CN113087403B - Forming process for glass substrate with fingerprint resistance and scratch resistance and wear resistance - Google Patents
Forming process for glass substrate with fingerprint resistance and scratch resistance and wear resistance Download PDFInfo
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- CN113087403B CN113087403B CN202110346912.4A CN202110346912A CN113087403B CN 113087403 B CN113087403 B CN 113087403B CN 202110346912 A CN202110346912 A CN 202110346912A CN 113087403 B CN113087403 B CN 113087403B
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
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Abstract
The invention relates to the technical field of glass deep processing, and particularly discloses a forming process of an etching effect of a glass substrate with fingerprint resistance and scratch resistance and wear resistance, which is mainly applied to chemical etching of a glass mobile phone back cover, and the fingerprint resistance effect is realized by forming a honeycomb-like particle layer on the surface of the glass mobile phone back cover to disperse the grains of finger fingerprints as much as possible; meanwhile, the honeycomb particle layer has good wear resistance, and can be used for a long time without falling off. In addition, the acid in the etching solution adopts organic acid, such as p-toluenesulfonic acid and methanesulfonic acid, and is combined with fluoride salts (ammonium bifluoride and sodium fluoride) to form active ingredients in the etching solution, so that the production is stable during frosting, and the waste liquid after frosting is environment-friendly and environment-friendly; in addition, the etching solution has lower price, the etching process is easier to control, the production yield is high, and the product quality is stable.
Description
Technical Field
The invention relates to the technical field of glass deep processing, in particular to a glass substrate etching effect forming process with fingerprint resistance, scratch resistance and wear resistance.
Background
Currently, more and more manufacturers of mobile phones begin to convert the material of the back cover of the mobile phone into a glass material. The glass mobile phone back cover is etched by using the chemical etching solution in the production process while the signal receiving capacity of the mobile phone is improved, so that various patterns can be obtained, and the mobile phone is more attractive and higher in quality.
Most of the existing chemical etching solutions are only used for carrying out attractive treatment on the surface of the back cover of the glass mobile phone, and the problem that the back cover of the glass mobile phone is easy to remain fingerprint-resistant is not solved. In addition, in the actual use process, the glass mobile phone back cover is not wear-resistant, and is not beneficial to the production of equipment manufacturers.
Disclosure of Invention
In order to solve the problems, the invention provides a glass substrate etching effect forming process with fingerprint resistance, scratch resistance and wear resistance.
The technical scheme adopted for solving the technical problems is as follows: a glass substrate etching effect molding process with fingerprint resistance, scratch resistance and wear resistance comprises the following steps:
s1, preparing an etching solution by the following components in parts by weight: 5-10 parts of ammonium bifluoride, 5-10 parts of sodium fluoride, 10-15 parts of p-toluenesulfonic acid, 10-15 parts of methanesulfonic acid, 2-6 parts of laureth, 2-4 parts of sodium polyacrylate, 2-10 parts of EDTA and 90-95 parts of water, and firstly, grinding and uniformly mixing the ammonium bifluoride and the sodium fluoride to form a mixture 1; grinding and uniformly mixing p-toluenesulfonic acid and methanesulfonic acid to form a mixture 2; then uniformly stirring laurinol polyoxyethylene ether and sodium polyacrylate to form a mixture 3; finally, heating water to 50 ℃, adding the mixture 3, EDTA, the mixture 2 and the mixture 1 into the water while stirring, and then sealing, standing and curing to obtain etching solution;
s2, cleaning the surface of the glass substrate to be frosted for the first time by using clean water;
s3, drying the glass, and protecting the surface of the glass substrate without frosting;
s4, placing the glass substrate into a frosting device, and frosting the surface of the glass substrate for 80 seconds by using the etching solution prepared in the step S1;
s5, placing the glass substrate etched in the step S4 into a conventional polishing solution for 7 minutes to polish;
and S6, cleaning the surface of the polished glass substrate with clean water for the second time.
The acid in the etching solution adopts organic acid such as p-toluenesulfonic acid and methanesulfonic acid, and is combined with fluoride salts (ammonium bifluoride and sodium fluoride) to form active ingredients in the etching solution, so that the production is stable during frosting, and the waste liquid after frosting is environment-friendly and environment-friendly.
The laurinol polyoxyethylene ether is combined with sodium polyacrylate and is used as a surfactant in the etching solution, so that the effective components in the etching solution can better react with the surface of the glass substrate.
Preferably, the curing time in S1 is 24 hours, and the stirring is carried out every 4 hours in the curing process.
Preferably, the etching solution temperature is kept at 28-32 ℃ during the frosting in the step S4, and the etching solution temperature difference is controlled within 3%.
Preferably, after the surface of the glass substrate is frosted by adopting the molding process, a honeycomb-like particle layer is uniformly distributed on the surface of the glass substrate.
The forming process is mainly applied to chemical etching of the glass mobile phone back cover, and in the actual production process, large-scale equipment is adopted to spray the glass mobile phone back cover, so that large-scale mass production can be realized, and the product treatment yield is high.
Compared with the prior art, the technical scheme has the following beneficial effects:
1. the acid in the etching solution adopts organic acid such as p-toluenesulfonic acid and methanesulfonic acid, and is combined with fluoride salts (ammonium bifluoride and sodium fluoride) to form active ingredients in the etching solution, so that the production is stable during frosting, and the waste liquid after frosting is environment-friendly and environment-friendly; in addition, the etching solution has lower price, the etching process is easier to control, the production yield is high, and the product quality is stable.
2. The forming process is mainly applied to chemical etching of the back cover of the glass mobile phone, and the grains of the finger fingerprints are dispersed as much as possible by forming a honeycomb-like particle layer on the surface of the back cover of the glass mobile phone, so that the anti-fingerprint effect is realized; meanwhile, the honeycomb particle layer has good wear resistance, and can be used for a long time without falling off.
Drawings
FIG. 1 is an electron microscope image of a glass surface of a batch 1 of a fifth test in accordance with an embodiment of the present invention;
FIG. 2 is an electron microscope image of a fifth test batch 2 glass surface according to the present invention;
FIG. 3 is an electron microscope image of the glass surface of batch 3 tested in accordance with the fifth embodiment of the present invention.
Detailed Description
The following describes the invention in more detail. The description of these embodiments is provided to assist understanding of the present invention, but is not intended to limit the present invention.
Example 1
The invention relates to a glass substrate etching effect forming process with fingerprint resistance, scratch resistance and wear resistance, which comprises the following steps:
s1, preparing an etching solution by the following components in parts by weight: 5-10 parts of ammonium bifluoride, 5-10 parts of sodium fluoride, 10-15 parts of p-toluenesulfonic acid, 10-15 parts of methanesulfonic acid, 2-6 parts of laureth, 2-4 parts of sodium polyacrylate, 2-10 parts of EDTA and 90-95 parts of water, and firstly, grinding and uniformly mixing the ammonium bifluoride and the sodium fluoride to form a mixture 1; grinding and uniformly mixing p-toluenesulfonic acid and methanesulfonic acid to form a mixture 2; then uniformly stirring laurinol polyoxyethylene ether and sodium polyacrylate to form a mixture 3; finally, heating water to 50 ℃, adding the mixture 3, EDTA, the mixture 2 and the mixture 1 into water while stirring (adding another substance after stirring until no sediment), standing and curing for 24 hours, and stirring once every 4 hours to obtain etching solution;
s2, cleaning the surface of the glass substrate to be frosted for the first time by using clean water;
s3, drying the glass, and protecting the surface of the glass substrate without frosting;
s4, placing the glass substrate into a frosting device, and frosting the surface of the glass substrate for 80 seconds by using the etching solution prepared in the S1, wherein the temperature of the etching solution is kept at 28-32 ℃, and the temperature difference of the etching solution is controlled within 3%;
s5, placing the glass substrate etched in the step S4 into a conventional polishing solution for 7 minutes to polish;
and S6, cleaning the surface of the polished glass substrate with clean water for the second time.
After the surface of the glass substrate is frosted by adopting a molding process, a honeycomb-like particle layer is uniformly distributed on the surface of the glass substrate. The forming process is mainly applied to chemical etching of the glass mobile phone back cover, and in the actual production process, large-scale equipment is adopted to spray the glass mobile phone back cover, so that large-scale mass production can be realized, and the product treatment yield is high.
Example two
The etching solution is prepared from the following components in parts by weight: 7 parts of ammonium bifluoride, 5 parts of sodium fluoride, 10 parts of p-toluenesulfonic acid, 13 parts of methanesulfonic acid, 2 parts of laurinol polyoxyethylene ether, 2 parts of sodium polyacrylate, 10 parts of EDTA and 90 parts of water; the etching liquid is kept at 28 ℃ during frosting, and the temperature difference of the etching liquid is controlled within 3%.
The etching solution of the second example and the molding process of the first example were used to test a glass substrate and to test the surface of the glass substrate for performance, and the following results were obtained:
firstly, no fingerprint residue exists on the surface of the glass substrate, and secondly, the thickness of the honeycomb-like particle layer is 45nm and the hardness is 5H measured by an instrument; thirdly, the dynamic friction coefficient is 0.03 measured by a friction measuring instrument, the wear resistance is good, and the dynamic friction coefficient is 1000g/cm 2 10000 times of steel wool friction test under pressure, and the contact angle of water drops is still maintained>100 °; fourth, the surface energy is 16mJ/m 2 The drop angle was 110 ° and the drop angle was 65 °.
Example III
The etching solution is prepared from the following components in parts by weight: 5 parts of ammonium bifluoride, 10 parts of sodium fluoride, 15 parts of p-toluenesulfonic acid, 10 parts of methanesulfonic acid, 4 parts of laurinol polyoxyethylene ether, 4 parts of sodium polyacrylate, 7 parts of EDTA and 93 parts of water; the etching liquid is kept at 32 ℃ during frosting, and the temperature difference of the etching liquid is controlled within 3%.
The etching solution of example three and the molding process of example one were used to test a glass substrate and to test the surface properties of the glass substrate, resulting in the following results:
firstly, no fingerprint residue exists on the surface of the glass substrate, and secondly, the thickness of the honeycomb-like particle layer is 47nm and the hardness is 6H measured by an instrument; thirdly, the dynamic friction coefficient measured by a friction measuring instrument is 0.04, the wear resistance is good, and the dynamic friction coefficient is 1000g/cm 2 10000 times of steel wool friction test under pressure, and the contact angle of water drops is still maintained>100 °; fourth, the surface energy is 16mJ/m 2 The drop angle was 115 deg., and the drop angle was 67 deg..
Example IV
The etching solution is prepared from the following components in parts by weight: 10 parts of ammonium bifluoride, 8 parts of sodium fluoride, 11 parts of p-toluenesulfonic acid, 15 parts of methanesulfonic acid, 6 parts of laurinol polyoxyethylene ether, 3 parts of sodium polyacrylate, 2 parts of EDTA and 95 parts of water; the etching liquid is kept at 30 ℃ during frosting, and the temperature difference of the etching liquid is controlled within 3%.
The etching solution of the fourth example and the molding process of the first example were used to test a glass substrate and to test the surface of the glass substrate for performance, and the following results were obtained:
firstly, no fingerprint residue exists on the surface of the glass substrate, and secondly, the thickness of the honeycomb-like particle layer is 48nm and the hardness is 6H measured by an instrument; thirdly, the dynamic friction coefficient measured by a friction measuring instrument is 0.05, the wear resistance is good, and the dynamic friction coefficient is 1000g/cm 2 10000 times of steel wool friction test under pressure, and the contact angle of water drops is still maintained>100 °; fourth, the surface energy is 17mJ/m 2 The drop angle was 120 ° and the drop angle was 70 °.
Example five
In order to verify the stability of the molding process effect of the present invention, three repeated experiments were performed on the surface of the glass substrate using the etching solution of the fourth embodiment and the molding process of the first embodiment, and the following test results were obtained:
the acid in the etching solution adopts organic acid such as p-toluenesulfonic acid and methanesulfonic acid, and is combined with fluoride salts (ammonium bifluoride and sodium fluoride) to form active ingredients in the etching solution, so that the production is stable during frosting, and the waste liquid after frosting is environment-friendly and environment-friendly; in addition, the etching solution has lower price, the etching process is easier to control, the production yield is high, and the product quality is stable. According to an electron microscope image, a honeycomb-like particle layer is formed on the surface of the glass substrate after etching to disperse the grains of the finger fingerprints as much as possible, so that an anti-fingerprint effect is realized; meanwhile, the honeycomb particle layer has good wear resistance, and can be used for a long time without falling off.
The embodiments of the present invention have been described in detail above, but the present invention is not limited to the described embodiments. It will be apparent to those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, and yet fall within the scope of the invention.
Claims (4)
1. The forming process for the glass substrate etching effect with fingerprint resistance and scratch resistance and wear resistance is characterized by comprising the following steps of:
s1, preparing an etching solution by the following components in parts by weight: 5-10 parts of ammonium bifluoride, 5-10 parts of sodium fluoride, 10-15 parts of p-toluenesulfonic acid, 10-15 parts of methanesulfonic acid, 2-6 parts of laureth, 2-4 parts of sodium polyacrylate, 2-10 parts of EDTA and 90-95 parts of water, and firstly, grinding and uniformly mixing the ammonium bifluoride and the sodium fluoride to form a mixture 1; grinding and uniformly mixing p-toluenesulfonic acid and methanesulfonic acid to form a mixture 2; then uniformly stirring laurinol polyoxyethylene ether and sodium polyacrylate to form a mixture 3; finally, heating water to 50 ℃, adding the mixture 3, EDTA, the mixture 2 and the mixture 1 into the water while stirring, and then standing and curing to obtain etching solution;
s2, cleaning the surface of the glass substrate to be frosted for the first time by using clean water;
s3, drying the glass, and protecting the surface of the glass substrate without frosting;
s4, placing the glass substrate into a frosting device, and frosting the surface of the glass substrate for 80 seconds by using the etching solution prepared in the step S1;
s5, placing the glass substrate etched in the step S4 into a conventional polishing solution for 7 minutes to polish;
s6, cleaning the surface of the polished glass substrate with clean water for the second time;
the forming process is applied to chemical etching of the glass mobile phone back cover, large equipment is adopted to spray the glass mobile phone back cover, and a honeycomb-like particle layer is formed on the surface of the glass mobile phone back cover.
2. The process for forming the glass substrate with fingerprint resistance and scratch and abrasion resistance according to claim 1, wherein the process comprises the following steps: and (3) curing time in the step S1 is 24 hours, and stirring is carried out every 4 hours in the curing process.
3. The process for forming the glass substrate with fingerprint resistance and scratch and abrasion resistance according to claim 1, wherein the process comprises the following steps: and S4, during frosting, the temperature of the etching solution is kept at 28-32 ℃, and the temperature difference of the etching solution is controlled within 3%.
4. The process for forming an etching effect on a glass substrate with fingerprint resistance and scratch resistance and abrasion resistance according to any one of claims 1 to 3, wherein the process comprises the following steps: after the forming process is adopted to sand the surface of the glass substrate, the surface of the glass substrate is uniformly distributed with a honeycomb-like particle layer.
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| CN115124249B (en) * | 2022-01-20 | 2024-01-23 | 佛山犀马精细化工有限公司 | Fluorite-shaped fingerprint-resistant and flashing-effect etching molding process for glass substrate |
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