CN113956798A - Polycrystalline cerium oxide polishing solution for polishing microcrystalline glass and preparation method and application thereof - Google Patents
Polycrystalline cerium oxide polishing solution for polishing microcrystalline glass and preparation method and application thereof Download PDFInfo
- Publication number
- CN113956798A CN113956798A CN202111225307.8A CN202111225307A CN113956798A CN 113956798 A CN113956798 A CN 113956798A CN 202111225307 A CN202111225307 A CN 202111225307A CN 113956798 A CN113956798 A CN 113956798A
- Authority
- CN
- China
- Prior art keywords
- cerium oxide
- polishing
- polycrystalline
- particles
- polishing solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention provides a polycrystalline cerium oxide polishing solution for polishing glass ceramics, and a preparation method and application thereof, which are used for solving the technical problems of high processing difficulty, long polishing time, low polishing efficiency and poor polishing stability when the conventional polishing solution is used for polishing special glass ceramics-glass ceramics. The polycrystalline particles in the polycrystalline cerium oxide polishing solution comprise 50-100nm cerium oxide particles, the strength of the polycrystalline particles is low, the outer cutting edge is small, the polycrystalline particles are spherical, and deep scratches are not easily caused in the polishing process after the polycrystalline particles are inlaid on the surface of a polishing pad in the polishing process; in the polishing process, the cutting edge of the nano cerium oxide particle on the outer layer of the polycrystalline particle gradually falls off to generate a new cutting edge, so that the stability of the polishing efficiency is ensured and the service life of the polishing solution is prolonged; and the preparation method of the polycrystalline cerium oxide polishing solution is simple, convenient to operate and easy for modern industrial production.
Description
Technical Field
The invention relates to the technical field of chemical mechanical polishing, in particular to a polycrystalline cerium oxide polishing solution for polishing microcrystalline glass, and a preparation method and application thereof.
Background
In the information era, the popularization of 5G high-speed data transmission technology leads to the great outbreak of intelligent terminal products, and the demand of high-end cover plate glass with strong scratch resistance, strong drop resistance and high light transmittance in the terminal market is continuously increased.
In recent years, a special glass ceramic-glass ceramic has been developed, which is a base glass having a specific composition and containing a crystal nucleus agent (or not) and is subjected to crystallization heat treatment under a predetermined temperature system to uniformly precipitate a large number of fine crystals in the glass and form a dense multiphase complex of a fine crystal phase and a glass phase. By controlling the type number, size and the like of the microcrystal, transparent microcrystal glass, microcrystal glass with zero expansion coefficient, surface-strengthened microcrystal glass and different colors or machinable microcrystal glass can be obtained. The special glass ceramic-microcrystalline glass has the three characteristics, and is rapidly popularized as front cover glass in the smart phone market.
However, the new problem is also brought by the appearance of the new glass ceramic-glass ceramic, how to polish the glass ceramic-glass ceramic is the first problem faced by researchers, and in the research, the researchers use the nano cerium oxide polishing solution for glass polishing and the polishing solution in the preparation method thereof, as disclosed in the Chinese invention patent 'publication No. CN110358453A, published 2019.10.22', the existing polishing solution has a good polishing effect corresponding to the traditional aluminosilicate glass, but the special glass ceramic-glass ceramic has high hardness, so that the polishing time is long, the processing difficulty is large, the polishing efficiency is low, the polishing stability is poor, and the production efficiency of the glass ceramic-glass ceramic is greatly influenced.
The polishing of the special glass ceramic-glass ceramics by the existing polishing solution is continued, which not only affects the productivity, but also increases other risks due to long-time processing. Therefore, the industrial production urgently needs a high-efficiency stable polishing solution suitable for polishing glass ceramic-glass ceramics.
Disclosure of Invention
Aiming at the technical problems of high processing difficulty, long polishing time, low polishing efficiency and poor polishing stability of the existing polishing solution when the existing polishing solution polishes special glass ceramic-microcrystalline glass, the invention provides the polycrystalline cerium oxide polishing solution for polishing the microcrystalline glass, the preparation method and the application thereof, polycrystalline particles in the polycrystalline cerium oxide polishing solution comprise 50-100nm cerium oxide particles, the strength of the polycrystalline particles is low, the outer cutting edge is small, the polycrystalline particles are spherical, and after the surface of a polishing pad is embedded in the polishing process, deep scratches are not easily caused in the polishing process; in the polishing process, the cutting edge of the nano cerium oxide particle on the outer layer of the polycrystalline particle gradually falls off to generate a new cutting edge, so that the stability of the polishing efficiency is ensured and the service life of the polishing solution is prolonged; and the preparation method of the polycrystalline cerium oxide polishing solution is simple, convenient to operate and easy for modern industrial production.
In order to achieve the purpose, the technical scheme of the invention is realized as follows:
the polishing solution consists of polycrystalline cerium oxide particles, deionized water, a pH regulator, a dispersant, a suspending agent and a defoaming agent, wherein the polycrystalline cerium oxide particles are prepared from cerium oxide particles, low-melting-point glass powder, the dispersant and the deionized water.
Preferably, the polycrystalline cerium oxide particles are prepared by grinding and centrifugally spraying a suspension prepared from 10-14% by mass of cerium oxide particles, 6-10% by mass of low-melting-point glass powder, 0.5% by mass of a dispersing agent and 79.5% by mass of deionized water for granulation.
Preferably, the polishing solution comprises, by mass, 20 to 30% of polycrystalline cerium oxide particles, 67 to 79% of deionized water, 0.2 to 0.3% of a pH regulator, 0.2 to 1% of a dispersant, 0.5 to 2% of a suspending agent, and 0.01 to 0.02% of an antifoaming agent.
Preferably, the content of cerium oxide in the cerium oxide particles is more than or equal to 99%, the average particle size of the cerium oxide particles is 1-2um, the low-melting-point glass powder is borosilicate glass powder, and the average particle size of the low-melting-point glass powder is 1-2 um.
Preferably, the dispersant for preparing the polycrystalline cerium oxide particles is absolute ethyl alcohol, ethylene glycol, polyethylene glycol 200 or polyethylene glycol 400, and the grain size of the polycrystalline cerium oxide particles is 20-40 um.
Preferably, the pH regulator is an inorganic base or an organic base, the inorganic base comprises potassium hydroxide and sodium hydroxide, the organic base comprises triethanolamine, diethanolamine and ethanolamine, the suspension is inorganic, cellulosic or natural gum, the inorganic base comprises bentonite, the cellulosic comprises methylcellulose, carboxyl cellulose, carboxyethyl cellulose and carboxypropyl methylcellulose, the natural gum comprises guar, arabic gum, pectin, agar and carrageenan,
preferably, the dispersant for forming the polishing solution is glycerol, glycol, polyethylene glycol 200 or polyethylene glycol 400, the defoaming agent is organic silicon or polyether, the organic silicon comprises polydimethylsiloxane, and the polyether comprises glycerol polyether and polyoxyethylene ether.
A preparation method of polycrystalline cerium oxide polishing solution for polishing microcrystalline glass comprises the following steps:
s1, preparing suspension from 1-2um cerium oxide particles, 1-2um low-melting-point glass powder particles, a dispersing agent and deionized water, sanding the suspension to 50-100nm by using a sand mill, and filtering the suspension for later use;
s2, spray drying the suspension liquid after sanding in the step S1 to prepare spherical particles of 20-40 um;
s3, preserving the heat of the dried spherical particles in the step S2 in a high-temperature furnace to obtain heat-treated spherical particles;
s4, screening the spherical particles subjected to the heat treatment in the step S3, and removing the adhered particles and the super-sized particles to obtain polycrystalline cerium oxide particles with the particle size of 20-40 um;
and S5, mixing and stirring the polycrystalline cerium oxide particles obtained in the step S4 with deionized water, a suspending agent, a pH regulator, a dispersing agent and a defoaming agent to obtain the polycrystalline cerium oxide polishing solution.
Preferably, the concentration of the suspension in the step S1 is 20%, the temperature of the high temperature furnace in the step S3 is 400-550 ℃, and the holding time is 2 h.
The application of the polycrystalline cerium oxide polishing solution for polishing the glass ceramics-glass ceramics is disclosed.
The invention has the beneficial effects that:
1. according to the polycrystalline cerium oxide polishing solution prepared by the invention, the bonding effect of the low-melting-point glass powder in a molten state is used for combining cerium oxide particles into the polycrystalline cerium oxide particles, wherein the polycrystalline particles comprise cerium oxide particles with the particle size of 50-100nm, the strength of the polycrystalline particles is low, the outer layer cutting edge of the particles is small, the surface of glass ceramic-microcrystalline glass is not easily scratched deeply in the polishing process, and the polishing effect is ensured.
2. In the polycrystalline cerium oxide polishing solution prepared by the invention, the polycrystalline particles are formed by bonding 50-100nm cerium oxide particles through low-melting-point glass powder in a molten state, in the polishing process, cutting edges of the nano cerium oxide particles at the outermost layer in the polycrystalline particles gradually fall off to generate new cutting edges, and the surface of the glass ceramic-microcrystalline glass is continuously polished to ensure the stability of the polishing efficiency during each polishing, so that the service life of the polishing solution is prolonged.
3. The polycrystalline particles in the polycrystalline cerium oxide polishing solution prepared by the invention are spherical, and after the polycrystalline cerium oxide particles are inlaid on the surface of a polishing pad in the polishing process and are contacted with the surface of glass ceramic-glass ceramics, the contact part has low sharpness, so that deep scratches are not easily caused, and the polishing effect is further ensured.
4. The preparation method of the invention adopts the method of frosting and spray granulation to prepare the polycrystalline cerium oxide particles, has simple operation and high production efficiency, and is easy for modern industrial production.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be obtained by a person skilled in the art without inventive effort based on the embodiments of the present invention, are within the scope of the present invention.
Example 1
The polishing solution consists of polycrystalline cerium oxide particles, deionized water, a pH regulator, a dispersant, a suspending agent and a defoaming agent, wherein the polycrystalline cerium oxide particles are prepared from cerium oxide particles, low-melting-point glass powder, the dispersant and the deionized water.
In this example, the mass fractions of the respective components making up the polycrystalline cerium oxide particles are shown in the following table, wherein the dispersant is ethylene glycol.
In this example, the mass fractions of the components constituting the polishing solution are shown in the following table, in which the pH adjuster is diethanolamine in an organic base, the suspension is cellulose-based carboxyethyl cellulose, the dispersant is ethylene glycol, and the defoaming agent is silicone-based polydimethylsiloxane.
It should be noted that, in the embodiment, the content of cerium oxide in the cerium oxide particles is greater than or equal to 99%, the average particle size of the cerium oxide particles is 1 to 2um, the low-melting glass frit is borosilicate glass frit, the average particle size of the low-melting glass frit is 1 to 2um, and the particle size of the polycrystalline cerium oxide particles is 20 to 40 um.
According to the above-mentioned polycrystalline cerium oxide polishing solution for polishing glass ceramics, the present embodiment also provides a preparation method of the polycrystalline cerium oxide polishing solution for polishing glass ceramics, comprising the following steps:
s1, preparing 1-2um cerium oxide particles, 1-2um low-melting-point glass powder particles, a dispersing agent and deionized water into a suspension according to the required proportion, sanding the suspension to 50-100nm through a sand mill, and filtering for later use. Specifically, cerium oxide particles, low-melting-point glass powder and ethylene glycol are weighed according to the proportion shown in the table above, added into weighed deionized water to prepare 20% suspension, and then the suspension is subjected to sand grinding by a sand mill until the average particle size is 55nm, filtered by a 1um filter element and reserved after filtration.
S2, adjusting the technological parameters of the centrifugal spray dryer, and spray drying the suspension liquid after sanding in the step S1 to prepare spherical particles of 20-40 um. Specifically, a centrifugal spray dryer is used for spray granulation, the rotation speed of an atomizer is 20000rpm, the air inlet temperature is 180 ℃, and the air outlet temperature is 90 ℃.
S3, preserving the heat of the dried spherical particles in the step S2 in a high-temperature furnace to obtain the heat-treated spherical particles. Specifically, the granulated particles were put into a high temperature furnace, heated to 400 ℃ at a rate of 5 ℃ per minute, and heat-treated at 400 ℃ for 2 hours.
S4, screening the spherical particles subjected to the heat treatment in the step S3, and removing the adhered particles and the super-sized particles to obtain the polycrystalline cerium oxide particles with the particle size of 20-40 um. Specifically, after cooling to room temperature, the particles were collected and sieved through a 400-mesh sieve, and the undersize product was the polycrystalline cerium oxide particles.
And S5, mixing and stirring the polycrystalline cerium oxide particles obtained in the step S4 with deionized water, a suspending agent, a pH regulator, a dispersing agent and a defoaming agent to obtain the polycrystalline cerium oxide polishing solution. Specifically, the prepared polycrystalline cerium oxide particles are weighed according to the table above, added into a mixed solution of deionized water, triethanolamine, hydroxyethyl cellulose, ethylene glycol and a polydimethylsiloxane defoaming agent which are uniformly mixed in advance, and continuously stirred and ultrasonically dispersed for 10min to obtain the polycrystalline cerium oxide polishing solution for polishing the glass ceramics.
The embodiment also provides application of the polycrystalline cerium oxide polishing solution for polishing the microcrystalline glass, which is used for polishing a 6-inch microcrystalline glass cover plate, and is matched with a polyurethane polishing pad, so that the removal rate is about 1.3um/min, and the roughness is 0.6-0.7 nm. Under the same condition, the removal rate of the conventional 0.7um cerium oxide polishing solution is about 1.0um/min, and the roughness is 0.7-0.8 nm; the removal rate is increased by 30%.
Example 2
The mass fractions of the components of the polycrystalline cerium oxide particles prepared in this example are shown in the following table, wherein the dispersant is polyethylene glycol 200.
In this example, the mass fractions of the components constituting the polishing liquid are shown in the following table, in which the pH adjuster is potassium hydroxide in an inorganic base, the suspension is gum arabic of natural gum type, the dispersant is glycerin, and the defoaming agent is silicone polydimethylsiloxane.
It should be noted that, in the embodiment, the content of cerium oxide in the cerium oxide particles is greater than or equal to 99%, the average particle size of the cerium oxide particles is 1 to 2um, the low-melting glass frit is borosilicate glass frit, the average particle size of the low-melting glass frit is 1 to 2um, and the particle size of the polycrystalline cerium oxide particles is 20 to 40 um.
The embodiment also provides application of the polycrystalline cerium oxide polishing solution for polishing the microcrystalline glass, which is used for polishing a 6-inch microcrystalline glass cover plate, and is matched with a polyurethane polishing pad, so that the removal rate is about 1.4um/min, and the roughness is 0.6-0.7 nm. Under the same condition, the removal rate of the conventional 0.7um cerium oxide polishing solution is about 1.0um/min, and the roughness is 0.7-0.8 nm; the removal rate is increased by 40%.
Example 3
A preparation method of polycrystalline cerium oxide polishing solution for polishing microcrystalline glass comprises the following steps:
s1, preparing 1-2um cerium oxide particles, 1-2um low-melting-point glass powder particles, a dispersing agent and deionized water into a suspension according to the required proportion, sanding the suspension to 50-100nm through a sand mill, and filtering for later use. Specifically, cerium oxide particles, low-melting-point glass powder and polyethylene glycol 200 are weighed according to the proportion shown in the following table, added into weighed deionized water to prepare 20% suspension, and then the suspension is subjected to sand grinding by a sand mill until the average particle size is 100nm, filtered by a 1um filter element and reserved after filtration.
S2, adjusting the technological parameters of the centrifugal spray dryer, and spray drying the suspension liquid after sanding in the step S1 to prepare spherical particles of 20-40 um. Specifically, a centrifugal spray dryer is used for spray granulation, the rotation speed of an atomizer is 20000rpm, the air inlet temperature is 180 ℃, and the air outlet temperature is 90 ℃.
S3, preserving the heat of the dried spherical particles in the step S2 in a high-temperature furnace to obtain the heat-treated spherical particles. Specifically, the granulated particles were put into a high temperature furnace, heated to 550 ℃ at a rate of 5 ℃ per minute, and heat-treated at 550 ℃ for 2 hours.
S4, screening the spherical particles subjected to the heat treatment in the step S3, and removing the adhered particles and the super-sized particles to obtain the polycrystalline cerium oxide particles with the particle size of 20-40 um. Specifically, after cooling to room temperature, the particles were collected and sieved through a 400-mesh sieve, and the undersize product was the polycrystalline cerium oxide particles.
And S5, mixing and stirring the polycrystalline cerium oxide particles obtained in the step S4 with deionized water, a suspending agent, a pH regulator, a dispersing agent and a defoaming agent to obtain the polycrystalline cerium oxide polishing solution. Specifically, the prepared polycrystalline cerium oxide particles are weighed according to the following table, added into a mixed solution of deionized water, potassium hydroxide, Arabic gum, glycerol and a polydimethylsiloxane defoaming agent which are uniformly mixed in advance, and continuously stirred and ultrasonically dispersed for 10min to obtain the polycrystalline cerium oxide polishing solution for polishing the microcrystalline glass.
The embodiment also provides application of the prepared polycrystalline cerium oxide polishing solution for polishing the microcrystalline glass, which is used for polishing a 6-inch microcrystalline glass cover plate, and is matched with a polyurethane polishing pad, so that the removal rate is about 1.4um/min, and the roughness is 0.6-0.7 nm. Under the same condition, the removal rate of the conventional 0.7um cerium oxide polishing solution is about 1.0um/min, and the roughness is 0.7-0.8 nm; the removal rate is increased by 40%.
Example 4
The mass fractions of the components of the polycrystalline cerium oxide particles prepared in this example are shown in the following table, wherein the dispersant is absolute ethanol.
In this example, the mass fractions of the components constituting the polishing solution are shown in the following table, in which the pH adjuster is diethanolamine in an organic base, the suspension is inorganic bentonite, the dispersant is polyethylene glycol 200, and the defoaming agent is polyether polyoxyethylene ether.
It should be noted that, in the embodiment, the content of cerium oxide in the cerium oxide particles is greater than or equal to 99%, the average particle size of the cerium oxide particles is 1 to 2um, the low-melting glass frit is borosilicate glass frit, the average particle size of the low-melting glass frit is 1 to 2um, and the particle size of the polycrystalline cerium oxide particles is 20 to 40 um.
According to the above-mentioned polycrystalline cerium oxide polishing solution for polishing glass ceramics, the present embodiment also provides a preparation method of the polycrystalline cerium oxide polishing solution for polishing glass ceramics, comprising the following steps:
s1, preparing 1-2um cerium oxide particles, 1-2um low-melting-point glass powder particles, a dispersing agent and deionized water into a suspension according to the required proportion, sanding the suspension to 50-100nm through a sand mill, and filtering for later use. Specifically, cerium oxide particles, low-melting-point glass powder and absolute ethyl alcohol are weighed according to the proportion shown in the table above, added into weighed deionized water to prepare 20% suspension, and then the suspension is subjected to sanding by a sand mill until the average particle size is 70nm, filtered by a 1um filter element and reserved after filtration.
S2, adjusting the technological parameters of the centrifugal spray dryer, and spray drying the suspension liquid after sanding in the step S1 to prepare spherical particles of 20-40 um. Specifically, a centrifugal spray dryer is used for spray granulation, the rotation speed of an atomizer is 20000rpm, the air inlet temperature is 180 ℃, and the air outlet temperature is 90 ℃.
S3, preserving the heat of the dried spherical particles in the step S2 in a high-temperature furnace to obtain the heat-treated spherical particles. Specifically, the granulated particles were put into a high temperature furnace, heated up to 450 ℃ at a rate of 5 ℃ per minute, and heat-treated at 450 ℃ for 2 hours.
S4, screening the spherical particles subjected to the heat treatment in the step S3, and removing the adhered particles and the super-sized particles to obtain the polycrystalline cerium oxide particles with the particle size of 20-40 um. Specifically, after cooling to room temperature, the particles were collected and sieved through a 400-mesh sieve, and the undersize product was the polycrystalline cerium oxide particles.
And S5, mixing and stirring the polycrystalline cerium oxide particles obtained in the step S4 with deionized water, a suspending agent, a pH regulator, a dispersing agent and a defoaming agent to obtain the polycrystalline cerium oxide polishing solution. Specifically, the prepared polycrystalline cerium oxide particles are weighed according to the above table, added into a mixed solution of deionized water, diethanolamine, polyethylene glycol 200, bentonite and a polyoxyethylene ether defoaming agent which are uniformly mixed in advance, and continuously stirred and ultrasonically dispersed for 10min to obtain the polycrystalline cerium oxide polishing solution for polishing the microcrystalline glass.
The embodiment also provides application of the polycrystalline cerium oxide polishing solution for polishing the microcrystalline glass, which is used for polishing a 6-inch microcrystalline glass cover plate, and is matched with a polyurethane polishing pad, so that the removal rate is about 1.45um/min, and the roughness is 0.6-0.7 nm. Under the same condition, the removal rate of the conventional 0.7um cerium oxide polishing solution is about 1.0um/min, and the roughness is 0.7-0.8 nm; the removal rate increased by 45%.
It is to be noted that, as shown in the above examples 1 to 4, in the application of the polycrystalline cerium oxide polishing solution for polishing microcrystalline glass according to the present invention, as the mass fraction of the polycrystalline cerium oxide particles in the polishing solution increases from 20% to 30%, the performance of the polishing solution gradually improves, but during the experiment, when the mass fraction of the polycrystalline cerium oxide particles in the polishing solution continues to increase, the increase of the removal rate decreases, the cost performance decreases, and meanwhile, the viscosity of the polycrystalline cerium oxide polishing solution increases, the fluidity decreases, and the normal liquid supply of the polishing machine is affected. Therefore, the polishing liquid prepared when the mass fraction of the polycrystalline cerium oxide particles in the polishing liquid is 30% performs optimally.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (10)
1. The polycrystalline cerium oxide polishing solution for polishing the microcrystalline glass is characterized by comprising polycrystalline cerium oxide particles, deionized water, a pH regulator, a dispersing agent, a suspending agent and a defoaming agent, wherein the polycrystalline cerium oxide particles are prepared from cerium oxide particles, low-melting-point glass powder, the dispersing agent and the deionized water.
2. The polycrystalline cerium oxide polishing solution for polishing microcrystalline glass according to claim 1, wherein the polycrystalline cerium oxide particles are prepared by grinding and centrifugal spray granulation of a suspension prepared from 10-14% by mass of cerium oxide particles, 6-10% by mass of low-melting-point glass powder, 0.5% by mass of a dispersing agent and 79.5% by mass of deionized water.
3. The polycrystalline cerium oxide polishing solution for polishing microcrystalline glass according to claim 1 or 2, wherein the polishing solution comprises, by mass, 20 to 30% of polycrystalline cerium oxide particles, 67 to 79% of deionized water, 0.2 to 0.3% of a pH regulator, 0.2 to 1% of a dispersant, 0.5 to 2% of a suspending agent, and 0.01 to 0.02% of an antifoaming agent.
4. The polycrystalline cerium oxide polishing solution for polishing glass ceramics according to claim 2, wherein the content of cerium oxide in the cerium oxide particles is not less than 99%, the average particle size of the cerium oxide particles is 1 to 2um, the low-melting-point glass powder is borosilicate glass powder, and the average particle size of the low-melting-point glass powder is 1 to 2 um.
5. The polycrystalline cerium oxide polishing solution for polishing glass ceramics according to claim 2, wherein the dispersant for preparing the polycrystalline cerium oxide particles is absolute ethyl alcohol, ethylene glycol, polyethylene glycol 200 or polyethylene glycol 400, and the grain size of the polycrystalline cerium oxide particles is 20 to 40 μm.
6. The cerium oxide polishing slurry according to claim 3, wherein the pH adjuster is an inorganic base or an organic base, the inorganic base includes potassium hydroxide and sodium hydroxide, the organic base includes triethanolamine, diethanolamine and ethanolamine, the suspension is an inorganic base including bentonite, a cellulose base including methyl cellulose, carboxyl cellulose, carboxyethyl cellulose and carboxypropyl methyl cellulose, or a natural gum including guar, gum arabic, pectin, agar and carrageenan.
7. The polycrystalline cerium oxide polishing solution for polishing glass ceramics according to claim 3, wherein the dispersant constituting the polishing solution is glycerol, ethylene glycol, polyethylene glycol 200 or polyethylene glycol 400, the defoaming agent is a silicone type or a polyether type, the silicone type includes polydimethylsiloxane, and the polyether type includes glycerol polyether and polyoxyethylene ether.
8. A preparation method of polycrystalline cerium oxide polishing solution for polishing microcrystalline glass is characterized by comprising the following steps:
s1, preparing suspension from 1-2um cerium oxide particles, 1-2um low-melting-point glass powder particles, a dispersing agent and deionized water, sanding the suspension to 50-100nm by using a sand mill, and filtering the suspension for later use;
s2, spray drying the suspension liquid after sanding in the step S1 to prepare spherical particles of 20-40 um;
s3, preserving the heat of the dried spherical particles in the step S2 in a high-temperature furnace to obtain heat-treated spherical particles;
s4, screening the spherical particles subjected to the heat treatment in the step S3, and removing the adhered particles and the super-sized particles to obtain polycrystalline cerium oxide particles with the particle size of 20-40 um;
and S5, mixing and stirring the polycrystalline cerium oxide particles obtained in the step S4 with deionized water, a suspending agent, a pH regulator, a dispersing agent and a defoaming agent to obtain the polycrystalline cerium oxide polishing solution.
9. The cerium oxide polishing slurry for polishing microcrystalline glass according to claim 8, wherein the suspension in step S1 has a concentration of 20%, the temperature of the high temperature furnace in step S3 is 400-550 ℃, and the holding time is 2 h.
10. Use of the polycrystalline cerium oxide polishing solution for polishing glass ceramics according to any one of claims 1, 2, 4 to 9, wherein the polishing solution is used for polishing glass ceramics-glass ceramics.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111225307.8A CN113956798A (en) | 2021-10-21 | 2021-10-21 | Polycrystalline cerium oxide polishing solution for polishing microcrystalline glass and preparation method and application thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111225307.8A CN113956798A (en) | 2021-10-21 | 2021-10-21 | Polycrystalline cerium oxide polishing solution for polishing microcrystalline glass and preparation method and application thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113956798A true CN113956798A (en) | 2022-01-21 |
Family
ID=79465890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111225307.8A Pending CN113956798A (en) | 2021-10-21 | 2021-10-21 | Polycrystalline cerium oxide polishing solution for polishing microcrystalline glass and preparation method and application thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113956798A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117866535A (en) * | 2023-12-26 | 2024-04-12 | 内蒙古师范大学 | Preparation method and application of nano polishing powder suitable for chemical mechanical polishing and industrial production of optical glass |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5104421A (en) * | 1990-03-23 | 1992-04-14 | Fujimi Abrasives Co., Ltd. | Polishing method of goods and abrasive pad therefor |
| US5910471A (en) * | 1997-03-07 | 1999-06-08 | Minnesota Mining And Manufacturing Company | Abrasive article for providing a clear surface finish on glass |
| CN1858132A (en) * | 2006-05-31 | 2006-11-08 | 河北工业大学 | Polishing liquid for grinding and polishing micro crystal glass |
| CN107488439A (en) * | 2017-09-30 | 2017-12-19 | 南京航空航天大学 | A kind of grinding and polishing glass abrasive compound and preparation method thereof |
| CN108237482A (en) * | 2016-12-23 | 2018-07-03 | 合肥宏光研磨科技有限公司 | A kind of glass polishing wheel and preparation method thereof |
| CN110216597A (en) * | 2019-05-28 | 2019-09-10 | 南京航空航天大学 | A kind of the resin finish block and preparation method of Compostie abrasive particles structure |
| CN110358453A (en) * | 2018-04-10 | 2019-10-22 | 蓝思科技（长沙）有限公司 | A kind of glass polishing nano-cerium oxide polishing fluid and preparation method thereof |
-
2021
- 2021-10-21 CN CN202111225307.8A patent/CN113956798A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5104421A (en) * | 1990-03-23 | 1992-04-14 | Fujimi Abrasives Co., Ltd. | Polishing method of goods and abrasive pad therefor |
| US5104421B1 (en) * | 1990-03-23 | 1993-11-16 | Fujimi Abrasives Co.,Ltd. | Polishing method of goods and abrasive pad therefor |
| US5910471A (en) * | 1997-03-07 | 1999-06-08 | Minnesota Mining And Manufacturing Company | Abrasive article for providing a clear surface finish on glass |
| CN1858132A (en) * | 2006-05-31 | 2006-11-08 | 河北工业大学 | Polishing liquid for grinding and polishing micro crystal glass |
| CN108237482A (en) * | 2016-12-23 | 2018-07-03 | 合肥宏光研磨科技有限公司 | A kind of glass polishing wheel and preparation method thereof |
| CN107488439A (en) * | 2017-09-30 | 2017-12-19 | 南京航空航天大学 | A kind of grinding and polishing glass abrasive compound and preparation method thereof |
| CN110358453A (en) * | 2018-04-10 | 2019-10-22 | 蓝思科技（长沙）有限公司 | A kind of glass polishing nano-cerium oxide polishing fluid and preparation method thereof |
| CN110216597A (en) * | 2019-05-28 | 2019-09-10 | 南京航空航天大学 | A kind of the resin finish block and preparation method of Compostie abrasive particles structure |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117866535A (en) * | 2023-12-26 | 2024-04-12 | 内蒙古师范大学 | Preparation method and application of nano polishing powder suitable for chemical mechanical polishing and industrial production of optical glass |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104592898B (en) | Efficiently sapphire lapping liquid and preparation method thereof | |
| CN104999365B (en) | Sapphire wafer abrasive polishing method | |
| CN108239484B (en) | Alumina polishing solution for sapphire polishing and preparation method thereof | |
| TW563115B (en) | Substrate for information recording media and manufacturing method thereof, information recording medium, and starting material glass plate | |
| CN101010602A (en) | Antiglare coating and articles | |
| CN114736654A (en) | Spherical abrasive, preparation method and application thereof, and sapphire grinding fluid containing spherical abrasive | |
| CN113956798A (en) | Polycrystalline cerium oxide polishing solution for polishing microcrystalline glass and preparation method and application thereof | |
| CN103361030A (en) | Praseodymium-containing ultrafine high-precision rare earth polishing powder and its preparation method | |
| CN110003798A (en) | A kind of polishing fluid and its preparation method and application | |
| CN117003581B (en) | Agglomerated diamond and its preparation method and application | |
| CN105385357A (en) | Polishing solution for A orientation sapphire polishing, and preparation method thereof | |
| CN102337083B (en) | Precision rare-earth polishing powder and preparation method thereof | |
| CN105086837A (en) | Sapphire drilling liquid | |
| CN112724836B (en) | Cerium-zirconium-doped polishing solution and preparation method and application thereof | |
| CN104312441A (en) | Silicon-cerium polishing liquid and preparation method thereof | |
| CN114956570A (en) | White reflection-increasing glass slurry for crystalline silicon component and preparation method thereof | |
| CN102329571B (en) | Rare earth and silicon compound precision type rare earth polishing powder and preparation method thereof | |
| JP2002246341A (en) | Polishing slurry for chemical mechanical polishing of silica film | |
| CN102079950A (en) | Preparation method of monodisperse rare earth polishing powder | |
| CN112210346B (en) | Quaternized spherical alpha-alumina @ gamma-alumina composite abrasive particle and preparation method thereof | |
| CN111925732B (en) | Preparation method of nano neodymium oxide coated zirconia powder | |
| CN118126679A (en) | Preparation method and application of agglomerated diamond | |
| CN109970090B (en) | Chemical preparation method of superfine ytterbium oxide with D50 of 1.5-2um | |
| CN103555206A (en) | Rare earth polishing powder and preparation method thereof | |
| CN106892567A (en) | A kind of crystal silicon solar energy battery front side silver paste glass dust and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20220121 |
|
| RJ01 | Rejection of invention patent application after publication |