CN113652645B - Rotary film plating equipment - Google Patents

Abstract

The invention relates to a rotary coating device, comprising: the reaction assembly comprises a reaction cavity and an air inlet disc, wherein the reaction cavity is provided with a reaction cavity, and the air inlet disc is arranged in the reaction cavity and is used for conveying reaction gas to the reaction cavity; an adjustment assembly including an adjustment table configured to be controllably movable; the heating table is rotatably connected to the adjusting table and is positioned in the reaction cavity, and the heating table is provided with a bearing position for bearing a workpiece and is used for heating the workpiece borne on the bearing position; the adjusting table can drive the workpiece on the bearing position to be close to or far away from the air inlet disc in the controlled movement process. According to the rotary coating equipment, the workpiece can be heated and simultaneously rotated, so that the reaction gas can be deposited on the workpiece more uniformly. Meanwhile, the distance between the workpiece and the air inlet disc can be adjusted through the adjusting table, so that the distance which is suitable for reaction can be ensured between the workpiece and the air inlet disc all the time, and the thickness uniformity of the deposited film of the workpiece is better.

Description

A kind of spin coating equipment

technical field

The invention relates to the technical field of vapor deposition, in particular to a spin coating device.

Background technique

Physical Vapor Deposition (Physical Vapor Deposition, PVD) technology refers to the use of physical methods to vaporize solid or liquid surface material sources into gaseous atoms, molecules or parts into ions under vacuum conditions, and through low-pressure gas (or plasma) , the technology of depositing a thin film with a certain special function on the surface of the wafer.

In the existing semiconductor coating equipment, the reaction gas enters the cavity through the gas uniform plate, and is evenly sprayed on the surface of the wafer or flows through the surface of the wafer, so that the required film is formed by reaction deposition. Therefore, the thickness uniformity of the deposited film on the wafer is determined by factors that are difficult to adjust, such as the uniformity of the gas intake and the level of the wafer. As a result, the uniformity of the formed film is limited, and it is difficult to meet the higher uniformity requirements.

Contents of the invention

Based on this, it is necessary to provide a rotary coating device for the problem of poor coating uniformity of the semiconductor coating device.

A spin coating device, comprising:

The reaction assembly includes a reaction chamber body and a gas inlet plate, the reaction chamber body has a reaction chamber, the gas inlet disk is placed in the reaction chamber, and is used to deliver reaction gas to the reaction chamber;

an adjustment assembly, including an adjustment table configured for controlled movement; and

a heating table, rotatably connected to the adjustment table, and located in the reaction chamber, the heating table has a bearing position for carrying workpieces, and is used to control the workpieces carried on the bearing positions to heat;

Wherein, the adjustment table can drive the workpiece on the bearing position to approach or move away from the air intake disk during the controlled movement.

In one of the embodiments, the adjusting assembly further includes a rotating shaft, one end of the rotating shaft is rotatably connected to the adjusting platform, the reaction chamber has a through hole communicating with the reaction chamber, the The other end of the rotating shaft penetrates into the reaction chamber through the through hole, and the heating platform is connected to one end of the rotating shaft passing into the reaction chamber.

In one of the embodiments, the rotary coating device further includes a dynamic seal assembly, the dynamic seal assembly is arranged between the adjustment platform and the reaction chamber, and is arranged around the rotation axis to seal the The through hole of the reaction chamber.

In one of the embodiments, the dynamic seal assembly includes a rotary seal and a telescopic seal, the rotary seal is arranged on the adjustment table, and has a rotary hole through which the rotary shaft passes, and the rotary hole It is filled with a sealing medium; the telescopic seal is sleeved outside the rotating shaft and can be stretched along the moving direction of the adjustment platform. One end of the telescopic seal is arranged around the through hole and is sealed and connected to the In the reaction chamber, the other end of the telescopic seal is arranged around the rotation hole, and is sealingly connected to the rotation seal.

In one of the embodiments, the dynamic seal assembly further includes a cooling liquid pipeline provided on the rotary seal, and the cooling liquid pipeline is used for cooling the sealing medium.

In one of the embodiments, the dynamic seal assembly further includes a purge pipeline provided on the rotary seal, and the purge pipeline is used to clean the sealing medium adhered to the rotating shaft.

In one of the embodiments, the adjustment assembly further includes a power source and a transmission assembly both installed on the adjustment table, and the transmission assembly is transmission-connected between the power source and the rotating shaft.

In one of the embodiments, the transmission assembly includes a worm wheel and a worm meshing with each other, the worm wheel is installed on the rotating shaft, and the worm is installed on the output shaft of the power source.

In one of the embodiments, the transmission assembly includes a first bevel gear and a second bevel gear meshing with each other, the first bevel gear is installed on the rotating shaft, and the second bevel gear is installed on the on the output shaft of the power source.

The adjustment assembly also includes an electric slip ring assembly arranged on the adjustment platform, the electric slip ring assembly includes an electric slip ring, the rotor of the electric slip ring is relatively fixed to the rotating shaft, and the electric slip ring The stator of the electric slip ring is relatively fixed to the adjustment table, the rotor wire harness of the electric slip ring is electrically connected to the heating table, and the stator wire harness of the electric slip ring is used for electrical connection with an external power supply

In the above spin coating equipment, the wafer can also be rotated while being heated, so that the reaction gas can be more uniformly deposited on the wafer. At the same time, the distance between the wafer and the air inlet plate can also be adjusted through the adjustment table, so that the wafer can always maintain a suitable reaction distance with the air inlet plate. Compared with the existing coating equipment, the thickness uniformity of the film deposited on the wafer is better.

Description of drawings

Fig. 1 is a schematic structural view of a rotary coating device in an embodiment of the present invention;

Fig. 2 is a schematic structural view of the adjustment assembly of the rotary coating device in Fig. 1;

Fig. 3 is a schematic structural view of the adjustment assembly in Fig. 2 in one of its embodiments;

Fig. 4 is a structural schematic diagram of another embodiment of the adjustment assembly in Fig. 2 .

Reaction assembly 10, reaction chamber body 11, reaction chamber 12, gas inlet plate 13; through hole 14;

Adjusting assembly 20, adjusting platform 21, rotating shaft 22; power source 23; worm gear 241; worm 242; first bevel gear 251; second bevel gear 252; electric slip ring assembly 26; rotor harness 261, stator harness 262, Electric slip ring 263, stator 264, rotor 265; connecting rod 266; shell 267; lifting module 27;

heating table 30;

Dynamic seal assembly 40 ; rotary seal 41 ; rotary hole 411 , sealing medium 412 ; telescopic seal 42 ; coolant pipeline 43 ; purge pipeline 44 .

Workpiece 50.

Detailed ways

In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. However, the present invention can be implemented in many other ways different from those described here, and those skilled in the art can make similar improvements without departing from the connotation of the present invention, so the present invention is not limited by the specific embodiments disclosed below.

In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise", "Axial" , "radial", "circumferential" and other indicated orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, which are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying the referred device or Elements must have certain orientations, be constructed and operate in certain orientations, and therefore should not be construed as limitations on the invention.

In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, the features defined as "first" and "second" may explicitly or implicitly include at least one of these features. In the description of the present invention, "plurality" means at least two, such as two, three, etc., unless otherwise specifically defined.

In the present invention, unless otherwise clearly specified and limited, terms such as "installation", "connection", "connection" and "fixation" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection , or integrated; it may be mechanically connected or electrically connected; it may be directly connected or indirectly connected through an intermediary, and it may be the internal communication of two components or the interaction relationship between two components, unless otherwise specified limit. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention according to specific situations.

In the present invention, unless otherwise clearly specified and limited, the first feature may be in direct contact with the first feature or the first and second feature may be in direct contact with the second feature through an intermediary. touch. Moreover, "above", "above" and "above" the first feature on the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. "Below", "beneath" and "beneath" the first feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is less horizontally than the second feature.

It should be noted that when an element is referred to as being “fixed on” or “disposed on” another element, it may be directly on the other element or there may be an intervening element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present. As used herein, the terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions are for the purpose of illustration only and are not intended to represent the only embodiments.

Referring to FIG. 1 , an embodiment of the present invention provides a spin coating device, including: a reaction assembly 10 , an adjustment assembly 20 and a heating table 30 .

The reaction assembly 10 includes a reaction chamber 11 and a gas inlet plate 13 , the reaction chamber 11 has a reaction chamber 12 in a vacuum state for coating reaction. The gas inlet plate 13 is arranged in the reaction chamber 12 and connected with an external gas source, so as to deliver reaction gas for coating reaction to the reaction chamber 12 .

The heating table 30 is disposed in the reaction chamber 12 and has a loading position for loading the workpiece 50 . The heating plate can heat the workpiece 50 on the supporting position, so that the heated workpiece 50 can react with the reaction gas input from the gas inlet plate 13 to perform coating reaction, so as to achieve coating on the workpiece 50 .

The adjustment assembly 20 includes an adjustment table 21 configured to move in a controlled manner. The heating table 30 is rotatably connected to the adjustment table 21 , so that the heating table 30 can not only rotate relative to the adjustment table 21 , but also move together with the adjustment table 21 . The heating table 30 can approach or move away from the air inlet disk 13 during the movement of the adjustment table 21 , so that the workpiece 50 on the loading position on the heating table 30 can also approach or move away from the air inlet disk 13 .

In actual use, the workpiece 50 is placed on the bearing position, and the movement of the adjustment table 21 is controlled so that the workpiece 50 on the bearing position gradually approaches the air inlet disk 13 until the air inlet disk 13 and the workpiece 50 are in a suitable position for reaction deposition. distance. Afterwards, the heating table 30 heats the workpiece 50 , and the gas inlet plate 13 injects a reactive gas, so that the reactive gas reacts with the workpiece 50 . When the reaction reaches a certain stage, the heating table 30 starts to rotate, and drives the workpiece 50 on the supporting position to rotate, so that the reaction gas can evenly contact the surface of the workpiece 50, ensuring that the film formed on the surface of the workpiece 50 due to the coating reaction is more uniform.

The above-mentioned rotary coating equipment can rotate the workpiece 50 while being heated, so that the reaction gas can contact the workpiece 50 more uniformly, and a coating reaction occurs, and a more uniform film is formed on the surface of the workpiece 50 . At the same time, the distance between the workpiece 50 and the air inlet disk 13 can also be adjusted through the adjustment table 21 , so that the workpiece 50 and the air inlet disk 13 can always maintain a distance suitable for the reaction. Compared with the existing coating equipment, the workpiece 50 has better thickness uniformity of deposited film. Optionally, the workpiece 50 may be a wafer to be coated.

In the embodiment of the present invention, the adjustment assembly 20 includes a rotating shaft 22, one end of the rotating shaft 22 is rotatably connected to the adjusting table 21, and the other end of the rotating shaft 22 is connected to the heating table 30, so that the adjusting table 21 is driven by the rotating shaft 22 The heating stage 30 moves. Specifically, the adjustment platform 21 is located outside the reaction chamber 11, the reaction chamber 11 has a through hole 14 communicating with the reaction chamber 12, and the other end of the rotating shaft 22 penetrates into the reaction chamber 12 through the through hole 14 and is connected to the heating platform 30 . In this way, placing the adjustment platform 21 outside the reaction chamber 12 can reduce the volume of the reaction chamber 12 . Optionally, the adjustment assembly 20 also includes a lifting module 27, and the adjusting platform 21 is installed on the driving end of the lifting module 27, so that the lifting module 27 drives the adjusting platform 21 to move, thereby driving the bearing through the rotating shaft 22 and the heating platform 30. The workpiece 50 on the position is far away from or close to the intake disk 13 .

Since the reaction chamber 12 must be vacuum-tight, gas leakage may occur at the position where the rotating shaft 22 passes through the reaction chamber 11 , that is, the through hole 14 . For this reason, in some embodiments, the rotary coating device further includes a dynamic seal assembly 40, the dynamic seal assembly 40 is arranged between the adjustment table 21 and the reaction chamber 11, and is arranged around the rotation axis 22 to seal the reaction chamber 11. Through hole 14.

Since the movement of the rotating shaft 22 is relatively complicated, including the movement together with the adjustment platform 21 and its own rotation, the dynamic seal assembly 40 includes a rotating seal 41 and a telescopic seal 42, and the rotating shaft 22 is guaranteed to The sealing of the reaction chamber 12 during rotation is ensured by the telescopic seal 42 to ensure the sealing of the reaction chamber 12 when the rotating shaft 22 is moving.

Specifically, referring to FIG. 2 and FIG. 3 , the rotary seal 41 is disposed on the adjustment table 21 and has a rotary hole 411 , and the rotary shaft 22 passes through the rotary hole 411 . The telescopic seal 42 is sheathed on the rotating shaft 22 , is located between the rotary seal 41 and the telescopic seal 42 , and is telescopic along the moving direction of the adjustment platform 21 . One end of the telescoping seal 42 is arranged around the through hole 14 and sealed connected to the reaction chamber 11 , and the other end of the telescopic seal 42 is arranged around the rotation hole 411 and sealed connected to the rotary seal 41 . Since both ends of the telescopic seal 42 are sealed, a sealed space is formed in the telescopic seal 42, which wraps the rotating shaft 22 and the through hole 14, so that the through hole 14 is sealed by the seal. Space sealed. Furthermore, when the rotating shaft 22 moves, the telescopic sealing member 42 also expands and contracts accordingly to match the movement of the rotating shaft 22 , so as to seal the reaction chamber 12 even when the rotating shaft 22 moves.

Further, since the rotating shaft 22 still needs to rotate, leakage will also occur at the place where the rotating shaft 22 rotates relative to the rotating seal 41 , that is, the rotating hole 411 . In order to avoid this problem, the rotation hole 411 is filled with a sealing medium 412 to seal the rotation hole 411 . That is to say, the rotating seal 41 forms a rotary dynamic seal with the rotating shaft 22 at the rotating hole 411, and fills the gap between the side wall of the rotating hole 411 and the rotating shaft 22 through the sealing medium 412, so that the rotating shaft 22 is rotating. It can also be sealed. In this way, the rotating seal 41 cooperates with the telescopic seal 42 to complete the sealing of the through hole 14 on the reaction chamber 11 .

Specifically in the embodiment, the rotary seal 41 is a magnetic fluid seal, that is, the sealing medium 412 is a magnetic fluid, and the telescopic seal 42 is a bellows.

During use, the temperature of the ferrofluid seal will rise. Excessively high temperature will cause the solvent of the ferrofluid to evaporate. At the same time, the high temperature will also cause the magnetic strength of the magnetic nanoparticles in the ferrofluid to decrease, thereby affecting the sealing effect. Specifically in the embodiment, the dynamic sealing assembly 40 further includes a cooling liquid pipeline 43 disposed on the rotating seal 41 , and the cooling liquid pipeline 43 is used for cooling the sealing medium 412 . It can be understood that cooling water circulates in the cooling liquid pipeline 43 to cool the magnetic fluid to ensure the working temperature of the magnetic fluid in the magnetic fluid seal and prevent the magnetic fluid from losing its magnetism at high temperature and affecting the sealing effect.

Further, the dynamic seal assembly 40 also includes a purge pipeline 44 disposed on the rotary seal 41 , and the purge pipeline 44 is used to clean the sealing medium 412 attached to the rotating shaft 22 . The purge pipeline 44 is close to the sidewall of the rotation hole 411 and is located at an end of the rotation hole 411 close to the reaction chamber 11 . That is to say, the purge pipeline 44 is close to the outlet of the rotating hole 411 so that the rotating shaft 22 can be purged at the outlet of the rotating hole 411 to clean the magnetic fluid attached to the rotating shaft 22 .

In the embodiment of the present invention, the adjustment assembly 20 further includes a power source 23 and a transmission assembly both installed on the adjustment platform 21 , and the transmission assembly is connected between the power source 23 and the rotating shaft 22 by transmission. The power of the power source 23 is transmitted to the rotating shaft 22 through the transmission assembly, so as to drive the rotating shaft 22 to rotate, and then the rotating shaft 22 drives the heating table 30 to rotate together.

Since an electric slip ring 263 structure needs to be provided under the rotating shaft 22 to supply power to the heating table 30 , the power source 23 is chosen to be placed sideways, that is, the output shaft of the power source 23 intersects the rotating shaft 22 . The transmission assembly needs to convert the driving direction of the power source 23 into the rotating direction of the rotating shaft 22 . In some embodiments, referring to FIG. 3 again, the transmission assembly includes a worm wheel 241 and a worm 242 that are engaged with each other. The worm wheel 241 is mounted on the rotating shaft 22 , and the worm 242 is mounted on the output shaft of the power source 23 . The driving direction of the laterally placed power source 23 is converted into the rotating direction of the rotating shaft 22 through the worm gear 241 and the worm screw 242 .

In other embodiments, referring to FIG. 4, the transmission assembly can also be a first bevel gear 251 and a second bevel gear 252 that mesh with each other, the first bevel gear 251 is installed on the rotating shaft 22, and the second bevel gear 252 is installed on the output shaft of power source 23. In this way, the driving direction of the laterally placed power source 23 can also be converted into the rotating direction of the rotating shaft 22 through the bevel gear.

In the embodiment of the present invention, the adjustment assembly 20 further includes an electric slip ring assembly 26 arranged on the adjustment table 21, the electric slip ring assembly 26 includes an electric slip ring 263, and the rotor 265 of the electric slip ring 263 is relatively fixed to the rotating shaft 22, The stator 264 of the electric slip ring is relatively fixed to the adjustment platform 21 . The heating table 30 is electrically connected to the rotor beam 261 of the electric slip ring 263, and the stator beam 262 of the electric slip ring 263 is electrically connected to an external power source. In this way, when the rotating shaft 22 rotates, the stator 264 and the stator wire harness 262 on the stator 264 do not rotate with the rotating shaft 22, the rotor 265 and the rotor wire harness 261 on the rotor 265 rotate with the rotating shaft 22, and the rotor 265 passes through carbon brushes and the like. It is electrically connected to the stator 264 . At this time, the stator harness 262 transmits the electric energy of the external power supply to the rotor harness 261 on the rotor 265 through the stator 264 and the rotor 265, and then the rotor harness 261 transmits the electric energy to the heating platform.

Specifically, the electric slip ring assembly 26 further includes a connecting rod 266 through which the rotor 265 is connected to the rotating shaft 22 and rotates with the rotating shaft 22 .

Specifically in the embodiment, the electric slip ring assembly 26 further includes a protective case, and the connecting rod 266 and the electric slip ring 263 are both disposed in the protective case. The protective shell is connected with the shell 267 of the magnetic fluid seal, and the structure of the electric slip ring 263 is integrated in the magnetic fluid, and the rotor harness 261 passes through the rotating shaft 22 and is connected with the heating table 30 . In this way, the wire harness passes directly through the ferrofluidic seal, and there is no need to seal the wire harness again, greatly reducing the number of parts.

The present invention has the following advantages:

The workpiece 50 can also be rotated while being heated, so that the reactive gas can contact the workpiece 50 more uniformly, and a coating reaction occurs, and a more uniform thin film is formed on the surface of the workpiece 50 . At the same time, the distance between the workpiece 50 and the air inlet disk 13 can also be adjusted through the adjustment table 21 , so that the workpiece 50 and the air inlet disk 13 can always maintain a distance suitable for the reaction. Compared with the existing coating equipment, the workpiece 50 has better thickness uniformity of deposited film. Optionally, the workpiece 50 may be a wafer to be coated.

One end of the telescopic seal 42 is arranged around the through hole 14 and sealed to the reaction chamber 11, and the other end of the telescopic seal 42 is arranged around the rotation hole 411 and sealed to the rotary seal 41, thereby forming a sealed space to seal the rotating shaft. 22 and through hole 14 are wrapped in. When the rotating shaft 22 moves, the telescopic sealing member 42 also expands and contracts accordingly to match the movement of the rotating shaft 22 , so as to seal the reaction chamber 12 even when the rotating shaft 22 moves.

The rotating seal 41 forms a rotary dynamic seal with the rotating shaft 22 at the rotating hole 411, and fills the gap between the side wall of the rotating hole 411 and the rotating shaft 22 through the sealing medium 412, so that the rotating shaft 22 can also rotate. Make a seal. In this way, the rotating seal 41 cooperates with the telescopic seal 42 to complete the sealing of the through hole 14 on the reaction chamber 11 .

The structure of the electric slip ring 263 is integrated inside the magnetic fluid, and the rotor harness 261 passes through the inside of the rotating shaft 22 and is connected to the heating table 30 . In this way, the wire harness passes directly through the ferrofluidic seal, and there is no need to seal the wire harness again, greatly reducing the number of parts.

The technical features of the above embodiments can be combined arbitrarily. To make the description concise, all possible combinations of the technical features in the above embodiments are not described. However, as long as there is no contradiction in the combination of these technical features, they should be It is considered to be within the range described in this specification.

The above examples only express several implementation modes of the present invention, and the description thereof is relatively specific and detailed, but it should not be construed as limiting the scope of the patent for the invention. It should be noted that, for those skilled in the art, several modifications and improvements can be made without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the patent for the present invention should be based on the appended claims.

Claims (10)

1. A rotary coating device, characterized in that, the rotary coating device comprises: The reaction assembly (10) comprises a reaction chamber (11) and an air inlet disk (13), the reaction chamber (11) has a reaction chamber (12), and the air inlet disk (13) is arranged in the reaction chamber (12), and used to deliver reaction gas to the reaction chamber (12); An adjustment assembly (20), comprising an adjustment table (21) configured to move in a controlled manner, a rotating shaft (22) and a dynamic seal assembly (40), the dynamic seal assembly (40) comprising a rotary seal (41), The telescopic seal (42), and the coolant pipeline (43) and the purge pipeline (44) arranged on the rotary seal (41), the rotary seal (41) is arranged on the adjustment table (21), and having a rotating hole (411) for the rotating shaft (22) to pass through, and the rotating hole (411) is filled with a sealing medium (412); a heating table (30), rotatably connected to the adjustment table (21), and located in the reaction chamber (12), the heating table (30) has a bearing position for carrying the workpiece (50), and used for heating the workpiece (50) carried on the bearing position; Wherein, the adjustment table (21) can drive the workpiece (50) on the bearing position to approach or move away from the air intake disk (13) during the controlled movement process. 2. The rotary coating device according to claim 1, characterized in that, one end of the rotating shaft (22) is rotatably connected to the adjustment table (21), and the reaction chamber (11) has a The through hole (14) communicating with the reaction chamber (12), the other end of the rotating shaft (22) penetrates into the reaction chamber (12) through the through hole (14), and the heating table (30) connected to one end of the rotating shaft (22) penetrating into the reaction chamber (12); The dynamic sealing assembly (40) is arranged between the adjustment platform (21) and the reaction chamber (11), and is arranged around the rotation shaft (22) to seal the reaction chamber (11) The through hole (14). 3. The rotary coating device according to claim 2, characterized in that, the telescopic seal (42) is sheathed outside the rotating shaft (22), and can move along the moving direction of the adjusting table (21). telescopic, one end of the telescopic seal (42) is arranged around the through hole (14), and is sealingly connected to the reaction chamber (11), and the other end of the telescopic seal (42) rotates around the Holes (411) are arranged and are hermetically connected to said rotary seal (41). 4. The spin coating device according to claim 1, characterized in that, the cooling liquid pipeline (43) is used to cool the sealing medium (412). 5. The spin coating device according to claim 1, characterized in that, the purging pipeline (44) is used to clean the sealing medium (412) attached to the rotating shaft (22). 6. The rotary coating device according to claim 2, characterized in that, the adjustment assembly (20) also includes a power source (23) and a transmission assembly both mounted on the adjustment table (21), and the transmission assembly The transmission is connected between the power source (23) and the rotating shaft (22). 7. The rotary coating device according to claim 6, characterized in that, the transmission assembly comprises a worm wheel (241) and a worm (242) meshing with each other, and the worm wheel (241) is mounted on the rotating shaft (22) , the worm (242) is installed on the output shaft of the power source (23). 8. The rotary coating device according to claim 6, characterized in that, the transmission assembly comprises a first bevel gear (251) and a second bevel gear (252) meshing with each other, and the first bevel gear (251) is installed on the rotating shaft (22), and the second bevel gear (252) is installed on the output shaft of the power source (23). 9. The rotary coating device according to claim 1, characterized in that, the adjustment assembly (20) further comprises an electric slip ring assembly (26) arranged on the adjustment table (21), and the electric slip ring The assembly (26) includes an electric slip ring (263), the rotor (265) of the electric slip ring (263) is relatively fixed to the rotating shaft (22), and the stator (264) of the electric slip ring (263) is connected to The adjustment table (21) is relatively fixed, the rotor wire harness (261) of the electric slip ring (263) is electrically connected to the heating table (30), and the stator wire harness (262) of the electric slip ring (263) is used for for electrical connection with an external power source. 10. The rotary coating device according to claim 1, characterized in that, the adjustment assembly (20) includes a protective shell and an outer shell that are connected and communicated with each other, and the electric slip ring (263) is sealed and arranged on the protective shell. In the shell, the sealing medium (412) is hermetically arranged in the shell.