦板15、第二安装板16、回转轴承17、加油嘴18、光栅尺安装板19、机械限位安装板20、机械限位缓冲器21、机械限位挡板22、读头安装支架23、读头24、光栅尺25、平衡块26。FIG. 4 is a partial enlarged view of FIG. 2 . 2-4, optionally, the pre-alignment module further includes a support frame 115, a first partition 04, a second partition 05, a motor mover 06, a mover mounting frame 07, a motor stator 08, and a stator mounting Rack 09, sensor bracket 10, limit sensor 11, sensor block 12, first mounting plate 13, universal ball 14, friction plate 15, second mounting plate 16, slewing bearing 17, oil filler 18, grating ruler mounting plate 19. Mechanical limit mounting plate 20 , mechanical limit buffer 21 , mechanical limit baffle 22 , read head mounting bracket 23 , read head 24 , grating ruler 25 , balance block 26 .

具体的,支撑框架115作为预对准模块的主体支撑,回转轴承17安装在支撑框架115上,回转轴承17的外圈与支撑框架115固定,回转轴承17的内圈可以绕旋转中心转动。第二安装板16与回转轴承17的内圈连接,支撑板111与第二安装板16连接,支撑板111用来承载掩模版,边缘吸附区1112对掩模版起到位置固定作用,掩模版随支撑板111一起转动。定子安装架09安装在支撑框架115上,电机定子08和传感器支架10安装在定子安装架09上,第二隔板05安装在电机定子08上,限位传感器11安装在传感器支架10上,电机定子08相对于支撑框架115固定不动并给电机动子06提供推力,两个限位传感器11实现电机动子直线运动的正负位置的电气限位开关,第二隔板05对电机定子08起到隔磁作用。第一隔板04和动子安装架07固定在支撑板111上,电机动子06和传感器挡片12固定在动子安装架07上,第一隔板04、电机动子06、动子安装架07和传感器挡片12随支撑板111一起转动;电机动子06通过电机定子08的磁场力驱动运动,电机动子06和电机定子08之间不接触,两者可以在X、Y方向任意相对移动,最终电机动子06驱动支撑板111绕回转轴承17中心转动。Specifically, the support frame 115 is supported as the main body of the pre-alignment module, the slewing bearing 17 is mounted on the support frame 115, the outer ring of the slewing bearing 17 is fixed to the support frame 115, and the inner ring of the slewing bearing 17 can rotate around the rotation center. The second mounting plate 16 is connected to the inner ring of the slewing bearing 17, the support plate 111 is connected to the second mounting plate 16, the support plate 111 is used to carry the reticle, and the edge adsorption area 1112 plays a role in fixing the position of the reticle. The support plate 111 rotates together. The stator mounting frame 09 is installed on the support frame 115, the motor stator 08 and the sensor bracket 10 are installed on the stator mounting frame 09, the second partition plate 05 is installed on the motor stator 08, the limit sensor 11 is installed on the sensor bracket 10, the motor The stator 08 is fixed relative to the support frame 115 and provides thrust to the motor mover 06 , the two limit sensors 11 realize the electrical limit switch of the positive and negative positions of the linear motion of the motor mover, and the second partition 05 is opposite to the motor stator 08 Play the role of magnetic isolation. The first partition 04 and the mover mounting frame 07 are fixed on the support plate 111, the motor mover 06 and the sensor block 12 are fixed on the mover mounting frame 07, the first partition 04, the motor mover 06, and the mover are installed The frame 07 and the sensor block 12 rotate together with the support plate 111; the motor mover 06 is driven to move by the magnetic field force of the motor stator 08, the motor mover 06 and the motor stator 08 are not in contact, and the two can be arbitrarily in the X and Y directions Relatively moving, finally the motor mover 06 drives the support plate 111 to rotate around the center of the slewing bearing 17 .

光栅尺25粘贴在光栅尺安装板19上,光栅尺安装板19固定在支撑板111上,随支撑板111一起转动;读头24安装在读头安装支架23上,读头安装支架23固定在第一安装板13上,第一安装板13固定在支撑框架115上,从而使读头24固定不动;由于19光栅尺相对读头24发生运动时,读头24可以测量出19光栅尺运动的位移量,并反馈给第一控制单元(图中未示出),第一控制单元计算出支撑板111带掩模版运动的旋转位移量。The grating ruler 25 is pasted on the grating ruler mounting plate 19, and the grating ruler mounting plate 19 is fixed on the support plate 111 and rotates together with the support plate 111; the read head 24 is mounted on the read head mounting bracket 23, and the read head mounting bracket 23 is fixed on the first On the mounting plate 13, the first mounting plate 13 is fixed on the supporting frame 115, so that the reading head 24 is fixed; because the 19 grating scale moves relative to the reading head 24, the reading head 24 can measure the movement of the 19 grating scale. The displacement amount is fed back to the first control unit (not shown in the figure), and the first control unit calculates the rotational displacement amount of the movement of the support plate 111 with the reticle.

机械限位缓冲器21安装在机械安装板20上,机械安装板20固定在支撑框架115上,机械限位挡板22固定在支撑板111上随支撑板111一起转动,机械限位缓冲器21与机械限位挡板22把支撑板111的转动限定在一定的范围内。The mechanical limit buffer 21 is installed on the mechanical installation plate 20 , the mechanical installation plate 20 is fixed on the support frame 115 , the mechanical limit baffle 22 is fixed on the support plate 111 and rotates together with the support plate 111 , the mechanical limit buffer 21 The rotation of the support plate 111 is limited within a certain range by the mechanical limit baffle 22 .

万向滚珠14安装在第一安装板13上,摩擦板15固定在支撑板111上,万向滚珠14对支撑板111起到辅助支撑作用;平衡块26安装在支撑板111上,使得支撑板111上的质心平衡到旋转中心;加油嘴18安装在支撑框架115上,可以对回转轴承17加注润滑脂。The universal ball 14 is installed on the first mounting plate 13, the friction plate 15 is fixed on the support plate 111, and the universal ball 14 plays an auxiliary supporting role for the support plate 111; the balance block 26 is installed on the support plate 111, so that the support plate The center of mass on 111 is balanced to the center of rotation; the oiling nozzle 18 is installed on the support frame 115, and the slewing bearing 17 can be filled with grease.

吸附接头114连接到边缘吸附区1112的气路,为边缘吸附区1112提供真空吸附,从而使边缘吸附区1112将掩模版固定在支撑板111上。The suction joint 114 is connected to the gas path of the edge suction area 1112 to provide vacuum suction for the edge suction area 1112 , so that the edge suction area 1112 fixes the reticle on the support plate 111 .

其中,上述实施例中驱动单元可以包括电机动子06和电机定子08。Wherein, the drive unit in the above embodiment may include a motor mover 06 and a motor stator 08 .

本发明实施例还提供了一种张网设备,该张网设备包括本发明上述任意实施例提供的掩模版预对准系统。Embodiments of the present invention further provide a net-stretching device, where the net-stretching device includes the reticle pre-alignment system provided by any of the above embodiments of the present invention.

本发明实施例还提供了一种掩模版预对准方法,该掩模版预对准方法可适用于上述任意实施例的掩模版预对准系统。图5是本发明实施例提供的一种掩模版预对准方法的流程图,参考图5,该掩模版预对准方法包括:Embodiments of the present invention further provide a reticle pre-alignment method, which can be applied to the reticle pre-alignment system of any of the foregoing embodiments. 5 is a flowchart of a method for pre-aligning a reticle provided by an embodiment of the present invention. Referring to FIG. 5 , the method for pre-aligning a reticle includes:

步骤210、在掩模版在预对准模块展平后,偏移量检测模块检测掩模版的偏移量,偏移量至少包括掩模版相对于参考平面的旋转偏移量和在参考平面的设定方向上的距离偏移量,并将旋转偏移量发送至预对准模块以及将距离偏移量发送至传送模块;Step 210, after the reticle is flattened by the pre-alignment module, the offset detection module detects the offset of the reticle, and the offset at least includes the rotational offset of the reticle relative to the reference plane and the setting on the reference plane. Determine the distance offset in the direction, and send the rotation offset to the pre-alignment module and the distance offset to the transmission module;

步骤220、预对准模块根据旋转偏移量调整掩模版的位置,以对旋转偏移量进行补偿;Step 220, the pre-alignment module adjusts the position of the reticle according to the rotation offset to compensate for the rotation offset;

步骤230、传送模块根据距离偏移量调整掩模版的位置,以对距离偏移量进行补偿。Step 230: The transmission module adjusts the position of the reticle according to the distance offset to compensate for the distance offset.

本实施例提供的掩模版预对准方法,在掩模版在预对准模块展平后,偏移量检测模块检测掩模版的偏移量,并将旋转偏移量发送至预对准模块以及将距离偏移量发送至传送模块;预对准模块根据旋转偏移量调整掩模版的位置,以对旋转偏移量进行补偿;传送模块根据距离偏移量调整掩模版的位置,以对距离偏移量进行补偿。本实施例中,检测模块检测掩模版的偏移量在掩模版展平之后进行检测,可以避免因掩模版褶皱等情况对掩模版的偏移量检测的影响,保证对掩模版的偏移量检测的准确性。并且,掩模版预对准系统不但可以实现对旋转偏移量的补偿,还可实现对设定方向上的距离偏移量的补偿,进而提高掩模版预对准的精度,进而提高张网精度。In the reticle pre-alignment method provided by this embodiment, after the reticle is flattened by the pre-alignment module, the offset detection module detects the offset of the reticle, and sends the rotational offset to the pre-alignment module and The distance offset is sent to the transfer module; the pre-alignment module adjusts the position of the reticle according to the rotation offset to compensate for the rotation offset; the transfer module adjusts the position of the reticle according to the distance offset to adjust the distance offset to compensate. In this embodiment, the detection module detects the offset of the reticle after the reticle is flattened, which can avoid the influence on the offset detection of the reticle due to the wrinkles of the reticle, and ensure the offset of the reticle. detection accuracy. In addition, the reticle pre-alignment system can not only compensate for the rotational offset, but also compensate for the distance offset in the set direction, thereby improving the accuracy of the reticle pre-alignment, thereby improving the accuracy of the screen. .

图6是本发明实施例提供的另一种掩模版预对准方法的流程图,参考图6,可选的,该掩模版预对准方法包括:FIG. 6 is a flowchart of another reticle pre-alignment method provided by an embodiment of the present invention. Referring to FIG. 6 , optionally, the reticle pre-alignment method includes:

步骤310、传输机械手将掩模版放置在支撑板的设定表面。Step 310, the transfer robot places the reticle on the set surface of the support plate.

具体的,传输机械手用于从版库取走掩模版,并放置在支撑板。传输机械手用于在版库与预对准模块之间传输掩模版。Specifically, the transfer manipulator is used to take the reticle from the plate library and place it on the support plate. The transfer robot is used to transfer reticles between the library and the pre-alignment module.

步骤320、传送模块夹取掩模版张紧后放置于预对准模块的支撑板的设定表面。Step 320 , the transfer module clamps the reticle and places it on the set surface of the support plate of the pre-alignment module after tensioning.

传送模块用于在预对准模块和工作台之间传输掩模版。因传输机械手将掩模版放置在支撑板后,掩模版可能会出现褶皱,传送模块夹取掩模版张紧后再次放置于掩模版,保证再次放置时褶皱情况减轻或消失。The transfer module is used to transfer the reticle between the pre-alignment module and the stage. After the reticle is placed on the support plate by the transfer manipulator, the reticle may be wrinkled. The transfer module clamps the reticle and places it on the reticle again to ensure that the wrinkle is reduced or disappeared when it is placed again.

步骤330、吸附结构对掩模版进行吸附以使掩模版在设定表面展平。Step 330, the adsorption structure adsorbs the reticle to flatten the reticle on the set surface.

吸附结构真空吸附掩模版,使得掩模版可以展平。The suction structure vacuum suctions the reticle so that the reticle can be flattened.

步骤340、传送模块释放掩模版。Step 340, the transfer module releases the reticle.

掩模版展平后,传送模块释放掩模版,则由于吸附结构的吸附作用,掩模版可以保持展平状态,进而使得后续步骤中偏移量检测模块对掩模版的偏移量进行检测时,检测的准确性可以提高。After the reticle is flattened, the transfer module releases the reticle, and the reticle can remain in a flattened state due to the adsorption effect of the adsorption structure, so that when the offset detection module detects the offset of the reticle in the subsequent steps, the detection accuracy can be improved.

步骤350、在掩模版在预对准模块展平后,偏移量检测模块检测掩模版的偏移量,偏移量至少包括掩模版相对于参考平面的旋转偏移量和在参考平面的设定方向上的距离偏移量,并将旋转偏移量发送至预对准模块以及将距离偏移量发送至传送模块。Step 350: After the reticle is flattened by the pre-alignment module, the offset detection module detects the offset of the reticle, and the offset at least includes the rotational offset of the reticle relative to the reference plane and the setting on the reference plane. The distance offset in the direction is determined, and the rotation offset is sent to the pre-alignment module and the distance offset is sent to the transfer module.

步骤360、预对准模块根据旋转偏移量调整掩模版的位置,以对旋转偏移量进行补偿。Step 360: The pre-alignment module adjusts the position of the reticle according to the rotation offset to compensate for the rotation offset.

可选的,预对准模块还包括第一控制单元和驱动单元;该步骤360包括:Optionally, the pre-alignment module further includes a first control unit and a drive unit; this step 360 includes:

第一控制单元根据旋转偏移量向驱动单元发送第一控制信号,以使驱动单元驱动支撑板转动以调整掩模版的位置。The first control unit sends a first control signal to the drive unit according to the rotation offset, so that the drive unit drives the support plate to rotate to adjust the position of the reticle.

步骤370、传送模块夹取掩模版。Step 370, the transfer module clamps the reticle.

步骤380、吸附结构停止对掩模版的吸附。Step 380, the adsorption structure stops the adsorption of the reticle.

步骤390、传送模块根据距离偏移量调整掩模版的位置,以对距离偏移量进行补偿。Step 390: The transmission module adjusts the position of the reticle according to the distance offset to compensate for the distance offset.

可选的,传送模块包括第二控制单元和抓取单元;该步骤390包括:Optionally, the transmission module includes a second control unit and a grabbing unit; this step 390 includes:

第二控制单元根据距离偏移量向抓取单元发送第二控制信号,以使抓取单元在抓取掩模版后在设定方向上调整掩模版的位置。The second control unit sends a second control signal to the grabbing unit according to the distance offset, so that the grabbing unit adjusts the position of the reticle in the set direction after grabbing the reticle.

可选的,在步骤390之后,还包括:Optionally, after step 390, it further includes:

步骤410、传送模块将掩模版放置于支撑板的设定表面,吸附结构对掩模版进行吸附,传送模块释放掩模版;Step 410, the transfer module places the reticle on the set surface of the support plate, the adsorption structure adsorbs the reticle, and the transfer module releases the reticle;

步骤420、偏移量检测模块检测旋转偏移量和距离偏移量是否满足设定要求;Step 420, the offset detection module detects whether the rotation offset and the distance offset meet the set requirements;

在旋转偏移量不满足设定要求时,返回执行步骤360及其后续步骤;在距离偏移量不满足设定要求时,返回执行步骤390及其后续步骤。When the rotation offset does not meet the set requirement, return to step 360 and its subsequent steps; when the distance offset does not meet the set requirement, return to step 390 and its subsequent steps.

在旋转偏移量和距离偏移量均满足设定要求时,可通过传送模块夹取掩模版,吸附结构释放掩模版,传送模块可将预对准后的掩模版传送至工作台,进而提高张网的精度。When both the rotation offset and the distance offset meet the set requirements, the reticle can be clamped by the transfer module, and the reticle can be released by the adsorption structure. The transfer module can transfer the pre-aligned reticle to the worktable, thereby improving the The accuracy of the net.

本实施例的掩模版预对准方法,通过设置吸附结构对掩模版的吸附,保证掩模版在支撑板的设定表面可以展平,进而保证偏移量检测模块对偏移量的检测准确性。同时传送模块可以对掩模版进行设定方向上的距离偏移量的补偿,提高的预对准的精度,进而有利于提高张网精度。The reticle pre-alignment method of this embodiment ensures that the reticle can be flattened on the set surface of the support plate by setting the adsorption structure to adsorb the reticle, thereby ensuring the detection accuracy of the offset by the offset detection module . At the same time, the transfer module can compensate the distance offset in the set direction for the reticle, which improves the pre-alignment precision, which is beneficial to improve the net-stretching precision.

注意,上述仅为本发明的较佳实施例及所运用技术原理。本领域技术人员会理解,本发明不限于这里所述的特定实施例,对本领域技术人员来说能够进行各种明显的变化、重新调整和替代而不会脱离本发明的保护范围。因此,虽然通过以上实施例对本发明进行了较为详细的说明,但是本发明不仅仅限于以上实施例,在不脱离本发明构思的情况下,还可以包括更多其他等效实施例,而本发明的范围由所附的权利要求范围决定。Note that the above are only preferred embodiments of the present invention and applied technical principles. Those skilled in the art will understand that the present invention is not limited to the specific embodiments described herein, and various obvious changes, readjustments and substitutions can be made by those skilled in the art without departing from the protection scope of the present invention. Therefore, although the present invention has been described in detail through the above embodiments, the present invention is not limited to the above embodiments, and can also include more other equivalent embodiments without departing from the concept of the present invention. The scope is determined by the scope of the appended claims.

Claims (15)

1. A reticle pre-alignment system, comprising: the device comprises a pre-alignment module, a transmission module and an offset detection module; the offset detection module is respectively connected with the pre-alignment module and the transmission module; the transfer module is used for transferring the mask plate from the prealignment module to a workbench;
the offset detection module is used for detecting the offset of the mask plate after the mask plate is flattened by the pre-alignment module, wherein the offset at least comprises the rotation offset of the mask plate relative to a reference plane and the distance offset in a set direction, and the rotation offset is sent to the pre-alignment module and the distance offset is sent to the transmission module;
the pre-alignment module is used for adjusting the position of the mask plate according to the rotary offset so as to compensate the rotary offset;
the transmission module is also used for adjusting the position of the mask plate according to the distance offset so as to compensate the distance offset.
2. The reticle pre-alignment system of claim 1,
the pre-alignment module comprises a support plate, the setting surface of the support plate is divided into a central placing area and edge adsorption areas, and the edge adsorption areas are at least positioned at two opposite sides of the central placing area;
the edge adsorption area comprises an adsorption structure, and the adsorption structure is used for adsorbing the mask plate so that the mask plate can be flattened on the set surface.
3. The reticle prealignment system of claim 2, wherein the adsorption structure comprises an adsorption joint and an adsorption body comprising a plurality of first adsorption holes, the adsorption body being disposed on a setting surface of the support plate;
the support plate comprises an air passage, and the adsorption joint is communicated with the first adsorption hole through the air passage in the support plate.
4. The reticle pre-alignment system of claim 3, wherein the first adsorption holes have a pore size of 2-20 microns and are uniformly distributed in the edge adsorption zone.
5. The mask blank prealignment system according to claim 2, wherein a plurality of second adsorption holes are formed in the support plate in the edge adsorption area, the adsorption structure comprises the second adsorption holes and adsorption joints, and the adsorption joints are communicated with the second adsorption holes;
preferably, the diameter of the second adsorption hole is larger than 15 microns;
preferably, the second adsorption holes are uniformly arranged.
6. The reticle prealignment system of claim 2, wherein the prealignment module further comprises a first control unit and a drive unit, the first control unit being electrically connected to the offset detection module and the drive unit, respectively, the drive unit being connected to the support plate;
the first control unit is used for sending a first control signal to the driving unit according to the rotation offset so that the driving unit drives the supporting plate to rotate to adjust the position of the mask.
7. The mask pre-alignment system according to claim 1, wherein the transfer module comprises a second control unit and a grabbing unit, the second control unit is electrically connected with the offset detection module and the grabbing unit respectively, and the second control unit sends a second control signal to the grabbing unit according to the distance offset, so that the grabbing unit adjusts the position of the mask in the set direction after grabbing the mask.
8. The reticle prealignment system of claim 1, wherein the set direction is a direction perpendicular to a direction in which the prealignment module points toward the stage.
9. A method for pre-aligning a mask, comprising:
after the mask plate is flattened by the pre-alignment module, an offset detection module detects the offset of the mask plate, wherein the offset at least comprises the rotation offset of the mask plate relative to a reference plane and the distance offset in the set direction of the reference plane, and the rotation offset is sent to the pre-alignment module and the distance offset is sent to a transmission module;
the pre-alignment module adjusts the position of the mask plate according to the rotation offset so as to compensate the rotation offset;
and the transmission module adjusts the position of the mask plate according to the distance offset so as to compensate the distance offset.
10. The reticle pre-alignment method of claim 9, wherein after the reticle is flattened in the pre-alignment module and before the offset detection module detects the offset of the reticle, the method further comprises:
the conveying module clamps the mask plate and places the mask plate on a set surface of a supporting plate of the pre-alignment module after tensioning;
the adsorption structure adsorbs the mask plate so as to flatten the mask plate on the set surface;
the transfer module releases the reticle.
11. The reticle pre-alignment method of claim 9, further comprising, before the transfer module adjusts the position of the reticle according to the distance offset to compensate for the distance offset:
the transmission module clamps the mask;
and stopping the adsorption of the adsorption structure on the mask.
12. The reticle pre-alignment method of claim 10, wherein the pre-alignment module further comprises a first control unit and a drive unit; the pre-alignment module adjusts the position of the mask plate according to the rotation offset to compensate the rotation offset, and the pre-alignment module comprises:
the first control unit sends a first control signal to the driving unit according to the rotation offset, so that the driving unit drives the supporting plate to rotate to adjust the position of the mask.
13. The reticle pre-alignment method according to any one of claims 9 to 11, wherein the transfer module comprises a second control unit and a gripper unit; the transmission module adjusts the position of the mask plate according to the distance offset to compensate the distance offset, and the method comprises the following steps:
and the second control unit sends a second control signal to the grabbing unit according to the distance offset, so that the grabbing unit can adjust the position of the mask plate in the set direction after grabbing the mask plate.
14. The reticle pre-alignment method of claim 10, further comprising, after the transfer module adjusts the position of the reticle according to the distance offset to compensate for the distance offset:
the transmission module places the mask on a set surface of the supporting plate, the adsorption structure adsorbs the mask, and the transmission module releases the mask;
the offset detection module detects whether the rotation offset and the distance offset meet set requirements, and when the rotation offset does not meet the set requirements, the pre-alignment module is returned to execute to adjust the position of the mask plate according to the rotation offset so as to compensate the rotation offset and carry out subsequent steps; and when the distance offset does not meet the set requirement, returning to the execution and transmission module to adjust the position of the mask plate according to the distance offset so as to compensate the distance offset and carry out the subsequent steps.
15. A screening apparatus comprising the reticle pre-alignment system of any one of claims 1 to 8.
CN202110181904.9A 2021-02-09 2021-02-09 Mask plate pre-alignment system and method and screen-stretching equipment Pending CN114911136A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110181904.9A CN114911136A (en) 2021-02-09 2021-02-09 Mask plate pre-alignment system and method and screen-stretching equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110181904.9A CN114911136A (en) 2021-02-09 2021-02-09 Mask plate pre-alignment system and method and screen-stretching equipment

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Application Number Title Priority Date Filing Date
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5959721A (en) * 1995-06-19 1999-09-28 Nikon Corporation Projection exposure apparatus and projection exposure method
CN103863821A (en) * 2012-12-07 2014-06-18 上海微电子装备有限公司 Mask transmission device and method
CN203889554U (en) * 2014-04-02 2014-10-22 自贡佳源炉业有限公司 Floating type steel belt offset detector
CN107656420A (en) * 2016-07-26 2018-02-02 Hoya株式会社 The manufacture method of photomask and display device, the inspection method of photomask base plate and device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5959721A (en) * 1995-06-19 1999-09-28 Nikon Corporation Projection exposure apparatus and projection exposure method
CN103863821A (en) * 2012-12-07 2014-06-18 上海微电子装备有限公司 Mask transmission device and method
CN203889554U (en) * 2014-04-02 2014-10-22 自贡佳源炉业有限公司 Floating type steel belt offset detector
CN107656420A (en) * 2016-07-26 2018-02-02 Hoya株式会社 The manufacture method of photomask and display device, the inspection method of photomask base plate and device

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