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CN114504147A - Gauze mask made of knitted fabric - Google Patents

Gauze mask made of knitted fabric Download PDF

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Publication number
CN114504147A
CN114504147A CN202011278641.5A CN202011278641A CN114504147A CN 114504147 A CN114504147 A CN 114504147A CN 202011278641 A CN202011278641 A CN 202011278641A CN 114504147 A CN114504147 A CN 114504147A
Authority
CN
China
Prior art keywords
knitted fabric
layer
knitted
knitting structure
double
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202011278641.5A
Other languages
Chinese (zh)
Inventor
鍾隆介
赖佩柔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zhichuang Popular Technology Holding Co ltd
Original Assignee
Zhichuang Popular Technology Holding Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zhichuang Popular Technology Holding Co ltd filed Critical Zhichuang Popular Technology Holding Co ltd
Priority to CN202011278641.5A priority Critical patent/CN114504147A/en
Publication of CN114504147A publication Critical patent/CN114504147A/en
Pending legal-status Critical Current

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Classifications

    • AHUMAN NECESSITIES
    • A41WEARING APPAREL
    • A41DOUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
    • A41D13/00Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches
    • A41D13/05Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches protecting only a particular body part
    • A41D13/11Protective face masks, e.g. for surgical use, or for use in foul atmospheres
    • A41D13/1107Protective face masks, e.g. for surgical use, or for use in foul atmospheres characterised by their shape
    • A41D13/113Protective face masks, e.g. for surgical use, or for use in foul atmospheres characterised by their shape with a vertical fold or weld
    • AHUMAN NECESSITIES
    • A41WEARING APPAREL
    • A41DOUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
    • A41D31/00Materials specially adapted for outerwear
    • A41D31/04Materials specially adapted for outerwear characterised by special function or use
    • AHUMAN NECESSITIES
    • A41WEARING APPAREL
    • A41DOUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
    • A41D2400/00Functions or special features of garments
    • A41D2400/42Foldable
    • AHUMAN NECESSITIES
    • A41WEARING APPAREL
    • A41DOUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
    • A41D2500/00Materials for garments
    • A41D2500/10Knitted

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  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Physical Education & Sports Medicine (AREA)
  • Respiratory Apparatuses And Protective Means (AREA)
  • Knitting Of Fabric (AREA)

Abstract

A mask made of knitted fabric comprises a piece of knitted fabric and two ear hooks, wherein the two ear hooks and the knitted fabric are knitted together and are respectively positioned on two sides of the knitted fabric. The knitted fabric is composed of a double-layer knitting structure and a single-layer knitting structure, the double-layer knitting structure is used for forming the foundation of the knitted fabric, the single-layer knitting structure defines at least one bending line, the single-layer knitting structure is only connected with one of two surface-layer textures to which the double-layer knitting structure belongs, and the bending line is a valley folding line or a mountain folding line determined by the connection of the single-layer knitting structure and the double-layer knitting structure. The present invention is formed by the double-layer knitting structure and the single-layer knitting structure, so that the knitted fabric can define the at least one bending line by utilizing the single-layer knitting structure, and the knitted fabric can be folded.

Description

Gauze mask made of knitted fabric
Technical Field
The invention relates to a mask made of knitted fabric, in particular to a mask with knitted fabric consisting of a double-layer knitted structure and a single-layer knitted structure.
Background
There are various masks, such as cloth Mask made of cotton cloth, and Pitta Mask made of polyurethane material and manufactured by ARAX of Japan. Wherein, to cloth gauze mask, this type of gauze mask is constituteed with the mode of concatenation between the fabric more, and cloth cover concatenation line easily produces the friction with the face of wearer after the person of wearing cloth gauze mask, and causes the wearer uncomfortable. In addition, although the Pitta Mask is an integrally formed structure, the product cannot be folded randomly, and the folded Mask is difficult to reduce in size after a wearer takes off the Mask, so that the Mask is inconvenient for the wearer to store.
Furthermore, although taiwan patent TW I511758 discloses a fabric mask capable of improving portability and storage, it can be found from the description of the present application that after knitting, the mask needs to be shaped by ultrasonic welding to form a fold, which results in a complicated manufacturing process. In addition, the two ear hooks used by the mask are additionally sewn on the mask body after the mask body is knitted, the extra ear hook sewing step makes the production steps complicated, and when the ear hooks are carelessly and not really connected to the mask body or a wearer pulls the ear hooks with great force, the ear hooks are easy to separate from the mask body.
Disclosure of Invention
The invention mainly aims to solve the problem that the existing cloth mask or the mask made of polyurethane material cannot be folded.
The invention also aims to solve the problem that the process steps of the existing foldable fabric mask are complicated.
The present invention provides a mask made of knitted fabric, comprising a knitted fabric and two hangers respectively knitted with the knitted fabric at the two sides of the knitted fabric, wherein the knitted fabric is composed of a double-layer knitting structure and a single-layer knitting structure, the double-layer knitting structure is the basis for forming the knitted fabric, the single-layer knitting structure defines at least one bending line for folding the knitted fabric, the single-layer knitting structure is connected with only one of the two side-layer knitting structures of the double-layer knitting structure, and the bending line is a valley folding line or a mountain folding line determined by the connection of the single-layer knitting structure and the double-layer knitting structure.
In one embodiment, the two ear loops are tubular fabrics formed by knitting bags, and the two ear loops are connected with the knitted fabrics by intarsia knitting.
In one embodiment, the single-layer knitted structure forms a plurality of the bending lines, the bending lines include a plurality of longitudinal bending lines arranged at intervals and a plurality of oblique bending lines respectively connected between any two adjacent longitudinal bending lines, and each oblique bending line intersects with another oblique bending line on one of the longitudinal bending lines.
In an embodiment, a plurality of rhombus images arranged in succession are formed on the surface of the knitted fabric by the oblique bending lines, and the rhombus images are larger than the other rhombus images in the center of the knitted fabric.
In one embodiment, the knitted fabric has an antimicrobial yarn added by plating knitting on one side of the double knit structure.
In one embodiment, the antimicrobial yarn is a graphene yarn.
In one embodiment, the two opposite sides of the knitted fabric not adjacent to the two ear loops are different in shape.
In one embodiment, the two ear loops define two parallel imaginary lines respectively connecting the two ear loops, the two imaginary lines divide the knitted fabric into a first side block, a middle block and a second side block from top to bottom, and the knitted fabric is knitted by a reverse knitting on a portion of the first side block close to the center line of the knitted fabric and a portion of the second side block close to the center line of the knitted fabric.
Compared with the prior art, the invention has the following characteristics: the double-layer knitting structure and the single-layer knitting structure are formed on the knitted fabric, so that the knitted fabric takes the single-layer knitting structure as the at least one bending line, and the knitted fabric is prevented from being unable to be accommodated and presenting a loose state when not being used.
The invention is described in detail below with reference to the drawings and specific examples, but the invention is not limited thereto.
Drawings
Fig. 1 is a schematic front view of a fabric mask in accordance with an embodiment of the present invention;
fig. 2 is a schematic view of an unfolded knitted fabric structure according to an embodiment of the present invention;
fig. 3 is a schematic view of a folded knitted fabric structure according to an embodiment of the present invention;
fig. 4 is a schematic view of the mask according to an embodiment of the present invention after being folded.
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Detailed Description
The present invention is described in detail and technical content with reference to the accompanying drawings, wherein:
referring to fig. 1 to 4, the present invention provides a mask 10 made of knitted fabric, the mask 10 includes a knitted fabric 11 and two ear loops 13, 14, the two ear loops 13, 14 are respectively located on the knitted fabric 11
On both sides, the two ear loops 13, 14 are not disposed on the knitted fabric 11 in an extra splicing manner, but are integrally formed on the knitted fabric 11, that is, the two ear loops 13, 14 and the knitted fabric 11 are knitted together.
Further, the knitted fabric 11 is composed of a double-layer knitted structure 111 and a single-layer knitted structure 112. The double-layer knitted structure 111 is a basis for forming the knitted fabric 11, the double-layer knitted structure 111 includes two surface layer textures 113 and 114 and a cross-linked texture 115 cross-linking the two surface layer textures 113 and 114, the single-layer knitted structure 112 has only a single surface layer texture 116, the surface layer texture 116 to which the single-layer knitted structure 112 belongs is connected to only one of the two surface layer textures 113 and 114 to which the double-layer knitted structure 111 belongs, and the surface layer texture 116 to which the single-layer knitted structure 112 belongs may be integrally formed with one of the two surface layer textures 113 and 114 to which the double-layer knitted structure 111 belongs. For purposes of fig. 2, the shell side stitch 116 of the single-layer knitted structure 112 may be connected to the shell side stitch 113 of the double-layer knitted structure 111, or the shell side stitch 116 of the single-layer knitted structure 112 may be connected to the shell side stitch 114 of the double-layer knitted structure 111. Moreover, since the Flexural rigidity (Flexural rigidity) of the single-layer knitted structure 112 is less than that of the double-layer knitted structure 111, the single-layer knitted structure 112 defines at least one bending line 117 to allow the knitted fabric 11 to be folded, and the at least one bending line 117 is a valley fold line or a mountain fold line determined by the connection between the single-layer knitted structure 112 and the double-layer knitted structure 111. For example, referring to fig. 2, if the bending line 117 is the mountain folding line, the single-layer knitted structure 112 is connected to the surface layer structure 113 of the double-layer knitted structure 111, and the bending line 117 makes the double-layer knitted structure 111 present an inverted V-shaped bending. On the contrary, when the bending line 117 is the valley folding line, the single-layer knitted structure 112 is connected to the surface layer structure 114 of the double-layer knitted structure 111, and the bending line 117 makes the double-layer knitted structure 111 to be bent in a V-shape, as shown in fig. 3.
In the invention, the knitted fabric 11 is composed of the double-layer knitted structure 111 and the single-layer knitted structure 112, so that the knitted fabric 11 defines the bending line 117 by the single-layer knitted structure 112, and the knitted fabric 11 can be folded to improve the portability of the mask 10. Furthermore, the present invention forms the double-layer knitting structure 111 and the single-layer knitting structure 112 simultaneously when knitting the knitted fabric 11, that is, the present invention forms the bending line 117 simultaneously during the knitting process, without forming the bending line 117 by using the existing additional process steps, thereby simplifying the process of the knitted fabric 11.
In an embodiment, the two ear loops 13, 14 are respectively a tubular fabric 131 formed by knitting a bag, and the two ear loops 13, 14 are connected to the knitted fabric 11 by an Intarsia knitting (Intarsia). The art of intarsia knitting is well known to those skilled in the art and will not be described herein.
Referring to fig. 1 to 4, in one embodiment, the single-layer knitted structure 112 forms a plurality of the bending lines 117, the bending lines 117 include a plurality of longitudinal bending lines 118 and a plurality of oblique bending lines 119, the longitudinal bending lines 118 are disposed at intervals, and the longitudinal bending lines 118 can be the mountain folding lines or the valley folding lines, respectively. Moreover, the oblique bending lines 119 are respectively connected between any two adjacent longitudinal bending lines 118, and each oblique bending line 119 intersects with another oblique bending line 119 on one of the longitudinal bending lines 118. In one embodiment, the oblique bending lines 119 can be the mountain bending lines, respectively.
Further, referring to fig. 1 again, in an embodiment, a plurality of diamond-shaped images 122 are formed on the surface of the knitted fabric 11 by a portion of the diagonal bending lines 119, the diamond-shaped images 122 are arranged in succession at positions of the knitted fabric 11 that are not adjacent to the edges, and the diamond-shaped images 122 are located at the center of the knitted fabric 11 and are larger than the remaining diamond-shaped images 122. Furthermore, the remaining oblique bending lines 119 are respectively connected to a side of one of the diamond-shaped images 122 away from another of the diamond-shaped images 122.
In another aspect, in an embodiment of the present invention, the knitted fabric 11 is configured to fit the nose and the chin of the wearer, and the two opposite sides of the knitted fabric 11 not adjacent to the two ear loops 13, 14 have different shapes. Specifically, the two ear loops 13, 14 define two imaginary lines 132, 133 which are parallel to each other and respectively connect the two ear loops 13, 14, and the knitted fabric 11 divides a first side block 123, a middle block 124 and a second side block from top to bottom by the two imaginary lines 132, 133. Further, assuming that the direction of the knitted fabric 11 is shown in the drawing of fig. 1, the first side block 123 corresponds to the nose of the wearer, the second side block 125 corresponds to the chin of the wearer, and the area of the first side block 123 is larger than the area of the second side block 125, so that the knitted fabric 11 can be specifically matched with the face of the wearer, and the wearer can further determine the wearing direction of the mask 10 by the difference between the first side block 123 and the second side block 125. Further, the knitted fabric 11 is knitted by a Partial knitting (Partial knitting) at a portion of the first side block 123 close to the central line 126 of the knitted fabric 11 and at a portion of the second side block 125 close to the central line 126 of the knitted fabric 11, so that the portion of the knitted fabric 11 close to the central line 126 of the knitted fabric 11 at the first side block 123 and the portion of the second side block 125 close to the central line 126 of the knitted fabric 11 have a curvature, thereby fitting the nose and the chin of a wearer.
In addition, in an embodiment, in order to enhance the antibacterial function of the knitted fabric 11, the knitted fabric 11 has an antibacterial yarn on one side of the double-layer knitting structure 111, and the antibacterial yarn is added to the knitted fabric 11 by plating knitting during the knitting process of the knitted fabric 11. In one embodiment, the antimicrobial yarn is a graphene yarn.
The present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof, and it should be understood that various changes and modifications can be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.

Claims (10)

1. A mask made of a knitted fabric, comprising:
a knitted fabric, which is composed of a double-layer knitting structure and a single-layer knitting structure, wherein the double-layer knitting structure is used for forming the foundation of the knitted fabric, the single-layer knitting structure defines at least one bending line so that the knitted fabric can be folded, the single-layer knitting structure is only connected with one of two surface layer tissues to which the double-layer knitting structure belongs, and the bending line is a valley fold line or a mountain fold line determined by the connection of the single-layer knitting structure and the double-layer knitting structure; and
and the two ear hangers are knitted together with the knitted fabric, and are respectively positioned on two sides of the knitted fabric.
2. The mask made of knitted fabric according to claim 1, wherein the two ear loops are respectively a tubular fabric formed by knitting a bag, and the two ear loops are connected with the knitted fabric by an intarsia knitting.
3. The mask made of knitted fabric according to claim 1 or 2, wherein the single-layer knitted structure forms a plurality of the bending lines, the bending lines include a plurality of longitudinal bending lines arranged at intervals, and a plurality of diagonal bending lines respectively connected between any two adjacent longitudinal bending lines, and each diagonal bending line intersects with another diagonal bending line on one of the longitudinal bending lines.
4. The mask made of knitted fabric according to claim 3, wherein a portion of the plurality of diagonal bending lines form a plurality of diamond-shaped patterns arranged in succession on the surface of the knitted fabric, and the diamond-shaped patterns located at the center of the knitted fabric are larger than the remaining diamond-shaped patterns.
5. The mask made of knitted fabric according to claim 1 or 2, wherein the knitted fabric has an antibacterial yarn added by plating knitting on one side of the double knit structure.
6. The mask of claim 5 wherein the antimicrobial yarn is a graphene yarn.
7. The mask made of knitted fabric according to claim 6, wherein the knitted fabric is different in shape between two opposite sides of the knitted fabric not adjacent to the two ear loops.
8. The mask made of knitted fabric according to claim 7, wherein the two ear loops define two parallel imaginary lines connecting the two ear loops, respectively, the two imaginary lines are a first side block, a middle block and a second side block from top to bottom, the knitted fabric is knitted by a back-leading knitting on the portion of the first side block near the center line of the knitted fabric and on the portion of the second side block near the center line of the knitted fabric.
9. The mask made of knitted fabric according to claim 1 or 2, wherein the two opposite sides of the knitted fabric not adjacent to the two ear loops are different in shape.
10. The mask made of knitted fabric according to claim 9, wherein the two ear loops define two parallel imaginary lines connecting the two ear loops, respectively, the two imaginary lines are a first side block, a middle block and a second side block from top to bottom, the knitted fabric is knitted by a back-leading knitting on the portion of the first side block near the center line of the knitted fabric and on the portion of the second side block near the center line of the knitted fabric.
CN202011278641.5A 2020-11-16 2020-11-16 Gauze mask made of knitted fabric Pending CN114504147A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202011278641.5A CN114504147A (en) 2020-11-16 2020-11-16 Gauze mask made of knitted fabric

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202011278641.5A CN114504147A (en) 2020-11-16 2020-11-16 Gauze mask made of knitted fabric

Publications (1)

Publication Number Publication Date
CN114504147A true CN114504147A (en) 2022-05-17

Family

ID=81546669

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202011278641.5A Pending CN114504147A (en) 2020-11-16 2020-11-16 Gauze mask made of knitted fabric

Country Status (1)

Country Link
CN (1) CN114504147A (en)

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012030798A1 (en) * 2010-08-31 2012-03-08 Crosstex International, Inc. A filter mask having one or more malleable stiffening members
CN103561821A (en) * 2011-04-08 2014-02-05 尤妮佳股份有限公司 Mask manufacturing method, and mask
CN107072341A (en) * 2014-10-31 2017-08-18 3M创新有限公司 Respirator with Corrugated filter structure
JP2019019435A (en) * 2017-07-20 2019-02-07 白元アース株式会社 Sanitary mask
CN109898324A (en) * 2019-02-27 2019-06-18 孙义柱 A kind of elastic absorption antibacterial mask fabric
JP2019183344A (en) * 2018-04-13 2019-10-24 ユニ・チャーム株式会社 Disposable mask
CN110367622A (en) * 2018-04-12 2019-10-25 黛莉股份有限公司 Mask
CN111480913A (en) * 2020-05-18 2020-08-04 无锡太平针织有限公司 3D forming mask knitted by four-needle bed flat knitting machine
JP3227113U (en) * 2020-04-23 2020-08-06 株式会社成願 Simple mask
CN111567930A (en) * 2020-05-06 2020-08-25 江南大学 Knitting full-forming 3D gauze mask
JP3227910U (en) * 2020-06-19 2020-09-24 ハンス株式会社 Sanitary mask
CN111713776A (en) * 2020-06-17 2020-09-29 山东鲁联新材料有限公司 Antibacterial and anti-fog mask and preparation method thereof
JP3228102U (en) * 2020-06-25 2020-10-08 モノリンク株式会社 Mask cover
CN211672575U (en) * 2020-01-09 2020-10-16 青岛科美生物工程有限公司 Three-dimensional gauze mask of removable filter core

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012030798A1 (en) * 2010-08-31 2012-03-08 Crosstex International, Inc. A filter mask having one or more malleable stiffening members
CN103561821A (en) * 2011-04-08 2014-02-05 尤妮佳股份有限公司 Mask manufacturing method, and mask
CN107072341A (en) * 2014-10-31 2017-08-18 3M创新有限公司 Respirator with Corrugated filter structure
JP2019019435A (en) * 2017-07-20 2019-02-07 白元アース株式会社 Sanitary mask
CN110367622A (en) * 2018-04-12 2019-10-25 黛莉股份有限公司 Mask
JP2019183344A (en) * 2018-04-13 2019-10-24 ユニ・チャーム株式会社 Disposable mask
CN109898324A (en) * 2019-02-27 2019-06-18 孙义柱 A kind of elastic absorption antibacterial mask fabric
CN211672575U (en) * 2020-01-09 2020-10-16 青岛科美生物工程有限公司 Three-dimensional gauze mask of removable filter core
JP3227113U (en) * 2020-04-23 2020-08-06 株式会社成願 Simple mask
CN111567930A (en) * 2020-05-06 2020-08-25 江南大学 Knitting full-forming 3D gauze mask
CN111480913A (en) * 2020-05-18 2020-08-04 无锡太平针织有限公司 3D forming mask knitted by four-needle bed flat knitting machine
CN111713776A (en) * 2020-06-17 2020-09-29 山东鲁联新材料有限公司 Antibacterial and anti-fog mask and preparation method thereof
JP3227910U (en) * 2020-06-19 2020-09-24 ハンス株式会社 Sanitary mask
JP3228102U (en) * 2020-06-25 2020-10-08 モノリンク株式会社 Mask cover

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* Cited by examiner, † Cited by third party
Title
余艳艳等: "自吸过滤式防尘口罩的适合性测试及改进", 《中华劳动卫生职业病杂志》 *

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Application publication date: 20220517