CN113248750A - Preparation method of silicon-free release film - Google Patents
Preparation method of silicon-free release film Download PDFInfo
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- CN113248750A CN113248750A CN202110422721.1A CN202110422721A CN113248750A CN 113248750 A CN113248750 A CN 113248750A CN 202110422721 A CN202110422721 A CN 202110422721A CN 113248750 A CN113248750 A CN 113248750A
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
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- C08J7/042—Coating with two or more layers, where at least one layer of a composition contains a polymer binder
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- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
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- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
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- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
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Abstract
The invention discloses a silicon-free release film which comprises a film main body, wherein a release agent is arranged on the surface of the film main body, and the silicon-free release agent is formed; the film main body comprises the following components in parts by weight: 100-500 parts of copolymerized and modified polyethylene glycol terephthalate, 5-10 parts of cross-linking agent and 1-2 parts of reinforcing agent, mixing and stirring the components, and pressing into a film sheet; the preparation method has the technical key points that when the silicon-free release agent is added with the catalyst and applied to the organic reaction, the whole mixing reaction condition is mild, the reaction speed can be improved when the silicon-free release agent is combined with a stirrer for use, meanwhile, the inner wall of the stirrer cannot be corroded, and the whole preparation process has a good effect; the stepped heating method is utilized in the preparation process, the using effect of the silicon-free release film after preparation is improved to a certain extent, corona treatment can be carried out in the temperature reduction process, the flexibility of the whole preparation process is reflected, and meanwhile, the adhesion degree of the film main body and the silicon-free release agent can also be ensured.
Description
Technical Field
The invention belongs to the technical field of release film preparation, and particularly relates to a preparation method of a silicon-free release film.
Background
The release film is a film with a distinguished surface, and the release film does not have viscosity or slight viscosity after being contacted with a specific material under a limited condition; the release film is also called as a stripping film, an isolating film, a separating film, a glue-resisting film, a release film, a plastic film, a hole-masking film, a silicon oil film, silicon oil paper, an anti-sticking film, molded paper, a slip film, Tianna paper and release paper; in general, in order to increase the release force of the plastic film, the plastic film is subjected to plasma treatment, or fluorine coating, or silicon release agent coating on the surface layer of the film material, such as PET, PE, and OPP;
however, the following technical problems can occur when the release film is prepared at present: firstly, the reaction rate of the whole preparation process is low, long-time continuous stirring is needed, and more electric energy is wasted; and secondly, the film main body and the silicon-free release agent are directly bonded, and the bonding degree between the film main body and the silicon-free release agent needs to be improved.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a preparation method of a silicon-free release film.
In order to achieve the purpose, the invention adopts the following technical scheme:
a silicon-free release film comprises a film main body, wherein a release agent is arranged on the surface of the film main body, and the silicon-free release agent is formed;
the film main body comprises the following components in parts by weight: 100-500 parts of copolymerized and modified polyethylene glycol terephthalate, 5-10 parts of cross-linking agent and 1-2 parts of reinforcing agent, mixing and stirring the components, and pressing into a film sheet;
the silicon-free release agent comprises the following components in parts by weight: 20-50 parts of any one of polyethyleneimine high molecular polymer or alkyl, 2-10 parts of mica powder, 1-2 parts of catalyst and 0.1-0.5 part of antistatic agent.
Preferably, the crosslinking agent comprises any one of dicumyl peroxide, benzoyl peroxide, di-t-butyl peroxide and dicumyl hydroperoxide. .
Preferably, the reinforcing agent comprises mixed polystyrene, polyimide and polybutylcyanide.
Preferably, the catalyst may be any one of an organotin catalyst or a polypropylene catalyst.
Preferably, the preparation method of the silicon-free release film comprises the following steps:
s1, pouring the polyethyleneimine high-molecular polymer, the mica powder and the catalyst in the silicon-free release agent into a stirrer to be stirred, and pouring out after treating for 30-50min to obtain a mixture;
s2, pouring the mixture into a trough of a coating machine, and uniformly coating the mixture on the surface of the film main body;
s3, drying the surface of the film main body, continuously increasing the temperature during air drying, and stabilizing the temperature after 30min and then obtaining the film at 90 degrees;
s4, carrying out corona treatment on the film main body;
s5, pouring the antistatic agent into a trough of a coating machine, uniformly coating the antistatic agent on the surface of the film main body, and continuously drying the film main body, wherein the air drying temperature is continuously increased to 120 ℃.
Preferably, in the step S1, the rotation speed of the stirring rod during stirring is 300-400r/min, and during the stirring treatment, the components in the silicon-free release agent are sequentially poured into the stirrer, and after the materials to be added are uniformly mixed, the next material is continuously added.
Preferably, in the step S4, the power of the corona treatment is 10-30 kw.
Compared with the prior art, the invention provides a preparation method of a silicon-free release film, which has the following beneficial effects:
the catalyst is added into the silicon-free release agent, so that the whole mixing reaction condition is mild when the silicon-free release agent is applied to the organic reaction, the reaction speed can be improved when the silicon-free release agent is used in combination with a stirrer, meanwhile, the inner wall of the stirrer cannot be corroded, and the whole preparation process has a good effect;
the stepped heating method is utilized in the preparation process, the using effect of the silicon-free release film after preparation is improved to a certain extent, corona treatment can be carried out in the process of temperature reduction, the flexibility of the whole preparation process is reflected, and meanwhile, the adhesion degree of the film main body and the silicon-free release agent can also be ensured.
Drawings
FIG. 1 is a schematic view of the overall structure of a film body and a silicon-free release agent according to the present invention;
FIG. 2 is a flow chart of the preparation method of the present invention.
Detailed Description
The following describes a specific embodiment of the preparation method of the silicon-free release film in the invention with reference to fig. 1. The method for preparing a silicon-free release film of the present invention is not limited to the description of the following examples.
The embodiment provides a specific structure of a preparation method of a silicon-free release film, and as shown in fig. 1, the silicon-free release film comprises a film main body, wherein a release agent is arranged on the surface of the film main body, and the silicon-free release agent is formed;
the film main body comprises the following components in parts by weight: 100-500 parts of copolymerized and modified polyethylene glycol terephthalate, 5-10 parts of cross-linking agent and 1-2 parts of reinforcing agent, mixing and stirring the components, and pressing into a film sheet;
the silicon-free release agent comprises the following components in parts by weight: 20-50 parts of any one of polyethyleneimine high molecular polymer or alkyl, 2-10 parts of mica powder, 1-2 parts of catalyst and 0.1-0.5 part of antistatic agent.
The crosslinking agent contains any one of dicumyl peroxide, benzoyl peroxide, di-tert-butyl peroxide and dicumyl hydroperoxide.
The reinforcing agent comprises mixed polystyrene, polyimide and polybutylcyanide.
The catalyst can adopt any one of organic tin catalyst or polypropylene catalyst.
Specifically, referring to fig. 1, the following are sequentially divided from top to bottom: a silicon-free release agent, a corona layer, and a film body, which may be a PET film.
The invention adds the catalyst into the silicon-free release agent, can lead the whole mixing reaction condition to be mild when being applied to the organic reaction, can improve the reaction speed when being used by combining a stirrer, can not cause corrosion to the inner wall of the stirrer, and has better effect of the whole preparation process
As shown in fig. 2, a silicon-free release film is prepared by the following specific steps:
s1, pouring the polyethyleneimine high-molecular polymer, the mica powder and the catalyst in the silicon-free release agent into a stirrer to be stirred, and pouring out after treating for 30-50min to obtain a mixture;
s2, pouring the mixture into a trough of a coating machine, and uniformly coating the mixture on the surface of the film main body;
s3, drying the surface of the film main body, continuously increasing the temperature during air drying, and stabilizing the temperature after 30min and then obtaining the film at 90 degrees;
s4, carrying out corona treatment on the film main body;
s5, pouring the antistatic agent into a trough of a coating machine, uniformly coating the antistatic agent on the surface of the film main body, and continuously drying the film main body, wherein the air drying temperature is continuously increased to 120 ℃.
In step S1, the rotation speed of the stirring rod during stirring is 300-.
In step S4, the power at the time of corona treatment is 10-30 kw.
The stepped heating method is utilized in the preparation process, the using effect of the silicon-free release film after preparation is improved to a certain extent, corona treatment can be carried out in the process of temperature reduction, the flexibility of the whole preparation process is reflected, and meanwhile, the adhesion degree of the film main body and the silicon-free release agent can also be ensured.
Compared with the traditional silicon-free release film, the technical indexes of the prepared silicon-free release film are as follows:
the tensile strength (longitudinal and transverse) is more than or equal to 190 Mpa; the traditional pressure is 185 MPa;
the elongation at break (longitudinal and transverse) is more than or equal to 95 percent; the traditional rate is 94.8%;
the longitudinal shrinkage rate is 0.6 percent, and the transverse shrinkage rate is 0.35 percent;
the peeling force is 10 +/-2 g/in; the traditional method is 16 +/-2 g/in
The turbidity is less than or equal to 4.0 percent; the tradition is as follows: 5.0 percent
Temperature resistance of 190 +/-57 & # 8451.
The foregoing is a more detailed description of the invention in connection with specific preferred embodiments and it is not intended that the invention be limited to these specific details. For those skilled in the art to which the invention pertains, several simple deductions or substitutions can be made without departing from the spirit of the invention, and all shall be considered as belonging to the protection scope of the invention.
Claims (7)
1. A silicon-free release film comprises a film main body and is characterized in that a release agent is arranged on the surface of the film main body, and the silicon-free release agent is formed;
the film main body comprises the following components in parts by weight: 100-500 parts of copolymerized and modified polyethylene glycol terephthalate, 5-10 parts of cross-linking agent and 1-2 parts of reinforcing agent, mixing and stirring the components, and pressing into a film sheet;
the silicon-free release agent comprises the following components in parts by weight: 20-50 parts of any one of polyethyleneimine high molecular polymer or alkyl, 2-10 parts of mica powder, 1-2 parts of catalyst and 0.1-0.5 part of antistatic agent.
2. The silicon-free release film of claim 1, wherein: the crosslinking agent comprises any one of dicumyl peroxide, benzoyl peroxide, di-tert-butyl peroxide and dicumyl hydroperoxide.
3. The silicon-free release film of claim 1, wherein: the reinforcing agent comprises mixed polystyrene, polyimide and polybutylcyanide.
4. The silicon-free release film of claim 1, wherein: the catalyst can adopt any one of organic tin catalyst or polypropylene catalyst.
5. The silicon-free release film according to claim 1, wherein the specific preparation method comprises the following steps:
s1, pouring the polyethyleneimine high-molecular polymer, the mica powder and the catalyst in the silicon-free release agent into a stirrer to be stirred, and pouring out after treating for 30-50min to obtain a mixture;
s2, pouring the mixture into a trough of a coating machine, and uniformly coating the mixture on the surface of the film main body;
s3, drying the surface of the film main body, continuously increasing the temperature during air drying, and stabilizing the temperature after 30min and then obtaining the film at 90 degrees;
s4, carrying out corona treatment on the film main body;
s5, pouring the antistatic agent into a trough of a coating machine, uniformly coating the antistatic agent on the surface of the film main body, and continuously drying the film main body, wherein the air drying temperature is continuously increased to 120 ℃.
6. The method for preparing the silicon-free release film according to claim 5, wherein the method comprises the following steps: in the step S1, the rotation speed of the stirring rod during stirring is 300-.
7. The method for preparing the silicon-free release film according to claim 5, wherein the method comprises the following steps: in the step S4, the power at the time of corona treatment is 10-30 kw.
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150361235A1 (en) * | 2013-02-06 | 2015-12-17 | Mitsubishi Plastics, Inc. | Release film |
CN110776845A (en) * | 2018-07-31 | 2020-02-11 | 苏州思锐达新材料有限公司 | Low-temperature deformation antistatic release film and preparation process and application thereof |
CN111410925A (en) * | 2018-12-30 | 2020-07-14 | 苏州市奥贝膜业有限公司 | Preparation method of silicon-free PET release film |
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2021
- 2021-04-16 CN CN202110422721.1A patent/CN113248750A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150361235A1 (en) * | 2013-02-06 | 2015-12-17 | Mitsubishi Plastics, Inc. | Release film |
CN110776845A (en) * | 2018-07-31 | 2020-02-11 | 苏州思锐达新材料有限公司 | Low-temperature deformation antistatic release film and preparation process and application thereof |
CN111410925A (en) * | 2018-12-30 | 2020-07-14 | 苏州市奥贝膜业有限公司 | Preparation method of silicon-free PET release film |
Non-Patent Citations (1)
Title |
---|
张振雄;邱殿銮;孙君;戴礼兴;: "聚对苯二甲酸乙二醇酯共聚改性技术进展" * |
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