JP2004354981A - Method of recording image pattern - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of recording image pattern by which reduction in the total productivity for processing a plurality of recording media is suppressed even when the measuring time for the recording medium is increased. <P>SOLUTION: The following processes are successively carried out: a recording medium supply process to supply a substrate 10A by a supply device 20; a first measuring process to measure the substrate 10A by a measuring device 30; a transporting process to transport the substrate from the measuring device 30 to a recording device 50 by a transporting device 40; a second measuring process to measure the substrate 10A by the recording device 50; a reference mark position acquiring process; an image data correcting process; and a recording process. The first measuring process for the succeeding substrate 10B supplied from the recording medium supply process succeeding to the former substrate 10A is carried out by the measuring device 30 parallel with any one of, or several processed among the second measuring process for the substrate 10A by the recording device 50, the reference mark position acquiring process, the image data correcting process and the recording process or along with a plurality of the above processes. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to an image pattern recording method, and more particularly to an image pattern recording method including a measurement step of measuring a recording medium and a recording step of recording an image pattern on the recording medium using the result of the measurement step. It is.

Conventionally, an exposure apparatus for recording an image pattern on a substrate by scanning a laser beam or the like in a direction orthogonal to the transport direction while placing the substrate or the like as a recording medium on a substrate mounting table and transporting the substrate in the transport direction. It has been known. Further, the position of the position measurement mark in the substrate indicating the position of the substrate and the position of the reference mark for image recording in the substrate which serves as a reference of the exposure position to the substrate when the image pattern is exposed are displayed on the substrate mounting table. There is also known an apparatus that measures a mounted substrate and accurately exposes an image pattern on the substrate mounted on the substrate mounting table based on the positional information (see, for example, Patent Document 1). ).
JP 2000-338432 A

  By the way, with the miniaturization and high accuracy of the image pattern exposed on the substrate, there is a demand for exposure of the image pattern in consideration of the deformation of the substrate. In response to such demands, a large number of image recording reference marks are arranged in the substrate, and the position of these image recording reference marks is accurately measured, thereby taking into account the deformation of the substrate and more appropriately in this substrate. Studies are underway to expose image patterns at various positions.

  However, it takes a lot of time to accurately measure a large number of image recording reference marks arranged on the substrate, and the image pattern cannot be exposed to the substrate during the measurement. Therefore, there is a problem that the overall productivity in the process of measuring the position in the substrate and exposing the image pattern to the substrate is lowered.

  The present invention has been made in view of the above circumstances, and an image pattern recording method capable of suppressing a decrease in overall productivity when a plurality of recording media are processed even if the measurement time for the recording media is increased. Is intended to provide.

  In the image pattern recording method of the present invention, a position measurement mark for measuring the position of a recording medium and an image recording reference mark that serves as a reference for the recording position of the image pattern when the image pattern is recorded are arranged. In the image pattern recording method for recording the image pattern on the recording medium, a recording medium supply step of supplying the recording medium to the measuring device by the supplying device, and the recording medium supplied to the measuring device by the measuring device In the first measurement step of acquiring positional relationship data indicating the positional relationship between the position of the position measurement mark and the position of the image recording reference mark in the recording apparatus, the loading device replaces the recording medium from the measuring device to the recording device. The position indicating the position of the position measurement mark with respect to the recording device on the recording medium placed on the recording device by the replacement process or the recording device. Based on the positional relationship data acquired in the first measurement step and the position data acquired in the second measurement step by the second measurement step and recording device for acquiring data, the position of the image recording reference mark with respect to this recording device A reference mark position acquisition step for acquiring the image pattern, and the recording device records the image pattern so that the image pattern is recorded on the recording medium with reference to the position of the reference mark for image recording acquired in the reference mark position acquisition step. An image data correction process for correcting the image data to be represented, and a recording apparatus that executes the recording process for recording the image pattern indicated by the image data on the recording medium in this order using the corrected image data. The second measurement step for the recording medium by the recording device, the reference mark position acquisition step, the image data correction step In parallel with the execution of any one of the recording steps or a plurality of steps, the measuring device supplies the recording medium to the measuring device by the recording medium supply step following the recording medium. The first measuring step is performed on the succeeding recording medium.

  The position measuring mark for measuring the position of the previous recording medium is a position measuring mark for indicating the position of the recording medium itself.

  The measurement device and the replacement device are connected by a vibration isolator, and when the recording medium is removed from the measurement device by the replacement device, the operation of the vibration isolator is prohibited and the mutual positional relationship between the two devices is established. The vibration isolator is actuated when the first measurement process is performed by the measuring device, and the above-described replacement device and the recording device are connected by the vibration isolator, and the recording device is a recording device by the transposing device. The vibration isolator is prohibited from being actuated when it is mounted on the apparatus, and the mutual positional relationship between the two apparatuses is fixed, and the vibration isolator is actuated when the second measuring process or the recording process is performed by the recording apparatus. Can be made.

  The vibration isolator attenuates vibrations propagating between the devices through the vibration isolator.

  The position measurement mark may also be used as the image recording reference mark. Note that all of the position measurement marks may also serve as the image recording reference marks, or a part of the position measurement marks may also serve as the image recording reference marks. Also good.

  The recording medium preferably has a plurality of position measurement marks.

  When the recording medium has a polygonal shape, the position measurement mark can be a corner of the polygonal shape.

  The image pattern recording method may include a step of controlling each of the table holding the recording medium supplied to the measuring apparatus and the table holding the recording medium transferred to the recording apparatus to a constant temperature. .

  The image pattern recording method of the present invention includes any one of the second measurement step, the reference mark position acquisition step, the image data correction step, and the recording step by the recording apparatus for the recording medium, or a plurality of them. In parallel with the execution of the process, the first measuring step by the measuring device is performed on the subsequent recording medium supplied to the measuring device by the recording medium supplying step following the recording medium. When the image pattern is recorded on the medium, the measurement device can measure the position of the subsequent recording medium following the recording medium, so even if the measurement time of the position on the recording medium increases, It is possible to suppress a decrease in overall productivity when processing a plurality of recording media.

  That is, conventionally, when processing a plurality of recording media, after the processing step by the measuring device for the specific recording medium and the processing step by the recording device are completed, the measuring device for the subsequent recording medium following this recording medium is used. In contrast to this, the image pattern recording method according to the present invention performs the process for the recording medium and the measurement for the subsequent recording medium following the recording medium. Since the processing steps by the apparatus can be performed in parallel, the entire processing time can be shortened by the time processed in parallel.

  In addition, the measuring device and the replacement device are connected by a vibration isolator, and when the recording medium is removed from the measuring device by the replacement device, the operation of the vibration isolator is prohibited and the mutual positional relationship between the two devices And the vibration isolator is operated when the first measurement process is performed by the measuring device, and the transfer device and the recording device are connected by the vibration isolator, and the recording device is connected to the recording device by the transfer device. The placement of the anti-vibration body is prohibited when placed, the mutual positional relationship between the two devices is fixed, and the anti-vibration body is activated when the recording device performs the second measurement process or the recording process. By doing so, it is possible to suppress the influence of vibration associated with movement of the transfer device when the first measurement process, the second measurement process, and the recording process are performed by operating each vibration isolator. The substrate can be removed by the transfer device by prohibiting the operation of each vibration isolator. Since the mutual positional relationship between the three devices, that is, the measuring device, the changing device, and the recording device when being transferred from the fixing device to the recording device can be substantially fixed, the position of the recording medium relative to the measuring device The above description can be changed so that the position of the repositioned recording medium with respect to the recording apparatus corresponds to, for example, the recording medium so that the recording medium is positioned at substantially the same position with respect to the measuring apparatus. If supplied, the recording medium, that is, the position measuring mark of the recording medium can always be positioned at substantially the same position with respect to the recording apparatus, and the position of the position measuring mark is determined in the second measuring step. The position of the position measurement mark when acquiring the position data to be shown is positioned at the corner of the measurement range or out of the measurement range. It can be.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. 1A is a diagram showing a schematic configuration of an image pattern recording apparatus for carrying out the image pattern recording method of the present invention, FIG. 1B is a front view of the apparatus, and FIG. 2 is a position measurement mark and image of a substrate. It is a figure which shows the reference mark for recording.

  The image pattern recording method of the present invention is a position measurement mark for measuring the position of a recording medium. This image pattern is recorded when the position measurement mark for indicating its own position and the image pattern are recorded. The image pattern is recorded on a recording medium provided with an image recording reference mark serving as a position reference.

  As shown in FIG. 1, an image pattern recording apparatus that performs the image pattern recording method includes a supply device 20, a measurement device 30, a transfer device 40, a recording device 50, and a collection device 60.

  The supply apparatus 20 includes a supply stocker 21 in which a plurality of substrates 10 are stacked and stored, a positioning unit 24 that positions the substrate 10 at a predetermined predetermined substrate supply position, and an uppermost portion stacked on the supply stocker 21. A substrate transfer unit 22 that takes out the substrate 10 positioned in the position and transfers it to the positioning unit 24, and a replacement unit 25 that transfers the substrate 10 positioned at the substrate supply position by the positioning unit 24 to the measurement apparatus 30.

  As shown in FIG. 2, two corners located at different positions of the substrate 10 having a quadrangular shape are used as position measurement marks 12, and circular shapes are formed at 12 locations (3 × 4) in the substrate 10. The image recording reference mark 11 is arranged. The substrate 10 is a printed circuit board production substrate having a photosensitive material layer on which a wiring pattern is recorded.

  The position measurement mark 12 may also serve as the image recording reference mark 11.

  FIG. 3A is a perspective view showing a schematic configuration of the supply stocker, and FIG. 3B is a perspective view showing an internal structure of the supply stocker.

  As shown in FIGS. 3A and 3B, the supply stocker 21 includes a mounting table 21 </ b> A for mounting a plurality of stacked substrates 10, and the uppermost substrate 10 of the stacked substrates 10. A jack portion 21B that automatically pushes up the position of the mounting table 21A each time the uppermost substrate 10 is taken out so that the position in the height direction (arrow Z direction in the figure) is always constant, and on the mounting table 21A While accommodating the several board | substrate 10 stacked | stacked, the movement to the vertical direction (arrow X direction in the figure) and horizontal direction (arrow Y direction in the figure) of the said board | substrate 10 and 21 A of mounting bases is controlled, The said board | substrate 10 And a substrate holding part 21C for guiding the peripheral edge of the mounting table 21A. Note that the position of the uppermost substrate 10 accommodated in the substrate holding unit 21C is detected by a substrate presence / absence sensor 21D including a limit switch.

  4 is a perspective view showing a schematic configuration of the supply device, FIG. 5 is a plan view showing a state where the substrate is positioned at the substrate supply position by the positioning unit, and FIG. 6 is a diagram showing the substrate placed on the measuring device by the replacement unit. It is a perspective view which shows a mode.

  As shown in FIG. 4, the substrate transfer unit 22 of the supply apparatus 20 includes a substrate holder 22 </ b> B having an adsorption unit 22 </ b> A that adsorbs the substrate 10, and two movement axes (X axis and Z axis) that move the substrate holder 22 </ b> B. The substrate transfer unit 22 adsorbs the substrate 10 by the adsorption unit 22A and removes it from the supply stocker 21 and places the substrate 10 in the positioning unit 24.

  The positioning unit 24 is arranged on the base table 24A, the table 24F on which the substrate 10 transferred by the substrate transfer unit 22 is placed, and the base table 24A that supports the table 24F and moves it in the vertical direction (X direction). The installed vertical drive unit 24B, two vertical positioning pins 24C extending in the height direction disposed on the base table 24A, and one horizontal positioning pin 24D disposed in the base table 24A and extending in the height direction. And a horizontal positioning pin moving portion 24E for moving the pin in the horizontal direction.

  The two vertical positioning pins 24C abut against the substrate 10 (see FIG. 5A) placed on the table 24F and transferred by the drive of the vertical drive unit 24B, so that the substrate 10 moves. Is stopped and the vertical position of the substrate 10 is positioned (see FIG. 5B). The horizontal positioning pin moving unit 24E moves one horizontal positioning pin 24D in the horizontal direction (Y direction) and applies the vertical positioning pin 24C to the substrate 10 positioned in the vertical direction to position the substrate 10. Is moved in the lateral direction to position the substrate 10 in the lateral direction (see FIG. 5C). As a result, the substrate 10 is positioned at the substrate supply position.

  The transfer unit 22C, the vertical drive unit 24B, and the substrate transfer unit 25C, vertical drive unit 32M, vertical / horizontal drive unit 32KM, substrate transfer unit 43, vertical drive unit 52M, substrate transfer unit 65C, etc. A ball / rail system or the like can be adopted as the moving mechanism, and a rack / pinion mechanism, a ball screw / ball bush mechanism, or a piston / cylinder mechanism can be adopted as the driving force transmission mechanism. Moreover, a motor, a hydraulic actuator, a pneumatic actuator, etc. can be adopted as the movement drive source.

  As illustrated in FIG. 6, the transfer unit 25 includes a substrate holder 25 </ b> B having an adsorption unit 25 </ b> A that adsorbs the substrate 10, and two movement axes (Y axis and Z axis) that support and move the substrate holder 25 </ b> B. The substrate 10 is disposed on the table 24F of the positioning unit 24 and is adsorbed by the adsorption unit 25A of the substrate holder 25B. 10 is arranged on the X table 32 of the measuring apparatus 30 described later.

  7 is a perspective view of the measuring device, FIG. 8 is a perspective view showing a schematic configuration of the measuring device having a configuration different from the measuring device shown in FIG. 7, FIG. 9A is a plan view of the measuring device, and FIG. b) is a front view of the measuring apparatus.

  As shown in FIG. 7, the measuring apparatus 30 supports the X base 32 on which the board | substrate 10 is mounted by the measurement base stand 31, the replacement part 25, and the X table 32, and moves it to a vertical direction (X direction). Both ends are supported by the vertical drive unit 32M provided on the measurement base 31 and the two support columns 33 and 2 support 33 provided on the measurement base table 31. It has a camera support portion 36 having a portal structure having a camera lateral movement portion 34 to be moved, and a camera 39 disposed on a moving base 35. The camera lateral movement portion 34 reciprocates the camera 39 in the horizontal direction. The X table 32 is moved in the vertical direction while the substrate 10 placed on the X table 32 is measured by the camera 39.

  The measuring apparatus 30 further moves the X table 32 in the vertical direction while reciprocating the camera 39 in the horizontal direction, measures the substrate 10 placed on the X table 32 with the camera 39, A positional relationship data acquisition unit 37 that acquires and stores positional relationship data indicating the positional relationship between the position of the position measurement mark 12 (corner portion of the substrate 10) and the position of the image recording reference mark 11. ing.

  In addition, as shown in FIG. 8 and FIG. 9, the said measuring apparatus may be comprised as follows. That is, the measurement apparatus 30K supports a measurement base 31K having an opening 36K in the center, an XY table 32K that can transmit X-rays on which the substrate 10 is placed, and an XY table 32K. The vertical / horizontal drive unit 32KM disposed on the measurement base base 31K and the two columns 33K disposed on the measurement base base 31K are moved in the direction (X direction) and the horizontal direction (Y direction). A camera holding portion 35K having a gate-shaped structure having a beam portion 34K extending in the lateral direction and supported at both ends by each of the columns 33K, and an X-ray for detecting X-rays held by the beam portion 34K of the camera holding portion 35K A detection camera 39K and an X-ray source 37K that is disposed below the measurement base 31K and irradiates the XY table 32K with X-rays through the opening 36K may be provided. In this case, the X-ray detection camera 39K detects X-rays emitted from the X-ray source 37K and passing through the substrate 10 arranged on the XY table 32K while moving the XY table 32K in the vertical and horizontal directions. Then, the positions of the position measurement mark and the image recording reference mark on the substrate 10 are measured.

  Further, the beam portion 34K holds the CCD camera 38K having sensitivity in the visible wavelength region next to the X-ray detection camera 39K, and the CCD camera 38K moves the XY table 32K in the vertical and horizontal directions. The position of the position measurement mark on the substrate 10 is read, and the X-ray passing through the substrate 10 radiated from the X-ray source 37K and moving on the XY table 32K is detected by the X-ray detection camera 39K to record an image on the substrate 10. The reference mark position may be read.

  When the vertical / horizontal driving unit 32KM moves the XY table 32K in the vertical and horizontal directions, the vertical / horizontal driving unit 32KM transmits the X-rays emitted from the X-ray source 37K and incident on the X-ray detection camera 39. The vertical / horizontal driving unit 32KM is provided with an opening 32KH so as not to block the road.

  FIG. 10 is a side view showing how the transfer device transfers the substrate from the measuring device to the recording device, FIG. 11A is a plan view showing the configuration of the substrate holder having a positioning pin hole, and FIG. Is a side view of the substrate holder, and FIGS. 12 (a), 12 (b), and 12 (c) are side views showing a state in which the substrate holder having a positioning pin hole is positioned and sucks the substrate. .

  As shown in FIG. 10, the transfer device 40 has a substrate holder 42 having a suction portion 41 that sucks the substrate 10, and two movement axes (Y axis and Z axis) that support and move the substrate holder 42. The substrate 10 is disposed on the common base stand 80, and the substrate 10 disposed on the measuring device 30 is adsorbed by the adsorption unit 41, and the substrate 10 is disposed on the recording device 50.

  In addition, you may make it adsorb | suck and transfer the board | substrate 10 arrange | positioned at the measuring apparatus 30 by making a board | substrate holder etc. into the following structures.

  That is, as shown in FIGS. 11 (a) and 11 (b), the inner holder has pin holes 42B that are arranged diagonally and extend in the height direction (Z direction), and is provided with a suction portion 42A. A plurality of elastic bodies having an opening capable of accommodating the portion 42C, the inner holder portion 42C, and connecting the outer holder portion 42D connected to the substrate transfer portion 43, and the inner holder portion 42A and the outer holder portion 42B. A substrate holder 42H having a spring 42E is connected to the substrate transfer section 43, and a pin 32G extending in the height direction (Z direction) to be fitted in the pin hole 42B of the substrate holder 42H on the X table 32 of the measuring device 30. Is disposed. Then, as shown in FIG. 12A, when the substrate holder 42H is lowered toward the substrate 10 placed on the X table 32 by driving the substrate transfer portion 43, the pin hole 42B of the inner holder portion 42C is formed. The pins 32G are fitted to position in the vertical direction (X direction) and the horizontal direction (Y direction), the substrate holder 42H is further lowered, and the suction portion 42A of the inner holder portion 42C sucks the substrate 10 (FIG. 12 (b)). Thereafter, the substrate 10 adsorbed by the adsorbing part 42A rises and is transferred together with the inner holder part 42C while adsorbed by the adsorbing part 42A as the substrate holder 42H rises (see FIG. 12C). In this way, the substrate 10 arranged in the measuring apparatus 30 may be sucked and transferred.

  Note that the above-described method can also be employed for changing the substrate from the supply device 20 to the measuring device 30 and changing the substrate from the recording device 50 to the recovery device 60.

  FIG. 13 is a side view showing a state in which the transfer device transfers the substrate to the recording device.

  As shown in FIG. 13 and FIG. 1, the recording apparatus 50 includes a recording base table 51, an X table 52 arranged on the recording base table 51 and movable in the vertical direction, and moves the X table 52 in the vertical direction. Exposure head having a gate-type structure including a vertical drive unit 52M to be moved, two support columns 53 disposed on the recording base 51, and beam portions 54 extending in the lateral direction and supported by the two support columns 53 at both ends. An exposure head 59R that exposes a support 56, a linear region extending in the horizontal direction, disposed on the beam 54, and a beam 54 opposite to the side on which the exposure head 59R is disposed. And two cameras 59C for measuring the substrate.

  The recording apparatus 50 further measures the substrate 10 disposed on the X table 52 that is moved in the vertical direction by the X table 52 with two cameras 59C, and measures the position measurement mark in the substrate 10 relative to the recording apparatus 50. The position data acquisition unit 57A for acquiring position data indicating 12 positions, the positional relationship data acquired by the positional relationship data acquisition unit 37, and the position data acquired by the positional data acquisition unit 57A are used for image recording. A reference mark position setting unit 57B that acquires the position of the reference mark 11 with respect to the recording apparatus 50, and an image pattern is recorded on the substrate 10 based on the position of the reference mark 11 for image recording acquired by the reference mark position setting unit 57B. As described above, the image data representing the image pattern stored in advance in the image data storage unit 57D is corrected. And an image data correction unit 57C, the exposure head 59R, using the image data corrected by the image data correction unit 57C has been performed, and records an image pattern indicating the image data within the substrate 10.

That is, correction is performed on the image data indicating the image pattern as follows. First, the measurement device 30 passes through the camera 39 and the two position measurement marks 12 in the substrate and 12 in the substrate 10. The position of the reference mark 11 for image recording at the location is measured, and positional relationship data is acquired. The measurement time at this time is approximately the same as the recording time on the substrate 10 by the recording device 50.

  Next, when the substrate 10 is transferred from the measuring device 30 to the recording device 50 by the transfer device 40, the recording device 50 passes the camera 59C to detect the position of the substrate 10 placed on the X table 52. The positions of the two position measurement marks 12 are measured. Thereby, the position of the position measurement mark 12 with respect to the recording apparatus 50 is grasped. Since two measurement points are measured by the fixed camera 59C at this time, the measurement time is short.

  Next, recording is performed on the basis of the position of the position measurement mark 12 with respect to the grasped recording apparatus 50 and the positional relationship between the image recording reference mark 11 and the position measurement mark 12 already acquired by the measurement apparatus 30. The positions of the twelve image recording reference marks 11 on the substrate 10 placed on the X table 52 of the apparatus 50 with respect to the recording apparatus 50 are obtained by calculation by the reference mark position setting unit 57B.

  Next, an image pattern is recorded based on the position of the image recording reference mark 11 with respect to the recording apparatus 50 obtained by the reference mark position setting unit 57B. That is, the X table 52 of the recording apparatus 50 has a predetermined position corresponding to the position of the image recording reference mark 11 of the substrate 10 in the image pattern exposed by the exposure head 59R of the recording apparatus 50. It is made to correspond to the position of the image recording reference mark 11 of the substrate 10 placed on the substrate 10. For this purpose, the position coordinate of the image data representing the image pattern exposed by the exposure head 59R is changed to correct the position of the image pattern exposed in the substrate 10. In this case, not only when the position of the entire image pattern is shifted or rotated, the magnification, the shift amount, and the rotation amount may be changed for each region in the image pattern.

  Further, in order to reduce the burden of rotating the image by calculation, a rotation mechanism for rotating the substrate 10 placed on the X table 52 of the recording apparatus 50 is added to the X table 52 to correct the rotation direction of the image pattern. May be performed mechanically rather than arithmetically.

  As shown in FIG. 1, the collection device 60 includes a collection stocker 61 that stacks and stores a plurality of substrates 10, and a transfer unit that replaces the substrate 10 on the X table 52 that has been exposed by the recording device 50 with the supply stocker 61. 65.

  The transfer unit 65 is arranged on a common base stand 80 having a substrate holder 65B having an adsorption unit 65A for adsorbing the substrate 10 and two axes (Y-axis and Z-axis) moving axes for supporting and moving the substrate holder 65B. The substrate 10 disposed on the X table 52 of the recording apparatus 50 is adsorbed by the adsorbing unit 65A, and the substrate 10 is stacked on the recovery stocker 61. To place.

  Here, the anti-vibration mechanism in the measuring device 30 and the recording device 50 will be described. The substrate transfer unit 43 of the transfer device 40 is arranged on the common base stand 80, and the measurement base stand 31 of the measuring device 30 is arranged on the common base stand 80 via the vibration isolator 70A ( On the other hand, the recording base 51 of the recording apparatus 50 is disposed on the common base 80 via the vibration isolator 70B (see FIGS. 13 and 1).

  The anti-vibration unit 70A operates the anti-vibration body 71A and the anti-vibration body 71A for connecting the measurement apparatus 30 and the replacement apparatus 40 disposed at the four corners of the bottom surface of the measurement base 31 of the measurement apparatus 30. A switching unit 72A that switches the operating state of the vibration isolator 71A by prohibiting the operation, and when the operation of the vibration isolator 71A is prohibited by the switching unit 72A, the measuring device 30 and the transfer device 40 The mutual positional relationship (the positional relationship between the vertical direction and the horizontal direction) is fixed.

  The switching unit 72A includes a linear motion mechanism that moves the pin 75A in the Z direction along the slide guide 76A. The linear motion mechanism is disposed in the common base stand 80. The switching unit 72A inserts the pin 75A into the pin hole 78A of the pin hole receiving unit 77A disposed on the measurement base base 31, and the pin 75A and the pin hole 78A are fitted to each other, whereby the measuring device The mutual positional relationship between 30 and the transfer device 40 is fixed. The switching unit 72A has a drive mechanism including a rack 73A to which a pin 75A is connected, a pinion 74A meshing with the rack 73A, a motor (not shown) that rotates the pinion 74A, and the like. Is moved in the Z direction along the slide guide 76A.

  On the other hand, the anti-vibration unit 70B is the same as the above-described replacement unit 72A and the anti-vibration body 71B that connects the transfer device 40 and the recording device 50 arranged at the four corners of the bottom surface of the recording base 51 of the recording device 50. When the operation of the vibration isolator 71B is prohibited by the switching unit 72B, the positional relationship between the recording device 50 and the transfer device 40 (in the vertical direction and the horizontal direction) The positional relationship) is fixed.

  The switching unit 72B includes a linear motion mechanism or the like that moves the pin 75B in the Z direction along the slide guide 76B, and this linear motion mechanism is disposed in the common base stand 80 in the same manner as the switching unit 72A. The switching unit 72B inserts the pin 75B into the pin hole 78B of the pin hole 77B disposed on the recording base 51 and causes the pin 75B and the pin hole 78B to be fitted to each other. The positional relationship of the transfer device 40 is fixed. The switching unit 72B has a drive mechanism including a rack 73B to which a pin 75B is connected, a pinion 74B meshing with the rack 73B, a motor (not shown) that rotates the pinion 74B, and the like. Is moved in the Z direction along the slide guide 76B.

  As the vibration isolator 71A and the vibration isolator 71B, an elastic body such as rubber, a coil spring, a leaf spring, or an elastic generation system such as an air spring can be applied.

  Next, a temperature control mechanism that maintains each of the X table 32 provided in the measuring device 30 and the X table 52 provided in the recording device 50 at a constant temperature will be described with reference to FIG.

  The temperature control for the X table 32 of the measuring device 30 is to circulate a liquid adjusted to a constant temperature in an embedded pipe 32Ta formed inside the X table 32 so that the X table 32 is kept at a constant temperature. is there. The liquid circulating in the embedded pipe 32Ta is routed from the chiller device 32H, supplied to the embedded pipe 32Ta through the pipe 32Tb, and returned from the embedded pipe 32Ta to the chiller apparatus 32H through the drawn pipe 32Tc.

  The temperature control for the X table 52 of the recording apparatus 50 is the same as the temperature control for the X table 32 described above, and a liquid whose temperature is adjusted to a constant temperature is circulated in an embedded pipe 52Ta formed inside the X table 52. Thus, the X table 52 is set to a constant temperature. The liquid circulating in the embedded pipe 52Ta is supplied from the chiller device 52H to the embedded pipe 52Ta through the pipe 52Tb, and returned from the embedded pipe 52Ta to the chiller apparatus 52H through the drawn pipe 52Tc. The temperature of the X table 32 of the temperature-controlled measuring device 30 may be the same as or slightly different from the temperature of the X table 52 of the temperature-controlled recording device 50.

  The controller 89 controls the overall operation of the apparatus and the timing of each operation.

  The operation of the image pattern recording apparatus based on the image pattern recording method will be described below with reference to FIG. FIG. 14 is a diagram showing the timing at which each substrate is processed in each step.

  In the following description of the image pattern recording apparatus, the substrate 10A, the substrate 10B, and the substrate 10C are supplied to each device in this order.

<Processing Process for Substrate 10A>
In the first recording medium supply process, the supply device 20 adsorbs the substrate 10A located at the uppermost portion of the supply stocker 21 on which a large number of substrates are stacked by the adsorption unit 22A of the transport arm 22, and the table 24F of the positioning unit 24. Move up. Then, the positioning unit 24 positions the position of the substrate 10A at the predetermined substrate supply position. Thereafter, the substrate 10 </ b> A positioned at the substrate supply position by the replacement unit 25 is replaced on the X table 32 of the measuring apparatus 30. Thereby, the substrate 10A is supplied to the measuring apparatus 30.

  In the recording medium supply process, when the substrate 10A is transferred from the positioning unit 24 to the measuring device 30, the operation of the vibration isolating unit 70A is prohibited. Then, the substrate 10A is placed at a predetermined position on the X table 32 of the measuring device 30 in a state where the operation of the vibration isolating unit 70A is prohibited.

  In the next first measurement step, the measurement device 30 measures the position of the position measurement mark 12 and the position of the image recording reference mark 11 in the substrate 10 supplied from the supply device 20 through the camera 39, and both The positional relationship data indicating the positional relationship is acquired and stored by the positional relationship acquisition unit 37.

  In the first measurement step, the vibration isolator 70A is in an operating state.

  In the next replacement process, the replacement apparatus 40 transfers the substrate 10 </ b> A from the measurement apparatus 30 to the X table 52 of the recording apparatus 50.

  In the above described replacement process, the operation of the vibration isolator 70A and the vibration isolator 70B is prohibited.

  In the second measurement process following the replacement process for the substrate 10A, the recording device 50 is used to record the position measurement marks 12 on the substrate 10A, which are mounted on the X table 52 through the two cameras 59C, with respect to the recording device 50. Positions are measured, and position data indicating these positions are acquired and stored by the position data acquisition unit 57A.

  In addition, in the said 2nd measurement process, the vibration isolator 70B will be in an operation state.

  In the next reference mark position acquisition step, the reference mark position setting unit 57B of the recording apparatus 50 records an image based on the positional relationship data acquired in the first measurement step and the position data acquired in the second measurement step. The position of the reference mark for use with respect to the recording device 50 is acquired.

  Subsequently, in the image data correction step, the image data correction unit 57C of the recording device 50 is stored in the image data storage unit 57D on the basis of the position of the image recording reference mark acquired in the reference mark position acquisition step. Image data representing the image pattern is corrected so that the image pattern is recorded on the substrate 10A.

  In the next recording step, the recording apparatus 50 records the image pattern indicated by the image data on the substrate 10A using the image data corrected by the image data correction unit 57C.

  In the recording process, the vibration isolator 70B is activated.

  In the recording medium recovery step subsequent to the recording step for the substrate 10A, the recovery device 60 recovers the substrate 10A on which the image pattern is recorded from the recording device 50.

<Processing of substrate 10B>
In addition, when the 1st measurement process with respect to the said board | substrate 10A is started, the recording-medium supply process with respect to the board | substrate 10B is implemented in parallel with this. That is, the substrate 10B following the above-described starting substrate 10A located on the uppermost portion of the supply stocker 21 is sucked by the suction unit 22A of the transfer arm 22 and transferred onto the table 24F of the positioning unit 24. The positioning unit 24 positions the substrate 10B at the predetermined substrate supply position. Thereafter, when the substrate 10A is removed from the measuring device 30 by the changing device 40 for transferring the substrate 10A from the measuring device 30 to the recording device 50, the substrate transfer unit 25C of the supply device 20 positions the substrate 10B. Transfer from the unit 24 to the measuring device 30.

  In the recording medium supply step, when the substrate 10B is transferred from the positioning unit 24 to the measuring device 30, the operation of the vibration isolating unit 70A is prohibited.

  Next, when the recording apparatus 50 starts the second measurement process for the substrate 10A, the first measurement process for the substrate 10B by the measurement apparatus 30 is performed.

  Note that the vibration isolator 70A is in an operating state during the execution of the first measurement step.

  When the recording process on the substrate 10A by the recording device 50 is completed and the substrate 10A is recovered by the recovery device 60, a transfer process is performed in which the transfer device 40 transfers the substrate 10B from the measuring device 30 to the recording device 50. Is done.

  In the above described replacement process, the operation of the vibration isolator 70A and the vibration isolator 70B is prohibited.

  Thereafter, when the recording device 50 completes the execution from the second measurement process to the recording process on the substrate 10B, the substrate 10B is recovered by the recovery device 60.

  In the second measurement process and the recording process, the vibration isolator 70B is in an operating state.

<Processing of substrate 10C>
When the first measurement process for the substrate 10B is started, a recording medium supply process for the substrate 10C is performed in parallel therewith. That is, the supply device 20 sucks the subsequent substrate 10C following the substrate 10B located at the top of the supply stocker 21 by the suction portion 22A of the transfer arm 22, transfers it to the table 24F of the positioning portion 24, and positions it. The unit 24 positions the substrate 10C at the predetermined substrate supply position.

  As described above, any one of the second measurement process, the reference mark position acquisition process, the image data correction process, and the recording process for the first substrate 10 by the recording apparatus 50, or a plurality of them In parallel with the process, the first measurement process for the subsequent substrate 10 can be performed by the measurement apparatus 30, so that even if the measurement time for the substrate 10 is increased, the entire production when processing a plurality of substrates 10 is performed. Deterioration can be suppressed.

The figure which shows schematic structure of the image pattern recording device by embodiment of this invention Diagram showing substrate position measurement mark and image recording reference mark Diagram showing schematic configuration of supply stocker The perspective view which shows schematic structure of a supply apparatus The top view which shows a mode that a board | substrate is positioned in a board | substrate supply position by the positioning part. The perspective view which shows a mode that a board | substrate is mounted in a measuring apparatus by the mounting part. The perspective view which shows schematic structure of a measuring apparatus The perspective view which shows schematic structure of the measuring apparatus which consists of a structure different from the measuring apparatus shown in FIG. The top view and side view which show schematic structure of the measuring apparatus which consists of a structure different from the measuring apparatus shown in FIG. Side view showing how the loading device replaces the substrate from the measuring device to the recording device A plan view and a side view showing a configuration of a substrate holder having a positioning pin hole Side view showing how a substrate holder having positioning pin holes is positioned Side view showing how the transfer device transfers the substrate to the recording device The figure which shows the timing when each board is processed in each process

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Board | substrate 20 Supply apparatus 30 Measuring apparatus 40 Replacement apparatus 50 Recording apparatus 60 Collection | recovery apparatus

Claims (4)

With respect to the recording medium in which a position measurement mark for measuring the position of the recording medium and an image recording reference mark serving as a reference of the recording position of the image pattern when the image pattern is recorded are arranged on the recording medium. In an image pattern recording method for recording an image pattern,
A recording medium supply step of supplying the recording medium to the measuring device by a supply device;
A first measurement step of acquiring, by the measurement device, positional relationship data indicating a positional relationship between the position of the position measurement mark and the position of the image recording reference mark on the recording medium supplied to the measurement device;
A transfer step of transferring the recording medium from the measurement device to the recording device by a transfer device;
A second measuring step of acquiring position data indicating a position of the position measuring mark with respect to the recording apparatus on the recording medium transferred to the recording apparatus by the recording apparatus;
A reference mark position for acquiring a position of the reference mark for image recording with respect to the recording device based on the positional relationship data acquired in the first measurement step and the position data acquired in the second measurement step. Acquisition process,
The image data representing the image pattern is corrected by the recording device so that the image pattern is recorded on the recording medium based on the position of the image recording reference mark acquired in the reference mark position acquisition step. Image data correction process,
The recording device uses the corrected image data to execute a recording process for recording the image pattern indicated by the image data on the recording medium in this order,
Execution of any one of the second measurement process, the reference mark position acquisition process, the image data correction process, and the recording process for the recording medium by the recording apparatus, or a plurality of processes among them In parallel with the image recording, the first measuring step is performed on the subsequent recording medium supplied to the measuring device by the measuring device, and the recording medium supplying step following the recording medium. Method. The measurement device and the replacement device are connected by a vibration isolator, and when the recording medium is removed from the measurement device by the replacement device, the operation of the vibration isolation body is prohibited, and the two devices are mutually connected. The vibration isolator is operated when the first measuring step is performed by the measuring device, and the replacement device and the recording device are connected by the vibration isolator, When the recording medium is placed on the recording device by the replacement device, the operation of the vibration isolator is prohibited and the mutual positional relationship between the two devices is fixed. 2. The image pattern recording method according to claim 1, wherein the vibration isolator is operated when a recording step is performed. 3. The image pattern recording method according to claim 1, wherein the position measurement mark also serves as the image recording reference mark. And a step of controlling each of the table holding the recording medium supplied to the measuring apparatus and the table holding the recording medium transferred to the recording apparatus to have a constant temperature. Item 4. The image pattern recording method according to any one of Items 1 to 3.

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