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CN114420828A - light-emitting device - Google Patents

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Publication number
CN114420828A
CN114420828A CN202210078822.6A CN202210078822A CN114420828A CN 114420828 A CN114420828 A CN 114420828A CN 202210078822 A CN202210078822 A CN 202210078822A CN 114420828 A CN114420828 A CN 114420828A
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light
emitting device
semiconductor solid
substrate
brightness adjustment
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赖隆宽
陈冠志
张国彦
林峻弘
梁建钦
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Lextar Electronics Corp
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Lextar Electronics Corp
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/855Optical field-shaping means, e.g. lenses
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/855Optical field-shaping means, e.g. lenses
    • H10H20/856Reflecting means

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Abstract

一种发光装置,包括基板、多个半导体固态光源、导光层、以及多个亮度调整结构。半导体固态光源设置于基板上。导光层覆盖半导体固态光源与基板,且导光层具有粗糙化上表面。粗糙化上表面具有凹凸微结构。亮度调整结构设置于导光层上或嵌置于导光层中。各亮度调整结构分别位于各半导体固态光源上方,用以调整各半导体固态光源所发出的光亮度。在此揭露的发光装置具有优良的亮度及均匀度,并且可减少发光二极管的使用量,进而降低制造成本。

Figure 202210078822

A light-emitting device includes a substrate, a plurality of semiconductor solid-state light sources, a light guide layer, and a plurality of brightness adjustment structures. The semiconductor solid state light source is arranged on the substrate. The light guide layer covers the semiconductor solid state light source and the substrate, and the light guide layer has a roughened upper surface. The roughened upper surface has a concave-convex microstructure. The brightness adjustment structure is disposed on the light guide layer or embedded in the light guide layer. The brightness adjustment structures are respectively located above the semiconductor solid-state light sources for adjusting the brightness of the light emitted by the semiconductor solid-state light sources. The light-emitting device disclosed herein has excellent brightness and uniformity, and can reduce the usage of light-emitting diodes, thereby reducing the manufacturing cost.

Figure 202210078822

Description

发光装置light-emitting device

本申请是申请日为2018年12月27日、申请号为201811608248.0、发明名称为“发光装置”的专利申请的分案申请。This application is a divisional application of a patent application with an application date of December 27, 2018, an application number of 201811608248.0, and an invention name of "light-emitting device".

技术领域technical field

本发明是有关于一种发光装置。The present invention relates to a light-emitting device.

背景技术Background technique

发光二极管(Light-Emitting diode,LED)由于体积小、亮度高、耗能低等优点,近年来已逐渐取代传统光源。发光二极管目前已广泛的应用于背光模块中。Light-emitting diodes (Light-Emitting diodes, LEDs) have gradually replaced traditional light sources in recent years due to their advantages of small size, high brightness, and low energy consumption. Light emitting diodes have been widely used in backlight modules.

现有的LED背光模块设计,主要是包括多个LED封装元件安装于电路板上,此具有光线传递路径较短的缺点,因此当发光二极管之间的间距过大时,将导致发光二极管之间出现暗区,造成不良的视觉感受。通过缩小发光二极管之间的间距虽然可以改善上述问题,但缩小间距的同时必须增加发光二极管的数量,因而导致成本提升。此外,由于LED为点光源,常需要额外透过多个透镜一一覆盖LED以扩大LED的发光角度。The existing LED backlight module design mainly includes a plurality of LED package components mounted on a circuit board, which has the disadvantage of a short light transmission path. Dark areas appear, resulting in poor visual experience. Although the above problems can be improved by reducing the spacing between the light-emitting diodes, the number of the light-emitting diodes must be increased when the spacing is reduced, which leads to an increase in cost. In addition, since the LED is a point light source, it is often necessary to cover the LED through a plurality of lenses one by one to expand the light-emitting angle of the LED.

因此,需要一种可以解决上述问题的发光模块结构。Therefore, there is a need for a light emitting module structure that can solve the above problems.

发明内容SUMMARY OF THE INVENTION

本发明的一态样是提供一种发光装置,包括基板、多个半导体固态光源、导光层、以及多个亮度调整结构。半导体固态光源设置于基板上。导光层覆盖半导体固态光源与基板,且导光层具有粗糙化上表面。粗糙化上表面具有凹凸微结构。亮度调整结构设置于导光层上或嵌置于导光层中。各亮度调整结构分别位于各半导体固态光源上方,用以调整各半导体固态光源所发出的光亮度。One aspect of the present invention is to provide a light-emitting device including a substrate, a plurality of semiconductor solid-state light sources, a light guide layer, and a plurality of brightness adjustment structures. The semiconductor solid-state light source is arranged on the substrate. The light guide layer covers the semiconductor solid state light source and the substrate, and the light guide layer has a roughened upper surface. The roughened upper surface has a concave-convex microstructure. The brightness adjustment structure is disposed on the light guide layer or embedded in the light guide layer. The brightness adjustment structures are respectively located above the semiconductor solid-state light sources, and are used for adjusting the brightness of the light emitted by the semiconductor solid-state light sources.

根据本发明的某些实施方式,导光层的粗糙化上表面具有0.08~2微米的一算术平均粗糙度。According to some embodiments of the present invention, the roughened upper surface of the light guide layer has an arithmetic mean roughness of 0.08-2 microns.

根据本发明的某些实施方式,亮度调整结构的透光率为40%~70%。According to some embodiments of the present invention, the light transmittance of the brightness adjustment structure is 40%-70%.

根据本发明的某些实施方式,亮度调整结构包括一第一树脂材料层,其中多个第一散射粒子分散于第一树脂材料层中。According to some embodiments of the present invention, the brightness adjustment structure includes a first resin material layer, wherein a plurality of first scattering particles are dispersed in the first resin material layer.

根据本发明的某些实施方式,第一散射粒子包含TiO2According to some embodiments of the present invention, the first scattering particles comprise TiO2 .

根据本发明的某些实施方式,亮度调整结构还包括一第二树脂材料层。第二树脂材料层围绕第一树脂材料层,且多个第二散射粒子分散于第二树脂材料层中。According to some embodiments of the present invention, the brightness adjustment structure further includes a second resin material layer. The second resin material layer surrounds the first resin material layer, and the plurality of second scattering particles are dispersed in the second resin material layer.

根据本发明的某些实施方式,第一散射粒子包含TiO2,且第二散射粒子包含SiO2According to certain embodiments of the present invention, the first scattering particles comprise TiO2 and the second scattering particles comprise SiO2 .

根据本发明的某些实施方式,发光装置还包括底部反射层、以及至少一底部散射结构。底部反射层设置于基板之上。底部散射结构设置于底部反射层上或嵌置于底部反射层中。According to some embodiments of the present invention, the light emitting device further includes a bottom reflection layer and at least one bottom scattering structure. The bottom reflection layer is disposed on the substrate. The bottom scattering structure is disposed on the bottom reflection layer or embedded in the bottom reflection layer.

根据本发明的某些实施方式,底部散射结构包括一第三树脂材料层,且多个第三散射粒子分散于第三树脂材料层中。According to some embodiments of the present invention, the bottom scattering structure includes a third resin material layer, and a plurality of third scattering particles are dispersed in the third resin material layer.

根据本发明的某些实施方式,发光装置还包括多个抗串扰结构。抗串扰结构设置于基板之上,且各抗串扰结构位于半导体固态光源之间。According to some embodiments of the present invention, the light emitting device further includes a plurality of anti-crosstalk structures. The anti-crosstalk structure is arranged on the substrate, and each anti-crosstalk structure is located between the semiconductor solid-state light sources.

根据本发明的某些实施方式,各亮度调整结构的面积大于各半导体固态光源的出光面积。According to some embodiments of the present invention, the area of each brightness adjustment structure is larger than the light emitting area of each semiconductor solid-state light source.

根据本发明的某些实施方式,相邻的两个半导体固态光源之间的一距离为D1,其满足:According to some embodiments of the present invention, a distance between two adjacent semiconductor solid-state light sources is D1, which satisfies:

Figure BDA0003485228450000021
Figure BDA0003485228450000021

其中L1为半导体固态光源的长度。Wherein L1 is the length of the semiconductor solid-state light source.

根据本发明的某些实施方式,发光装置还包括多个透光盖。透光盖设置于导光层上,且透光盖具有低于导光层的第一折射率的第二折射率。各透光盖分别覆盖各亮度调整结构。According to some embodiments of the present invention, the light-emitting device further includes a plurality of light-transmitting covers. The light-transmitting cover is disposed on the light-guiding layer, and the light-transmitting cover has a second refractive index lower than the first refractive index of the light-guiding layer. Each light-transmitting cover covers each brightness adjusting structure respectively.

根据本发明的某些实施方式,透光盖的一剖面形状为矩形、半圆形或半椭圆形。According to some embodiments of the present invention, a cross-sectional shape of the light-transmitting cover is a rectangle, a semicircle or a semiellipse.

根据本发明的某些实施方式,亮度调整结构是嵌置于导光层中,且各亮度调整结构的顶表面暴露于导光层外。According to some embodiments of the present invention, the brightness adjustment structures are embedded in the light guide layer, and the top surface of each brightness adjustment structure is exposed outside the light guide layer.

根据本发明的某些实施方式,亮度调整结构的剖面形状为矩形或近似倒三角形。According to some embodiments of the present invention, the cross-sectional shape of the brightness adjustment structure is a rectangle or an approximately inverted triangle.

根据本发明的某些实施方式,亮度调整结构的剖面形状为近似倒三角形,且与近似倒三角形的底部顶点相邻的两侧边向内凹陷。According to some embodiments of the present invention, the cross-sectional shape of the brightness adjustment structure is an approximately inverted triangle, and the two sides adjacent to the bottom vertex of the approximately inverted triangle are recessed inward.

根据本发明的某些实施方式,导光层具有至少两个侧表面分别与基板的两个侧表面共平面。According to some embodiments of the present invention, the light guide layer has at least two side surfaces that are coplanar with the two side surfaces of the substrate, respectively.

根据本发明的某些实施方式,导光层的两个侧表面为光滑的,且不具有凹凸微结构。According to some embodiments of the present invention, both side surfaces of the light guide layer are smooth and do not have a concave-convex microstructure.

根据本发明的某些实施方式,基板为矩形基板。According to some embodiments of the present invention, the substrate is a rectangular substrate.

根据本发明的某些实施方式,导光层包括硅氧树脂、环氧树脂或压克力胶。According to some embodiments of the present invention, the light guide layer includes silicone resin, epoxy resin or acrylic glue.

根据本发明的某些实施方式,半导体固态光源为发光二极管晶片或发光二极管封装件或晶片级封装发光二极管(CSP LED)。According to certain embodiments of the present invention, the semiconductor solid state light source is a light emitting diode die or a light emitting diode package or a wafer level package light emitting diode (CSP LED).

本发明的另一态样是提供一种发光装置,包括基板、多个半导体固态光源、导光层、以及多个亮度调整结构。半导体固态光源设置于基板上。导光层覆盖半导体固态光源与基板,且导光层具有一光滑上表面。亮度调整结构嵌置于导光层中。各亮度调整结构分别位于各半导体固态光源上方,用以调整各半导体固态光源所发出的光亮度,且各亮度调整结构的顶表面未暴露于导光层外。Another aspect of the present invention is to provide a light-emitting device including a substrate, a plurality of semiconductor solid-state light sources, a light guide layer, and a plurality of brightness adjustment structures. The semiconductor solid-state light source is arranged on the substrate. The light guide layer covers the semiconductor solid state light source and the substrate, and the light guide layer has a smooth upper surface. The brightness adjustment structure is embedded in the light guide layer. The brightness adjustment structures are respectively located above the semiconductor solid state light sources for adjusting the brightness of the light emitted by the semiconductor solid state light sources, and the top surfaces of the brightness adjustment structures are not exposed to the light guide layer.

根据本发明的某些实施方式,亮度调整结构的透光率为40%~70%。According to some embodiments of the present invention, the light transmittance of the brightness adjustment structure is 40%-70%.

根据本发明的某些实施方式,发光装置还包括底部反射层、以及至少一底部散射结构。底部反射层设置于基板之上。底部散射结构嵌置于底部反射层中。According to some embodiments of the present invention, the light emitting device further includes a bottom reflection layer and at least one bottom scattering structure. The bottom reflection layer is disposed on the substrate. The bottom scattering structure is embedded in the bottom reflective layer.

根据本发明的某些实施方式,各亮度调整结构的面积大于各半导体固态光源的出光面积。According to some embodiments of the present invention, the area of each brightness adjustment structure is larger than the light emitting area of each semiconductor solid-state light source.

本发明的另一态样是提供一种发光装置,包括基板、多个半导体固态光源、以及导光层。半导体固态光源设置于基板上。导光层覆盖多个半导体固态光源与基板,且导光层具有一光滑上表面。光滑上表面具有多个凹部,且各凹部分别位于各半导体固态光源上方。凹部配置以调整半导体固态光源所发射的光的亮度。Another aspect of the present invention is to provide a light-emitting device including a substrate, a plurality of semiconductor solid-state light sources, and a light guide layer. The semiconductor solid-state light source is arranged on the substrate. The light guide layer covers a plurality of semiconductor solid-state light sources and the substrate, and the light guide layer has a smooth upper surface. The smooth upper surface has a plurality of concave portions, and each concave portion is respectively located above each semiconductor solid-state light source. The recess is configured to adjust the brightness of light emitted by the semiconductor solid state light source.

根据本发明的某些实施方式,凹部的底部为尖状。According to some embodiments of the invention, the bottom of the recess is pointed.

根据本发明的某些实施方式,凹部的剖面形状为近似V形。According to some embodiments of the present invention, the cross-sectional shape of the recess is approximately V-shaped.

根据本发明的某些实施方式,近似V形的两侧边向内凹陷。According to some embodiments of the present invention, the two sides of the approximately V-shape are inwardly recessed.

附图说明Description of drawings

当结合附图阅读时,从以下详细描述中可以更好地理解本揭露的各个方面。应注意,依据工业中的标准实务,多个特征并未按比例绘制。实际上,多个特征的尺寸可任意增大或缩小,以便使论述明晰。Various aspects of the present disclosure may be better understood from the following detailed description when read in conjunction with the accompanying drawings. It should be noted that in accordance with standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or decreased in order to clarify the discussion.

图1A绘示根据本揭示内容的一些实施方式的发光装置的立体示意图;FIG. 1A is a schematic perspective view of a light-emitting device according to some embodiments of the present disclosure;

图1B绘示根据本揭示内容的一些实施方式的发光装置的剖面示意图;1B is a schematic cross-sectional view of a light-emitting device according to some embodiments of the present disclosure;

图2A绘示根据本揭示内容的一些实施方式的发光装置的剖面示意图;2A is a schematic cross-sectional view of a light-emitting device according to some embodiments of the present disclosure;

图2B绘示根据本揭示内容的一些实施方式的发光装置的俯视示意图;2B is a schematic top view of a light emitting device according to some embodiments of the present disclosure;

图3绘示根据本揭示内容的一些实施方式的发光装置的剖面示意图;3 is a schematic cross-sectional view of a light-emitting device according to some embodiments of the present disclosure;

图4绘示根据本揭示内容的一些实施方式的发光装置的剖面示意图;4 is a schematic cross-sectional view of a light-emitting device according to some embodiments of the present disclosure;

图5绘示根据本揭示内容的一些实施方式的发光装置的剖面示意图;5 is a schematic cross-sectional view of a light-emitting device according to some embodiments of the present disclosure;

图6绘示根据本揭示内容的一些实施方式的发光装置的剖面示意图;6 is a schematic cross-sectional view of a light-emitting device according to some embodiments of the present disclosure;

图7绘示根据本揭示内容的一些实施方式的发光装置的剖面示意图;7 is a schematic cross-sectional view of a light-emitting device according to some embodiments of the present disclosure;

图8A绘示根据本揭示内容的一些实施方式的发光装置的立体示意图;8A is a schematic perspective view of a light-emitting device according to some embodiments of the present disclosure;

图8B绘示根据本揭示内容的一些实施方式的发光装置的剖面示意图;8B is a schematic cross-sectional view of a light-emitting device according to some embodiments of the present disclosure;

图9绘示根据本揭示内容的一些实施方式的发光装置的剖面示意图;9 is a schematic cross-sectional view of a light-emitting device according to some embodiments of the present disclosure;

图10A~图10F绘示根据本揭示内容的一些实施方式的发光装置运作时的照片。10A-10F illustrate photographs of the light-emitting device in operation according to some embodiments of the present disclosure.

具体实施方式Detailed ways

以下揭示内容提供许多不同实施例或实例以用于实现所提供标的物的不同的特征。下文描述组件及排列的特定实例以简化本揭露。当然,这些仅仅为实例,并不旨在限制本揭露。举例而言,在随后描述中的在第二特征之上或在第二特征上形成第一特征可包括形成直接接触的第一特征和第二特征的实施例,还可以包括在第一特征和第二特征之间形成额外特征,从而使第一特征和第二特征不直接接触的实施例。另外,本揭露在各实例中可重复元件符号及/或字母。此重复是出于简化及清楚的目的,且本身不指示所论述各实施例及/或构造之间的关系。The following disclosure provides many different embodiments or examples for implementing different features of the provided subject matter. Specific examples of components and arrangements are described below to simplify the present disclosure. Of course, these are only examples and are not intended to limit the present disclosure. By way of example, embodiments in the ensuing description where forming a first feature over or on a second feature may include forming direct contact between the first feature and the second feature may also include embodiments where the first feature and the second feature are in direct contact. Embodiments in which additional features are formed between the second features so that the first and second features are not in direct contact. Additionally, the present disclosure may repeat reference numerals and/or letters throughout the examples. This repetition is for the purpose of simplicity and clarity, and does not in itself indicate a relationship between the various embodiments and/or configurations discussed.

另外,空间相对用语,诸如“下方”、“以下”、“下部”、“上方”、“上部”及类似者,在此用于简化描述附图所示的一个元件或特征与另一元件(或多个元件)或特征(或多个特征)的关系。除附图中描绘的方向外,空间相对用语旨在包含于使用或操作中的装置的不同方向。装置可为不同的方向(旋转90度或在其他的方向),并且在此使用的空间相关描述词也可相应地被解释。In addition, spatially relative terms, such as "below," "below," "lower," "above," "upper," and the like, are used herein to simplify the description of one element or feature shown in the figures compared to another element ( or elements) or feature (or features). In addition to the orientation depicted in the figures, spatially relative terms are intended to encompass different orientations of the device in use or operation. The device may be oriented in different directions (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

请同时参照图1A及图1B。图1A绘示根据本揭示内容的一些实施方式的发光装置10a的立体示意图,而图1B绘示沿着图1A的线B-B”截取的发光装置10a的剖面示意图。如图1A及图1B所示,发光装置10a包括基板110、多个半导体固态光源200、导光层300、以及多个亮度调整结构400。发光装置10a还可以包含其他元件,将在以下叙述之。Please refer to FIG. 1A and FIG. 1B at the same time. 1A illustrates a schematic perspective view of a light-emitting device 10a according to some embodiments of the present disclosure, and FIG. 1B illustrates a schematic cross-sectional view of the light-emitting device 10a taken along the line B-B″ of FIG. 1A . As shown in FIGS. 1A and 1B The light-emitting device 10a includes a substrate 110, a plurality of semiconductor solid-state light sources 200, a light guide layer 300, and a plurality of brightness adjustment structures 400. The light-emitting device 10a may also include other elements, which will be described below.

基板110可以包含任何合适的基板。在某些实施方式中,基板110可以为透明基板或不透明基板。在某些实施方式中,基板110可以为软性基板。因此,发光装置10a可以应用于高曲面背光形式的发光模块。在其他实施方式中,基板110可以为刚性基板。例如,基板110可以为蓝宝石基板、硅基板、玻璃基板、印刷电路板、金属基板、陶瓷基板,但不限于此。如图1A所示,基板110可为一矩形基板。Substrate 110 may comprise any suitable substrate. In some embodiments, the substrate 110 may be a transparent substrate or an opaque substrate. In some embodiments, the substrate 110 may be a flexible substrate. Therefore, the light emitting device 10a can be applied to a light emitting module in the form of a highly curved backlight. In other embodiments, the substrate 110 may be a rigid substrate. For example, the substrate 110 may be a sapphire substrate, a silicon substrate, a glass substrate, a printed circuit board, a metal substrate, or a ceramic substrate, but is not limited thereto. As shown in FIG. 1A , the substrate 110 may be a rectangular substrate.

在某些实施方式中,基板110中还可以包含导电结构118(如图1B所示)。因此,在某些实施方式中,基板110可以通过导电结构118与半导体固态光源200的电极112电性连接。此外,在某些实施方式中,基板110中还可以包含绝缘材料116(如图1B所示),位于基板110的下方。In some embodiments, the substrate 110 may also include conductive structures 118 (as shown in FIG. 1B ). Therefore, in some embodiments, the substrate 110 may be electrically connected to the electrode 112 of the semiconductor solid state light source 200 through the conductive structure 118 . In addition, in some embodiments, the substrate 110 may further include an insulating material 116 (as shown in FIG. 1B ) located below the substrate 110 .

多个半导体固态光源200设置于基板110之上。在一些实施方式中,半导体固态光源200为可以发出任何波长的光的发光二极管晶片。举例来说,半导体固态光源200可为发出蓝光的发光二极管晶片或发出紫外光的发光二极管晶片。此外,半导体固态光源200可以是任何尺寸的发光二极管晶片。例如,在某些实施方式中,半导体固态光源200可以为次毫米发光二极管晶片(Mini LED chip)或微发光二极管晶片(Micro LED chip),但不以此为限。所述“次毫米发光二极管晶片”的边长尺寸可为约100微米、150微米、200微米、250微米、300微米、350微米或400微米。所述“微发光二极管晶片”的边长尺寸约100微米以下,例如可为约30微米、40微米、50微米、60微米、70微米、80微米或90微米。另外,在某些实施方式中,半导体固态光源200可以为发光二极管封装件(LED package)或晶片级封装LED(ChipScale Package LED,简称CSP LED)。A plurality of semiconductor solid-state light sources 200 are disposed on the substrate 110 . In some embodiments, the semiconductor solid state light source 200 is a light emitting diode die that can emit light of any wavelength. For example, the semiconductor solid state light source 200 may be a blue light emitting diode chip or an ultraviolet light emitting light emitting diode chip. Furthermore, the semiconductor solid state light source 200 may be any size LED die. For example, in some embodiments, the semiconductor solid-state light source 200 may be a sub-millimeter light emitting diode chip (Mini LED chip) or a micro light emitting diode chip (Micro LED chip), but not limited thereto. The side length dimension of the "sub-millimeter light emitting diode wafer" may be about 100 microns, 150 microns, 200 microns, 250 microns, 300 microns, 350 microns or 400 microns. The side length dimension of the "micro-LED wafer" is about 100 microns or less, for example, about 30 microns, 40 microns, 50 microns, 60 microns, 70 microns, 80 microns or 90 microns. In addition, in some embodiments, the semiconductor solid-state light source 200 may be a light-emitting diode package (LED package) or a chip-scale package LED (ChipScale Package LED, CSP LED for short).

导光层300覆盖半导体固态光源200与基板110。具体地,导光层300具有粗糙化上表面300a。须说明的是,导光层300的粗糙化上表面300a提供特定的技术效果,其将在下文中详细叙述。如图1B所示,导光层300具有至少两个侧表面300b、300c分别与基板110的两个侧表面110b、110c共平面。导光层300包含任何合适的透明胶材。例如,在某些实施方式中,导光层300包括硅氧树脂、环氧树脂或压克力胶,但不以此为限。另外,在某些实施方式中,导光层300的折射率为约1.49至约1.6。The light guide layer 300 covers the semiconductor solid state light source 200 and the substrate 110 . Specifically, the light guide layer 300 has a roughened upper surface 300a. It should be noted that the roughened upper surface 300a of the light guide layer 300 provides specific technical effects, which will be described in detail below. As shown in FIG. 1B , the light guide layer 300 has at least two side surfaces 300b and 300c that are coplanar with the two side surfaces 110b and 110c of the substrate 110 , respectively. The light guide layer 300 includes any suitable transparent adhesive. For example, in some embodiments, the light guide layer 300 includes silicone resin, epoxy resin or acrylic adhesive, but not limited thereto. Additionally, in certain embodiments, the refractive index of the light directing layer 300 is about 1.49 to about 1.6.

多个亮度调整结构400设置于导光层300上。具体地,各亮度调整结构400分别位于各半导体固态光源200上方,具有部分透光与部分反射光的效果,用以调整各半导体固态光源200所发出的光亮度。详言之,由于发光二极管晶片具有很高的指向性,因此在传统的发光装置中,位于发光二极管晶片正上方的光亮度较高,使得发光装置的出光不均匀。根据本揭示内容的各种实施方式,通过亮度调整结构400的设置,可以调整位于半导体固态光源200上方的光亮度,使发光装置10a的出光更均匀。更详细言之,半导体固态光源200所发射的一部分光通过并透射出亮度调整结构400,而另一部分光则在通过亮度调整结构400时被反射。A plurality of brightness adjustment structures 400 are disposed on the light guide layer 300 . Specifically, each brightness adjustment structure 400 is located above each semiconductor solid state light source 200 , and has the effect of partially transmitting light and partially reflecting light, so as to adjust the brightness of the light emitted by each semiconductor solid state light source 200 . In detail, since the light emitting diode chip has high directivity, in the conventional light emitting device, the brightness of the light directly above the light emitting diode chip is relatively high, so that the light output of the light emitting device is uneven. According to various embodiments of the present disclosure, the brightness of the light located above the semiconductor solid state light source 200 can be adjusted through the setting of the brightness adjustment structure 400 , so that the light output of the light emitting device 10 a is more uniform. In more detail, a part of the light emitted by the semiconductor solid-state light source 200 passes through and transmits the brightness adjustment structure 400 , and another part of the light is reflected when passing through the brightness adjustment structure 400 .

为了使亮度调整结构400能有效地调整半导体固态光源200所发出的光亮度,亮度调整结构400的面积大于半导体固态光源200的出光面积,如图1A和图1B所示。在一些实施方式中,亮度调整结构400具有一长度L(或直径),其满足下式:In order for the brightness adjustment structure 400 to effectively adjust the brightness of the light emitted by the semiconductor solid state light source 200 , the area of the brightness adjustment structure 400 is larger than the light emitting area of the semiconductor solid state light source 200 , as shown in FIGS. 1A and 1B . In some embodiments, the brightness adjustment structure 400 has a length L (or diameter), which satisfies the following formula:

Figure BDA0003485228450000061
Figure BDA0003485228450000061

其中D1为相邻的两个半导体固态光源200之间的距离;L1为半导体固态光源200的长度。D1 is the distance between two adjacent semiconductor solid-state light sources 200 ; L1 is the length of the semiconductor solid-state light sources 200 .

此外,在一些实施方式中,亮度调整结构400的透光率为40%~70%,例如45%、50%、55%或65%。亮度调整结构400可为一层或多层树脂材料层。如图1B所示,亮度调整结构400包括第一树脂材料层410。具体地,多个第一散射粒子(未绘示)分散于第一树脂材料层410中,以散射或反射通过第一树脂材料层410的光。在一些实施例中,第一树脂材料层410包括硅氧树脂、环氧树脂或压克力胶,且第一树脂材料层410的折射率为约1.49至约1.6。在一些实施例中,第一散射粒子包含TiO2,但不以此为限。In addition, in some embodiments, the light transmittance of the brightness adjustment structure 400 is 40%˜70%, such as 45%, 50%, 55% or 65%. The brightness adjustment structure 400 may be one or more layers of resin material. As shown in FIG. 1B , the brightness adjustment structure 400 includes a first resin material layer 410 . Specifically, a plurality of first scattering particles (not shown) are dispersed in the first resin material layer 410 to scatter or reflect light passing through the first resin material layer 410 . In some embodiments, the first resin material layer 410 includes silicone resin, epoxy resin or acrylic glue, and the refractive index of the first resin material layer 410 is about 1.49 to about 1.6. In some embodiments, the first scattering particles comprise TiO 2 , but are not limited thereto.

如前所述,导光层300的粗糙化上表面300a提供特定的技术效果。具体而言,导光层300是通过形成一层树脂材料层后,利用化学蚀刻或物理研磨等方式,使树脂材料层的上表面粗糙化而得到。因此,粗糙化上表面300a具有凹凸微结构(未绘示)。如此一来,随后形成的亮度调整结构400与导光层300之间的黏着性可有效提升,降低了两者发生剥离的风险。另一方面,当半导体固态光源200所发射的光通过粗糙化上表面300a时,粗糙化上表面300a的凹凸微结构可散射光,从而使发光装置10a的出光更均匀。在一些实施例中,粗糙化上表面300a具有0.08~2微米的一算术平均粗糙度(Ra)。在一些实施例中,仅在树脂材料层的上表面进行粗糙化,因此所形成的导光层300的两个侧表面300b、300c为光滑的,且不具有凹凸微结构。As previously mentioned, the roughened upper surface 300a of the light guide layer 300 provides a specific technical effect. Specifically, the light guide layer 300 is obtained by forming a resin material layer and then roughening the upper surface of the resin material layer by chemical etching or physical polishing. Therefore, the roughened upper surface 300a has a concave-convex microstructure (not shown). In this way, the adhesiveness between the subsequently formed brightness adjustment structure 400 and the light guide layer 300 can be effectively improved, and the risk of peeling off between the two can be reduced. On the other hand, when the light emitted by the semiconductor solid state light source 200 passes through the roughened upper surface 300a, the concave-convex microstructure of the roughened upper surface 300a can scatter the light, thereby making the light output of the light emitting device 10a more uniform. In some embodiments, the roughened upper surface 300a has an arithmetic mean roughness (Ra) of 0.08-2 microns. In some embodiments, roughening is performed only on the upper surface of the resin material layer, so the two side surfaces 300b and 300c of the formed light guide layer 300 are smooth and do not have a concave-convex microstructure.

在某些实施方式中,发光装置10a还包括一底部反射层500,底部反射层500设置于基板110上(如图1B所示)。在一些实施例中,底部反射层500包含镜面金属材料,例如银、铝等,但不以此为限。应了解到,为了清楚起见,在图1B中并未绘示如底部散射结构、抗串扰结构等其他元件,但发光装置10a还可以包含底部散射结构、抗串扰结构等其他元件,其将在下文中详细叙述。In some embodiments, the light-emitting device 10a further includes a bottom reflection layer 500 disposed on the substrate 110 (as shown in FIG. 1B ). In some embodiments, the bottom reflection layer 500 includes a specular metal material, such as silver, aluminum, etc., but not limited thereto. It should be understood that, for the sake of clarity, other elements such as the bottom scattering structure and the anti-crosstalk structure are not shown in FIG. 1B , but the light emitting device 10a may also include other elements such as the bottom scattering structure and the anti-crosstalk structure, which will be described below. Describe in detail.

通过亮度调整结构400、底部反射层500的设置,以及使导光层300具有粗糙化上表面300a,可增加半导体固态光源200所发射的光在导光层300中传递的距离,并且使发光装置10a的出光更均匀。据此,可在不缩小发光二极管之间的间距的情况下,维持出光亮度,并增加出光均匀性。具体而言,如图1B所示,相邻的两个半导体固态光源200之间的一距离为D1,其满足下式:By disposing the brightness adjustment structure 400, the bottom reflective layer 500, and making the light guide layer 300 have a roughened upper surface 300a, the distance that the light emitted by the semiconductor solid state light source 200 transmits in the light guide layer 300 can be increased, and the light-emitting device can be improved. The light output of 10a is more uniform. Accordingly, the brightness of the emitted light can be maintained and the uniformity of the emitted light can be increased without reducing the spacing between the light-emitting diodes. Specifically, as shown in FIG. 1B , a distance between two adjacent semiconductor solid-state light sources 200 is D1, which satisfies the following formula:

Figure BDA0003485228450000071
Figure BDA0003485228450000071

其中L1为半导体固态光源200的长度。Wherein L1 is the length of the semiconductor solid state light source 200 .

请参照图2A及图2B。图2A绘示根据本揭示内容的一些实施方式的发光装置10b的剖面示意图,而图2B绘示发光装置10b的俯视示意图。须说明的是,在图2A及图2B中,与图1A和图1B相同或相似的元件被给予相同的符号,并省略相关说明。图2A及图2B的发光装置10b与图1A和图1B的发光装置10a相似,差异在发光装置10b的亮度调整结构400还包括第二树脂材料层420。Please refer to FIG. 2A and FIG. 2B . 2A is a schematic cross-sectional view of a light emitting device 10b according to some embodiments of the present disclosure, and FIG. 2B is a schematic top view of the light emitting device 10b. It should be noted that, in FIGS. 2A and 2B , the same or similar elements as those in FIGS. 1A and 1B are given the same symbols, and the related descriptions are omitted. The light emitting device 10b of FIGS. 2A and 2B is similar to the light emitting device 10a of FIGS. 1A and 1B , except that the brightness adjustment structure 400 of the light emitting device 10b further includes a second resin material layer 420 .

第二树脂材料层420围绕第一树脂材料层410(如图2B所示)。具体地,多个第二散射粒子(未绘示)分散于第二树脂材料层420中,以散射或反射通过第二树脂材料层420的光。在一些实施例中,第二树脂材料层420包括硅氧树脂、环氧树脂或压克力胶,且第二树脂材料层420的折射率为约1.49至约1.6。在一些实施例中,第二散射粒子包含SiO2,但不以此为限。The second resin material layer 420 surrounds the first resin material layer 410 (as shown in FIG. 2B ). Specifically, a plurality of second scattering particles (not shown) are dispersed in the second resin material layer 420 to scatter or reflect light passing through the second resin material layer 420 . In some embodiments, the second resin material layer 420 includes silicone resin, epoxy resin or acrylic, and the refractive index of the second resin material layer 420 is about 1.49 to about 1.6. In some embodiments, the second scattering particles include SiO2, but not limited thereto.

请参照图3。图3绘示根据本揭示内容的一些实施方式的发光装置10c的剖面示意图。须说明的是,在图3中,与图1A和图1B相同或相似的元件被给予相同的符号,并省略相关说明。图3的发光装置10c与图1A和图1B的发光装置10a相似,差异在发光装置10c还包括多个底部散射结构600,设置于底部反射层500上。Please refer to Figure 3. FIG. 3 is a schematic cross-sectional view of a light emitting device 10c according to some embodiments of the present disclosure. It should be noted that, in FIG. 3 , the same or similar elements as those in FIGS. 1A and 1B are given the same symbols, and the related descriptions are omitted. The light-emitting device 10c of FIG. 3 is similar to the light-emitting device 10a of FIGS. 1A and 1B , except that the light-emitting device 10c further includes a plurality of bottom scattering structures 600 disposed on the bottom reflection layer 500 .

在一些实施方式中,底部散射结构600包括一第三树脂材料层。具体地,多个第三散射粒子分散于第三树脂材料层中,以散射通过第三树脂材料层的光。在一些实施例中,第三树脂材料层包括硅氧树脂、环氧树脂或压克力胶,且第三树脂材料层的折射率为约1.49至约1.6。在一些实施例中,第三散射粒子包含TiO2或SiO2,但不以此为限。In some embodiments, the bottom scattering structure 600 includes a third resin material layer. Specifically, a plurality of third scattering particles are dispersed in the third resin material layer to scatter light passing through the third resin material layer. In some embodiments, the third resin material layer includes silicone resin, epoxy resin or acrylic, and the refractive index of the third resin material layer is about 1.49 to about 1.6. In some embodiments, the third scattering particles include TiO 2 or SiO 2 , but are not limited thereto.

如图3所示,各底部散射结构600的尺寸可不相同。详细而言,越接近半导体固态光源200的底部散射结构600的尺寸可越小,越远离半导体固态光源200的底部散射结构600的尺寸可越大。其是因为,在越接近半导体固态光源200的位置处,通过亮度调整结构400反射至此的光越少。反之,在越远离半导体固态光源200的位置处(即图3中的两个半导体固态光源200中间处),通过亮度调整结构400反射至此的光越多。据此,调整底部散射结构600的尺寸以增加光接收面积,可增加底部散射结构600的散射效率。但应了解到,图3所示的底部散射结构600的位置、数量及尺寸仅为示例,多个底部散射结构600的尺寸亦可以是相同的,并且可依需求选择底部散射结构600的数量及位置。As shown in FIG. 3 , the sizes of the bottom scattering structures 600 may be different. In detail, the size of the bottom scattering structure 600 that is closer to the semiconductor solid-state light source 200 may be smaller, and the size of the bottom scattering structure 600 that is farther from the semiconductor solid-state light source 200 may be larger. This is because, at a position closer to the semiconductor solid-state light source 200 , the less light is reflected therethrough by the brightness adjustment structure 400 . On the contrary, the farther away from the semiconductor solid-state light source 200 is (ie, the middle of the two semiconductor solid-state light sources 200 in FIG. 3 ), the more light is reflected by the brightness adjustment structure 400 . Accordingly, adjusting the size of the bottom scattering structure 600 to increase the light receiving area can increase the scattering efficiency of the bottom scattering structure 600 . However, it should be understood that the positions, numbers and sizes of the bottom scattering structures 600 shown in FIG. 3 are only examples, and the sizes of the plurality of bottom scattering structures 600 may also be the same, and the number and size of the bottom scattering structures 600 may be selected according to requirements. Location.

请参照图4。图4绘示根据本揭示内容的一些实施方式的发光装置10d的剖面示意图。须说明的是,在图4中,与图1A和图1B相同或相似的元件被给予相同的符号,并省略相关说明。图4的发光装置10d与图1A和图1B的发光装置10a相似,差异在发光装置10d还包括多个透光盖800,设置于导光层300上。Please refer to Figure 4. FIG. 4 is a schematic cross-sectional view of a light emitting device 10d according to some embodiments of the present disclosure. It should be noted that, in FIG. 4 , the same or similar elements as those in FIGS. 1A and 1B are given the same symbols, and the related descriptions are omitted. The light-emitting device 10d of FIG. 4 is similar to the light-emitting device 10a of FIGS. 1A and 1B , except that the light-emitting device 10d further includes a plurality of light-transmitting covers 800 disposed on the light guide layer 300 .

如图4所示,各透光盖800分别覆盖各亮度调整结构400。换言之,各透光盖800分别位于各半导体固态光源200的上方。透光盖800可使发光装置10d的出光更均匀。具体而言,半导体固态光源200所发射的一部分光,在通过亮度调整结构400并透射进入透光盖800之后,可在透光盖800与空气的交界面发生全反射,从而进一步调整位于半导体固态光源200上方的光亮度,使发光装置10d的出光更均匀。As shown in FIG. 4 , each light-transmitting cover 800 covers each brightness adjusting structure 400 respectively. In other words, each light-transmitting cover 800 is located above each of the semiconductor solid-state light sources 200 , respectively. The light-transmitting cover 800 can make the light output of the light-emitting device 10d more uniform. Specifically, after a part of the light emitted by the semiconductor solid-state light source 200 passes through the brightness adjustment structure 400 and is transmitted into the light-transmitting cover 800, it can be totally reflected at the interface between the light-transmitting cover 800 and the air, so as to further adjust the light in the semiconductor solid-state light source. The brightness of the light above the light source 200 makes the light output of the light emitting device 10d more uniform.

此外,在一些实施方式中,透光盖800的折射率低于导光层300的折射率。在某些实施方式中,透光盖800的折射率为约1.39至约1.48。据此,当半导体固态光源200所发射的光从折射率较高的导光层300进入折射率较低的透光盖800时,光有机会被全反射以增加光在导光层300中的传递距离,进而使发光装置10d的出光更均匀。Furthermore, in some embodiments, the refractive index of the light transmissive cover 800 is lower than the refractive index of the light guide layer 300 . In certain embodiments, the refractive index of the light transmissive cover 800 is about 1.39 to about 1.48. Accordingly, when the light emitted by the semiconductor solid-state light source 200 enters the light-transmitting cover 800 with a lower refractive index from the light-guiding layer 300 with a higher refractive index, the light has the opportunity to be totally reflected to increase the intensity of the light in the light-guiding layer 300 . The transmission distance is increased, thereby making the light output of the light-emitting device 10d more uniform.

请参照图5。图5绘示根据本揭示内容的一些实施方式的发光装置10e的剖面示意图。须说明的是,在图5中,与图4相同或相似的元件被给予相同的符号,并省略相关说明。图5的发光装置10e与图4的发光装置10d相似,差异在于,发光装置10d的透光盖800的剖面形状为矩形,而发光装置10e的透光盖800的剖面形状则为半椭圆形(从图4、图5所示的剖面示意图观之)。Please refer to Figure 5. FIG. 5 is a schematic cross-sectional view of a light emitting device 10e according to some embodiments of the present disclosure. It should be noted that, in FIG. 5 , the same or similar elements as those in FIG. 4 are given the same symbols, and the related descriptions are omitted. The light-emitting device 10e of FIG. 5 is similar to the light-emitting device 10d of FIG. 4 , except that the cross-sectional shape of the light-transmitting cover 800 of the light-emitting device 10d is a rectangle, while the cross-sectional shape of the light-transmitting cover 800 of the light-emitting device 10e is a semi-ellipse ( Viewed from the schematic cross-sectional views shown in Figures 4 and 5).

详言之,透光盖800的剖面形状配置为半椭圆形(即透光盖800为透镜形状,并具有弯曲表面)可增加光线在透光盖800与空气的交界面发生全反射的机会。在一些其他实施方式中,透光盖800的剖面形状亦可为半圆形或其他形状。Specifically, the cross-sectional shape of the transparent cover 800 is configured as a semi-elliptical shape (ie the transparent cover 800 is in the shape of a lens and has a curved surface) to increase the chance of total reflection of light at the interface between the transparent cover 800 and the air. In some other embodiments, the cross-sectional shape of the light-transmitting cover 800 may also be a semicircle or other shapes.

请参照图6。图6绘示根据本揭示内容的一些实施方式的发光装置10f的剖面示意图。须说明的是,在图6中,与图1A和图1B相同或相似的元件被给予相同的符号,并省略相关说明。图6的发光装置10f与图1A和图1B的发光装置10a相似,差异在发光装置10f的亮度调整结构400是嵌置于导光层300中。此外,发光装置10f还包括多个底部散射结构600及多个抗串扰结构700。Please refer to Figure 6. 6 is a schematic cross-sectional view of a light emitting device 10f according to some embodiments of the present disclosure. It should be noted that, in FIG. 6 , the same or similar elements as those in FIGS. 1A and 1B are given the same symbols, and the related descriptions are omitted. The light-emitting device 10f of FIG. 6 is similar to the light-emitting device 10a of FIGS. 1A and 1B , except that the brightness adjustment structure 400 of the light-emitting device 10f is embedded in the light guide layer 300 . In addition, the light emitting device 10f further includes a plurality of bottom scattering structures 600 and a plurality of anti-crosstalk structures 700 .

具体地,发光装置10f的亮度调整结构400的顶表面400a暴露于导光层300外。在一些实施例中,亮度调整结构400的顶表面400a与导光层300的粗糙化上表面300a共平面。Specifically, the top surface 400 a of the brightness adjustment structure 400 of the light emitting device 10 f is exposed to the outside of the light guide layer 300 . In some embodiments, the top surface 400a of the brightness adjustment structure 400 is coplanar with the roughened top surface 300a of the light guide layer 300 .

如图6所示,底部散射结构600嵌置于底部反射层500中。抗串扰结构700设置于基板110之上,且抗串扰结构700位于半导体固态光源200之间。抗串扰结构700可散射及/或反射来自于半导体固态光源200的光线,以避免光线互相干扰。在某些实施方式中,抗串扰结构700包含锥体或柱体,但不限于此。在某些实施方式中,抗串扰结构700的高度大于或等于半导体固态光源200的高度。As shown in FIG. 6 , the bottom scattering structure 600 is embedded in the bottom reflection layer 500 . The anti-crosstalk structure 700 is disposed on the substrate 110 , and the anti-crosstalk structure 700 is located between the semiconductor solid-state light sources 200 . The anti-crosstalk structure 700 can scatter and/or reflect the light from the semiconductor solid-state light source 200 to prevent the light from interfering with each other. In some embodiments, the anti-crosstalk structure 700 includes cones or pillars, but is not limited thereto. In some embodiments, the height of the anti-crosstalk structure 700 is greater than or equal to the height of the semiconductor solid state light source 200 .

在一些实施方式中,多个第四散射粒子分散于抗串扰结构700中,以散射及/或反射通过抗串扰结构700的光。在一些实施例中,抗串扰结构700包括硅氧树脂、环氧树脂或压克力胶,且抗串扰结构700的折射率为约1.49至约1.6。在一些实施例中,第四散射粒子包含TiO2、SiO2等,但不以此为限。In some embodiments, a plurality of fourth scattering particles are dispersed in the anti-crosstalk structure 700 to scatter and/or reflect light passing through the anti-crosstalk structure 700 . In some embodiments, the anti-crosstalk structure 700 includes silicone, epoxy, or acrylic, and the refractive index of the anti-crosstalk structure 700 is about 1.49 to about 1.6. In some embodiments, the fourth scattering particles include TiO 2 , SiO 2 , etc., but are not limited thereto.

请参照图7。图7绘示根据本揭示内容的一些实施方式的发光装置10g的剖面示意图。须说明的是,在图7中,与图1A和图1B相同或相似的元件被给予相同的符号,并省略相关说明。图7的发光装置10g与图1A和图1B的发光装置10a相似,差异在发光装置10g的亮度调整结构400是嵌置于导光层300中,且各亮度调整结构400的顶表面400a未暴露于导光层300外。发光装置10g还包括多个底部散射结构600,嵌置于底部反射层500中。Please refer to Figure 7. 7 is a schematic cross-sectional view of a light emitting device 10g according to some embodiments of the present disclosure. It should be noted that, in FIG. 7 , the same or similar elements as those in FIGS. 1A and 1B are given the same symbols, and the related descriptions are omitted. The light emitting device 10g of FIG. 7 is similar to the light emitting device 10a of FIGS. 1A and 1B , except that the brightness adjustment structure 400 of the light emitting device 10g is embedded in the light guide layer 300 , and the top surface 400a of each brightness adjustment structure 400 is not exposed outside the light guide layer 300 . The light emitting device 10g further includes a plurality of bottom scattering structures 600 embedded in the bottom reflective layer 500 .

此外,相较于发光装置10a的导光层300具有粗糙化上表面300a(如图1B所示),发光装置10g的导光层300具有光滑上表面300a”(如图7所示)。亦即,在形成发光装置10g的导光层300时(例如通过模制形成),并未进行化学蚀刻或物理研磨来粗糙化导光层300的上表面。其原因在于,发明人透过研究发现,当亮度调整结构400是嵌置于导光层300中,且亮度调整结构400的顶表面400a未暴露于导光层300外时,光滑上表面300a”可调整位于半导体固态光源200上方的光亮度。具体而言,与粗糙的上表面相比,光线从光滑上表面300a”透射至空气时较易发生全反射。因此,半导体固态光源200所发射的一部分光在通过亮度调整结构400之后,可在光滑上表面300a”被全反射,进而增加光线的传递距离,并使发光装置10g的出光更均匀。In addition, compared to the light guide layer 300 of the light emitting device 10a having a roughened upper surface 300a (as shown in FIG. 1B ), the light guide layer 300 of the light emitting device 10g has a smooth upper surface 300a ″ (as shown in FIG. 7 ). That is, when the light guide layer 300 of the light emitting device 10g is formed (for example, formed by molding), chemical etching or physical polishing is not performed to roughen the upper surface of the light guide layer 300. The reason for this is that the inventors found through research that , when the brightness adjustment structure 400 is embedded in the light guide layer 300, and the top surface 400a of the brightness adjustment structure 400 is not exposed outside the light guide layer 300, the smooth upper surface 300a" can adjust the light above the semiconductor solid-state light source 200 brightness. Specifically, compared with the rough upper surface, when light is transmitted from the smooth upper surface 300 a ″ to the air, total reflection is more likely to occur. Therefore, after passing through the brightness adjustment structure 400 , a part of the light emitted by the semiconductor solid-state light source 200 can be The smooth upper surface 300a" is totally reflected, thereby increasing the transmission distance of light, and making the light output of the light emitting device 10g more uniform.

请同时参照图8A及图8B。图8A绘示根据本揭示内容的一些实施方式的发光装置10h的立体示意图,而图8B绘示沿着图8A的线B-B”截取的发光装置10h的剖面示意图。须说明的是,在图8A及图8B中,与图1A和图1B相同或相似的元件被给予相同的符号,并省略相关说明。图8A及图8B的发光装置10h与图1A和图1B的发光装置10a相似,差异在于,发光装置10h的导光层300的粗糙化上表面300a具有多个凹部310。各凹部310分别位于各半导体固态光源200上方,且凹部310的底部为尖状。具体地,凹部310的剖面形状为近似V形(从图8B所示的剖面示意图观之)。更具体地,近似V形的两侧边S1、S2向内凹陷。Please refer to FIG. 8A and FIG. 8B at the same time. 8A shows a schematic perspective view of a light-emitting device 10h according to some embodiments of the present disclosure, and FIG. 8B shows a schematic cross-sectional view of the light-emitting device 10h taken along the line B-B″ of FIG. 8A . It should be noted that in FIG. 8A And in Fig. 8B, the same or similar elements with Fig. 1A and Fig. 1B are given the same symbol, and omit the relevant description.The light-emitting device 10h of Fig. 8A and Fig. 8B is similar to the light-emitting device 10a of Fig. 1A and Fig. 1B, the difference lies in , the roughened upper surface 300a of the light guide layer 300 of the light-emitting device 10h has a plurality of concave portions 310. Each concave portion 310 is located above each semiconductor solid-state light source 200, and the bottom of the concave portion 310 is pointed. Specifically, the cross-sectional shape of the concave portion 310 It is an approximately V-shape (viewed from the schematic cross-sectional view shown in FIG. 8B ). More specifically, the two sides S1 and S2 of the approximately V-shape are recessed inward.

各亮度调整结构400嵌置于导光层300的各凹部310中,且亮度调整结构400的顶表面400a暴露于导光层300外。在一些实施例中,亮度调整结构400的顶表面400a与导光层300的粗糙化上表面300a共平面。须说明的是,相较于发光装置10a的亮度调整结构400的剖面形状为矩形(从图1B所示的剖面示意图观之),发光装置10h的亮度调整结构400的剖面形状为近似倒三角形(从图8B所示的剖面示意图观之)。具体地,与此近似倒三角形的底部顶点相邻的两侧边S1、S2向内凹陷。据此,将亮度调整结构400配置为如图8A及图8B所示的圆锥状,增加了亮度调整结构400的散射或反射效果。Each brightness adjustment structure 400 is embedded in each concave portion 310 of the light guide layer 300 , and the top surface 400 a of the brightness adjustment structure 400 is exposed outside the light guide layer 300 . In some embodiments, the top surface 400a of the brightness adjustment structure 400 is coplanar with the roughened top surface 300a of the light guide layer 300 . It should be noted that, compared with the cross-sectional shape of the brightness adjustment structure 400 of the light emitting device 10a being a rectangle (viewed from the schematic cross-sectional view shown in FIG. 1B ), the cross-sectional shape of the brightness adjustment structure 400 of the light emitting device 10h is an approximately inverted triangle ( Viewed from the schematic cross-sectional view shown in FIG. 8B ). Specifically, the two sides S1 and S2 adjacent to the bottom vertex of the approximately inverted triangle are concave inward. Accordingly, the brightness adjustment structure 400 is configured in a cone shape as shown in FIG. 8A and FIG. 8B , which increases the scattering or reflection effect of the brightness adjustment structure 400 .

请参照图9。图9绘示根据本揭示内容的一些实施方式的发光装置10i的剖面示意图。须说明的是,在图9中,与图8B相同或相似的元件被给予相同的符号,并省略相关说明。图9的发光装置10i与图8A和图8B的发光装置10h相似,差异在于,相较于发光装置10h的导光层300具有粗糙化上表面300a(如图8B所示),发光装置10i的导光层300具有光滑上表面300a”(如图9所示)。亦即,在形成发光装置10i的导光层300时(例如通过模制形成),并未进行化学蚀刻或物理研磨来粗糙化导光层300的上表面。Please refer to Figure 9. FIG. 9 is a schematic cross-sectional view of a light emitting device 10i according to some embodiments of the present disclosure. It should be noted that, in FIG. 9 , the same or similar elements as those in FIG. 8B are given the same symbols, and the related descriptions are omitted. The light emitting device 10i of FIG. 9 is similar to the light emitting device 10h of FIGS. 8A and 8B, except that, compared with the light guide layer 300 of the light emitting device 10h having a roughened upper surface 300a (as shown in FIG. 8B ), the light emitting device 10i has a roughened upper surface 300a. The light guide layer 300 has a smooth upper surface 300a" (as shown in FIG. 9). That is, when the light guide layer 300 of the light emitting device 10i is formed (eg, formed by molding), chemical etching or physical grinding is not performed to roughen it the upper surface of the light guide layer 300 .

如前所述,与粗糙的上表面相比,光线从光滑上表面300a”透射至空气时较易发生全反射。因此,发光装置10i可不具有亮度调整结构。取而代之的是,通过将发光装置10i的导光层300配置为具有光滑上表面300a”,并且光滑上表面300a”的多个凹部310分别位于各半导体固态光源200的上方,以调整位于半导体固态光源200上方的光亮度,进而使发光装置10i的出光更均匀。具体地,如图9所示,凹部310的剖面形状为近似V形(从图9所示的剖面示意图观之)。更具体地,近似V形的两侧边S3、S4向内凹陷。As mentioned above, compared with the rough upper surface, when light is transmitted from the smooth upper surface 300a" to the air, total reflection is more likely to occur. Therefore, the light emitting device 10i may not have the brightness adjustment structure. Instead, the light emitting device 10i may be The light guide layer 300 is configured to have a smooth upper surface 300a", and the plurality of concave portions 310 of the smooth upper surface 300a" are respectively located above the semiconductor solid-state light sources 200 to adjust the brightness of the light above the semiconductor solid-state light sources 200, so as to emit light. The light output of the device 10i is more uniform. Specifically, as shown in Figure 9, the cross-sectional shape of the concave portion 310 is approximately V-shaped (viewed from the schematic cross-sectional view shown in Figure 9). More specifically, the approximately V-shaped two sides S3 , S4 is recessed inward.

请参照图10A~图10F。图10A~图10F绘示根据本揭示内容的一些实施方式的发光装置运作时的照片。图10A为不具有亮度调整结构的发光装置运作时的照片。图10B及图10C分别为具有亮度调整结构的两个发光装置运作时的照片,其中亮度调整结构是嵌置于导光层中,并且亮度调整结构的顶表面暴露于导光层外。由图10A~图10C可明显看出,图10B及图10C的发光装置具有比图10A的发光装置更佳的亮度及均匀度。此外,图10C的发光装置具有最佳的亮度及均匀度,这是因为图10C的发光装置具有较大面积的亮度调整结构,从而可更有效地调整位于半导体固态光源上方的光亮度。Please refer to FIGS. 10A to 10F . 10A-10F illustrate photographs of the light-emitting device in operation according to some embodiments of the present disclosure. FIG. 10A is a photo of the light-emitting device without the brightness adjustment structure during operation. 10B and FIG. 10C are photos of two light-emitting devices with brightness adjustment structures in operation, wherein the brightness adjustment structures are embedded in the light guide layer, and the top surfaces of the brightness adjustment structures are exposed outside the light guide layer. It can be clearly seen from FIGS. 10A to 10C that the light-emitting devices of FIGS. 10B and 10C have better brightness and uniformity than the light-emitting device of FIG. 10A . In addition, the light emitting device of FIG. 10C has the best brightness and uniformity because the light emitting device of FIG. 10C has a larger area of the brightness adjustment structure, so that the brightness of the light above the semiconductor solid state light source can be adjusted more effectively.

图10D~图10F分别为具有亮度调整结构的三个发光装置运作时的照片,其中亮度调整结构是嵌置于导光层中,并且亮度调整结构的顶表面未暴露于导光层外。详细地,图10F的发光装置具有最大面积的亮度调整结构,图10E的发光装置具有次大面积的亮度调整结构,而图10D的发光装置则具有最小面积的亮度调整结构。由图10A、图10D~图10F可明显看出,图10D~图10F的发光装置具有比图10A的发光装置更佳的亮度及均匀度。此外,图10F的发光装置(其具有最大面积的亮度调整结构)具有最佳的亮度及均匀度。FIGS. 10D to 10F are respectively photos of the three light-emitting devices with brightness adjustment structures in operation, wherein the brightness adjustment structures are embedded in the light guide layer, and the top surfaces of the brightness adjustment structures are not exposed outside the light guide layer. In detail, the light emitting device of FIG. 10F has the brightness adjustment structure with the largest area, the light emitting device of FIG. 10E has the brightness adjustment structure of the second largest area, and the light emitting device of FIG. 10D has the brightness adjustment structure of the smallest area. It can be clearly seen from FIGS. 10A and 10D to 10F that the light-emitting device of FIGS. 10D to 10F has better brightness and uniformity than the light-emitting device of FIG. 10A . In addition, the light emitting device of FIG. 10F (which has the largest area brightness adjustment structure) has the best brightness and uniformity.

如上所述,根据本揭示内容的实施方式,通过发光装置的导光层的光学设计(例如,导光层具有位于半导体固态光源上方的凹部、导光层上表面为光滑上表面或粗糙化上表面),以及各种光学元件的设置(例如亮度调整结构、底部反射层,底部散射结构、以及抗串扰结构等),使半导体固态光源所发射的光线可以更均匀地分布,并使光线可传递的更远。因此,本揭示内容的发光装置可减少发光二极管的使用量,进而降低制造成本。As described above, according to embodiments of the present disclosure, the optical design of the light guide layer of the light emitting device (eg, the light guide layer has a recess above the semiconductor solid state light source, the light guide layer upper surface is a smooth upper surface or a roughened upper surface surface), and the arrangement of various optical elements (such as brightness adjustment structure, bottom reflective layer, bottom scattering structure, and anti-crosstalk structure, etc.), so that the light emitted by the semiconductor solid-state light source can be more uniformly distributed and the light can be transmitted. farther. Therefore, the light emitting device of the present disclosure can reduce the usage amount of the light emitting diode, thereby reducing the manufacturing cost.

上文概述若干实施例的特征,使得熟悉此项技术者可更好地理解本揭露的态样。熟悉此项技术者应了解,可轻易使用本揭露作为设计或修改其他制程及结构的基础,以便实施本文所介绍的实施例的相同目的及/或实现相同优势。熟悉此项技术者亦应认识到,此类等效结构并未脱离本揭露的精神及范畴,且可在不脱离本揭露的精神及范畴的情况下产生本文的各种变化、替代及更改。The foregoing outlines the features of several embodiments so that those skilled in the art may better understand aspects of the present disclosure. Those skilled in the art should appreciate that the present disclosure may be readily utilized as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments described herein. Those skilled in the art should also realize that such equivalent structures do not depart from the spirit and scope of the present disclosure, and that various changes, substitutions and alterations herein can be made without departing from the spirit and scope of the present disclosure.

Claims (14)

1.一种发光装置,其特征在于,包括:1. A light-emitting device, characterized in that, comprising: 一基板;a substrate; 多个半导体固态光源,设置于该基板上;a plurality of semiconductor solid-state light sources, disposed on the substrate; 一导光层,直接地覆盖所述多个半导体固态光源与该基板,该导光层具有一粗糙化上表面,其中该粗糙化上表面具有凹凸微结构;以及a light guide layer directly covering the plurality of semiconductor solid-state light sources and the substrate, the light guide layer has a roughened upper surface, wherein the roughened upper surface has a concave-convex microstructure; and 多个亮度调整结构,设置于该导光层上,其中各该亮度调整结构分别位于各该半导体固态光源上方,用以调整各该半导体固态光源所发出的光亮度;a plurality of brightness adjustment structures disposed on the light guide layer, wherein each of the brightness adjustment structures is located above each of the semiconductor solid-state light sources, respectively, for adjusting the brightness of the light emitted by each of the semiconductor solid-state light sources; 其中,所述多个亮度调整结构包括一第一树脂材料层以及一第二树脂材料层,多个第一散射粒子分散于该第一树脂材料层中,该第二树脂材料层围绕该第一树脂材料层,且多个第二散射粒子分散于该第二树脂材料层中,所述多个第一散射粒子包含TiO2,且所述多个第二散射粒子包含SiO2Wherein, the plurality of brightness adjustment structures include a first resin material layer and a second resin material layer, a plurality of first scattering particles are dispersed in the first resin material layer, and the second resin material layer surrounds the first resin material layer A resin material layer, and a plurality of second scattering particles are dispersed in the second resin material layer, the plurality of first scattering particles include TiO 2 , and the plurality of second scattering particles include SiO 2 . 2.根据权利要求1所述的发光装置,其特征在于,该导光层的该粗糙化上表面具有0.08~2微米的一算术平均粗糙度。2 . The light-emitting device of claim 1 , wherein the roughened upper surface of the light guide layer has an arithmetic mean roughness of 0.08˜2 μm. 3 . 3.根据权利要求1所述的发光装置,其特征在于,所述多个亮度调整结构的透光率为40%~70%。3 . The light-emitting device according to claim 1 , wherein the light transmittance of the plurality of brightness adjustment structures is 40% to 70%. 4 . 4.根据权利要求1所述的发光装置,其特征在于,还包括:4. The light-emitting device of claim 1, further comprising: 一底部反射层,设置于该基板之上;以及a bottom reflective layer disposed on the substrate; and 至少一底部散射结构,设置于该底部反射层上或嵌置于该底部反射层中。At least one bottom scattering structure is disposed on the bottom reflection layer or embedded in the bottom reflection layer. 5.根据权利要求4所述的发光装置,其特征在于,该至少一底部散射结构包括一第三树脂材料层,且多个第三散射粒子分散于该第三树脂材料层中。5 . The light-emitting device of claim 4 , wherein the at least one bottom scattering structure comprises a third resin material layer, and a plurality of third scattering particles are dispersed in the third resin material layer. 6 . 6.根据权利要求1所述的发光装置,其特征在于,还包括:6. The light-emitting device of claim 1, further comprising: 多个抗串扰结构,设置于该基板之上,且各该抗串扰结构位于所述多个半导体固态光源之间。A plurality of anti-crosstalk structures are disposed on the substrate, and each of the anti-crosstalk structures is located between the plurality of semiconductor solid-state light sources. 7.根据权利要求1所述的发光装置,其特征在于,各该亮度调整结构的一面积大于各该半导体固态光源的一出光面积。7 . The light-emitting device of claim 1 , wherein an area of each of the brightness adjustment structures is larger than a light-emitting area of each of the semiconductor solid-state light sources. 8 . 8.根据权利要求1所述的发光装置,其特征在于,相邻的两个所述半导体固态光源之间的一距离为D1,其满足下式:8. The light-emitting device according to claim 1, wherein a distance between two adjacent semiconductor solid-state light sources is D1, which satisfies the following formula:
Figure FDA0003485228440000021
Figure FDA0003485228440000021
其中L1为所述半导体固态光源的一长度。Wherein L1 is a length of the semiconductor solid state light source.
9.根据权利要求1所述的发光装置,其特征在于,所述多个亮度调整结构的一剖面形状为矩形。9 . The light-emitting device of claim 1 , wherein a cross-sectional shape of the plurality of brightness adjustment structures is a rectangle. 10 . 10.根据权利要求1所述的发光装置,其特征在于,该导光层具有至少两个侧表面分别与该基板的两个侧表面共平面。10 . The light-emitting device of claim 1 , wherein the light guide layer has at least two side surfaces that are coplanar with the two side surfaces of the substrate, respectively. 11 . 11.根据权利要求10所述的发光装置,其特征在于,该导光层的该至少两个侧表面为光滑的,且不具有凹凸微结构。11 . The light-emitting device of claim 10 , wherein the at least two side surfaces of the light guide layer are smooth and do not have concave-convex microstructures. 12 . 12.根据权利要求1所述的发光装置,其特征在于,该基板为一矩形基板。12. The light-emitting device of claim 1, wherein the substrate is a rectangular substrate. 13.根据权利要求1所述的发光装置,其特征在于,该导光层包括硅氧树脂、环氧树脂或压克力胶。13 . The light-emitting device of claim 1 , wherein the light guide layer comprises silicone resin, epoxy resin or acrylic glue. 14 . 14.根据权利要求1所述的发光装置,其特征在于,所述多个半导体固态光源为多个发光二极管晶片或多个发光二极管封装件或多个晶片级封装发光二极管(CSP LED)。14. The light emitting device of claim 1, wherein the plurality of semiconductor solid state light sources are a plurality of light emitting diode chips or a plurality of light emitting diode packages or a plurality of wafer level package light emitting diodes (CSP LEDs).
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