CN113447123B - Continuously-distributed integrated ultra-surface micro spectrum sensing system - Google Patents
Continuously-distributed integrated ultra-surface micro spectrum sensing system Download PDFInfo
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- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
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Abstract
The invention discloses a continuously-distributed integrated ultra-surface miniature spectrum sensing system, relates to the field of spectrum measurement, and mainly aims to solve the problems that a current spectrometer is large in size, heavy in weight and not easy to integrate. The system comprises a super-surface sub-subsystem, an achromatic imaging subsystem and an area array detector; an achromatic imaging subsystem is arranged on the area array detector, and a super-surface sub-subsystem is arranged on the achromatic imaging subsystem; the super-surface light splitting subsystem comprises a substrate and super-atoms which are arranged on the substrate and are arranged continuously; the super-surface sub-subsystem is divided into N multiplied by M areas, and each area contains a plurality of identical super atoms; each region corresponds to a harmonic wavelength. The invention has the advantages of high integration, high reliability, compatibility with semiconductor technology and the like.
Description
Technical Field
The invention relates to the field of spectrum measurement, in particular to a continuously distributed integrated ultra-surface micro spectrum sensing system.
Background
The spectrum measurement technology is widely applied to various fields of national economy, such as agriculture, astronomy, automobiles, biology, chemistry, coating, colorimetry, environment detection, film industry, food, printing, papermaking, raman spectroscopy, semiconductor industry, component detection, color mixing and matching, biomedical application, fluorescence measurement, precious stone component detection, oxygen concentration sensor, vacuum chamber coating process monitoring, film thickness measurement, LED measurement, emission spectrum measurement, ultraviolet/visible absorption spectrum measurement, color measurement and the like. Spectrometers are an important optical instrument in spectrometry. The spectrometer can acquire the spectrum signal of the substance and analyze the composition and content of the substance, such as detection and analysis of harmful substances and vitamins in food industry, detection of specific elements in chemical and biological analysis, analysis of molecular and atomic fine structures, detection of the composition and content of each substance of ore in geological exploration and metallurgy industry, and the like. In summary, spectrometers have become an integral part of modern scientific instrumentation. Advances and innovations in spectrometers are always driven by advances in electronics and computing, so that spectrometer systems are increasingly being developed toward high precision, optoelectronics, automation, and intelligence. Its receiving system has evolved from the original visual system to the present-day optoelectronic system; the measurement and analysis of the spectrum signals are from qualitative to quantitative, from static to dynamic, from visual observation and spectrum comparison to pattern recognition by a computer; the spectrometer is also simpler to operate. Spectrometers have evolved to date to form optical-to-optical-centered, opto-electronic precision instruments that integrate optical and electronic computing.
The traditional spectrometer mainly comprises a light source and illumination system, a light splitting system, a detection receiving system and a transmission storage and display system. The most critical components are a light splitting system, and can be divided into a grating spectrometer, a prism spectrometer and an interference spectrometer according to the difference of light splitting principles. The spectroscopic system in conventional spectrometers is typically implemented using a grating, prism or interference light path. The traditional spectrometer has high spectrum resolution, but the dispersive elements such as gratings, prisms and the like have extremely high cost and difficult miniaturization and integration, so the traditional spectrometer is mainly applied to traditional spectroscopy analysis and is not suitable for miniaturized application. The interference detection technical scheme comprises a complex light path and a dynamic light path regulating and controlling mechanism, so that the integration and miniaturization of the interference detection technical scheme are difficult. In particular to the integration, compound functionalization and weight reduction requirements of various optical instruments in aerospace, national defense industry and national economy. The development of miniaturized spectrometers is therefore of great importance.
Some existing micro-spectrometers are prepared by either continuously optimizing the optical path system therein or by making the conventional optical elements therein small enough to compress the size of the entire spectrometer. The most critical part of the spectrometer is a light splitting system, so if the light splitting system can be miniaturized effectively, the whole spectrometer system can be miniaturized, and the invention is based on a micro-zone plate array 201910242913.7, a micro-mirror array 201510175317.3 or a plasmon nano-antenna array 201510233081.4 to realize the light splitting function. The basic principle of the micro zone plate array 201910242913.7 is that the zone plates with different transmittances are arranged in an array mode due to the characteristic of different transmittances of the zone plates with different wavelengths, the rear side receives the light intensities of different areas by an area array detector, and then the intensity information of the light with different wavelengths is obtained by a spectrum analysis mode. The micro mirror array 201510175317.3 is used for realizing the phase regulation and control by the micro mirror array so as to realize the function of a Fresnel zone plate, thereby realizing the function of dispersion and light splitting. The technology is characterized in that the regulation and control function can be realized by adjusting the angle of the micro-mirror array, so that the technology has the programmable regulation and control capability. The technical scheme basic principle of using the plasmon nano antenna array 201510233081.4 as a light splitting system is that nano antennas with different structures, different materials and different sizes have local enhancement effects on different light wavelengths. The different nanoantennas allow light of the resonant wavelength to be enhanced in a very near localized region, while light that is not resonant is reflected or scattered. Therefore, the light intensity information of different wavelengths is obtained by detecting the near-field light field intensity of the nano antenna, so that the light splitting function is realized.
The beam splitting system based on the zone plate array is generally realized by a multilayer film system, so that the multilayer film zone plate is realized, the array form is manufactured, and the processing difficulty is very high.
Although MEMS-based micromirror arrays have programmable capabilities, the size of the micromirror array units cannot be too small because of the need to implement individual micromirror unit manipulations, and the addition of micromirror arrays and driving circuitry makes the system more complex and unfavorable for further integration.
The surface plasmon nano antenna generates local light field strong enhancement effect on different lights through different materials or structures, and therefore, the surface plasmon nano antenna is necessarily made of metal or conductive materials. The nano antenna gathers free electrons in a local area of the structure so as to generate strong electric field intensity near the nano structure, and the electric field intensity is detected by the array detector to acquire information. However, the local optical field information in the technical scheme only exists in a wavelength range near the nano antenna, and the intensity of the optical field information is drastically reduced away from the wavelength range, so that the area array detector is required to be closely attached to the nano antenna or be very close to the nano antenna. Therefore, there are limitations in material selection and integration.
Disclosure of Invention
In order to realize high integration, high reliability and compatibility with semiconductor processes, the invention provides a continuously distributed integrated ultra-surface micro spectrum sensing system.
In order to achieve the above object, the present invention provides the following solutions:
a continuously distributed integrated ultra-surface micro spectrum sensing system comprises an ultra-surface light splitting subsystem, an achromatic imaging subsystem and an area array detector; the achromatic imaging subsystem is arranged on the area array detector, and the super-surface light splitting subsystem is arranged on the achromatic imaging subsystem;
the super-surface light splitting subsystem comprises a substrate and super-atoms which are arranged on the substrate and are arranged continuously; the super-surface light splitting subsystem is divided into N multiplied by M areas, and each area contains a plurality of identical super atoms; each of the regions corresponds to a harmonic wavelength.
Optionally, there is no space between adjacent regions.
Alternatively, different said regions correspond to different resonant wavelengths.
Optionally, the distance between adjacent super atoms is smaller than the maximum resonance wavelength.
Optionally, the achromatic imaging subsystem includes an achromatic planar superlens covering all detected harmonic wavelength ranges.
Optionally, the plane in which the superatom is located is an object plane, the surface of the area array detector is an image plane, and the superatom is imaged on the surface of the area array detector through the achromatic planar superlens.
Optionally, the super-atom has a single resonant wavelength, and the harmonic wavelength corresponding to the region is adjusted by adjusting the super-atom size.
Optionally, the super atom is a micro-nano structure formed by dielectric materials.
Optionally, the material of the substrate is an all-dielectric material.
Optionally, the substrate is made of one of optical glass, chalcogenide glass, sapphire, optical plastic, titanium dioxide, silicon, germanium, calcium fluoride, vanadium dioxide, hafnium dioxide, silicon dioxide, titanium nitride, si-Ge alloy, silicon-silicon nitride alloy, barium fluoride, magnesium fluoride, silicon nitride, silicon hydride, tungsten dioxide, titanium nitride, lithium niobate, ITO, TCO, magnesium oxide, znSe, znO, zrO2, indium antimonide, indium arsenide, silicon carbide, gallium nitride, lead telluride, zinc sulfide, and III-V semiconductor materials.
According to the specific embodiment provided by the invention, the invention discloses the following technical effects:
in order to realize high integration, high reliability and compatibility with a semiconductor process, the micro spectrometer has different resonance characteristics for light with different wavelengths based on a super surface structure, thus having different transmittance, playing a role in light splitting, arranging an area array detector under the super surface structure to receive and acquire optical signals, and finally obtaining corresponding spectrum information through spectrum analysis, data processing and storage display components.
The invention has the following advantages compared with the prior scheme: 1. the light splitting function is realized through continuously distributed super atoms, and any interval is not needed between different areas, so that a more compact super-surface light splitting subsystem is realized. 2. The super atomic layer is imaged on the area array detector through the achromatic plane super lens, so that crosstalk between continuously distributed super atomic partitions is effectively avoided. 3. Because the super atoms are continuously distributed and the subareas are not separated, only an achromatic imaging subsystem can be adopted to avoid the crosstalk of the light intensity of each subarea. Therefore, the single achromatic plane superlens is adopted to realize spectrum sensing, the structure is smaller, and the integration is more facilitated.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings that are needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of a subsurface micro-spectrum sensing system according to the present invention;
FIG. 2 is a schematic diagram of a mid-subsurface region of the present invention micro-spectroscopic sensor system partitioned by resonant wavelength;
FIG. 3 is a schematic diagram of the super-atomic distribution of four wavelength surfaces according to the present invention.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The invention aims to provide a continuously distributed integrated ultra-surface micro spectrum sensing system which has the advantages of high integration, high reliability, compatibility with a semiconductor process and the like.
In order that the above-recited objects, features and advantages of the present invention will become more readily apparent, a more particular description of the invention will be rendered by reference to the appended drawings and appended detailed description.
Superatom: the nanostructure on the surface of the optical material at some micro-nano scale has a structure thickness generally lower than a wavelength, and the nanostructure has a regulation function on the light field. These individual nanostructures are referred to as superatoms.
As shown in fig. 1, the continuously distributed integrated ultra-surface micro spectrum sensing system provided in this embodiment includes an ultra-surface spectroscopic subsystem, an achromatic imaging subsystem and an area array detector. An achromatic imaging subsystem is arranged on the area array detector, and a super-surface sub-subsystem is arranged on the achromatic imaging subsystem.
The super surface spectroscopic subsystem includes a substrate and a continuous array of super atoms disposed over the substrate. The super atoms are distributed on the whole substrate and divided into N multiplied by M areas, and no interval exists between the areas.
As shown in fig. 2, the super-atoms in each region are the same, i.e., each region contains a plurality of the same super-atoms, and the super-atoms have a single resonant wavelength, and thus each region corresponds to one resonant wavelength. The superatoms of the different regions are different, and therefore the different regions correspond to different resonant wavelengths. Wherein, the distance between the super atoms is smaller than the maximum resonance wavelength. In one particular embodiment, 4 zones may be provided, as shown in FIG. 3.
The super-atom is a micro-nano structure on a planar substrate, and when the super-atom structure is irradiated by light, the transmittance of light with resonance wavelength is different from the transmittance of light with non-resonance wavelength, so that the light splitting effect is achieved. The spacing between the super-atoms is less than the maximum resonant wavelength to enhance the interaction between the super-atoms to make the spectroscopic function stronger. The super atom is a micro-nano structure formed by dielectric materials. The substrate material under the super atom is a full dielectric material, and may include one of optical glass, chalcogenide glass, sapphire, optical plastic, titanium dioxide, silicon, germanium, calcium fluoride, vanadium dioxide, hafnium dioxide, silicon dioxide, titanium nitride, si-Ge alloy, silicon-silicon nitride alloy, barium fluoride, magnesium fluoride, silicon nitride, silicon hydride, tungsten dioxide, titanium nitride, lithium niobate, ITO, TCO, magnesium oxide, znSe, znO, zrO2, indium antimonide, indium arsenide, silicon carbide, gallium nitride, lead telluride, zinc sulfide, group III-V semiconductor material, and the like, but is not limited thereto. The base material and the meta-material are transparent materials in the resonance wavelength range.
The achromatic imaging subsystem includes an achromatic planar superlens covering all detected harmonic wavelength ranges, the achromatic planar superlens being a superlens covering the tested wavelength band. For example, if for visible light, the achromatic planar superlens is an achromatic lens for visible light, if for near infrared, the achromatic planar superlens is an achromatic lens for near infrared band, since the present invention can be implemented with this approach for different full-band ultraviolet to long-band infrared, only different material systems need to be selected for implementing different bands, but the design methods and ideas are consistent, and therefore the wavelength range is not specified herein.
The positions of the super-surface sub-subsystem, the achromatic plane super-lens and the area array detector meet the following conditions: the plane where the super atom is located is an object plane, and the surface of the area array detector is an image plane. Wherein the superatoms are imaged onto the surface of the area array detector by an achromatic planar superlens. The imaging formula satisfied among the three is: 1/f=1/u+1/v, where f is the focal length of the achromatic planar superlens, u is the object distance, and is the distance from the supersurface sub-system to the achromatic planar superlens; v is the image distance, which is the distance between the achromatic planar superlens and the area array detector.
The test method of the ultra-surface micro spectrum sensing system comprises the following steps:
the surface on which the superatoms are located is imaged on the surface of the area array detector by the achromatic imaging subsystem, so that the change of the light intensity on the superatoms can be detected by the area array detector. The different super atomic regions have different resonant wavelengths, and the transmittance of the resonant wavelengths is different from the transmittance of the non-resonant wavelengths. The area array detector can test the light intensity of each of N multiplied by M areas, which are respectively I ij (i=1, 2,3 … M; j=1, 2,3, … N). Let the spectrum of the incident light be Φ (λ).
The substrate is divided into a total of n×m areas. The total transmittance light intensity of each region is I ij (i=1, 2,3 … M; j=1, 2,3, … N), the light intensity of the region corresponding to ij can be measured by the area array detector as I ij . Wherein T is ij The (λ) is the transmittance of light having a wavelength λ in the ij region. Then the light intensity I of the ij-th region ij ＝∑ λ T ij Phi (lambda). N x M light intensity values can be measured by the area array detector, thus forming N x M mathematical equations in total. Solving the NxM mathematical equations by a numerical calculation mode to obtain the incident spectrum information phi (lambda).
The invention has the advantages that all the super-atoms are densely distributed on the substrate in a partitioning way, and the super-atom interval is smaller than the resonance wavelength corresponding to the maximum super-atom, so that the whole surface is more integrated. For example, the previous proposal was to set the distance between the respective super surface units to 10 times the wavelength in order to avoid crosstalk occurring between the super surface units due to diffraction. The invention adds an achromatic imaging superlens between the supersurface light splitting subsystem and the area array detector, so that the space between the supersurface units is not limited by 10 times of wavelength interval. Further, the spectrum sensing system is smaller and more integrated. The method comprises the following steps:
(1) The super atoms are micro-nano structures smaller than the wavelength, the super atoms are dielectric materials, and the super atoms are continuously arranged on the whole substrate without leaving any interval. The spacing between the super atoms is less than the maximum resonant wavelength.
(2) The super atoms are arranged in a partition mode, and the super atoms of each region are identical and correspond to one resonant wavelength. The superatoms produce a resonant effect on the optical wave such that the optical transmission at the resonant wavelength is different from the optical transmission at the non-resonant wavelength.
(3) The resonant wavelength can be adjusted by adjusting the size of the super-atom, for example, if the super-atom is square, the length and width dimensions are adjusted, and if the super-atom is cylindrical, the diameter of the column is adjusted; and others alike.
(4) An achromatic imaging subsystem is arranged under the super-surface light splitting subsystem; an area array detector is arranged under the achromatic imaging subsystem; the positions of the super-surface sub-subsystem, the achromatic imaging subsystem and the area array detector meet the following conditions: the super atomic layer is imaged on the surface of the area array detector through an achromatic imaging subsystem. The achromatic imaging subsystem is an achromatic planar superlens for the resonant wavelength range.
(5) The light intensity of different areas in the super-surface array is detected by the area array detector, and the information of the incident spectrum can be obtained by a spectrum analysis method.
In the present specification, each embodiment is described in a progressive manner, and each embodiment is mainly described in a different point from other embodiments, and identical and similar parts between the embodiments are all enough to refer to each other.
The principles and embodiments of the present invention have been described herein with reference to specific examples, the description of which is intended only to assist in understanding the methods of the present invention and the core ideas thereof; also, it is within the scope of the present invention to be modified by those of ordinary skill in the art in light of the present teachings. In view of the foregoing, this description should not be construed as limiting the invention.
Claims (1)
1. The continuously distributed integrated ultra-surface micro spectrum sensing system is characterized by comprising an ultra-surface sub-photon system, an achromatic imaging subsystem and an area array detector; the achromatic imaging subsystem is arranged on the area array detector, and the super-surface light splitting subsystem is arranged on the achromatic imaging subsystem;
the super-surface light splitting subsystem comprises a substrate and super-atoms which are arranged on the substrate and are arranged continuously; the super-surface light splitting subsystem is divided into N multiplied by M areas, and each area contains a plurality of identical super atoms; each of the regions corresponds to a harmonic wavelength;
different resonant wavelengths correspond to different regions;
the distance between adjacent super atoms is smaller than the maximum resonance wavelength;
the achromatic imaging subsystem includes an achromatic planar superlens covering all detected harmonic wavelength ranges;
the plane where the superatoms are located is an object plane, the surface of the area array detector is an image plane, and the superatoms are imaged on the surface of the area array detector through the achromatic plane superlens;
the super-atom has a single resonance wavelength, and the harmonic wavelength corresponding to the region is adjusted by adjusting the super-atom size;
no space exists between adjacent areas;
the super atoms are micro-nano structures formed by dielectric materials;
the material of the substrate is an all-dielectric material;
the substrate is made of one of optical glass, chalcogenide glass, sapphire, optical plastic, titanium dioxide, silicon, germanium, calcium fluoride, vanadium dioxide, hafnium dioxide, silicon dioxide, titanium nitride, si-Ge alloy, silicon-silicon nitride alloy, barium fluoride, magnesium fluoride, silicon nitride, silicon hydride, tungsten dioxide, titanium nitride, lithium niobate, ITO, TCO, magnesium oxide, znSe, znO, zrO2, indium antimonide, indium arsenide, silicon carbide, gallium nitride, lead telluride, zinc sulfide and III-V semiconductor materials;
the substrate material and the meta-atom material are transparent materials in the resonance wavelength range;
the achromatic plane super lens is set as any one of a visible light achromatic plane super lens and an infrared band achromatic plane super lens;
the imaging formula of the super-surface sub-subsystem, the achromatic planar super-lens and the area array detector is as follows: 1/f=1/u+1/v
Where f is the focal length of the achromatic planar superlens, u is the object distance, and is the distance from the supersurface sub-system to the achromatic planar superlens; v is the image distance, which is the distance between the achromatic plane superlens and the area array detector;
the test method of the continuous distribution integrated ultra-surface micro spectrum sensing system comprises the following steps:
the spectrum of the incident light is Φ (λ);
the substrate is divided into N×M regions, and the total transmittance light intensity of each region is I ij ，（i=1,2,3…M;j=1,2,3,…N）；
The light intensity of the region corresponding to the ij is measured to be I by the area array detector ij Wherein T is ij (lambda) is the transmittance of light having a wavelength lambda in the ij region;
the light intensity of the ij-th region;
n x M light intensity values can be measured by the area array detector, so that N x M mathematical equations are formed; solving the NxM mathematical equations by a numerical calculation mode to obtain the incident spectrum information phi (lambda).
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104298022A (en) * | 2014-10-24 | 2015-01-21 | 华中科技大学 | Graphene-based double-mold hybrid integrated electronic control liquid crystal micro lens array chip |
| CN105699330A (en) * | 2016-01-19 | 2016-06-22 | 北京大学 | Refractive index sensor based on surface plasmon laser and detection system and method |
| CN207263300U (en) * | 2017-10-24 | 2018-04-20 | 中国计量大学 | A kind of spectrometer based on super surface texture |
| CN108507678A (en) * | 2018-03-01 | 2018-09-07 | 东南大学 | A kind of adjustable ultraphotic spectrum detection chip of phasmon multi-resonant mechanism enhancing |
| CN109343217A (en) * | 2018-11-13 | 2019-02-15 | 南京大学 | An achromatic light-field camera system and achromatic method based on metalens array |
| CN109642822A (en) * | 2016-08-22 | 2019-04-16 | 三星电子株式会社 | Spectrometer and the spectral measurement method for utilizing it |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AUPS098002A0 (en) * | 2002-03-08 | 2002-03-28 | University Of Western Australia, The | Tunable cavity resonator, and method of fabricating same |
| CN101963583B (en) * | 2010-09-10 | 2012-03-14 | 清华大学 | Optical fiber probe and sensing system with same |
-
2020
- 2020-03-26 CN CN202010222056.7A patent/CN113447123B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104298022A (en) * | 2014-10-24 | 2015-01-21 | 华中科技大学 | Graphene-based double-mold hybrid integrated electronic control liquid crystal micro lens array chip |
| CN105699330A (en) * | 2016-01-19 | 2016-06-22 | 北京大学 | Refractive index sensor based on surface plasmon laser and detection system and method |
| CN109642822A (en) * | 2016-08-22 | 2019-04-16 | 三星电子株式会社 | Spectrometer and the spectral measurement method for utilizing it |
| CN207263300U (en) * | 2017-10-24 | 2018-04-20 | 中国计量大学 | A kind of spectrometer based on super surface texture |
| CN108507678A (en) * | 2018-03-01 | 2018-09-07 | 东南大学 | A kind of adjustable ultraphotic spectrum detection chip of phasmon multi-resonant mechanism enhancing |
| CN109343217A (en) * | 2018-11-13 | 2019-02-15 | 南京大学 | An achromatic light-field camera system and achromatic method based on metalens array |
Non-Patent Citations (1)
| Title |
|---|
| Color Imaging via Nearest Neighbor Hole Coupling in Plasmonic Color Filters Integrated onto a Complementary Metal-Oxide Semiconductor Image Sensor;Stanley P. Burgos 等;《ACS NANO》;"Hole Array Filter Design部分"、"Fabrication and Integration部分"和"METHODS章节"，附图2 * |
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