CN206993471U - A kind of plasma producing apparatus corona electrode - Google Patents
A kind of plasma producing apparatus corona electrode Download PDFInfo
- Publication number
- CN206993471U CN206993471U CN201720481904.XU CN201720481904U CN206993471U CN 206993471 U CN206993471 U CN 206993471U CN 201720481904 U CN201720481904 U CN 201720481904U CN 206993471 U CN206993471 U CN 206993471U
- Authority
- CN
- China
- Prior art keywords
- titanium plate
- electrode
- corona electrode
- punching press
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000010936 titanium Substances 0.000 claims abstract description 101
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 99
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 99
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 36
- 238000005530 etching Methods 0.000 claims abstract description 24
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 16
- 238000004080 punching Methods 0.000 claims abstract description 15
- 238000012545 processing Methods 0.000 claims abstract description 5
- 229910000048 titanium hydride Inorganic materials 0.000 claims description 8
- 238000005516 engineering process Methods 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 8
- 238000002360 preparation method Methods 0.000 abstract description 7
- 238000001459 lithography Methods 0.000 abstract description 2
- 238000003672 processing method Methods 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 34
- 229920002120 photoresistant polymer Polymers 0.000 description 20
- 238000007747 plating Methods 0.000 description 17
- 238000004140 cleaning Methods 0.000 description 16
- 239000007789 gas Substances 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000008367 deionised water Substances 0.000 description 12
- 229910021641 deionized water Inorganic materials 0.000 description 12
- 229910002666 PdCl2 Inorganic materials 0.000 description 11
- 238000004506 ultrasonic cleaning Methods 0.000 description 11
- 238000007654 immersion Methods 0.000 description 7
- 238000002604 ultrasonography Methods 0.000 description 7
- WTDHULULXKLSOZ-UHFFFAOYSA-N Hydroxylamine hydrochloride Chemical compound Cl.ON WTDHULULXKLSOZ-UHFFFAOYSA-N 0.000 description 6
- 230000004913 activation Effects 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000011259 mixed solution Substances 0.000 description 5
- 206010052428 Wound Diseases 0.000 description 4
- 208000027418 Wounds and injury Diseases 0.000 description 4
- 239000003638 chemical reducing agent Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000007788 roughening Methods 0.000 description 4
- NWZSZGALRFJKBT-KNIFDHDWSA-N (2s)-2,6-diaminohexanoic acid;(2s)-2-hydroxybutanedioic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O.NCCCC[C@H](N)C(O)=O NWZSZGALRFJKBT-KNIFDHDWSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000023555 blood coagulation Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 3
- 239000008280 blood Substances 0.000 description 2
- 210000004369 blood Anatomy 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000004089 microcirculation Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- 208000017667 Chronic Disease Diseases 0.000 description 1
- 241001391944 Commicarpus scandens Species 0.000 description 1
- 101150003085 Pdcl gene Proteins 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000001580 bacterial effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000000645 desinfectant Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 231100000957 no side effect Toxicity 0.000 description 1
- 230000035764 nutrition Effects 0.000 description 1
- 235000016709 nutrition Nutrition 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 230000000472 traumatic effect Effects 0.000 description 1
Landscapes
- Chemically Coating (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Abstract
The utility model provides a kind of plasma producing apparatus corona electrode, and the preparation method of the corona electrode mainly includes：It is cleaned and dried overlay film etch cleaner and dries punching press overlay film；The invention develops a kind of etching, punching press and plated film new technology, the technique is using titanium plate as base material, cylindrical electrode shape is gone out by lithography first, then punching press is carried out to cylindrical electrode to prepare pointed shape, the processing method can ensure that the precision of the processing of each point of discharge, the uniformity of electric discharge is improved, reduces the size of sparking electrode；In addition, corona electrode of the present utility model plates one layer of platinum than the electrode produced by the method for plated film on the Ti electrode surface for having projection, so as to increase the stability of the service life of electrode and electric discharge.
Description
Technical field
Plasma discharge technical field is the utility model is related to, more particularly to a kind of plasma producing apparatus corona
Electrode.
Background technology
Plasma is that complete ionization or partial ionization, charge number are bordering on equal positive negative charged particles and neutral particle
Material aggregation state.Plasma can produce active component, cause conventional chemical to be difficult to the physical change and change realized in reacting
Learn reaction.Atmospheric non-equilibrium plasma because its temperature is low, and rich in high energy electron, ion, excited atom, molecule and
Free radical isoreactivity species, these active components are easy to the substance reaction with contacting, therefore are widely used in material modification, water
Processing, purification of air, disinfectant fresh-keeping, biologic medical etc..
2006, Fridman reported that low temperature plasma has the function that to remarkably promote blood coagulation first, it is indicated that low temperature etc. from
Daughter is used for the benefit of blood coagulation actual treatment.By research closely about ten years, people's plasma promotes the mechanism of blood coagulation to have
The understanding that is apparent from.Researcher also found that Topically active plasma composition can efficiently reduce the bacterium on wound face
Amount, stimulated by the depth of electric field, promote blood microcirculation, improve the oxygen of wound tissue and the supply of nutrition.Profound
The reduction of blood microcirculation and local bacterial is stimulated, activation body causes the self-healing ability of damage to chronic disease.
Because lower temperature plasma technology treat wound has compared to conventional medicament, quick, the advantage such as have no side effect,
Therefore there are good market prospects.Corona discharge is because its is simple in construction, be easy to equipment miniaturization and plasma can be directly
It is applied on skin, is likely to become the mainstream technology of following Related product.However, the electric discharge device of current application is all fixed electricity
Pole structure, fine wire is as corona electrode, it is easy to be broken, the life-span mostly at three to six months, such as：Chinese invention patent
Application No. 200710038821.4, denomination of invention《Assembly modular type systyle electrostatic field device》.Zigzag or prong shape knot
Although the corona electrode of structure is not easily broken, tip long-time is discharged, heating and ion sputtering double action, is caused sophisticated easy
In passivation, micro-arc discharge phenomenon also easily occurs.Slim banding corona electrode is not easy to break, and can obtain similar fine wire
Discharge effect, still, breach easily occurs in band electrode, forms local micro discharge, such as：Please number be in Chinese invention patent
200910263798.8 denomination of invention《Metal tape -- plate structure reactor》.Four kinds of presently most used corona electrodes of the above are equal
The problem of Uniform discharge is also poor and electrode life is short be present, often only some months is, it is necessary to inspect periodically and change corona
Electrode, maintenance cost is high, once safeguarding not in time, fracture of wire occurs and fails, or local micro discharge occurs, and seriously constrains it
Popularization and application, therefore, it is most important to develop a kind of corona discharge electrode of long-life.
The content of the invention
The purpose of this utility model seeks to provide a kind of plasma producing apparatus corona electrode, the utility model system
There is the advantages of Uniform discharge is good, and discharge life is long and stability is good for the corona electrode gone out.
To achieve the above object, the utility model is achieved by the following scheme：
A kind of plasma producing apparatus corona electrode, it is characterised in that the electrode includes：One piece of thickness is 1~2mm
Titanium plate, the sheet titanium plate (1) being sized to；To the cylindrical electrode gone out by etching and processing on titanium plate (1) surface
Shape punching press, extrude pointed shape (2)；Metastable TiH2 films are precipitated on titanium plate surface；TiH2 films on titanium plate surface
One layer of platinum of upper plating, i.e., described corona electrode.
The thickness of described titanium plate is 1.5mm.
A height of 150 μm -300 μm of described pointed shape (2).
A kind of plasma producing apparatus corona electrode, it is characterised in that the preparation method of the electrode includes following step
Suddenly：
(1) titanium plate that one piece of thickness is 1~2mm, the sheet titanium plate being sized to are taken；
(2) the sheet titanium plate of step (1) is placed in the ultrasonic cleaning tank for filling 4wt%-7wt%NaOH solution and surpassed
Sound is cleaned, and cleaning is first rinsed after terminating with deionized water, is then dried up titanium plate with the compressed gas of cleaning；
(3) one layer of negative photoresist is coated in the titanium plate surface that step (2) obtains, mask is placed in photoresist afterwards
On, and carry out the exposure of photoresist；
(4) the unexposed photoresist in step (3) titanium plate surface is washed away, and is carved using plasma etching technology on titanium plate surface
Lose required pattern, the etching depth of the etching is 50~300 μm；
(5) photoresist on titanium plate surface is removed, then the titanium plate after etching is placed in ultrasonic cleaning tank and carries out ultrasound clearly
40~60min is washed, and cleaning is first rinsed after terminating with deionized water, then titanium plate is dried up with the compressed gas of cleaning；
(6) punching press is carried out to the position of titanium plate surface exposure, cylindrical end face pressure is gone out pointed shape；
(7) it is first 3 with volume ratio by the titanium plate after punching press：1 HNO3- HF mixed solutions are embathed to remove titanium-based table
The oxide layer in face and other metal impurities, it is then 3 with volume ratio:1 HCl-H2SO4Solution performs etching to titanium plate surface
So as to its surface roughening and make titanium plate surface precipitate metastable TiH2Film, afterwards using PdCl2Solution soaks one section of titanium plate
Time so that titanium plate activation, is cleaned with deionized water after activation, is dried up titanium plate with compressed gas；
(8) dry titanium plate is put into coating bath, one layer of platinum is plated on titanium plate surface using platiniferous plating solution, then by after plated film
Titanium plate material cleans up, and is dried up with compressed gas, is placed in 60~120min of thermal decomposition in 400~600 DEG C of atmosphere afterwards, finally
Cool down and produce the corona electrode.
Wherein, the time being cleaned by ultrasonic in the step (2) is 30~40min, and temperature control is at 35 DEG C~60 DEG C.
HNO is used in the step (7)3The time that-HF mixed solutions are embathed to titanium plate is 30~60min, temperature
Control is at 35~70 DEG C.
HCl-H is used in the step (7)2SO4The temperature that solution performs etching be 60~80 DEG C, the time be 20~
40min。
PdCl in the step (7)2The concentration of solution is 0.1g/L, using PdCl2The time of solution immersion for 20~
50min。
Platiniferous plating solution is the Pt (NO that concentration is 0.5g/L in the step (8)2)2(NH3)2Solution, used during platinum plating
Reducing agent be the hydrazine hydrate that concentration is 12g/L and/or the hydroxylamine hydrochloride that concentration is 5g/L, the control of platinum plating process temperature 40~
60℃。
In addition, the corona electrode that the preparation method is prepared is also claimed in the utility model.
And the utility model also protects application of the corona electrode in plasma producing apparatus；The plasma
Body generating means is used for the treatment of traumatic wounds.
The beneficial effects of the utility model are：The utility model develops a kind of etching, punching press and plated film new technology, should
Technique goes out cylindrical electrode shape by lithography first using titanium plate as base material, then to cylindrical electrode carry out punching press with
Pointed shape is prepared, the processing method can ensure that the precision of the processing of each point of discharge, improve the uniformity of electric discharge, and reduction is put
The size of electrode；In addition, the utility model also plates one layer of platinum by the method for plated film on the Ti electrode surface for having projection, so as to
Increase the service life of electrode and the stability of electric discharge.
Below in conjunction with accompanying drawing, the utility model is described in further detail by specific embodiment
Brief description of the drawings
The flow chart that Fig. 1 the utility model corona electrode makes；
The top view of electrode made by Fig. 2 the utility model；
The front view of electrode made by Fig. 3 the utility model；
Embodiment
The technical scheme in the embodiment of the utility model will be clearly and completely described below, it is clear that described
Embodiment is only the utility model part of the embodiment, rather than whole embodiments.Based on the implementation in the utility model
Example, the every other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, is belonged to
The scope of the utility model protection.
Embodiment 1
A kind of plasma producing apparatus corona electrode, the preparation method of the electrode, comprises the following steps：
(1) titanium plate that one piece of thickness is about 1.5mm is taken, the sheet titanium plate 1 being sized to；
(2) plate of sheet titanium 1 of step (1) is placed in the ultrasonic cleaning tank for filling 5wt%NaOH solution and carries out ultrasound clearly
Wash, cleaning is first rinsed after terminating with deionized water, is then dried up titanium plate with the compressed gas of cleaning；The ultrasonic cleaning
Time be 35min, temperature control is at 50 DEG C；
(3) one layer of negative photoresist is coated in the titanium plate surface that step (2) obtains, mask is placed in photoresist afterwards
On, and carry out the exposure of photoresist；
(4) the unexposed photoresist in step (3) titanium plate surface is washed away, and is carved using plasma etching technology on titanium plate surface
Lose required pattern, the etching depth of the etching is about 200 μm；
(5) photoresist on titanium plate surface is removed, then the titanium plate after etching is placed in ultrasonic cleaning tank and carries out ultrasound clearly
50min is washed, and cleaning is first rinsed after terminating with deionized water, then titanium plate is dried up with the compressed gas of cleaning；
(6) punching press is carried out to the position of titanium plate surface exposure, cylindrical end face pressure is gone out pointed shape 2；
(7) it is first 3 with volume ratio by the titanium plate after punching press：1 HNO3- HF mixed solutions are embathed to remove titanium-based table
The oxide layer in face and other metal impurities, the time embathed are 45min, then temperature control uses volume ratio at 50 DEG C
For 3:1 HCl-H2SO4Solution is performed etching to titanium plate surface so as to its surface roughening and make titanium plate surface precipitated phase to stable
TiH2Film, the temperature of the etching is 70 DEG C, time 30min, afterwards using PdCl2Solution immersion titanium plate for a period of time with
Activate titanium plate, the PdCl2The concentration of solution is 0.1g/L, using PdCl2The time of solution immersion is 30min, after activation
Cleaned with deionized water, dried up titanium plate with compressed gas；
(8) dry titanium plate is put into coating bath, one layer of platinum is plated on titanium plate surface using platiniferous plating solution, then by after plated film
Titanium plate material cleans up, and is dried up with compressed gas, is placed in afterwards in 500 DEG C of atmosphere and thermally decomposes 90min, finally cools down and produces institute
State corona electrode；Platiniferous plating solution is the Pt (NO that concentration is 0.5g/L2)2(NH3)2Solution, the reducing agent used during platinum plating for
Concentration is 12g/L hydrazine hydrate, and platinum plating process temperature is controlled at 50 DEG C.
Embodiment 2
A kind of plasma producing apparatus corona electrode, the preparation method of the preparation method of the electrode, including following step
Suddenly：
(1) titanium plate that one piece of thickness is about 1mm is taken, the sheet titanium plate 1 being sized to；
(2) the sheet titanium plate of step (1) is placed in the ultrasonic cleaning tank for filling 4wt%NaOH solution and carries out ultrasound clearly
Wash, cleaning is first rinsed after terminating with deionized water, is then dried up titanium plate with the compressed gas of cleaning；The ultrasonic cleaning
Time be 30min, temperature control is at 35 DEG C；
(3) one layer of negative photoresist is coated in the titanium plate surface that step (2) obtains, mask is placed in photoresist afterwards
On, and carry out the exposure of photoresist；
(4) the unexposed photoresist in step (3) titanium plate surface is washed away, and is carved using plasma etching technology on titanium plate surface
Lose required pattern, the etching depth of the etching is about 150 μm；
(5) photoresist on titanium plate surface is removed, then the titanium plate after etching is placed in ultrasonic cleaning tank and carries out ultrasound clearly
40min is washed, and cleaning is first rinsed after terminating with deionized water, then titanium plate is dried up with the compressed gas of cleaning；
(6) punching press is carried out to the position of titanium plate surface exposure, cylindrical end face pressure is gone out pointed shape 2；
(7) it is first 3 with volume ratio by the titanium plate after punching press：1 HNO3- HF mixed solutions are embathed to remove titanium-based table
The oxide layer in face and other metal impurities, the time embathed are 30min, then temperature control uses volume ratio at 35 DEG C
For 3:1 HCl-H2SO4Solution is performed etching to titanium plate surface so as to its surface roughening and make titanium plate surface precipitated phase to stable
TiH2Film, the temperature of the etching is 60 DEG C, time 20min, afterwards using PdCl2Solution immersion titanium plate for a period of time with
Activate titanium plate, the PdCl2The concentration of solution is 0.1g/L, using PdCl2The time of solution immersion is 20min, after activation
Cleaned with deionized water, dried up titanium plate with compressed gas；
(8) dry titanium plate is put into coating bath, one layer of platinum is plated on titanium plate surface using platiniferous plating solution, then by after plated film
Titanium plate material cleans up, and is dried up with compressed gas, is placed in afterwards in 400 DEG C of atmosphere and thermally decomposes 60min, finally cools down and produces institute
State corona electrode；Platiniferous plating solution is the Pt (NO that concentration is 0.5g/L2)2(NH3)2Solution, the reducing agent used during platinum plating for
Concentration is 5g/L hydroxylamine hydrochloride, and platinum plating process temperature is controlled at 40 DEG C.
Embodiment 3
A kind of plasma producing apparatus corona electrode, the preparation method of the electrode, comprises the following steps：
(1) titanium plate that one piece of thickness is about 2mm is taken, the sheet titanium plate 1 being sized to；
(2) the sheet titanium plate of step (1) is placed in the ultrasonic cleaning tank for filling 7wt%NaOH solution and carries out ultrasound clearly
Wash, cleaning is first rinsed after terminating with deionized water, is then dried up titanium plate with the compressed gas of cleaning；The ultrasonic cleaning
Time be 40min, temperature control is at 60 DEG C；
(3) one layer of negative photoresist is coated in the titanium plate surface that step (2) obtains, mask is placed in photoresist afterwards
On, and carry out the exposure of photoresist；
(4) the unexposed photoresist in step (3) titanium plate surface is washed away, and is carved using plasma etching technology on titanium plate surface
Lose required pattern, the etching depth of the etching is about 300 μm；
(5) photoresist on titanium plate surface is removed, then the titanium plate after etching is placed in ultrasonic cleaning tank and carries out ultrasound clearly
60min is washed, and cleaning is first rinsed after terminating with deionized water, then titanium plate is dried up with the compressed gas of cleaning；
(6) punching press is carried out to the position of titanium plate surface exposure, cylindrical end face pressure is gone out pointed shape 2；
(7) it is first 3 with volume ratio by the titanium plate after punching press：1 HNO3- HF mixed solutions are embathed to remove titanium-based table
The oxide layer in face and other metal impurities, the time embathed are 60min, then temperature control uses volume ratio at 70 DEG C
For 3:1 HCl-H2SO4Solution is performed etching to titanium plate surface so as to its surface roughening and make titanium plate surface precipitated phase to stable
TiH2Film, the temperature of the etching is 80 DEG C, time 40min, afterwards using PdCl2Solution immersion titanium plate for a period of time with
Activate titanium plate, the PdCl2The concentration of solution is 0.1g/L, using PdCl2The time of solution immersion is 50min, after activation
Cleaned with deionized water, dried up titanium plate with compressed gas；
(8) dry titanium plate is put into coating bath, one layer of platinum is plated on titanium plate surface using platiniferous plating solution, then by after plated film
Titanium plate material cleans up, and is dried up with compressed gas, is placed in afterwards in 600 DEG C of atmosphere and thermally decomposes 120min, finally cools down and produces
The corona electrode；Platiniferous plating solution is the Pt (NO that concentration is 0.5g/L2)2(NH3)2Solution, the reducing agent used during platinum plating
The hydroxylamine hydrochloride that the hydrazine hydrate and concentration for being 12g/L for concentration are 5g/L, platinum plating process temperature are controlled at 60 DEG C.
It is obvious to a person skilled in the art that the utility model is not limited to the details of above-mentioned one exemplary embodiment, and
And in the case of without departing substantially from spirit or essential attributes of the present utility model, it can realize that this practicality is new in other specific forms
Type.Therefore, no matter from the point of view of which point, embodiment all should be regarded as exemplary, and is nonrestrictive, this practicality is new
The scope of type limits by appended claims rather than described above, it is intended that the equivalency fallen in claim is contained
All changes in justice and scope are included in the utility model.
Moreover, it will be appreciated that although the present specification is described in terms of embodiments, not each embodiment is only wrapped
Containing an independent technical scheme, this narrating mode of specification is only that those skilled in the art should for clarity
Using specification as an entirety, the technical solutions in the various embodiments may also be suitably combined, forms those skilled in the art
It is appreciated that other embodiment.
Claims (3)
1. a kind of plasma producing apparatus corona electrode, it is characterised in that the electrode includes：
The titanium plate that one piece of thickness is 1~2mm, the sheet titanium plate (1) being sized to；
The cylindrical electrode shape punching press gone out by etching and processing to titanium plate (1) surface, extrude pointed shape (2)；
Metastable TiH2 films are precipitated on titanium plate surface；
One layer of platinum, i.e., described corona electrode are plated on the TiH2 films on titanium plate surface.
2. corona electrode according to claim 1, it is characterised in that the thickness of described titanium plate is 1.5mm.
3. corona electrode according to claim 1, it is characterised in that a height of 150 μm of -300 μ of described pointed shape (2)
m。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720481904.XU CN206993471U (en) | 2017-05-03 | 2017-05-03 | A kind of plasma producing apparatus corona electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720481904.XU CN206993471U (en) | 2017-05-03 | 2017-05-03 | A kind of plasma producing apparatus corona electrode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206993471U true CN206993471U (en) | 2018-02-09 |
Family
ID=61391981
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720481904.XU Active CN206993471U (en) | 2017-05-03 | 2017-05-03 | A kind of plasma producing apparatus corona electrode |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206993471U (en) |
-
2017
- 2017-05-03 CN CN201720481904.XU patent/CN206993471U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2738467B2 (en) | Ozone water production equipment | |
| US9117636B2 (en) | Plasma catalyst chemical reaction apparatus | |
| CN111010790A (en) | Dielectric barrier discharge plasma reactor and sterilizing device | |
| CN106572585B (en) | A kind of plasma generator | |
| CN114477362B (en) | A Plasma Activation Water Device Based on Piezoelectric Material | |
| JP2012146690A (en) | Cleaning method for electronic material and cleaning apparatus for electronic material | |
| DE60219506D1 (en) | METHOD FOR PRODUCING AN ULTRA-FINE AQUEOUS DISPERSION OF ULTRA-FINE PRECIOUS METAL PARTICLES | |
| CN117599218A (en) | A device and method for ultrasonic atomization micro-plasma discharge sterilization and disinfection | |
| JP7304882B2 (en) | System and method for ozone water generator | |
| CN206993471U (en) | A kind of plasma producing apparatus corona electrode | |
| CN105948372A (en) | Industrial sewage treatment technique and system based on high-voltage nanosecond pulsed electric field technology | |
| CN110149755A (en) | One kind not producing ozoniferous cold plasma generating device | |
| CN104891447B (en) | Half wet type efficient ozone method for generation of one kind and device | |
| CN108811288A (en) | A kind of plasma producing apparatus corona electrode and preparation method thereof | |
| JP2001191076A (en) | Production method of electrolytic water, washing water and washing method | |
| CN220900381U (en) | Device for preparing hydrogen peroxide from air by plasma | |
| CN103275342A (en) | Method for pulsed bias-assistant plasma high-speed treatment on organic film | |
| CN110430653A (en) | A kind of bilayer gas layout large area dielectric barrier discharge array apparatus | |
| CN105854759A (en) | Material surface low-temperature plasma modification method and device | |
| CN107275568B (en) | A kind of graphene-doped ruthenium dioxide-based porous electrode and preparation method thereof | |
| CN101250738B (en) | Photoelectrocatalysis oxidization preparation method for titanium alloy surface anticoagulant titanium white film | |
| CN216702414U (en) | Skin cleaning device | |
| CN116789230A (en) | An atmospheric pressure rotating sliding arc plasma sewage treatment device | |
| CN2437668Y (en) | HF magnetized ion water generator | |
| CN207076310U (en) | Honeycomb fashion plasma waste gas treatment equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20191104 Address after: 518026, A building, building 19, Shennan international road, Futian, Shenzhen, Futian District, Shenzhen, Guangdong, 1006, China Patentee after: SHENZHEN TIANJIQUAN HEALTH SCIENCE & TECHNOLOGY GROUP CO., LTD. Address before: 450008 Zhengzhou City, Jinshui District, Henan Road, No. 71, building No. 6, building No. 88 Patentee before: Release the leopard |
|
| TR01 | Transfer of patent right |