CN113322445B - Heavy-calibre basement coating film frock - Google Patents
Heavy-calibre basement coating film frock Download PDFInfo
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- CN113322445B CN113322445B CN202110608116.3A CN202110608116A CN113322445B CN 113322445 B CN113322445 B CN 113322445B CN 202110608116 A CN202110608116 A CN 202110608116A CN 113322445 B CN113322445 B CN 113322445B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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Abstract
Description
技术领域technical field
本发明属于镀膜工装技术领域,特别涉及一种大口径基底镀膜工装。The invention belongs to the technical field of coating tooling, and particularly relates to a large-diameter base coating tooling.
背景技术Background technique
光学薄膜应用于工业生产、科学研究、工作生活等各个领域。随着技术的发展,在一些场合下对光学薄膜提出了更加严苛的指标需求。比如在极紫外领域,由于物质对短波的吸收和折射率趋近于1的物理特性,只能使用高低折射率材料交替堆叠构成的布拉格反射膜来实现极紫外光的调控。这一类光学薄膜的镀制,不仅要求在纵向上达到亚纳米的控制精度,还要求在横向上满足一定的面形指标。极紫外光刻机中使用的典型的反射镜使用非球面或自由曲面,直径在200~500mm左右,而对面形的指标高达0.01nmRMS,对薄膜引入的面形偏差更是达到0.005nmRMS,由此在整个的镀膜流程中都需进行严苛的设计与管控。Optical films are used in various fields such as industrial production, scientific research, work and life. With the development of technology, more stringent index requirements are put forward for optical films in some occasions. For example, in the EUV field, due to the physical properties of the material's absorption of short wavelengths and the refractive index approaching 1, the control of EUV light can only be achieved by using a Bragg reflector composed of alternating stacks of high and low refractive index materials. The plating of this type of optical film not only requires sub-nanometer control accuracy in the longitudinal direction, but also requires a certain surface shape index in the transverse direction. Typical mirrors used in EUV lithography machines use aspheric or free-form surfaces, with a diameter of about 200-500mm, while the surface shape index is as high as 0.01nmRMS, and the surface shape deviation introduced to the film is even 0.005nmRMS, thus Strict design and control are required throughout the coating process.
镀膜工装是镀膜基底在薄膜沉积过程中的支撑夹持机构。常见的镀膜工装包括利用与基底形状一致的槽型进行限位、使用压片固定等多种形式。但由于基底尺寸较小、指标精度不高等原因,镀膜工装的支撑一般使用与基底紧贴的平面,或者与基底相同尺寸的套环等来实现。但是对于类似上述的大口径基底同时面形精度要求极其高的情况,在使用时,受支撑与重力的共同作用,会产生一定的面形变化。为了扣除这一变化的影响,检测环节已经使用了与工作条件完全相同的工装配置。在镀膜时,使用常规的平面支撑式镀膜工装就不再适合指标需求了。The coating tool is a supporting and clamping mechanism for the coating substrate during the film deposition process. Common coating tooling includes various forms such as using a groove shape consistent with the shape of the substrate to limit the position, and using a pressing sheet to fix it. However, due to the small size of the substrate and the low index accuracy, the support of the coating tooling is generally realized by a plane that is close to the substrate, or a collar of the same size as the substrate. However, in the case of large-diameter substrates like the above-mentioned large-diameter substrates with extremely high requirements on surface shape accuracy, certain surface shape changes will occur due to the combined action of support and gravity during use. To deduct the effect of this change, the inspection process has used the exact same tooling configuration as the working conditions. When coating, the use of conventional flat support coating tooling is no longer suitable for the index requirements.
综上所述,面向超高精度的镀膜工艺需求,一种大口径基底镀膜工装是十分重要的。To sum up, a large-diameter substrate coating tool is very important for the ultra-high-precision coating process requirements.
发明内容SUMMARY OF THE INVENTION
有鉴如此,本发明的目的是提供一种大口径基底镀膜工装,提供与工作环境相近的支撑条件,保证薄膜沉积过程与最终使用条件基底面形的一致性,实现高精度的面形控制,降低重力对基底面形的影响。In view of this, the purpose of the present invention is to provide a large-diameter substrate coating tool, provide supporting conditions similar to the working environment, ensure the consistency of the substrate surface shape during the film deposition process and the final use conditions, and achieve high-precision surface shape control, Reduce the effect of gravity on the basal surface shape.
为实现上述目的,本发明提供一种大口径基底镀膜工装,在所述工装的中间开设与基底形状一致的凹槽,所述凹槽的侧壁构成限位结构,在所述凹槽的底面设置支撑结构,基底装配于所述凹槽内,在所述工装的边缘设置固定结构;In order to achieve the above purpose, the present invention provides a large-diameter base coating tool, in which a groove with the same shape as the base is opened in the middle of the tool, the side wall of the groove constitutes a limit structure, and the bottom surface of the groove is formed. A support structure is arranged, the base is assembled in the groove, and a fixing structure is arranged on the edge of the tooling;
所述支撑结构与镀膜完成后的光学元件在工作时的支撑结构保持一致,用于在镀膜过程中支撑基底;The support structure is consistent with the support structure of the optical element after the coating is completed during operation, and is used to support the substrate during the coating process;
所述限位结构用于限制基底的平移,使基底保持不动;The limiting structure is used to limit the translation of the base to keep the base still;
所述固定结构用于将所述工装固定于镀膜机样品台上。The fixing structure is used for fixing the tool on the sample stage of the coating machine.
进一步地,所述支撑结构采用三点支撑,所述支撑结构为三个半球形凸起,均布于所述凹槽的底面上。Further, the support structure adopts three-point support, and the support structure is three hemispherical protrusions, which are evenly distributed on the bottom surface of the groove.
进一步地,在基底的底面配套设有3个支撑通孔,装配时半球形凸起部分进入支撑通孔中,半球形凸起的直径大于支撑通孔的直径。Further, three supporting through holes are arranged on the bottom surface of the base, the hemispherical protrusions enter into the supporting through holes during assembly, and the diameter of the hemispherical protrusions is larger than that of the supporting through holes.
进一步地,基底的底部为三棱柱形,上部为圆柱形,装配时三棱柱底部的部分位于所述凹槽内;所述凹槽为三角形凹槽,三个半球形凸起分别位于三角形的顶点位置。Further, the bottom of the base is a triangular prism, and the upper part is a cylindrical shape, and the bottom part of the triangular prism is located in the groove during assembly; the groove is a triangular groove, and the three hemispherical protrusions are respectively located at the vertices of the triangle. Location.
进一步地,所述工装为圆柱形,所述固定结构为若干个安装通孔,均布于圆柱形工装的边缘位置,通过安装通孔和螺钉实现与镀膜机样品台的固定。Further, the tooling is cylindrical, and the fixing structure is a plurality of installation through holes, which are evenly distributed on the edge of the cylindrical tooling, and the fixing with the sample stage of the coating machine is realized by the installation through holes and screws.
进一步地,安装通孔的数量为3个。Further, the number of mounting through holes is three.
进一步地,所述工装的材质为铝,或者镁铝合金。Further, the material of the tooling is aluminum, or magnesium-aluminum alloy.
本发明的大口径基底镀膜工装,能够提供与工作环境相近的支撑条件,保证了薄膜沉积过程与最终使用条件基底面形的一致性,极大地提高了镀膜的精度。The large-diameter substrate coating tool of the invention can provide support conditions similar to the working environment, ensure the consistency of the film deposition process and the final use condition of the substrate surface, and greatly improve the coating accuracy.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其它的附图。In order to explain the embodiments of the present invention or the technical solutions in the prior art more clearly, the following briefly introduces the accompanying drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention, and for those of ordinary skill in the art, other drawings can also be obtained from these drawings without creative effort.
图1是本发明的大口径基底镀膜工装的结构示意图;Fig. 1 is the structural representation of the large-diameter base coating tool of the present invention;
图2是本发明的大口径基底镀膜工装与基底的装配结构示意图;Fig. 2 is the assembly structure schematic diagram of the large-diameter base coating tool and base of the present invention;
图3是大口径基底在平面支撑与重力作用下的面形ANSYS仿真图;Figure 3 is an ANSYS simulation diagram of the surface shape of a large-diameter substrate under the action of plane support and gravity;
图4是大口径基底在三点支撑与重力作用下的面形ANSYS仿真图;Figure 4 is an ANSYS simulation diagram of the surface shape of a large-diameter substrate under the action of three-point support and gravity;
附图标记说明:1-支撑结构;2-限位结构;3-固定结构;4-基底。Description of reference numerals: 1-support structure; 2-limiting structure; 3-fixed structure; 4-base.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其它实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
在镀膜过程中,在基底尺寸较小、指标精度不高时,镀膜工装的支撑一般使用与基底紧贴的平面,或者与基底相同尺寸的套环等来实现。但是对于大口径基底同时面形精度要求极其高的情况下,基底由于受支撑与重力的共同作用,在使用时会产生一定的面形变化。In the coating process, when the size of the substrate is small and the index accuracy is not high, the support of the coating tool is generally realized by a plane that is close to the substrate, or a collar of the same size as the substrate. However, in the case of large-diameter substrates and extremely high surface shape accuracy requirements, the substrate will have certain surface shape changes during use due to the combined action of support and gravity.
如图3和4所示,分别为大口径基底在平面支撑与重力作用下的面形ANSYS仿真图,大口径基底在三点支撑与重力作用下的面形ANSYS仿真图。仿真过程,工装如图所示呈圆形,直径250mm,选用不锈钢材质;镀镜为三角形,边长150mm,镜面为圆形,直径100mm,镜面为凹面镜,曲率半径400mm,选用微晶玻璃材质。镀镜三个角位置的通孔与位置相应的支撑结构接触,使得镀镜在平面内的受力点可近似的视为三个点。对于传统工装,镀镜下表面直接与金属平面接触。通过有限元方法,分析了两种支撑条件下,镜面受重力影响的形变情况。As shown in Figures 3 and 4, they are the ANSYS simulation diagram of the surface shape of the large-diameter substrate under the action of plane support and gravity, and the ANSYS simulation diagram of the surface shape of the large-diameter substrate under the action of three-point support and gravity. In the simulation process, the tooling is circular as shown in the figure, with a diameter of 250mm and stainless steel; the mirror is a triangle with a side length of 150mm; . The through holes at the three corners of the mirror are in contact with the corresponding support structures, so that the force points of the mirror in the plane can be approximately regarded as three points. For traditional tooling, the mirrored lower surface is in direct contact with the metal plane. Through the finite element method, the deformation of the mirror surface under the influence of gravity under the two support conditions is analyzed.
从图3和4中可以看出,在三点支撑下的基底面形与使用传统平面支撑的面形是明显不同的。在面向高精度镀膜的情况下,使用与工作条件一致或相近的镀膜工装能够更好的用于面形的控制。As can be seen from Figures 3 and 4, the base surface shape under three-point support is significantly different from that using conventional planar support. In the case of high-precision coating, the use of coating tooling that is consistent with or similar to the working conditions can better control the surface shape.
本发明提供一种大口径基底镀膜工装,如图1和2所示,在所述工装的中间开设与基底4形状一致的凹槽,所述凹槽的侧壁构成限位结构2,在所述凹槽的底面设置支撑结构1,基底4装配于所述凹槽内,在所述工装的边缘设置固定结构3;The present invention provides a large-diameter substrate coating tool. As shown in Figures 1 and 2, a groove with the same shape as the
所述支撑结构1与镀膜完成后的光学元件在工作时的支撑结构保持一致,用于在镀膜过程中支撑基底;The
所述限位结构2用于限制基底4的平移,使基底保持不动;The
所述固定结构3用于将所述工装固定于镀膜机样品台上。The
其中,所述支撑结构1可以采用三点支撑,所述支撑结构1为三个半球形凸起,均布于所述凹槽的底面上。在基底4的底面配套设有3个支撑通孔,装配时半球形凸起部分进入支撑通孔中,半球形凸起的直径大于支撑通孔的直径。当然,所述支撑结构1也可以采用多点支撑,此时基底4上配套设置的支撑通孔的数量也跟着同步改变。Wherein, the
在一些实施例中,基底4的底部为三棱柱形,上部为圆柱形,装配时三棱柱底部的部分位于所述凹槽内;所述凹槽为三角形凹槽,三个半球形凸起分别位于三角形的顶点位置。所述工装为圆柱形,所述固定结构3为若干个安装通孔,均布于圆柱形工装的边缘位置,通过安装通孔和螺钉实现与镀膜机样品台的固定,在该实施例中,安装通孔的数量为3个,在其他实施例中可以设计成多个。当然基底4的也可以为其他形状,此时凹槽形状的设计也同步匹配。In some embodiments, the bottom of the
本发明中所述工装采用铝、镁铝合金等具有真空兼容性的材料制成,使用时需保证表面清洁,没有真空放气材料的污染。The tooling in the present invention is made of materials with vacuum compatibility such as aluminum, magnesium-aluminum alloy, etc., and it is necessary to ensure that the surface is clean during use, and there is no pollution from the vacuum outgassing material.
本发明的大口径基底镀膜工装,能够提供与工作环境相近的支撑条件,保证了薄膜沉积过程与最终使用条件基底面形的一致性,极大地提高了镀膜的精度。The large-diameter substrate coating tool of the invention can provide support conditions similar to the working environment, ensure the consistency of the film deposition process and the final use condition of the substrate surface, and greatly improve the coating accuracy.
当然本发明还可具有多种变换及改型,并不局限于上述实施方式的具体结构。总之,本发明的保护范围应包括那些对于本领域普通技术人员来说显而易见的变换或替代以及改型。Of course, the present invention can also have various transformations and modifications, and is not limited to the specific structures of the above-mentioned embodiments. In a word, the protection scope of the present invention should include those changes or substitutions and modifications that are obvious to those of ordinary skill in the art.
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CN110724913A (en) * | 2019-11-07 | 2020-01-24 | 西安工业大学 | A large-diameter mirror resistance thermal evaporation coating device |
CN110846634A (en) * | 2019-11-25 | 2020-02-28 | 中国科学院光电技术研究所 | A planetary rotating device and coating equipment capable of mass production |
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