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CN114748971B - Method for purifying H2 and CO from synthesis gas by using rotary distributor - Google Patents

Method for purifying H2 and CO from synthesis gas by using rotary distributor Download PDF

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Publication number
CN114748971B
CN114748971B CN202210256742.5A CN202210256742A CN114748971B CN 114748971 B CN114748971 B CN 114748971B CN 202210256742 A CN202210256742 A CN 202210256742A CN 114748971 B CN114748971 B CN 114748971B
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tower
cavity
enters
rotary distributor
distributor
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CN114748971A (en
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钟雨明
陈运
汪兰海
詹家聪
陈勇
蔡跃明
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Sichuan Techairs Co ltd
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Sichuan Techairs Co ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0407—Constructional details of adsorbing systems
    • B01D53/0446—Means for feeding or distributing gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0454—Controlling adsorption
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/047—Pressure swing adsorption
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/508—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by selective and reversible uptake by an appropriate medium, i.e. the uptake being based on physical or chemical sorption phenomena or on reversible chemical reactions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/40—Carbon monoxide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/16—Hydrogen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/20—Carbon monoxide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/40—Further details for adsorption processes and devices
    • B01D2259/406—Further details for adsorption processes and devices using more than four beds
    • B01D2259/4065—Further details for adsorption processes and devices using more than four beds using eight beds

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Inorganic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Separation Of Gases By Adsorption (AREA)

Abstract

The invention discloses a method for purifying H2 and CO from synthesis gas by using a rotary distributor, belongs to the technical field of hydrogen production by using hydrogen-containing converted gas, and aims to solve the problem of complex system structure caused by the fact that a pipeline is required in each step of pressure swing adsorption and cannot be shared in the prior art. The rotary distributor is creatively used in the application, the rotatable flow channel distributor is arranged in the shell of the rotary distributor, independent functional chambers with multiple functions are arranged in the flow channel distributor, and when the functional chambers with different functions are communicated or blocked from being communicated with corresponding adsorption towers, the corresponding adsorption towers are in adsorption, pressure drop, pressure rise, sequential arrangement, reverse arrangement, flushing, final charging or maintaining stages and are switched among the stages; the rotary distributor can replace the original rotary valve, does not need to be provided with a complex adsorption pipeline, does not have complex bridge wiring, programming and other work, and has a simpler adsorption system structure and lower production cost.

Description

Method for purifying H2 and CO from synthesis gas by using rotary distributor
Technical Field
The invention belongs to the technical field of hydrogen production, relates to a method for producing hydrogen by using hydrogen-containing reformed gas, and more particularly relates to a method for producing hydrogen by using a rotary distributor for hydrogen-containing reformed gas.
Background
In the process, an Axial Fixed Bed (AFB) is generally used for pressure swing adsorption, namely, a columnar adsorption tower with the height-diameter ratio of more than 1.5 is adopted to fill an adsorbent and is vertically installed, and gas passes through an adsorption bed layer in the vertical direction (axial direction).
The AFBPSA process has the advantages of simple equipment, convenience in installation, easiness in filling of the adsorbent and the like.
But at the same time, the following disadvantages exist:
1. because the valve is adopted to control the gas flow direction, a plurality of program control valves are needed to form a special valve area, so that the occupied area is large, and complicated program control is needed;
2. limited by the size of the adsorption tower, if large production is required, more adsorption towers need to be added, resulting in a linear increase in the number of valves;
3. with the increase of the yield requirement, a large adsorption tower and a plurality of pipelines face a large amount of loss of dead space gas in the desorption process, and the yield is reduced.
For the above deficiencies of AFBPSA, numerous solutions also appear in the prior art:
the invention patent application with the application number of CN202110084790.6 discloses a pressure swing adsorption process based on a multi-channel rotary valve, which comprises an adsorption mechanism, a driving mechanism, a buffer mechanism and a control device, wherein the adsorption mechanism comprises a pressure swing adsorption device and a pressure swing adsorption device, wherein the pressure swing adsorption device comprises a pressure swing adsorption device, a pressure swing adsorption device and a control device, wherein the pressure swing adsorption device comprises a pressure swing adsorption device, a pressure swing adsorption device and a control device, wherein the pressure swing adsorption device comprises: the adsorption mechanism is filled with adsorption filler and is provided with a plurality of groups for adsorbing the product gas; the driving mechanism is arranged in the center of the plurality of groups of adsorption mechanisms and is respectively communicated with the upper end and the lower end of each adsorption mechanism so as to enable the adsorption tower to sequentially complete an adsorption process, an equal lifting/equal lowering process and an analysis process; the buffer mechanism is used for respectively storing the product gas, the finished product gas and the analysis gas; the control device comprises a programmable logic controller which is electrically connected with a frequency converter; the driving mechanism comprises an upper valve, a lower valve and a driving motor for controlling the communication or the blocking of the corresponding chambers of the upper valve and the lower valve. In the process, the communication or the blocking communication among the adsorption towers can be realized through the rotary valve, and each adsorption tower is correspondingly positioned in each stage of adsorption, pressure equalizing drop, pressure equalizing rise, forward discharge, reverse discharge, flushing and the like by adjusting the communication relation among the adsorption towers.
In addition, the utility model patent with application number CN201821779052.3 discloses a nine-tower pressure swing adsorption system's programmable valve device, it includes valve and lower valve, it includes valve body and last case to go up the valve, the lower valve includes valve body and case down, it is connected through the pivot to go up case and case down, the pivot is passed the case and is connected with the motor, it goes up the interface to have seted up nine on the valve body, nine lower interfaces have been seted up on the valve body down, it is connected with the top of the tower of adsorption tower respectively through the pipeline to go up the interface, the lower interface is connected with the tower bottom of adsorption tower through the pipeline respectively, it is equipped with product gas passageway respectively to go up the valve in-core, one all falls the passageway, two all fall the passageway, three all falls the passageway, finally step up passageway and last valve sweep the passageway against the current, lower case inside is equipped with raw materials air inlet respectively, the adsorption passageway, lower valve sweeps the passageway against the current and evacuation passageway.
The utility model discloses a utility model patent of application number CN201922100881.5 discloses a rotary valve device of twelve-tower pressure swing adsorption system, it includes upper valve and lower valve, the upper valve includes valve body and upper valve core, the internal portion of upper valve is equipped with the product gas passageway respectively, the passageway of homogeneous liter/drop, four homogeneous liter/drop, the passageway of finally stepping up, put in the same direction/wash a passageway, put in the same direction/wash two passageways, put in the same direction/wash three passageways, the product gas sweeps the passageway, the inside raw materials air inlet that is equipped with respectively of lower valve core, the adsorption channel, wash analytic gas one discharge channel, wash analytic gas two discharge channels, wash analytic gas three discharge channels, put in the opposite direction, product gas discharge channel and analytic gas discharge total passageway.
The technical scheme that the rotary valve is used for replacing the prior numerous program control and regulating valves and a large number of pipelines is matched and used is provided by the multiple patent applications, so that the production and manufacturing cost and space are effectively reduced. However, it has a significant drawback that the rotary valves rotate in a manner similar to jumping rather than uniform rotation, and need to rotate to a certain angle to achieve pipeline communication for performing the corresponding pressure swing adsorption step, resulting in the following disadvantages:
(1) the function of the traditional PSA regulating valve is not provided, the pressure is suddenly increased and decreased, the air flow obviously scours the bed layer, and the adsorbent is greatly influenced;
(2) pipelines cannot be shared, each step of pressure swing adsorption needs one pipeline in a one-to-one correspondence mode, the whole system is complex in structure, and production cost is high.
Disclosure of Invention
The invention aims to: in order to solve the problems of complex system structure and high production cost caused by the fact that a pipeline is needed in each step of pressure swing adsorption and cannot be shared in the prior art, a method for purifying H2 and CO by using a rotary distributor for synthesis gas is provided.
The invention specifically adopts the following technical scheme for realizing the purpose:
a method for purifying H2 and CO by using a rotary distributor for synthesis gas comprises a plurality of adsorption towers and a rotary distributor, wherein the number of upper tower openings and lower tower openings of the rotary distributor is the same as that of the adsorption towers, a discharge opening of each adsorption tower is communicated with the corresponding upper tower opening, and a feed opening of each adsorption tower is communicated with the corresponding lower tower opening;
the rotary distributor comprises a shell and a flow channel distributor;
the shell is provided with an FG port for feeding, a PG port for product output, a VT port for emptying, and a tower upper port and a tower lower port for communicating the adsorption tower;
the runner distributor is arranged in the shell and can rotate in the shell, a plurality of independent functional cavities are respectively formed in the upper part and the lower part of the runner distributor along the circumferential direction of the runner distributor, the functional cavities on the upper part of the runner distributor sequentially comprise an A cavity, an E1D cavity, a PP cavity, an E2D cavity, an E3D cavity, a P cavity, an E3R cavity, an E2R cavity, an E1R cavity and an FR cavity, and the functional cavities on the lower part of the runner distributor sequentially comprise an A cavity, a D cavity and a P cavity;
the cavity A and the cavity FR on the upper part of the flow channel distributor are both communicated with the PG port, the functional cavity on the upper part of the flow channel distributor is provided with a communicating seam which can be communicated with the upper tower port, the cavity A on the lower part of the flow channel distributor is communicated with the FG port, the cavity P and the cavity D are both communicated with the VT port, the cavity D on the lower part of the flow channel distributor is provided with a communicating seam which can be communicated with the lower tower port, and the flow channel distributor and the shell are sealed;
the synthesis gas is used as raw material gas, the raw material gas enters a cavity A at the lower part of the flow channel distributor through an FG port on a shell, when the cavity A at the upper part of the flow channel distributor is communicated with a tower A upper port corresponding to an adsorption tower A through a communication seam, the raw material gas enters the adsorption tower A through a tower A lower port for adsorption, and H2 and CO enter the cavity A at the upper part of the flow channel distributor through the tower A upper port and are output through a PG port; the method comprises the steps of rotating the flow channel distributor and adjusting the rotating speed of the flow channel distributor, communicating or blocking and communicating different functional chambers on the flow channel distributor with different adsorption towers, connecting the functional chambers in the flow channel distributor with the adsorption towers end to end in a time sequence in the cyclic operation of adsorption and desorption, and distributing feed gas in the chambers, connecting pipelines of the chambers and the adsorption towers so that the inner adsorption towers can repeatedly perform adsorption and desorption steps.
Preferably, the synthesis gas consists of the following raw materials in volume percent: h 2 33％～36％、CO 2 17-20 percent of carbon monoxide (CO), 43-47 percent of CO and the balance of water and methane.
Preferably, eight adsorption towers are arranged, namely a tower A, a tower B, a tower C, a tower D, a tower E, a tower F, a tower G and a tower H, and two adsorption towers are in an adsorption state in the middle and are subjected to pressure equalization for 3 times; the rotating speed of the flow channel distributor is 30-100 min/rad, and the yield is 1000-50000 Nm 3 /h。
Preferably, the yield is 8000Nm 3 The rotating speed of the flow channel distributor is 50-80 min/rad.
Preferably, the communication seams of the flow channel distributor are variable diameter communication seams, and the sizes of the variable diameter communication seams are sequentially increased along the rotation direction of the flow channel distributor.
Preferably, the flow channel distributor comprises an upper distributor positioned at the upper part and a lower distributor positioned at the lower part, wherein a cavity A, an E1D cavity, a PP cavity, an E2D cavity, an E3D cavity, a P cavity, an E3R cavity, an E2R cavity, an E1R cavity and an FR cavity are formed in the upper distributor, and the cavity A, the cavity D and the cavity P are formed in the lower distributor; the upper distributor and the lower distributor rotate independently, and the rotating speed and the rotating direction are the same.
Preferably, in the upper part of the flow channel distributor, the cavity P and the cavity E3R are arranged opposite to the cavity A, a solid area is arranged between the cavity E3D and the cavity P, and solid areas are arranged between the cavity E3R and the cavity E2R and between the cavity E2R and the cavity E1R;
in the lower part of the flow channel distributor, a cavity D and a cavity P are arranged opposite to a cavity A, and solid areas are arranged between the cavity A and the cavity D and between the cavity P and the cavity A.
Preferably, the rotating speed of the flow channel distributor is adjusted according to the technical indexes of the working condition of the raw material gas and the product gas and the desorption gas.
Preferably, the adsorption tower is provided with eight towers, i.e., tower a, tower B, tower C, tower D, tower E, tower F, tower G and tower H, the flow channel distributor in the rotary distributor is rotated, and the adsorption process, the equalization up/equalization down process are performed by the steps of:
in the interval of time slice 1, the A and H towers are in an adsorption state, feed gas enters the cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the A and H towers, enters the cavity A at the top of the rotary distributor from the tops of the A and H towers, and is sent out of the system from a PG pipe; the tower B and the tower G are in primary pressure equalizing, the gas in the tower G enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower B from the top of the tower B to finish pressure equalizing on the tower B; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower E is in a reverse discharge state, the top of the tower E is not communicated with the rotary distributor, the bottom of the tower E is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower F are in a matched forward flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower D, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 2, the towers A and H keep the adsorption state, and the airflow is unchanged; the tower B is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower B; the tower C and the tower F are in secondary pressure equalizing, the gas in the tower F enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower E is in a reverse discharge state, the top of the tower E is not communicated with the rotary distributor, the bottom of the tower E is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower D, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 3, the towers A and F keep the adsorption state, and the airflow is unchanged; continuing to fill the tower B; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower D and the tower F are in third pressure equalizing, the tower F gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower D from the top of the tower D to finish pressure equalizing on the tower D; the tower E and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of time slice 4, tower A and tower B are in an adsorption state, feed gas enters cavity A at the lower part of the rotary distributor from FG port, enters cavity A at the top of the rotary distributor from the top after entering the bottoms of tower A and tower B, and is sent out of the system from PG pipe; the tower C and the tower H are in primary pressure equalizing, the gas in the tower H enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower F is in a reverse discharge state, the top of the tower F is not communicated with the rotary distributor, the bottom of the tower F is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower E and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 5, the tower A and the tower B are in an adsorption state, and the airflow is unchanged; the tower C is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower C; the tower D and the tower G are in secondary pressure equalizing, the gas in the tower G enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the tower F is in a reverse discharge state, and the airflow is unchanged; the tower E and the tower H are in a matched forward flushing state, the gas in the tower H enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 6, the tower A and the tower B maintain an adsorption state, and the airflow is unchanged; the tower C is in a final charging state, and the airflow is unchanged; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower E and the tower G are in third pressure equalization, the gas in the tower G enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower E from the top of the tower E to equalize the pressure of the tower E; the tower F and the tower H are in a matched forward flushing state, the gas in the tower H enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower F, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 7, the tower B and the tower C are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the tower B and the tower C, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; e, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower G is in a reverse discharge state, the top of the tower G is not communicated with the rotary distributor, the bottom of the tower G is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower A are in primary pressure equalizing, the tower A gas enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the F tower and the H tower are in a matched forward-discharge flushing state, the airflow is unchanged, and the gas is sent out of the system through the VT port;
in the interval of the time slice 8, the tower B and the tower C are in an adsorption state, and the airflow is unchanged; the tower D is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with the FR cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower D; the tower G is in a reverse discharge state, and the airflow is unchanged; the H tower and the E tower are in secondary pressure equalizing, the H tower gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the E tower from the top of the E tower to finish pressure equalizing on the E tower; the tower F and the tower A are in a matched forward flushing state, the gas in the tower A enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower F, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of time slice 9, tower B and tower C are in an adsorption state, and the airflow is unchanged; the tower D is in a final charging state, and the airflow is unchanged; e, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the H tower and the F tower are in third pressure equalizing, H tower gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters from the top of the F tower to equalize the pressure of the F tower; the tower G and the tower A are in a matched forward flushing state, the gas of the tower A enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower G, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 10, the tower D of the tower C is in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the tower C and the tower D, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; the tower F is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the H tower is in a reverse discharge state, the top of the H tower is not communicated with the rotary distributor, the bottom of the H tower is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower B and the tower E are in primary pressure equalizing, the gas in the tower B enters an upper E1D cavity of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower E from the top of the tower E to equalize the pressure of the tower E; the tower A and the tower G are in a matched sequential flushing state, and the airflow is unchanged;
in the interval of the time slice 11, the tower C and the tower D are in an adsorption state, and the airflow is unchanged; the E tower is in a final charging state, the bottom of the E tower is not communicated with the rotary distributor, the top of the E tower is communicated with the FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the E tower; the H tower is in a reverse discharge state, and the airflow is unchanged; the tower A and the tower F are in secondary pressure equalizing, the tower A gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower F from the top to finish pressure equalizing on the tower F; the tower B and the tower G are in a matched forward flushing state, the gas in the tower B enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower G, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 12, the tower C and the tower D are in an adsorption state, and the airflow is unchanged; the tower E is in a final charging state, and the airflow is unchanged; the tower F is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A and the tower G are in third pressure equalization, the gas in the tower A enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower G from the top to equalize the pressure of the tower G; the tower B and the tower H are in a matched forward flushing state, the gas in the tower B enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower H, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 13, the tower D and the tower E are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the tower D and the tower E, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the G tower is in a maintaining state, and the top and the bottom of the G tower are not communicated with the rotary distributor; the tower C and the tower F are in primary pressure equalizing, the tower C gas enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower F from the top to finish pressure equalizing on the tower F; the tower B and the tower H are in a matched sequential flushing state, and the flushing is finished under the condition that the airflow is unchanged;
in the interval of the time slice 14, the tower D and the tower E are in an adsorption state, and the airflow is unchanged; the tower A is in a reverse discharge state, and the airflow is unchanged; the tower F is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower F; the tower B and the tower G are in secondary pressure equalizing, the gas in the tower B enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower G from the top to equalize the pressure of the tower G; the tower C and the tower H are in a matched forward flushing state, the gas in the tower C enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower H, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 15, the tower D and the tower E are in an adsorption state, and the airflow is unchanged; the tower F is in a final charging state, and the airflow is unchanged; g, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower B and the tower H are in third pressure equalization, the gas in the tower B enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower H from the top of the tower H to equalize the pressure of the tower H; the tower A and the tower C are in a matched forward flushing state, the gas in the tower C enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower A, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 16, the tower F of the tower E is in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor after entering the bottoms of the tower D and the tower F, and is sent out of the system from a PG pipe; the H tower is in a holding state, and the top and the bottom of the H tower are not communicated with the rotary distributor; the tower B is in a reverse discharge state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower G are in primary pressure equalizing, the gas in the tower D enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower G from the top to equalize the pressure of the tower G; the tower A and the tower C are in a matched forward flushing state, and the air flow is unchanged, so that flushing is completed;
in the interval of the time slice 17, the E tower F tower is in an adsorption state, and the airflow is unchanged; the tower G is in a final charging state, the bottom of the tower G is not communicated with the rotary distributor, the top of the tower G is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower G; the tower is in a reverse discharge state, and the airflow is unchanged; the tower C and the tower H are in secondary pressure equalizing, tower C gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower H from the top to finish pressure equalizing on the tower H; the tower A and the tower D are in a matched forward flushing state, the gas of the tower D enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower A, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
in the interval of the time slice 18, the E tower F tower is in an adsorption state, and the airflow is unchanged; the tower G is in a final charging state, and the airflow is unchanged; the H tower is in a holding state, and the top and the bottom of the H tower are not communicated with the rotary distributor; the tower A and the tower C are in third pressure equalizing, the tower C gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower A from the top of the tower A to finish pressure equalizing on the tower A; the tower B and the tower D are in a matched forward flushing state, the gas of the tower D enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower B, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 19, the tower G of the tower F is in an adsorption state, raw gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the tower F and the tower G, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower E and the tower H are in primary pressure equalization, the gas in the tower E enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower H from the top to equalize the pressure of the tower H; the tower B and the tower D are in a matched forward flushing state, and the air flow is unchanged, so that flushing is completed;
in the interval of the time slice 20, the tower F and the tower G are in an adsorption state, and the airflow is unchanged; the tower C is in a keeping state, and the airflow is unchanged; the H tower is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the H tower; the tower A and the tower D are in secondary pressure equalizing, the gas of the tower D enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower A from the top of the tower A to finish pressure equalizing on the tower A; the tower B and the tower E are in a matched forward flushing state, the gas of the tower E enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower B, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 21, the tower G of the tower F is in an adsorption state, and the airflow is unchanged; the H tower is in a final charging state, and the airflow is unchanged; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower B and the tower D are in third pressure equalizing, the tower D gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower B from the top of the tower B to equalize the pressure of the tower B; the tower C and the tower E are in a matched forward flushing state, the gas in the tower E enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower C, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 22, the G tower H tower is in an adsorption state, raw gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the G tower and the H tower, enters a cavity A at the top of the rotary distributor from the top of the G tower and the H tower, and is sent out of the system from a PG pipe; the tower B is in a reverse discharge state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A and the tower F are in primary pressure equalizing, the gas in the tower F enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower A from the top of the tower A to finish pressure equalizing on the tower A; the tower C and the tower E are in a matched forward flushing state, and the air flow is unchanged, so that the flushing is completed;
in the interval of the time slice 23, the G tower H tower is in an adsorption state, and the airflow is unchanged; the tower D is in a maintaining state, and the airflow is unchanged; the tower A is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower A; the tower B and the tower E are in secondary pressure equalizing, the gas in the tower E enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower B from the top of the tower B to finish pressure equalizing on the tower B; the tower C and the tower F are in a matched forward flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower C, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 24, the G tower H tower is in an adsorption state, and the airflow is unchanged; the tower A is in a final charging state, and the airflow is unchanged; the tower B is in a reverse state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower C and the tower E are in third pressure equalization, the tower E gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower D and the tower F are in a matched forward-discharging flushing state, gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters the top of the tower D after entering a P cavity through a pipeline, and is sent out of the system from a VT port after entering a P cavity at the lower part of the rotary distributor from the bottom, so that flushing is completed.
The invention has the following beneficial effects:
1. in the invention, a rotatable flow channel distributor is arranged in a shell of a rotary distributor, independent functional chambers with multiple functions are arranged in the flow channel distributor, and when the functional chambers with different functions are communicated or blocked from being communicated with corresponding adsorption towers, the corresponding adsorption towers are in adsorption, pressure drop, pressure rise, sequential discharge, reverse discharge, flushing, final charging or holding stages; the rotary distributor can replace the original rotary valve, does not need to be provided with a complex adsorption pipeline, does not have complex bridge wiring, programming and other work, and has a simpler adsorption system structure and lower production cost.
2. According to the invention, the communicating seams are set to be the reducing communicating seams, and the sizes of the reducing communicating seams are sequentially increased along the rotating direction of the flow channel distributor, so that the contact areas of the reducing seams, the upper tower opening and the lower tower opening are gradually increased from small (the minimum is 0) to large according to the rotating direction, the flow of the upper tower opening and the lower tower opening is uniformly changed, the pressure in the adsorption tower is also uniformly changed and cannot be suddenly increased or decreased, the uniformly changed airflow in the adsorption tower is weaker in scouring the bed layer, the adsorbent is less influenced, and the adsorption effect and the adsorption capacity of the adsorption tower are improved.
Drawings
FIG. 1 is a schematic view of the distribution of functional chambers in the upper portion of a flow channel distributor according to the present invention;
FIG. 2 is a schematic view of the distribution of functional chambers in the lower part of the flow channel distributor according to the present invention;
FIG. 3 is a schematic structural view of the present invention;
FIG. 4 is a diagram of the pressure swing adsorption timing sequence design of the present invention;
wherein A represents adsorption, the tower is in an adsorption stage, and a bottom feeding valve and a top discharging valve are opened;
EnD represents the nth average pressure drop, the tower is in the nth pressure drop stage, and the nth pressure drop valve at the top is opened;
EnR represents the nth pressure rise, the tower is in the nth pressure rise stage, and the pressure rise valve at the top is opened for n times;
PP represents a forward discharge stage, the tower is in the forward discharge stage, and a forward discharge valve at the top is opened;
d represents reverse discharge, the tower is in a reverse discharge stage, and a reverse discharge valve at the bottom is opened;
p represents flushing, the tower is in a flushing stage, a gas receiving valve at the top and a flushing valve at the bottom are opened;
FR stands for final charge, the column is in the final charge stage, the final charge valve at the top is opened;
and/stands for hold, all valves of the column are closed.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present invention, as presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
As shown in fig. 1-2, a rotary distributor is used in a method for purifying H2 and CO from syngas using an apparatus for purifying H2 and CO from syngas. The device comprises a plurality of adsorption towers and a rotary distributor, wherein the number of the upper tower openings and the lower tower openings of the rotary distributor is the same as that of the adsorption towers, the discharge hole of each adsorption tower is communicated with the corresponding upper tower opening, and the feed hole of each adsorption tower is communicated with the corresponding lower tower opening.
In this embodiment, the number of the adsorption towers is set to 8, and the adsorption towers are respectively an adsorption tower a, an adsorption tower B, an adsorption tower C, an adsorption tower D, an adsorption tower E, an adsorption tower F, an adsorption tower G, and an adsorption tower H.
The rotary distributor comprises a shell and a flow channel distributor;
the shell is a stator which is fixed after being installed. The upper end surface or the side surface of the upper part of the shell is provided with a tower upper opening, and the lower end surface or the side surface of the lower part of the shell is provided with a tower lower opening; the upper tower opening is communicated with a product outlet of an external adsorption tower, and the lower tower opening is communicated with a feed inlet of an external adsorption diagram. If the rotary distributor is matched with a plurality of adsorption towers for use, a plurality of tower upper openings and tower lower openings on the shell can be arranged, and the plurality of tower upper openings and the plurality of tower lower openings are uniformly distributed along the circumferential direction of the shell. The shell is provided with an FG port for feeding, a PG port for product output, a VT port for emptying (an outlet for reverse discharge and flushing), and a tower upper port and a tower lower port for communicating the adsorption tower; wherein the PG port is communicated with a product pipeline, the FG port is communicated with a raw material pipeline, and the VT port is communicated with a vent pipeline.
Namely, the number of the tower upper openings is 8, and the tower upper openings are respectively an A tower upper opening, a B tower upper opening, a C tower upper opening, a D tower upper opening, an E tower upper opening, an F tower upper opening, a G tower upper opening and an H tower upper opening; the number of the tower lower openings is also 8, and the tower lower openings are respectively a tower lower opening A, a tower lower opening B, a tower lower opening C, a tower lower opening D, a tower lower opening E, a tower lower opening F, a tower lower opening G and a tower lower opening H, as shown in figures 1 and 2. The feed inlet and the discharge outlet of the adsorption tower A are correspondingly communicated with the tower lower opening and the tower upper opening of the tower A respectively, the feed inlet and the discharge outlet of the adsorption tower B are correspondingly communicated with the tower lower opening of the tower B and the tower upper opening of the tower B respectively, the feed inlet and the discharge outlet of the adsorption tower C are correspondingly communicated with the tower lower opening of the tower C and the tower upper opening of the tower C respectively, the feed inlet and the discharge outlet of the adsorption tower D are correspondingly communicated with the tower lower opening of the tower D and the tower upper opening of the tower D respectively, the feed inlet and the discharge outlet of the adsorption tower E are correspondingly communicated with the tower lower opening of the tower E and the tower upper opening of the tower E respectively, the feed inlet and the discharge outlet of the adsorption tower F are correspondingly communicated with the tower lower opening of the tower F and the tower upper opening of the tower F respectively, the feed inlet and the discharge outlet of the adsorption tower G are correspondingly communicated with the tower lower opening of the tower G and the tower upper opening of the H respectively.
The flow channel distributor is a stator, is arranged in the shell and can rotate in the shell. The upper part and the lower part of the flow channel distributor are respectively provided with a plurality of independent functional cavities along the circumferential direction of the flow channel distributor, and the functional cavities are cavities instead of depressed areas. The number, the position, the size and the functions of the functional chambers at the upper part and the lower part of the flow channel distributor can be set according to actual requirements, and the functional chambers at the upper part and the lower part of the flow channel distributor are not directly communicated but are communicated through the adsorption tower. The runner distributor is driven to rotate by a motor (preferably a variable frequency motor). The functional cavity on the upper part of the flow channel distributor sequentially comprises an A cavity, an E1D cavity, a PP cavity, an E2D cavity, an E3D cavity, a P cavity, an E3R cavity, an E2R cavity, an E1R cavity and an FR cavity; wherein, E1D chamber and E1R chamber intercommunication, E2D chamber and E2R chamber intercommunication, E3D chamber and E3R chamber intercommunication, P chamber and PP chamber intercommunication. The functional cavity at the lower part of the flow channel distributor sequentially comprises an A cavity, a D cavity and a P cavity.
Wherein:
chamber a, representing a chamber for adsorption;
E1D chamber, representing the chamber for the 1 st pressure drop;
E2D cavity, representing the chamber for the 2 nd pressure drop;
E3D chamber, representing the chamber for the 3 rd pressure drop;
PP cavity, representing the chamber for antegrade;
p-chamber, representing a chamber for reverse discharge;
E3R cavity, representing the chamber for the 3 rd pressure rise;
E2R cavity, representing the chamber for the 2 nd pressure rise;
E1R cavity, representing the chamber for the 1 st pressure rise;
FR chamber, representing the chamber for final filling;
chamber D, representing the chamber for reverse playback.
In addition, the flow channel distributor and the shell are sealed in a surface sealing mode; the cavity A at the lower part of the runner distributor is communicated with the FG port through a cavity communicating pipe/groove, raw material gas can enter the cavity A at the lower part of the runner distributor through the FG port, and the raw material gas in the cavity A can enter the corresponding adsorption tower through a tower lower port communicated with the cavity A; the functional cavities at the upper part of the flow channel distributor are provided with communicating seams which can be communicated with the upper opening of the tower, and because the cavities A at the upper part and the lower part of the flow channel distributor are correspondingly arranged up and down, the flow channel distributor rotates, and when the communicating seams in the cavities A are communicated with the upper opening of the tower, the whole adsorption tower enters the cavity A at the upper part of the flow channel distributor through the upper opening of the tower and the communicating seams; the cavity A at the upper part of the flow channel distributor is communicated with the PG port through a cavity communicating pipe/groove, and the gas in the cavity A at the upper part of the flow channel distributor is finally discharged through the PG port and collected. When reverse releasing and flushing are needed, the VT port can be used as an outlet for reverse releasing and flushing.
The adsorption tower and the rotary distributor can be packaged after being skid-mounted to form a square or cylindrical regular unit. The adsorbent in the adsorption tower can be filled according to layer composite filling, and an integrated regular adsorption material can also be used; the adsorption tower is fixed on the base.
In this example, synthesis gas was used as feed gas and product gas was H 2 And CO, adopting flushing in a desorption mode, and adopting the recommended process as follows: 8-2-3P, namely 8 adsorption towers, and simultaneously 2 adsorption towers are in an adsorption state, and pressure equalization is carried out for 3 times; the yield is 1000-50000 Nm 3 The rotating speed of the flow channel distributor is 30-100 min/rad. Wherein the synthesis gas consists of the following raw materials in percentage by volume: h 2 33％～36％、CO 2 17% -20%, CO 43% -47%, and the balance of water and methane; preferably, the volume percent of H2 is 35%, CO 2 18% by volume of CO and 46% by volume of CO; the yield is 8000Nm 3 The rotating speed of the flow channel distributor is 50-80 min/rad.
When the device works, feed gas enters the cavity A at the lower part of the flow channel distributor through the FG port on the shell, when the cavity A at the upper part of the flow channel distributor is communicated with the upper port of the tower A corresponding to the adsorption tower A through the communication seam, the feed gas enters the adsorption tower A through the lower port of the tower A for adsorption, and H2 and CO enter the cavity A at the upper part of the flow channel distributor through the upper port of the tower A and are output through the PG port; then the flow channel distributor in the rotary distributor is rotated, along with the rotation of the flow channel distributor in the rotary distributor, different chambers on the flow channel distributor are communicated or blocked with different adsorption towers, the adsorption towers are in adsorption, pressure drop, pressure rise, sequential release, reverse release, flushing, final charge or maintenance stages, and are changed among the stages, so that all the channels in the flow channel distributor are connected with the time sequence table in the cyclic operation of adsorption and desorption of all the adsorption towers end to form a circle, and the operation cyclicity of the adsorption and desorption processes of Pressure Swing Adsorption (PSA) is completely formed, all the materials or process gases are uniformly and alternately distributed in all the channels in the flow channel distributor and all the connected adsorption tower process pipelines and adsorption towers, and the Pressure Swing Adsorption (PSA) in one cycle period is simultaneously carried out in all the steps in the adsorption and desorption processes through the rotation speed of the flow channel distributor of a controllable time slice (area) and all the connected adsorption towers respectively, and the process gas positions of the flow channel distributor in and out are continuously and repeatedly adjusted according to the technical index requirements of the product gas and the desorption gas, so that the adsorption distributor can adsorb and the CO purification steps can be realized, and the purification steps can be continuously repeated.
In the embodiment, the rotatable flow channel distributor is arranged in the shell of the rotary distributor, and the independent functional chambers with multiple functions are arranged in the flow channel distributor, so that the corresponding adsorption tower is in adsorption, pressure drop, pressure rise, sequential discharge, reverse discharge, flushing, final charging or maintaining stages when the functional chambers with different functions are communicated or blocked from being communicated with the corresponding adsorption tower; the rotary distributor can replace the original rotary valve, does not need to be provided with a complex adsorption pipeline, does not have the complex work of bridge wiring, programming and the like, and has the advantages of simpler adsorption system structure and lower production cost.
Example 2
On the basis of example 1, eight adsorption towers, namely tower a, tower B, tower C, tower D, tower E, tower F, tower G and tower H were provided, a flow channel distributor in a rotary distributor was rotated, and an adsorption process, a uniform ascending/descending process, and a uniform descending process were performed by the following steps:
in the interval of the time slice 1, the towers A and H are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the towers A and H, enters a cavity A at the top of the rotary distributor from the top of the towers A and H, and is sent out of the system from a PG pipe; the tower B and the tower G are in primary pressure equalizing, the gas in the tower G enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower B from the top of the tower B to finish pressure equalizing on the tower B; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower E is in a reverse discharge state, the top of the tower E is not communicated with the rotary distributor, the bottom of the tower E is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower F are in a matched forward flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower D, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of time slice 2, the A and H towers are kept in an adsorption state, and the airflow is unchanged; the tower B is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower B; the tower C and the tower F are in secondary pressure equalizing, the gas in the tower F enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower E is in a reverse discharge state, the top of the tower E is not communicated with the rotary distributor, the bottom of the tower E is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower D, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of time slice 3, the towers A and F are kept in an adsorption state, and the airflow is unchanged; continuing to fill the tower B; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower D and the tower F are in third pressure equalizing, the tower F gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower D from the top of the tower D to finish pressure equalizing on the tower D; the tower E and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of time slice 4, tower A and tower B are in an adsorption state, feed gas enters cavity A at the lower part of the rotary distributor from FG port, enters cavity A at the top of the rotary distributor from the top after entering the bottoms of tower A and tower B, and is sent out of the system from PG pipe; the tower C and the tower H are in primary pressure equalizing, the gas in the tower H enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower F is in a reverse discharge state, the top of the tower F is not communicated with the rotary distributor, the bottom of the tower F is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower E and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 5, the tower A and the tower B are in an adsorption state, and the airflow is unchanged; the tower C is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower C; the tower D and the tower G are in secondary pressure equalizing, the gas in the tower G enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the tower F is in a reverse discharge state, and the airflow is unchanged; the tower E and the tower H are in a matched forward flushing state, the gas in the tower H enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 6, the tower A and the tower B maintain an adsorption state, and the airflow is unchanged; the tower C is in a final charging state, and the airflow is unchanged; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower E and the tower G are in third pressure equalization, the gas of the tower G enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower E from the top of the tower E to equalize the pressure of the tower E; the tower F and the tower H are in a matched forward flushing state, gas in the tower H enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower F, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of time slice 7, tower B and tower C are in an adsorption state, feed gas enters cavity A at the lower part of the rotary distributor from FG port, enters cavity A at the top of the rotary distributor from the top of tower B and tower C after entering the bottoms of tower B and tower C, and is sent out of the system from PG pipe; e, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower G is in a reverse discharge state, the top of the tower G is not communicated with the rotary distributor, the bottom of the tower G is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower A are in primary pressure equalizing, the tower A gas enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the F tower and the H tower are in a matched forward-discharge flushing state, the airflow is unchanged, and the gas is sent out of the system through the VT port;
in the interval of the time slice 8, the tower B and the tower C are in an adsorption state, and the airflow is unchanged; the tower D is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower D; the tower G is in a reverse discharge state, and the airflow is unchanged; the H tower and the E tower are in secondary pressure equalizing, the H tower gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the E tower from the top of the E tower to finish pressure equalizing on the E tower; the tower F and the tower A are in a matched forward flushing state, the gas of the tower A enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower F, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
in the interval of the time slice 9, the tower B and the tower C are in an adsorption state, and the airflow is unchanged; the tower D is in a final charging state, and the airflow is unchanged; e, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the H tower and the F tower are in third pressure equalizing, H tower gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters from the top of the F tower to equalize the pressure of the F tower; the tower G and the tower A are in a matched forward flushing state, the gas of the tower A enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower G, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
in the interval of time slice 10, tower C and tower D are in an adsorption state, feed gas enters cavity A at the lower part of the rotary distributor from FG port, enters cavity A at the top of the rotary distributor from the top of tower C and tower D after entering the bottoms of tower C and tower D, and is sent out of the system from PG pipe; the tower F is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the H tower is in a reverse discharge state, the top of the H tower is not communicated with the rotary distributor, the bottom of the H tower is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower B and the tower E are in primary pressure equalizing, the gas in the tower B enters an upper E1D cavity of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower E from the top of the tower E to equalize the pressure of the tower E; the tower A and the tower G are in a matched sequential flushing state, and the airflow is unchanged;
in the interval of the time slice 11, the tower C and the tower D are in an adsorption state, and the airflow is unchanged; the E tower is in a final charging state, the bottom of the E tower is not communicated with the rotary distributor, the top of the E tower is communicated with the FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the E tower; the H tower is in a reverse discharge state, and the airflow is unchanged; the tower A and the tower F are in secondary pressure equalizing, the tower A gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower F from the top to finish pressure equalizing on the tower F; the tower B and the tower G are in a matched forward flushing state, the gas in the tower B enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower G, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 12, the tower C and the tower D are in an adsorption state, and the airflow is unchanged; the tower E is in a final charging state, and the airflow is unchanged; the tower F is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A and the tower G are in third pressure equalization, the gas in the tower A enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower G from the top to equalize the pressure of the tower G; the tower B and the tower H are in a matched forward flushing state, the gas in the tower B enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower H, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 13, the tower D and the tower E are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the tower D and the tower E, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the G tower is in a maintaining state, and the top and the bottom of the G tower are not communicated with the rotary distributor; the tower C and the tower F are in primary pressure equalizing, tower C gas enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower F from the top to finish pressure equalizing on the tower F; the tower B and the tower H are in a matched forward flushing state, and the air flow is unchanged, so that flushing is completed;
in the interval of the time slice 14, the tower D and the tower E are in an adsorption state, and the airflow is unchanged; the tower A is in a reverse discharge state, and the airflow is unchanged; the tower F is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower F; the tower B and the tower G are in secondary pressure equalizing, the gas in the tower B enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower G from the top to equalize the pressure of the tower G; the tower C and the tower H are in a matched forward flushing state, the gas in the tower C enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower H, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 15, the tower D and the tower E are in an adsorption state, and the airflow is unchanged; the tower F is in a final charging state, and the airflow is unchanged; the G tower is in a maintaining state, and the top and the bottom of the G tower are not communicated with the rotary distributor; the tower B and the tower H are in third pressure equalization, the gas in the tower B enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower H from the top of the tower H to equalize the pressure of the tower H; the tower A and the tower C are in a matched forward flushing state, the gas of the tower C enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower A, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 16, the tower F of the tower E is in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor after entering the bottoms of the tower D and the tower F, and is sent out of the system from a PG pipe; the H tower is in a holding state, and the top and the bottom of the H tower are not communicated with the rotary distributor; the tower B is in a reverse discharge state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower G are in primary pressure equalizing, the gas of the tower D enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower G from the top of the tower G to equalize the pressure of the tower G; the tower A and the tower C are in a matched forward flushing state, and the air flow is unchanged, so that the flushing is completed;
in the interval of the time slice 17, the E tower F tower is in an adsorption state, and the airflow is unchanged; the tower G is in a final charging state, the bottom of the tower G is not communicated with the rotary distributor, the top of the tower G is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower G; the tower is in a reverse discharge state, and the airflow is unchanged; the tower C and the tower H are in secondary pressure equalizing, the tower C gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower H from the top to finish pressure equalizing; the tower A and the tower D are in a matched forward flushing state, the gas of the tower D enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower A, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
in the interval of the time slice 18, the E tower F tower is in an adsorption state, and the air flow is unchanged; the tower G is in a final charging state, and the airflow is unchanged; the H tower is in a holding state, and the top and the bottom of the H tower are not communicated with the rotary distributor; the tower A and the tower C are in third pressure equalizing, the tower C gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower A from the top of the tower A to finish pressure equalizing on the tower A; the tower B and the tower D are in a matched forward flushing state, the gas of the tower D enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower B, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 19, the tower G of the tower F is in an adsorption state, raw gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the tower F and the tower G, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower E and the tower H are in primary pressure equalization, the gas in the tower E enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower H from the top to equalize the pressure of the tower H; the tower B and the tower D are in a matched forward flushing state, and the air flow is unchanged, so that flushing is completed;
in the interval of the time slice 20, the tower F and the tower G are in an adsorption state, and the airflow is unchanged; the tower C is in a keeping state, and the airflow is unchanged; the H tower is in a final charging state, the bottom of the H tower is not communicated with the rotary distributor, the top of the H tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the H tower; the tower A and the tower D are in secondary pressure equalizing, the gas of the tower D enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower A from the top of the tower A to finish pressure equalizing on the tower A; the tower B and the tower E are in a matched forward flushing state, the gas of the tower E enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower B, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 21, the tower G of the tower F is in an adsorption state, and the airflow is unchanged; the H tower is in a final charging state, and the airflow is unchanged; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower B and the tower D are in third pressure equalizing, the tower D gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower B from the top of the tower B to equalize the pressure of the tower B; the tower C and the tower E are in a matched forward flushing state, the gas in the tower E enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower C, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
in the interval of the time slice 22, the G tower H tower is in an adsorption state, raw gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the G tower and the H tower, enters a cavity A at the top of the rotary distributor from the top of the G tower and the H tower, and is sent out of the system from a PG pipe; the tower B is in a reverse discharge state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A and the tower F are in primary pressure equalizing, the gas in the tower F enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower A from the top of the tower A to finish pressure equalizing on the tower A; the tower C and the tower E are in a matched sequential flushing state, and the flushing is finished under the condition that the airflow is unchanged;
in the interval of the time slice 23, the G tower H tower is in an adsorption state, and the airflow is unchanged; the tower D is in a maintaining state, and the airflow is unchanged; the tower A is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower A; the tower B and the tower E are in secondary pressure equalizing, the gas in the tower E enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower B from the top of the tower B to finish pressure equalizing on the tower B; the tower C and the tower F are in a matched forward flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower C, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 24, the G tower H tower is in an adsorption state, and the airflow is unchanged; the tower A is in a final charging state, and the airflow is unchanged; the tower B is in a reverse state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower C and the tower E are in third pressure equalization, the tower E gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower D and the tower F are in a matched forward-discharging flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters the top of the tower D after entering a P cavity through a pipeline, enters the P cavity at the lower part of the rotary distributor from the bottom and is then sent out of the system from a VT port, and the flushing is completed.

Claims (9)

1. A method for purifying H2 and CO by using a rotary distributor for synthesis gas is characterized by comprising the following steps: the device comprises a plurality of adsorption towers and a rotary distributor, wherein the number of upper tower openings and lower tower openings of the rotary distributor is the same as that of the adsorption towers, a discharge hole of each adsorption tower is communicated with the corresponding upper tower opening, and a feed hole of each adsorption tower is communicated with the corresponding lower tower opening;
the rotary distributor comprises a shell and a flow channel distributor;
the shell is provided with an FG port for feeding, a PG port for product output, a VT port for emptying, and a tower upper port and a tower lower port for communicating the adsorption tower;
the runner distributor is arranged in the shell and can rotate in the shell, a plurality of independent functional cavities are respectively arranged on the upper part and the lower part of the runner distributor along the circumferential direction of the runner distributor, the functional cavities on the upper part of the runner distributor sequentially comprise an A cavity, an E1D cavity, a PP cavity, an E2D cavity, an E3D cavity, a P cavity, an E3R cavity, an E2R cavity, an E1R cavity and an FR cavity, and the functional cavities on the lower part of the runner distributor sequentially comprise an A cavity, a D cavity and a P cavity;
the cavity A and the cavity FR on the upper part of the flow channel distributor are both communicated with the PG port, the functional cavity on the upper part of the flow channel distributor is provided with a communicating seam which can be communicated with the upper tower port, the cavity A on the lower part of the flow channel distributor is communicated with the FG port, the cavity P and the cavity D are both communicated with the VT port, the cavity D on the lower part of the flow channel distributor is provided with a communicating seam which can be communicated with the lower tower port, and the flow channel distributor and the shell are sealed;
the synthesis gas is used as raw material gas, the raw material gas enters a cavity A at the lower part of the flow channel distributor through an FG port on a shell, when the cavity A at the upper part of the flow channel distributor is communicated with a tower A upper port corresponding to an adsorption tower A through a communication seam, the raw material gas enters the adsorption tower A through a tower A lower port for adsorption, and H2 and CO enter the cavity A at the upper part of the flow channel distributor through the tower A upper port and are output through a PG port; the method comprises the steps of rotating a flow channel distributor and adjusting the rotating speed of the flow channel distributor, communicating or blocking communication between different functional cavities on the flow channel distributor and different adsorption towers, connecting the functional cavities in the flow channel distributor with the adsorption towers end to end in time sequence in the cyclic operation of adsorption and desorption, and distributing feed gas in the cavities, the cavity and adsorption tower connecting pipelines and the adsorption towers so that the inner adsorption tower can repeatedly carry out adsorption and desorption steps.
2. The process of claim 1, wherein the syngas is comprised of the following raw materials by volume percent: h 2 33％～36％、CO 2 17-20 percent of carbon monoxide (CO), 43-47 percent of CO and the balance of water and methane.
3. The process for purifying H2 and CO from synthesis gas by using the rotary distributor according to claim 1, wherein eight adsorption towers are provided, namely, tower A, tower B, tower C, tower D, tower E, tower F, tower G and tower H, and two adsorption towers are in an adsorption state at the same time, and pressure equalization is carried out for 3 times; the rotating speed of the flow channel distributor is 30-100 min/rad, and the yield is 1000-50000 Nm 3 /h。
4. The process for purifying H2 and CO from synthesis gas using a rotary distributor according to claim 3, wherein the production rate is 8000Nm 3 The rotating speed of the flow channel distributor is 50-80 min/rad.
5. The method for purifying H2 and CO by using the synthesis gas through the rotary distributor according to claim 1, wherein the communication seams of the flow channel distributor are reducing communication seams, and the sizes of the reducing communication seams are sequentially increased along the rotation direction of the flow channel distributor.
6. The method for purifying H2 and CO by using the synthesis gas through the rotary distributor according to claim 1, wherein the flow channel distributor comprises an upper distributor positioned at the upper part and a lower distributor positioned at the lower part, and a cavity A, an E1D cavity, a PP cavity, an E2D cavity, an E3D cavity, a cavity P, an E3R cavity, an E2R cavity, an E1R cavity and an FR cavity are formed on the upper distributor, and a cavity A, a cavity D and a cavity P are formed on the lower distributor; the upper distributor and the lower distributor rotate independently, and the rotating speed and the rotating direction are the same.
7. A process for purifying H2 and CO from syngas using a rotating distributor as claimed in claim 1, wherein:
in the upper part of the flow channel distributor, a cavity P and a cavity E3R are arranged opposite to the cavity A, a solid area is arranged between the cavity E3D and the cavity P, and solid areas are arranged between the cavity E3R and the cavity E2R and between the cavity E2R and the cavity E1R;
in the lower part of the flow channel distributor, a cavity D and a cavity P are arranged opposite to a cavity A, and solid areas are arranged between the cavity A and the cavity D and between the cavity P and the cavity A.
8. The method for purifying H2 and CO from synthesis gas by using the rotary distributor according to claim 1, wherein the rotation speed of the flow channel distributor is adjusted according to the working conditions of the raw material gas and the technical indexes of the product gas and the desorption gas.
9. A process for purifying H2 and CO from syngas using a rotating distributor as claimed in claim 1, wherein: the adsorption towers are provided with eight towers, namely a tower A, a tower B, a tower C, a tower D, a tower E, a tower F, a tower G and a tower H, a runner distributor in the rotary distributor is rotated, and an adsorption process and an equal lifting/equal lifting process are carried out through the following steps:
in the interval of the time slice 1, the towers A and H are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the towers A and H, enters a cavity A at the top of the rotary distributor from the top of the towers A and H, and is sent out of the system from a PG pipe; the tower B and the tower G are in primary pressure equalizing, the gas in the tower G enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower B from the top of the tower B to equalize the pressure of the tower B; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower E is in a reverse discharge state, the top of the tower E is not communicated with the rotary distributor, the bottom of the tower E is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower F are in a matched forward flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower D, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of time slice 2, the A and H towers are kept in an adsorption state, and the airflow is unchanged; the tower B is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower B; the tower C and the tower F are in secondary pressure equalizing, the gas in the tower F enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower E is in a reverse discharge state, the top of the tower E is not communicated with the rotary distributor, the bottom of the tower E is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower D, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of time slice 3, the towers A and F are kept in an adsorption state, and the airflow is unchanged; the tower B continues to be filled finally; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower D and the tower F are in third pressure equalization, the gas in the tower F enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the tower E and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of time slice 4, tower A and tower B are in an adsorption state, feed gas enters cavity A at the lower part of the rotary distributor from FG port, enters cavity A at the top of the rotary distributor from the top after entering the bottoms of tower A and tower B, and is sent out of the system from PG pipe; the tower C and the tower H are in primary pressure equalizing, the gas in the tower H enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower F is in a reverse discharge state, the top of the tower F is not communicated with the rotary distributor, the bottom of the tower F is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower E and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 5, the tower A and the tower B are in an adsorption state, and the airflow is unchanged; the tower C is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower C; the tower D and the tower G are in secondary pressure equalizing, the gas in the tower G enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the tower F is in a reverse discharge state, and the airflow is unchanged; the tower E and the tower H are in a matched forward flushing state, gas in the tower H enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of time slice 6, tower A and tower B maintain the adsorption state and the airflow is unchanged; the tower C is in a final charging state, and the airflow is unchanged; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower E and the tower G are in third pressure equalization, the gas of the tower G enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower E from the top of the tower E to equalize the pressure of the tower E; the tower F and the tower H are in a matched forward flushing state, gas in the tower H enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower F, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 7, the tower B and the tower C are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the tower B and the tower C, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; e, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower G is in a reverse discharge state, the top of the tower G is not communicated with the rotary distributor, the bottom of the tower G is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower A are in primary pressure equalizing, the tower A gas enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the F tower and the H tower are in a matched forward-discharge flushing state, the airflow is unchanged, and the gas is sent out of the system through the VT port;
in the interval of the time slice 8, the tower B and the tower C are in an adsorption state, and the airflow is unchanged; the tower D is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower D; the tower G is in a reverse discharge state, and the airflow is unchanged; the H tower and the E tower are in secondary pressure equalizing, the H tower gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters from the top of the E tower to equalize the pressure of the E tower; the tower F and the tower A are in a matched forward flushing state, the gas in the tower A enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower F, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of time slice 9, tower B and tower C are in an adsorption state, and the airflow is unchanged; the tower D is in a final charging state, and the airflow is unchanged; e, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the H tower and the F tower are in third pressure equalizing, H tower gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters from the top of the F tower to equalize the pressure of the F tower; the tower G and the tower A are in a matched forward flushing state, the gas of the tower A enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower G, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
in the interval of the time slice 10, the tower D of the tower C is in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the tower C and the tower D, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; the tower F is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the H tower is in a reverse discharge state, the top of the H tower is not communicated with the rotary distributor, the bottom of the H tower is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower B and the tower E are in primary pressure equalizing, the gas in the tower B enters an upper E1D cavity of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower E from the top of the tower E to equalize the pressure of the tower E; the tower A and the tower G are in a matched sequential flushing state, and the airflow is unchanged;
in the interval of the time slice 11, the tower C and the tower D are in an adsorption state, and the airflow is unchanged; the E tower is in a final charging state, the bottom of the E tower is not communicated with the rotary distributor, the top of the E tower is communicated with the FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the E tower; the H tower is in a reverse discharge state, and the airflow is unchanged; the tower A and the tower F are in secondary pressure equalizing, the gas in the tower A enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower F from the top to finish pressure equalizing on the tower F; the tower B and the tower G are in a matched forward flushing state, the gas in the tower B enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower G, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 12, the tower C and the tower D are in an adsorption state, and the airflow is unchanged; the tower E is in a final charging state, and the airflow is unchanged; the tower F is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A and the tower G are in third pressure equalization, the gas in the tower A enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower G from the top to equalize the pressure of the tower G; the tower B and the tower H are in a matched forward flushing state, the gas in the tower B enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower H, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 13, the tower D and the tower E are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the tower D and the tower E, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; g, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower C and the tower F are in primary pressure equalizing, the tower C gas enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower F from the top to finish pressure equalizing on the tower F; the tower B and the tower H are in a matched sequential flushing state, and the flushing is finished under the condition that the airflow is unchanged;
in the interval of the time slice 14, the tower D and the tower E are in an adsorption state, and the airflow is unchanged; the tower A is in a reverse discharge state, and the airflow is unchanged; the tower F is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower F; the tower B and the tower G are in secondary pressure equalizing, the gas in the tower B enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower G from the top to equalize the pressure of the tower G; the tower C and the tower H are in a matched forward flushing state, the gas in the tower C enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower H, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 15, the tower D and the tower E are in an adsorption state, and the airflow is unchanged; the tower F is in a final charging state, and the airflow is unchanged; g, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower B and the tower H are in third pressure equalizing, the gas in the tower B enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower H from the top of the tower H to equalize the pressure of the tower H; the tower A and the tower C are in a matched forward flushing state, the gas of the tower C enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower A, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 16, the tower F of the tower E is in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor after entering the bottoms of the tower D and the tower F, and is sent out of the system from a PG pipe; the H tower is in a holding state, and the top and the bottom of the H tower are not communicated with the rotary distributor; the tower B is in a reverse discharge state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower G are in primary pressure equalizing, the gas in the tower D enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower G from the top to equalize the pressure of the tower G; the tower A and the tower C are in a matched forward flushing state, and the air flow is unchanged, so that flushing is completed;
in the interval of the time slice 17, the E tower F tower is in an adsorption state, and the airflow is unchanged; the tower G is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower G; the tower is in a reverse discharge state, and the airflow is unchanged; the tower C and the tower H are in secondary pressure equalizing, tower C gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower H from the top to finish pressure equalizing on the tower H; the tower A and the tower D are in a matched forward flushing state, the gas of the tower D enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower A, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
in the interval of the time slice 18, the E tower F tower is in an adsorption state, and the air flow is unchanged; the tower G is in a final charging state, and the airflow is unchanged; the H tower is in a holding state, and the top and the bottom of the H tower are not communicated with the rotary distributor; the tower A and the tower C are in third pressure equalizing, the tower C gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower A from the top of the tower A to finish pressure equalizing on the tower A; the tower B and the tower D are in a matched forward flushing state, the gas of the tower D enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower B, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 19, the tower G of the tower F is in an adsorption state, raw gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the tower F and the tower G, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower E and the tower H are in primary pressure equalization, the gas in the tower E enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower H from the top to equalize the pressure of the tower H; the tower B and the tower D are in a matched forward flushing state, and the air flow is unchanged, so that flushing is completed;
in the interval of the time slice 20, the tower F and the tower G are in an adsorption state, and the airflow is unchanged; the tower C is in a keeping state, and the airflow is unchanged; the H tower is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the H tower; the tower A and the tower D are in secondary pressure equalizing, the gas of the tower D enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower A from the top of the tower A to finish pressure equalizing on the tower A; the tower B and the tower E are in a matched forward flushing state, the gas of the tower E enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower B, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 21, the tower G of the tower F is in an adsorption state, and the airflow is unchanged; the H tower is in a final charging state, and the airflow is unchanged; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower B and the tower D are in third pressure equalizing, the gas in the tower D enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower B from the top of the tower B to finish pressure equalizing on the tower B; the tower C and the tower E are in a matched forward flushing state, the gas in the tower E enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower C, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 22, the G tower H tower is in an adsorption state, raw gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottoms of the G tower and the H tower, enters a cavity A at the top of the rotary distributor from the top of the G tower and the H tower, and is sent out of the system from a PG pipe; the tower B is in a reverse discharge state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A and the tower F are in primary pressure equalizing, the gas in the tower F enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower A from the top of the tower A to finish pressure equalizing on the tower A; the tower C and the tower E are in a matched forward flushing state, and the air flow is unchanged, so that the flushing is completed;
in the interval of the time slice 23, the G tower and the H tower are in an adsorption state, and the airflow is unchanged; the tower D is in a maintaining state, and the airflow is unchanged; the tower A is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower A; the tower B and the tower E are in secondary pressure equalizing, the gas in the tower E enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower B from the top of the tower B to finish pressure equalizing on the tower B; the tower C and the tower F are in a matched forward flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower C, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 24, the G tower H tower is in an adsorption state, and the airflow is unchanged; the tower A is in a final charging state, and the airflow is unchanged; the tower B is in a reverse state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower C and the tower E are in third pressure equalization, the tower E gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower D and the tower F are in a matched forward-discharging flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters the top of the tower D after entering a P cavity through a pipeline, enters the P cavity at the lower part of the rotary distributor from the bottom and is then sent out of the system from a VT port, and the flushing is completed.
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CN205084584U (en) * 2015-10-26 2016-03-16 四川天一科技股份有限公司 Pressure swing adsorption unit that tandem was washed
CN106763910A (en) * 2017-01-22 2017-05-31 成都赛普瑞兴科技有限公司 A kind of whirligig and gas fractionation unit
CN107213750A (en) * 2017-07-10 2017-09-29 成都赛普瑞兴科技有限公司 A kind of H2Purification system and gas handling system
CN210978624U (en) * 2019-11-27 2020-07-10 山东津挚环保科技有限公司 Rotary valve device of twelve-tower pressure swing adsorption system

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1250321C (en) * 2004-06-11 2006-04-12 成都天立化工科技有限公司 Two-stage recovering pressure swing adsorption gas separating method

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Publication number Priority date Publication date Assignee Title
CN205084584U (en) * 2015-10-26 2016-03-16 四川天一科技股份有限公司 Pressure swing adsorption unit that tandem was washed
CN106763910A (en) * 2017-01-22 2017-05-31 成都赛普瑞兴科技有限公司 A kind of whirligig and gas fractionation unit
CN107213750A (en) * 2017-07-10 2017-09-29 成都赛普瑞兴科技有限公司 A kind of H2Purification system and gas handling system
CN210978624U (en) * 2019-11-27 2020-07-10 山东津挚环保科技有限公司 Rotary valve device of twelve-tower pressure swing adsorption system

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