CN114464559A - UV glue-dissolving machine - Google Patents
UV glue-dissolving machine Download PDFInfo
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- CN114464559A CN114464559A CN202210183645.8A CN202210183645A CN114464559A CN 114464559 A CN114464559 A CN 114464559A CN 202210183645 A CN202210183645 A CN 202210183645A CN 114464559 A CN114464559 A CN 114464559A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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Abstract
Description
技术领域technical field
本发明涉及解胶机技术领域,更具体的是涉及UV解胶机技术领域。The invention relates to the technical field of degumming machines, and more particularly to the technical field of UV degumming machines.
背景技术Background technique
在半导体芯片生产工艺中,芯片划片之前,要将晶圆片用划片胶膜固定在框架上,在划片工艺完成后,用UV光对固定胶膜进行照射使UV胶膜粘性固化硬化,以降低划片固定膜的粘性,以便后续封装工序的顺利生产。当紫外线照射时,粘合强度变低。因此,在紫外线照射后晶圆或芯片很容易从粘胶带上面剥离脱落。In the semiconductor chip production process, before the chip is diced, the wafer should be fixed on the frame with a dicing film. After the dicing process is completed, the fixed film is irradiated with UV light to make the UV film sticky and hardened. , in order to reduce the viscosity of the dicing fixed film, so as to facilitate the smooth production of the subsequent packaging process. When irradiated with ultraviolet rays, the adhesive strength becomes low. Therefore, the wafer or chip is easily peeled off from the adhesive tape after UV irradiation.
UV解胶机解决了晶圆、玻璃和陶瓷切割工艺的解胶工序,适用行业目前不仅局限于半导体封装行业,还适用于光学镜头、LED、IC、半导体、集成电路板、移动硬盘等半导体材料UV膜脱胶使用。The UV debonding machine solves the debonding process of the wafer, glass and ceramic cutting process. The applicable industry is not only limited to the semiconductor packaging industry, but also suitable for semiconductor materials such as optical lenses, LEDs, ICs, semiconductors, integrated circuit boards, mobile hard disks, etc. UV film degumming is used.
现有技术中的UV解胶机存在工作效率低、解胶效果不均匀且散热性不佳的缺陷。如何解决上述技术问题成了本领域技术人员的努力方向。The UV degumming machine in the prior art has the defects of low working efficiency, uneven degumming effect and poor heat dissipation. How to solve the above technical problems has become the direction of efforts of those skilled in the art.
发明内容SUMMARY OF THE INVENTION
本发明的目的在于:为了解决以上技术问题,本发明提供一种UV解胶机。The purpose of the present invention is: in order to solve the above technical problems, the present invention provides a UV degumming machine.
本发明为了实现上述目的具体采用以下技术方案:The present invention specifically adopts the following technical solutions in order to achieve the above object:
一种UV解胶机,包括外部壳体和设置在外部壳体底部四角处的支撑组件和滚轮组件,所述外部壳体包括位于左上侧的晶圆放置箱、位于右上侧的放置晶圆提篮的提篮主箱、位于右下侧的使晶圆提篮升降的晶圆次箱、位于左下侧的用于晶圆解胶的解胶箱,所述晶圆放置箱、提篮主箱、晶圆次箱和解胶箱顺序连通,所述晶圆放置箱内设置有用于放置晶圆的晶圆箱,所述提篮主箱内设置有晶圆提篮、安装架、设置在安装架上且能调整放置晶圆提篮距离的调整架、设置在安装架上且能沿安装架水平移动到晶圆箱内拾取晶圆的机械抓手组件。A UV degumming machine includes an outer casing, support assemblies and roller assemblies arranged at the four corners of the bottom of the outer casing, the outer casing includes a wafer placement box on the upper left side, and a wafer placement basket on the upper right side The main basket case, the wafer sub case located on the lower right side for lifting and lowering the wafer carrier, and the degumming case located on the lower left side for wafer debonding, the wafer placement case, the main basket case, the wafer sub case The box and the de-gluing box are connected in sequence, the wafer placement box is provided with a wafer box for placing wafers, and the basket main box is provided with a wafer carrier, a mounting rack, which is arranged on the mounting rack and can adjust the placement of wafers. The adjustment frame for the distance between the round baskets and the mechanical gripper assembly are arranged on the installation frame and can move horizontally along the installation frame to pick up wafers in the wafer box.
进一步地,所述晶圆次箱内设置有直线升降机构,直线升降机构顶部与调整架底部连接,所述直线升降机构为升降气缸。Further, a linear lifting mechanism is arranged in the wafer sub-box, the top of the linear lifting mechanism is connected with the bottom of the adjustment frame, and the linear lifting mechanism is a lifting cylinder.
进一步地,所述解胶箱内设置有隔板,所述隔板中部镶嵌有圆盘状的石英玻璃,所述隔板上还设置有位于石英玻璃两侧的晶圆提篮A,所述隔板上还设置有一对用于调整晶圆提篮A间距的调整机构A,所述隔板下方设置有用于对准石英玻璃的UV灯管组件。Further, a partition is arranged in the dissolving box, and a disc-shaped quartz glass is inlaid in the middle of the partition, and wafer baskets A located on both sides of the quartz glass are also arranged on the partition. A pair of adjustment mechanisms A for adjusting the spacing between the wafer baskets A are also arranged on the board, and a UV lamp tube assembly for aligning the quartz glass is arranged below the partition plate.
进一步地,所述调整架机构和调整机构A均为调整气缸。Further, the adjusting frame mechanism and the adjusting mechanism A are both adjusting cylinders.
进一步地,所述解胶箱内顶部设置有氮气喷头,所述解胶箱内底部设置有使氮气形成对流的抽风机。Further, a nitrogen nozzle is arranged at the top of the dissolving box, and an exhaust fan for convection of nitrogen is arranged at the bottom of the dispelling box.
进一步地,所述解胶箱内设置有散热风扇。Further, a cooling fan is arranged in the dissolving box.
进一步地,所述晶圆箱为开口向下的形状为U形折板,U形折板的宽度与晶圆提篮的宽度相适应,所述晶圆放置箱上设置有开口,所述开口处铰接设置有密封盖,所述密封盖上设置有透明的观察窗和把手。Further, the shape of the wafer box with the opening downward is a U-shaped folded plate, the width of the U-shaped folded plate is adapted to the width of the wafer carrying basket, the wafer placement box is provided with an opening, and the opening is A sealing cover is hingedly arranged, and a transparent observation window and a handle are arranged on the sealing cover.
进一步地,所述提篮主箱左侧设置有控制面板,所述控制面板上设置有多个控制按钮。Further, a control panel is provided on the left side of the main carrying basket, and a plurality of control buttons are provided on the control panel.
进一步地,所述提篮主箱内部右侧壁设置有竖直导向板,竖直导向板上设置有两条相互平行的导轨,所述安装架右端设置有竖直板,竖直板上设置有与两条导轨卡接的两个卡槽。Further, a vertical guide plate is arranged on the inner right side wall of the main box of the carrying basket, two guide rails are arranged parallel to each other on the vertical guide plate, a vertical plate is arranged on the right end of the mounting frame, and a vertical plate is arranged on the vertical plate. Two card slots for snapping with two guide rails.
本发明的有益效果如下:The beneficial effects of the present invention are as follows:
1、本发明设计合理,工作时,把待解胶的晶圆放入晶圆放置箱的晶圆箱内,在通过安装架上的机械抓手组件移动到晶圆箱内抓取晶圆,放置到晶圆放置箱上的晶圆提篮上,通过直线升降机构把安装架降到下方的晶圆次箱内,在通过机械抓手组件把晶圆送入到解胶箱内,通过UV灯管组件进行解胶处理,通过同一个机械抓手组件实现晶圆的搬运,这样可以减少解胶机的机构,使得解胶机占地面积小,这种结构可节约上下料时间,提高了工作效率,且解胶效果稳定。1. The design of the present invention is reasonable. When working, the wafer to be debonded is put into the wafer box of the wafer placement box, and the wafer is moved into the wafer box by the mechanical gripper assembly on the mounting frame to grab the wafer, Place it on the wafer carrying basket on the wafer placement box, lower the mounting frame to the lower wafer sub-box through the linear lifting mechanism, and then send the wafer into the dissolving box through the mechanical gripper assembly, and pass the UV lamp. The tube assembly is debonded, and the wafer is transported through the same mechanical gripper assembly, which can reduce the mechanism of the debonding machine and make the debonding machine occupy a small area. This structure can save the loading and unloading time and improve the work. efficiency, and the degumming effect is stable.
2、解胶内顶部设置有氮气喷头,解胶箱底部设置有抽风机,使得解胶箱内的氮气形成上下对流,增强了解胶效果。2. There is a nitrogen nozzle at the top of the degumming box, and an exhaust fan is arranged at the bottom of the degumming box, so that the nitrogen in the degumming box can form up and down convection and enhance the degumming effect.
附图说明Description of drawings
图1是本发明的结构示意图;Fig. 1 is the structural representation of the present invention;
图2是图1去掉外部壳体的结构示意图;FIG. 2 is a schematic structural diagram of FIG. 1 with the outer casing removed;
图3是图2的正视图;Fig. 3 is the front view of Fig. 2;
图4是解胶箱的结构示意图;Fig. 4 is the structural representation of dispelling box;
附图标记:1-晶圆次箱,1-1-直线升降机构,2-提篮主箱,2-1-调整架,2-2-晶圆提篮,2-3-机械抓手组件,2-4-导轨,2-5-安装架,2-6-竖直导向板,3-控制面板,4-晶圆放置箱,5-解胶箱,5-1-隔板,5-2-晶圆提篮A,5-3-石英玻璃,5-4-氮气喷头,5-5-调整机构A,5-6-UV灯管组件,5-7-抽风机,6-支撑组件,7-滚轮组件。Reference numerals: 1-wafer sub-box, 1-1-linear lift mechanism, 2-basket main box, 2-1-adjustment frame, 2-2-wafer carrier, 2-3-mechanical gripper assembly, 2 -4-rail, 2-5-mounting frame, 2-6-vertical guide plate, 3-control panel, 4-wafer placement box, 5-dissolving box, 5-1-spacer, 5-2- Wafer Basket A, 5-3-Quartz Glass, 5-4-Nitrogen Nozzle, 5-5-Adjustment Mechanism A, 5-6-UV Lamp Assembly, 5-7-Exhaust Fan, 6-Support Assembly, 7- Roller assembly.
具体实施方式Detailed ways
为使本发明实施例的目的、技术方案和优点更加清楚,下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本发明一部分实施例,而不是全部的实施例。通常在此处附图中描述和示出的本发明实施例的组件可以以各种不同的配置来布置和设计。In order to make the purposes, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments These are some embodiments of the present invention, but not all embodiments. The components of the embodiments of the invention generally described and illustrated in the drawings herein may be arranged and designed in a variety of different configurations.
因此,以下对在附图中提供的本发明的实施例的详细描述并非旨在限制要求保护的本发明的范围,而是仅仅表示本发明的选定实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。Thus, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the invention as claimed, but is merely representative of selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
应注意到:相似的标号和字母在下面的附图中表示类似项,因此,一旦某一项在一个附图中被定义,则在随后的附图中不需要对其进行进一步定义和解释。此外,术语“第一”、“第二”等仅用于区分描述,而不能理解为指示或暗示相对重要性。It should be noted that like numerals and letters refer to like items in the following figures, so once an item is defined in one figure, it does not require further definition and explanation in subsequent figures. Furthermore, the terms "first", "second", etc. are only used to differentiate the description and should not be construed to indicate or imply relative importance.
在本发明实施方式的描述中,需要说明的是,术语“内”、“外”、“上”等指示的方位或位置关系为基于附图所示的方位或位置关系,或者是该发明产品使用时惯常摆放的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。In the description of the embodiments of the present invention, it should be noted that the orientation or positional relationship indicated by the terms "inside", "outside", "upper", etc. is based on the orientation or positional relationship shown in the drawings, or the product of the invention The orientation or positional relationship that is usually placed in use is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood to limit the present invention.
实施例1Example 1
如图1到4所示,本实施例提供一种UV解胶机,包括外部壳体和设置在外部壳体底部四角处的支撑组件6和滚轮组件7,所述外部壳体包括位于左上侧的晶圆放置箱4、位于右上侧的放置晶圆提篮的提篮主箱2、位于右下侧的使晶圆提篮升降的晶圆次箱1、位于左下侧的用于晶圆解胶的解胶箱5,所述晶圆放置箱4、提篮主箱2、晶圆次箱1和解胶箱5顺序连通,所述晶圆放置箱4内设置有用于放置晶圆的晶圆箱4-3,所述提篮主箱2内设置有晶圆提篮2-2、安装架2-5、设置在安装架2-5上且能调整放置晶圆提篮2-2距离的调整架2-1、设置在安装架2-5上且能沿安装架2-5水平移动到晶圆箱4-3内拾取晶圆的机械抓手组件2-3。As shown in Figures 1 to 4, the present embodiment provides a UV degumming machine, which includes an outer casing, a
所述晶圆次箱1内设置有直线升降机构1-1,直线升降机构1-1顶部与调整架2-1底部连接,所述直线升降机构1-1为升降气缸。The
所述解胶箱5内设置有隔板5-1,所述隔板5-1中部镶嵌有圆盘状的石英玻璃5-3,所述隔板5-1上还设置有位于石英玻璃5-3两侧的晶圆提篮A5-2,所述隔板5-1上还设置有一对用于调整晶圆提篮A5-2间距的调整机构A5-5,所述隔板5-1下方设置有用于对准石英玻璃5-3的UV灯管组件5-6。The dissolving
所述调整架机构2-1和调整机构A5-5均为调整气缸。The adjusting frame mechanism 2-1 and the adjusting mechanism A5-5 are both adjusting cylinders.
本实施例中,工作时,把待解胶的晶圆放入晶圆放置箱的晶圆箱内,在通过安装架上的机械抓手组件移动到晶圆箱内抓取晶圆,放置到晶圆放置箱上的晶圆提篮上,通过直线升降机构把安装架降到下方的晶圆次箱内,在通过机械抓手组件把晶圆送入到解胶箱内,通过UV灯管组件进行解胶处理,通过同一个机械抓手组件实现晶圆的搬运,这样可以减少解胶机的机构,使得解胶机占地面积小,这种结构可节约上下料时间,提高了工作效率,且解胶效果稳定。In this embodiment, during operation, the wafer to be debonded is put into the wafer box of the wafer placement box, and the wafer is moved into the wafer box by the mechanical gripper assembly on the mounting frame to grab the wafer, and place it in the wafer box. On the wafer carrying basket on the wafer placement box, the mounting frame is lowered into the lower wafer sub-box through the linear lifting mechanism, and the wafer is sent into the dissolving box through the mechanical gripper assembly, and the UV lamp tube assembly is used. The debonding process is carried out, and the wafer handling is realized through the same mechanical gripper assembly, which can reduce the mechanism of the debonding machine and make the debonding machine occupy a small area. This structure can save the loading and unloading time and improve the work efficiency. And the degumming effect is stable.
实施例2Example 2
本实施例是在实施例1的基础上做了进一步优化,具体是:This embodiment is further optimized on the basis of
所述解胶箱5内顶部设置有氮气喷头5-4,所述解胶箱5内底部设置有使氮气形成对流的抽风机5-7。A nitrogen spray head 5-4 is arranged on the top of the
所述解胶箱5内设置有散热风扇。A cooling fan is arranged in the
所述晶圆箱4-3为开口向下的形状为U形折板,U形折板的宽度与晶圆提篮2-2的宽度相适应,所述晶圆放置箱4上设置有开口,所述开口处铰接设置有密封盖4-1,所述密封盖4-1上设置有透明的观察窗4-2和把手。The wafer box 4-3 is a U-shaped folded plate with an opening downward, and the width of the U-shaped folded plate is adapted to the width of the wafer carrying basket 2-2. The
所述提篮主箱2左侧设置有控制面板3,所述控制面板3上设置有多个控制按钮。A
所述提篮主箱2内部右侧壁设置有竖直导向板2-6,竖直导向板2-6上设置有两条相互平行的导轨2-7,所述安装架2-5右端设置有竖直板,竖直板上设置有与两条导轨2-7卡接的两个卡槽。这种结构的设计增加了升降的稳定性。A vertical guide plate 2-6 is arranged on the inner right side wall of the basket
Claims (9)
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CN202210183645.8A CN114464559A (en) | 2021-11-05 | 2021-11-05 | UV glue-dissolving machine |
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CN202111310054.4 | 2021-11-05 | ||
CN202210183645.8A CN114464559A (en) | 2021-11-05 | 2021-11-05 | UV glue-dissolving machine |
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WO2024234490A1 (en) * | 2023-05-12 | 2024-11-21 | 苏州德龙激光股份有限公司 | Adhesive and ring removal device for wafer |
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