CN114381798A - A leakage drainage device of a single crystal furnace and a single crystal furnace - Google Patents

Abstract

The invention provides a single crystal furnace leakage drainage device and a single crystal furnace, wherein the single crystal furnace leakage drainage device comprises: the leakage-proof disc is arranged at the bottom of the crucible and comprises a disc bottom surface and a leakage-proof edge arranged around the periphery of the disc bottom surface, and the disc bottom surface and the leakage-proof edge are arranged in a surrounding manner to form an accommodating cavity; the cylindrical pipe is connected to the middle part of the leakage-proof disc and comprises a hollow inner pipe and a hollow outer pipe, a cavity is formed between the inner pipe and the outer pipe, the cylindrical pipe comprises a first end and a second end which are opposite, the first end is connected to the middle part of the bottom surface of the disc, the cavity is opened at the first end to form a liquid inlet communicated with the accommodating cavity of the leakage-proof disc, and a liquid outlet is formed in the cylindrical pipe; the crucible shaft penetrates into the inner tube, and the bearing sleeve is connected between the inner tube and the crucible shaft. The single crystal furnace leakage flow guiding device and the single crystal furnace provided by the invention can avoid the corrosion of silicon solution to damage other thermal field components, improve the capability of equipment for coping with overflow risks, reduce potential safety hazards and even accidents, reduce loss and improve the utilization rate of the equipment.

Description

A leakage drainage device of a single crystal furnace and a single crystal furnace

technical field

The invention relates to the technical field of single crystal silicon growth, in particular to a leakage drainage device for a single crystal furnace and a single crystal furnace.

Background technique

With the continuous improvement of the quality of semiconductor silicon wafers, there are higher control requirements for the crystal defects of the crystal rods in the crystal pulling process. There are two main factors affecting the crystal defects. One is the crystal pulling process parameters, which are optimized by The second is the structure and performance of the thermal field, which is a prerequisite for the quality of the ingot, and the thermal field is a crucial part of the crystal pulling furnace. , Due to the strict requirements of the crystal pulling environment of the crystal pulling furnace, the quality and material of the thermal field are extremely demanding, not only high temperature resistance, good thermal stability, but also high purity. Usually, the thermal field is mainly composed of graphite parts and thermal felt. The graphite part with high strength and excellent thermal stability is the core part of the thermal field. Layered silicon carbide coating, the thermal felt mainly plays the role of heat insulation and directional heat conduction. The thermal felt usually undergoes many high-purification treatment processes. The cumbersome manufacturing process and strict material requirements make the price of the thermal field quite expensive.

Usually, the silicon solution is placed in a quartz crucible, and the outside of the quartz crucible is wrapped by two graphite crucibles. During the crystal pulling process, the quartz crucible reacts with the silicon solution. Secondly, there will also be a reaction between the quartz crucible and the graphite crucible, so the quartz crucible has a certain service life. When multiple unsuccessful seedings occur, the entire crystal pulling time will become longer, and there is a possibility of silicon solution leakage. And once it leaks, it will cause irreparable huge losses to other thermal field components in the crystal pulling furnace, such as heaters, crucible shafts, etc. will be destroyed. In the prior art, there is no emergency storage device to deal with the leakage of silicon solution, so that when leakage occurs, most of the thermal field components will be eroded and damaged by the silicon solution, which will cause huge losses.

SUMMARY OF THE INVENTION

In order to solve the above-mentioned technical problems, the present invention provides a leakage drainage device for a single crystal furnace and a single crystal furnace, which can avoid the erosion and damage of other thermal field components by silicon solution, improve the ability of equipment to deal with overflow risks, and reduce potential safety hazards and even accidents. Reduce losses and improve equipment availability.

In order to achieve the above object, the technical scheme adopted in the present invention is:

A leakage drainage device for a single crystal furnace is used for draining silicon liquid leaked from a crucible of a single crystal furnace, the single crystal furnace includes a furnace body and a crucible arranged in the furnace body, the bottom of the crucible is connected with the crucible shaft; the leakage drainage device of the single crystal furnace includes:

A leak-proof tray arranged at the bottom of the crucible, the leak-proof tray includes a bottom surface of the tray and a leak-proof edge arranged around the surrounding edges of the bottom surface of the tray, and the bottom surface of the tray and the leak-proof edge are formed to contain accommodating cavity for leaking liquid;

A cylindrical tube connected in the middle of the leak-proof plate, the cylindrical tube includes a hollow inner tube and an outer tube sleeved outside the inner tube, and a hollow space is formed between the inner tube and the outer tube. a cavity, and the cylindrical tube includes an opposite first end and a second end, the first end is connected to the middle part of the bottom surface of the disc, the cavity is open at the first end, and is formed with the prevention a liquid inlet that communicates with the accommodating cavities of the leakage tray, and the cylindrical tube is provided with a liquid discharge port for discharging the leakage liquid out of the cavity;

And, a bearing sleeve, the crucible shaft is penetrated in the inner tube, and the bearing sleeve is connected between the inner tube and the crucible shaft.

Exemplarily, the cylindrical tube and the leak-proof disc are integrally formed.

Exemplarily, the cylindrical tube and the leak-proof tray are of separate structures, wherein a through hole is provided in the middle of the bottom surface of the tray, and the cylindrical tube is accommodated in the through hole.

Exemplarily, the first end of the cylindrical tube is flush with the bottom surface of the disc; or, the first end of the cylindrical tube is lower than the bottom surface of the disc.

Exemplarily, the cavity of the cylindrical tube is a closed structure at the second end, and the liquid discharge port is provided on the side wall of the outer tube.

Exemplarily, the liquid discharge port is provided with a valve.

Exemplarily, the liquid discharge port is connected to an external leakage liquid storage tank.

Exemplarily, an exhaust port is further provided on the bottom surface of the disc.

Exemplarily, the leak-proof disc, the cylindrical tube and the bearing sleeve are all made of corrosion-resistant materials.

A single crystal furnace includes the leakage drainage device of the single crystal furnace as described above.

The beneficial effects brought by the present invention are as follows:

The single crystal furnace leakage drainage device and the single crystal furnace provided by the present invention mainly include a leakage prevention plate, a cylindrical tube and a bearing sleeve, wherein the bearing sleeve is located between the cylindrical tube and the crucible shaft. The inner ring of the bearing sleeve is connected to the crucible shaft, and the outer ring of the bearing sleeve is connected to the inner tube. In this way, the leak-proof plate can move up and down with the crucible shaft, but will not change with the rotation of the crucible shaft. Rotate; the cavity of the cylindrical tube is opened at the first end to form a liquid inlet, and a liquid discharge port is also set on the cylindrical tube, so that when the silicon liquid leaks, it will first flow to the leak-proof plate, and then from the leak-proof plate. The leak-proof disc flows into the cavity of the cylindrical tube and is discharged through the liquid discharge port, so that the silicon solution is prevented from eroding and damaging other thermal field components, and the loss is reduced.

Description of drawings

1 shows a schematic diagram of the installation structure of the single crystal furnace leakage drainage device provided by the present invention in the single crystal furnace;

Fig. 2 shows the structural schematic diagram of the leakage drainage device of the single crystal furnace provided by the present invention;

FIG. 3 is a schematic cross-sectional view of the leakage drainage device for a single crystal furnace provided by the present invention.

Detailed ways

To make the objectives, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are some, but not all, embodiments of the present invention. Based on the described embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art fall within the protection scope of the present invention.

In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, which is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the indicated device or element must have a specific orientation or a specific orientation. construction and operation, and therefore should not be construed as limiting the invention. Furthermore, the terms "first", "second", and "third" are used for descriptive purposes only and should not be construed to indicate or imply relative importance.

The invention provides a leakage drainage device for a single crystal furnace and a single crystal furnace, which can avoid silicon solution erosion and damage to other thermal field components, improve the ability of equipment to deal with overflow risks, reduce safety hazards and even accidents, reduce losses, and improve equipment performance. Utilization rate.

As shown in FIGS. 1 to 3 , a single crystal furnace leakage drainage device provided in an embodiment of the present invention is used to drain silicon liquid leaked from a crucible of a single crystal furnace, wherein the single crystal furnace includes a furnace body (not shown in the drawings). The bottom of the crucible 10 is connected with a crucible shaft 20, and the bottom of the crucible 10 is further provided with a crucible tray 30. The leakage drainage device of the single crystal furnace includes: a leakage prevention plate 100 , a cylindrical tube 200 and a bearing sleeve 300 , wherein the leakage prevention plate 100 is arranged at the bottom of the crucible 10 , and the leakage prevention plate 100 includes a plate bottom surface 110 and a leak-proof edge 120 arranged around the periphery of the bottom surface of the pan 110, the bottom surface of the pan 110 and the leak-proof edge 120 are surrounded to form a accommodating cavity for containing leakage liquid; the cylindrical tube 200 is connected to the In the middle of the leak-proof tray 100 , the cylindrical tube 200 includes a hollow inner tube 210 and an outer tube 220 sleeved outside the inner tube 210 , and the inner tube 210 and the outer tube 220 are formed between A cavity 230 is formed, and the cylindrical tube 200 includes an opposite first end and a second end, the first end is connected to the middle of the bottom surface 110 of the disc, the cavity 230 is open at the first end, A liquid inlet 231 is formed that communicates with the accommodating cavity of the leak-proof plate 100, and the cylindrical tube 200 is provided with a liquid discharge port 241 for discharging the leakage liquid out of the cavity 230; the crucible The shaft 20 passes through the inner tube 210 , and the bearing sleeve 300 is connected between the inner tube 210 and the crucible shaft 20 .

In the single crystal furnace leakage drainage device and the single crystal furnace provided by the present invention, the single crystal furnace leakage drainage device mainly includes a leakage prevention plate 100, a cylindrical tube 200 and a bearing sleeve 300, wherein the bearing sleeve 300 is located between the cylindrical tube 200 and the crucible shaft 20, the inner ring of the bearing sleeve 300 is connected to the crucible shaft 20, and the outer ring of the bearing sleeve 300 is connected to the inner tube 210, so that the leak-proof tray 100 can follow the crucible shaft 20 Move up and down, but will not rotate with the rotation of the crucible shaft 20; the cavity 230 of the cylindrical tube 200 is opened at the first end to form a liquid inlet 231, and a liquid discharge port 241 is also provided on the cylindrical tube 200, In this way, when the silicon liquid leaks, it will first flow to the leak-proof plate 100, then flow into the cavity 230 of the cylindrical tube 200 from the leak-proof plate 100, and be discharged through the liquid discharge port 241. It avoids the erosion of silicon solution to damage other thermal field components and reduces losses.

In some embodiments, the volume of the cavity 230 of the cylindrical tube 200 is greater than the maximum volume of the silicon solution in the crucible 10 to ensure that the leakage liquid will not overflow the cylindrical tube 200 .

In addition, in some embodiments, the leak-proof disc 100 , the cylindrical tube 200 and the bearing sleeve 300 are all made of corrosion-resistant materials, such as molybdenum.

In addition, in some embodiments, the cylindrical tube 200 and the leak-proof disc 100 may be an integrally formed structure; in other embodiments, the cylindrical tube 200 and the leak-proof disc 100 are separate bodies structure, wherein a through hole is formed in the middle of the bottom surface 110 of the disk, and the cylindrical tube 200 is accommodated in the through hole.

In addition, in some embodiments, the first end of the cylindrical tube 200 is flush with the bottom surface 110 of the tray; or, the first end of the cylindrical tube 200 is lower than the bottom surface 110 of the tray. In this way, it is convenient for the leakage liquid in the leakage prevention plate 100 to smoothly flow into the cavity 230 of the cylindrical tube 200 .

Of course, it can be understood that, in other embodiments, the first end of the cylindrical tube 200 may also be higher than the bottom surface 110 of the tray, but the height difference should be less than or equal to the height of the leak-proof edge 120 , so as to prevent leakage liquid from overflowing from the leak-proof tray 100 .

In addition, in some embodiments, as shown in the figures, the cavity 230 of the cylindrical tube 200 is a closed structure at the second end, and the liquid discharge port 241 is provided on the side wall of the outer tube 220 , and is located near the second end.

Of course, it can be understood that, in other embodiments, the liquid discharge port 241 may also be disposed at the second end.

In addition, the liquid discharge port 241 is provided with a valve (not shown in the figure), and the liquid discharge port 241 is connected to an external leakage liquid storage tank (not shown in the figure).

In this way, the valve is used to control the communication state between the cavity 230 of the cylindrical tube 200 and the external leakage liquid storage tank. During the normal crystal pulling process, the valve is in a closed state, and when the silicon liquid leaks, it will first flow to the external leakage liquid storage tank. The leak-proof plate 100 flows from the leak-proof plate 100 to the cylindrical tube 200. At this time, the pressure inside the furnace is greater than the external pressure, the valve is opened, and the leakage liquid flows into the external leakage liquid storage tank along the valve.

In addition, in some embodiments, as shown in the figures, the bottom surface 110 of the tray is further provided with an exhaust port 130 .

The embodiment of the present invention also provides a single crystal furnace, including the leakage drainage device of the single crystal furnace provided by the embodiment of the present invention. Obviously, the single crystal furnace provided by the embodiment of the present invention also has the beneficial effects brought by the leakage drainage device of the single crystal furnace provided by the embodiment of the present invention, which will not be repeated here.

The following points need to be noted:

(1) The accompanying drawings of the embodiments of the present disclosure only relate to the structures involved in the embodiments of the present disclosure, and other structures may refer to general designs.

(2) In the drawings for describing the embodiments of the present disclosure, the thicknesses of layers or regions are exaggerated or reduced for clarity, ie, the drawings are not drawn on actual scale. It will be understood that when an element such as a layer, film, region or substrate is referred to as being "on" or "under" another element, it can be "directly on" or "under" the other element, or Intermediate elements may be present.

(3) The embodiments of the present disclosure and the features in the embodiments may be combined with each other to obtain new embodiments without conflict.

The above are only specific embodiments of the present disclosure, but the protection scope of the present disclosure is not limited thereto, and the protection scope of the present disclosure should be subject to the protection scope of the claims.

Claims (10)

1. A single crystal furnace leakage drainage device is used for draining silicon liquid leaked from a crucible of the single crystal furnace, the single crystal furnace comprises a furnace body and the crucible arranged in the furnace body, and the bottom of the crucible is connected with a crucible shaft; the leakage drainage device of the single crystal furnace is characterized by comprising:

the leakage-proof disc is arranged at the bottom of the crucible and comprises a disc bottom surface and a leakage-proof edge arranged around the periphery of the disc bottom surface, and an accommodating cavity for accommodating leakage liquid is formed by the disc bottom surface and the leakage-proof edge in an enclosing manner;

the cylindrical pipe is connected to the middle part of the leakage-proof disc and comprises a hollow inner pipe and an outer pipe sleeved outside the inner pipe, a cavity is formed between the inner pipe and the outer pipe, the cylindrical pipe comprises a first end and a second end which are opposite, the first end is connected to the middle part of the bottom surface of the disc, the cavity is opened at the first end to form a liquid inlet communicated with the accommodating cavity of the leakage-proof disc, and the cylindrical pipe is provided with a liquid outlet used for discharging the leakage liquid out of the cavity;

and the bearing sleeve is arranged in the inner tube in a penetrating manner, and is connected between the inner tube and the crucible shaft.

2. The single crystal furnace leakage flow guide device according to claim 1,

the cylindrical pipe and the leakage-proof disc are of an integrally formed structure.

3. The single crystal furnace leakage flow guide device according to claim 1,

the cylindrical pipe and the leakage-proof disc are of a split structure, wherein a through hole is formed in the middle of the bottom surface of the disc, and the cylindrical pipe is accommodated in the through hole.

4. The single crystal furnace leakage flow guide device according to claim 1,

the first end of the cylindrical tube is flush with the bottom surface of the plate; alternatively, the first end of the cylindrical tube is lower than the bottom surface of the tray.

5. The single crystal furnace leakage flow guide device according to claim 1,

the cavity of the cylindrical pipe is of a closed structure at the second end, and the liquid outlet is formed in the side wall of the outer pipe.

6. The single crystal furnace leakage flow guide device according to claim 1,

and a valve is arranged on the liquid outlet.

7. The single crystal furnace leakage flow guide device according to claim 1,

the liquid outlet is connected with an external leakage liquid storage tank.

8. The single crystal furnace leakage flow guide device according to claim 1,

an exhaust port is also arranged on the bottom surface of the plate.

9. The single crystal furnace leakage flow guide device according to claim 1,

the anti-leakage disc, the cylindrical pipe and the bearing sleeve are all made of corrosion-resistant materials.

10. A single crystal furnace comprising the single crystal furnace leakage flow guide apparatus according to any one of claims 1 to 9.

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