[go: up one dir, main page]

CN114748971A - Method for purifying H2 and CO from synthesis gas by using rotary distributor - Google Patents

Method for purifying H2 and CO from synthesis gas by using rotary distributor Download PDF

Info

Publication number
CN114748971A
CN114748971A CN202210256742.5A CN202210256742A CN114748971A CN 114748971 A CN114748971 A CN 114748971A CN 202210256742 A CN202210256742 A CN 202210256742A CN 114748971 A CN114748971 A CN 114748971A
Authority
CN
China
Prior art keywords
tower
cavity
enters
rotary distributor
distributor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202210256742.5A
Other languages
Chinese (zh)
Other versions
CN114748971B (en
Inventor
钟雨明
陈运
汪兰海
詹家聪
陈勇
蔡跃明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sichuan Techairs Co ltd
Original Assignee
Sichuan Techairs Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sichuan Techairs Co ltd filed Critical Sichuan Techairs Co ltd
Priority to CN202210256742.5A priority Critical patent/CN114748971B/en
Publication of CN114748971A publication Critical patent/CN114748971A/en
Application granted granted Critical
Publication of CN114748971B publication Critical patent/CN114748971B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0407—Constructional details of adsorbing systems
    • B01D53/0446—Means for feeding or distributing gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0454—Controlling adsorption
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/047—Pressure swing adsorption
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/508—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by selective and reversible uptake by an appropriate medium, i.e. the uptake being based on physical or chemical sorption phenomena or on reversible chemical reactions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/40—Carbon monoxide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/16—Hydrogen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/20—Carbon monoxide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/40—Further details for adsorption processes and devices
    • B01D2259/406—Further details for adsorption processes and devices using more than four beds
    • B01D2259/4065—Further details for adsorption processes and devices using more than four beds using eight beds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Combustion & Propulsion (AREA)
  • Separation Of Gases By Adsorption (AREA)

Abstract

The invention discloses a method for purifying H2 and CO from synthesis gas by using a rotary distributor, belongs to the technical field of hydrogen production by using hydrogen-containing converted gas, and aims to solve the problem of complex system structure caused by the fact that a pipeline is required in each step of pressure swing adsorption and cannot be shared in the prior art. The rotary distributor is creatively used in the application, the rotatable flow channel distributor is arranged in the shell of the rotary distributor, independent functional chambers with multiple functions are arranged in the flow channel distributor, and when the functional chambers with different functions are communicated or blocked from being communicated with the corresponding adsorption towers, the corresponding adsorption towers are in adsorption, pressure drop, pressure rise, sequential discharge, reverse discharge, flushing, final charging or maintaining stages and are switched among the stages; the rotary distributor can replace the original rotary valve, does not need to be provided with a complex adsorption pipeline, does not have complex bridge wiring, programming and other work, and has a simpler adsorption system structure and lower production cost.

Description

Method for purifying H2 and CO from synthesis gas by using rotary distributor
Technical Field
The invention belongs to the technical field of hydrogen production, relates to a method for producing hydrogen by using hydrogen-containing reformed gas, and more particularly relates to a method for producing hydrogen by using a rotary distributor for hydrogen-containing reformed gas.
Background
In the process, an Axial Fixed Bed (AFB) is generally used for pressure swing adsorption, namely, a columnar adsorption tower with the height-diameter ratio of more than 1.5 is adopted to fill an adsorbent and is vertically installed, and gas passes through an adsorption bed layer in the vertical direction (axial direction).
The AFBPSA process has the advantages of simple equipment, convenience in installation, easiness in filling of the adsorbent and the like.
But at the same time, the following disadvantages exist:
1. because the valve is adopted to control the gas flow direction, a plurality of program control valves are needed to form a special valve area, so that the occupied area is large and complicated program control is needed;
2. limited by the size of the adsorption tower, if a large production volume is required, more adsorption towers need to be added, resulting in a linear increase in the number of valves;
3. with the increase of the yield requirement, a large adsorption tower and a plurality of pipelines face a large amount of loss of dead space gas in the desorption process, and the yield is reduced.
For the above deficiencies of AFBPSA, numerous solutions also appear in the prior art:
the invention patent application with the application number of CN202110084790.6 discloses a pressure swing adsorption process based on a multi-channel rotary valve, which comprises an adsorption mechanism, a driving mechanism, a buffer mechanism and a control device: the adsorption mechanism is filled with adsorption filler and is provided with a plurality of groups for adsorbing the product gas; the driving mechanism is arranged in the center of the plurality of groups of adsorption mechanisms and is respectively communicated with the upper end and the lower end of each adsorption mechanism so as to enable the adsorption tower to sequentially complete an adsorption process, an uniform lifting/uniform lowering process and an analysis process; the buffer mechanism is used for respectively storing the product gas, the finished product gas and the analysis gas; the control device comprises a programmable logic controller which is electrically connected with a frequency converter; the driving mechanism comprises an upper valve, a lower valve and a driving motor for controlling the communication or the blocking of the corresponding chambers of the upper valve and the lower valve. In the process, the communication or the blocking communication among the adsorption towers can be realized through the rotary valve, and each adsorption tower is correspondingly positioned in each stage of adsorption, pressure equalizing drop, pressure equalizing rise, sequential discharge, reverse discharge, flushing and the like by adjusting the communication relation among a plurality of adsorption towers.
In addition, the utility model patent of application number CN201821779052.3 discloses a nine-tower pressure swing adsorption system's programmable valve device, it includes upper valve and lower valve, upper valve includes valve body and last case, the lower valve includes lower valve body and lower valve core, upper valve core and lower valve core are connected through the pivot, the pivot is passed the lower valve core and is connected with the motor, last nine last interfaces have been seted up on the valve body, nine lower interfaces have been seted up on the lower valve body, it is connected with the top of the tower of adsorption tower respectively through the pipeline to go up the interface, the lower interface is connected with the tower bottom of adsorption tower through the pipeline respectively, upper valve core part does not is equipped with the product gas passageway, the passageway all falls in one, the passageway all falls in two, the passageway all falls in three, finally step up passageway and upper valve sweep the passageway against the current, lower valve inside is equipped with the raw materials air inlet respectively, the adsorption channel, the lower valve sweeps the passageway against the current and takes out the vacuum passageway.
The utility model discloses a utility model patent that application number is CN201922100881.5 discloses a twelve-tower pressure swing adsorption system's rotary valve device, it includes upper valve and lower valve, the upper valve includes valve body and upper valve core, the upper valve core part is equipped with the product gas passageway respectively, an equal lift/drop passageway, two equal lift/drop passageways, three equal lift/drop passageways, four equal lift/drop passageways, the passageway that finally steps up, put in the same direction/wash a passageway, put in the same direction/wash two passageways, put in the same direction/wash three passageways, product gas sweeps the passageway, the lower valve core is inside to be equipped with raw materials air inlet respectively, the absorption passageway, wash analytic gas one discharge passageway, wash analytic gas two discharge passageways, wash analytic gas three discharge passageways, put in the opposite direction passageway, product gas sweeps discharge passageway and analytic gas discharge total passageway.
The above patent applications all propose to use the rotary valve to replace the prior numerous program control and regulating valves and to use a large number of pipelines in a matching way, thereby effectively reducing the cost and space of production and manufacturing. However, there are significant drawbacks in that the rotary valves rotate in a manner similar to jumping rather than uniform rotation, and need to rotate to a certain angle to achieve pipeline communication for performing the corresponding pressure swing adsorption step, resulting in the following disadvantages:
firstly, the function of the traditional PSA regulating valve is not provided, the pressure rises and drops suddenly, the air flow scours the bed layer obviously, and the adsorbent is greatly influenced;
secondly, pipelines cannot be shared, each step of pressure swing adsorption needs one pipeline, the whole system is complex in structure, and production cost is high.
Disclosure of Invention
The invention aims to: in order to solve the problems of complex system structure and high production cost caused by the fact that a pipeline is required in each step of pressure swing adsorption and cannot be shared in the prior art, a method for purifying H2 and CO by using a rotary distributor for synthesis gas is provided.
The invention specifically adopts the following technical scheme for realizing the purpose:
a method for purifying H2 and CO from synthesis gas by using a rotary distributor comprises a plurality of adsorption towers and a rotary distributor, wherein the number of the upper tower openings and the lower tower openings of the rotary distributor is the same as that of the adsorption towers, the discharge opening of each adsorption tower is communicated with the corresponding upper tower opening, and the feed opening of each adsorption tower is communicated with the corresponding lower tower opening;
The rotary distributor comprises a shell and a flow channel distributor;
the shell is provided with an FG port for feeding, a PG port for product output, a VT port for emptying, and a tower upper port and a tower lower port for communicating the adsorption tower;
the runner distributor is arranged in the shell and can rotate in the shell, a plurality of independent function chambers are respectively arranged at the upper part and the lower part of the runner distributor along the circumferential direction of the runner distributor, the function chambers at the upper part of the runner distributor sequentially comprise an A chamber, an E1D chamber, a PP chamber, an E2D chamber, an E3D chamber, a P chamber, an E3R chamber, an E2R chamber, an E1R chamber and an FR chamber, and the function chambers at the lower part of the runner distributor sequentially comprise an A chamber, a D chamber and a P chamber;
the cavity A and the cavity FR on the upper part of the flow channel distributor are both communicated with the PG port, the functional cavity on the upper part of the flow channel distributor is provided with a communicating seam which can be communicated with the upper tower port, the cavity A on the lower part of the flow channel distributor is communicated with the FG port, the cavity P and the cavity D are both communicated with the VT port, the cavity D on the lower part of the flow channel distributor is provided with a communicating seam which can be communicated with the lower tower port, and the flow channel distributor and the shell are sealed;
the synthesis gas is used as raw material gas, the raw material gas enters a cavity A at the lower part of the flow channel distributor through an FG port on a shell, when the cavity A at the upper part of the flow channel distributor is communicated with a tower A upper port corresponding to an adsorption tower A through a communication seam, the raw material gas enters the adsorption tower A through a tower A lower port for adsorption, and H2 and CO enter the cavity A at the upper part of the flow channel distributor through the tower A upper port and are output through a PG port; the method comprises the steps of rotating a flow channel distributor and adjusting the rotating speed of the flow channel distributor, communicating or blocking communication between different functional cavities on the flow channel distributor and different adsorption towers, connecting the functional cavities in the flow channel distributor with the adsorption towers end to end in time sequence in the cyclic operation of adsorption and desorption, and distributing feed gas in the cavities, the cavity and adsorption tower connecting pipelines and the adsorption towers so that the inner adsorption tower can repeatedly carry out adsorption and desorption steps.
Preferably, the synthesis gas consists of the following raw materials in volume percent: h2 33％～36％、CO 217% -20%, CO 43% -47%, and the balance of water and methane.
Preferably, eight adsorption towers are arranged, namely a tower A, a tower B, a tower C, a tower D, a tower E, a tower F, a tower G and a tower H, and two adsorption towers are in an adsorption state in the middle and are subjected to pressure equalization for 3 times; the rotating speed of the flow channel distributor is 30-100 min/rad, and the yield is 1000-50000 Nm3/h。
Preferably, the yield is 8000Nm3The rotating speed of the flow channel distributor is 50-80 min/rad.
Preferably, the communication seams of the flow channel distributor are variable diameter communication seams, and the sizes of the variable diameter communication seams are sequentially increased along the rotation direction of the flow channel distributor.
Preferably, the flow channel distributor comprises an upper distributor positioned at the upper part and a lower distributor positioned at the lower part, wherein a cavity A, an E1D cavity, a PP cavity, an E2D cavity, an E3D cavity, a P cavity, an E3R cavity, an E2R cavity, an E1R cavity and an FR cavity are arranged on the upper distributor, and the A cavity, the D cavity and the P cavity are arranged on the lower distributor; the upper distributor and the lower distributor rotate independently, and the rotating speed and the rotating direction are the same.
Preferably, in the upper part of the flow-channel distributor, the P cavity and the E3R cavity are arranged opposite to the A cavity, a solid area is arranged between the E3D cavity and the P cavity, and solid areas are arranged between the E3R cavity and the E2R cavity and between the E2R cavity and the E1R cavity;
In the lower part of the flow channel distributor, a cavity D and a cavity P are arranged opposite to a cavity A, and solid areas are arranged between the cavity A and the cavity D and between the cavity P and the cavity A.
Preferably, the rotating speed of the flow channel distributor is adjusted according to the technical indexes of the working condition of the raw material gas and the product gas and the desorption gas.
Preferably, the adsorption tower is provided with eight towers, i.e., tower a, tower B, tower C, tower D, tower E, tower F, tower G and tower H, the flow channel distributor in the rotary distributor is rotated, and the adsorption process, the equalization up/equalization down process are performed by the steps of:
in the interval of time slice 1, the A, H tower is in an adsorption state, raw gas enters the cavity A at the lower part of the rotary distributor from an FG port, enters the cavity A at the top part of the rotary distributor from the top part of the tower A, H after entering the cavity A at the bottom part of the rotary distributor, and is sent out of the system from a PG pipe; the tower B and the tower G are in primary pressure equalizing, the gas in the tower G enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower B from the top of the tower B to equalize the pressure of the tower B; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower E is in a reverse discharge state, the top of the tower E is not communicated with the rotary distributor, the bottom of the tower E is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower F are in a matched forward flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower D, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
In the interval of time slice 2, A, H tower keeps adsorption state and the airflow is unchanged; the tower B is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower B; the tower C and the tower F are in secondary pressure equalization, the gas in the tower F enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower E is in a reverse discharge state, the top of the tower E is not communicated with the rotary distributor, the bottom of the tower E is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower D, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of time slice 3, A, F tower keeps the adsorption state and the airflow is unchanged; continuing to fill the tower B; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower D and the tower F are in third pressure equalization, the gas in the tower F enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the tower E and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
In the interval of time slice 4, tower A and tower B are in an adsorption state, feed gas enters cavity A at the lower part of the rotary distributor from FG port, enters A, B tower bottom, enters cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from PG pipe; the tower C and the tower H are in primary pressure equalizing, the gas in the tower H enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower F is in a reverse discharge state, the top of the tower F is not communicated with the rotary distributor, the bottom of the tower F is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower E and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of the time slice 5, the tower A and the tower B are in an adsorption state, and the airflow is unchanged; the tower C is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower C; the tower D and the tower G are in secondary pressure equalizing, the gas in the tower G enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the tower F is in a reverse discharge state, and the airflow is unchanged; the tower E and the tower H are in a matched forward flushing state, the gas in the tower H enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
In the interval of time slice 6, tower A and tower B maintain the adsorption state and the airflow is unchanged; the tower C is in a final charging state, and the airflow is unchanged; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower E and the tower G are in three-time pressure equalization, the gas in the tower G enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower E from the top of the tower E to equalize the pressure of the tower E; the tower F and the tower H are in a matched forward flushing state, the gas in the tower H enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower F, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of time slice 7, tower B and tower C are in an adsorption state, feed gas enters cavity A at the lower part of the rotary distributor from FG port, enters B, C tower bottom, enters cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from PG pipe; e, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower G is in a reverse state, the top of the tower G is not communicated with the rotary distributor, the bottom of the tower G is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower A are in primary pressure equalization, the tower A gas enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the tower F and the tower H are in a matched forward flushing state, the airflow is unchanged, and the gas is sent out of the system through a VT port;
In the interval of the time slice 8, the tower B and the tower C are in an adsorption state, and the airflow is unchanged; the tower D is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with the FR cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower D; the tower G is in a reverse discharge state, and the airflow is unchanged; the H tower and the E tower are in secondary pressure equalizing, the gas in the H tower enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the E tower from the top of the E tower to equalize the pressure of the E tower; the tower F and the tower A are in a matched forward flushing state, the gas in the tower A enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower F, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of time slice 9, tower B and tower C are in an adsorption state, and the airflow is unchanged; the tower D is in a final charging state, and the airflow is unchanged; e, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the H tower and the F tower are in three-time pressure equalization, the H tower gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the F tower from the top of the F tower to finish pressure equalization; the tower G and the tower A are in a matched forward flushing state, the gas of the tower A enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower G, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
In the interval of the time slice 10, the tower C and the tower D are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottom of C, D towers, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor and is sent out of the system from a PG pipe; the tower F is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the H tower is in a reverse discharge state, the top of the H tower is not communicated with the rotary distributor, the bottom of the H tower is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower B and the tower E are in primary pressure equalization, the gas in the tower B enters an upper E1D cavity of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower E from the top of the tower E to equalize the pressure of the tower E; the tower A and the tower G are in a matched forward flushing state, and the airflow is unchanged;
in the interval of the time slice 11, the tower C and the tower D are in an adsorption state, and the airflow is unchanged; the E tower is in a final charging state, the bottom of the E tower is not communicated with the rotary distributor, the top of the E tower is communicated with the FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the E tower; the H tower is in a reverse discharge state, and the airflow is unchanged; the tower A and the tower F are in secondary pressure equalizing, the tower A gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower F from the top of the tower F to equalize the pressure of the tower F; the tower B and the tower G are in a matched forward flushing state, the gas in the tower B enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower G, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
In the interval of the time slice 12, the tower C and the tower D are in an adsorption state, and the airflow is unchanged; the tower E is in a final charging state, and the airflow is unchanged; the tower F is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A and the tower G are in three-time pressure equalization, the tower A gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower G from the top of the tower G to equalize the pressure of the tower G; the tower B and the tower H are in a matched forward flushing state, the gas in the tower B enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower H, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of time slice 13, tower D and tower E are in an adsorption state, feed gas enters cavity A at the lower part of the rotary distributor from FG port, enters D, E tower bottom, enters cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from PG pipe; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; g, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower C and the tower F are in primary pressure equalizing, tower C gas enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower F from the top of the tower F to equalize the pressure of the tower F; the tower B and the tower H are in a matched forward flushing state, and the air flow is unchanged, so that flushing is completed;
In the interval of the time slice 14, the D tower E tower is in an adsorption state, and the air flow is unchanged; the tower A is in a reverse discharge state, and the airflow is unchanged; the tower F is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower F; the tower B and the tower G are in secondary pressure equalizing, the gas in the tower B enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower G from the top of the tower G to equalize the pressure of the tower G; the tower C and the tower H are in a matched forward flushing state, the gas in the tower C enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower H, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 15, the tower D and the tower E are in an adsorption state, and the airflow is unchanged; the tower F is in a final charging state, and the airflow is unchanged; g, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower B and the tower H are in three-time pressure equalization, the gas in the tower B enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower H from the top of the tower H to equalize the pressure of the tower H; the tower A and the tower C are in a matched forward flushing state, the gas of the tower C enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower A, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port to complete flushing;
In the interval of the time slice 16, the E tower F tower is in an adsorption state, feed gas enters the cavity A at the lower part of the rotary distributor from an FG port, enters the cavity A at the top of the rotary distributor from the top of the rotary distributor after entering the bottom of D, F tower, and is sent out of the system from a PG pipe; the H tower is in a holding state, and the top and the bottom of the H tower are not communicated with the rotary distributor; the tower B is in a reverse state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower G are in primary pressure equalizing, the gas of the tower D enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower G from the top of the tower G to equalize the pressure of the tower G; the tower A and the tower C are in a matched forward flushing state, and the air flow is unchanged, so that the flushing is completed;
in the interval of the time slice 17, the E tower F tower is in an adsorption state, and the airflow is unchanged; the tower G is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower G; the tower is in a reverse discharge state, and the airflow is unchanged; the tower C and the tower H are in secondary pressure equalization, the tower C gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower H from the top to equalize the pressure of the tower H; the tower A and the tower D are in a matched forward flushing state, the gas of the tower D enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower A, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
In the interval of the time slice 18, the E tower F tower is in an adsorption state, and the air flow is unchanged; the tower G is in a final charging state, and the airflow is unchanged; the H tower is in a holding state, and the top and the bottom of the H tower are not communicated with the rotary distributor; tower A and tower C are in three-time pressure equalization, tower C gas enters an upper E3D cavity of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower A from the top of the tower A to equalize the pressure of the tower A; the tower B and the tower D are in a matched forward flushing state, the gas of the tower D enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower B, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 19, the tower G of the tower F is in an adsorption state, raw gas enters the cavity A at the lower part of the rotary distributor from an FG port, enters the cavity A at the top of the rotary distributor from the top after entering the bottom of F, G towers, and is sent out of the system from a PG pipe; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower E and the tower H are in primary pressure equalization, the gas of the tower E enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters from the top of the tower H to equalize the pressure of the tower H; the tower B and the tower D are in a matched forward flushing state, and the air flow is unchanged, so that flushing is completed;
In the interval of the time slice 20, the tower F and the tower G are in an adsorption state, and the airflow is unchanged; the tower C is in a maintaining state, and the airflow is unchanged; the H tower is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the H tower; the tower A and the tower D are in secondary pressure equalizing, the gas of the tower D enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower A from the top of the tower A to equalize the pressure of the tower A; the tower B and the tower E are in a matched forward flushing state, the gas of the tower E enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower B, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 21, the tower F and the tower G are in an adsorption state, and the airflow is unchanged; the H tower is in a final charging state, and the airflow is unchanged; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower B and the tower D are in third pressure equalization, the gas of the tower D enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower B from the top of the tower B to equalize the pressure of the tower B; the tower C and the tower E are in a matched forward flushing state, the gas in the tower E enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower C, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
In the interval of the time slice 22, the G tower and the H tower are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottom of G, H towers, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor and is sent out of the system from a PG pipe; the tower B is in a reverse state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A and the tower F are in primary pressure equalizing, the gas in the tower F enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower A from the top of the tower A to equalize the pressure of the tower A; the tower C and the tower E are in a matched forward flushing state, and the air flow is unchanged, so that the flushing is completed;
in the interval of the time slice 23, the G tower and the H tower are in an adsorption state, and the airflow is unchanged; the tower D is in a maintaining state, and the airflow is unchanged; the tower A is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower A; the tower B and the tower E are in secondary pressure equalization, the gas in the tower E enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower B from the top of the tower B to equalize the pressure of the tower B; the tower C and the tower F are in a matched forward flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower C, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
In the interval of the time slice 24, the G tower and the H tower are in an adsorption state, and the airflow is unchanged; the tower A is in a final charging state, and the airflow is unchanged; the tower B is in a reverse state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower C and the tower E are in three-time pressure equalization, the tower E gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower D and the tower F are in a matched forward-discharging flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters the top of the tower D after entering a P cavity through a pipeline, enters the P cavity at the lower part of the rotary distributor from the bottom and is then sent out of the system from a VT port, and the flushing is completed.
The invention has the following beneficial effects:
1. in the invention, a rotatable flow channel distributor is arranged in a shell of a rotary distributor, independent functional chambers with multiple functions are arranged in the flow channel distributor, and when the functional chambers with different functions are communicated or blocked from being communicated with corresponding adsorption towers, the corresponding adsorption towers are in adsorption, pressure drop, pressure rise, sequential discharge, reverse discharge, flushing, final charge or holding stages; the rotary distributor can replace the original rotary valve, does not need to be provided with a complex adsorption pipeline, does not have the complex work of bridge wiring, programming and the like, and has the advantages of simpler adsorption system structure and lower production cost.
2. According to the invention, the communicating seams are set to be the reducing communicating seams, and the sizes of the reducing communicating seams are sequentially increased along the rotating direction of the flow channel distributor, so that the contact areas of the reducing seams, the upper tower opening and the lower tower opening are gradually increased from small (the minimum is 0) to large according to the rotating direction, the flow of the upper tower opening and the lower tower opening is uniformly changed, the pressure in the adsorption tower is also uniformly changed and cannot be suddenly increased or decreased, the uniformly changed airflow in the adsorption tower is weaker in scouring the bed layer, the adsorbent is less influenced, and the adsorption effect and the adsorption capacity of the adsorption tower are improved.
Drawings
FIG. 1 is a schematic view of the distribution of functional chambers in the upper part of a flow channel distributor according to the present invention;
FIG. 2 is a schematic view of the distribution of functional chambers in the lower part of the flow channel distributor according to the present invention;
FIG. 3 is a schematic structural view of the present invention;
FIG. 4 is a diagram of the pressure swing adsorption timing sequence design of the present invention;
wherein, A represents adsorption, the tower is in an adsorption stage, and a bottom feeding valve and a top discharging valve are opened;
EnD represents the nth average pressure drop, the tower is in the nth pressure drop stage, and the top nth pressure drop valve is opened;
EnR represents the nth pressure equalization, the tower is in the nth pressure equalization stage, and the pressure increase valve at the top is opened for n times;
PP represents a forward discharge stage, the tower is in the forward discharge stage, and a forward discharge valve at the top is opened;
d represents reverse discharge, the tower is in a reverse discharge stage, and a reverse discharge valve at the bottom is opened;
p represents flushing, the tower is in a flushing stage, a gas receiving valve at the top and a flushing valve at the bottom are opened;
FR represents final filling, the tower is in a final filling stage, and a final filling valve at the top is opened;
and/stands for hold, all valves of the column are closed.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
As shown in fig. 1-2, a rotary distributor is used in a syngas purification process for H2 and CO using a device for syngas purification of H2 and CO. The device comprises a plurality of adsorption towers and a rotary distributor, wherein the number of the upper tower openings and the lower tower openings of the rotary distributor is the same as that of the adsorption towers, the discharge hole of each adsorption tower is communicated with the corresponding upper tower opening, and the feed hole of each adsorption tower is communicated with the corresponding lower tower opening.
In this embodiment, the number of the adsorption towers is set to 8, and the adsorption towers are respectively an adsorption tower a, an adsorption tower B, an adsorption tower C, an adsorption tower D, an adsorption tower E, an adsorption tower F, an adsorption tower G, and an adsorption tower H.
The rotary distributor comprises a shell and a flow channel distributor;
the shell is a stator which is fixed after being installed. The upper end surface or the side surface of the upper part of the shell is provided with a tower upper opening, and the lower end surface or the side surface of the lower part of the shell is provided with a tower lower opening; the upper tower opening is communicated with a product outlet of an external adsorption tower, and the lower tower opening is communicated with a feed inlet of an external adsorption diagram. If the rotary distributor is matched with a plurality of adsorption towers for use, a plurality of tower upper openings and tower lower openings on the shell can be arranged, and the plurality of tower upper openings and the plurality of tower lower openings are uniformly distributed along the circumferential direction of the shell. The shell is provided with an FG port for feeding, a PG port for product output, a VT port for emptying (an outlet for reverse discharge and flushing), and a tower upper port and a tower lower port for communicating the adsorption tower; wherein the PG port is communicated with a product pipeline, the FG port is communicated with a raw material pipeline, and the VT port is communicated with a vent pipeline.
Namely, the number of the tower upper openings is 8, and the tower upper openings are respectively an A tower upper opening, a B tower upper opening, a C tower upper opening, a D tower upper opening, an E tower upper opening, an F tower upper opening, a G tower upper opening and an H tower upper opening; the number of the tower lower openings is also 8, and the tower lower openings are respectively a tower lower opening A, a tower lower opening B, a tower lower opening C, a tower lower opening D, a tower lower opening E, a tower lower opening F, a tower lower opening G and a tower lower opening H, as shown in figures 1 and 2. The feed inlet and the discharge outlet of the adsorption tower A are correspondingly communicated with the tower lower opening and the tower upper opening of the tower A respectively, the feed inlet and the discharge outlet of the adsorption tower B are correspondingly communicated with the tower lower opening of the tower B and the tower upper opening of the tower B respectively, the feed inlet and the discharge outlet of the adsorption tower C are correspondingly communicated with the tower lower opening of the tower C and the tower upper opening of the tower C respectively, the feed inlet and the discharge outlet of the adsorption tower D are correspondingly communicated with the tower lower opening of the tower D and the tower upper opening of the tower D respectively, the feed inlet and the discharge outlet of the adsorption tower E are correspondingly communicated with the tower lower opening of the tower E and the tower upper opening of the tower E respectively, the feed inlet and the discharge outlet of the adsorption tower F are correspondingly communicated with the tower lower opening of the tower F and the tower upper opening of the tower F respectively, the feed inlet and the discharge outlet of the adsorption tower G are correspondingly communicated with the tower lower opening of the tower G and the tower upper opening of the H respectively.
The flow channel distributor is a stator, is arranged in the shell and can rotate in the shell. The upper part and the lower part of the flow channel distributor are respectively provided with a plurality of independent functional cavities along the circumferential direction of the flow channel distributor, and the functional cavities are cavities instead of depressed areas. The number, the position, the size and the functions of the functional chambers at the upper part and the lower part of the flow channel distributor can be set according to actual requirements, and the functional chambers at the upper part and the lower part of the flow channel distributor are not directly communicated but are communicated through the adsorption tower. The runner distributor is driven to rotate by a motor (preferably a variable frequency motor). The functional cavity on the upper part of the flow channel distributor sequentially comprises a cavity A, a cavity E1D, a cavity PP, a cavity E2D, a cavity E3D, a cavity P, a cavity E3R, a cavity E2R, a cavity E1R and a cavity FR; the cavity E1D is communicated with the cavity E1R, the cavity E2D is communicated with the cavity E2R, the cavity E3D is communicated with the cavity E3R, and the cavity P is communicated with the cavity PP. The functional cavity at the lower part of the flow channel distributor sequentially comprises an A cavity, a D cavity and a P cavity.
Wherein:
chamber a, representing a chamber for adsorption;
E1D chamber, representing the chamber for the 1 st pressure drop;
E2D chamber, representing the chamber for the 2 nd pressure drop;
E3D chamber, representing the chamber for the 3 rd pressure drop;
PP cavity, representing the chamber for antegrade;
p-chamber, representing a chamber for reverse discharge;
E3R chamber, representing the chamber for the 3 rd pressure rise;
E2R chamber, representing the chamber for the 2 nd pressure rise;
E1R chamber, representing the chamber for the 1 st pressure rise;
FR chamber, representing the chamber for final filling;
chamber D, representing the chamber for reverse playback.
In addition, the flow channel distributor and the shell are sealed in a surface sealing mode; the cavity A at the lower part of the runner distributor is communicated with the FG port through a cavity communicating pipe/groove, raw material gas can enter the cavity A at the lower part of the runner distributor through the FG port, and the raw material gas in the cavity A can enter the corresponding adsorption tower through a tower lower port communicated with the cavity A; the functional cavities at the upper part of the flow channel distributor are provided with communicating seams which can be communicated with the upper opening of the tower, and because the cavities A at the upper part and the lower part of the flow channel distributor are correspondingly arranged up and down, the flow channel distributor rotates, and when the communicating seams in the cavities A are communicated with the upper opening of the tower, the whole adsorption tower enters the cavity A at the upper part of the flow channel distributor through the upper opening of the tower and the communicating seams; the cavity A at the upper part of the flow channel distributor is communicated with the PG port through a cavity communicating pipe/groove, and the gas in the cavity A at the upper part of the flow channel distributor is finally discharged through the PG port and collected. When reverse releasing and flushing are needed, the VT port can be used as an outlet for reverse releasing and flushing.
The adsorption tower and the rotary distributor can be packaged after being skid-mounted to form a regular unit in a square or cylindrical shape. The adsorbent in the adsorption tower can be filled according to layer composite filling, and an integrated regular adsorption material can also be used; the adsorption tower is fixed on the base.
In this example, synthesis gas was used as feed gas and product gas was H2And CO, adopting flushing in a desorption mode, and adopting the recommended process as follows: 8-2-3P, i.e. 8 adsorption towers with 2 towers in the middleCarrying out pressure equalization for 3 times in an adsorption state; the yield is 1000-50000 Nm3The rotating speed of the flow channel distributor is 30-100 min/rad. Wherein the synthesis gas consists of the following raw materials in percentage by volume: h2 33％～36％、CO 217% -20%, CO 43% -47%, and the balance of water and methane; preferably, the H2 volume percent is 35%, CO 218% by volume of CO and 46% by volume of CO; the yield is 8000Nm3The rotating speed of the flow channel distributor is 50-80 min/rad.
When the device works, raw gas enters the cavity A at the lower part of the flow channel distributor through the FG port on the shell, when the cavity A at the upper part of the flow channel distributor is communicated with the upper port of the tower A corresponding to the adsorption tower A through the communication seam, the raw gas enters the adsorption tower A through the lower port of the tower A for adsorption, and H2 and CO enter the cavity A at the upper part of the flow channel distributor through the upper port of the tower A and are output through the PG port; then the flow channel distributor in the rotary distributor is rotated, along with the rotation of the flow channel distributor in the rotary distributor, different chambers on the flow channel distributor are communicated or blocked with different adsorption towers, the adsorption towers are in adsorption, pressure drop, pressure rise, sequential release, reverse release, flushing, final charging or maintaining stages, and are switched among the stages, so that all the channels in the air flow distributor are connected with the time sequence table in the cyclic operation of adsorption and desorption of each adsorption tower end to form a circle, and the operation cyclicity of the adsorption and desorption processes of Pressure Swing Adsorption (PSA) is completely formed, all the materials or process gases are uniformly and alternately distributed in each channel in the air flow distributor and each connected adsorption tower process pipeline and adsorption tower, and the Pressure Swing Adsorption (PSA) of one cycle period is simultaneously carried out on each adsorption tower and each connected corresponding adsorption tower through the rotation speed of the air flow distributor of a controllable time slice (region) And step (2) adjusting the rotation speed of the gas flow distributor to continuously change the positions of the process gases entering and exiting the adsorption towers according to different raw material gas working conditions and technical index requirements including product gas and desorption gas, so that each adsorption tower repeats the adsorption and desorption steps, and finally purification (realized during adsorption) of H2 and CO is realized.
In the embodiment, the rotatable flow channel distributor is arranged in the shell of the rotary distributor, the independent functional chambers with multiple functions are arranged in the flow channel distributor, and when the functional chambers with different functions are communicated or blocked from being communicated with the corresponding adsorption towers, the corresponding adsorption towers are in adsorption, pressure drop, pressure rise, sequential discharge, reverse discharge, flushing, final charge or holding stages; the rotary distributor can replace the original rotary valve, does not need to be provided with a complex adsorption pipeline, does not have the complex work of bridge wiring, programming and the like, and has the advantages of simpler adsorption system structure and lower production cost.
Example 2
On the basis of example 1, eight adsorption towers, namely tower a, tower B, tower C, tower D, tower E, tower F, tower G and tower H were provided, a flow channel distributor in a rotary distributor was rotated, and an adsorption process, a uniform ascending/descending process, and a uniform descending process were performed by the following steps:
in the interval of time slice 1, A, H tower is in adsorption state, raw gas enters into cavity A at lower part of rotary distributor from FG port, enters into cavity A at top of rotary distributor from top of A, H tower bottom, and is sent out from PG pipe; the tower B and the tower G are in primary pressure equalization, the gas in the tower G enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower B from the top of the tower B to equalize the pressure of the tower B; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower E is in a reverse discharge state, the top of the tower E is not communicated with the rotary distributor, the bottom of the tower E is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower F are in a matched forward flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower D, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
In the interval of time slice 2, A, H tower keeps adsorption state and the airflow is unchanged; the tower B is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower B; the tower C and the tower F are in secondary pressure equalizing, the gas in the tower F enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower E is in a reverse discharge state, the top of the tower E is not communicated with the rotary distributor, the bottom of the tower E is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower D, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
in the interval of time slice 3, A, F tower keeps adsorption state and the airflow is unchanged; the tower B continues to be filled finally; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower D and the tower F are in third pressure equalization, the tower F gas enters an upper E3D cavity of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the tower E and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
In the interval of time slice 4, tower A and tower B are in an adsorption state, feed gas enters cavity A at the lower part of the rotary distributor from FG port, enters A, B tower bottom, enters cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from PG pipe; the tower C and the tower H are in primary pressure equalizing, the gas in the tower H enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower F is in a reverse discharge state, the top of the tower F is not communicated with the rotary distributor, the bottom of the tower F is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower E and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 5, the tower A and the tower B are in an adsorption state, and the airflow is unchanged; the tower C is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower C; the tower D and the tower G are in secondary pressure equalization, the gas in the tower G enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the tower F is in a reverse discharge state, and the airflow is unchanged; the tower E and the tower H are in a matched forward flushing state, the gas in the tower H enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
In the interval of the time slice 6, the tower A and the tower B maintain an adsorption state, and the airflow is unchanged; the tower C is in a final charging state, and the airflow is unchanged; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower E and the tower G are in third pressure equalization, the gas in the tower G enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower E from the top of the tower E to equalize the pressure of the tower E; the tower F and the tower H are in a matched forward flushing state, gas in the tower H enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower F, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 7, the tower B and the tower C are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottom of B, C towers, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; the tower E is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower G is in a reverse discharge state, the top of the tower G is not communicated with the rotary distributor, the bottom of the tower G is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower A are in primary pressure equalization, the tower A gas enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the F tower and the H tower are in a matched forward-discharge flushing state, the airflow is unchanged, and the gas is sent out of the system through the VT port;
In the interval of the time slice 8, the tower B and the tower C are in an adsorption state, and the airflow is unchanged; the tower D is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with the FR cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower D; the tower G is in a reverse discharge state, and the airflow is unchanged; the H tower and the E tower are in secondary pressure equalizing, the H tower gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the E tower from the top of the E tower to finish pressure equalizing on the E tower; the tower F and the tower A are in a matched forward flushing state, the gas of the tower A enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower F, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
in the interval of the time slice 9, the tower B and the tower C are in an adsorption state, and the airflow is unchanged; the tower D is in a final charging state, and the airflow is unchanged; the tower E is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the H tower and the F tower are in three-time pressure equalization, the H tower gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the F tower from the top of the F tower to finish pressure equalization; the tower G and the tower A are in a matched forward flushing state, the gas of the tower A enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower G, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
In the interval of the time slice 10, the tower C and the tower D are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottom of C, D towers, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor and is sent out of the system from a PG pipe; the tower F is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the H tower is in a reverse discharge state, the top of the H tower is not communicated with the rotary distributor, the bottom of the H tower is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower B and the tower E are in primary pressure equalization, the gas in the tower B enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower E from the top of the tower E to equalize the pressure of the tower E; the tower A and the tower G are in a matched forward flushing state, and the airflow is unchanged;
in the interval of the time slice 11, the tower C and the tower D are in an adsorption state, and the airflow is unchanged; the tower E is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower E; the H tower is in a reverse discharge state, and the airflow is unchanged; the tower A and the tower F are in secondary pressure equalizing, the gas in the tower A enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower F from the top of the tower F to equalize the pressure of the tower F; the tower B and the tower G are in a matched forward flushing state, the gas in the tower B enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower G, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
In the interval of the time slice 12, the tower C and the tower D are in an adsorption state, and the airflow is unchanged; the tower E is in a final charging state, and the airflow is unchanged; the tower F is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A and the tower G are in three-time pressure equalization, the gas in the tower A enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower G from the top of the tower G to equalize the pressure of the tower G; the tower B and the tower H are in a matched forward flushing state, the gas in the tower B enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower H, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 13, the tower D and the tower E are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottom of D, E towers, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the G tower is in a maintaining state, and the top and the bottom of the G tower are not communicated with the rotary distributor; the tower C and the tower F are in primary pressure equalizing, the tower C gas enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower F from the top to equalize the pressure of the tower F; the tower B and the tower H are in a matched sequential flushing state, and the flushing is finished under the condition that the airflow is unchanged;
In the interval of the time slice 14, the D tower E tower is in an adsorption state, and the air flow is unchanged; the tower A is in a reverse discharge state, and the airflow is unchanged; the tower F is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower F; the tower B and the tower G are in secondary pressure equalizing, the gas in the tower B enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower G from the top of the tower G to equalize the pressure of the tower G; the tower C and the tower H are in a matched forward flushing state, the gas in the tower C enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower H, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 15, the tower D and the tower E are in an adsorption state, and the airflow is unchanged; the tower F is in a final charging state, and the airflow is unchanged; the G tower is in a maintaining state, and the top and the bottom of the G tower are not communicated with the rotary distributor; the tower B and the tower H are in three-time pressure equalization, the gas in the tower B enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower H from the top of the tower H to equalize the pressure of the tower H; the tower A and the tower C are in a matched forward flushing state, the gas of the tower C enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower A, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port to complete flushing;
In the interval of the time slice 16, the E tower F tower is in an adsorption state, feed gas enters the cavity A at the lower part of the rotary distributor from an FG port, enters the cavity A at the top of the rotary distributor from the top of the rotary distributor after entering the bottom of D, F tower, and is sent out of the system from a PG pipe; the H tower is in a holding state, and the top and the bottom of the H tower are not communicated with the rotary distributor; the tower B is in a reverse state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower G are in primary pressure equalizing, the gas of the tower D enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower G from the top of the tower G to equalize the pressure of the tower G; the tower A and the tower C are in a matched forward flushing state, and the air flow is unchanged, so that the flushing is completed;
in the interval of the time slice 17, the E tower F tower is in an adsorption state, and the airflow is unchanged; the tower G is in a final charging state, the bottom of the tower G is not communicated with the rotary distributor, the top of the tower G is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower G; the tower is in a reverse discharge state, and the airflow is unchanged; the tower C and the tower H are in secondary pressure equalizing, tower C gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower H from the top to equalize the pressure of the tower H; the tower A and the tower D are in a matched forward flushing state, the gas of the tower D enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower A, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
In the interval of the time slice 18, the E tower F tower is in an adsorption state, and the air flow is unchanged; the tower G is in a final charging state, and the airflow is unchanged; the H tower is in a holding state, and the top and the bottom of the H tower are not communicated with the rotary distributor; tower A and tower C are in three-time pressure equalization, tower C gas enters an upper E3D cavity of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower A from the top of the tower A to equalize the pressure of the tower A; the tower B and the tower D are in a matched forward flushing state, the gas of the tower D enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower B, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 19, the tower G of the tower F is in an adsorption state, raw gas enters the cavity A at the lower part of the rotary distributor from an FG port, enters the cavity A at the top of the rotary distributor from the top of the tower F, G after entering the bottom of the tower, and is sent out of the system from a PG pipe; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower E and the tower H are in primary pressure equalization, the gas of the tower E enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters from the top of the tower H to equalize the pressure of the tower H; the tower B and the tower D are in a matched forward flushing state, and the air flow is unchanged, so that flushing is completed;
In the interval of the time slice 20, the tower F and the tower G are in an adsorption state, and the airflow is unchanged; the tower C is in a maintaining state, and the airflow is unchanged; the H tower is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the H tower; the tower A and the tower D are in secondary pressure equalizing, the gas of the tower D enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower A from the top of the tower A to equalize the pressure of the tower A; the tower B and the tower E are in a matched forward flushing state, the gas of the tower E enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower B, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 21, the tower F and the tower G are in an adsorption state, and the airflow is unchanged; the H tower is in a final charging state, and the airflow is unchanged; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower B and the tower D are in three-time pressure equalization, the gas of the tower D enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower B from the top of the tower B to equalize the pressure of the tower B; the tower C and the tower E are in a matched forward flushing state, the gas in the tower E enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower C, enters a P cavity at the lower part of the rotary distributor from the bottom, and is discharged out of the system from a VT port to complete flushing;
In the interval of the time slice 22, the G tower and the H tower are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottom of G, H towers, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor and is sent out of the system from a PG pipe; the tower B is in a reverse state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A and the tower F are in primary pressure equalization, the gas in the tower F enters an upper E1D cavity of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower A from the top of the tower A to equalize the pressure of the tower A; the tower C and the tower E are in a matched sequential flushing state, and the flushing is finished under the condition that the airflow is unchanged;
in the interval of the time slice 23, the G tower H tower is in an adsorption state, and the airflow is unchanged; the tower D is in a maintaining state, and the airflow is unchanged; the tower A is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower A; the tower B and the tower E are in secondary pressure equalization, the gas in the tower E enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower B from the top of the tower B to equalize the pressure of the tower B; the tower C and the tower F are in a matched forward flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower C, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
In the interval of the time slice 24, the G tower and the H tower are in an adsorption state, and the airflow is unchanged; the tower A is in a final charging state, and the airflow is unchanged; the tower B is in a reverse state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower C and the tower E are in third pressure equalization, the tower E gas enters an upper E3D cavity of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower D and the tower F are in a matched forward-discharging flushing state, gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters the top of the tower D after entering a P cavity through a pipeline, and is sent out of the system from a VT port after entering a P cavity at the lower part of the rotary distributor from the bottom, so that flushing is completed.

Claims (9)

1. A method for purifying H2 and CO by using a rotary distributor for synthesis gas is characterized in that: the device comprises a plurality of adsorption towers and a rotary distributor, wherein the number of upper tower openings and lower tower openings of the rotary distributor is the same as that of the adsorption towers, a discharge hole of each adsorption tower is communicated with the corresponding upper tower opening, and a feed hole of each adsorption tower is communicated with the corresponding lower tower opening;
the rotary distributor comprises a shell and a flow channel distributor;
the shell is provided with an FG port for feeding, a PG port for product output, a VT port for emptying, and a tower upper port and a tower lower port for communicating the adsorption tower;
The runner distributor is arranged in the shell and can rotate in the shell, a plurality of independent functional cavities are respectively formed in the upper part and the lower part of the runner distributor along the circumferential direction of the runner distributor, the functional cavities on the upper part of the runner distributor sequentially comprise an A cavity, an E1D cavity, a PP cavity, an E2D cavity, an E3D cavity, a P cavity, an E3R cavity, an E2R cavity, an E1R cavity and an FR cavity, and the functional cavities on the lower part of the runner distributor sequentially comprise an A cavity, a D cavity and a P cavity;
the cavity A and the cavity FR on the upper part of the flow channel distributor are both communicated with the PG port, the functional cavity on the upper part of the flow channel distributor is provided with a communicating seam which can be communicated with the upper tower port, the cavity A on the lower part of the flow channel distributor is communicated with the FG port, the cavity P and the cavity D are both communicated with the VT port, the cavity D on the lower part of the flow channel distributor is provided with a communicating seam which can be communicated with the lower tower port, and the flow channel distributor and the shell are sealed;
the synthesis gas is used as raw material gas, the raw material gas enters a cavity A at the lower part of the flow channel distributor through an FG port on a shell, when the cavity A at the upper part of the flow channel distributor is communicated with an upper opening of a tower A corresponding to an adsorption tower A through a communication seam, the raw material gas enters the adsorption tower A through a lower opening of the tower A for adsorption, and H2 and CO enter the cavity A at the upper part of the flow channel distributor through an upper opening of the tower A and are output through a PG port; the method comprises the steps of rotating the flow channel distributor and adjusting the rotating speed of the flow channel distributor, communicating or blocking and communicating different functional chambers on the flow channel distributor with different adsorption towers, connecting the functional chambers in the flow channel distributor with the adsorption towers end to end in a time sequence in the cyclic operation of adsorption and desorption, and distributing feed gas in the chambers, connecting pipelines of the chambers and the adsorption towers so that the inner adsorption towers can repeatedly perform adsorption and desorption steps.
2. The process of claim 1, wherein the syngas is comprised of the following materials by volume percent: h2 33％～36％、CO217% -20%, CO 43% -47%, and the balance of water and methane.
3. The method for purifying H2 and CO by using the synthesis gas through the rotary distributor is characterized in that eight adsorption towers are arranged, namely an A tower, a B tower, a C tower, a D tower, an E tower, an F tower, a G tower and an H tower, and two adsorption towers are in an adsorption state at the same time, and pressure equalization is carried out for 3 times; the rotating speed of the flow channel distributor is 30-100 min/rad, and the yield is 1000-50000 Nm3/h。
4. A process for the purification of H2 and CO from synthesis gas using a rotating distributor according to claim 3, wherein the throughput is 8000Nm3The rotating speed of the flow channel distributor is 50-80 min/rad.
5. The method for purifying H2 and CO by using the rotary distributor as claimed in claim 1, wherein the communicating seams of the flow channel distributor are variable diameter communicating seams, and the sizes of the variable diameter communicating seams are increased along the rotation direction of the flow channel distributor.
6. The method for purifying H2 and CO by using the rotary distributor as claimed in claim 1, wherein the flow-path distributor comprises an upper distributor at the upper part and a lower distributor at the lower part, and a cavity A, a cavity E1D, a cavity PP, a cavity E2D, a cavity E3D, a cavity P, a cavity E3R, a cavity E2R, a cavity E1R and a cavity FR are arranged on the upper distributor, and a cavity A, a cavity D and a cavity P are arranged on the lower distributor; the upper distributor and the lower distributor rotate independently, and the rotating speed and the rotating direction are the same.
7. A process of purifying H2 and CO for syngas according to claim 1, wherein:
in the upper part of the flow channel distributor, a P cavity and an E3R cavity are arranged opposite to the A cavity, a solid area is arranged between the E3D cavity and the P cavity, and solid areas are arranged between the E3R cavity and the E2R cavity and between the E2R cavity and the E1R cavity;
in the lower part of the flow channel distributor, a cavity D and a cavity P are arranged opposite to a cavity A, and solid areas are arranged between the cavity A and the cavity D and between the cavity P and the cavity A.
8. The method for purifying H2 and CO by using the rotary distributor as claimed in claim 1, wherein the rotation speed of the flow channel distributor is adjusted according to the working conditions of the raw material gas and the technical indexes of the product gas and the desorption gas.
9. A process of purifying H2 and CO for syngas according to claim 1, wherein: the adsorption tower is provided with eight towers, namely a tower A, a tower B, a tower C, a tower D, a tower E, a tower F, a tower G and a tower H, the runner distributor in the rotary distributor is rotated, and an adsorption process and an equal lifting/equal lifting process are carried out through the following steps:
in the interval of time slice 1, A, H tower is in adsorption state, raw gas enters into cavity A at lower part of rotary distributor from FG port, enters into cavity A at top of rotary distributor from top of A, H tower bottom, and is sent out from PG pipe; the tower B and the tower G are in primary pressure equalization, the gas in the tower G enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower B from the top of the tower B to equalize the pressure of the tower B; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower E is in a reverse discharge state, the top of the tower E is not communicated with the rotary distributor, the bottom of the tower E is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower F are in a matched forward flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower D, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
In the interval of time slice 2, A, H tower keeps adsorption state and the airflow is unchanged; the tower B is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR (flame front) cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower B; the tower C and the tower F are in secondary pressure equalization, the gas in the tower F enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower E is in a reverse discharge state, the top of the tower E is not communicated with the rotary distributor, the bottom of the tower E is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower D, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of time slice 3, A, F tower keeps adsorption state and the airflow is unchanged; the tower B continues to be filled finally; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower D and the tower F are in third pressure equalization, the gas in the tower F enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the tower E and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
In the interval of time slice 4, tower A and tower B are in an adsorption state, feed gas enters cavity A at the lower part of the rotary distributor from an FG port, enters A, B tower bottom, enters cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; the tower C and the tower H are in primary pressure equalization, the gas in the tower H enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower F is in a reverse discharge state, the top of the tower F is not communicated with the rotary distributor, the bottom of the tower F is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower E and the tower G are in a matched forward flushing state, gas in the tower G enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 5, the tower A and the tower B are in an adsorption state, and the airflow is unchanged; the tower C is in a final charging state, the bottom of the tower is not communicated with the rotating distributor, the top of the tower is communicated with an FR cavity of the rotating distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower C; the tower D and the tower G are in secondary pressure equalization, the gas in the tower G enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the tower F is in a reverse discharge state, and the airflow is unchanged; the tower E and the tower H are in a matched forward flushing state, gas in the tower H enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower E, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
In the interval of time slice 6, tower A and tower B maintain the adsorption state and the airflow is unchanged; the tower C is in a final charging state, and the airflow is unchanged; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower E and the tower G are in third pressure equalization, the gas in the tower G enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower E from the top of the tower E to equalize the pressure of the tower E; the tower F and the tower H are in a matched forward flushing state, gas in the tower H enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower F, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 7, the tower B and the tower C are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottom of B, C towers, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; e, the tower is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower G is in a reverse discharge state, the top of the tower G is not communicated with the rotary distributor, the bottom of the tower G is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower A are in primary pressure equalization, the tower A gas enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower D from the top of the tower D to equalize the pressure of the tower D; the F tower and the H tower are in a matched forward-discharge flushing state, the airflow is unchanged, and the gas is sent out of the system through the VT port;
In the interval of the time slice 8, the tower B and the tower C are in an adsorption state, and the airflow is unchanged; the tower D is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower D; the tower G is in a reverse discharge state, and the airflow is unchanged; the H tower and the E tower are in secondary pressure equalizing, the H tower gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the E tower from the top of the E tower to finish pressure equalizing on the E tower; the tower F and the tower A are in a matched forward flushing state, the gas of the tower A enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower F, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
in the interval of the time slice 9, the tower B and the tower C are in an adsorption state, and the airflow is unchanged; the tower D is in a final charging state, and the airflow is unchanged; the tower E is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the H tower and the F tower are in three-time pressure equalization, the H tower gas enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the F tower from the top of the F tower to finish pressure equalization; the tower G and the tower A are in a matched forward flushing state, the gas of the tower A enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower G, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
In the interval of the time slice 10, the tower C and the tower D are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottom of C, D towers, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; the tower F is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the H tower is in a reverse discharge state, the top of the H tower is not communicated with the rotary distributor, the bottom of the H tower is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower B and the tower E are in primary pressure equalization, the gas in the tower B enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower E from the top of the tower E to equalize the pressure of the tower E; the tower A and the tower G are in a matched sequential flushing state, and the airflow is unchanged;
in the interval of the time slice 11, the tower C and the tower D are in an adsorption state, and the airflow is unchanged; the tower E is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower E; the H tower is in a reverse discharge state, and the airflow is unchanged; the tower A and the tower F are in secondary pressure equalizing, the gas in the tower A enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower F from the top of the tower F to equalize the pressure of the tower F; the tower B and the tower G are in a matched forward flushing state, the gas in the tower B enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower G, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
In the interval of the time slice 12, the tower C and the tower D are in an adsorption state, and the airflow is unchanged; the tower E is in a final charging state, and the airflow is unchanged; the tower F is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A and the tower G are in three-time pressure equalization, the gas in the tower A enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower G from the top of the tower G to equalize the pressure of the tower G; the tower B and the tower H are in a matched forward flushing state, the gas in the tower B enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower H, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 13, the tower D and the tower E are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottom of D, E towers, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor, and is sent out of the system from a PG pipe; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the G tower is in a maintaining state, and the top and the bottom of the G tower are not communicated with the rotary distributor; the tower C and the tower F are in primary pressure equalizing, tower C gas enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower F from the top of the tower F to equalize the pressure of the tower F; the tower B and the tower H are in a matched sequential flushing state, and the flushing is finished under the condition that the airflow is unchanged;
In the interval of the time slice 14, the D tower E tower is in an adsorption state, and the air flow is unchanged; the tower A is in a reverse discharge state, and the airflow is unchanged; the tower F is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower F; the tower B and the tower G are in secondary pressure equalizing, the gas in the tower B enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower G from the top of the tower G to equalize the pressure of the tower G; the tower C and the tower H are in a matched forward flushing state, the gas in the tower C enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower H, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 15, the tower D and the tower E are in an adsorption state, and the airflow is unchanged; the tower F is in a final charging state, and the airflow is unchanged; the G tower is in a maintaining state, and the top and the bottom of the G tower are not communicated with the rotary distributor; the tower B and the tower H are in three-time pressure equalization, the gas in the tower B enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower H from the top of the tower H to equalize the pressure of the tower H; the tower A and the tower C are in a matched forward flushing state, the gas of the tower C enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower A, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port to complete flushing;
In the interval of the time slice 16, the E tower F tower is in an adsorption state, feed gas enters the cavity A at the lower part of the rotary distributor from an FG port, enters the cavity A at the top of the rotary distributor from the top of the rotary distributor after entering the bottom of D, F tower, and is sent out of the system from a PG pipe; the H tower is in a holding state, and the top and the bottom of the H tower are not communicated with the rotary distributor; the tower B is in a reverse state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D and the tower G are in primary pressure equalization, the gas of the tower D enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower G from the top of the tower G to equalize the pressure of the tower G; the tower A and the tower C are in a matched forward flushing state, and the air flow is unchanged, so that the flushing is completed;
in the interval of the time slice 17, the E tower F tower is in an adsorption state, and the airflow is unchanged; the tower G is in a final charging state, the bottom of the tower G is not communicated with the rotary distributor, the top of the tower G is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower G; the tower is in a reverse discharge state, and the airflow is unchanged; the tower C and the tower H are in secondary pressure equalization, the tower C gas enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower H from the top to equalize the pressure of the tower H; the tower A and the tower D are in a matched forward flushing state, the gas of the tower D enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower A, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
In the interval of the time slice 18, the E tower F tower is in an adsorption state, and the air flow is unchanged; the tower G is in a final charging state, and the airflow is unchanged; the H tower is in a holding state, and the top and the bottom of the H tower are not communicated with the rotary distributor; tower A and tower C are in three-time pressure equalization, tower C gas enters an upper E3D cavity of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower A from the top of the tower A to equalize the pressure of the tower A; the tower B and the tower D are in a matched forward flushing state, the gas of the tower D enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower B, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
in the interval of the time slice 19, the tower G of the tower F is in an adsorption state, raw gas enters the cavity A at the lower part of the rotary distributor from an FG port, enters the cavity A at the top of the rotary distributor from the top after entering the bottom of F, G towers, and is sent out of the system from a PG pipe; the tower C is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower E and the tower H are in primary pressure equalization, the gas in the tower E enters an E1D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower H from the top of the tower H to equalize the pressure of the tower H; the tower B and the tower D are in a matched forward flushing state, and the air flow is unchanged, so that flushing is completed;
In the interval of the time slice 20, the tower F and the tower G are in an adsorption state, and the airflow is unchanged; the tower C is in a maintaining state, and the airflow is unchanged; the H tower is in a final charging state, the bottom of the H tower is not communicated with the rotary distributor, the top of the H tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the H tower; the tower A and the tower D are in secondary pressure equalization, the gas of the tower D enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower A from the top of the tower A to equalize the pressure of the tower A; the tower B and the tower E are in a matched forward flushing state, the gas of the tower E enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower B, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port to complete flushing;
in the interval of the time slice 21, the tower F and the tower G are in an adsorption state, and the airflow is unchanged; the H tower is in a final charging state, and the airflow is unchanged; the tower A is in a reverse discharge state, the top of the tower A is not communicated with the rotary distributor, the bottom of the tower A is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower B and the tower D are in third pressure equalization, the gas of the tower D enters an E3D cavity at the upper part of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower B from the top of the tower B to equalize the pressure of the tower B; the tower C and the tower E are in a matched forward flushing state, the gas in the tower E enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower C, enters a P cavity at the lower part of the rotary distributor from the bottom and is sent out of the system from a VT port, and flushing is finished;
In the interval of the time slice 22, the G tower and the H tower are in an adsorption state, feed gas enters a cavity A at the lower part of the rotary distributor from an FG port, enters the bottom of G, H towers, enters a cavity A at the top of the rotary distributor from the top of the rotary distributor and is sent out of the system from a PG pipe; the tower B is in a reverse state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower D is in a maintaining state, and the top and the bottom of the tower are not communicated with the rotary distributor; the tower A and the tower F are in primary pressure equalization, the gas in the tower F enters an upper E1D cavity of the rotary distributor from the top, enters an E1R cavity through a pipeline, and enters the tower A from the top of the tower A to equalize the pressure of the tower A; the tower C and the tower E are in a matched forward flushing state, and the air flow is unchanged, so that the flushing is completed;
in the interval of the time slice 23, the G tower H tower is in an adsorption state, and the airflow is unchanged; the tower D is in a maintaining state, and the airflow is unchanged; the tower A is in a final charging state, the bottom of the tower is not communicated with the rotary distributor, the top of the tower is communicated with an FR cavity of the rotary distributor, and the FR cavity obtains gas from the cavity A through a pipeline to charge the tower A; the tower B and the tower E are in secondary pressure equalization, the gas in the tower E enters an E2D cavity at the upper part of the rotary distributor from the top, enters an E2R cavity through a pipeline, and enters the tower B from the top of the tower B to equalize the pressure of the tower B; the tower C and the tower F are in a matched forward flushing state, the gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters a P cavity through a pipeline, enters the top of the tower C, enters a P cavity at the lower part of the rotary distributor from the bottom, and is sent out of the system from a VT port to complete flushing;
In the interval of the time slice 24, the G tower and the H tower are in an adsorption state, and the airflow is unchanged; the tower A is in a final charging state, and the airflow is unchanged; the tower B is in a reverse discharge state, the top of the tower B is not communicated with the rotary distributor, the bottom of the tower B is communicated with a cavity D at the lower part of the rotary distributor, and gas is sent out of the system through a VT port; the tower C and the tower E are in third pressure equalization, the tower E gas enters an upper E3D cavity of the rotary distributor from the top, enters an E3R cavity through a pipeline, and enters the tower C from the top of the tower C to equalize the pressure of the tower C; the tower D and the tower F are in a matched forward-discharging flushing state, gas in the tower F enters a PP cavity at the upper part of the rotary distributor from the top, enters the top of the tower D after entering a P cavity through a pipeline, and is sent out of the system from a VT port after entering a P cavity at the lower part of the rotary distributor from the bottom, so that flushing is completed.
CN202210256742.5A 2022-03-16 2022-03-16 Method for purifying H2 and CO from synthesis gas by using rotary distributor Active CN114748971B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210256742.5A CN114748971B (en) 2022-03-16 2022-03-16 Method for purifying H2 and CO from synthesis gas by using rotary distributor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202210256742.5A CN114748971B (en) 2022-03-16 2022-03-16 Method for purifying H2 and CO from synthesis gas by using rotary distributor

Publications (2)

Publication Number Publication Date
CN114748971A true CN114748971A (en) 2022-07-15
CN114748971B CN114748971B (en) 2023-03-03

Family

ID=82327103

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202210256742.5A Active CN114748971B (en) 2022-03-16 2022-03-16 Method for purifying H2 and CO from synthesis gas by using rotary distributor

Country Status (1)

Country Link
CN (1) CN114748971B (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070221060A1 (en) * 2004-06-11 2007-09-27 Yuwen Song Two-Stage Complete Recycle Pressure-Swing Adsorption Process for Gas
CN205084584U (en) * 2015-10-26 2016-03-16 四川天一科技股份有限公司 Pressure swing adsorption unit that tandem was washed
CN106763910A (en) * 2017-01-22 2017-05-31 成都赛普瑞兴科技有限公司 A kind of whirligig and gas fractionation unit
CN107213750A (en) * 2017-07-10 2017-09-29 成都赛普瑞兴科技有限公司 A kind of H2Purification system and gas handling system
CN210978624U (en) * 2019-11-27 2020-07-10 山东津挚环保科技有限公司 Rotary valve device of twelve-tower pressure swing adsorption system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070221060A1 (en) * 2004-06-11 2007-09-27 Yuwen Song Two-Stage Complete Recycle Pressure-Swing Adsorption Process for Gas
CN205084584U (en) * 2015-10-26 2016-03-16 四川天一科技股份有限公司 Pressure swing adsorption unit that tandem was washed
CN106763910A (en) * 2017-01-22 2017-05-31 成都赛普瑞兴科技有限公司 A kind of whirligig and gas fractionation unit
CN107213750A (en) * 2017-07-10 2017-09-29 成都赛普瑞兴科技有限公司 A kind of H2Purification system and gas handling system
CN210978624U (en) * 2019-11-27 2020-07-10 山东津挚环保科技有限公司 Rotary valve device of twelve-tower pressure swing adsorption system

Also Published As

Publication number Publication date
CN114748971B (en) 2023-03-03

Similar Documents

Publication Publication Date Title
CN210978624U (en) Rotary valve device of twelve-tower pressure swing adsorption system
CN101340969B (en) Pressure swing adsorption process for oxygen production
JPH05137938A (en) Method and device for separating by adsorption at least one constituent of gaseous mixture and use of said device
CN101474520A (en) Device for adsorptive separation and purification of industrial gas
US20140076164A1 (en) Adsorption purification unit with rotary distributor and means for regulating the flow rates
JPH04222613A (en) Method for producing oxygen-enriched product stream
CN111841244B (en) Pressure swing adsorption hydrogen purification system
CN114917724B (en) A full temperature range simulation of air oxygen enrichment process of rotating moving bed pressure swing adsorption FTrSRMPSA
CN114748971B (en) Method for purifying H2 and CO from synthesis gas by using rotary distributor
CN217473093U (en) Device for purifying H2 and CO from synthesis gas
CN114748970B (en) Method for separating methane from biogas by using rotary distributor
CN104524922B (en) A kind of radial bed method for designing with Efficient air flow distribution and radial bed thereof
CN217473092U (en) Rotary distributor and device for removing CO2 and purifying H2 from converted gas
CN1454970A (en) Continuous catalytic reforming reactor
CN114748973B (en) Rotary distributor for removing CO from reformed gas 2 And purification of H 2 Method (2)
CN102500190B (en) A kind of cleaning and recovering process for enriched gas source
CN217855343U (en) Device for purifying nitrogen from air
CN111204712A (en) Pressure swing adsorption gas hydrogen separation and purification system and separation and purification method thereof
CN112892153B (en) Pressure swing adsorption process based on multi-channel rotary valve
CN114748972A (en) Method for purifying N2 from air by using rotary distributor
CN203529931U (en) Device for preparing oxygen from air
CN115608105B (en) Variable-path step-by-step pressure-equalizing pressure swing adsorption gas separation method and device
CN209005510U (en) The program-controlled valve gear of nine tower pressure swing adsorption systems
CN112569443B (en) Medical oxygen generator with low oxygen supply interval and oxygen generation method
CN212387734U (en) Pressure swing adsorption gas separation and purification hydrogen system

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant