CN114071850A - Method for manufacturing plasma discharge electrode - Google Patents
Method for manufacturing plasma discharge electrode Download PDFInfo
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- CN114071850A CN114071850A CN202010746985.8A CN202010746985A CN114071850A CN 114071850 A CN114071850 A CN 114071850A CN 202010746985 A CN202010746985 A CN 202010746985A CN 114071850 A CN114071850 A CN 114071850A
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- metal plate
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
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Abstract
The invention provides a method for manufacturing a plasma discharge electrode, which relates to the technical field of plasma discharge and comprises the following steps: the metal layer is a metal plate; wherein the metal plate is a high-temperature resistant metal plate; forming a protective layer on the surface of the metal layer; wherein, the protective layer uniformly wraps the surface of the metal layer; and in the process of forming the protective layer, a dielectric layer is uniformly adhered to the surface of the protective layer. According to the invention, the surface of the metal electrode plate is wrapped with the protective layer, and the catalyst is adhered to the surface of the protective layer, so that the metal plate of the plasma discharge electrode is protected, the service life of the plasma generator is prolonged, and the discharge efficiency of the plasma is further improved.
Description
Technical Field
The invention relates to the technical field of plasma discharge, in particular to a manufacturing method of a plasma discharge electrode.
Background
The plasma is a state of mass aggregation of positively and negatively charged particles and neutral particles, which are completely or partially ionized and have nearly equal numbers of charges. The atmospheric pressure non-equilibrium plasma is widely applied to the aspects of material modification, water treatment, air purification, disinfection and preservation, biological medical treatment and the like because the atmospheric pressure non-equilibrium plasma is low in temperature, rich in active species such as high-energy electrons, ions, excited state atoms, molecules, free radicals and the like, and the active ingredients are easy to react with contacted substances.
In the prior art, a plasma generator mainly adopts a high-voltage power supply to directly act on a metal electrode plate, so as to generate plasma.
However, in the method for obtaining plasma in the prior art, the metal plate electrode is exposed in the air for a long time and is easily affected by the environment for a long time, oxidation reaction occurs on the surface of the metal plate electrode, and the surface of the electrode is corroded. Therefore, the method for obtaining the plasma in the prior art has the problems that the surface of the electrode is corroded, the normal discharge of the electrode is influenced, and the service life of a plasma generator is shortened.
Disclosure of Invention
The invention aims to solve the problems that the surface of a metal discharge electrode is easy to corrode, the normal discharge of the electrode is influenced, and the service life of a plasma generator is shortened in the prior art.
In order to achieve the above purpose, the embodiment of the present invention adopts the following technical solutions:
in a first aspect, the present invention provides a method for manufacturing a plasma discharge electrode, including:
a method for manufacturing a plasma discharge electrode comprises the following steps:
the metal layer is a metal plate; wherein the metal plate is a high-temperature-resistant metal plate;
forming a protective layer on the surface of the metal layer; the protective layer uniformly wraps the surface of the metal layer;
and in the forming process of the protective layer, a dielectric layer is uniformly attached to the surface of the protective layer.
Optionally, a pin is connected to an edge of the metal plate, and one end of the pin, which is far away from the metal plate, is not covered by the protective layer.
Optionally, the thickness of the metal plate is 1-2 mm.
Optionally, the dielectric layer includes a catalyst.
Optionally, the catalyst is a metal oxide particle.
In a second aspect, the present invention also discloses a plasma discharge electrode plate, including:
the metal layer is a metal plate; wherein the metal plate is a high-temperature-resistant metal plate;
the protective layer wraps the surface of the metal layer;
and the catalyst in the dielectric layer is uniformly attached to the protective layer.
The invention has the beneficial effects that: a method for manufacturing a plasma discharge electrode comprises the following steps: the metal layer is a metal plate; wherein the metal plate is a high-temperature-resistant metal plate; forming a protective layer on the surface of the metal layer; the protective layer uniformly wraps the surface of the metal layer; and in the forming process of the protective layer, a dielectric layer is uniformly attached to the surface of the protective layer. In other words, the surface of the metal electrode plate is wrapped by the protective layer, and the catalyst is attached to the surface of the protective layer, so that the metal plate of the plasma discharge electrode is protected, the service life of the plasma generator is prolonged, and the discharge efficiency of the plasma is further improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
Fig. 1 is a schematic flow chart illustrating a method for manufacturing a plasma discharge electrode according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a plasma discharge electrode according to another embodiment of the present invention;
fig. 3 is a schematic structural diagram of another plasma discharge electrode according to another embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings or the orientations or positional relationships that the products of the present invention are conventionally placed in use, and are only used for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," "third," and the like are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance.
Furthermore, the terms "horizontal", "vertical" and the like do not imply that the components are required to be absolutely horizontal or pendant, but rather may be slightly inclined. For example, "horizontal" merely means that the direction is more horizontal than "vertical" and does not mean that the structure must be perfectly horizontal, but may be slightly inclined.
In the description of the present invention, it should also be noted that, unless otherwise explicitly specified or limited, the terms "disposed," "mounted," "connected," and "connected" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
The terms to which the present invention relates will be explained first:
plasma: plasmas are aggregates consisting of charged positive and negative particles (including positive ions, negative ions, electrons, radicals, reactive radicals, etc.), wherein the positive and negative charges are equal in magnitude, so called plasmas, which are macroscopically electrically neutral. The plasma, which is composed of electrons, ions, radicals, and neutral particles, is a conductive fluid and generally maintains electrical neutrality.
Fig. 1 is a schematic flow chart illustrating a method for manufacturing a plasma discharge electrode according to an embodiment of the present invention; FIG. 2 is a schematic structural diagram of a plasma discharge electrode according to another embodiment of the present invention; fig. 3 is a structural diagram of another plasma discharge electrode according to another embodiment of the present invention. The following will explain the apparatus for treating high-temperature exhaust gas according to the embodiment of the present invention in detail with reference to fig. 1 to 3.
The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention.
It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
The embodiment of the invention provides a manufacturing method of a plasma discharge electrode, which is applied to waste gas treatment equipment. The steps involved in the method are described in detail below with reference to fig. 1.
Step 101: the metal layer is a metal plate;
wherein the metal plate is a high temperature resistant metal plate.
In the embodiment of the invention, the thickness of the metal plate is 1-2 mm. Illustratively, the shape of the metal plate may be a flat plate, a cylinder, a sphere, etc., and the metal plate may be tellurium copper, chromium zirconium copper, or melt metal.
Optionally, a pin is connected to an edge of the metal plate, and the pin is disposed at an end far from the metal plate.
In the embodiment of the invention, the pin is used for being connected with a high-voltage power supply. For example, a pin of one metal plate is connected to a positive electrode of a high voltage power supply, and a pin of one metal plate is connected to a negative electrode of the high voltage power supply, thereby forming plasma between the two electrode plates.
Step 102: and forming a protective layer on the surface of the metal layer.
Wherein, the protective layer is evenly coated on the surface of the metal layer.
In the embodiment of the invention, the protective layer is made of quartz glass, the quartz glass is sleeved on the surface of the metal plate, and the quartz glass is further melted in the environment with the temperature of 1100-1200 ℃, so that the quartz glass is only completely attached to the surface of the metal plate. Namely, the protective layer uniformly wraps the surface of the metal layer.
The quartz glass is tightly wrapped on the surface of the metal plate, so that the corrosion phenomenon of the surface of the metal plate caused by long-term oxidation-reduction reaction of the metal plate with air or contact with moisture in the air is avoided, and the discharge of the metal plate is influenced. In the process of wrapping the metal plate by the quartz glass, special attention is paid to the fact that one end, far away from the metal plate, of the pin is not wrapped by the protective layer, and therefore the metal plate can work normally and discharge under the action of the high-voltage power supply.
And 103, in the forming process of the protective layer, uniformly adhering a dielectric layer on the surface of the protective layer.
In the embodiment of the present invention, the dielectric layer includes a catalyst, and the catalyst is metal oxide particles, for example, the catalyst may be titanium dioxide, iron oxide, nickel oxide, copper oxide, and the like, wherein the metal oxide may be a micro-scale or nano-scale metal oxide.
Illustratively, in the process of wrapping the metal plate by the quartz glass at a high temperature, a catalyst is sprayed on the surface of the quartz glass in a molten state of the protective layer by adopting a spraying mode, so that the generation rate of plasma and the subsequent exhaust gas treatment speed are increased.
The embodiment of the invention discloses a manufacturing method of a plasma discharge electrode, which comprises the following steps: the metal layer is a metal plate; wherein the metal plate is a high-temperature resistant metal plate; forming a protective layer on the surface of the metal layer; wherein, the protective layer uniformly wraps the surface of the metal layer; and in the process of forming the protective layer, a dielectric layer is uniformly adhered to the surface of the protective layer. In other words, the surface of the metal electrode plate is wrapped by the protective layer, and the catalyst is attached to the surface of the protective layer, so that the metal plate of the plasma discharge electrode is protected, the service life of the plasma generator is prolonged, and the discharge efficiency of the plasma is further improved.
In another possible embodiment, the present invention further provides a heat dissipation cooling device, as shown in fig. 2, a schematic structural diagram of the plasma discharge electrode, including: metal layer 1, protective layer 2, dielectric layer 3 and high voltage power supply 4.
In the embodiment of the invention, the protective layer 2 is made of quartz glass, the high-temperature-resistant metal layer 1 is selected, the quartz glass tube is sleeved on the metal layer 1, the quartz glass tube sleeved on the metal layer 1 is melted at the temperature of 1000-1200 ℃, the catalyst is uniformly sprayed on the dielectric layer 3 under the condition that the quartz glass is determined to be melted, and finally the quartz glass attached with the catalyst is arranged on the surface of the cooled and shaped metal plate. The high-voltage power supply 4 is connected with the pins of the metal plates, and under the action of the catalyst, plasma is rapidly generated between the two metal plates.
In the embodiment of the invention, the plasma discharge electrode is disclosed, wherein a protective layer is formed on the surface of a high-temperature resistant metal layer 1; the protective layer 2 uniformly wraps the surface of the metal layer; in the process of forming the protective layer, a dielectric layer 3 is uniformly adhered on the surface of the protective layer. In other words, the surface of the metal electrode plate is wrapped by the protective layer, and the catalyst is attached to the surface of the protective layer, so that the metal plate of the plasma discharge electrode is protected, the service life of the plasma generator is prolonged, and the discharge efficiency of the plasma is further improved.
Fig. 3 is a schematic view of a plasma discharge electrode structure provided in another embodiment of the present invention. The device includes: a metal layer 31 which is a metal plate; wherein the metal plate is a high-temperature resistant metal plate;
the protective layer 32 wraps the surface of the metal layer;
and a dielectric layer 33, wherein the catalyst in the dielectric layer is uniformly attached on the protective layer.
It should be noted that, for the descriptions of the same steps and the same contents in this embodiment as those in other embodiments, reference may be made to the descriptions in other embodiments, which are not described herein again.
In an embodiment of the present invention, a schematic structural diagram of a plasma discharge electrode plate in the present invention includes: a metal layer 31, a protective layer 32 and a dielectric layer 33,
a metal layer 31 which is a metal plate; wherein the metal plate is a high-temperature resistant metal plate;
the protective layer 32 wraps the surface of the metal layer;
and a dielectric layer 33, wherein the catalyst in the dielectric layer is uniformly attached on the protective layer.
In the embodiment of the invention, a plasma discharge electrode structure schematic diagram is disclosed, which comprises: a metal layer 31 which is a metal plate; wherein the metal plate is a high-temperature resistant metal plate; the protective layer 32 wraps the surface of the metal layer; and a dielectric layer 33, wherein the catalyst in the dielectric layer is uniformly attached on the protective layer. In other words, the surface of the metal electrode plate is wrapped by the protective layer, and the catalyst is attached to the surface of the protective layer, so that the metal plate of the plasma discharge electrode is protected, the service life of the plasma generator is prolonged, and the discharge efficiency of the plasma is further improved.
In the embodiments provided in the present invention, it should be understood that the disclosed apparatus and method may be implemented in other ways. For example, the above-described apparatus embodiments are merely illustrative, and for example, a division of a unit is merely a logical division, and an actual implementation may have another division, for example, a plurality of units or components may be combined or integrated into another system, or some features may be omitted, or not executed. In addition, the shown or discussed mutual coupling or direct coupling or communication connection may be an indirect coupling or communication connection through some interfaces, devices or units, and may be in an electrical, mechanical or other form.
In addition, functional units in the embodiments of the present invention may be integrated into one processing unit, or each unit may exist alone physically, or two or more units are integrated into one unit. The integrated unit can be realized in a form of hardware, or in a form of hardware plus a software functional unit.
The integrated unit implemented in the form of a software functional unit may be stored in a computer readable storage medium. The software functional unit is stored in a storage medium and includes several instructions to enable a computer device (which may be a personal computer, a server, or a network device) or a processor (processor) to execute some steps of the methods according to the embodiments of the present invention. And the aforementioned storage medium includes: a U disk, a removable hard disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a magnetic disk or an optical disk, and other various media capable of storing program codes.
Claims (6)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010746985.8A CN114071850A (en) | 2020-07-29 | 2020-07-29 | Method for manufacturing plasma discharge electrode |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202010746985.8A CN114071850A (en) | 2020-07-29 | 2020-07-29 | Method for manufacturing plasma discharge electrode |
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| CN114071850A true CN114071850A (en) | 2022-02-18 |
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| CN202010746985.8A Pending CN114071850A (en) | 2020-07-29 | 2020-07-29 | Method for manufacturing plasma discharge electrode |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1283076A (en) * | 1999-07-27 | 2001-02-07 | 松下电工株式会社 | Electrode used for producing plasme body, plasma body processing equipment using said dectrode and plasma body processing using said equipment |
| CN1452448A (en) * | 2002-04-15 | 2003-10-29 | 乐金电子(天津)电器有限公司 | Multiple plasma generating device |
| JP2012204201A (en) * | 2011-03-25 | 2012-10-22 | Osaka Gas Co Ltd | Method for manufacturing dielectric barrier discharging electrode |
| WO2017061735A1 (en) * | 2015-10-05 | 2017-04-13 | (주)에프티넷 | Hybrid dielectric barrier discharge electrode using surface discharge and spatial discharge simultaneously |
| CN106714436A (en) * | 2016-12-15 | 2017-05-24 | 南京克普医疗科技有限公司 | Normal-temperature atmospheric-pressure plasma discharge electrode |
| CN206517656U (en) * | 2017-01-23 | 2017-09-22 | 中科新天地（合肥）环保科技有限公司 | A kind of sparking electrode for plasma generator |
-
2020
- 2020-07-29 CN CN202010746985.8A patent/CN114071850A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1283076A (en) * | 1999-07-27 | 2001-02-07 | 松下电工株式会社 | Electrode used for producing plasme body, plasma body processing equipment using said dectrode and plasma body processing using said equipment |
| CN1452448A (en) * | 2002-04-15 | 2003-10-29 | 乐金电子(天津)电器有限公司 | Multiple plasma generating device |
| JP2012204201A (en) * | 2011-03-25 | 2012-10-22 | Osaka Gas Co Ltd | Method for manufacturing dielectric barrier discharging electrode |
| WO2017061735A1 (en) * | 2015-10-05 | 2017-04-13 | (주)에프티넷 | Hybrid dielectric barrier discharge electrode using surface discharge and spatial discharge simultaneously |
| CN106714436A (en) * | 2016-12-15 | 2017-05-24 | 南京克普医疗科技有限公司 | Normal-temperature atmospheric-pressure plasma discharge electrode |
| CN206517656U (en) * | 2017-01-23 | 2017-09-22 | 中科新天地（合肥）环保科技有限公司 | A kind of sparking electrode for plasma generator |
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Application publication date: 20220218 |